CN112130419A - Motion platform for detecting thickness and curvature of large-size wafer - Google Patents
Motion platform for detecting thickness and curvature of large-size wafer Download PDFInfo
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- CN112130419A CN112130419A CN201910553213.XA CN201910553213A CN112130419A CN 112130419 A CN112130419 A CN 112130419A CN 201910553213 A CN201910553213 A CN 201910553213A CN 112130419 A CN112130419 A CN 112130419A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract
The invention provides a moving platform for detecting the thickness and the bending degree of a large-size wafer, which comprises a marble base, wherein a Y1-oriented marble guide rail and a Y2-oriented marble guide rail are arranged on the marble base in parallel, a Y1-oriented air floatation guide device and a Y2-oriented air floatation guide device are respectively arranged on the Y1-oriented marble guide rail and the Y2-oriented marble guide rail, a parallel X1-oriented guide rail and an X2-oriented guide rail are vertically connected between the Y1-oriented air floatation guide device and the Y2-oriented air floatation guide device, an X-oriented air floatation guide device is arranged on the X1-oriented guide rail and the X2-oriented guide rail through air floatation interaction, and an object carrying table is arranged on the. The invention adopts the XY bidirectional double-drive air-floating guide rail, and the joint type air-floating pads are arranged on the XY guide surfaces, so that the processing and mounting precision can be reduced, thereby realizing a motion platform for detecting large-size wafers and the like, and the object carrying plane can jump by 1 micron to meet the trend of increasing industry size and stricter detection requirements, and the invention has simple maintenance and no pollution to a clean room.
Description
Technical Field
The invention mainly relates to the field of wafer thickness and curvature detection, in particular to a moving platform for detecting the thickness and the curvature of a large-size wafer.
Background
The existing motion platform for detecting the thickness and the bending degree of the wafer is a mechanical guide rail platform, the jumping of a carrying plane is limited by the precision of the mechanical guide rail and the machining precision of parts, the carrying plane can only be as small as several microns, the installation is complicated, and the mechanical guide rail is lubricated by grease and needs to be sealed and maintained.
In addition, the existing air-floating platform for detecting the thickness and the bending degree of the wafer focuses on the detection of small-sized wafers and the like due to the limitation of processing precision and installation and debugging precision.
The published Chinese invention patent, application number CN201110378061.8, patent name: a three-beat double-workpiece-stage exchange device and method based on double-guide-rail double-drive is disclosed on the application date: 20111112, the invention relates to a three-beat double-workpiece stage exchange device and method based on double-guide-rail double-drive, belonging to the technical field of semiconductor manufacturing equipment, the system comprises a workpiece stage operating at a pre-alignment station and an exposure station, a well-type driving unit is respectively arranged at the pre-alignment station and the exposure station, the well-type driving unit consists of a bilateral X-direction linear motion unit and a bilateral Y-direction linear motion unit, and two Y-direction transition linear motion units are arranged between the two well-type driving units; and the double workpiece tables are replaced by butting the Y-direction linear motion unit and the Y-direction transition linear motion unit. According to the invention, two workpiece tables are driven by bilateral mass centers in the pre-alignment station and the exposure station, so that the angular rigidity of the system can be increased, only three beats are required when the two workpiece tables are exchanged between the pre-alignment station and the exposure station, the photoetching efficiency can be improved, and meanwhile, the invention has the advantages of small motion inertia, short stabilization time, large structural rigidity and the like in the specific implementation process.
Disclosure of Invention
The invention provides a motion platform for detecting the thickness and the curvature of a large-size wafer, and aims at the defects of the prior art, the motion platform for detecting the thickness and the curvature of the large-size wafer comprises a marble base 1, wherein a Y1 marble guide rail 8 and a Y2 marble guide rail 7 are arranged on the marble base 1 in parallel, a Y1 air-floatation guide device and a Y2 air-floatation guide device are respectively arranged on the Y1 marble guide rail 8 and the Y2 marble guide rail 7, a parallel X1 guide rail 22 and an X2 guide rail 25 are vertically connected between the Y1 air-floatation guide device and the Y2 air-floatation guide device, an X1 air-floatation guide device and an X2X guide rail 25 are provided with the X air-floatation guide device through air floatation interaction, and an objective table 28 is arranged on the X-floatation guide device;
an X-direction grating ruler 37 is installed on the X1 guide rail 22, and an X-direction reading head 45 corresponding to the X-direction grating ruler 37 is installed at the bottom of the object stage 28 through an X-direction reading head connecting piece 46;
the Y1 is to installing Y1 to the grating ruler 17 and Y2 to the grating ruler 18 on the marble guide rail 8 and Y2 to the marble guide rail 7 side each other, correspond to Y1 to the Y1 of the grating ruler 17 to read the head 16 and install on Y1 to the drive link 21 of the air supporting guiding device of Y1, correspond to Y2 to the Y2 of the grating ruler 18 to read the head 19 and install on Y2 to the drive link 23 of the air supporting guiding device of Y2;
an upper spectrum confocal sensor 14 is installed on the marble base 1 through a Z-axis bracket, a lower spectrum confocal sensor 15 is installed on the marble base 1, the lower spectrum confocal sensor 15 is arranged under an object stage 28, and the upper spectrum confocal sensor 14 and the lower spectrum confocal sensor 15 are coaxially arranged.
Preferably, the Y1-oriented air flotation guide device comprises a Y1-oriented motor stator 9, a Y1-oriented motor rotor 10, a Y1-oriented L-shaped air flotation member 20 and a Y1-oriented drive connector 21, wherein the Y1-oriented motor stator 9 is fixed on the marble base 1 through the connector, the Y1-oriented motor stator 9 is movably provided with a Y1-oriented motor rotor 10, the Y1-oriented motor rotor 10 is connected to one end of the Y1-oriented drive connector 21 at the top end of the motor rotor 10, and the Y1-oriented drive connector 21 is connected to the Y1-oriented L-shaped air flotation member 20 at the other end of the Y1-oriented drive connector.
Preferably, the Y1-oriented L-shaped air floating member 20 and the Y1-oriented motor mover 10 are respectively disposed at two sides of the Y1-oriented marble guide rail 8, a first Y1-oriented articulated air floating pad 31 and a second Y1-oriented articulated air floating pad 32 are disposed on a side surface of the Y1-oriented L-shaped air floating member 20, and the Y1-oriented L-shaped air floating member 20 is an integrated vacuum preloading type air floating.
Preferably, the Y2-oriented air flotation guide device comprises a Y2-oriented motor stator 5, a Y2-oriented motor rotor 6, a Y2-oriented L-shaped air flotation member 24 and a Y2-oriented drive connecting member 23, wherein the Y2-oriented motor stator 5 is fixed on the marble base 1 through the connecting member, the Y2-oriented motor stator 5 is movably provided with the Y2-oriented motor rotor 6, the Y2-oriented motor rotor 6 is connected to one end of the Y2-oriented drive connecting member 23 at the top end, and the Y2-oriented drive connecting member 23 is connected to the Y2-oriented L-shaped air flotation member 24 at the other end.
Preferably, the Y2-oriented L-shaped air floating member 24 and the Y2-oriented motor mover 6 are respectively arranged at two sides of the Y2-oriented marble guide rail 7, a first Y2-oriented articulated air floating pad 33 and a second Y2-oriented articulated air floating pad 34 are arranged on the side surface of the Y2-oriented L-shaped air floating member 24 in a penetrating manner, and the Y2-oriented L-shaped air floating member 24 is integrally vacuum preloaded on the bottom surface.
Preferably, the X1 guide rail 22 and the X2 guide rail 25 are connected to the Y1 to L-shaped air floating member 20 and the Y2 to L-shaped air floating member 24 at the same time, a first reinforcing rib 29 and a second reinforcing rib 30 are vertically arranged between the X1 guide rail 22 and the X2 guide rail 25, and the first reinforcing rib 29 and the second reinforcing rib 30 are parallel to the Y1 to L-shaped air floating member 20 and the Y2 to L-shaped air floating member 24.
Preferably, the first reinforcing rib 29 and the second reinforcing rib 30 are provided with a plurality of through holes.
Preferably, the X-directional air-bearing guide device includes an X1 directional air-bearing member 27 and an X2 directional air-bearing member 26, the X1 directional air-bearing member 27 and the X2 directional air-bearing member 26 are respectively installed at two sides of the bottom of the object stage 28, the bottom of the object stage 28 is respectively provided with an X1 directional motor mover 38 and an X2 directional motor mover 43, the X1 directional guide rail 22 and the X2 directional guide rail 25 are respectively provided with an X1 directional motor stator 36 and an X2 directional motor stator 35 along the long sides thereof, the X1 directional motor stator 36 and the X1 directional motor mover 38 correspond in position, and the X2 directional motor stator 35 and the X2 correspond in position to the motor mover 43.
Preferably, the X1 is provided with a first X1-oriented articulated air floating pad 39 and a second X1-oriented articulated air floating pad 40 on the side surface facing the air floating member 27, the X2 is provided with a first X2-oriented articulated air floating pad 41 and a second X2-oriented articulated air floating pad 42 on the side surface facing the air floating member 26, the X1 is an integrated vacuum preloading air floating on the bottom surface of the air floating member 27, and the X2 is an integrated vacuum preloading air floating on the bottom surface of the air floating member 26.
Preferably, the Z-axis support includes left stand 2, right stand 4 and crossbeam 3, left side stand 2 and right stand 4 are installed perpendicularly on marble base 1, the both ends of crossbeam 3 are fixed respectively on left stand 2 and right stand 4, be connected with Z axle slip table 12 through Z axle connecting piece 11 that has waist type hole on the vertical side of crossbeam 3, Z axle slip table 12 has last sensor connecting piece 13 that set screw distributes through circumference 120 to be provided with spectrum confocal sensor 14.
The invention has the beneficial effects that: by adopting the XY bidirectional double-drive air floating guide rail, the joint type air floating pads are arranged on the XY guide surfaces, the processing and mounting precision can be reduced, so that a motion platform for detecting large-size wafers and the like is realized, the object carrying plane can jump by 1 micrometer, the trend that the size of the industry is increased day by day and the detection requirement that the size of the industry is strict day by day are met, the maintenance is simple, and the clean room is not polluted.
Drawings
FIG. 1 is a block diagram of the present invention;
FIG. 2 is a front view of the present invention;
FIG. 3 is a detailed view of the present invention with respect to Y1-oriented air bearing guide and Y2-oriented air bearing guide;
FIG. 4 is a schematic structural diagram of an X-directional air-floating guide device according to the present invention;
FIG. 5 is a front view of the X-directional air-float guiding device of the present invention;
in the figure, the position of the upper end of the main shaft,
1. a marble base; 2. a left upright post; 3. a cross beam; 4. a right upright post; 5. y2 to the motor stator; 6. y2 directional motor rotor; 7. y2 marble guide; 8. y1 marble guide; 9. y1 to the motor stator; 10. y1 directional motor rotor; 11. a Z-axis connector; 12. a Z-axis sliding table; 13. an upper sensor connection; 14. an upper spectral confocal sensor; 15. a lower spectral confocal sensor; 16. y1 to the reading head; 17. y1 directional grating ruler; 18. y2 directional grating ruler; 19. y2 to the reading head; 20. y1 to L-shaped air floating piece; 21. y1 drive link; 22. x1 to the guide rail; 23. y2 drive link; 24. y2 to L-shaped air floating piece; 25. x2 to the guide rail; 26. x2 to the air float; 27. x1 to the air float; 28. an object stage; 29. a first reinforcing rib; 30. a second reinforcing rib; 31. a number Y1 guide joint air bearing pad; 32. a second Y1 guide joint type air floating cushion; 33. a number Y2 guide joint air bearing pad; 34. a second Y2 guide joint type air floating cushion; 35. x2 to the motor stator; 36. x1 to the motor stator; 37. an X-direction grating ruler; 38. an X1 directional motor rotor; 39. a number X1 guide articulating air bearing pad; 40. the second X1 guide joint type air floating cushion; 41. a number X2 guide articulating air bearing pad; 42. the second X2 guide joint type air floating cushion; 43. an X2 directional motor rotor; 44. a large-size wafer; 45. an X-direction reading head; 46. x-direction reading head connecting piece.
Detailed Description
As shown in fig. 1 to 5, the present invention includes: the marble base 1 is provided with a Y1 marble guide rail 8 and a Y2 marble guide rail 7 in parallel, a Y1 air-floating guide device and a Y2 air-floating guide device are respectively arranged on the Y1 marble guide rail 8 and the Y2 marble guide rail 7, parallel X1 guide rails 22 and X2 guide rails 25 are vertically connected between the Y1 air-floating guide device and the Y2 air-floating guide device, the X1 guide rails 22 and the X2 guide rails 25 are provided with X air-floating guide devices through air-floating interaction, and the X air-floating guide devices are provided with object stages 28;
an X-direction grating ruler 37 is installed on the X1 guide rail 22, and an X-direction reading head 45 corresponding to the X-direction grating ruler 37 is installed at the bottom of the object stage 28 through an X-direction reading head connecting piece 46;
the Y1 is to installing Y1 to the grating ruler 17 and Y2 to the grating ruler 18 on the marble guide rail 8 and Y2 to the marble guide rail 7 side each other, correspond to Y1 to the Y1 of the grating ruler 17 to read the head 16 and install on Y1 to the drive link 21 of the air supporting guiding device of Y1, correspond to Y2 to the Y2 of the grating ruler 18 to read the head 19 and install on Y2 to the drive link 23 of the air supporting guiding device of Y2;
an upper spectrum confocal sensor 14 is installed on the marble base 1 through a Z-axis bracket, a lower spectrum confocal sensor 15 is installed on the marble base 1, the lower spectrum confocal sensor 15 is arranged under an object stage 28, and the upper spectrum confocal sensor 14 and the lower spectrum confocal sensor 15 are coaxially arranged.
In use, the high-rigidity joint type air cushion is adopted on the XY guide side surface, the processing precision and the installation and debugging difficulty of the air floating piece and the air floating guide rail are greatly reduced, the bottom surface is processed by integrated air floating, the cost is reduced compared with that of the air cushion, the development of thickness detection platforms such as large-size wafers is guaranteed, and the jump of the carrying wafer in the whole motion plane can reach 1 um. In addition, the lower spectral confocal sensor 15 can be adjusted in three directions of XYZ to ensure the working distance with the upper spectral confocal sensor 14 axis and with the working plane; stage 28 is hollow and carries wafer trim features and wafer edge definition features, with large-sized wafer 44 placed directly on wafer trim features on stage 28.
In this embodiment, the Y1-oriented air floating guide device preferably includes a Y1-oriented motor stator 9, a Y1-oriented motor rotor 10, a Y1-oriented L-shaped air floating member 20 and a Y1-oriented driving connecting member 21, the Y1-oriented motor stator 9 is fixed on the marble base 1 through the connecting member, the Y1-oriented motor stator 9 is movably provided with the Y1-oriented motor rotor 10, the Y1-oriented motor rotor 10 is connected to one end of the Y1-oriented driving connecting member 21 at the top end thereof, the Y1-oriented driving connecting member 21 is connected to the Y1-oriented L-shaped air floating member 20 at the other end thereof, and the Y1-oriented L-shaped air floating member 20 is an integrated vacuum preloaded air floating.
With the structure, the bottom surface of the Y1-direction L-shaped air floating piece 20 is in a vacuum self-weight completely pre-tightening mode, and forms an air film with certain thickness and rigidity with the marble base 1 for supporting in the Y-axis Z direction.
In this embodiment, the Y1-oriented L-shaped air floating member 20 and the Y1-oriented motor mover 10 are preferably disposed on both sides of the Y1-oriented marble guide rail 8, and a first Y1-oriented articulated air floating pad 31 and a second Y1-oriented articulated air floating pad 32 are formed on the side surface of the Y1-oriented L-shaped air floating member 20.
With the above structure, the direction of Y1 toward the inner side of the marble guide rail 8 is used as the air floatation guide surface of the Y1 toward the L-shaped air floatation member 20; the high-rigidity joint type air-floating cushion and the marble guide rail 8 form an air film with certain thickness and rigidity for Y-axis bidirectional guiding. The installation form of the joint type air floating cushion can be automatically adjusted according to the planeness and the verticality of the side surface of the guide rail, so that the design and processing requirements on the side surface of the L-shaped air floating piece are reduced, the processing requirements on the plane and the verticality of the guide rail can be reduced, and the installation and the debugging are facilitated.
In this embodiment, the Y2-oriented air flotation guide device preferably includes a Y2-oriented motor stator 5, a Y2-oriented motor mover 6, a Y2-oriented L-shaped air flotation member 24 and a Y2-oriented drive connector 23, the Y2-oriented motor stator 5 is fixed on the marble base 1 through connectors, the Y2-oriented motor stator 5 is movably provided with a Y2-oriented motor mover 6, the Y2-oriented motor mover 6 is connected to one end of the Y2-oriented drive connector 23 at the top end thereof, the Y2-oriented drive connector 23 is connected to the Y2-oriented L-shaped air flotation member 24 at the other end thereof, and the Y2-oriented L-shaped air flotation member 24 is an integrated vacuum preloaded air flotation.
With the structure, the bottom surface of the Y2L-shaped air floating piece 24 is in a vacuum self-weight completely pre-tightening mode, and forms an air film with certain thickness and rigidity with the marble base 1 for supporting in the Y-axis Z direction.
In this embodiment, the Y2-oriented L-shaped air floating member 24 and the Y2-oriented motor mover 6 are preferably disposed on both sides of the Y2-oriented marble guide rail 7, and the Y2-oriented L-shaped air floating member 24 is provided with a first Y2-oriented articulated air floating pad 33 and a second Y2-oriented articulated air floating pad 34 on its side surface.
With the above structure, the direction of Y2 toward the inner side of the marble guide rail 7 is used as the air floatation guide surface of the Y2 toward the L-shaped air floatation piece 24; the high-rigidity joint type air floating cushion and the Y2 directional marble guide rail 7 form an air film with certain thickness and rigidity for Y-axis bidirectional guiding. The installation form of the joint type air floating cushion can be automatically adjusted according to the planeness and the verticality of the side surface of the guide rail, so that the design and processing requirements on the side surface of the L-shaped air floating piece are reduced, the processing requirements on the plane and the verticality of the guide rail can be reduced, and the installation and the debugging are facilitated.
In this embodiment, the X1 guide rail 22 and the X2 guide rail 25 are preferably connected to the Y1-to-L air float 20 and the Y2-to-L air float 24 at the same time, the first reinforcing rib 29 and the second reinforcing rib 30 are further vertically arranged between the X1 guide rail 22 and the X2 guide rail 25, and the first reinforcing rib 29 and the second reinforcing rib 30 are parallel to the Y1-to-L air float 20 and the Y2-to-L air float 24.
With the above configuration, the rigidity in the X direction is increased by the first reinforcing rib 29 and the second reinforcing rib 30.
In this embodiment, the first rib 29 and the second rib 30 are preferably provided with a plurality of through holes.
With the structure, the first reinforcing rib 29 and the second reinforcing rib 30 are structurally optimized to reduce weight, but not limited to hole weight reduction and other weight reduction modes.
In this embodiment, the X-direction air-bearing guide device preferably includes an X1-direction air-bearing member 27 and an X2-direction air-bearing member 26, the X1-direction air-bearing member 27 and the X2-direction air-bearing member 26 are respectively mounted on both sides of the bottom of the stage 28, the bottom of the stage 28 is respectively provided with an X1-direction motor mover 38 and an X2-direction motor mover 43, the X1-direction guide rail 22 and the X2-direction guide rail 25 are respectively provided with an X1-direction motor stator 36 and an X2-direction motor stator 35 along the long sides thereof, the X1-direction motor stator 36 and the X1-direction motor mover 38 correspond to each other in position, and the X2-direction motor stator 35 and the X2-direction motor mover 43 correspond to each.
By the structure, the X-axis aluminum air-floating guide rail is transversely provided with the X-direction motor fixing character, the aluminum guide rail can be enlarged in size on the same appearance size as much as possible, the integral rigidity can be increased, and the machining of the guide rail is facilitated.
In this embodiment, preferably, the X1 has a first X1-oriented articulated air bearing pad 39 and a second X1-oriented articulated air bearing pad 40 mounted on the side surface of the air floating member 27, the X2 has a first X2-oriented articulated air bearing pad 41 and a second X2-oriented articulated air bearing pad 42 mounted on the side surface of the air floating member 26, the X1 is an integrated vacuum preloading air bearing on the bottom surface of the air floating member 27, and the X2 is an integrated vacuum preloading air bearing on the bottom surface of the air floating member 26.
With the structure, the air floating device 27 facing the X1 and the air floating device 26 facing the X2 are vacuum dead-weight completely pre-tightening air floating, interact with the marble base 1 to form an air film with certain thickness and rigidity, and are used for bearing the X bearing; the high stiffness articulated air bearing pads interact with the sides of the X1 guide rail 22 and the X2 guide rail 25, respectively, to form a film of air with a thickness stiffness for X-direction guidance.
Preferred in this implementation, the Z axle support includes left stand 2, right stand 4 and crossbeam 3, left side stand 2 and right stand 4 are installed perpendicularly on marble base 1, the both ends of crossbeam 3 are fixed respectively on left stand 2 and right stand 4, be connected with Z axle slip table 12 through Z axle connecting piece 11 that has waist type hole on the vertical side of crossbeam 3, Z axle slip table 12 has last sensor connecting piece 13 that the set screw distributes through circumference 120 and is provided with spectrum confocal sensor 14.
With the above structure, the upper spectral confocal sensor 14 can be adjusted in the XY direction.
The above-described embodiments are merely illustrative of the principles and utilities of the present patent application and are not intended to limit the present patent application. Modifications and variations can be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of this patent application. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical concepts disclosed in the present application shall be covered by the claims of this patent application.
Claims (10)
1. A motion platform for detecting the thickness and the bending degree of a large-size wafer is characterized by comprising a marble base (1), wherein a Y1 directional marble guide rail (8) and a Y2 directional marble guide rail (7) are arranged on the marble base (1) in parallel, a Y1 directional air floatation guide device and a Y2 directional air floatation guide device are respectively installed on the Y1 directional marble guide rail (8) and the Y2 directional marble guide rail (7), a parallel X1 directional guide rail (22) and an X2 directional guide rail (25) are vertically connected between the Y1 directional air floatation guide device and the Y2 directional air floatation guide device, an X directional air floatation guide device is arranged on the X1 directional guide rail (22) and the X2 directional guide rail (25) through air floatation interaction, and a loading platform (28) is installed on the X directional air floatation guide device; an X-direction grating ruler (37) is installed on the X1-direction guide rail (22), and an X-direction reading head (45) corresponding to the X-direction grating ruler (37) is installed at the bottom of the objective table (28) through an X-direction reading head connecting piece (46); y1-direction grating scales (17) and Y2-direction grating scales (18) are respectively arranged on the mutually opposite side surfaces of the Y1-direction marble guide rail (8) and the Y2-direction marble guide rail (7), a Y1-direction reading head (16) corresponding to the Y1-direction grating scale (17) is arranged on a Y1-direction driving connecting piece (21) of the Y1-direction air floatation guide device, and a Y2-direction reading head (19) corresponding to the Y2-direction grating scale (18) is arranged on a Y2-direction driving connecting piece (23) of the Y2-direction air floatation guide device; an upper spectrum confocal sensor (14) is installed on the marble base (1) through a Z-axis support, a lower spectrum confocal sensor (15) is installed on the marble base (1), the lower spectrum confocal sensor (15) is arranged right below an object stage (28), and the upper spectrum confocal sensor (14) and the lower spectrum confocal sensor (15) are coaxially arranged.
2. The motion platform for thickness and curvature detection of large-sized wafers according to claim 1, wherein: y1 is to air supporting guider includes Y1 to motor stator (9), Y1 to motor active cell (10), Y1 to L type air supporting piece (20) and Y1 to drive connecting piece (21), Y1 passes through the connecting piece to motor stator (9) and fixes on marble base (1), Y1 is provided with Y1 to motor active cell (10) to motor stator (9) activity, Y1 is connected in Y1 to the one end of drive connecting piece (21) to the top of motor active cell (10), Y1 is connected on Y1 to L type air supporting piece (20) to the other end of drive connecting piece (21).
3. The motion platform for thickness and curvature detection of large-sized wafers according to claim 2, wherein: y1 sets up respectively in Y1 to the both sides of marble guide rail (8) to L type air supporting member (20) and Y1 to motor active cell (10), Y1 wears to be equipped with a Y1 on the side of L type air supporting member (20) and leads articulated air supporting pad (31) and No. two Y1 to leading articulated air supporting pad (32), Y1 is to the bottom surface formula air supporting of vacuum preloading formula of integral type of L type air supporting member (20).
4. The motion platform for thickness and curvature detection of large-sized wafers according to claim 3, wherein: y2 is to air supporting guider includes Y2 to motor stator (5), Y2 to motor active cell (6), Y2 to L type air supporting piece (24) and Y2 to drive connecting piece (23), Y2 passes through the connecting piece to motor stator (5) and fixes on marble base (1), Y2 is provided with Y2 to motor active cell (6) to motor stator (5) activity, Y2 is connected in Y2 to the one end of drive connecting piece (23) to the top of motor active cell (6), Y2 is connected on Y2 to L type air supporting piece (24) to the other end of drive connecting piece (23).
5. The motion platform for thickness and curvature detection of large-sized wafers according to claim 4, wherein: y2 sets up respectively in Y2 to the both sides of marble guide rail (7) to L type air supporting piece (24) and Y2 to motor active cell (6), Y2 wears to be equipped with a Y2 on the side to L type air supporting piece (24) and leads articulated air supporting pad (33) and No. two Y2 to leading articulated air supporting pad (34), Y2 is to the bottom surface formula air supporting of vacuum preloading formula of integral type of L type air supporting piece (24).
6. The motion platform for thickness and curvature detection of large-sized wafers according to claim 5, wherein: x1 is connected simultaneously to Y1 to L type air supporting member (20) and Y2 to L type air supporting member (24) to the both ends of guide rail (25) to guide rail (22) and X2, X1 still is provided with a strengthening rib (29) and No. two strengthening ribs (30) to the guide rail (22) and X2 to between guide rail (25) perpendicularly, No. one strengthening rib (29) and No. two strengthening ribs (30) are parallel to L type air supporting member (20) and Y2 to L type air supporting member (24) with Y1.
7. The motion platform for large-size wafer thickness and bow detection according to claim 6, wherein: a plurality of through holes are formed in the first reinforcing rib (29) and the second reinforcing rib (30).
8. The motion platform for thickness and curvature detection of large-sized wafers according to claim 7, wherein: the X-direction air floatation guiding device comprises an X1-direction air floatation piece (27) and an X2-direction air floatation piece (26), wherein the X1-direction air floatation piece (27) and the X2-direction air floatation piece (26) are respectively installed on two sides of the bottom of an object stage (28), the bottom of the object stage (28) is respectively provided with an X1-direction motor rotor (38) and an X2-direction motor rotor (43), the X1-direction guide rail (22) and the X2-direction guide rail (25) are respectively provided with an X1-direction motor stator (36) and an X2-direction motor stator (35) along the long edge of the guide rail, the X1-direction motor stator (36) corresponds to the X1-direction motor rotor (38), and the X2-direction motor stator (35) corresponds to the X2-direction motor rotor (43).
9. The motion platform for large-scale wafer thickness and bow detection according to claim 8, wherein: x1 is to the side-mounting of air supporting piece (27) have one number X1 to lead articulated air supporting pad (39) and No. two X1 to lead articulated air supporting pad (40), X2 is to the side-mounting of air supporting piece (26) have one number X2 to lead articulated air supporting pad (41) and No. two X2 to lead articulated air supporting pad (42), X1 is to the bottom surface of air supporting piece (27) formula vacuum preloading air supporting of integral type, X2 is to the bottom surface formula vacuum preloading air supporting of air supporting piece (26) of integral type.
10. The motion platform for thickness and curvature detection of large-sized wafers according to claim 9, wherein: z axle support includes left stand (2), right stand (4) and crossbeam (3), install perpendicularly on marble base (1) left side stand (2) and right stand (4), the both ends of crossbeam (3) are fixed respectively on left stand (2) and right stand (4), be connected with Z axle slip table (12) through Z axle connecting piece (11) that have waist type hole on the vertical side of crossbeam (3), Z axle slip table (12) have last sensor connecting piece (13) of holding screw through the 120 distribution of circumference and are provided with on spectrum confocal sensor (14).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910553213.XA CN112130419A (en) | 2019-06-25 | 2019-06-25 | Motion platform for detecting thickness and curvature of large-size wafer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910553213.XA CN112130419A (en) | 2019-06-25 | 2019-06-25 | Motion platform for detecting thickness and curvature of large-size wafer |
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| CN112130419A true CN112130419A (en) | 2020-12-25 |
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| CN201910553213.XA Pending CN112130419A (en) | 2019-06-25 | 2019-06-25 | Motion platform for detecting thickness and curvature of large-size wafer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114309925A (en) * | 2021-12-31 | 2022-04-12 | 河南通用智能装备有限公司 | Wafer recessive cutting device |
| CN117031888A (en) * | 2023-08-24 | 2023-11-10 | 千凰微纳装备科技(北京)有限公司 | Device and method for detecting movement precision of workpiece table of photoetching machine |
-
2019
- 2019-06-25 CN CN201910553213.XA patent/CN112130419A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114309925A (en) * | 2021-12-31 | 2022-04-12 | 河南通用智能装备有限公司 | Wafer recessive cutting device |
| CN117031888A (en) * | 2023-08-24 | 2023-11-10 | 千凰微纳装备科技(北京)有限公司 | Device and method for detecting movement precision of workpiece table of photoetching machine |
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