CN112114389A - Heat-insulation antireflection film and preparation method and application thereof - Google Patents
Heat-insulation antireflection film and preparation method and application thereof Download PDFInfo
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- CN112114389A CN112114389A CN202010492544.XA CN202010492544A CN112114389A CN 112114389 A CN112114389 A CN 112114389A CN 202010492544 A CN202010492544 A CN 202010492544A CN 112114389 A CN112114389 A CN 112114389A
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- 238000009413 insulation Methods 0.000 title abstract description 27
- 238000002360 preparation method Methods 0.000 title abstract description 23
- 239000002131 composite material Substances 0.000 claims abstract description 29
- 230000007704 transition Effects 0.000 claims abstract description 13
- 239000010408 film Substances 0.000 claims description 241
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 68
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 64
- 239000000463 material Substances 0.000 claims description 45
- 239000000377 silicon dioxide Substances 0.000 claims description 34
- 239000012788 optical film Substances 0.000 claims description 28
- 229910052681 coesite Inorganic materials 0.000 claims description 26
- 229910052906 cristobalite Inorganic materials 0.000 claims description 26
- 229910052682 stishovite Inorganic materials 0.000 claims description 26
- 229910052905 tridymite Inorganic materials 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 23
- 239000007769 metal material Substances 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 239000004408 titanium dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 3
- 229910052593 corundum Inorganic materials 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 239000005083 Zinc sulfide Substances 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 24
- 230000000694 effects Effects 0.000 abstract description 14
- 238000009825 accumulation Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 69
- 238000000151 deposition Methods 0.000 description 45
- 230000008021 deposition Effects 0.000 description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 238000001771 vacuum deposition Methods 0.000 description 15
- 238000004140 cleaning Methods 0.000 description 8
- 238000000411 transmission spectrum Methods 0.000 description 7
- 230000035699 permeability Effects 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- -1 silver-aluminum Chemical compound 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a heat-insulation antireflection film and a preparation method and application thereof, wherein the heat-insulation antireflection film comprises the following components: the device comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; the composite near-infrared reflection film system is composed of a near-infrared reflection film and all-dielectric transition films wrapped on two sides of the near-infrared reflection film. The heat-insulating antireflection film obtained by the invention realizes the heat-insulating effect on near-infrared wave bands, protects the working of instruments or human eyes from the interference of heat accumulation, greatly prolongs the service life of corresponding lenses or elements, realizes high visible light transmittance of the film layer, and has the advantages of low cost, simple and convenient preparation process and wide application value.
Description
Technical Field
The invention relates to the technical field of optical film preparation, in particular to a heat-insulating antireflection film and a preparation method and application thereof.
Background
The antireflection film is a film with the widest application range in the field of optical films, is used for reducing reflection caused by mismatching of refractive indexes of a substrate and an air interface so as to increase light transmission, and is widely applied to the fields of display, imaging, spectacle lens preparation and the like. At present, the antireflection film mainly comprises two types of interference film layers or optical micro-nano structure films with gradually changed refractive indexes. Wherein, the interference film layer has a single layer, a double layer and a plurality of layers, so as to correspond to different bandwidth and anti-reflection effect requirements; the optical micro-nano structure film with gradually changed refractive index is generally a single-layer film and is formed by a low refractive index film layer or a substrate. The double-layer or multi-layer interference antireflection film is formed by stacking film stacks with high refractive indexes and low refractive indexes alternately. The antireflection film obtained in the mode can realize the whole transmittance of the substrate of more than 97% (the double-sided reflection is less than 3%), and even more than 98.5% (the double-sided reflection is less than 1.5%).
Since the visible range of human eyes is visible light band, common visible light band antireflection film has no definite modulation to near infrared band, however, since the spectrum of sunlight covers ultraviolet-visible-near infrared band, in which the near infrared band energy accounts for about 50%, the near infrared energy needs to be isolated to avoid unnecessary heat accumulation. However, the existing technology lacks a heat-insulating antireflection film layer for blocking near infrared bands, which is a technical problem to be solved urgently in the field.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a heat-insulating antireflection film, a preparation method and application thereof, which can effectively improve the light transmittance and simultaneously can obviously insulate heat.
The technical scheme of the invention is realized by the following modes:
a first aspect of the present invention provides a heat-insulating antireflection film, including: the device comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; the composite near-infrared reflection film system consists of a near-infrared reflection film and all-dielectric transition films wrapped on two sides of the near-infrared reflection film;
further, the all-dielectric antireflection film system 1 and the all-dielectric antireflection film system 2 are formed by alternately stacking high-refractive-index material layers and low-refractive-index material layers; furthermore, the outermost layer of the all-dielectric antireflection film system 2 is a low refractive index material layer;
furthermore, the high-refractive-index material is selected from one or more of titanium dioxide, hafnium dioxide, tantalum pentoxide, silicon nitride and zinc sulfide; further preferably, the high refractive index material is titanium dioxide; further, the low refractive index material is selected from any one or more of silicon dioxide, aluminum oxide and fluoride; further preferably, the low refractive index material is silicon dioxide;
furthermore, the total-medium antireflection film layer 1 is 2-35 layers; preferably, the all-dielectric antireflection film layer 1 is 6-24 layers;
furthermore, the total-medium antireflection film layer 2 is 2-12 layers; preferably, the all-dielectric antireflection film layer 2 comprises 2-8 layers;
furthermore, in the all-dielectric antireflection film layer 1 and the all-dielectric antireflection film layer 2, the thickness of the high-refractive-index material film layer is 6-180 nm; preferably, the thickness of the high-refractive-index material film layer is 8-120 nm; furthermore, in the all-dielectric antireflection film layer 1 and the all-dielectric antireflection film layer 2, the thickness of the low-refractive-index material film layer is 6-300 nm; preferably, the thickness of the low-refractive-index material film is 10-260 nm;
further, in the composite near-infrared reflection film system, the all-dielectric transition film material includes, but is not limited to, Al2O3，SiO2，ZrO2Any one or more of them;
furthermore, in the composite near-infrared reflection film system, the all-dielectric transition film is 0-6 layers; preferably, the all-dielectric transition film is 0-2 layers;
furthermore, in the composite near-infrared reflection film system, the thickness of the all-dielectric transition film layer is 6-300 nm; preferably, the thickness of the all-dielectric transition film layer is 8-120 nm;
further, in the composite near-infrared reflection film system, the near-infrared reflection film is made of a metal material; preferably, the metal material is an alloy composed of one or more of silver, aluminum, gold, copper, zinc, nickel and chromium; more preferably, the metal material is silver or Ag-Al alloy, wherein Ag accounts for 90-97% of the mole fraction of the Ag-Al alloy;
furthermore, in the composite near-infrared reflection film system, the thickness of the near-infrared reflection film is 5-35 nm;
a second aspect of the invention provides a heat-insulating anti-reflection lens, comprising: the lens comprises a substrate lens and optical films arranged on two sides of the substrate lens, wherein at least one side of the optical film is the heat-insulating antireflection film, and an all-dielectric antireflection film 1 in the heat-insulating antireflection film is tightly attached to the substrate lens;
further, the optical film on the other side is a conventional antireflection film or the heat-insulating antireflection film;
further, the substrate lens is a glass lens, a resin lens or a plastic lens;
further, the light transmittance of the heat-insulation anti-reflection lens at a waveband of 400nm-700nm is more than or equal to 95%, and the light transmittance at a waveband of 800nm-2500nm is less than or equal to 40%; further preferably, the heat-insulating anti-reflection lens has a light transmittance of 97% or more at a waveband of 400nm to 700nm and a light transmittance of 30% or less at a waveband of 800nm to 2500 nm; more preferably, the heat-insulating anti-reflection lens has a light transmittance of 98% or more in a wavelength band of 400nm to 700nm and a light transmittance of 20% or less in a wavelength band of 800nm to 2500 nm;
the third aspect of the invention provides a preparation method of the heat-insulating anti-reflection lens, which comprises the following steps:
s1: selecting proper materials with high and low refractive indexes, metal materials and lenses according to the specific requirements on the light transmittance of the heat-insulating anti-reflection lens to design a heat-insulating anti-reflection film system meeting the requirements;
s2: wiping and cleaning the lens by using ethanol, then placing the lens into vacuum coating equipment, strictly controlling deposition parameters according to the film system designed in the S1, depositing the heat-insulating antireflection film system on one side or two sides of the lens, and obtaining the lens after deposition is finished.
The fourth aspect of the invention provides a use of the heat-insulating anti-reflection lens, which can be used for preparing glasses, goggles, optical instruments or helmets with lenses.
Advantageous effects
The heat-insulating antireflection film and the lens thereof have the following technical advantages:
(1) the ultra-thin metal layer is added into the heat-insulating antireflection film to serve as a near-infrared reflecting layer, so that the heat-insulating effect on a near-infrared band is realized, and the service life of corresponding lenses or elements is greatly prolonged;
(2) by matching the high-low refractive index material with the near infrared layer, the visible light high permeability of the film layer is realized while infrared light is blocked to meet heat insulation, and the light transmission requirements for preparing different lenses are met;
(3) the heat-insulating antireflection film is low in material cost, simple and convenient in preparation process, convenient for large-scale and batch production, and widely applied to the fields of display, imaging, glasses, biomedicine and the like.
Drawings
FIG. 1 is a schematic structural view of a heat-insulating antireflection film prepared in example 1 of the present invention
All-dielectric antireflection film series 1(101), composite near-infrared reflection film series 102, all-dielectric antireflection film series 2(103)
FIG. 2 is a schematic view of a structure of a heat-insulating antireflection lens obtained in example 1.2 of the present invention
(a) A cross-sectional view of a thermally insulated anti-reflective lens, and (b) an exploded view of a thermally insulated anti-reflective lens; (a) the (b) consists of a substrate lens (1), a heat-insulating antireflection film (2) and a conventional antireflection film (3)
FIG. 3 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained in 1.2 of example 1 of the present invention
FIG. 4 shows a transmission spectrum of a heat-insulating antireflection lens obtained in 1.3 of example 1 of the present invention
FIG. 5 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained in 2.2 of example 2 of the present invention
FIG. 6 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained in 3.2 of example 3 of the present invention
FIG. 7 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained in 4.2 of example 4 of the present invention
FIG. 8 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained in 5.2 of example 5 of the present invention
FIG. 9 shows the transmission spectrum of the heat-insulating anti-reflection lens obtained at 6.2 in example 6 of the present invention
Detailed Description
Example 1:
1.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; wherein the composite near-infrared reflection film system only comprises a near-infrared reflection film; the specific film layer is made of titanium dioxide as a high-refractive-index material, silicon dioxide as a low-refractive-index material and silver as a metal material, and the specific film layer is as shown in the following table 1:
TABLE 1
1.2 preparation of lens with one side plated with heat-insulating antireflection film
As shown in fig. 2, a heat-insulating anti-reflection lens (wherein (a) is a cross-sectional view of the heat-insulating anti-reflection lens, and (b) is an exploded view of the heat-insulating anti-reflection lens), which uses a resin lens (hereinafter referred to as CR-39 lens) cast by a common CR-39 monomer as a substrate, (1) and optical films disposed on both sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film (3) prepared in the step 1.1; the optical film on the other side is a conventional antireflection film (2), and the specific film layer settings of the conventional antireflection film are shown in the following table 2:
TABLE 2
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 1, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in fig. 3, the obtained lens has high light transmittance (> 98%) in the visible light band of 400-700nm and obtains excellent heat insulation effect (the transmittance in the near infrared band is < 30%) in the near infrared band of 800-2500 nm. Therefore, the high-efficiency anti-reflection lens with remarkable heat insulation effect can be obtained by the method.
1.3 preparation of lens with both sides plated with heat-insulating antireflection film
A heat-insulating anti-reflection lens consists of a substrate lens CR-39 and optical films arranged on two sides of the lens; wherein, the optical films on both sides are the heat-insulating antireflection film prepared in the step 1.1.
The specific operation is as follows:
firstly, respectively wiping and cleaning two CR-39 lenses by using ethanol, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 1, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 1, continuously depositing the heat-insulating antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in fig. 4, the obtained lens has high light transmittance (> 95%) in the visible light band, and obtains excellent heat insulation effect (the transmittance in the near infrared band is less than 10%) in the near infrared band 800-. Therefore, the double-sided plated heat-insulation antireflection film can realize excellent heat insulation effect and higher transmission effect, and is expected to be applied to occasions sensitive to solar heat.
Example 2
2.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; wherein the composite near-infrared reflection film system only comprises a near-infrared reflection film; and the high refractive index material is titanium dioxide, the low refractive index material is silicon dioxide, the metal material is silver, and the specific film layer setting is as shown in table 3 below:
TABLE 3
| Film layer | Material | Thickness/ |
| 1 | SiO2 | 65.15 |
| 2 | TiO2 | 12 |
| 3 | SiO2 | 40.18 |
| 4 | TiO2 | 109.33 |
| 5 | SiO2 | 138.09 |
| 6 | TiO2 | 19.09 |
| 7 | Ag | 11.43 |
| 8 | TiO2 | 17.93 |
| 9 | SiO2 | 47.4 |
2.2 preparation of lenses
The lens consists of a substrate lens CR-39(1) and optical films arranged on two sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film prepared in the step 2.1; the optical film on the other side is a conventional antireflection film, and the specific film layer of the conventional antireflection film is as shown in the following table 2:
TABLE 2
| Film layer | Material | Thickness/ |
| 1 | TiO2 | 7.29 |
| 2 | SiO2 | 47.41 |
| 3 | TiO2 | 24.18 |
| 4 | SiO2 | 21.08 |
| 5 | TiO2 | 72.88 |
| 6 | SiO2 | 10.38 |
| 7 | TiO2 | 29 |
| 8 | SiO2 | 90.47 |
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 3, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in fig. 5, the obtained lens has high light transmittance (> 98%) in the visible light band of 400-700nm and obtains excellent heat insulation effect (the transmittance in the near infrared band is < 20%) in the near infrared band of 800-2500 nm. Therefore, the compact film can realize the heat insulation and permeability increasing effect with less films, and can be applied to plastic substrates such as lenses and the like and occasions with high requirements on the number of the films or the coating temperature and the like.
Example 3
3.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; wherein the composite near-infrared reflection film system only comprises a near-infrared reflection film; and the high refractive index material is titanium dioxide, the low refractive index material is silicon dioxide, the metal material is silver, and the specific film layer settings are as shown in table 4 below:
TABLE 4
Note: wherein the molar ratio of Ag in the Ag-Al alloy is 95%, and the molar ratio of Al is 5%.
3.2 preparation of lenses
The lens consists of a substrate lens CR-39(1) and optical films arranged on two sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film prepared by the method 3.1; the optical film on the other side is a conventional antireflection film, and the specific film layer of the conventional antireflection film is as shown in the following table 2:
TABLE 2
| Film layer | Material | Thickness/ |
| 1 | TiO2 | 7.29 |
| 2 | SiO2 | 47.41 |
| 3 | TiO2 | 24.18 |
| 4 | SiO2 | 21.08 |
| 5 | TiO2 | 72.88 |
| 6 | SiO2 | 10.38 |
| 7 | TiO2 | 29 |
| 8 | SiO2 | 90.47 |
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 4, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in fig. 6, the obtained lens has high light transmittance (> 95%) in the visible light band of 400-700nm and obtains excellent heat insulation effect (the transmittance in the near infrared band is < 25%) in the near infrared band of 800-2500 nm. Therefore, the silver-aluminum alloy material can greatly improve the stability of the film layer, thereby obviously prolonging the service life of the heat-insulation antireflection lens and being suitable for occasions with harsh use environment and long service time.
Example 4
4.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; wherein the composite near-infrared reflection film system only comprises a near-infrared reflection film; and the high refractive index material is titanium dioxide, the low refractive index material is aluminum oxide, the metal material is silver, and the specific film layer setting is as shown in the following table 5:
TABLE 5
4.2 preparation of lenses
The device consists of a substrate lens CR-39 and optical films arranged on two sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film prepared by the method 4.1; the optical film on the other side is a conventional antireflection film, and the specific film layer of the conventional antireflection film is as shown in the following table 2:
TABLE 2
| Film layer | Material | Thickness/ |
| 1 | TiO2 | 7.29 |
| 2 | SiO2 | 47.41 |
| 3 | TiO2 | 24.18 |
| 4 | SiO2 | 21.08 |
| 5 | TiO2 | 72.88 |
| 6 | SiO2 | 10.38 |
| 7 | TiO2 | 29 |
| 8 | SiO2 | 90.47 |
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 5, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in FIG. 7, the obtained lens has high light transmittance (> 97%) in the visible light band of 400-700nm and obtains excellent heat insulation effect (the average transmittance in the near infrared band is less than or equal to 20%) in the near infrared band of 800-2500 nm. Therefore, the compact film can realize the heat insulation and permeability increasing effect with less films, and can be applied to plastic substrates such as lenses and the like and occasions with high requirements on the number of the films or the coating temperature and the like.
Example 5
5.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; wherein the composite near-infrared reflection film system only comprises a near-infrared reflection film; and the high refractive index material is ZnS, the low refractive index material is silica, the metal material is silver, and the specific film layer settings are as shown in table 6 below:
TABLE 6
5.2 preparation of lenses
The device consists of a substrate lens CR-39 and optical films arranged on two sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film prepared by the above 5.1; the optical film on the other side is a conventional antireflection film, and the specific film layer of the conventional antireflection film is as shown in the following table 2:
TABLE 2
| Film layer | Material | Thickness/ |
| 1 | TiO2 | 7.29 |
| 2 | SiO2 | 47.41 |
| 3 | TiO2 | 24.18 |
| 4 | SiO2 | 21.08 |
| 5 | TiO2 | 72.88 |
| 6 | SiO2 | 10.38 |
| 7 | TiO2 | 29 |
| 8 | SiO2 | 90.47 |
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 6, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in FIG. 8, the obtained lens has a high light transmittance (greater than 90%) at the visible light band of 400-700nm and an excellent heat insulation effect (the average transmittance at the near infrared band is less than or equal to 8%) at the near infrared band of 800-2500 nm. Therefore, the compact film can realize the heat insulation and permeability increasing effect with less films, and can be applied to plastic substrates such as lenses and the like and occasions with high requirements on the number of the films or the coating temperature and the like.
Example 6
6.1 preparation of Heat-insulating antireflection film
A heat insulation antireflection film comprises an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2 which are sequentially arranged; the composite near-infrared reflection film comprises a near-infrared reflection film and an all-dielectric transition film; the high refractive index material is titanium dioxide, the low refractive index material is silicon dioxide, the metal material is silver, and the all-dielectric transition film material is Al2O3The specific film layer settings are shown in table 7 below:
TABLE 7
6.2 preparation of lenses
The device consists of a substrate lens CR-39 and optical films arranged on two sides of the lens; wherein, the optical film on one side is the heat-insulating antireflection film prepared by the 6.1; the optical film on the other side is a conventional antireflection film, and the specific film layer of the conventional antireflection film is as shown in the following table 2:
TABLE 2
| Film layer | Material | Thickness/ |
| 1 | TiO2 | 7.29 |
| 2 | SiO2 | 47.41 |
| 3 | TiO2 | 24.18 |
| 4 | SiO2 | 21.08 |
| 5 | TiO2 | 72.88 |
| 6 | SiO2 | 10.38 |
| 7 | TiO2 | 29 |
| 8 | SiO2 | 90.47 |
The specific operation is as follows:
firstly, wiping and cleaning two CR-39 lenses by using ethanol respectively, then simultaneously placing the lenses in vacuum coating equipment, strictly controlling deposition parameters according to the film layer setting requirements of the table 7, depositing a heat-insulating antireflection film system on one surface of each lens, placing the two lenses in the vacuum coating equipment in a turned-over mode after deposition is finished, strictly controlling the deposition parameters according to the film layer setting requirements of the table 2, depositing a conventional antireflection film system on the other surface of each lens, and obtaining the lens after deposition is finished.
Through determination, as shown in FIG. 9, the obtained lens has a high light transmittance (> 95%) at the visible light band of 400-700nm and an excellent heat insulation effect (the average transmittance at the near infrared band is less than or equal to 16%) at the near infrared band of 800-2500 nm. Therefore, the compact film can realize the heat insulation and permeability increasing effect with less films, and can be applied to plastic substrates such as lenses and the like and occasions with high requirements on the number of the films or the coating temperature and the like.
Claims (9)
1. A heat-insulating antireflection film characterized by comprising: sequentially arranging an all-dielectric antireflection film system 1, a composite near-infrared reflection film system and an all-dielectric antireflection film system 2; the composite near-infrared reflection film system is composed of a near-infrared reflection film and all-dielectric transition films wrapped on two sides of the near-infrared reflection film.
2. The heat-insulating antireflection film according to claim 1, wherein the all-dielectric antireflection film system 1 and the all-dielectric antireflection film system 2 are formed by alternately stacking high-refractive-index material layers and low-refractive-index material layers; further, the outermost layer of the all-dielectric antireflection film system 2 is a low-refractive-index material layer; further preferably, the high refractive index material is selected from any one or more of titanium dioxide, hafnium oxide, tantalum pentoxide, silicon nitride and zinc sulfide; further preferably, the low refractive index material is selected from any one or more of silicon dioxide, aluminum oxide and fluoride.
3. The heat-insulating antireflection film according to claim 2, wherein in the all-dielectric antireflection film layer 1 and the all-dielectric antireflection film layer 2, the thickness of the high-refractive-index material film layer is 6 to 180 nm; preferably, the thickness of the high-refractive-index material film layer is 8-120 nm.
4. The heat-insulating antireflection film according to claim 2, wherein in the all-dielectric antireflection film layer 1 and the all-dielectric antireflection film layer 2, the thickness of the low-refractive-index material film layer is 6 to 300 nm; preferably, the thickness of the low-refractive-index material film is 10-260 nm.
5. The heat-insulating antireflection film according to any one of claims 1 to 4, wherein the all-dielectric antireflection film layer 1 comprises 2 to 35 layers; preferably, the total-medium antireflection film layer 1 is 6-24 layers.
6. The heat-insulating antireflection film according to any one of claims 1 to 4, wherein the all-dielectric antireflection film layer 2 comprises 2 to 12 layers; preferably, the all-dielectric antireflection film layer 2 comprises 2-8 layers.
The heat-insulating antireflection film according to any one of claims 1 to 4, wherein in the composite near-infrared reflection film system, the all-dielectric transition film material includes but is not limited to Al2O3，SiO2，ZrO2Any one or more of them; furthermore, in the composite near-infrared reflection film system, the all-dielectric transition film is 0-6 layers; furthermore, in the composite near-infrared reflection film system, the thickness of the all-dielectric transition film layer is 6-300 nm.
7. The heat-insulating antireflection film according to any one of claims 1 to 4, wherein in the composite near-infrared reflection film system, the material of the near-infrared reflection film is a metal material; preferably, the metal material is an alloy composed of one or more of silver, aluminum, gold, copper, zinc, nickel and chromium; furthermore, in the composite near-infrared reflection film system, the thickness of the near-infrared reflection film is 5-35 nm.
8. A heat-insulating anti-reflection lens is characterized by comprising: a substrate lens and optical films arranged on two sides of the substrate lens, wherein at least one side of the optical film is the heat-insulating antireflection film of any one of claims 1 to 7, and an all-dielectric antireflection film 1 in the heat-insulating antireflection film is tightly attached to the substrate lens; further, the optical film on the other side is a conventional antireflection film or the heat-insulating antireflection film; further, the substrate lens is a glass lens, a resin lens or a plastic lens.
9. Use of the thermally insulating anti-reflective lens according to claim 8 for the production of spectacles, goggles, optical instruments or helmets with lenses.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115079315A (en) * | 2022-07-25 | 2022-09-20 | 无锡泓瑞航天科技有限公司 | Near-infrared spectral band optical measurement window suitable for low-temperature and high-temperature environments |
| EP4332641A1 (en) * | 2022-08-31 | 2024-03-06 | Samsung Electro-Mechanics Co., Ltd. | Lens and lens module including lens |
-
2020
- 2020-06-03 CN CN202010492544.XA patent/CN112114389A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115079315A (en) * | 2022-07-25 | 2022-09-20 | 无锡泓瑞航天科技有限公司 | Near-infrared spectral band optical measurement window suitable for low-temperature and high-temperature environments |
| CN115079315B (en) * | 2022-07-25 | 2024-03-15 | 无锡泓瑞航天科技有限公司 | Near infrared spectrum section optical measurement window suitable for low temperature and high temperature environment |
| EP4332641A1 (en) * | 2022-08-31 | 2024-03-06 | Samsung Electro-Mechanics Co., Ltd. | Lens and lens module including lens |
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