CN112030104A - TiN deposition film process method for solving cavitation of titanium alloy impeller - Google Patents

TiN deposition film process method for solving cavitation of titanium alloy impeller Download PDF

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Publication number
CN112030104A
CN112030104A CN202010726912.2A CN202010726912A CN112030104A CN 112030104 A CN112030104 A CN 112030104A CN 202010726912 A CN202010726912 A CN 202010726912A CN 112030104 A CN112030104 A CN 112030104A
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vacuum
titanium alloy
workpiece
equal
cleaning
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黄鑫
陈宝来
喻岚
唐华
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AECC Guizhou Honglin Aviation Power Control Technology Co Ltd
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AECC Guizhou Honglin Aviation Power Control Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/20—Other heavy metals
    • C23G1/205—Other heavy metals refractory metals

Abstract

The invention discloses a TiN deposition film process method for solving cavitation of a titanium alloy impeller. The method comprises the following steps: (1) inspecting before plating; (2) cleaning; (3) hanging parts; (4) vacuumizing; (5) heating; (6) glow cleaning; (7) sputtering and cleaning; (8) deposition of a transition layer; (9) preparing a TiN film layer; (10) cooling; (11) and (6) checking. The invention has the advantages of improving the surface performance of the TC6 titanium alloy impeller, improving the surface anti-cavitation capability of the titanium alloy impeller, mainly depositing a TiN film layer, improving the hardness, the wear resistance and the like of the surface of the titanium alloy impeller, further preventing the generation of cavitation, solving the problem of the cavitation of the surface of the TC6 titanium alloy impeller, further improving the service life of the titanium alloy impeller, and smoothly applying the titanium alloy impeller to military product parts such as aerospace, aviation, navy and the like.

Description

TiN deposition film process method for solving cavitation of titanium alloy impeller
Technical Field
The invention relates to the technical field of metal surface treatment protection engineering, in particular to a TiN deposition film process method for solving cavitation of a titanium alloy impeller.
Background
The TC6 titanium alloy is widely used for an impeller of a centrifugal pump because of its high specific strength and good corrosion resistance, and since the pressure of a liquid decreases from a pump inlet to an impeller inlet when the impeller is operated in the centrifugal pump, cavitation is easily generated when the absolute pressure of the liquid is reduced to be equal to or lower than the saturated vapor pressure of the liquid. Cavitation not only reduces the performance of the pump, reduces the flow rate and increases the energy consumption, but also degrades and destroys the flow passage components, shortens the service life of the pump and even causes serious accidents. In addition, the maintenance of the impeller, the pump chamber and other parts which are required to be replaced frequently after the cavitation destruction consumes a great deal of manpower, material resources and financial resources. Corresponding measures to solve cavitation should therefore be found to maintain proper operation of the pump. Part of titanium alloy impellers are coated with chemical coatings (such as epoxy resin, polyurethane and other high polymer) on the surfaces to improve the cavitation resistance of the impellers, but the bonding firmness of the coatings and the matrix is not ensured; part of the titanium alloy impeller adopts surface chemical heat treatment to strengthen the surface, but the anti-cavitation effect is not obvious; the surface quality of part of titanium alloy impellers is improved by spray welding or spraying alloy powder with special properties on the surfaces of the impellers, but the surface hardness of the titanium alloy impellers can only reach HRC 60-70 (HV 700-1000).
Disclosure of Invention
The invention aims to provide a TiN deposition film process method for solving the problem of titanium alloy impeller cavitation. The invention has the characteristics of improving the surface performance of the TC6 titanium alloy impeller, improving the surface anti-cavitation capability of the titanium alloy impeller, mainly depositing a TiN film layer, improving the hardness, the abrasion resistance and the like of the surface of the titanium alloy impeller, further preventing the generation of cavitation, solving the problem of the cavitation of the surface of the TC6 titanium alloy impeller, further improving the service life of the titanium alloy impeller, and enabling the titanium alloy impeller to be successfully applied to military product parts such as aerospace, aviation, navy and the like.
The technical scheme of the invention is as follows: a TiN deposition film process method for solving cavitation of a titanium alloy impeller comprises the following steps:
(1) inspecting before plating;
(2) cleaning;
2.1 ultrasonic cleaning is carried out for more than or equal to 10 minutes;
2.2 chemical cleaning
Figure BDA0002602104850000021
2.3 ultrasonic cleaning with alcohol for more than or equal to 10 minutes;
2.4 ultrasonic cleaning with acetone for more than or equal to 10 minutes;
2.5 air-drying the workpiece and the accompanying part for later use;
2.6, loading and unloading the cleaned workpiece and the accompanying part, and checking whether stains exist on the surface, and wiping the stains by using acetone;
2.7 cleaning the vacuum chamber;
(3) hanging:
3.1 fixing the impeller and the sample on a clamp by adopting a tool and a stainless steel wire;
3.2 after the impeller and the sample are loaded into the furnace, checking the bias voltage and the rotation of the workpiece frame, wherein the rotation is not abnormal;
(4) vacuumizing:
after the workpiece is installed, closing the vacuum chamber and vacuumizing;
(5) heating:
the vacuum is more than or equal to 8 multiplied by 10-3After Pa, heating: heating the vacuum chamber, setting the temperature to be 200-300 ℃, starting the workpiece frame to rotate and revolve after the preset temperature is reached, continuously pumping high vacuum, and keeping the temperature for 0.5-1.5 hours to balance the temperature in the vacuum chamber;
(6) glow cleaning:
vacuum is more than or equal to 6 multiplied by 10-3When Pa, filling Ar gas in the vacuum chamber, wherein the specific technological parameters are as follows: the vacuum is more than or equal to 2Pa, the baffle is 15-25 degrees, the temperature is more than or equal to 250 ℃, the pulse voltage is 900-1100V, the duration is more than or equal to 15min, and the air supply quantity of Ar gas is 250-350 ml.min-1The duty ratio is 70-90%;
(7) sputtering and cleaning:
reducing Ar gas supply amount, bombarding the surface of a workpiece by using Ti ions, and having the following specific technological parameters: the vacuum is 5 to 6 x 10- 1Pa, baffle plate of 25-35 degree, temperature not less than 250 degree, pulse voltage of 800-1000V, DC voltage of 160-200V, arc source90-110A, the duration is more than or equal to 10min, and the air supply quantity of Ar gas is 80-120 ml/min-1The duty ratio is 70-90%;
(8) deposition of a transition layer:
keeping the vacuum unchanged, and preparing the Ti transition coating, wherein the specific process parameters are as follows: the vacuum is 5-6 multiplied by 10-1Pa, a baffle plate at 25-35 deg.C, a temperature of 250 deg.C, a pulse voltage of 500-700V, a DC voltage of 100-140V, an arc source at 90-110A, a duration of 10min or more, and an air supply of 80-120 ml-min-1The duty ratio is 20-40%;
(9) preparing a TiN film layer:
closing Ar gas, introducing N into the vacuum chamber2And gas, preparing the TiN coating, wherein the specific technological parameters are as follows: vacuum of 0.5-1.5 Pa, baffle of 15-25 deg.C, temperature of 250 deg.C or higher, pulse voltage of 500-700V, DC voltage of 60-100V, arc source of 90-110A, duration of 10min or longer, and N2The air delivery rate of the air is 380-420 ml/min-1The duty ratio is 10-20%;
(10) and (3) cooling:
sequentially turning an arc source, a bias power supply, a heating power supply, a workpiece support power supply, closing an air supply valve, continuously pumping high vacuum until the temperature of the workpiece is lower than 100 ℃, stopping a vacuum pumping system, then releasing air, opening a vacuum chamber door, taking the workpiece, and delivering for inspection;
(11) and (4) checking:
11.1 appearance and surface microtopography;
11.2 the Vickers microhardness of the plating layer;
11.3 testing the thickness of the film layer;
11.4 film layer binding force;
11.5 Friction Performance test.
In the TiN deposition film process method for solving the problem of the cavitation erosion of the titanium alloy impeller, in the step (1), the inspection before plating is as follows: 1.1, checking the surfaces of the workpiece and the accompanying part before plating, wherein the surfaces of the workpiece and the accompanying part are free of rust; 1.2 visual inspection under white projection light without reflected light, and the surfaces of the workpiece and the accompanying part are not scratched, bruised or otherwise mechanically damaged; the workpiece TC6 titanium alloy impeller and the accompanying part are made of TC6 titanium alloy materials.
In the step 2.1, the ultrasonic cleaning is carried out for more than or equal to 10 minutes by using an Exxon Mobil ISOPARL solvent type cleaning agent.
In the aforementioned TiN deposition film process method for solving the problem of titanium alloy impeller cavitation, in step 2.6, the cleaned workpiece and the accompanying part need to be assembled and disassembled by wearing clean gloves or disposable plastic gloves, and whether stains exist on the surface is checked, and if stains exist, the surface is wiped clean by adopting acetone.
In the aforementioned TiN deposition film process method for solving the problem of titanium alloy impeller cavitation, in step 2.7, the vacuum chamber is cleaned: cleaning a heat shield, a workpiece rack and an arc target in a vacuum chamber before processing each batch of workpieces, firstly detaching the workpieces for sand blowing, and then cleaning the vacuum chamber by a vacuum cleaner through a loader; and the cleaning of the arc target adopts the target shooting treatment.
In the aforementioned TiN deposited film process method for solving the cavitation problem of the titanium alloy impeller, in the step (5), heating: the vacuum is more than or equal to 8 multiplied by 10-3After Pa, heating: and (3) heating the vacuum chamber by adopting a stainless steel heating pipe, setting the temperature to be 250 ℃, starting the workpiece holder to rotate and revolve after the preset temperature is reached, continuously pumping high vacuum, and preserving the heat for 1 hour to ensure that the temperature in the vacuum chamber is balanced.
In the aforementioned TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller, in the step (6), the glow cleaning: vacuum is more than or equal to 6 multiplied by 10-3When Pa, filling Ar gas in the vacuum chamber, wherein the specific technological parameters are as follows: the vacuum is more than or equal to 2Pa, the baffle is 20 degrees, the temperature is more than or equal to 250 ℃, the pulse voltage is 1000V, the duration time is more than or equal to 15min, and the air supply quantity of Ar gas is 300 ml.min-1The duty ratio is 80%.
In the TiN deposition film process method for solving the problem of the cavitation erosion of the titanium alloy impeller, in the step (7), the Ar gas supply amount is reduced, Ti ions are utilized to bombard the surface of the workpiece, and the specific process parameters are as follows: the vacuum is 5 to 6 x 10-1Pa, baffle 30 degree, temperature not less than 250 deg.C, pulse voltage 900V, DC voltage 180V, arc source 100A, duration not less than 10min, and Ar gas delivery 100 ml/min-1And the duty ratio is 80%.
Foregoing description of the inventionIn the TiN deposition film process method for solving the problem of the cavitation of the titanium alloy impeller, in the step (8), the deposition of the transition layer is as follows: keeping the vacuum unchanged, and preparing the Ti transition coating, wherein the specific process parameters are as follows: the vacuum is 5 to 6 x 10-1Pa, baffle 30 degree, temperature not less than 250 deg.C, pulse voltage 600V, DC voltage 120V, arc source 100A, duration not less than 10min, and Ar gas delivery amount 100 ml/min-1And a duty ratio of 30%.
In the aforementioned TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller, in the step (9), the TiN film layer is prepared: closing Ar gas, introducing N into the vacuum chamber2And gas, preparing the TiN coating, wherein the specific technological parameters are as follows: vacuum of 1Pa, baffle of 20 deg.C, temperature of 250 deg.C or higher, pulse voltage of 600V, DC voltage of 60-100V, arc source of 100A, duration of 10min or more, and N2The gas delivery rate is 400 ml/min-1And a duty ratio of 15%.
In the aforementioned TiN deposited film process method for solving the cavitation problem of the titanium alloy impeller, in the step (11), the following tests are carried out:
11.1 appearance and surface microtopography;
the appearance inspection of the workpiece is carried out under the condition of natural scattered light or white projected light without reflected light, and the illumination intensity of the light is more than or equal to 300Lx, which is equivalent to the illumination intensity of the workpiece placed at 500mm of a 40W fluorescent lamp; observing the surface microscopic appearance, amplifying under a microscope, and observing the surface microscopic appearance of the companion element;
11.2 the Vickers microhardness of the plating layer;
measuring the Vickers microhardness of the surface of the coating surface of the accompanying part carried by each furnace according to the requirements of GB/T4340-1999;
11.3 testing the thickness of the film layer;
testing the thickness of the film layer of the companion element according to the requirements of GB/T6463-;
11.4 film layer binding force;
measuring the binding force of the film layer of the companion element by adopting an Antopa RST scratch instrument;
11.5 testing the friction performance;
and (3) carrying out accompanying part film layer friction performance test by adopting a CSM ball disc friction tester.
Compared with the prior art, the invention has the following beneficial effects:
1. the deposition film process is based on solving the problem of cavitation erosion on the surface of the TC6 titanium alloy impeller, and a TiN (titanium nitride) strengthening layer with high density, high bonding force, high hardness and good wear resistance is plated on the surface of the impeller through vacuum multi-arc plating equipment, so that the surface performance of the impeller is improved, and the erosion of bubbles on the surface when the bubbles are brought to a high-pressure zone by liquid flow during the operation of the impeller is reduced. And further, the service life of the titanium alloy impeller is prolonged, so that the titanium alloy impeller can be successfully used for military product parts such as aerospace, aviation, navy and the like.
2. The key point of the invention is that the surface performance of the TC6 titanium alloy impeller is improved through the physical vapor deposition technology, so that the surface anti-cavitation capability of the impeller is improved, a TiN film layer is mainly deposited, the hardness, the wear resistance and the like of the surface of the titanium alloy impeller are improved, and further the generation of cavitation is prevented.
3. Before the titanium nitride strengthening layer is not plated, the titanium alloy impeller generates cavitation after the high-flow tester uses 600H, after the titanium nitride strengthening layer is plated, the titanium alloy impeller does not generate cavitation after the high-flow tester uses 800H, and the titanium alloy impeller does not generate cavitation after the high-flow tester continuously uses 1000H.
The experimental results are as follows:
in step (11) of the present application example, 11.1 appearance and surface microtopography; and (3) checking the appearance quality of the surface of the workpiece after coating, wherein the surface has no bubbling, the demoulding phenomenon and the coating is continuous and uniform. The result of the microscopic morphology was that the TiN film layer thickness was 3.1 um.
The detailed examination is shown in Table 1 for TiN coating properties:
TABLE 1TiN coating Properties
Figure BDA0002602104850000071
The applicant carried out the following experiments on the coated impellers of the examples of the invention:
1. measurement of roughness, dimension and unbalance of impeller before and after plating
And (3) testing the surface roughness of the impeller coating, wherein the surface roughness of the impeller is less than 0.8, and the requirement of part roughness is met. And the impeller surfaces of the two plating layers are smooth and have no burrs or scratches. The required dimensions of the impeller coated with TiN coating meet the requirements of design drawings. According to the requirement of the impeller dynamic balance test, the result of the impeller dynamic balance test is checked to be not more than 0.5g cm. The test results are shown in table 2 for dynamic balance of parts before and after plating: the dynamic balance test result after coating TiN coating meets the requirement. The results of the dynamic balance test were not satisfactory when the R was 45mm before TiN coating, and were satisfactory after TiN coating.
TABLE 2 dynamic balance test of parts before and after plating
Figure BDA0002602104850000072
2. High flow rate test
The TiN film layer deposited by physical vapor deposition has high density, high binding force, high hardness and good wear resistance, and is suitable for the surface strengthening of the titanium alloy impeller which is easy to generate cavitation on the surface. Experiments prove that: the TC6 impeller which is easy to generate cavitation is selected, and the surface quality of the impeller is obviously improved after the TiN film layer is deposited by physical vapor deposition. Before the surface strengthening layer is not plated, the titanium alloy impeller generates cavitation after the high-flow tester uses 600H, does not generate cavitation after the surface strengthening layer is plated and the high-flow tester uses 800H, and does not generate cavitation after the high-flow tester uses 1000H. The impeller surface in the prior art does not adopt a coating, the dynamic balance value is shown in the data before coating in the table 2, and the cavitation is generated after the large flow test data is 600H.
In conclusion, the invention has the beneficial effects of improving the surface performance of the TC6 titanium alloy impeller, improving the surface anti-cavitation capability of the impeller, mainly depositing a TiN film layer, improving the hardness, the wear resistance and the like of the surface of the titanium alloy impeller, further preventing the generation of cavitation, solving the problem of cavitation on the surface of the TC6 titanium alloy impeller, further improving the service life of the titanium alloy impeller and successfully applying the titanium alloy impeller to military product parts such as aerospace, aviation, navy and the like.
Detailed Description
The present invention is further illustrated by the following examples, which are not to be construed as limiting the invention.
Examples are given. A TiN deposition film process method for solving cavitation of a titanium alloy impeller comprises the following steps:
(1) inspecting before plating;
1.1, checking the surfaces of the workpiece and the accompanying part before plating, wherein the surfaces of the workpiece and the accompanying part are free of rust;
1.2 visual inspection under white projection light without reflected light, and the surfaces of the workpiece and the accompanying part are not scratched, bruised or otherwise mechanically damaged; the workpiece TC6 titanium alloy impeller and the accompanying part are made of TC6 titanium alloy materials;
(2) cleaning;
2.1 ultrasonic cleaning with an Exxonmobil ISOPARL solvent type cleaning agent for more than or equal to 10 minutes;
2.2 chemical cleaning
Figure BDA0002602104850000081
2.3 ultrasonic cleaning with alcohol for more than or equal to 10 minutes;
2.4 ultrasonic cleaning with acetone for more than or equal to 10 minutes;
2.5 air-drying the workpiece and the accompanying part for later use;
2.6 the cleaned workpiece and the accompanying part need to be worn with clean gloves or disposable plastic gloves for loading and unloading, and whether stains exist on the surface is checked, and if the stains exist, the surface is wiped clean by acetone;
2.7 cleaning the vacuum chamber:
cleaning a heat shield, a workpiece rack and an arc target in a vacuum chamber before processing each batch of workpieces, firstly detaching the workpieces for sand blowing, and then cleaning the vacuum chamber by a vacuum cleaner through a loader; the cleaning of the arc target adopts target shooting treatment;
(3) hanging:
3.1 fixing the impeller and the sample on a clamp by adopting a tool and a stainless steel wire;
3.2 after the impeller and the sample are loaded into the furnace, checking the bias voltage and the rotation of the workpiece frame, wherein the rotation is not abnormal;
(4) vacuumizing:
after the workpiece is installed, closing the vacuum chamber and vacuumizing;
(5) heating:
the vacuum is more than or equal to 8 multiplied by 10-3After Pa, heating: heating the vacuum chamber by a stainless steel heating pipe, setting the temperature to be 250 ℃, starting the workpiece frame to rotate and revolve after the preset temperature is reached, continuously pumping high vacuum, and preserving the heat for 1 hour to ensure that the temperature in the vacuum chamber is balanced;
(6) glow cleaning:
vacuum is more than or equal to 6 multiplied by 10-3When Pa, the vacuum chamber is filled with Ar gas, and the specific process parameters are shown in Table 3:
TABLE 3 Process parameters for glow cleaning
Figure BDA0002602104850000091
(7) Sputtering and cleaning:
reducing Ar gas supply amount, bombarding the surface of a workpiece by using Ti ions, wherein the specific process parameters are shown in a table 4:
TABLE 4 Process parameters for sputter cleaning
Figure BDA0002602104850000101
(8) Deposition of a transition layer:
keeping the vacuum unchanged, preparing the Ti transition coating, wherein the specific process parameters are shown in Table 5:
TABLE 5 Process parameters for the deposition of transition layers
Figure BDA0002602104850000102
(9) Preparing a TiN film layer:
closing Ar gas, introducing N into the vacuum chamber2Gas, prepare TiN coating, the specific process parameters are shown in table 6:
TABLE 6 Process parameters for TiN film layer preparation
Figure BDA0002602104850000103
Figure BDA0002602104850000111
(10) And (3) cooling:
sequentially turning an arc source, a bias power supply, a heating power supply, a workpiece support power supply, closing an air supply valve, continuously pumping high vacuum until the temperature of the workpiece is lower than 100 ℃, stopping a vacuum pumping system, then releasing air, opening a vacuum chamber door, taking the workpiece, and delivering for inspection;
(11) and (4) checking:
11.1 appearance and surface microtopography;
the appearance inspection of the workpiece is carried out under the condition of natural scattered light or white projected light without reflected light, and the illumination intensity of the light is more than or equal to 300Lx, which is equivalent to the illumination intensity of the workpiece placed at 500mm of a 40W fluorescent lamp; observing the surface microscopic appearance, amplifying under a microscope, and observing the surface microscopic appearance of the companion element;
11.2 the Vickers microhardness of the plating layer;
measuring the Vickers microhardness of the surface of the coating surface of the accompanying part carried by each furnace according to the requirements of GB/T4340-1999;
11.3 testing the thickness of the film layer;
testing the thickness of the film layer of the companion element according to the requirements of GB/T6463-;
11.4 film layer binding force;
measuring the binding force of the film layer of the companion element by adopting an Antopa RST scratch instrument;
11.5 testing the friction performance;
and (3) carrying out accompanying part film layer friction performance test by adopting a CSM ball disc friction tester.

Claims (10)

1. A TiN deposition film process method for solving cavitation of a titanium alloy impeller is characterized by comprising the following steps: the method comprises the following steps:
(1) inspecting before plating;
(2) cleaning;
2.1 ultrasonic cleaning is carried out for more than or equal to 10 minutes;
2.2 chemical cleaning
Figure FDA0002602104840000011
2.3 ultrasonic cleaning with alcohol for more than or equal to 10 minutes;
2.4 ultrasonic cleaning with acetone for more than or equal to 10 minutes;
2.5 air-drying the workpiece and the accompanying part for later use;
2.6, loading and unloading the cleaned workpiece and the accompanying part, and checking whether stains exist on the surface, and wiping the stains by using acetone;
2.7 cleaning the vacuum chamber;
(3) hanging:
3.1 fixing the impeller and the sample on a clamp by adopting a tool and a stainless steel wire;
3.2 after the impeller and the sample are loaded into the furnace, checking the bias voltage and the rotation of the workpiece frame, wherein the rotation is not abnormal;
(4) vacuumizing:
after the workpiece is installed, closing the vacuum chamber and vacuumizing;
(5) heating:
the vacuum is more than or equal to 8 multiplied by 10-3After Pa, heating: heating the vacuum chamber, setting the temperature to be 200-300 ℃, starting the workpiece frame to rotate and revolve after the preset temperature is reached, continuously pumping high vacuum, and keeping the temperature for 0.5-1.5 hours to balance the temperature in the vacuum chamber;
(6) glow cleaning:
vacuum is more than or equal to 6 multiplied by 10-3When Pa, filling Ar gas in the vacuum chamber, wherein the specific technological parameters are as follows: the vacuum is more than or equal to 2Pa, the baffle is 15-25 degrees, the temperature is more than or equal to 250 ℃, the pulse voltage is 900-1100V, the duration is more than or equal to 15min, and the air supply quantity of Ar gas is 250-350 ml.min-1The duty ratio is 70-90%;
(7) sputtering and cleaning:
reducing Ar gas supply amount, bombarding the surface of a workpiece by using Ti ions, and having the following specific technological parameters: the vacuum is 5 to 6 x 10-1Pa, baffle 2535 DEG, the temperature is more than or equal to 250 ℃, the pulse voltage is 800-1000V, the direct current voltage is 160-200V, the arc source is 90-110A, the duration is more than or equal to 10min, and the air delivery quantity of Ar gas is 80-120 ml/min-1The duty ratio is 70-90%;
(8) deposition of a transition layer:
keeping the vacuum unchanged, and preparing the Ti transition coating, wherein the specific process parameters are as follows: the vacuum is 5 to 6 x 10-1Pa, a baffle plate at 25-35 deg.C, a temperature of 250 deg.C, a pulse voltage of 500-700V, a DC voltage of 100-140V, an arc source at 90-110A, a duration of 10min or more, and an air supply of 80-120 ml-min-1The duty ratio is 20-40%;
(9) preparing a TiN film layer:
closing Ar gas, introducing N into the vacuum chamber2And gas, preparing the TiN coating, wherein the specific technological parameters are as follows: vacuum of 0.5-1.5 Pa, baffle of 15-25 degrees, temperature of 250 deg.C or higher, pulse voltage of 500-700V, DC voltage of 60-100V, arc source of 90-110A, duration of 10min or longer, and N2The air delivery rate of the air is 380-420 ml/min-1The duty ratio is 10-20%;
(10) and (3) cooling:
sequentially turning an arc source, a bias power supply, a heating power supply, a workpiece support rotating power supply, closing an air supply valve, continuously pumping high vacuum until the temperature of the workpiece is lower than 100 ℃, stopping a vacuum pumping system, then deflating a vacuum chamber door, taking the workpiece, and delivering for inspection;
(11) and (4) checking:
11.1 appearance and surface microtopography;
11.2 the Vickers microhardness of the plating layer;
11.3 testing the thickness of the film layer;
11.4 film layer binding force;
11.5 Friction Performance test.
2. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (1), the pre-plating inspection: 1.1, checking the surfaces of the workpiece and the accompanying part before plating, wherein the surfaces of the workpiece and the accompanying part are free of rust; 1.2 visual inspection under white projection light without reflected light, and the surfaces of the workpiece and the accompanying part are not scratched, bruised or otherwise mechanically damaged; the workpiece TC6 titanium alloy impeller and the accompanying part are made of TC6 titanium alloy materials;
in the step 2.1, the ultrasonic cleaning is carried out for more than or equal to 10 minutes by using an Exxonmol ISOPARL solvent type cleaning agent.
3. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step 2.6, the cleaned workpiece and the accompanying part need to wear clean gloves or disposable plastic gloves for loading and unloading, whether stains exist on the surface is checked, and if the stains exist, the surface is wiped clean by using acetone.
4. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in step 2.7, cleaning the vacuum chamber: cleaning a heat shield, a workpiece rack and an arc target in a vacuum chamber before processing each batch of workpieces, firstly detaching the workpieces for sand blowing, and then cleaning the vacuum chamber by a vacuum cleaner through a loader; and the cleaning of the arc target adopts the target shooting treatment.
5. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (5), heating: the vacuum is more than or equal to 8 multiplied by 10-3After Pa, heating: and heating the vacuum chamber by using a stainless steel heating pipe, setting the temperature to be 250 ℃, starting the workpiece frame to rotate and revolve after the preset temperature is reached, continuously pumping high vacuum, and preserving the heat for 1 hour to ensure that the temperature in the vacuum chamber is balanced.
6. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (6), glow cleaning: vacuum is more than or equal to 6 multiplied by 10-3When Pa, filling Ar gas in the vacuum chamber, wherein the specific technological parameters are as follows: the vacuum is more than or equal to 2Pa, the baffle is 20 degrees, the temperature is more than or equal to 250 ℃, the pulse voltage is 1000V, the duration is more than or equal to 15min, and the air delivery quantity of Ar gas is 300 ml.min-1And the duty ratio is 80%.
7. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (7), the Ar gas supply amount is reduced, Ti ions are used for bombarding the surface of the workpiece, and the specific technological parameters are as follows: the vacuum is 5 to 6 x 10-1Pa, baffle plate at 30 deg.C, temperature not lower than 250 deg.C, pulse voltage of 900V, DC voltage of 180V, arc source of 100A, duration not lower than 10min, and air supply amount of Ar gas of 100 ml/min-1And the duty ratio is 80%.
8. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (8), depositing a transition layer: keeping the vacuum unchanged, and preparing the Ti transition coating, wherein the specific process parameters are as follows: the vacuum is 5 to 6 x 10-1Pa, baffle 30 degree, temperature not less than 250 deg.C, pulse voltage 600V, DC voltage 120V, arc source 100A, duration not less than 10min, and Ar gas delivery amount 100 ml/min-1And a duty ratio of 30%.
9. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (9), preparing a TiN film layer: closing Ar gas, introducing N into the vacuum chamber2And gas, preparing the TiN coating, wherein the specific technological parameters are as follows: vacuum of 1Pa, baffle of 20 deg.C, temperature of 250 deg.C or higher, pulse voltage of 600V, DC voltage of 60-100V, arc source of 100A, duration of 10min or more, and N2The gas delivery rate is 400 ml/min-1And a duty ratio of 15%.
10. The TiN deposition film process method for solving the cavitation problem of the titanium alloy impeller according to the claim 1, which is characterized in that: in the step (11), checking:
11.1 appearance and surface microtopography;
the appearance inspection of the workpiece is carried out by visual inspection under natural scattered light or white projected light without reflected light, and the illumination of the light is more than or equal to 300Lx, which is equivalent to the illumination of the workpiece placed at 500mm position of a 40W fluorescent lamp; observing the surface microscopic appearance, amplifying under a microscope, and observing the surface microscopic appearance of the companion;
11.2 the Vickers microhardness of the plating layer;
measuring the Vickers microhardness of the surface of the coating surface of the accompanying part carried by each furnace according to the requirements of GB/T4340-1999;
11.3 testing the thickness of the film layer;
testing the thickness of the film layer of the companion element according to the requirements of GB/T6463-;
11.4 film layer binding force;
measuring the binding force of the film layer of the companion element by adopting an Antopa RST scratch instrument;
11.5 testing the friction performance;
and (3) carrying out accompanying part film layer friction performance test by adopting a CSM ball disc friction tester.
CN202010726912.2A 2020-07-26 2020-07-26 TiN deposition film process method for solving cavitation of titanium alloy impeller Pending CN112030104A (en)

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