CN112011828B - PLC glow control method and device for diamond growth - Google Patents
PLC glow control method and device for diamond growth Download PDFInfo
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- CN112011828B CN112011828B CN202010774602.8A CN202010774602A CN112011828B CN 112011828 B CN112011828 B CN 112011828B CN 202010774602 A CN202010774602 A CN 202010774602A CN 112011828 B CN112011828 B CN 112011828B
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/16—Controlling or regulating
Abstract
The invention relates to a PLC glow control method and a device for diamond growth, wherein the method comprises the following steps: acquiring initial glow power and a formula table; controlling a radio frequency power supply to start glow discharge, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure and first real-time pressure in a growth preparation stage in a formula table; controlling the radio frequency power supply to continue glow discharge to keep the target glow power unchanged, and simultaneously controlling the target pressure to keep unchanged; and controlling the radio frequency power supply to gradually reduce the glow discharge power, and controlling the radio frequency power supply according to the comparison result of the standard vacuum pressure and the second real-time pressure at the growth finishing stage in the formula table. The control method organically combines vacuum pressure control and radio frequency power supply glow discharge control, and provides good conditions for diamond growth.
Description
Technical Field
The invention belongs to the technical field of automatic control, and particularly relates to a PLC glow control method and device for diamond growth.
Background
Diamond, as a wide band gap semiconductor material, has many unusual properties, such as a large forbidden band width, a low dielectric constant, a high breakdown voltage, a high electron-hole mobility, a high thermal conductivity, and an excellent radiation resistance, and is chemically stable. All of these physical, chemical and electrical properties have led to the wide application of diamond in many areas of industry and civilian use.
The existing methods for artificially synthesizing diamond include high temperature high pressure process (HTHP), direct current arc plasma spraying process (DCAPJ), hot filament chemical vapor deposition process (HFCVD), microwave plasma chemical vapor deposition process (MPCVD), etc. Among them, MPCVD is the preferred method for preparing high quality diamond because of the good controllability of microwave-excited plasma, high plasma density and no electrode contamination.
In the process of diamond growth, the quality of the diamond growth result is not only influenced by the vacuum environment, but also influenced by the glow discharge power of the radio frequency power supply. However, in the existing diamond growth process, the control of vacuum pressure and the control of radio frequency power supply glow discharge are operated independently, and operators are required to perform manual overall operation according to experience, so that the vacuum pressure and the radio frequency power supply glow discharge cannot achieve real organic unification, and good conditions cannot be provided for diamond growth.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides a PLC glow control method and a PLC glow control device for diamond growth. The technical problem to be solved by the invention is realized by the following technical scheme:
the embodiment of the invention provides a PLC glow control method for diamond growth, which comprises the following steps:
obtaining initial glow power and a formula table of the glow power and vacuum pressure;
controlling a radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in a vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure in a growth preparation stage in a formula table and the first real-time pressure until the first real-time glow power reaches target glow power from the initial glow power and the first real-time pressure reaches target pressure from the initial pressure;
controlling the radio frequency power supply to continue glow discharge, keeping the target glow power unchanged, and simultaneously controlling the target pressure to keep unchanged;
and controlling the radio frequency power supply to gradually reduce glow discharge power, acquiring second real-time glow power and second real-time pressure in a vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure at a growth finishing stage in the formula table and the second real-time pressure until the second real-time glow power is reduced from the target glow power to the initial glow power and the second real-time pressure is reduced from the target pressure to the initial pressure.
In one embodiment of the present invention, the controlling the rf power according to the comparison result between the standard vacuum pressure of the growth preparation stage in the recipe table and the first real-time pressure comprises:
comparing the first real-time pressure to a standard vacuum pressure of the growth preparation stage;
when the first real-time pressure is equal to the standard vacuum pressure of the growth preparation stage, searching the standard glow power of the growth preparation stage corresponding to the standard vacuum pressure of the growth preparation stage in the formula table;
and controlling the radio frequency power supply according to the standard glow power of the growth preparation stage so as to enable the first real-time glow power to be equal to the standard glow power of the growth preparation stage in the formula table.
In one embodiment of the present invention, the controlling the rf power according to the comparison result between the standard vacuum pressure at the growth end stage in the recipe table and the second real-time pressure comprises:
comparing the second real-time pressure to a standard vacuum pressure of the end-of-growth stage;
when the second real-time pressure is equal to the standard vacuum pressure of the growth ending stage, searching the standard glow power of the growth ending stage corresponding to the standard vacuum pressure of the growth ending stage in the formula table;
and controlling the radio frequency power supply according to the standard glow power of the growth ending stage so as to enable the second real-time glow power to be equal to the standard glow power of the growth ending stage in the formula table.
In one embodiment of the invention, the initial glow power is 0.6Kw, the initial pressure is 10-40 mbar, the target glow power is 4-6 Kw, and the target pressure is 300-500 mbar.
In one embodiment of the invention, during the growth preparation phase, a first trend of change of the first real-time glow power is the same as a second trend of change of the first real-time pressure;
and in the growth ending stage, the third variation trend of the second real-time glow power is the same as the fourth variation trend of the second real-time pressure.
In one embodiment of the present invention, further comprising:
acquiring real-time reflected power when the radio frequency power supply performs glow discharge;
and controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper limit of the reflected power.
In an embodiment of the present invention, controlling the operation of the rf power supply according to a comparison result between the real-time reflected power and a pre-obtained upper limit of reflected power includes:
comparing the real-time reflected power to the upper reflected power limit;
when the upper limit of the reflected power is smaller than or equal to the real-time reflected power, controlling the radio frequency power supply to stop glow discharge;
and when the upper limit of the reflected power is larger than the real-time reflected power, controlling the radio frequency power supply to continue glow discharge.
Another embodiment of the present invention provides a PLC glow control apparatus for diamond growth, comprising:
the parameter acquisition module is used for acquiring initial glow power and a formula table of the glow power and vacuum pressure;
the glow discharge starting module is used for controlling the radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure in a growth preparation stage in the formula table and the first real-time pressure until the initial glow power reaches target glow power and the initial pressure in the vacuum cavity reaches target pressure;
the glow discharge maintaining module is used for controlling the radio frequency power supply to continue glow discharge, so that the target glow power is kept unchanged, and meanwhile, the target pressure is kept unchanged;
and the glow discharge closing module is used for controlling the radio frequency power supply to gradually reduce glow discharge power, acquiring second real-time glow power and second real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure at a growth finishing stage in the formula table and the second real-time pressure until the target glow power is reduced to the initial glow power and the target pressure is reduced to the initial pressure.
In one embodiment of the invention, the apparatus further comprises:
the reflected power acquisition module is used for acquiring real-time reflected power when the radio frequency power supply performs glow discharge;
and the radio frequency power supply control module is used for controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper limit of the reflected power.
In one embodiment of the present invention, the rf power control module includes:
a comparison module for comparing the real-time reflected power with the upper reflected power limit;
the radio frequency power supply stopping module is used for controlling the radio frequency power supply to stop glow discharge when the upper limit of the reflected power is less than or equal to the real-time reflected power;
and the radio frequency power supply operation module is used for controlling the radio frequency power supply to continue glow discharge when the upper limit of the reflected power is greater than the real-time reflected power.
Compared with the prior art, the invention has the beneficial effects that:
the control method is carried out on the basis of PLC, the radio frequency power supply is controlled according to the standard vacuum pressure of the formula table in the growth preparation stage and the growth finishing stage, so that the real-time glow power is changed along with the change of the vacuum pressure according to the relation in the formula table all the time, the automatic control of the vacuum pressure and the glow discharge of the radio frequency power supply is realized, the organic combination of the vacuum pressure control and the glow discharge control of the radio frequency power supply is realized, the organic unification of the vacuum pressure control and the glow discharge control of the radio frequency power supply is realized, and good conditions are provided for the growth of diamond.
Drawings
Fig. 1 is a schematic flow chart of a PLC glow control method for diamond growth according to an embodiment of the present invention;
FIG. 2 is a graph showing the variation trend of the glow power and the vacuum pressure in the preparation stage of growth according to the embodiment of the present invention;
FIG. 3 is a graph showing the variation trend of the glow power and the vacuum pressure in the end stage of growth according to an embodiment of the present invention;
FIG. 4 is a schematic flow chart of another PLC glow control method for diamond growth according to an embodiment of the present invention;
fig. 5 is a schematic structural diagram of a PLC glow control device for diamond growth according to an embodiment of the present invention;
FIG. 6 is a schematic structural diagram of another PLC glow control device for diamond growth according to an embodiment of the present invention;
fig. 7 is a schematic structural diagram of a radio frequency power supply control module according to an embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to specific examples, but the embodiments of the present invention are not limited thereto.
Example one
During the diamond growth process, the control of glow discharge is required, which is the basic condition for ensuring the normal growth of the crystal. The present embodiment divides the glow control into three phases according to the diamond process requirements: the growth preparation phase, the growth maintenance phase and the growth end phase, and the PLC glow control method is explained in connection with each phase.
Referring to fig. 1, fig. 1 is a schematic flow chart of a PLC glow control method for diamond growth according to an embodiment of the present invention. The PLC glow control method comprises the following steps:
and S1, acquiring the initial glow power and a formula table of the glow power and the vacuum pressure.
Specifically, an operator sets the glow parameters on an upper computer, and specifically comprises setting an initial glow power and a formula table of the glow power and the vacuum pressure in the diamond growth process, wherein the PLC acquires the initial glow power and the formula table, and the formula table comprises the standard vacuum pressure and the standard glow power of each stage in a growth preparation stage, a growth maintenance stage and a growth finishing stage. Meanwhile, an operator can set the initial pressure of the vacuum cavity on the upper computer, and the PLC acquires the initial pressure.
In this example, the initial glow power was set to 0.6Kw, and the initial pressure was set to 40 mbar.
And S2, controlling the radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure and the first real-time pressure in a growth preparation stage in a formula table until the initial glow power reaches the target glow power and the initial pressure in the vacuum cavity reaches the target pressure.
Specifically, the PLC controls the radio frequency power supply to start glow discharge and enters a growth preparation stage. Then, detecting the glow parameters by the PLC in the glow discharge process to obtain a first real-time glow power transmitted by the radio frequency power supply; simultaneously, the PLC controller still acquires the first real-time pressure in the vacuum cavity, and this first real-time pressure is given the PLC controller by electric capacity rule through analog input/output module transmission.
Further, after the first real-time glow power and the first real-time pressure are obtained, the PLC compares the first real-time pressure with the standard vacuum pressure in the growth preparation stage in the formula table, and controls the radio frequency power supply according to the comparison result. Specifically, when the first real-time pressure is equal to the standard vacuum pressure of the growth preparation stage, the PLC searches the standard glow power of the growth preparation stage in a formula table according to the standard vacuum pressure of the growth preparation stage, wherein the standard glow power corresponds to the standard vacuum pressure; and then, the PLC controls the radio frequency power supply according to the standard glow power, so that the first real-time glow power is equal to the standard glow power, the control of the glow power is realized, the glow power is gradually increased according to the standard conditions, a good and stable growth environment is formed in the vacuum cavity, and danger caused by sudden change is avoided. When the first real-time pressure is not equal to the standard vacuum pressure in the growth preparation stage, the PLC adjusts the first real-time pressure within a certain time until the first real-time pressure is equal to the standard vacuum pressure; if the two are not equal after the adjustment of the PLC, the fault processing flow is started.
Further, the first real-time glow power gradually rises from the initial glow power until the target glow power is reached, and simultaneously the first real-time pressure in the vacuum cavity also reaches the target pressure from the initial pressure, at the moment, the glow power and the pressure can meet the requirements of diamond growth conditions, and the growth maintaining stage is entered. In this embodiment, the target glow power may be 4-6 Kw, and the target pressure may be 300-500 mbar.
Referring to fig. 2, fig. 2 is a graph illustrating a variation trend of the glow power and the vacuum pressure in the growth preparation stage according to an embodiment of the present invention, wherein pressure represents the vacuum pressure, and power represents the glow power. In fig. 2, in the preparation stage of growth, the first real-time glow power has a first trend of gradually rising change, which is to maintain a larger constant rate first and then a smaller constant rate; similarly, the first real-time pressure has a second gradually rising trend of change, and the change of the first real-time pressure keeps a larger constant speed firstly and then keeps a smaller constant speed; and, the first variation tendency is the same as the second variation tendency. The two keep the same change trend, so that the environment in the vacuum cavity is convenient to adjust.
And S3, controlling the radio frequency power supply to continue glow discharge, keeping the target glow power unchanged, and simultaneously keeping the target pressure unchanged.
Specifically, in the growth maintaining stage, the PLC controls the radio frequency power supply to continue glow discharge, so that the target glow power is kept unchanged in the whole diamond growth process, and meanwhile, the PLC controls the target pressure to be also kept unchanged in the diamond growth process; namely, in the diamond growth process, the glow power is kept at 4-6 Kw all the time, and the pressure in the vacuum cavity is kept at 300-500 mbar all the time.
S4, controlling the radio frequency power supply to gradually reduce the glow discharge power, acquiring second real-time glow power and second real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to the comparison result of the standard vacuum pressure and the second real-time pressure in the growth finishing stage in the formula table until the second real-time glow power is reduced from the target glow power to the initial glow power, and simultaneously the second real-time pressure is reduced from the target pressure to the initial pressure.
Specifically, after the growth of the diamond is finished, the PLC controls the radio frequency power supply to be closed, so that the radio frequency power supply gradually reduces glow discharge power and enters a growth finishing stage; meanwhile, the PLC detects the glow parameters, first real-time glow power transmitted by the radio frequency power supply is obtained, second real-time pressure in the vacuum cavity is obtained, and the second real-time pressure is transmitted to the PLC through the analog input and output module by the capacitance gauge.
Further, after the second real-time glow power and the second real-time pressure are obtained, the PLC compares the second real-time pressure with the standard vacuum pressure of the growth ending stage in the formula table, and controls the radio frequency power supply according to the comparison result. Specifically, when the second real-time pressure is equal to the standard vacuum pressure at the growth ending stage, the PLC searches the standard glow power corresponding to the standard vacuum pressure in the formula table according to the standard vacuum pressure at the growth ending stage; then, the PLC controls the radio frequency power supply according to the standard glow power, so that the second real-time glow power is equal to the standard glow power, the control of the glow power is realized, the glow power is gradually reduced according to the standard until the second real-time glow power is reduced from the target glow power to the initial glow power, the second real-time pressure is reduced from the target pressure to the initial pressure, and the condition that the environment in the vacuum cavity is stable and danger caused by sudden reduction is avoided; the glow discharge is then turned off, ending the growth. When the second real-time pressure is not equal to the standard vacuum pressure at the growth ending stage, the PLC adjusts the second real-time pressure within a certain time until the second real-time pressure is equal to the standard vacuum pressure; if the two are not equal after the adjustment of the PLC, the fault processing flow is started.
Referring to fig. 3, fig. 3 is a graph illustrating variation trends of the glow power and the vacuum pressure in the growth end stage according to an embodiment of the present invention, wherein power represents the glow power, and pressure represents the vacuum pressure. In fig. 3, the second real-time glow power has a third trend of gradually decreasing change, which is maintained at a smaller constant rate first and then at a larger constant rate, at the end of the growth; similarly, the second real-time pressure has a fourth trend of gradually decreasing, and the change of the second real-time pressure firstly keeps a smaller constant speed and then keeps a larger constant speed; and the third variation trend is the same as the fourth variation trend, so that the environment in the vacuum cavity can be conveniently adjusted.
In the embodiment, the control method is carried out based on a PLC (programmable logic controller), the PLC controls the glow power of the radio frequency power supply all the time, the capacitance gauge collects the pressure of the vacuum cavity in real time, and the glow power of the radio frequency power supply changes along with the change of the vacuum pressure all the time according to the relation in a formula table in the growth process of the diamond, so that the automatic control of the vacuum pressure and the glow discharge of the radio frequency power supply is realized, the vacuum pressure control and the glow discharge control of the radio frequency power supply are organically combined, the organic unification of the vacuum pressure control and the glow discharge control of the radio frequency power supply is realized, and good conditions are provided for the growth of the diamond.
Example two
On the basis of the first embodiment, please refer to fig. 4, and fig. 4 is a schematic flow chart of another PLC glow control method for diamond growth according to the first embodiment of the present invention. The PLC glow control method comprises the following steps:
and S1, acquiring the initial glow power and a formula table of the glow power and the vacuum pressure.
And S2, controlling the radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure and the first real-time pressure in a growth preparation stage in a formula table until the initial glow power reaches the target glow power and the initial pressure in the vacuum cavity reaches the target pressure.
And S3, controlling the radio frequency power supply to continue glow discharge, keeping the target glow power unchanged, and simultaneously keeping the target pressure unchanged.
S4, controlling the radio frequency power supply to gradually reduce the glow discharge power, acquiring second real-time glow power and second real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to the comparison result of the standard vacuum pressure and the second real-time pressure in the growth finishing stage in the formula table until the second real-time glow power is reduced from the target glow power to the initial glow power, and simultaneously the second real-time pressure is reduced from the target pressure to the initial pressure.
Please refer to the first embodiment for the specific implementation of steps S1-S4, which is not described in detail herein.
In this embodiment, while the PLC glow control method of the growth preparation stage, the growth maintenance stage, and the growth end stage is performed, the following control may be performed on the radio frequency power supply:
step a, acquiring real-time reflected power when the radio frequency power supply performs glow discharge.
Specifically, when the radio frequency power supply performs glow discharge, the real-time glow power is transmitted to the PLC controller, and the real-time reflected power is transmitted to the PLC controller.
And b, controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper limit of the reflected power.
Specifically, the PLC controller can obtain the upper limit of the reflected power while obtaining the initial glow power and the recipe table. After the PLC acquires the real-time feedback power of the radio frequency power supply, comparing the real-time feedback power with the upper limit of the feedback power to judge the running state of the radio frequency power supply; when the upper limit of the reflected power is smaller than or equal to the real-time reflected power, the radio frequency power fails, and the PLC controls the radio frequency power to stop glow discharge; when the upper limit of the reflected power is larger than the real-time reflected power, the radio frequency power supply is normal in operation, and the PLC does not operate the radio frequency power supply, so that the radio frequency power supply continuously performs glow discharge.
The above steps a to b may be performed at any time of the growth preparation phase, the growth holding phase, and the growth completion phase, or may be performed at any time of the growth preparation phase, the growth holding phase, or the growth completion phase, and preferably, the steps a to b are performed at any time of the growth preparation phase, the growth holding phase, and the growth completion phase, so as to monitor the operating state of the radio frequency power supply in the whole process.
In this embodiment, when the radio frequency power supply carries out glow discharge, the running state of PLC controller to the radio frequency power supply monitors to prevent that the radio frequency power supply from breaking down and causing diamond growth anomaly, improve equipment's security simultaneously.
EXAMPLE III
On the basis of the first embodiment and the second embodiment, please refer to fig. 5, and fig. 5 is a schematic structural diagram of a PLC glow control device for diamond growth according to an embodiment of the present invention. The PLC glow control apparatus includes a parameter acquisition module 51, a glow discharge starting module 52, a glow discharge maintaining module 53, and a glow discharge closing module 54. Wherein the content of the first and second substances,
the parameter obtaining module 51 is used for obtaining the initial glow power and the formulation table of the glow power and the vacuum pressure. The glow discharge starting module 52 is connected to the parameter obtaining module 51, and is configured to control the radio frequency power supply to start glow discharge, obtain a first real-time glow power and a first real-time pressure in the vacuum chamber, and control the radio frequency power supply according to a comparison result between a standard vacuum pressure in a growth preparation stage in the recipe table and the first real-time pressure until the initial glow power reaches the target glow power and the initial pressure in the vacuum chamber reaches the target pressure. The glow discharge maintaining module 53 is connected to the glow discharge starting module 52, and is configured to control the radio frequency power supply to continue to perform glow discharge, so that the target glow power is kept unchanged, and meanwhile, the target pressure is kept unchanged. The glow discharge closing module 54 is connected to the glow discharge maintaining module 53, and is configured to control the radio frequency power supply to gradually reduce the glow discharge power, obtain a second real-time glow power and a second real-time pressure in the vacuum chamber, and control the radio frequency power supply according to a comparison result between the standard vacuum pressure at the growth completion stage in the recipe table and the second real-time pressure until the target glow power decreases to the initial glow power and the target pressure decreases to the initial pressure.
Referring to fig. 6, fig. 6 is a schematic structural diagram of another PLC glow control device for diamond growth according to an embodiment of the present invention, where the PLC glow control device further includes: a reflected power acquisition module 55 and a radio frequency power control module 56. Wherein the content of the first and second substances,
the reflected power obtaining module 55 may be connected to any one of the glow discharge starting module 52, the glow discharge maintaining module 53, and the glow discharge closing module 54, or may be connected to all of the glow discharge starting module 52, the glow discharge maintaining module 53, and the glow discharge closing module 54, and the preferred reflected power obtaining module 55 is connected to all of the three modules; the reflected power obtaining module 55 is configured to obtain real-time reflected power when the radio frequency power source performs glow discharge. The rf power control module 56 is connected to the reflected power obtaining module 55, and is configured to control the operation of the rf power according to a comparison result between the real-time reflected power and the upper limit of the pre-obtained reflected power.
Referring to fig. 7, fig. 7 is a schematic structural diagram of a radio frequency power control module 56 according to an embodiment of the present invention, where the radio frequency power control module 56 includes a comparison module 561, a radio frequency power stop module 562, and a radio frequency power running module 563. Wherein the content of the first and second substances,
the comparing module 561 is connected to the reflected power obtaining module 55, and is configured to compare the real-time reflected power with the upper reflected power limit. The rf power stopping module 562 is connected to the comparing module 561, and is configured to control the rf power to stop the glow discharge when the upper limit of the reflected power is less than or equal to the real-time reflected power. The rf power supply running module 563 is connected to the comparing module 561, and is configured to control the rf power supply to continue glow discharge when the upper limit of the reflected power is greater than the real-time reflected power.
For the specific implementation process of each module, please refer to the first embodiment and the second embodiment, which is not described in detail in this embodiment.
The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.
Claims (7)
1. A PLC glow control method for diamond growth is characterized by comprising the following steps:
the method comprises the steps that a formula table of initial glow power, glow power and vacuum pressure is obtained, in the diamond growth process, the glow power of a radio frequency power supply changes along with the change of the vacuum pressure according to the relation in the formula table, and the change trends are the same;
controlling a radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in a vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure in a growth preparation stage in a formula table and the first real-time pressure until the first real-time glow power reaches target glow power from the initial glow power and the first real-time pressure reaches target pressure from the initial pressure; the first real-time glow power keeps a larger constant speed firstly and then keeps a smaller constant speed, and the first real-time pressure keeps a larger constant speed firstly and then keeps a smaller constant speed;
controlling the radio frequency power supply to continue glow discharge, keeping the target glow power unchanged, and simultaneously controlling the target pressure to keep unchanged;
controlling the radio frequency power supply to gradually reduce glow discharge power, acquiring second real-time glow power and second real-time pressure in a vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure at a growth finishing stage in the formula table and the second real-time pressure until the second real-time glow power is reduced from the target glow power to the initial glow power and the second real-time pressure is reduced from the target pressure to the initial pressure; the second real-time glow power is firstly kept at a small constant speed and then kept at a large constant speed, and the second real-time pressure is firstly kept at a small constant speed and then kept at a large constant speed;
wherein, controlling the radio frequency power supply according to the comparison result of the standard vacuum pressure of the growth preparation stage in the formula table and the first real-time pressure comprises: comparing the first real-time pressure to a standard vacuum pressure of the growth preparation stage; when the first real-time pressure is equal to the standard vacuum pressure of the growth preparation stage, searching the standard glow power of the growth preparation stage corresponding to the standard vacuum pressure of the growth preparation stage in the formula table; controlling the radio frequency power supply according to the standard glow power of the growth preparation stage so as to enable the first real-time glow power to be equal to the standard glow power of the growth preparation stage in the formula table;
controlling the radio frequency power supply according to the comparison result of the standard vacuum pressure at the growth ending stage in the formula table and the second real-time pressure, wherein the control method comprises the following steps: comparing the second real-time pressure to a standard vacuum pressure of the end-of-growth stage; when the second real-time pressure is equal to the standard vacuum pressure of the growth ending stage, searching the standard glow power of the growth ending stage corresponding to the standard vacuum pressure of the growth ending stage in the formula table; and controlling the radio frequency power supply according to the standard glow power of the growth ending stage so as to enable the second real-time glow power to be equal to the standard glow power of the growth ending stage in the formula table.
2. The PLC glow control method for diamond growth according to claim 1, wherein the initial glow power is 0.6Kw, the initial pressure is 10-40 mbar, the target glow power is 4-6 Kw, and the target pressure is 300-500 mbar.
3. The PLC glow control method for diamond growth as claimed in claim 1, further comprising:
acquiring real-time reflected power when the radio frequency power supply performs glow discharge;
and controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper limit of the reflected power.
4. The PLC glow control method for diamond growth according to claim 3, wherein controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper reflected power limit comprises:
comparing the real-time reflected power to the upper reflected power limit;
when the upper limit of the reflected power is smaller than or equal to the real-time reflected power, controlling the radio frequency power supply to stop glow discharge;
and when the upper limit of the reflected power is larger than the real-time reflected power, controlling the radio frequency power supply to continue glow discharge.
5. A PLC glow control device for diamond growth, comprising:
the parameter acquisition module is used for acquiring initial glow power and a formula table of the glow power and vacuum pressure;
the glow discharge starting module is used for controlling the radio frequency power supply to start glow discharge, acquiring first real-time glow power and first real-time pressure in the vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure in a growth preparation stage in the formula table and the first real-time pressure until the initial glow power reaches target glow power and the initial pressure in the vacuum cavity reaches target pressure; the first real-time glow power keeps a larger constant speed firstly and then keeps a smaller constant speed, and the first real-time pressure keeps a larger constant speed firstly and then keeps a smaller constant speed;
the glow discharge maintaining module is used for controlling the radio frequency power supply to continue glow discharge, so that the target glow power is kept unchanged, and meanwhile, the target pressure is kept unchanged;
the glow discharge closing module is used for controlling the radio frequency power supply to gradually reduce glow discharge power, acquiring second real-time glow power and second real-time pressure in a vacuum cavity, and controlling the radio frequency power supply according to a comparison result of standard vacuum pressure at a growth finishing stage in the formula table and the second real-time pressure until the target glow power is reduced to the initial glow power and the target pressure is reduced to the initial pressure; the second real-time glow power is firstly kept at a small constant speed and then kept at a large constant speed, and the second real-time pressure is firstly kept at a small constant speed and then kept at a large constant speed.
6. The PLC glow control apparatus for diamond growth of claim 5, further comprising:
the reflected power acquisition module is used for acquiring real-time reflected power when the radio frequency power supply performs glow discharge;
and the radio frequency power supply control module is used for controlling the operation of the radio frequency power supply according to the comparison result of the real-time reflected power and the pre-acquired upper limit of the reflected power.
7. The PLC glow control apparatus for diamond growth of claim 6, wherein said rf power control module comprises:
a comparison module for comparing the real-time reflected power with the upper reflected power limit;
the radio frequency power supply stopping module is used for controlling the radio frequency power supply to stop glow discharge when the upper limit of the reflected power is less than or equal to the real-time reflected power;
and the radio frequency power supply operation module is used for controlling the radio frequency power supply to continue glow discharge when the upper limit of the reflected power is greater than the real-time reflected power.
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| EP0284190B1 (en) * | 1987-02-24 | 1992-11-25 | Semiconductor Energy Laboratory Co., Ltd. | Enhanced cvd method for deposition of carbon |
| CN107308888A (en) * | 2017-08-10 | 2017-11-03 | 安庆市凯立金刚石科技有限公司 | A kind of diamond safe operating device |
| CN108546933A (en) * | 2018-04-20 | 2018-09-18 | 长沙新材料产业研究院有限公司 | A kind of MPCVD synthesis devices, control method and synthetic method |
| CN109092227A (en) * | 2018-08-30 | 2018-12-28 | 长沙新材料产业研究院有限公司 | A kind of MPCVD synthesis device and control method |
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| EP0284190B1 (en) * | 1987-02-24 | 1992-11-25 | Semiconductor Energy Laboratory Co., Ltd. | Enhanced cvd method for deposition of carbon |
| CN107308888A (en) * | 2017-08-10 | 2017-11-03 | 安庆市凯立金刚石科技有限公司 | A kind of diamond safe operating device |
| CN108546933A (en) * | 2018-04-20 | 2018-09-18 | 长沙新材料产业研究院有限公司 | A kind of MPCVD synthesis devices, control method and synthetic method |
| CN109092227A (en) * | 2018-08-30 | 2018-12-28 | 长沙新材料产业研究院有限公司 | A kind of MPCVD synthesis device and control method |
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