CN111996512A - 一种用于cvd涂层设备的铝反应器 - Google Patents
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Abstract
本发明涉及金属切削刀具和工模具涂层技术领域,且公开了一种用于CVD涂层设备的铝反应器,包括筒体,所述筒体的外侧固定安装有铝反应器固定板,铝反应器的上盖因为需要频繁拆卸添加铝颗粒,采用锁紧卡箍的方式锁紧,既能保证密封性,又能快速拆卸和安装,上盖上安装有吊环和把手,便于搬运整个铝反应器和拆卸移动上盖,上盖法兰处安装有散热片,可以一定程度上降低上盖法兰O型圈沟槽处的温度,延长了上盖法兰O型圈的使用寿命,降低了成本,同时散热片还可起到挡住筒体加热圈的作用,不让筒体加热圈滑落,出气孔板采用螺丝固定的方式固定,方便拆卸进行清洗维护,进气孔板采用卡扣方式固定,位置不会偏移,同时方便拆卸。
Description
技术领域
本发明涉及金属切削刀具和工模具涂层技术领域,具体为一种用于CVD涂层设备的铝反应器。
背景技术
CVD是在其它材料(基材)的金属加工用工件例如模具、切削工具、耐磨损、耐腐蚀零件等的表面上成膜的方法,尤其是薄膜形成方法,化学气相沉积的特点是反应气体所含化合物的化学反应的进行,所期望的化学反应主要产物沉积在基材表面上并在那里形成涂层或者说覆膜,可能的反应副产物以气体形态出现并且必须从气体混合物中被除去以保证层膜性能,这通过排气管路来实现,经过涂层的切削刀具、工模具的使用寿命会大大提高,经过涂层的零部件更加耐腐蚀和耐磨损。
在常见的技术中铝反应器的测温元件全部分布在反应器的外部,如顶盖和筒壁,上盖法兰处不带散热片,出气孔板采用焊接固定的方式,但是这些方式也是有缺陷的,测温元件分布在反应器的外部,测温点为外部,和内部的实际温度有偏差,上盖用螺丝紧固的方式锁紧,拆卸和安装不方便,同时容易将螺丝滑丝。
发明内容
技术方案
为实现上述能准确的知晓铝反应器内部的温度,上盖能保证密封性,又能快速拆卸和安装目的,本发明提供如下技术方案:一种用于CVD涂层设备的铝反应器,包括筒体,所述筒体的外侧固定安装有铝反应器固定板,所述筒体的外壁底部焊接安装有测温热电偶支架,所述筒体的底部焊接有下封板,所述下封板的底部固定安装有下封板加热片压板,所述下封板的底部开设有出气口,所述筒体的顶部焊接有上盖法兰散热片,所述上盖法兰散热片的顶部焊接有上盖法兰,所述上盖法兰的顶侧端开设有上盖法兰O型圈沟槽,所述上盖法兰和上盖的外侧活动安装有锁紧卡箍,所述筒体的顶部活动安装有上盖,所述筒体的内部分别固定安装有进气孔板、出气孔板与测温热电偶套管。
优选的,所述上盖的顶部分别固定安装有吊环、把手与进气口。
优选的,所述下封板的底端外部开设有下封板测温点。
优选的,所述测温热电偶套管位于筒体内部但和筒体内腔隔绝。
优选的,所述下封板上固定安装有加热片,通过下封板加热片压板将加热片固定安装在下封板的底部。
优选的,所述上盖法兰O型圈沟槽的内部放置有O型圈沟槽。
有益效果
与现有技术相比,本发明提供了一种用于CVD涂层设备的铝反应器,具备以下有益效果:
1、该用于CVD涂层设备的铝反应器,通过将测温元件通过测温热电偶套管,***到铝反应器内部,测量铝反应器内部温度,更能准确的知晓铝反应器内部的温度。
2、该用于CVD涂层设备的铝反应器,铝反应器的上盖因为需要频繁拆卸添加铝颗粒,采用锁紧卡箍的方式锁紧,既能保证密封性,又能快速拆卸和安装,上盖上安装有吊环和把手,便于搬运整个铝反应器和拆卸移动上盖,上盖法兰处安装有上盖法兰散热片,可以一定程度上降低上盖法兰O型圈沟槽处的温度,延长了上盖法兰O型圈的使用寿命,降低了成本,同时上盖法兰散热片还可起到挡住筒体加热圈的作用,不让筒体加热圈滑落,出气孔板采用螺丝固定的方式固定,方便拆卸进行清洗维护,进气孔板采用卡扣方式固定,位置不会偏移,同时方便拆卸。
附图说明
图1为本发明整体结构正视图;
图2为本发明去筒体内部结构图;
图3为本发明整体结构仰视图。
图中:1-筒体、2-上盖、3-锁紧卡箍、4-测温热电偶支架、5-进气孔板、6-出气孔板、7-下封板加热片压板、8-上盖法兰散热片、9-铝反应器固定板、10-测温热电偶套管、11-出气口、12-上盖法兰O型圈沟槽、13-上盖法兰、14-下封板、15-吊环、16-把手、17-进气口、18-下封板测温点。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
请参阅图1-3,一种用于CVD涂层设备的铝反应器,包括筒体1,筒体1的外侧固定安装有铝反应器固定板9,铝反应器固定板9焊接在筒体1约中间部位,筒体1的外壁底部焊接安装有测温热电偶支架4,筒体1的底部焊接有下封板14,下封板14的底部固定安装有下封板加热片压板7,下封板14的底部开设有出气口11,出气口11焊接在下封板14底部中心位置,筒体1的顶部焊接有上盖法兰散热片8,上盖法兰散热片8的顶部焊接有上盖法兰13,上盖法兰13的顶侧端开设有上盖法兰O型圈沟槽12,上盖法兰13和上盖2的外侧活动安装有锁紧卡箍3,通过锁紧卡箍3将上盖2和上盖法兰13锁紧。
将测温元件通过测温热电偶套管,***到铝反应器内部,测量铝反应器内部温度,更能准确的知晓铝反应器内部的温度,锁紧卡箍3将上盖2和上盖法兰13锁紧压住,保证密封,筒体1的顶部活动安装有上盖2,筒体1的内部分别固定安装有近气孔板5、出气孔板6与测温热电偶套管10。
其中,优选的,上盖2的顶部分别固定安装有吊环15、把手16与进气口17。
其中,优选的,下封板14的底端外部开设有下封板测温点18。
其中,优选的,测温热电偶套管10位于筒体1内部但和筒体1内腔隔绝。
其中,优选的,下封板14上固定安装有加热片,通过下封板加热片压板7将加热片固定安装在下封板14的底部。
其中,优选的,上盖法兰O型圈沟槽12的内部放置有O型圈沟槽。
本发明的工作原理及使用流程:在进气孔板5和出气孔板6之间放置铝颗粒,通过铝反应器固定板9,借助外部旋转机构,将铝反应器旋转至倒置位置,即上盖2位于下部,下封板14位于上部,筒体1外侧环绕安装有电阻丝加热环,下封板14底部安装有加热片,加热环和加热片共同对铝反应器进行加热,热量以热传导的方式传输至铝反应内部,根据铝反应器下封板安装的测温热电偶和测温热电偶套管10内安装的测温热电偶的温度反馈,控制加热环和加热片的加热通断和加热频率,最终来实现对铝反应器的温度控制,当铝反应器的温度达到设定的工艺温度后,进气口17处通入能和铝颗粒反应的气体,生成所需反应物或气体,并借由出气口11进入下一工艺环节。
尽管已经示出和描述了本发明的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由所附权利要求及其等同物限定。
Claims (6)
1.一种用于CVD涂层设备的铝反应器,包括筒体(1),其特征在于:所述筒体(1)的外侧固定安装有铝反应器固定板(9),所述筒体(1)的内壁底部焊接安装有测温热电偶支架(4),所述筒体(1)的底部焊接有下封板(14),所述下封板(14)的底部固定安装有下封板加热片压板(7),所述下封板(14)的底部开设有出气口(11),所述筒体(1)的顶部焊接有上盖法兰散热片(8),所述上盖法兰散热片(8)的顶部焊接有上盖法兰(13),所述上盖法兰(13)的顶侧端开设有上盖法兰O型圈沟槽(12),所述上盖法兰(13)与上盖(2)的外侧均活动安装有锁紧卡箍(3),所述筒体(1)的顶部活动安装有上盖(2),所述筒体(1)的内部分别固定安装有进气孔板(5)、出气孔板(6)与测温热电偶套管(10)。
2.根据权利要求1所述的一种用于CVD涂层设备的铝反应器,其特征在于:所述上盖(2)的顶部分别焊接有吊环(15)、把手(16)与进气口(17)。
3.根据权利要求1所述的一种用于CVD涂层设备的铝反应器,其特征在于:所述下封板(14)的底端开设有下封板测温点(18)。
4.根据权利要求1所述的一种用于CVD涂层设备的铝反应器,其特征在于:所述测温热电偶套管(10)位于筒体(1)内部但和筒体(1)内腔隔绝。
5.根据权利要求1所述的一种用于CVD涂层设备的铝反应器,其特征在于:所述下封板(14)上固定安装有加热片,通过下封板加热片压板(7)将加热片固定安装在下封板(14)的底部。
6.根据权利要求1所述的一种用于CVD涂层设备的铝反应器,其特征在于:所述上盖法兰O型圈沟槽(12)的内部放置有O型圈沟槽。
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