CN111897035A - Resin lens for shielding high-frequency radiation and production process thereof - Google Patents

Resin lens for shielding high-frequency radiation and production process thereof Download PDF

Info

Publication number
CN111897035A
CN111897035A CN202010754810.1A CN202010754810A CN111897035A CN 111897035 A CN111897035 A CN 111897035A CN 202010754810 A CN202010754810 A CN 202010754810A CN 111897035 A CN111897035 A CN 111897035A
Authority
CN
China
Prior art keywords
film layer
lens
lines
resin substrate
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010754810.1A
Other languages
Chinese (zh)
Inventor
苗国华
潘学龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN202010754810.1A priority Critical patent/CN111897035A/en
Publication of CN111897035A publication Critical patent/CN111897035A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694Halides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/086Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • GPHYSICS
    • G02OPTICS
    • G02CSPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C7/00Optical parts
    • G02C7/02Lenses; Lens systems ; Methods of designing lenses
    • G02C7/022Ophthalmic lenses having special refractive features achieved by special materials or material structures

Abstract

A resin lens for attenuating high frequency radiation and a production process thereof, comprising, a first step of manufacturing a resin substrate; secondly, hardening the surface of the resin substrate: thirdly, manufacturing a shielding pattern film layer; fourthly, evaporating an antireflection film layer; fifthly, evaporating a waterproof film layer; sixthly, inspecting finished products; seventhly, packaging and warehousing; the method is characterized in that: thirdly, manufacturing a shielding pattern film layer; printing conductive adhesive on the front side and the back side of the resin substrate, wherein the pattern of the conductive adhesive comprises R lines, vertical lines and transverse lines; the widths of the R lines, the vertical lines and the transverse lines are 0.5-1.5mm, a certain distance is reserved between the R lines, the vertical lines and the transverse lines, and the distance is 0.8-5.5 mm. The damage of electromagnetic radiation to human eyes is effectively reduced, the function of protecting the eyes is achieved, a certain health value is brought to users, and good social benefits are generated.

Description

Resin lens for shielding high-frequency radiation and production process thereof
Technical Field
The invention relates to a spectacle lens and a production process thereof, in particular to a resin lens for shielding high-frequency radiation and a production process thereof.
Background
At present, wireless network terminals such as mobile phones, tablet computers, bluetooth, WiFi and the like which utilize wireless transmission technology to realize point-to-point communication and transmit contents such as video images and the like are more widely applied, so that the environment of work and life of people is filled with 1. large amount of radio waves, particularly along with the popularization of 5G communication, the power of wireless transmission is larger and larger, and visual fatigue and damage are easily caused to eyes of people.
The traditional radiation-proof glasses adopt a method of vacuum evaporating a layer of indium tin oxide conducting film on the surface of a resin lens to attenuate and shield high-frequency radiation, and obtain a certain effect, but because the whole film coating on the surface of the lens belongs to nonselective shielding attenuation, the attenuation effect can be realized only by an induced current discharge channel, so a discharge loop can be formed only by wearing a metal spectacle frame and utilizing the human body to release and circulate high-frequency induced charges to the ground, but under the condition that a spectacle frame is made of a non-conductor such as a plastic spectacle frame, the resin lens is made of high-frequency high potential and cannot realize the grounding smooth discharge of the high-frequency induced charges, and the original expected shielding effect on the high-frequency radiation electric waves is weakened.
Disclosure of Invention
The invention provides a resin lens for shielding high-frequency radiation, which adopts a brand-new conductive shielding mode, wherein a shielding pattern film layer for shielding electromagnetic waves is arranged in the lens, the shielding pattern film layer is made of transparent conductive materials, the pattern of the shielding pattern film layer is a plurality of mutually parallel longitudinal vertical bars, the leftmost vertical bar is in closed connection with the rightmost vertical bar, a resistor is connected in series in the middle, and after densely distributed conductive bars are electrically connected in series, the problem of the radiation of the high-frequency electromagnetic waves to eyeballs can be effectively solved, the eyes can be effectively protected, the damage of the electromagnetic radiation is reduced, and a certain effect is particularly played on the protection of the eyes of teenagers.
The invention also provides a resin lens for shielding high-frequency radiation and a production process thereof.
The resin lens for shielding high-frequency radiation is composed of a resin substrate, a hardening film layer, a shielding pattern film layer, an antireflection film layer and a waterproof film layer, and is characterized in that: the surface of the resin substrate is sequentially dipped and coated with a hard coating layer, a printing shielding pattern film layer, a vacuum evaporation antireflection film layer and a waterproof film layer.
The resin substrate adopts resin lens monomers with different refractive indexes, such as refractive indexes of 1.499, 1.56, 1.60, 1.67, 1.71, 1.74 and 1.76, etc., and the chemical components of the substrate monomer materials can be allyl diglycol carbonate, diallyl isophthalate and different monomer materials of amino resin.
The hard coating layer uses commercial silicon dioxide hard coating liquid, such as XT-113 for hard coating of domestic CR39 lens, CH-01-8H, TC2000, FC200 type hard coating liquid, Japanese import TS-56-T resin lens hard coating liquid, the dip coating thickness of the hard coating liquid on the surface of the resin substrate is 1-2um, and the resin lenses with different refractive indexes and materials are matched with the hard coating liquid with corresponding types.
The purpose of dip-coating the surface of the substrate with the hard coating layer is to improve the surface hardness of the substrate, increase the surface hardness of the resin substrate from original 4-5H to 6-7H, improve the scratch resistance and wear resistance of the lens and enable the lens to be firmer and more durable in the wearing process.
The shielding pattern film layer is: printing conductive adhesive on the front side and the back side of the resin substrate, wherein the pattern of the conductive adhesive comprises R lines, vertical lines and transverse lines; the widths of the R lines, the vertical lines and the transverse lines are 0.3-1.8mm, a certain distance is reserved between the R lines, the vertical lines and the transverse lines, the distance is 0.5-6.5mm, the R lines, the vertical lines and the transverse lines are in conductive connection with each other in series, and a loop is closed to form an electric loop; and (3) placing the resin substrate (1) printed with the R lines, the vertical lines and the transverse lines in a constant temperature box for drying.
The shielding pattern film layer is obtained by depositing metal cloud formed by an ITO (indium tin oxide) alloy target material in a vacuum evaporation machine on the surface of a resin substrate and a hard film layer, and the thickness of the shielding pattern film layer is 30-100 nm; in the specific process of manufacturing the shielding pattern film layer, the surface parts which do not need to be evaporated are covered by sticking the shielding pattern (3-1) films on the front surface and the back surface of the hardened film layer to form the attenuating antenna shielding pattern film layer, so that the metal shielding effect of shielding high-frequency electromagnetic waves is achieved on the surface of the lens, and the electromagnetic harm of electromagnetic radiation products such as mobile phones and the like to the eyes of a wearer is reduced.
The anti-reflection film is obtained by depositing metal cloud formed by a zirconia target in a vacuum evaporation machine on the surface of a resin substrate, and the thickness of the anti-reflection film is 50-200 nm; the antireflection film layer has the functions of improving the visible light transmittance of the lens, reducing the light loss of the lens medium and enabling people to see the clear surroundings in a dim environment.
After the antireflection film layer is added, the transmittance of the lens light can be increased by 3-5%, so that the total visible light transmittance of the lens can reach more than 95%.
The carbon fluoride waterproof film layer is obtained by depositing ion cloud formed by pulling an electric arc in a vacuum evaporation plating machine by adopting a carbon fluoride target material on the surface of a resin substrate, and the thickness of the carbon fluoride waterproof film layer is 60-100 nm; the hydrophobic angle of the surface of the lens after the waterproof film layer is evaporated on the surface of the lens is increased to more than 150 ℃, no water is adhered, and when the lens is worn in rain, rain water cannot remain on the surface of the lens and cannot influence the definition of objects viewed by the lens after rolling down.
The invention has the beneficial effects that: the invention adopts a conductive shielding mode, and the conductive patterns are arranged in the lens, so that the electromagnetic wave of radio frequency equipment such as a mobile phone and the like can be shielded, the damage of electromagnetic radiation to human eyes is effectively reduced, the function of protecting the eyes is achieved, a certain health value is brought to users, and good social benefits are generated.
Drawings
Fig. 1 is a perspective view of the construction of the present invention.
Fig. 2 is a front view of the construction of the present invention.
Fig. 3 is a sectional view of the construction of the present invention.
Fig. 4 is a shielding pattern of the present invention.
Fig. 5 is a schematic front view of the present invention applied to eyeglasses.
FIG. 6 is a production process diagram of the product of the present invention.
In the figure, 1. a resin substrate; 2, adding a hard film layer; 3. a shielding pattern film layer; r line 3-1; 3-2. vertical lines; 3-3. horizontal lines; 4. an anti-reflection film layer; 5. a waterproof film layer; 6. a spectacle frame.
Detailed Description
In fig. 1, 2 and 3, a resin lens for attenuating high frequency radiation is composed of a resin substrate (1), a hard coating layer (2), a shielding pattern film layer (3), an anti-reflection film layer (4) and a waterproof film layer (5); the method is characterized in that: sequentially dip-coating a hard coating layer (2), a printing shielding pattern film layer (3), an antireflection film layer (4) and a waterproof film layer (5) on the front surface and the back surface of the resin substrate (1); the shielding pattern film layer (3) is provided with a plurality of mutually parallel longitudinal vertical lines (3-2), the longitudinal vertical lines are connected with the longitudinal vertical lines through R lines (3-1), and the leftmost vertical line and the rightmost vertical line are connected and closed through transverse lines (3-3).
In fig. 5, the left side of the spectacle frame (6) is fitted with the resin lenses of the invention; the right side was fitted with the resin lenses of the invention.
The resin substrate (1) is prepared by the following steps:
1) at room temperature, the selected monomers are sent into a special preparation tank, initiator IPP (diisopropyl peroxydicarbonate), ultraviolet absorbent (UVG) and plasticizer (DOP) are weighed according to weight ratio, added into the tank, stirred and mixed under certain temperature and pressure, degassed to separate liquid from bubbles, vacuumized and purified, and then stored at low temperature (-10 ℃) for standby.
lPP, 2.0 percent of ultraviolet absorbent, 0.04 percent of plasticizer and 0.01 percent of plasticizer;
2) and pouring a mould: pressurizing the cold-stored prepared spare monomer by using electric nitrogen, filling the pressurized monomer into a clearly cleaned glass mold, and then transferring to a curing and forming process; .
3) And curing and forming: the mold filled with the monomer is preset for a certain time (pregel) and then sent into curing equipment for heating, the temperature is firstly raised to 48 ℃, the temperature is kept for 2 hours, then the temperature is raised to 90 ℃ at uniform speed, the temperature is rapidly lowered to 60 ℃, and the monomer is cured and molded for 21 hours to prepare a resin substrate;
4) and stabilizing treatment: after the lens is demoulded, annealing treatment is carried out to reduce the dimer or trimer and eliminate the internal stress, thereby improving the stability of the lens and the imaging quality of the lens, and the treatment method comprises the following steps: the lens was heated to about 110 ℃ for 2 hours to obtain a resin substrate (1) by the above procedures.
Hardening the surface of the resin substrate (1): firstly adding hardening liquid into a stainless steel dip-coating tank, then hanging the cured resin substrate (1) on a dip-coating hanger by a group of 40 hanging cards, conveying the cured resin substrate to the upper surface of the hardening liquid dip-coating tank, slowly dropping the hanger to enable the lens to enter the dip-coating tank to be dip-coated with silicon dioxide hardening liquid, wherein the dropping speed is 2-3mm per second, the immersion residence time in the tank is 5-10S, the rising pulling speed is 2-3mm per second, the pulling time is 30S, the lens is pulled out of the dip-coating tank and then conveyed into a far infrared oven to be dried and cured, so that a hardening film layer (2) is formed on the surface of the resin substrate (1), the drying and curing temperature is 80-100 ℃, and the drying and curing time is 30-.
In fig. 5, the shielding pattern film layer (3) is prepared: printing conductive adhesive on the front side and the back side of a resin substrate (1), wherein the conductive adhesive has a pattern of R lines (3-1), vertical lines (3-2) and transverse lines (3-3); the widths of the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are 0.5-1.5mm, a certain distance is reserved between the R lines and the vertical lines, the distance is 0.8-5.5mm, the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are electrically connected in series, and a loop is closed to form an electric loop; and (3) placing the resin substrate (1) printed with the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) in a constant temperature box for drying, wherein the temperature of the constant temperature box is set to be 45-65 ℃, and the drying time is set to be 15-45 minutes.
Evaporating an antireflection film layer (4): placing the resin substrate (1) printed with the shielding pattern film layer (3) on a rotary film coating bracket of a vacuum evaporation plating machine, rotating the film coating bracket to enter an evaporation plating cavity of the vacuum evaporation plating machine, closing a sealing bin door of a vacuum evaporation plating chamber of the vacuum evaporation plating machine and screwing a lock catch handle; opening a vacuumizing machine, vacuumizing the vacuum evaporation chamber, keeping the vacuum degree in the vacuum evaporation chamber to be 2 x 10 < -7 > Pa, and simultaneously keeping the temperature in the vacuum evaporation chamber to be 60 ℃; and opening a second arc-drawing switch to enable the zirconium oxide target material stored in a combustion chamber in a second crucible below the evaporation plating machine to be instantaneously evaporated at high temperature in sparks of the high-voltage arc to form zirconium metal ion cloud, and depositing the zirconium oxide metal ion cloud on the surface of the lens shielding pattern film layer (3) in the vacuum evaporation plating chamber in a continuous rotating process of a rotary film-plating bracket with the lens until the front surface and the back surface are evaporated to form an antireflection film layer (4) with different deposition thicknesses of 30-100nm, namely forming a high-hardness antireflection film layer (4).
Evaporation coating of waterproof film layer (5): keeping the vacuum degree in the vacuum evaporation chamber to reach 2 multiplied by 10 < -7 > Pa, and simultaneously keeping the temperature in the vacuum evaporation chamber at 60 ℃; opening a third arc-drawing switch to enable a carbon fluoride target material stored in a combustion chamber in a third crucible below the evaporation plating machine to be instantaneously evaporated at high temperature in sparks of a high-voltage arc to form carbon fluoride metal ion clouds, enabling a rotary coating support in the vacuum evaporation plating chamber to be deposited on the surface of the lens antireflection film layer (4) in the continuous rotating process of a lens with the rotary coating support, and forming a high-hydrophobicity waterproof film layer (5), and controlling the quantity and the evaporation plating time of the silicon fluoride target material placed in the crucible combustion chamber, so that water reducing and waterproof film layers (5) with different deposition thicknesses of 30-100nm can be evaporated on the front surface and the back surface of the resin lens antireflection film layer (4); and (3) releasing the vacuum: and (3) closing the vacuum pump, opening the air inlet valve, introducing air, and taking out the resin lens plated with the waterproof film layer (5).
In fig. 6, the production process of the present invention is; comprises the first step of manufacturing a resin substrate (1); secondly, hardening the surface of the resin substrate (1): thirdly, manufacturing a shielding pattern film layer (3); fourthly, evaporating an antireflection film layer (4); fifthly, evaporating a waterproof film layer (5); sixthly, inspecting finished products; seventhly, packaging and warehousing; the method is characterized in that: thirdly, manufacturing a shielding pattern film layer (3); printing conductive adhesive on the front side and the back side of a resin substrate (1), wherein the conductive adhesive has a pattern of R lines (3-1), vertical lines (3-2) and transverse lines (3-3); the widths of the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are 0.5-1.5mm, a certain distance is reserved between the R lines and the vertical lines, the distance is 0.8-5.5mm, the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are electrically connected in series, and a loop is closed to form an electric loop; and (3) placing the resin substrate (1) printed with the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) in a constant temperature box for drying, wherein the temperature of the constant temperature box is set to be 45-65 ℃, and the drying time is set to be 15-45 minutes.

Claims (5)

1. A resin lens for attenuating high-frequency radiation comprises a resin substrate (1), a hard coating layer (2), a shielding pattern film layer (3), an antireflection film layer (4) and a waterproof film layer (5); the method is characterized in that: the production process comprises the first step of manufacturing a resin substrate (1); secondly, hardening the surface of the resin substrate (1): thirdly, manufacturing a shielding pattern film layer (3); fourthly, evaporating an antireflection film layer (4); fifthly, evaporating a waterproof film layer (5); sixthly, inspecting finished products; seventhly, packaging and warehousing; the method is characterized in that: thirdly, manufacturing a shielding pattern film layer (3); printing conductive adhesive on the front side and the back side of a resin substrate (1), wherein the conductive adhesive has a pattern of R lines (3-1), vertical lines (3-2) and transverse lines (3-3); the widths of the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are 0.5-1.5mm, a certain distance is reserved between the R lines and the vertical lines, the distance is 0.8-5.5mm, the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) are electrically connected in series, and a loop is closed to form an electric loop; and (3) placing the resin substrate (1) printed with the R lines (3-1), the vertical lines (3-2) and the transverse lines (3-3) in a constant temperature box for drying, wherein the temperature of the constant temperature box is set to be 45-65 ℃, and the drying time is set to be 15-45 minutes.
2. The resin lens for attenuating high-frequency radiation according to claim 1, wherein: the resin substrate (1) is prepared by the following steps:
1) feeding selected monomers into a special preparation tank at room temperature, weighing an initiator IPP (diisopropyl peroxydicarbonate), an ultraviolet absorbent (UVG) and a plasticizer (DOP) according to weight ratio, adding into the tank, stirring and mixing at a certain temperature and pressure, degassing to separate liquid from bubbles, vacuumizing and purifying, and then storing at low temperature (-10 ℃) for later use, wherein the dosage of lPP is 2.0%, the dosage of the ultraviolet absorbent is 0.04%, and the dosage of the plasticizer is 0.01%;
2) and pouring a mould: pressurizing the cold-stored prepared spare monomer by using electric nitrogen, filling the pressurized monomer into a clearly cleaned glass mold, and then transferring to a curing and forming process;
3) and curing and forming: the mold filled with the monomer is preset for a certain time (pregel) and then sent into curing equipment for heating, the temperature is firstly raised to 48 ℃, the temperature is kept for 2 hours, then the temperature is raised to 90 ℃ at uniform speed, the temperature is rapidly lowered to 60 ℃, and the monomer is cured and molded for 21 hours to prepare a resin substrate;
4) and stabilizing treatment: after the lens is demoulded, annealing treatment is carried out to reduce the dimer or trimer and eliminate the internal stress, thereby improving the stability of the lens and the imaging quality of the lens, and the treatment method comprises the following steps: the lens was heated to about 110 ℃ for 2 hours to obtain a resin substrate (1) by the above procedures.
3. The resin lens for attenuating high-frequency radiation according to claim 1, wherein: hardening the surface of the resin substrate (1): firstly adding hardening liquid into a stainless steel dip-coating tank, hanging a cured resin substrate (1) on a dip-coating hanging frame by a group of 40 hanging cards, conveying the cured resin substrate to the upper surface of the hardening liquid dip-coating tank, slowly dropping the hanging frame to enable a lens to enter the dip-coating tank to be dip-coated with silicon dioxide hardening liquid, wherein the dropping speed is 2-3mm per second, the immersion residence time in the tank is 5-10S, the rising pulling speed is 2-3mm per second, the pulling time is 30S, the lens is lifted out of the dip-coating tank and then conveyed into a far infrared oven to be dried and cured, the hardening liquid is dried and cured, the curing temperature is 80-100 ℃, and the curing time is 30-60 min.
4. The resin lens for attenuating high-frequency radiation according to claim 1, wherein: evaporating an antireflection film layer (4): taking out the resin lens coated with the ITO indium tin alloy conductive antenna shielding pattern film layer 3 by evaporation, tearing off the shielding pattern (3-1) films adhered to the front and back surfaces, and then putting the resin lens into a vacuum evaporator to be coated with an antireflection film layer (4) by evaporation; the method comprises the following steps of sequentially arranging resin lenses on a rotary coating bracket of a vacuum coating machine after no flaw is detected, rotating the coating bracket to enter a coating cavity of the vacuum coating machine after the lenses are arranged, closing a sealing bin door of a vacuum coating chamber of the coating machine and screwing a lock catch handle; opening a vacuumizing machine, vacuumizing the vacuum evaporation chamber, keeping the vacuum degree in the vacuum evaporation chamber to be 2 x 10 < -7 > Pa, and simultaneously keeping the temperature in the vacuum evaporation chamber to be 60 ℃; and opening a second arc-drawing switch to enable the zirconium oxide target material stored in a combustion chamber in a second crucible below the evaporation plating machine to be instantaneously evaporated at high temperature in the sparks of the high-voltage arc to form zirconium metal ion cloud, depositing the zirconium oxide target material on the surface of the lens shielding pattern film layer (3) in the continuous rotating process of the rotary film-plating bracket with the lens in the vacuum evaporation plating chamber to form a high-hardness antireflection film layer, and evaporating and plating the zirconium oxide target material in the combustion chamber of the crucible for 30-100nm deposition thickness antireflection film layers (4) on the front surface and the back surface of the resin lens shielding pattern film layer (3) by controlling the quantity and the evaporation plating time of the zirconium oxide target material in the combustion chamber.
5. The resin lens for attenuating high-frequency radiation according to claim 1, wherein: evaporation coating of waterproof film layer (5): keeping the vacuum degree in the vacuum evaporation chamber to reach 2 multiplied by 10 < -7 > Pa, and simultaneously keeping the temperature in the vacuum evaporation chamber at 60 ℃; opening a third arc-drawing switch to enable a carbon fluoride target material stored in a combustion chamber in a third crucible below the evaporation plating machine to be instantaneously evaporated at high temperature in sparks of a high-voltage arc to form carbon fluoride metal ion clouds, enabling a rotary coating support in the vacuum evaporation plating chamber to be deposited on the surface of the lens antireflection film layer (4) in the continuous rotating process of a lens with the rotary coating support, and forming a high-hydrophobicity waterproof film layer (5), and controlling the quantity and the evaporation plating time of the silicon fluoride target material placed in the crucible combustion chamber, so that water reducing and waterproof film layers (5) with different deposition thicknesses of 30-100nm can be evaporated on the front surface and the back surface of the resin lens antireflection film layer (4); and (3) releasing the vacuum: and (3) closing the vacuum pump, opening the air inlet valve, introducing air, and taking out the resin lens plated with the waterproof film layer (5).
CN202010754810.1A 2020-07-31 2020-07-31 Resin lens for shielding high-frequency radiation and production process thereof Pending CN111897035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010754810.1A CN111897035A (en) 2020-07-31 2020-07-31 Resin lens for shielding high-frequency radiation and production process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010754810.1A CN111897035A (en) 2020-07-31 2020-07-31 Resin lens for shielding high-frequency radiation and production process thereof

Publications (1)

Publication Number Publication Date
CN111897035A true CN111897035A (en) 2020-11-06

Family

ID=73182751

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010754810.1A Pending CN111897035A (en) 2020-07-31 2020-07-31 Resin lens for shielding high-frequency radiation and production process thereof

Country Status (1)

Country Link
CN (1) CN111897035A (en)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101276079A (en) * 2007-03-28 2008-10-01 C.R.F.阿西安尼顾问公司 Method for obtaining a transparent conductive film
CN103824616A (en) * 2014-02-26 2014-05-28 南昌欧菲光科技有限公司 Conducting film and manufacturing method thereof, touch component and touch display device
CN104880745A (en) * 2015-06-11 2015-09-02 丹阳市精通眼镜技术创新服务中心有限公司 Carbon nanotube transparent antistatic resin lens and production method thereof
CN104898296A (en) * 2015-06-11 2015-09-09 丹阳市精通眼镜技术创新服务中心有限公司 Resin lens with 3D laser-micro-engraved patterns and manufacturing method of resin lens
CN104950358A (en) * 2015-07-27 2015-09-30 江苏万新光学有限公司 Resin lens with anti-fogging and electromagnetic shielding functions and manufacturing method of resin lens
CN105861993A (en) * 2016-05-17 2016-08-17 江苏淘镜有限公司 Colored resin spectacle lens and preparation method thereof
CN108242329A (en) * 2016-12-27 2018-07-03 中国科学院沈阳自动化研究所 A kind of non-contact charge coil
CN109946848A (en) * 2019-04-24 2019-06-28 丹阳市精通眼镜技术创新服务中心有限公司 A kind of phase-change thermal storage Anti-fog glasses piece and preparation method thereof
CN110056212A (en) * 2019-05-21 2019-07-26 佛山瑞加图医疗科技有限公司 A kind of nuclear magnetic resonance check room

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101276079A (en) * 2007-03-28 2008-10-01 C.R.F.阿西安尼顾问公司 Method for obtaining a transparent conductive film
CN103824616A (en) * 2014-02-26 2014-05-28 南昌欧菲光科技有限公司 Conducting film and manufacturing method thereof, touch component and touch display device
CN104880745A (en) * 2015-06-11 2015-09-02 丹阳市精通眼镜技术创新服务中心有限公司 Carbon nanotube transparent antistatic resin lens and production method thereof
CN104898296A (en) * 2015-06-11 2015-09-09 丹阳市精通眼镜技术创新服务中心有限公司 Resin lens with 3D laser-micro-engraved patterns and manufacturing method of resin lens
CN104950358A (en) * 2015-07-27 2015-09-30 江苏万新光学有限公司 Resin lens with anti-fogging and electromagnetic shielding functions and manufacturing method of resin lens
CN105861993A (en) * 2016-05-17 2016-08-17 江苏淘镜有限公司 Colored resin spectacle lens and preparation method thereof
CN108242329A (en) * 2016-12-27 2018-07-03 中国科学院沈阳自动化研究所 A kind of non-contact charge coil
CN109946848A (en) * 2019-04-24 2019-06-28 丹阳市精通眼镜技术创新服务中心有限公司 A kind of phase-change thermal storage Anti-fog glasses piece and preparation method thereof
CN110056212A (en) * 2019-05-21 2019-07-26 佛山瑞加图医疗科技有限公司 A kind of nuclear magnetic resonance check room

Similar Documents

Publication Publication Date Title
CN103293709B (en) Eye protection eyeglass lens and preparation method thereof
JP5369177B2 (en) EMI filter for plasma display panel
CN104950358A (en) Resin lens with anti-fogging and electromagnetic shielding functions and manufacturing method of resin lens
EP2322020B1 (en) Plasma display panel including frameless emi filter, and/or method of making the same
US20140204294A1 (en) Sun control window film with light control function
EP2301055B1 (en) Plasma display panel including tcc emi filter, and/or method of making the same
CN112346165B (en) High-strength blue-light-proof and ultraviolet-proof PC lens and preparation method thereof
CN103698901A (en) Resin eyeglass with low refractive index 1.56 and film plating method thereof
CN111897035A (en) Resin lens for shielding high-frequency radiation and production process thereof
CN103434154A (en) Production process of hardened resin lens
CN114133145A (en) High-transmittance electromagnetic shielding coated glass and production and preparation method thereof
JP7332298B2 (en) Electromagnetic wave permeable metallic luster film
CN111890710A (en) Resin lens for shielding high-frequency radiation and manufacturing method thereof
CN109946848A (en) A kind of phase-change thermal storage Anti-fog glasses piece and preparation method thereof
CN113580478A (en) Production method of blue light, ultraviolet ray, radiation, reflection and seawater prevention lens and lens
CN102373418A (en) Method for manufacturing transparent conductive thin film
CN110215031A (en) A kind of spectacle case and preparation method thereof with fog-proof lens
CN217085447U (en) Plasma wind discharge fog-dispersing lens
CN204065585U (en) Amber anti-blue light eyeglass
CN103000637A (en) Coated thin film transistor (TFT) substrate, preparation method thereof and TFT
CN203535249U (en) Low-reflectivity film layer resin eyeglass having reflective index of 1.56
CN204065584U (en) Presbyopic safety goggles
WO2022252038A1 (en) All-weather high-definition lens suitable for golf and preparation method therefor
CN210954514U (en) Blue light anti-dazzle lens is prevented to anion
CN213141903U (en) Antibacterial protective film

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20201106