CN111839557A - Dual-energy exposure control method and device of X-ray high-voltage generator - Google Patents
Dual-energy exposure control method and device of X-ray high-voltage generator Download PDFInfo
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- A61B6/542—Control of apparatus or devices for radiation diagnosis involving control of exposure
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
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- A61B6/48—Diagnostic techniques
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Abstract
The invention relates to the technical field of X-ray dual-energy exposure control, in particular to a dual-energy exposure control method and a dual-energy exposure control device of an X-ray high-voltage generator, wherein the method comprises the following steps: acquiring a target dual-energy exposure mode; determining a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters; acquiring a real-time exposure feedback parameter, and judging whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; and when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter, switching to the next exposure mode to expose the target body based on the exposure parameter corresponding to the next exposure mode. The method can realize dual-energy ray control in dual-energy single-shot and dual-energy sequence exposure modes and also can realize dual-energy ray control in the dual-energy single-shot and dual-energy sequence exposure modes.
Description
Technical Field
The invention relates to the technical field of X-ray dual-energy exposure control, in particular to a dual-energy exposure control method and device of an X-ray high-voltage generator.
Background
The X-ray detection has important application in the fields of hospital patient diagnosis, industrial nondestructive detection, station security inspection and the like. The dual-energy subtraction is one of the indispensable technologies, and is characterized in that two different X-ray energies are used for exposure within a short time interval, so that different density tissues of a human body in an imaging area form different images, and then hardware processing is performed through a computer by using the difference between the images, and finally a soft tissue image and a bone tissue image are obtained.
The absorption of different tissues of a human body to X-rays is different, the dual-energy subtraction utilizes the mechanism, low KV and high KV are respectively used for carrying out low-energy exposure and high-energy exposure, after a detector receives different signals, the tissues of the human body are divided into soft tissues and bone tissues through an energy subtraction software package, then subtraction processing is carried out, the bone tissues or the soft tissue components are selectively eliminated, and a single image is obtained.
At present, the key point of the dual-energy exposure technology of the X-ray machine in the market is mainly focused on the aspect of image processing in the later period of exposure, and the adopted exposure mode is single.
Disclosure of Invention
The embodiment of the invention provides a dual-energy exposure control method and device of an X-ray high-voltage generator, which can automatically control dual-energy exposure rays in different exposure modes and are convenient to use.
According to a first aspect, an embodiment of the present invention provides a dual-energy exposure control method for an X-ray high voltage generator, including:
acquiring a target dual-energy exposure mode; wherein the target dual-energy exposure mode comprises dual-energy single exposure and dual-energy sequence exposure;
determining a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; wherein the current exposure mode is high-energy exposure or low-energy exposure;
extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters;
acquiring a real-time exposure feedback parameter, and judging whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; wherein the real-time exposure feedback parameters comprise at least one of exposure time and exposure dose;
and when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter, switching to the next exposure mode to expose the target body based on the exposure parameter corresponding to the next exposure mode.
The dual-energy exposure control method of the X-ray high-voltage generator provided by the embodiment of the invention determines the current exposure mode and the next exposure mode based on the target dual-energy exposure mode; extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters; and controlling whether to switch to the next exposure mode or not by acquiring the real-time exposure feedback parameter and judging whether the exposure cut-off parameter is reached or not. The dual-energy single exposure and the dual-energy sequence exposure can be realized, and the dual-energy ray control under the dual-energy single exposure and the dual-energy sequence exposure mode can be realized.
With reference to the first aspect, in a first implementation manner of the first aspect, the exposure cut-off parameter is an exposure time; wherein the obtaining the real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches the exposure cut-off parameter comprises:
when the target body is exposed, starting an exposure timer to obtain real-time exposure time;
judging whether the real-time exposure time reaches the exposure time;
and when the real-time exposure time reaches the exposure time, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
The exposure parameters corresponding to the current exposure mode comprise tube voltage, tube current and the exposure time.
According to the dual-energy exposure control method of the X-ray high-voltage generator, the real-time exposure time is obtained through the exposure timing, whether the real-time exposure time reaches the exposure time is judged, and when the real-time exposure time reaches the exposure time, the next exposure mode is switched to, wherein the exposure mode is high-energy exposure or low-energy exposure, and dual-energy exposure rays can be controlled through the exposure time in a dual-energy single-exposure mode or a dual-energy sequence exposure mode.
With reference to the first embodiment of the first aspect, in a second embodiment of the first aspect, the exposure cut-off parameter is an exposure dose; wherein the obtaining the real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches the exposure cut-off parameter comprises:
when the target body is exposed, acquiring the detected real-time exposure dose corresponding to the target body;
judging whether the real-time exposure dose reaches the exposure dose;
and when the real-time exposure dose reaches the exposure dose, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
The exposure parameter corresponding to the current exposure mode comprises a tube voltage.
According to the dual-energy exposure control method of the X-ray high-voltage generator, the real-time exposure dose corresponding to the detected target body is obtained, whether the real-time exposure dose reaches the exposure dose is judged, and when the real-time exposure dose reaches the exposure dose, switching to the next exposure mode is executed, wherein the exposure mode is high-energy exposure or low-energy exposure, and dual-energy exposure rays can be controlled through the exposure dose in a dual-energy single-exposure mode or a dual-energy sequence exposure mode.
With reference to the first aspect, the first implementation manner of the first aspect, or the second implementation manner of the first aspect, in a third implementation manner of the first aspect, the exposing the target body based on the exposure parameter includes:
judging whether the primary hand brake is pressed down, and if the primary hand brake is not pressed down, returning to the step of executing the target-taking dual-energy exposure mode;
when the primary hand brake is pressed down, judging whether a secondary hand brake is pressed down;
when the secondary hand brake is not pressed within the preset time, returning to the step of acquiring the target dual-energy exposure mode;
and when the secondary hand brake is pressed down, exposing the target body based on the exposure parameters.
According to the dual-energy exposure control method of the X-ray high-voltage generator, the primary hand brake and the secondary hand brake are pressed down simultaneously to control the start of dual-energy exposure, a function of pause in midway is provided for the dual-energy exposure, and the dual-energy exposure control method is more convenient for users to use.
According to a second aspect, an embodiment of the present invention further provides a dual-energy exposure control apparatus for an X-ray high voltage generator, including:
the first acquisition module is used for acquiring a target dual-energy exposure mode; wherein the target dual-energy exposure mode comprises dual-energy single exposure and dual-energy sequence exposure;
The exposure mode determining module is used for determining a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; wherein the current exposure mode is high-energy exposure or low-energy exposure;
the extraction module is used for extracting the exposure parameters corresponding to the current exposure mode and exposing the target body based on the exposure parameters;
the second acquisition module is used for acquiring a real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; wherein the real-time exposure feedback parameters comprise at least one of exposure time and exposure dose;
and the switching module is used for switching to the next exposure mode when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter so as to expose the target body based on the exposure parameter corresponding to the next exposure mode.
The dual-energy exposure control device of the X-ray high-voltage generator provided by the embodiment of the invention judges whether the current exposure mode is high-energy exposure or low-energy exposure based on different exposure modes, so as to determine the next exposure mode; extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters; and controlling whether to switch to the next exposure mode or not by acquiring the real-time exposure feedback parameter and comparing the real-time exposure feedback parameter with the exposure cut-off parameter. The dual-energy single exposure and the dual-energy sequence exposure can be realized, and the dual-energy ray control under the dual-energy single exposure and the dual-energy sequence exposure mode can be realized.
According to a third aspect, an embodiment of the present invention further provides an electronic device, including:
the dual-energy exposure control method of the X-ray high voltage generator comprises a memory and a processor, wherein the memory and the processor are mutually connected in a communication mode, the memory stores computer instructions, and the processor executes the computer instructions so as to execute the dual-energy exposure control method of the X-ray high voltage generator according to the first aspect or any embodiment of the first aspect.
According to a fourth aspect, the embodiment of the present invention further provides a computer-readable storage medium, which stores computer instructions for causing a computer to execute the dual-energy exposure control method of an X-ray high voltage generator according to the first aspect of the present invention or any implementation manner of the first aspect of the present invention.
According to a fifth aspect, an embodiment of the present invention further provides a dual-energy exposure system of an X-ray high voltage generator, including:
the upper computer is connected with the electronic equipment; the upper computer is used for setting the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode, and sending the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode to the electronic equipment;
The electronic device of the third aspect; and the electronic equipment carries out dual-energy exposure based on the target dual-energy exposure mode sent by the upper computer and the exposure parameters corresponding to the exposure mode.
According to the dual-energy exposure system of the X-ray high-voltage generator, the target dual-energy exposure mode and the exposure parameters corresponding to the dual-energy exposure mode are set through the upper computer, and the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode are sent to the electronic equipment; and the electronic equipment carries out dual-energy exposure based on the target dual-energy exposure mode sent by the upper computer and the exposure parameters corresponding to the exposure mode. And a parameter setting interface is provided for the dual-energy exposure, so that the dual-energy exposure is easier to operate.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a flow chart of a dual-energy exposure control method of an X-ray high voltage generator according to an embodiment of the present invention;
FIGS. 2 a-2 d are schematic diagrams of a target dual energy exposure mode according to an embodiment of the invention;
FIG. 3 is a flow chart of a dual energy exposure time control method of an X-ray high voltage generator according to an embodiment of the present invention;
FIG. 4 is a flow chart of a dual energy exposure dose control method of an X-ray high voltage generator according to an embodiment of the present invention;
FIG. 5 is a flow chart of a dual-energy exposure hand brake control method of an X-ray high voltage generator according to an embodiment of the present invention;
FIG. 6 is a schematic structural diagram of a dual-energy exposure control device of an X-ray high-voltage generator according to an embodiment of the invention;
FIG. 7 is a diagram of a hardware configuration provided in accordance with an embodiment of the present invention;
fig. 8 is a schematic structural diagram of a dual-energy exposure system of an X-ray high-voltage generator according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In accordance with an embodiment of the present invention, there is provided an embodiment of a dual-energy exposure control method for an X-ray high voltage generator, wherein the steps illustrated in the flowchart of the drawings may be performed in a computer system, such as a set of computer executable instructions, and wherein, although a logical order is illustrated in the flowchart, in some cases, the steps illustrated or described may be performed in an order different than that illustrated herein.
In this embodiment, a method for controlling dual-energy exposure of an X-ray high voltage generator is provided, which can be used in the electronic device described above, and fig. 1 is a flowchart of a method for controlling dual-energy exposure of an X-ray high voltage generator according to an embodiment of the present invention, as shown in fig. 1, where the flowchart includes the following steps:
and S11, acquiring the target dual-energy exposure mode.
Fig. 2 a-2 d are schematic diagrams of a target dual-energy exposure mode according to an embodiment of the invention, which includes dual-energy single exposure and dual-energy sequential exposure, as shown in fig. 2 a-2 d. Wherein the dual-energy single exposure comprises: a high energy first followed by low energy single exposure mode, as shown in FIG. 2a, and a low energy first followed by high energy single exposure mode, as shown in FIG. 2 b; the dual energy sequence exposure comprises: a high energy first followed by a low energy sequence exposure mode, as shown in fig. 2c, and a low energy first followed by a high energy sequence exposure mode, as shown in fig. 2 d. Wherein, the high energy refers to the exposure of the tube voltage under the conditions of 100-150 KV, and the low energy refers to the exposure of the tube voltage under the conditions of 40-100 KV.
And S12, determining the current exposure mode and the next exposure mode based on the target dual-energy exposure mode.
The current exposure mode comprises high-energy exposure or low-energy exposure, and when the current exposure mode is the high-energy exposure, the next exposure mode is the low-energy exposure; and when the current exposure mode is low-energy exposure, the next exposure mode is high-energy exposure.
And S13, extracting the exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters.
The exposure parameters corresponding to the current exposure mode include: tube voltage, tube current, and exposure time.
And S14, acquiring real-time exposure feedback parameters, and judging whether the real-time exposure feedback parameters reach exposure cut-off parameters in the exposure parameters.
The real-time exposure feedback parameter comprises at least one of exposure time and exposure dose; the real-time exposure feedback parameters are obtained by converting the X-rays of the dual-energy exposure penetrating through the target body into real-time electric signals by using a flat panel detector or a timer or other feedback components, and calculating the exposure time of the dual-energy exposure by using the timer; and taking the real-time electric signal or the exposure time as a real-time exposure feedback parameter to be compared with the exposure cut-off parameter.
And S15, when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter, switching to the next exposure mode to expose the target body based on the exposure parameter corresponding to the next exposure mode.
The dual-energy exposure control method of the X-ray high-voltage generator provided by the embodiment of the invention determines the current exposure mode and the next exposure mode based on the target dual-energy exposure mode; extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters; and controlling whether to switch to the next exposure mode or not by acquiring the real-time exposure feedback parameter and judging whether the exposure cut-off parameter is reached or not. The dual-energy single exposure and the dual-energy sequence exposure can be realized, and the dual-energy ray control under the dual-energy single exposure and the dual-energy sequence exposure mode can be realized.
As an optional implementation manner of this embodiment, the exposure cut-off parameter is an exposure time; as shown in fig. 3, the obtaining the real-time exposure feedback parameter and determining whether the real-time exposure feedback parameter reaches the exposure cut-off parameter includes the following steps:
and S21, acquiring the target dual-energy exposure mode.
See S11 shown in fig. 1 for details, which are not described herein.
And S22, determining the current exposure mode and the next exposure mode based on the target dual-energy exposure mode.
See S12 shown in fig. 1 for details, which are not described herein.
And S23, extracting the exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters.
See S13 shown in fig. 1 for details, which are not described herein.
And S24, when the target body is exposed, starting exposure timing to obtain real-time exposure time.
And S25, judging whether the real-time exposure time reaches the exposure time.
And S26, when the real-time exposure time reaches the exposure time, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
According to the dual-energy exposure time control method of the X-ray high-voltage generator, provided by the embodiment of the invention, the real-time exposure time is obtained through an exposure meter, the real-time exposure time is compared with the exposure time, and when the real-time exposure time reaches the exposure time, the step of switching to the next exposure mode is executed so as to expose the target body based on the exposure parameters corresponding to the next exposure mode. The dual-energy exposure control is simpler and more convenient to operate.
As another alternative implementation manner of this embodiment, the exposure cut-off parameter is an exposure dose; as shown in fig. 4, the obtaining the real-time exposure feedback parameter and determining whether the real-time exposure feedback parameter reaches the exposure cut-off parameter includes the following steps:
and S31, acquiring the target dual-energy exposure mode.
See S11 shown in fig. 1 for details, which are not described herein.
And S32, determining the current exposure mode and the next exposure mode based on the target dual-energy exposure mode.
See S12 shown in fig. 1 for details, which are not described herein.
And S33, extracting the exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters.
See S13 shown in fig. 1 for details, which are not described herein.
And S34, acquiring the detected real-time exposure dose corresponding to the target body when the target body is exposed.
The real-time exposure dose may be obtained by a flat panel detector or other feedback component. And converting the X-rays which penetrate through the target body by the dual-energy exposure into real-time electric signals by using a flat panel detector, wherein the real-time electric signals can represent the real-time exposure dose.
And S35, judging whether the real-time exposure dose reaches the exposure dose.
And S36, when the real-time exposure dose reaches the exposure dose, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
In particular, the exposure dose may be converted into a tube voltage, and the real-time electrical signal may characterize the real-time exposure dose. And comparing the real-time electric signal with the tube voltage, and switching to the next exposure mode when the real-time electric signal reaches the tube voltage so as to expose the target body based on the exposure parameters corresponding to the next exposure mode.
Specifically, the exposure dose and the tube voltage have a correspondence or a look-up table. The tube voltage corresponding to the exposure dose can be automatically obtained through the corresponding relation or the comparison table.
According to the dual-energy exposure dose control method of the X-ray high-voltage generator, real-time exposure dose is converted into a real-time electric signal through the flat panel detector, the real-time electric signal is compared with the tube voltage, and when the real-time electric signal reaches the tube voltage, the next exposure mode is switched to expose the target body based on the exposure parameters corresponding to the next exposure mode. The dual-energy exposure control method is more diversified and easy to operate.
Optionally, as another implementation manner of this embodiment, as shown in fig. 5, the S13 includes the following steps:
and S41, acquiring the target dual-energy exposure mode.
See S11 shown in fig. 1 for details, which are not described herein.
And S42, determining the current exposure mode and the next exposure mode based on the target dual-energy exposure mode.
See S12 shown in fig. 1 for details, which are not described herein.
And S43, extracting the exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters.
Specifically, the S43 may include the following steps:
and S431, extracting the exposure parameters corresponding to the current exposure mode.
And S432, judging whether the primary hand brake is pressed down, and returning to the step of executing the target-taking dual-energy exposure mode if the primary hand brake is not pressed down.
S433, when the first-stage hand brake is pressed down, whether the second-stage hand brake is pressed down is judged.
S434, when the secondary hand brake is not pressed within the preset time, returning to the step of executing the target dual-energy exposure mode.
And S435, exposing the target body based on the exposure parameters when the secondary hand brake is pressed down.
According to the dual-energy exposure control method provided by the embodiment of the invention, the dual-energy exposure is controlled to start by simultaneously pressing the primary hand brake and the secondary hand brake, so that a manual control function is provided for the dual-energy exposure, and the dual-energy exposure control method is more convenient for users to use.
The present embodiment provides a dual-energy exposure control device for an X-ray high voltage generator, as shown in fig. 6, including:
a first obtaining module 51, configured to obtain a target dual-energy exposure mode; wherein the target dual-energy exposure mode comprises dual-energy single exposure and dual-energy sequence exposure;
the target dual-energy exposure mode is built in the dual-energy exposure control device in advance, and a user can select the target dual-energy exposure mode according to requirements.
An exposure mode determination module 52, configured to determine a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; wherein the current exposure mode is high-energy exposure or low-energy exposure;
an extracting module 53, configured to extract an exposure parameter corresponding to a current exposure mode, and expose a target based on the exposure parameter;
a second obtaining module 54, configured to obtain a real-time exposure feedback parameter, and determine whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; wherein the real-time exposure feedback parameters comprise at least one of exposure time and exposure dose;
a switching module 55, configured to switch to the next exposure mode when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter, so as to expose the target based on the exposure parameter corresponding to the next exposure mode.
The dual-energy exposure control device of the X-ray high voltage generator in this embodiment is presented in the form of a functional unit, where the unit refers to an ASIC circuit, a processor and a memory executing one or more software or fixed programs, and/or other devices that can provide the above-mentioned functions.
Further functional descriptions of the modules are the same as those of the corresponding embodiments, and are not repeated herein.
The dual-energy exposure control device of the X-ray high-voltage generator provided by the embodiment of the invention judges whether the current exposure mode is high-energy exposure or low-energy exposure based on different exposure modes, so as to determine the next exposure mode; extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters; and controlling whether to switch to the next exposure mode or not by acquiring the real-time exposure feedback parameter and comparing the real-time exposure feedback parameter with the exposure cut-off parameter. The dual-energy single exposure and the dual-energy sequence exposure can be realized, and the dual-energy ray control under the dual-energy single exposure and the dual-energy sequence exposure mode can be realized.
An embodiment of the present invention further provides an electronic device, which includes the dual-energy exposure control apparatus of the X-ray high-voltage generator shown in fig. 6.
Referring to fig. 7, fig. 7 is a schematic structural diagram of an electronic device according to an embodiment of the present invention, and as shown in fig. 7, the electronic device may include: at least one processor 61, such as a CPU (Central Processing Unit), at least one communication interface 63, memory 64, at least one communication bus 62. Wherein a communication bus 62 is used to enable the connection communication between these components. The communication interface 63 may include a Display (Display) and a Keyboard (Keyboard), and the optional communication interface 63 may also include a standard wired interface and a standard wireless interface. The Memory 64 may be a high-speed RAM Memory (volatile Random Access Memory) or a non-volatile Memory (non-volatile Memory), such as at least one disk Memory. The memory 64 may optionally be at least one memory device located remotely from the processor 61. Wherein the processor 61 may be in connection with the apparatus described in fig. 6, an application program is stored in the memory 64, and the processor 61 calls the program code stored in the memory 64 for performing any of the above-mentioned method steps.
The communication bus 62 may be a Peripheral Component Interconnect (PCI) bus or an Extended Industry Standard Architecture (EISA) bus. The communication bus 62 may be divided into an address bus, a data bus, a control bus, and the like. For ease of illustration, only one thick line is shown in FIG. 7, but this is not intended to represent only one bus or type of bus.
The memory 64 may include a volatile memory (RAM), such as a random-access memory (RAM); the memory may also include a non-volatile memory (english: non-volatile memory), such as a flash memory (english: flash memory), a hard disk (english: hard-drive, abbreviated: HDD) or a solid-state drive (english: SSD); the memory 64 may also comprise a combination of the above types of memory.
The processor 61 may be a Central Processing Unit (CPU), a Network Processor (NP), or a combination of CPU and NP.
The processor 61 may further include a hardware chip. The hardware chip may be an application-specific integrated circuit (ASIC), a Programmable Logic Device (PLD), or a combination thereof. The aforementioned PLD may be a Complex Programmable Logic Device (CPLD), a field-programmable gate array (FPGA), a General Array Logic (GAL), or any combination thereof.
Optionally, the memory 64 is also used to store program instructions. The processor 61 may call program instructions to implement the dual-energy exposure control method of the X-ray high-voltage generator as shown in the embodiments of fig. 1, fig. 2a to fig. 2d, fig. 3 and fig. 4 of the present application.
An embodiment of the present invention further provides a non-transitory computer storage medium, where the computer storage medium stores computer-executable instructions, and the computer-executable instructions can execute the dual-energy exposure control method in the method embodiments of fig. 1, 2a to 2d, 3, and 4. The storage medium may be a magnetic Disk, an optical Disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a flash Memory (FlashMemory), a Hard Disk (Hard Disk Drive, abbreviated as HDD), a Solid-State Drive (SSD), or the like; the storage medium may also comprise a combination of memories of the kind described above.
An embodiment of the present invention further provides a dual-energy exposure system of an X-ray high voltage generator, as shown in fig. 8, including:
the upper computer 71 is connected with the electronic equipment; the upper computer is used for setting the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode, and sending the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode to the electronic equipment;
The electronic device 72 shown in fig. 7; the electronic device 72 performs dual-energy exposure based on the target dual-energy exposure mode sent by the upper computer 71 and the exposure parameters corresponding to the exposure mode.
In the dual-energy exposure system of the X-ray high-voltage generator provided by the embodiment of the invention, the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode are set through the upper computer 71, the exposure parameters corresponding to the target dual-energy exposure mode and the exposure mode are sent to the electronic equipment, and the electronic equipment 72 carries out exposure based on the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode sent by the upper computer 71. The operation is simple and the use is easy.
Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope defined by the appended claims.
Claims (10)
1. A dual-energy exposure control method of an X-ray high-voltage generator is characterized by comprising the following steps:
acquiring a target dual-energy exposure mode; wherein the target dual-energy exposure mode comprises dual-energy single exposure and dual-energy sequence exposure;
Determining a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; wherein the current exposure mode is high-energy exposure or low-energy exposure;
extracting exposure parameters corresponding to the current exposure mode, and exposing the target body based on the exposure parameters;
acquiring a real-time exposure feedback parameter, and judging whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; wherein the real-time exposure feedback parameters comprise at least one of exposure time and exposure dose;
and when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter, switching to the next exposure mode to expose the target body based on the exposure parameter corresponding to the next exposure mode.
2. The method of claim 1, wherein the exposure cut-off parameter is an exposure time; wherein the obtaining the real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches the exposure cut-off parameter comprises:
when the target body is exposed, starting an exposure timer to obtain real-time exposure time;
judging whether the real-time exposure time reaches the exposure time;
And when the real-time exposure time reaches the exposure time, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
3. The method of claim 1, wherein the exposure parameters corresponding to the current exposure mode comprise a tube voltage, a tube current, and the exposure time.
4. The method of claim 1, wherein the exposure cut-off parameter is exposure dose; wherein the obtaining the real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches the exposure cut-off parameter comprises:
when the target body is exposed, acquiring the detected real-time exposure dose corresponding to the target body;
judging whether the real-time exposure dose reaches the exposure dose;
and when the real-time exposure dose reaches the exposure dose, switching to the next exposure mode to expose the target body based on the exposure parameters corresponding to the next exposure mode.
5. The method of claim 4, wherein the exposure parameter corresponding to the current exposure mode comprises a tube voltage.
6. The method of any of claims 1-5, wherein exposing the target based on the exposure parameters comprises:
judging whether the primary hand brake is pressed down, and if the primary hand brake is not pressed down, returning to the step of executing the target-taking dual-energy exposure mode;
when the primary hand brake is pressed down, judging whether a secondary hand brake is pressed down;
when the secondary hand brake is not pressed within the preset time, returning to the step of acquiring the target dual-energy exposure mode;
and when the secondary hand brake is pressed down, exposing the target body based on the exposure parameters.
7. A dual-energy exposure control device of an X-ray high voltage generator, comprising:
the first acquisition module is used for acquiring a target dual-energy exposure mode; wherein the target dual-energy exposure mode comprises dual-energy single exposure and dual-energy sequence exposure;
the exposure mode determining module is used for determining a current exposure mode and a next exposure mode based on the target dual-energy exposure mode; wherein the current exposure mode is high-energy exposure or low-energy exposure;
the extraction module is used for extracting the exposure parameters corresponding to the current exposure mode and exposing the target body based on the exposure parameters;
The second acquisition module is used for acquiring a real-time exposure feedback parameter and judging whether the real-time exposure feedback parameter reaches an exposure cut-off parameter in the exposure parameters; wherein the real-time exposure feedback parameters comprise at least one of exposure time and exposure dose;
and the switching module is used for switching to the next exposure mode when the real-time exposure feedback parameter reaches a preset exposure cut-off parameter so as to expose the target body based on the exposure parameter corresponding to the next exposure mode.
8. An electronic device, comprising:
a memory and a processor, the memory and the processor being communicatively connected to each other, the memory having stored therein computer instructions, the processor executing the computer instructions to perform the dual-energy exposure control method of any one of claims 1 to 6.
9. A computer-readable storage medium storing computer instructions for causing a computer to execute the dual-energy exposure control method according to any one of claims 1 to 6.
10. A dual energy exposure system for an X-ray high voltage generator, comprising:
The upper computer is connected with the electronic equipment; the upper computer is used for setting the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode, and sending the target dual-energy exposure mode and the exposure parameters corresponding to the exposure mode to the electronic equipment; the electronic device of claim 8; and the electronic equipment carries out dual-energy exposure based on the target dual-energy exposure mode sent by the upper computer and the exposure parameters corresponding to the exposure mode.
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