CN111763573A - Alkaline glass substrate cleaning fluid composition - Google Patents
Alkaline glass substrate cleaning fluid composition Download PDFInfo
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- CN111763573A CN111763573A CN201910261609.7A CN201910261609A CN111763573A CN 111763573 A CN111763573 A CN 111763573A CN 201910261609 A CN201910261609 A CN 201910261609A CN 111763573 A CN111763573 A CN 111763573A
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/08—Silicates
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/10—Carbonates ; Bicarbonates
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
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Abstract
An alkaline glass substrate cleaning solution composition, which comprises the following components: 1. the corrosion inhibitor comprises a strong alkaline substance, 2, a chelating agent, 3, a dispersing agent, 4, a corrosion inhibitor and 5, high-purity water, and comprises the following components in percentage by mass: 1-45% of strong alkaline substance, preferably 3-30%, 0.1-50% of chelating agent, preferably 0.5-20%, 0.1-25% of dispersing agent, preferably 0.2-20%, 0.1-15% of corrosion inhibitor, preferably 0.2-10%, 30-99.9% of deionized water, preferably 40-98%; the alkaline glass substrate cleaning solution composition disclosed by the invention is non-toxic and non-corrosive, has no low-boiling-point organic volatile matter, has no pollution to the environment, and does not corrode a glass substrate while effectively removing residues on the surface of a substrate.
Description
Technical Field
The invention relates to the field of materials in a liquid crystal display manufacturing process, in particular to an alkaline glass substrate cleaning solution composition before photoresist coating in a display manufacturing process.
Background
The liquid crystal display has the advantages of small volume, light weight, low radiation, low power consumption, full color and the like, is widely applied to various display terminals, has the industrial scale at the high-speed growth stage, and is always the mainstream product in the display field at present and in the future for a long time; the glass substrate is used as a front plate of a display screen by utilizing the transparency of any display, namely, the glass substrate is used for reading images and the like outside, the glass substrate in the liquid crystal display is divided into an upper substrate (a color filter substrate) and a lower substrate (a TFT array substrate), liquid crystal materials are injected between the two glass substrates to realize liquid crystal display, the glass substrate is used as a mother set no matter the TFT array or the color filter is manufactured, the liquid crystal display is realized through a series of photoetching processes (gluing, developing, etching, removing glue and the like), the manufacturing process is similar to a semiconductor wafer manufacturing process, and in the photoetching process, the requirement on the cleanliness of the glass substrate is very high, and the photoetching effect is directly influenced by the cleanliness; the unclean surface of the glass substrate can cause uneven subsequent gluing and etching, obvious defects exist, the adhesive force of the coated photoresist can be reduced, the photoresist can fall off, and the quality defects of subsequent patterning transfer such as development and etching can be caused, therefore, the glass substrate needs to be strictly cleaned before the photoresist is coated, so that the requirements of the photoetching process can be met; when the glass substrates used by the TFT-LCD are stored, a layer of paper is arranged among the glass substrates for separation, a lot of oil stains, cerium oxide residues and the like are generated after the glass substrates are placed for a long time, and in addition, a plurality of paper scraps, glass powder, organic matters, metal objects, fingerprints and other impurities exist, so that in the manufacturing process of the TFT-LCD display screen, the glass is cleaned and the subsequent photoetching process can be carried out; in the prior art, CN107354017A discloses a TFT-LCD display substrate cleaning solution, which contains too high content of potassium hydroxide, and in order to form a homogeneous solution with other components, a large amount of surfactant and cosolvent are required to be introduced, so that a large amount of foam is produced during the cleaning process, which causes surface residue and watermarks, and at the same time, the glass substrate is also corroded due to too high content of potassium hydroxide; CN107245388A discloses a TFT-LCD glass substrate cleaning agent, which contains sodium tripolyphosphate which can cause eutrophication of water body and can cause water body pollution.
Disclosure of Invention
In order to solve the problems, the invention provides an efficient and environment-friendly alkaline glass substrate cleaning solution composition which is suitable for use before photoresist coating in the manufacturing process of a TFT-LCD display screen.
The technical scheme adopted by the invention for solving the technical problems is as follows: an alkaline glass substrate cleaning solution composition, characterized in that: the composition is as follows: 1. strong alkaline substance, 2 chelating agent, 3 dispersing agent, 4 corrosion inhibitor, 5 high-purity water, which comprises the following components in percentage by mass,
1-45% of strong alkaline substance, preferably 3-30%;
chelating agent 0.1-50%, preferably 0.5-20%;
0.1 to 25 percent of dispersant, preferably 0.2 to 20 percent;
0.1 to 15%, preferably 0.2 to 10%, of a corrosion inhibitor;
30-99.9% of deionized water, preferably 40-98%.
Further, the strongly basic substance is selected from inorganic strongly basic substances and/or organic strongly basic substances, wherein the inorganic strongly basic substance is preferably one or more of potassium hydroxide (KOH), sodium hydroxide specification (NaOH), lithium hydroxide (LiOH), sodium carbonate (Na 2CO 3), potassium carbonate (K2 CO 3), sodium bicarbonate (NaHCO 3), sodium silicate (Na 2SiO 3) and the like; the organic strong basic substance is preferably one or more of tetramethylammonium hydroxide, hydroxyethyltrimethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, hexadecyltrimethylammonium hydroxide and benzyltrimethylammonium hydroxide.
Further, the chelating agent is selected from organic carboxylic acids, organic amines and/or amino carboxylic acids; the organic carboxylic acid is preferably gluconic acid, tartaric acid, carboxymethyltartaric acid, citric acid, maleic acid, succinic acid, carboxymethyloxysuccinic acid, 1,2,3, 4-cyclopentanetetracarboxylic acid, or the like; preferred organic amines are diethylamine, dipropylamine, diisopropylamine, dibutylamine, diisobutylamine, triethylamine, tripropylamine, tributylamine, tripentylamine, dimethylethylamine, methyldiethylamine, methyldipropylamine, choline, monoethanolamine, diethanolamine, triethanolamine, diglycolamine, monopropanolamine, monoisopropanolamine, 2-aminoethanol, 2- (ethylamino) ethanol, 2- (methylamino) ethanol, N-methyldiethanolamine, N, N-dimethylethanolamine, N, N-diethylaminoethanol, 2- (2-aminoethylamino) -1-ethanol, 1-amino-2-propanol, 2-amino-1-propanol, 3-amino-1-propanol, 4-amino-1-butanol, Dibutanolamine, (butoxymethyl) diethylamine, (methoxymethyl) dimethylamine, (butoxymethyl) dimethylamine, (isobutoxymethyl) dimethylamine, (methoxymethyl) diethanolamine, (hydroxyethyloxymethyl) diethylamine, methylmethoxymethyl) aminoethane, methyl (methoxymethyl) aminoethanol, methyl (butoxymethyl) aminoethanol, 2- (2-aminoethoxy) ethanol, 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- (2-hydroxyethyl) methylpiperazine, N- (3-aminopropyl) morpholine, 2-methylpiperazine, 1-amino-4-methylpiperazine, 1-benzylpiperazine, 1-phenylpiperazine and the like; preferred aminocarboxylic acids are the environmentally friendly N, N-dicarboxyamino-2-carboxypropanesulfonic acids, 3-hydroxy-2, 2-iminodisuccinic acid tetra-acid (HIDS), methylglycinediacetic acid (MGDA), nitrilotriacetic acid (NTA), glutamic acid-N, N-diacetic acid (GLDA), hydroxyethylethylenediaminetriacetic acid (HEEDTA), ethylenediamine difumaric acid (EDDF), ethylenediamine dimalic acid (EDDM), ethylenediamine ditartaric acid (EDDT), ethylenediamine disuccinic acid (EDDS), aspartic acid-N, N-diacetic acid (ASDA), hydroxyethylenediaminetetraacetic acid (HEDTA), iminodisuccinic acid (IDS), ethylenediaminetetraacetic acid (EDTA), iminodifumaric acid (IDF), iminoditartaric acid (IDT), iminodimaleic acid (IDMAL), Iminodimalic acid (IDM), ethylenediamine dimaleic acid (EDDMAL), diethylenetriamine pentaacetic acid (DTPA), aspartic acid diethoxy succinic Acid (AES), salts thereof, and combinations thereof; the chelating agent may be selected from one or more of the above chelating agents.
Further, the dispersant is selected from commercial cationic surfactants, anionic surfactants, nonionic surfactants and/or amphiphilic surfactants, preferably cocoammonium acetate dodecyltrimethylammonium chloride, hexadecyltrimethylammonium chloride, stearyltrimethylammonium chloride; the anionic surfactant is preferably sodium lauryl sulfate, sodium polyoxyethylene lauryl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, triethanolamine polyoxyethylene lauryl ether sulfate, sodium dodecylbenzenesulfonate, a partially hydrogenated sodium salt of an animal fatty acid, lauryl alcohol ether phosphate, isooctyl alcohol polyoxyethylene ether phosphate, nonylphenol polyoxyethylene ether phosphate, isotridecyl alcohol ether phosphate series, isodecyl alcohol ether phosphate series, polyoxyethylene (8) octyl ether carboxylate, polyoxyethylene (10.5) octyl ether carboxylate, polyoxyethylene (10) alkyl ether carboxylate, polyoxyethylene (2) ethyl ether carboxylate, polyoxyethylene (5) ethyl ether carboxylate, triethanolamine lauryl sulfate; the nonionic surfactant is preferably polyoxyethylene lauryl ether series, polyoxyethylene alkyl ether series, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, polyoxyethylene glyceryl fatty acid ester, polyethylene glycol monododecanoate, polyethylene glycol monostearate, polyethylene glycol distearate, polyoxyethylene hardened castor oil, polyoxyethylene alkylamine, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, glyceryl monostearate, polyoxyethylene glyceryl fatty acid ester, polyoxyethylene glyceryl monostearate, polyoxyethylene polyethylene glycol monostearate, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene sorbitan monooleate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene alkyl fatty amine, fatty acid alkylolamide, methyl cocoolamide; the amphiphilic surfactant is preferably lauryl betaine, yarrowia oil amide propyl betaine, [ N-cocoalkyl- (2-aminoethyl) -N- (2-hydroxyethyl) -N-carboxymethyl sodium ] ethylenediamine, dodecyl hydroxysulfobetaine, lauryl dimethyl amine oxide. Further, the corrosion inhibitor is selected from organic corrosion inhibitors containing nitrogen, oxygen, sulfur and other atoms, wherein one or more of polyols, phenols, azoles and imidazolines are preferred; the polyhydric alcohol is preferably one or more of ethylene glycol, 1, 2-propylene glycol, glycerol, diethylene glycol, dipropylene glycol, erythritol, xylitol or sorbitol; the phenols are preferably one or more of catechol, 4-methyl catechol, 4-tert-butyl catechol, 4-carboxyl catechol, pyrogallol, gallic acid, methyl gallate, ethyl gallate and n-propyl gallate; the azole is preferably one or more selected from 1,2, 4-triazole, 3-amino-1, 2, 4-triazole, 4-amino-1, 2, 4-triazole, 5-aminotetrazole, benzimidazole, 2-mercapto-1-methylimidazole, mercapto-benzothiazole, benzotriazole, methylbenzotriazole, 1-hydroxybenzotriazole and 1-phenyl-5-mercaptotetrazole, and the imidazoline is preferably imidazoline, 2-ethyl-2-imidazoline, 1-ethyl-3-methylimidazolium methylsulfate, imidazoline oleate, 2-methyl-2-imidazoline, 2-phenylimidazoline, 2-benzylimidazoline, 1-ethyl-3-methylimidazolium bis (trifluoromethylsulfonyl) imide, 2-imino-1-imidazoline acetic acid, 2-thiol imidazoline, 1-butyl-3-methyl imidazoline tetrafluoroboric acid and one or more of 1-ethyl-3-methyl imidazoline trifluoromethanesulfonic acid.
Furthermore, the deionized water with the resistance value larger than 18m omega/cm is selected.
Furthermore, the alkaline glass substrate cleaning solution provided by the invention is prepared by sequentially adding the components, stirring and dissolving, wherein the phenomenon of strong base heat release needs to be controlled in the dissolving process, the temperature in the whole dissolving process is controlled below 50 ℃, and the solution is filtered by a filter element of 0.1um after being completely dissolved.
Furthermore, the alkaline glass substrate cleaning solution of the invention can be directly used, or can be diluted by deionized water for use, wherein the dilution multiple is 2-500 times, preferably 10-200 times, and the pH of the diluted solution is controlled between 9-14.
The invention has the beneficial effects that: the alkaline glass substrate cleaning solution composition disclosed by the invention is non-toxic and non-corrosive, has no low-boiling-point organic volatile matter, has no pollution to the environment, and does not corrode a glass substrate while effectively removing residues on the surface of a substrate.
Drawings
FIG. 1 is a graph of compositional content data according to an example of the present invention.
Detailed Description
In order to make the technical solution of the present invention more apparent, the present invention is further described with reference to the following embodiments.
As shown in fig. 1, an alkaline glass substrate cleaning solution composition according to an embodiment of the present invention is characterized in that: the composition is as follows: 1. strong alkaline substance, 2 chelating agent, 3 dispersing agent, 4 corrosion inhibitor, 5 high-purity water, which comprises the following components in percentage by mass,
1-45% of strong alkaline substance, preferably 3-30%;
chelating agent 0.1-50%, preferably 0.5-20%;
0.1 to 25 percent of dispersant, preferably 0.2 to 20 percent;
0.1 to 15%, preferably 0.2 to 10%, of a corrosion inhibitor;
30-99.9% of deionized water, preferably 40-98%.
Further, the strongly basic substance is selected from inorganic strongly basic substances and/or organic strongly basic substances, wherein the inorganic strongly basic substance is preferably one or more of potassium hydroxide (KOH), sodium hydroxide specification (NaOH), lithium hydroxide (LiOH), sodium carbonate (Na 2CO 3), potassium carbonate (K2 CO 3), sodium bicarbonate (NaHCO 3), sodium silicate (Na 2SiO 3) and the like; the organic strong basic substance is preferably one or more of tetramethylammonium hydroxide, hydroxyethyltrimethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, hexadecyltrimethylammonium hydroxide and benzyltrimethylammonium hydroxide.
Further, the chelating agent is selected from organic carboxylic acids, organic amines and/or amino carboxylic acids; the organic carboxylic acid is preferably gluconic acid, tartaric acid, carboxymethyltartaric acid, citric acid, maleic acid, succinic acid, carboxymethyloxysuccinic acid, 1,2,3, 4-cyclopentanetetracarboxylic acid, or the like; preferred organic amines are diethylamine, dipropylamine, diisopropylamine, dibutylamine, diisobutylamine, triethylamine, tripropylamine, tributylamine, tripentylamine, dimethylethylamine, methyldiethylamine, methyldipropylamine, choline, monoethanolamine, diethanolamine, triethanolamine, diglycolamine, monopropanolamine, monoisopropanolamine, 2-aminoethanol, 2- (ethylamino) ethanol, 2- (methylamino) ethanol, N-methyldiethanolamine, N, N-dimethylethanolamine, N, N-diethylaminoethanol, 2- (2-aminoethylamino) -1-ethanol, 1-amino-2-propanol, 2-amino-1-propanol, 3-amino-1-propanol, 4-amino-1-butanol, Dibutanolamine, (butoxymethyl) diethylamine, (methoxymethyl) dimethylamine, (butoxymethyl) dimethylamine, (isobutoxymethyl) dimethylamine, (methoxymethyl) diethanolamine, (hydroxyethyloxymethyl) diethylamine, methylmethoxymethyl) aminoethane, methyl (methoxymethyl) aminoethanol, methyl (butoxymethyl) aminoethanol, 2- (2-aminoethoxy) ethanol, 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- (2-hydroxyethyl) methylpiperazine, N- (3-aminopropyl) morpholine, 2-methylpiperazine, 1-amino-4-methylpiperazine, 1-benzylpiperazine, 1-phenylpiperazine and the like; preferred aminocarboxylic acids are the environmentally friendly N, N-dicarboxyamino-2-carboxypropanesulfonic acids, 3-hydroxy-2, 2-iminodisuccinic acid tetra-acid (HIDS), methylglycinediacetic acid (MGDA), nitrilotriacetic acid (NTA), glutamic acid-N, N-diacetic acid (GLDA), hydroxyethylethylenediaminetriacetic acid (HEEDTA), ethylenediamine difumaric acid (EDDF), ethylenediamine dimalic acid (EDDM), ethylenediamine ditartaric acid (EDDT), ethylenediamine disuccinic acid (EDDS), aspartic acid-N, N-diacetic acid (ASDA), hydroxyethylenediaminetetraacetic acid (HEDTA), iminodisuccinic acid (IDS), ethylenediaminetetraacetic acid (EDTA), iminodifumaric acid (IDF), iminoditartaric acid (IDT), iminodimaleic acid (IDMAL), Iminodimalic acid (IDM), ethylenediamine dimaleic acid (EDDMAL), diethylenetriamine pentaacetic acid (DTPA), aspartic acid diethoxy succinic Acid (AES), salts thereof, and combinations thereof; the chelating agent may be selected from one or more of the above chelating agents.
Further, the dispersant is selected from commercial cationic surfactants, anionic surfactants, nonionic surfactants and/or amphiphilic surfactants, preferably cocoammonium acetate dodecyltrimethylammonium chloride, hexadecyltrimethylammonium chloride, stearyltrimethylammonium chloride; the anionic surfactant is preferably sodium lauryl sulfate, sodium polyoxyethylene lauryl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, triethanolamine polyoxyethylene lauryl ether sulfate, sodium dodecylbenzenesulfonate, a partially hydrogenated sodium salt of an animal fatty acid, lauryl alcohol ether phosphate, isooctyl alcohol polyoxyethylene ether phosphate, nonylphenol polyoxyethylene ether phosphate, isotridecyl alcohol ether phosphate series, isodecyl alcohol ether phosphate series, polyoxyethylene (8) octyl ether carboxylate, polyoxyethylene (10.5) octyl ether carboxylate, polyoxyethylene (10) alkyl ether carboxylate, polyoxyethylene (2) ethyl ether carboxylate, polyoxyethylene (5) ethyl ether carboxylate, triethanolamine lauryl sulfate; the nonionic surfactant is preferably polyoxyethylene lauryl ether series, polyoxyethylene alkyl ether series, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, polyoxyethylene glyceryl fatty acid ester, polyethylene glycol monododecanoate, polyethylene glycol monostearate, polyethylene glycol distearate, polyoxyethylene hardened castor oil, polyoxyethylene alkylamine, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, glyceryl monostearate, polyoxyethylene glyceryl fatty acid ester, polyoxyethylene glyceryl monostearate, polyoxyethylene polyethylene glycol monostearate, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene sorbitan monooleate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene alkyl fatty amine, fatty acid alkylolamide, methyl cocoolamide; the amphiphilic surfactant is preferably lauryl betaine, yarrowia oil amide propyl betaine, [ N-cocoalkyl- (2-aminoethyl) -N- (2-hydroxyethyl) -N-carboxymethyl sodium ] ethylenediamine, dodecyl hydroxysulfobetaine, lauryl dimethyl amine oxide. Further, the corrosion inhibitor is selected from organic corrosion inhibitors containing nitrogen, oxygen, sulfur and other atoms, wherein one or more of polyols, phenols, azoles and imidazolines are preferred; the polyhydric alcohol is preferably one or more of ethylene glycol, 1, 2-propylene glycol, glycerol, diethylene glycol, dipropylene glycol, erythritol, xylitol or sorbitol; the phenols are preferably one or more of catechol, 4-methyl catechol, 4-tert-butyl catechol, 4-carboxyl catechol, pyrogallol, gallic acid, methyl gallate, ethyl gallate and n-propyl gallate; the azole is preferably one or more selected from 1,2, 4-triazole, 3-amino-1, 2, 4-triazole, 4-amino-1, 2, 4-triazole, 5-aminotetrazole, benzimidazole, 2-mercapto-1-methylimidazole, mercapto-benzothiazole, benzotriazole, methylbenzotriazole, 1-hydroxybenzotriazole and 1-phenyl-5-mercaptotetrazole, and the imidazoline is preferably imidazoline, 2-ethyl-2-imidazoline, 1-ethyl-3-methylimidazolium methylsulfate, imidazoline oleate, 2-methyl-2-imidazoline, 2-phenylimidazoline, 2-benzylimidazoline, 1-ethyl-3-methylimidazolium bis (trifluoromethylsulfonyl) imide, 2-imino-1-imidazoline acetic acid, 2-thiol imidazoline, 1-butyl-3-methyl imidazoline tetrafluoroboric acid and one or more of 1-ethyl-3-methyl imidazoline trifluoromethanesulfonic acid.
Furthermore, the deionized water with the resistance value larger than 18m omega/cm is selected.
In order to further examine the cleaning effect of the alkaline glass substrate cleaning solution, the invention adopts the following technical means: spin coating Dow Corning high vacuum grease with a certain thickness on a glass substrate of 10cm multiplied by 10cm, pre-baking the glass substrate in an oven at 120 ℃ for 80s, and then cleaning the glass substrate diluted by a certain factor. After the cleaning treatment, washing with high-purity water, then drying with nitrogen, hard baking in an oven at 220 ℃, observing with an optical microscope and an electron microscope to confirm the cleaning effect, wherein the properties of the alkaline glass cleaning solution and the cleaning effect after dilution are shown in the following table:
as can be seen from the above table, the basic glass substrate cleaning solution of the present invention can obtain a solution with uniform dissolution in the range of 5-50 ℃, and the cleaning effect after dilution shows that the cleaning results of no residue, no defect and no substrate corrosion can be obtained.
In conclusion, the invention has the advantages that the invention provides the environment-friendly and efficient alkaline glass substrate cleaning solution which is nontoxic and non-corrosive, has no low-boiling-point organic volatile matter, has no pollution to the environment, and does not corrode a glass substrate while effectively removing the residue on the surface of the substrate; in addition, the wt% in fig. 1 means mass percentage.
The above embodiments may be combined with each other and further implemented without being mutually opposed.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (6)
1. An alkaline glass substrate cleaning solution composition, characterized in that: the composition is as follows: 1. strong alkaline substance, 2 chelating agent, 3 dispersing agent, 4 corrosion inhibitor, 5 high-purity water, which comprises the following components in percentage by mass,
1-45% of strong alkaline substance, preferably 3-30%;
chelating agent 0.1-50%, preferably 0.5-20%;
0.1 to 25 percent of dispersant, preferably 0.2 to 20 percent;
0.1 to 15%, preferably 0.2 to 10%, of a corrosion inhibitor;
30-99.9% of deionized water, preferably 40-98%.
2. The alkaline glass substrate cleaning solution composition according to claim 1, wherein: the strong alkaline substance is selected from inorganic strong alkaline substance and/or organic strong alkaline substance, wherein the inorganic strong alkaline substance is preferably one or more of potassium hydroxide (KOH), sodium hydroxide (NaOH), lithium hydroxide (LiOH), sodium carbonate (Na 2CO 3), potassium carbonate (K2 CO 3), sodium bicarbonate (NaHCO 3), sodium silicate (Na 2SiO 3) and the like; the organic strong basic substance is preferably one or more of tetramethylammonium hydroxide, hydroxyethyltrimethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, hexadecyltrimethylammonium hydroxide and benzyltrimethylammonium hydroxide.
3. The alkaline glass substrate cleaning solution composition according to claim 1, wherein: the chelating agent is selected from organic carboxylic acids, organic amines and/or amino carboxylic acids; the organic carboxylic acid is preferably gluconic acid, tartaric acid, carboxymethyltartaric acid, citric acid, maleic acid, succinic acid, carboxymethyloxysuccinic acid, 1,2,3, 4-cyclopentanetetracarboxylic acid, or the like; preferred organic amines are diethylamine, dipropylamine, diisopropylamine, dibutylamine, diisobutylamine, triethylamine, tripropylamine, tributylamine, tripentylamine, dimethylethylamine, methyldiethylamine, methyldipropylamine, choline, monoethanolamine, diethanolamine, triethanolamine, diglycolamine, monopropanolamine, monoisopropanolamine, 2-aminoethanol, 2- (ethylamino) ethanol, 2- (methylamino) ethanol, N-methyldiethanolamine, N, N-dimethylethanolamine, N, N-diethylaminoethanol, 2- (2-aminoethylamino) -1-ethanol, 1-amino-2-propanol, 2-amino-1-propanol, 3-amino-1-propanol, 4-amino-1-butanol, Dibutanolamine, (butoxymethyl) diethylamine, (methoxymethyl) dimethylamine, (butoxymethyl) dimethylamine, (isobutoxymethyl) dimethylamine, (methoxymethyl) diethanolamine, (hydroxyethyloxymethyl) diethylamine, methylmethoxymethyl) aminoethane, methyl (methoxymethyl) aminoethanol, methyl (butoxymethyl) aminoethanol, 2- (2-aminoethoxy) ethanol, 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- (2-hydroxyethyl) methylpiperazine, N- (3-aminopropyl) morpholine, 2-methylpiperazine, 1-amino-4-methylpiperazine, 1-benzylpiperazine, 1-phenylpiperazine and the like; preferred aminocarboxylic acids are the environmentally friendly N, N-dicarboxyamino-2-carboxypropanesulfonic acids, 3-hydroxy-2, 2-iminodisuccinic acid tetra-acid (HIDS), methylglycinediacetic acid (MGDA), nitrilotriacetic acid (NTA), glutamic acid-N, N-diacetic acid (GLDA), hydroxyethylethylenediaminetriacetic acid (HEEDTA), ethylenediamine difumaric acid (EDDF), ethylenediamine dimalic acid (EDDM), ethylenediamine ditartaric acid (EDDT), ethylenediamine disuccinic acid (EDDS), aspartic acid-N, N-diacetic acid (ASDA), hydroxyethylenediaminetetraacetic acid (HEDTA), iminodisuccinic acid (IDS), ethylenediaminetetraacetic acid (EDTA), iminodifumaric acid (IDF), iminoditartaric acid (IDT), iminodimaleic acid (IDMAL), Iminodimalic acid (IDM), ethylenediamine dimaleic acid (EDDMAL), diethylenetriamine pentaacetic acid (DTPA), aspartic acid diethoxy succinic Acid (AES), salts thereof, and combinations thereof; the chelating agent may be selected from one or more of the above chelating agents.
4. The alkaline glass substrate cleaning solution composition according to claim 1, wherein: the dispersant is selected from commercial cationic surfactant, anionic surfactant, nonionic surfactant and/or amphiphilic surfactant, preferably coconut ammonium acetate dodecyl trimethyl ammonium chloride, cetyl trimethyl ammonium chloride, stearyl trimethyl ammonium chloride; the anionic surfactant is preferably sodium lauryl sulfate, sodium polyoxyethylene lauryl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, triethanolamine polyoxyethylene lauryl ether sulfate, sodium dodecylbenzenesulfonate, a partially hydrogenated sodium salt of an animal fatty acid, lauryl alcohol ether phosphate, isooctyl alcohol polyoxyethylene ether phosphate, nonylphenol polyoxyethylene ether phosphate, isotridecyl alcohol ether phosphate series, isodecyl alcohol ether phosphate series, polyoxyethylene (8) octyl ether carboxylate, polyoxyethylene (10.5) octyl ether carboxylate, polyoxyethylene (10) alkyl ether carboxylate, polyoxyethylene (2) ethyl ether carboxylate, polyoxyethylene (5) ethyl ether carboxylate, triethanolamine lauryl sulfate; the nonionic surfactant is preferably polyoxyethylene lauryl ether series, polyoxyethylene alkyl ether series, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, polyoxyethylene glyceryl fatty acid ester, polyethylene glycol monododecanoate, polyethylene glycol monostearate, polyethylene glycol distearate, polyoxyethylene hardened castor oil, polyoxyethylene alkylamine, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene biphenylated phenyl ether series, sorbitan laurate, sorbitan trioleate, sorbitan monostearate, sorbitan sesquioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, glyceryl monostearate, polyoxyethylene glyceryl fatty acid ester, polyoxyethylene glyceryl monostearate, polyoxyethylene polyethylene glycol monostearate, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkyl amine, polyoxyethylene alkyl ether, polyoxyethylene lauryl ether, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene sorbitan monooleate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan stearate, polyoxyethylene alkyl fatty amine, fatty acid alkylolamide, methyl cocoolamide; the amphiphilic surfactant is preferably lauryl betaine, yarrowia oil amide propyl betaine, [ N-cocoalkyl- (2-aminoethyl) -N- (2-hydroxyethyl) -N-carboxymethyl sodium ] ethylenediamine, dodecyl hydroxysulfobetaine, lauryl dimethyl amine oxide.
5. The alkaline glass substrate cleaning solution composition according to claim 1, wherein: the corrosion inhibitor is selected from organic corrosion inhibitors containing nitrogen, oxygen, sulfur and other atoms, wherein one or more of polyols, phenols, azoles and imidazolines are preferred; the polyhydric alcohol is preferably one or more of ethylene glycol, 1, 2-propylene glycol, glycerol, diethylene glycol, dipropylene glycol, erythritol, xylitol or sorbitol; the phenols are preferably one or more of catechol, 4-methyl catechol, 4-tert-butyl catechol, 4-carboxyl catechol, pyrogallol, gallic acid, methyl gallate, ethyl gallate and n-propyl gallate; the azole is preferably one or more selected from 1,2, 4-triazole, 3-amino-1, 2, 4-triazole, 4-amino-1, 2, 4-triazole, 5-aminotetrazole, benzimidazole, 2-mercapto-1-methylimidazole, mercapto-benzothiazole, benzotriazole, methylbenzotriazole, 1-hydroxybenzotriazole and 1-phenyl-5-mercaptotetrazole, and the imidazoline is preferably imidazoline, 2-ethyl-2-imidazoline, 1-ethyl-3-methylimidazolium methylsulfate, imidazoline oleate, 2-methyl-2-imidazoline, 2-phenylimidazoline, 2-benzylimidazoline, 1-ethyl-3-methylimidazolium bis (trifluoromethylsulfonyl) imide, 2-imino-1-imidazoline acetic acid, 2-thiol imidazoline, 1-butyl-3-methyl imidazoline tetrafluoroboric acid and one or more of 1-ethyl-3-methyl imidazoline trifluoromethanesulfonic acid.
6. The alkaline glass substrate cleaning solution composition according to claim 1, wherein: the deionized water with the resistance value larger than 18m omega/cm is selected.
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