CN111739850A - Self-destruction chip embedded with energetic film and preparation method thereof - Google Patents
Self-destruction chip embedded with energetic film and preparation method thereof Download PDFInfo
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- CN111739850A CN111739850A CN202010656256.3A CN202010656256A CN111739850A CN 111739850 A CN111739850 A CN 111739850A CN 202010656256 A CN202010656256 A CN 202010656256A CN 111739850 A CN111739850 A CN 111739850A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/57—Protection from inspection, reverse engineering or tampering
- H01L23/573—Protection from inspection, reverse engineering or tampering using passive means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
- B81C1/00246—Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/345—Arrangements for heating
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Abstract
The disclosure provides a self-destruction chip embedded with an energy-containing film and a preparation method thereof. The chip takes an information chip to be damaged as a substrate layer, utilizes the MEMS technology to integrate and manufacture a micro-heater layer and an energy-containing thin film layer on the substrate layer in sequence, can obviously reduce the dosage of energy-containing materials in the self-destruction chip, improves the use safety, simultaneously can ensure that the application performance of the energy-containing thin film and the self-destruction chip is not degraded under various severe environments by further using high-temperature-resistant energy-containing materials and low-temperature packaging technology, and increases the heat dissipation capacity, mechanical properties and physical properties of the chip.
Description
Technical Field
The invention belongs to the technical field of information security and self-destruction, and also belongs to the field of micro-initiating explosive devices, and particularly relates to a self-destruction chip embedded with an energy-containing film and a preparation method thereof.
Background
With the development of informatization and intellectualization, information security has become one of the major technical problems at the national level. So far, the method for realizing physical self-destruction of chips with important information is the method with highest feasibility and the most thorough method for guaranteeing the information safety.
One type of current chip physical self-destruction mode is to physically destroy the chip by means of overcurrent power supply, strong acid, shape memory alloy and the like, but the mode has the risk that the chip cannot be completely destroyed. If the cost is not counted, the advanced physical and chemical analysis means is adopted to carry out deep anatomical analysis on the chip, and the information in the chip can still be read out.
The chip is physically self-destructed by adopting an energetic material, the packaging shell and the silicon-based storage chip inside the packaging shell need to be destroyed simultaneously, larger impact energy is needed, and the packaging shell is limited by the process, so that the medicine loading is larger, the output energy is not easy to control, and an additional safety problem can be brought when the target silicon-based chip is destroyed.
Disclosure of Invention
The invention aims to provide a planar self-destruction chip embedded with energetic materials, which can ensure the high-efficiency destruction capability of a target silicon-based chip, needs less medicine loading amount and has good safety.
The self-destruction chip embedded with the energy-containing film is formed by sequentially and integrally packaging a substrate layer, a micro-heater layer and an energy-containing film layer, wherein,
the substrate layer is an information chip to be damaged;
the micro-heater layer is a metal film formed on the substrate layer, is connected with an external control system or a power supply system, and can generate heat under the action of current to heat the energy-containing film;
the energy-containing film is attached to the substrate layer and the micro-heater layer, and burns or explodes after being heated to form thorough physical damage to the information chip to be damaged.
Optionally, the microheater layer comprises two metal films:
the lower layer is a bridge area for converting electric energy given by the outside into heat energy;
the second layer is a bonding pad, which is made above the bridge area and is used for protecting the bridge area material and connecting the micro-heater layer with an external circuit.
Optionally, the film thickness of the bridge region and the bonding pad are both 500-1500 nm.
Optionally, the bridge region is made of nickel-cadmium alloy, platinum or tungsten, and the pad is made of copper, aluminum or gold.
Optionally, the resistance of the micro-heater is 1-10 Ω.
Optionally, the energetic film layer is made of a high-temperature-resistant energetic material, and the thermal decomposition peak temperature is more than or equal to 350 ℃.
Optionally, the energetic film is a cadmium azide primary explosive energetic film or a thermite multilayer film.
On the other hand, the invention provides a preparation method of the self-destruction chip embedded with the energetic film, which comprises the following steps:
manufacturing the micro-heater layer on the substrate layer in a film coating mode;
manufacturing the energy-containing thin film layer on the surface of the micro-heater layer by adopting an MEMS (micro-electromechanical systems) process;
integrating the self-destruction chip with an external circuit;
and packaging and protecting the self-destruction chip.
Preferably, the energy-containing thin film is made of cadmium azide initiating explosive, and the forming process is a micro-control direct writing process and comprises the following steps:
mixing powdery cadmium azide initiating explosive with a binder, a solvent and the like to prepare cadmium azide initiating explosive slurry;
and forming the energy-containing film at the designated position by micro-control direct writing.
Preferably, a multilayer film of thermite is used as the energetic film, and the manufacturing process is magnetron sputtering: and sequentially depositing the metal oxide and the active metal in a laminated manner, wherein the outermost layer is the metal oxide.
The invention takes an information chip to be damaged as a substrate layer, and utilizes the MEMS technology to integrate and manufacture a nano-structure energetic material film obtained by the charging technologies such as magnetron sputtering coating, micro-control direct writing and the like and a micro-heater obtained by the MEMS technologies such as photoetching, masking, vacuum coating and the like on the substrate layer to obtain the embedded self-destruction chip. The chip directly realizes high-precision point-determined impact on the information chip to be damaged by utilizing high-temperature and high-pressure heat particles formed by the transient action of the embedded energetic film, and thus physical destruction is completed.
Compared with the prior art, the beneficial effects of the invention are mainly embodied in the following aspects:
(1) the dosage of the energetic material in the self-destruction chip can be obviously reduced, and the use safety is improved. The energy-containing thin film is embedded as an energy-containing material, high-temperature and high-pressure heat particles can be formed under the transient action of the energy-containing thin film, high-precision point impact can be realized on an information chip to be damaged, the physical structure of a target chip is thoroughly destroyed, and the energy-containing material has the advantages of being micro, quick, accurate and controllable in energy output, disposable, thorough in physical destruction and the like, and meanwhile, due to the fact that the using amount is as low as a sub-milligram level, compared with the traditional charging, the reduction range is up to more than 90%, and extra safety problems cannot be brought to a.
(2) By adopting the high-temperature-resistant energy-containing film, the low-temperature packaging of the embedded self-destruction chip can be further realized, the application performance of the energy-containing film and the self-destruction chip is ensured not to be degraded under various severe environments (air ions, dust, moisture and the like), the heat dissipation capacity, the mechanical property and the physical property of the chip are increased, and the reliability and the service life are improved.
(3) The structure design and the manufacturing process are completely compatible with the MEMS process, batch production can be realized, the consistency and the reliability can be improved, and the production cost can be reduced.
Drawings
The foregoing and other objects, features and advantages of the disclosure will be apparent from the following more particular descriptions of exemplary embodiments of the disclosure as illustrated in the accompanying drawings wherein like reference numbers generally represent like parts throughout the exemplary embodiments of the disclosure.
FIG. 1 is a schematic structural diagram of an exemplary embodiment of a self-destruct chip according to the present disclosure;
FIG. 2 is a schematic diagram of an exemplary microheater layer;
fig. 3 is a flow chart of an exemplary method for preparing the self-destruct chip of the present disclosure.
Detailed Description
Preferred embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.
As shown in fig. 1, the self-destruct chip embedded with the energy-containing thin film according to the exemplary embodiment is formed by integrally packaging a substrate layer 1, a micro-heater layer 2 and an energy-containing thin film layer 3. Wherein:
1: the substrate layer is an information chip to be damaged;
2: the micro-heater layer is a metal film formed on the substrate layer in a film coating mode, is connected with an external control system or a power supply system, and can generate heat under the action of current to heat the energy-containing thin film layer;
3: the energy-containing thin film layer is a thin film made of energy-containing materials through the Mems process, and the thin film is heated to generate combustion or explosion so as to form thorough physical damage to the information chip to be damaged.
The self-destruction chip is connected with an external circuit through the micro-heater layer, and after receiving an external self-destruction instruction, the self-destruction chip is switched on to supply power to the micro-heater layer and heat the energy-containing thin film layer, so that the energy-containing thin film layer is exploded. The micro-heater layer is a metal film formed on the information chip to be damaged on the substrate layer through an MEMS (micro-electro-mechanical systems) process, and the energy-containing thin film layer is also an energy-containing material thin film formed on the substrate layer chip and the micro-heater layer through a micro-structure processing process. And integrally packaging the substrate layer, the micro-heater layer and the energy-containing thin film layer to obtain the self-destruction chip embedded with the energy-containing thin film. The chip achieves planarization and significantly reduces the amount of loading.
Optionally, the microheater layer includes two metal films, as shown in fig. 2:
the lower layer is a bridge area 5 used for converting electric energy given by the outside into heat energy;
the second layer is a bond pad 6, fabricated over the bridge region, for protecting the bridge region material and the circuit connections between the microheater layer and external devices.
Wherein, the material of the bridge region is an oxidation-resistant and corrosion-resistant resistance material, preferably Ni-Cr alloy, platinum, tungsten and the like, and the film thickness range is 500-1500 nm; the material of the bonding pad is preferably copper, aluminum, gold and the like, and the film thickness is 500-1500 nm.
The bridge area of the micro heater can be made into any structures such as rectangle, V-shaped, square, snake-shaped and the like according to the requirement.
In an exemplary embodiment, a Ni-Cr alloy (where Ni: Cr 80:20) was chosen as the microheater bridge region material, with a thickness of 900 nm. Bridge zone size of microheater: the length is 0.4mm, and the width is 0.2 mm; copper is selected as the material of the micro-heater bonding pad, and the size of the micro-heater bonding pad is 4mm in length and 2mm in width.
Optionally, the resistance of the microheater layer is 1-10 Ω. Under the action of the direct current of less than or equal to 5A, the micro heater receives electric energy and converts the electric energy into heat energy, and the heat energy acts on the energy-containing thin film layer to enable the energy-containing thin film layer to combust or explode.
As a preferred scheme, the energetic thin film layer is made of energetic materials which can resist high temperature and have a preparation process compatible with MEMS technology. Optionally, the thermal decomposition peak temperature is more than or equal to 350 ℃.
Preferably, a cadmium azide primary explosive energetic film or a thermite multilayer film is adopted. The energetic material can meet the heat resistance requirement in integrated packaging processes such as wave soldering, low-temperature injection molding and the like.
In the preferred example 1, the cadmium azide energy content in the cadmium azide slurry is 92%, and the obtained cadmium azide energy-containing film has a thickness of 0.5 mm.
In the preferable embodiment 2, the selected multilayer film of thermite is Al/CuO, the single-layer thickness of Al/CuO is 150nm/150nm respectively, and the total thickness is 10 μm.
FIG. 3 provides a method for preparing a self-destruct chip according to an exemplary embodiment, comprising the steps of:
(1) through the MEMS process: cleaning → film deposition → glue spreading → film firming → photoetching → development → post-baking → etching → removing the glue → cleaning, and the micro-heater layer 2 is made on the information chip 1 to be damaged.
The bridge area and the bonding pad of the micro-heater can be manufactured by combining magnetron sputtering and patterning processes.
(2) The energy-containing film is manufactured at the appointed position on the surface of the chip by adopting a micro-control direct writing technology or a magnetron sputtering coating technology and combining a physical mask technology.
Preferably, when the cadmium azide primary explosive film is used as the energy-containing film, a micro-control direct-writing process is combined with a physical mask technology, and direct-writing forming is carried out at a specified position above the micro-heater: firstly, mixing powdery cadmium azide initiating explosive with a binder, a solvent and the like to prepare cadmium azide initiating explosive slurry, and then carrying out micro-control direct writing on a specified position by using a micro-control direct writing platform to form an energy-containing film, wherein the content of cadmium azide in the cadmium azide initiating explosive slurry is not less than 70%, and the thickness of the obtained energy-containing film is controllable within the range of 0.1mm-2 mm.
Preferably, when the thermite multilayer film is used as the energy-containing film, the metal oxide and the active metal in the thermite multilayer film can be sequentially deposited at the designated position above the micro heater by adopting a magnetron sputtering coating process combined with a physical mask technology, and the outermost layer is the metal oxide. The thickness of the obtained energy-containing film is controllable within the range of 1-10 mu m. The thickness of the single-layer metal oxide/active metal is not more than 300nm, and the thickness ratio is controllable within the range of 1:2-2: 1.
(3) The connection between the bonding pad and an external device is realized by adopting approaches such as reflow soldering or wave soldering, so that the chip is integrated into a designated circuit, then the chip is packaged and protected by adopting low-temperature packaging technologies such as low-temperature injection molding, the application performance of the energy-containing film and the self-destruction chip is ensured not to be degraded under various severe environments (air ions, dust, moisture and the like), and the heat dissipation capacity, the mechanical property and the physical property of the chip are improved.
The self-destruction chip embedded with the energy-containing film obtained through the steps can obviously reduce the dosage of the energy-containing material in the self-destruction chip and improve the use safety on the one hand, and can realize the low-temperature packaging of the embedded self-destruction chip by adopting the high-temperature-resistant energy-containing film on the other hand, so that the reliability is improved, and the service life is prolonged. Meanwhile, the adopted forming process of the cadmium azide initiating explosive is micro-control direct writing, the manufacturing process of the multilayer film thermite is magnetron sputtering coating, and the method is compatible with the MEMS technology, can realize batch production, improves consistency and reliability, and reduces production cost.
The foregoing is illustrative of the present invention and various modifications and changes in form or detail will readily occur to those skilled in the art based upon the teachings herein and the application of the principles and principles disclosed herein, which are to be regarded as illustrative rather than restrictive on the broad principles of the present invention.
Claims (10)
1. A self-destruction chip embedded with an energetic film is characterized in that: the chip is formed by sequentially and integrally packaging a substrate layer 1, a micro-heater layer 2 and an energy-containing thin film layer 3, wherein,
the substrate layer is an information chip to be damaged;
the micro-heater layer is a metal film formed on the substrate layer, is connected with an external control system or a power supply system, and can generate heat under the action of current to heat the energy-containing film;
the energy-containing film is attached to the substrate layer and the micro-heater layer, and burns or explodes after being heated to form thorough physical damage to the information chip to be damaged.
2. The self-destruct chip of claim 1, wherein: the microheater layer includes two layers of metal films:
the lower layer is a bridge area for converting electric energy given by the outside into heat energy;
the second layer is a bonding pad, which is made above the bridge area and is used for protecting the bridge area material and connecting the micro-heater layer with an external circuit.
3. The self-destruct chip of claim 2, wherein: the film thickness of the bridge region and the bonding pad is both 500-1500 nm.
4. The self-destruct chip of claim 2, wherein: the bridge area is made of nickel-cadmium alloy, platinum or tungsten, and the pad is made of copper, aluminum or gold.
5. The self-destruct chip of claim 1, wherein: the resistance of the micro-heater is 1-10 omega.
6. The self-destruct chip of claim 1, wherein: the energetic film layer is made of high-temperature-resistant energetic materials, and the thermal decomposition peak temperature is more than or equal to 350 ℃.
7. The self-destruct chip of claim 6, wherein: the energy-containing film is a cadmium azide primary explosive energy-containing film or a thermite multilayer film.
8. The method for preparing the self-destruction chip according to any one of claims 1 to 7, comprising the steps of:
manufacturing the micro-heater layer on the substrate layer in a film coating mode;
manufacturing the energy-containing thin film layer on the surface of the micro-heater layer by adopting an MEMS (micro-electromechanical systems) process;
integrating the self-destruction chip with an external circuit;
and packaging and protecting the self-destruction chip.
9. The method for preparing a self-destruct chip according to claim 8, wherein: the energy-containing film is made of cadmium azide initiating explosive, and the forming process is a micro-control direct writing process and comprises the following steps:
mixing powdery cadmium azide initiating explosive with a binder, a solvent and the like to prepare cadmium azide initiating explosive slurry;
and forming the energy-containing film at the designated position by micro-control direct writing.
10. The method for preparing a self-destruct chip according to claim 8, wherein: the preparation process of the energy-containing thin film adopts a thermite multilayer film as the energy-containing thin film and comprises the following steps: and sequentially depositing the metal oxide and the active metal in a laminated manner, wherein the outermost layer is the metal oxide.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010656256.3A CN111739850A (en) | 2020-07-09 | 2020-07-09 | Self-destruction chip embedded with energetic film and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010656256.3A CN111739850A (en) | 2020-07-09 | 2020-07-09 | Self-destruction chip embedded with energetic film and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115139521A (en) * | 2022-06-30 | 2022-10-04 | 上海交通大学 | Device and method for preparing energetic material by utilizing ultrasonic-assisted ink-jet direct writing |
| WO2023045113A1 (en) * | 2021-09-22 | 2023-03-30 | 深圳先进技术研究院 | Chip attachment apparatus capable of realizing chip self-destruction and control method therefor |
-
2020
- 2020-07-09 CN CN202010656256.3A patent/CN111739850A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023045113A1 (en) * | 2021-09-22 | 2023-03-30 | 深圳先进技术研究院 | Chip attachment apparatus capable of realizing chip self-destruction and control method therefor |
| CN115139521A (en) * | 2022-06-30 | 2022-10-04 | 上海交通大学 | Device and method for preparing energetic material by utilizing ultrasonic-assisted ink-jet direct writing |
| CN115139521B (en) * | 2022-06-30 | 2023-08-29 | 上海交通大学 | Device and method for preparing energetic material by utilizing ultrasonic-assisted ink-jet direct writing |
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