CN111733400A - Quartz support and quartz heating device - Google Patents

Quartz support and quartz heating device Download PDF

Info

Publication number
CN111733400A
CN111733400A CN202010646128.0A CN202010646128A CN111733400A CN 111733400 A CN111733400 A CN 111733400A CN 202010646128 A CN202010646128 A CN 202010646128A CN 111733400 A CN111733400 A CN 111733400A
Authority
CN
China
Prior art keywords
quartz
support
copper foil
rolling
rolling ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010646128.0A
Other languages
Chinese (zh)
Inventor
李学瑞
张宝勋
李炯利
***
于公奇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Graphene Technology Research Institute Co Ltd
Original Assignee
Beijing Graphene Technology Research Institute Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Graphene Technology Research Institute Co Ltd filed Critical Beijing Graphene Technology Research Institute Co Ltd
Priority to CN202010646128.0A priority Critical patent/CN111733400A/en
Publication of CN111733400A publication Critical patent/CN111733400A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/186Preparation by chemical vapour deposition [CVD]
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates

Abstract

The application relates to a quartz support and a quartz heating device. The quartz support is provided with a first support and a second support, at least three first rolling rings are arranged on the first support, three second rolling rings are arranged on the second support, the first rolling rings and the second rolling rings are in one-to-one correspondence, and the positions of the corresponding first rolling rings and the second rolling rings are the same in height. The first rolling rings are sequentially arranged along the extending direction of the first support, and the heights of the positions of the adjacent first rolling rings are different. In the structure, because the connecting line of the second rolling ring and the corresponding first rolling ring is perpendicular to the extending direction of the first support, and the first rolling ring and the second rolling ring can support and convey the copper foil to be grown with graphite, the contact between the copper foil and the furnace tube can be avoided, the area of the copper foil in the furnace tube is increased, and the area of the single-time growth of graphene is increased. The quartz support can improve the production efficiency of graphene, and meanwhile, the phenomenon that graphene folds or tears are caused by the fact that copper foils in the furnace tube are bonded with the quartz tube wall is avoided, and the quality of graphene is improved.

Description

Quartz support and quartz heating device
Technical Field
The application relates to the technical field of graphene, in particular to a quartz support and a quartz heating device.
Background
In industrial production, large-area graphene is generally produced by using roll-to-roll equipment of a tube furnace gas image deposition method, namely, after a copper foil is conveyed into a quartz heating tube by a winding roll driven by a winding shaft to grow graphene, the graphene is wound on the other side of the quartz heating tube.
In the conventional art, contact of the copper foil with the quartz tube when growing graphene may cause the copper foil to adhere to the wall of the quartz tube. Because the copper foil is bonded with the wall of the quartz tube, the copper foil is moved after graphene growth is completed, so that the copper foil is wrinkled or even torn, the quality of graphene on the surface of the copper foil is affected, and meanwhile, the residual copper foil fragments cause pollution in the quartz tube.
Disclosure of Invention
Therefore, it is necessary to provide a quartz holder and a quartz heating device for solving the problem that the quality of graphene on the surface of the copper foil is affected by the occurrence of wrinkles or even tearing of the copper foil.
The present application provides a quartz holder comprising:
the first support is provided with at least three first rolling rings, the first rolling rings are sequentially arranged along the extension direction of the first support, and the heights of the adjacent first rolling rings are different; and
the second support is arranged opposite to the first support and is provided with at least three second rolling rings, the second rolling rings correspond to the first rolling rings one by one, the heights of the positions of the second rolling rings are the same as those of the corresponding first rolling rings, and the connecting line of the second rolling rings and the corresponding first rolling rings is perpendicular to the extending direction of the first support;
the first rolling ring and the second rolling ring are used for supporting and conveying copper foils of graphite to be grown, and the first support, the second support, the first rolling ring and the second rolling ring are all made of quartz materials.
In one embodiment, the quartz support further includes a support body, the support body defines a through groove, one sidewall of the through groove forms the first support, the other sidewall forms the second support, and an extending direction of the first support is an extending direction of the through groove.
In one of the embodiments, the first and second electrodes are,
the first support is provided with at least three first through holes, the first through holes are sequentially arranged along the extending direction of the through groove, the heights of the adjacent first through holes are different, the second support is provided with at least three second through holes, the second through holes correspond to the first through holes one to one, the heights of the positions of the second through holes are the same as the heights of the positions of the corresponding first through holes, and the connecting line of the second through holes and the corresponding first through holes is perpendicular to the extending direction of the through groove;
the quartz support further comprises a plurality of rolling ring supporting rods, wherein the rolling ring supporting rods are respectively arranged in each first through hole and each second through hole, the first rolling ring and the second rolling ring are sleeved on the rolling ring supporting rods, and the first rolling ring and the second rolling ring are used for rotating along the rolling ring supporting rods.
In one embodiment, the surface of the first rolling ring and/or the second rolling ring in contact with the rolling ring struts is provided with semicircular protrusions for reducing friction between the first rolling ring and/or the second rolling ring and the rolling ring struts.
In one embodiment, the rolling ring strut comprises a strut head and a strut rod part, wherein a first annular boss is machined on one side of the strut head, which is close to the strut rod part, and the outer diameter of the first annular boss is smaller than the diameter of the strut head and larger than the diameter of the strut rod part;
a second annular boss is machined on the side wall of the through groove where the first through hole and the second through hole are located, and the outer diameter of the second annular boss is the same as that of the first annular boss;
the first rolling ring is provided with annular grooves at two ends in the axial direction, the diameter of each annular groove is the same as the outer diameter of the corresponding first annular boss, the annular grooves are used for fixing two sides of the first rolling ring to the first annular bosses and the second annular bosses respectively, and the second rolling ring is the same as the first rolling ring in structure.
In one embodiment, the rod portion of the strut is in threaded connection with the first through hole and/or the second through hole.
In one embodiment, the bracket body is provided with two mounting grooves, and the mounting grooves are positioned at two ends of the bracket body along the extending direction of the through groove and positioned at one side of the bracket body away from the through groove;
the quartz support system further comprises two mounting stop blocks, one end of each mounting stop block is abutted to the corresponding mounting groove, the other end of each mounting stop block is abutted to the corresponding quartz heating pipe, and the mounting stop blocks and the mounting grooves are used for fixing the support body.
In one embodiment, an inclined surface is processed on one side of the bracket body away from the through groove, and the inclined surface is used for fixing the bracket body on the inner wall of the quartz heating tube.
Based on the same inventive concept, the present application further provides a quartz heating device, which includes the quartz holder and the quartz heating tube described in any of the above embodiments, wherein the quartz heating tube surrounds to form a heating cavity, and the quartz holder is located in the heating cavity.
In one embodiment, the quartz heating tube comprises a quartz tube and a heating device, wherein the heating device is arranged on the outer wall of the quartz tube.
The quartz support is through setting up first support and second support to set up at least three first ring of rolling on first support, set up three second on the second support and roll the ring, first ring and the second of rolling roll the ring one-to-one, and the first ring that rolls that corresponds and the second rolls the ring position height phase with the same. The first rolling rings are sequentially arranged along the extending direction of the first support, and the heights of the positions of the adjacent first rolling rings are different. In the structure, because the connecting line of the second rolling ring and the corresponding first rolling ring is perpendicular to the extending direction of the first support, and the first rolling ring and the second rolling ring can support and convey the copper foil of the graphite to be grown, the contact between the copper foil and the furnace tube can be avoided, the area of the copper foil in the furnace tube can be increased on the premise of not increasing the diameter and the length of the furnace tube, and the area of the graphene grown at one time is increased. Therefore, the quartz support can improve the production efficiency of graphene, and meanwhile, the phenomenon that graphene folds or tears are caused by the fact that copper foils in the furnace tube are bonded with the quartz tube wall is avoided, and the quality of graphene is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments or the conventional technologies of the present application, the drawings used in the descriptions of the embodiments or the conventional technologies will be briefly introduced below, it is obvious that the drawings in the following descriptions are only some embodiments of the present application, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a graphene production system according to an embodiment of the present application;
fig. 2 is a schematic structural diagram of a feeding and pressing assembly of a graphene production system according to an embodiment of the present disclosure;
fig. 3 is a schematic structural diagram of a stitching device of a graphene production system according to an embodiment of the present disclosure;
fig. 4 is a schematic structural diagram of a feeding, winding and cutting assembly of a graphene production system according to an embodiment of the present disclosure;
fig. 5 is a schematic structural diagram of a first compactor of a graphene production system according to an embodiment of the present disclosure;
fig. 6 is a schematic structural view of a thermal insulation baffle of a graphene production system according to an embodiment of the present disclosure;
fig. 7 is a schematic structural diagram of a discharging, winding and cutting assembly of a graphene production system according to an embodiment of the present application;
FIG. 8 is a schematic structural diagram of a quartz support according to an embodiment of the present application;
FIG. 9 is a cross-sectional view along the line A-A of a quartz support structure according to an embodiment of the present application;
FIG. 10 is a schematic view of a rolling ring strut structure of a quartz stent according to an embodiment of the present invention;
fig. 11 is a schematic structural diagram of a first rolling ring or a second rolling ring of a quartz support according to an embodiment of the present application;
fig. 12 is a schematic structural diagram of a quartz heating device according to an embodiment of the present application.
Description of the reference numerals
The graphene production system 100, the feeding transfer device 10, the feeding transfer roller 110, the feeding transfer window 120, the feeding transfer assembly 130, the turntable 131, the guide roller 132, the feeding pressing assembly 140, the first fixing roller 141, the pressing device 142, the pressing nail 143, the second cutter 144, the second counter 145, the stripping assembly 150, the quartz heating device 20, the quartz holder 200, the first holder 210, the first rolling ring 211, the first through hole 212, the annular groove 213, the second holder 220, the second rolling ring 221, the second through hole 222, the holder body 230, the through groove 231, the second annular boss 232, the mounting groove 233, the rolling ring holder 240, the holder head 241, the holder rod part 242, the first annular boss 243, the mounting stopper 250, the quartz heating tube 260, the heating cavity 261, the heating device 262, the quartz tube 263, the feeding device 30, the feeding roller 310, the cleaning and drying assembly 320, the tension adjusting assembly 330, the feeding winding and cutting assembly 340, the feeding winding and cutting assembly, The device comprises a fixer 341, a first presser 342, a first counter 343, a first cutter 344, an exhaust gas purification device 350, a film pasting component 360, a heat insulation baffle 40, a baffle body 410, a third through hole 411, a fourth through hole 412, a quartz ball 420, a cooling component 50, a temperature sensor 510, a water cooling device 520, a discharging transfer device 60, a discharging transfer roller 610, a discharging winding cutting component 620, a second fixing roller 621, a third counter 622, a one-way fixer 623, a third cutter 624, a guide belt 625, a second presser 626, a discharging transfer component 630, a discharging transmission window 640, a discharging film pasting component 650, a discharging device 70, a connecting flange 80, a position sensor 910 and a radio frequency generator 920.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present application more comprehensible, embodiments accompanying the present application are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is capable of embodiments in many different forms than those described herein and those skilled in the art will be able to make similar modifications without departing from the spirit of the application and it is therefore not intended to be limited to the embodiments disclosed below.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Referring to fig. 1, the present application provides a graphene production system 100. The graphene production system 100 includes a feed relay apparatus 10 and a quartz heating apparatus 20. The feeding transfer device 10 includes a plurality of feeding transfer rollers 110, a feeding transfer window 120, a feeding transfer assembly 130 and a feeding press-fit assembly 140, wherein the feeding transfer rollers 110 are used for winding copper foil, the feeding transfer window 120 is used for transferring the feeding transfer rollers 110 wound with copper foil to the feeding transfer assembly 130, the feeding transfer assembly 130 is used for accommodating the plurality of feeding transfer rollers 110 at the same time and transferring the feeding transfer rollers 110 with the copper foil used up back to the feeding transfer window 120, and the feeding press-fit assembly 140 is used for press-fit processing of the copper foil of two adjacent feeding transfer rollers 110. The quartz heating device 20 is arranged at the discharge port of the feeding transfer device 10 and used for growing graphene on the copper foil.
It should be noted that all control processes required in the present application may be completed by a built-in computer system, or may be completed by a communication device and a remote control terminal according to actual needs, and the present application is not particularly limited to this. In this embodiment, the feed transfer window 120 encloses a transfer chamber having movable baffles at both ends. The feeding transfer assembly 130 and the feeding nip assembly 140 may jointly surround and form a feeding transfer chamber, and the feeding transfer roller 110 with the copper foil wound on the surface thereof may enter the feeding transfer chamber through the feeding transfer window 120. The feed transfer window 120 includes a pumping and ventilating device, and the pumping and ventilating device is disposed in the transfer chamber for replacing the gas in the transfer chamber.
The process of the feeding material transfer window 120 transferring the feeding material transfer roller 110 is as follows: when the feed transfer window 120 is not in operation, the baffles at both ends of the feed transfer window 120 are closed and the interior of the transfer chamber is in a vacuum state. When the feeding transfer roller 110 is conveyed through the feeding transfer window 120, argon can be filled into the transfer chamber by the gas pumping and exchanging device, after the air pressure in the transfer chamber reaches the normal atmospheric pressure, the baffle on one side of the transfer chamber close to the feeding port of the feeding transfer window 120 is opened, the feeding transfer roller 110 wound with copper foil enters the transfer chamber through the feeding port, and the baffle on one side of the feeding port of the transfer chamber is closed. Then, the pumping and air exchanging device pumps out the air in the transfer chamber until the transfer chamber reaches a vacuum state, argon is filled into the transfer chamber, and after the air pressure in the transfer chamber reaches the normal atmospheric pressure, a baffle plate at one side of the feed inlet of the transfer chamber, which is far away from the feeding transfer window 120, is opened. At this time, the feeding transfer roller 110 may be conveyed into the feeding transfer chamber by a mechanical conveying structure disposed inside the feeding transfer window 120, and the baffle plate on the side of the transfer chamber away from the feeding port is closed. After the feeding transfer roller 110 is conveyed, the air pumping and exchanging device pumps the air in the transfer chamber until reaching a vacuum state, and waits for the next conveying of the feeding transfer roller 110.
It can be understood that, every time a feeding transfer roller 110 wound with a copper foil is conveyed to the inside of the feeding transfer chamber through the feeding transfer window 120, the feeding transfer roller 110 with one copper foil used up in the feeding transfer chamber can enter the feeding transfer window 120, so that the continuous circulation of the feeding transfer roller 110 is completed, the supply of the copper foil in the production process of graphene is ensured, and the production efficiency of the graphene is improved. Meanwhile, the arrangement of the transfer chamber of the feeding transfer window 120 and the air exhausting and exchanging device can avoid the adverse effect of external air on the copper foil in the conveying process of the feeding transfer roller 110.
In one embodiment, the feed relay assembly 130 includes a turntable 131 and a guide roller 132. The turntable 131 is used for accommodating the feeding transfer roller 110 and driving the feeding transfer roller 110 to rotate. The guide roller 132 serves to guide the copper foil of the feeding relay roller 110 adjacent to the guide roller 132 to the feeding nip assembly 140. It is understood that the feeding relay roller 110 wound with copper foil is fixed to the turntable 131 of the feeding relay assembly 130 after entering the feeding relay chamber, and can rotate with the turntable 131 to the vicinity of the position of the guide roller 132. Since the surface of the guiding roller 132 has viscosity and can be bonded after contacting with the copper foil, the guiding roller 12 can drive the copper foil to move and guide the copper foil to the feeding and pressing assembly 140. It can be understood that the arrangement of the rotary table 131 and the guide roller 132 in the feeding transfer assembly 130 can ensure the continuous supply of the copper foil in the production process of the graphene, and the production efficiency of the graphene is improved.
Referring to fig. 2-3 together, in one embodiment, the feeding nip assembly 140 includes a first fixed roller 141, a nip 142, a press pin 143, a second cutter 144, and a second counter 145. The pressing device 142 may be composed of an upper and a lower clamping plates, wherein a pressing nail 143 may be fixed inside one of the clamping plates, and an arc-shaped groove is formed on the surface of the other clamping plate to cooperate with the pressing nail 143 to press the copper foil on the two adjacent feeding transfer rollers 110. In one embodiment, the material of the press pins 143 is copper or other material that can maintain its shape at 1200 ℃ and is non-reactive with other materials. After entering the feeding and laminating assembly 140, the copper foil may pass through the first fixing roller 141 and the laminator 142 in sequence and then be conveyed to the quartz heating apparatus 20 through the output end of the feeding and laminating assembly 140. Note that the guide roll 132 may return to the initial position after the copper foils of two adjacent feeding transfer rolls 110 are pressed.
It can be understood that the above process can be judged whether the copper foil wound on the feeding transfer roller 110 is used up through the second counter 145, and specifically, the judgment can be made by comparing whether the number of turns of the feeding transfer roller 110 is equal to the preset number of turns. If the number of turns of the feeding transfer roller 110 is determined to be equal to the preset number of turns, that is, the copper foil wound on the feeding transfer roller 110 is used up, the copper foil of the used-up feeding transfer roller 110 is laminated with the copper foil on the next feeding transfer roller 110 wound with the copper foil through the laminator 142 and the pressing nails 143. After the pressing, the two clamping plates of the pressing device 142 are separated, the second cutter 144 cuts off the copper foil remained on the feeding transfer roller 110 with the exhausted copper foil, and the copper foil is continuously conveyed along the previous path, so that the continuity of copper foil supply in the graphene production process is ensured. At this time, the next feeding transfer roller 110 wound with copper foil can rotate with the rotating disc 131 to the position of the feeding transfer roller 110 with the depleted copper foil, the feeding transfer roller 110 with the depleted copper foil can continue to rotate with the rotating disc 131, and when one of the feeding transfer rollers 110 with the depleted copper foil is aligned with the movable baffle plate of the feeding transfer window 120 far away from the feeding inlet, the feeding transfer window 120 can be accessed to replace the feeding transfer roller 110.
In one embodiment, the graphene production system further comprises a feeding device 30, the feeding device 30 surrounding to form a feeding processing chamber. The in-feed transfer roll 110, which has been aligned with the in-feed transfer window 120 and has exhausted the copper foil, can enter the in-feed treatment chamber through the in-feed transfer window 120 in a similar process as the in-feed transfer roll 110 wound with the copper foil in the in-feed treatment chamber enters the in-feed transfer chamber through the in-feed transfer window 120. In this embodiment, the feeding transfer roller 110 with the depleted copper foil may firstly enter the feeding processing chamber through the feeding transfer window 120, and then the feeding transfer roller 110 wound with the copper foil in the feeding processing chamber may enter the feeding transfer chamber through the feeding transfer window 120, that is, the position of the feeding transfer roller 110 with the depleted copper foil is replaced with the rotation of the rotation disc 131, so as to ensure the continuity of the graphene production process. It can be understood that when preparing the same amount of graphene, the time for preparing the graphene is reduced by the above process, so that the efficiency for preparing the large batch of graphene can be improved, and the cost for preparing the large batch of graphene is reduced. In another embodiment, the in-feed transfer roll 110 wound with the copper foil in the in-feed processing chamber can also transfer the copper foil to the in-feed transfer roll 110 depleted of copper foil in the in-feed transfer chamber through the in-feed transfer window 120, which is not particularly limited in this application.
The graphene production system 100 provided by the present application, through the feeding transfer roller 110, the copper foil is wound and conveyed to the feeding transfer assembly 130 through the feeding transfer window 120, the feeding transfer assembly 130 accommodates a plurality of feeding transfer rollers 110 at the same time, and conveys the feeding transfer rollers 110 with the copper foil used up back to the feeding transfer window 120. When the copper foil in one of the feeding transfer rollers 110 is used up, the feeding press-fit assembly 140 can perform press-fit treatment on the copper foil of the next feeding transfer roller 110, so that continuity of copper foil supply in the graphene production process is ensured, and the production efficiency of graphene is improved. The quartz heating device 20 is disposed at the discharge port of the feeding transfer device 10, and can grow graphene on the copper foil. It can be appreciated that the production efficiency of roll-to-roll graphene can be improved by the graphene production system 100.
In one embodiment, the graphene production system further includes a feeding device 30, the feeding device 30 is disposed at the feeding port of the feeding transfer window 120, the feeding device 30 is configured to wind the copper foil to the feeding transfer roller 110 and transfer the feeding transfer roller 110 wound with the copper foil to the feeding transfer window 120, and the feeding transfer window 120 is further configured to transfer the feeding transfer roller 110 depleted of the copper foil back to the feeding device 30. It can be understood that the feeding device 30 can surround to form a feeding treatment chamber, the feeding transfer roller 110 wound with copper foil can enter the feeding treatment chamber through a feeding baffle arranged on the feeding device 30, and the feeding treatment chamber is cleaned, dried and subjected to film pasting treatment to pretreat the copper foil, so that the production quality of graphene is ensured.
In one embodiment, the feeding device 30 includes a feed roll 310, a washer dryer assembly 320, a tensioning assembly 330, and a feed roll severing assembly 340. The feed roll 310 is used to provide copper foil. The cleaning and drying assembly 320 is used to perform cleaning and drying processes on the copper foil. The tension adjusting assembly 330 is used to adjust the tension of the copper foil after the cleaning and drying processes. The feeding and winding cutting assembly 340 is used for winding the tension-adjusted copper foil onto the feeding transfer roll 110 with the copper foil used up, and transferring the feeding transfer roll 110 with the copper foil wound thereon to the feeding transfer window 120.
The copper foil to be wound on the feeding transfer roll 110 may be first subjected to cleaning and drying by the cleaning and drying unit 320. In this embodiment, the cleaning and drying assembly 320 may include at least two cleaning nozzles and a dryer, wherein the number of the cleaning nozzles may sequentially eject the ionized water and the nitrogen gas, the additional cleaning nozzles may sequentially eject one of acetone, ethanol, dilute hydrochloric acid, and dilute acetic acid, and the last cleaning nozzle may eject the ultrapure water. It can be understood that organic substances such as acetone and ethanol can remove pollutants such as oil stains, and alkene hydrochloric acid and alkene acetic acid can remove inorganic impurities such as oxides. Finally, the dryer can blow out nitrogen to dry the cleaned copper foil. In addition, the tension adjusting assembly 330 may include two fixed rollers, a movable roller, a spring, and a displacement sensor, wherein the movable roller is connected to the spring and may adjust the tension of the copper foil through the spring according to the monitoring information of the displacement sensor. The copper foil passes through the fixed roller, the movable roller and the other fixed roller in sequence to complete tension adjustment, and the copper foil after tension adjustment is conveyed to the feeding winding cutting assembly 340.
Referring to fig. 4-5 together, in one embodiment, the feed-stock-roll cutting assembly 340 includes a holder 341, a presser 342, a first counter 343, and a first cutter 344. The holder 341 is configured to clamp the tension-adjusted copper foil and drive the copper foil to move from an initial position to a predetermined position. The presser 342 is used to press the copper foil to the in-feed relay roller 110 after the copper foil is moved to a preset position, and the holder 341 releases the copper foil and returns to an initial position after the presser 342 presses the copper foil to the in-feed relay roller 110. The first counter 343 is used to take the number of turns of the copper foil wound on the feeding relay roller 110. The first cutter 344 serves to cut the copper foil when the number of turns is equal to a preset number of turns. It is understood that the tension-adjusted copper foil may be fixed to the surface of the feeding relay roller 110 after passing through the holder 341, the first cutter 344, and the presser 342 in sequence. The first counter 343 is disposed at one side of the feeding transfer roller 110, and is used for acquiring the number of turns of the copper foil wound on the feeding transfer roller 110.
In one embodiment, a plurality of grooves are continuously formed in one side of the feeding transfer roller 110, and the side walls of the plurality of grooves can form a protruding structure, and the protruding structure is matched with the pressing device 342 to fix the copper foil. In this embodiment, the presser 342 is disposed opposite to the plurality of grooves of the in-feed turn roll 110 and matches the plurality of grooves and the raised structures formed thereby. In one embodiment, the shape of the protrusions of the protrusion structure of the feeding transfer roller 110 may be circular, square, or other shapes that can achieve the effect of pressing the copper foil. It can be understood that the arrangement of the protruding structure in the feeding transfer roller 110 and the pressing device 342 can ensure that the copper foil can be wound around the feeding transfer roller 110, thereby ensuring the supply of the copper foil in the graphene production process.
In one embodiment, the holder 341 may be a bi-directional holder, wherein the bi-directional holder is a pair of oppositely disposed cleats. In the copper foil winding process, a gap through which the copper foil passes is reserved between the two clamping plates of the bidirectional fixer, and the gap distance is larger than the thickness of the copper foil. The specific process of winding the tension-adjusted copper foil around the feeding relay roll 110 is as follows: the copper foil can be manually conveyed to the middle of the bidirectional fixer for the first time until the two clamping plates of the bidirectional fixer clamp the copper foil and drive the copper foil to move to the other end of the preset movement track, or the copper foil is wound on the surface of the feeding transfer roller 110 for preset turns, such as 3/4 turns, at the moment, the copper foil can cover the surface of the feeding transfer roller 110 at the position of the convex structure, the presser 342 is aligned to the convex structure of the feeding transfer roller 110 matched with the presser, and part of the copper foil is pressed and fixed on the feeding transfer roller 110. Subsequently, the presser 342 may return to the initial position while the reversible holder releases the copper foil and returns to the initial position. The feeding transfer roller 110 drives the copper foil to rotate, and the copper foil can be wound on the surface of the feeding transfer roller 110. The number of turns of the copper foil on the surface of the feeding transfer roller 110 can be obtained by the first counter 343, and when the number of turns of the copper foil reaches a predetermined number of turns, the bidirectional fixer clamps the copper foil, and the first cutter 344 cuts the copper foil, thereby completing the preparation of the feeding transfer roller 110 wound with the copper foil. Finally, the in-feed transfer roll 110 wound with the copper foil may enter the in-feed transfer chamber through the in-feed transfer window 120. It should be noted that the second transfer of the copper foil to the bi-directional fixture can be performed automatically according to the above-described process.
In one embodiment, the feeding device 30 further comprises an exhaust gas purification device 350 for ventilating the gas in the feeding device 30. It can be understood that the exhaust purification device 350 disposed in the feeding processing chamber can remove the waste gas diffused to the feeding transfer chamber and the feeding processing chamber in the process of growing graphene, so as to avoid the waste gas polluting the environment and even causing human poisoning or fire explosion. Therefore, by arranging the exhaust gas purification device 350, the cleanliness of the environment where the copper foil is located can be maintained, the pollution of impurities on the surface of the copper foil and the surrounding environment to the copper foil is reduced, and the cleanliness of the copper foil is improved.
In one embodiment, the feeding device 30 further comprises a feeding film-pasting component 360, and the feeding film-pasting component 360 is used for pasting the cleaned and dried copper foil. The feeding transfer device 10 further comprises a feeding film removing assembly 150, wherein the feeding film removing assembly 150 is used for removing films from the copper foil and conveying the copper foil after the film removing treatment to the quartz heating device 20. The copper foil after being cleaned and dried can be subjected to film pasting treatment, so that scratching and pollution to the copper foil in the transmission and winding processes can be effectively prevented, a high-quality copper foil substrate is provided for next-step graphene growth, and the purity and quality of the prepared graphene are improved. Meanwhile, if the feeding film pasting assembly 360 is adopted in the feeding processing chamber for film pasting processing, the film removing assembly 150 is adopted in the feeding transfer chamber for processing the copper foil correspondingly, so that the copper foil is conveyed to the quartz heating device 20 for graphene preparation.
In one embodiment, a heat insulation baffle 40 is further included, and the heat insulation baffle 40 is disposed between the feed material transfer device 10 and the quartz heating device 20 for reducing the heat and/or gas in the quartz heating device 20 from entering the feed material transfer device 10. In this embodiment, the thermal baffle 40 may be made of quartz material.
Referring also to FIG. 6, in one embodiment, the thermal baffle 40 includes a baffle body 410 and at least two quartz balls 420. The baffle body 410 is provided with a third through hole 411 and a fourth through hole 412, the third through hole 411 is used for providing a conveying channel for the copper foil entering the quartz heating device 20, and the fourth through hole 412 is used for providing an air inlet channel for the quartz heating device 20. At least two quartz balls 420 are embedded in the third through hole 411 for reducing friction between the copper foil and the third through hole 411.
It will be appreciated that the quartz heating means 20 surrounds the heating chamber and that the heating means is located axially intermediate within the heating chamber and therefore requires the provision of separate thermal insulating barriers 40 at each end of the heating chamber interior. Wherein, a plurality of pairs of quartz balls 420 are embedded in each heat insulation baffle 40, the copper foil transmitted from the feeding processing transfer chamber is transmitted into the heating chamber through the quartz balls 420 in one heat insulation baffle 40, passes through each pair of the first rolling ring 211 and the second rolling ring 221 on the quartz bracket 200 arranged in the quartz heating device 20 in sequence, and finally is transmitted out of the heating chamber through the quartz balls 420 embedded in the other heat insulation baffle 40 to reach the discharging transfer chamber. In one embodiment, the quartz holder 200 is provided at both sides thereof with mounting stoppers 250, respectively, one side of each mounting stopper 250 being in contact with one side of the quartz holder 200, and the other side of the mounting stopper 250 being in contact with the heat shielding plate 40, to fix the quartz holder 200 in the heating chamber.
It can be understood that, since the copper foil penetrates through the feeding transfer chamber, the heating chamber and the discharging transfer chamber in the whole process, the reaction gas may slightly enter the feeding transfer chamber and the discharging transfer chamber. If the heat insulation baffle 40 is not arranged, the heating temperature in the heating cavity can be conducted to the adjacent feeding transfer chamber and the discharging transfer chamber, and when the temperature is higher, the reflecting gas can affect the copper foil before and after the growth of the graphene and the film on the surface of the copper foil, such as physical influence (deformation and even melting of the film due to overhigh temperature) or chemical influence (reaction of the reacting gas with the copper foil or the film due to overhigh temperature). In addition, the arrangement of the quartz balls 420 can improve the sliding friction of the copper foil into rolling friction, namely, the abrasion of the copper foil in the conveying process is reduced by reducing the friction resistance, the contact area of the copper foil and a support can be reduced, and the effective growth area of the copper foil is enlarged.
In one embodiment, connecting flanges 80 are installed at two ends of the heating cavity, wherein one end of one connecting flange 80 is connected with the position of the feeding transfer chamber close to the air inlet, and one end of the other connecting flange 80 is connected with one end of the copper foil which is discharged from the heating cavity in the discharging transfer chamber. Wherein, a radio frequency generator 920 is arranged outside the quartz tube between the connecting flange 80 at the gas inlet of the feeding transfer chamber and the quartz heating device 20, and is used for pretreating copper foil before graphene growth. It can be understood that the rf generator 920 is used to treat the surface of the copper foil on which the graphene is to be grown, so as to reduce the heating temperature required by the copper foil in the process of growing the graphene in the quartz heating apparatus 20. In addition, the rf transmitter 920 may facilitate accelerated decomposition of a gas, such as methane, used to grow the graphene, thereby reducing the temperature required for decomposition of the methane.
In one embodiment, the feeding material transfer chamber is provided with a water cooling device 520 at the outside, and the water cooling device 520 may be a water cooling flange. Wherein, an air inlet passage is arranged between the water-cooling flange and the connecting flange 80. In this embodiment, the air inlet may be formed by two intersecting hole structures, that is, the structure of the air inlet in the feeding transfer chamber is a hole structure, a circular annular through hole, that is, a fourth through hole 412, is formed inside one end of the copper foil, which is transferred out of the feeding transfer chamber, and the hole structure of the air inlet is communicated with the fourth through hole 412. In one embodiment, the width of the aperture structure of the feed transfer chamber is less than the width of the fourth aperture 412 of the thermal baffle 40.
In one embodiment, since the thermal insulation barrier 40 has a cylindrical radial cross section, the axial cross section of the fourth through hole 412 may be two fan-shaped through holes which are symmetrical up and down. The third through hole 411 may be a rectangular through hole opened in the axial direction, and the rectangular through hole may receive and transfer the copper foil along the length in the radial direction. Meanwhile, two circular quartz balls 420 are symmetrically inserted in the inside of the rectangular through hole in the radial direction of the thermal insulation barrier 40 up and down, that is, the number of the quartz balls 420 is at least four. It will be appreciated that the thermal barrier 40 may be in communication with the gas inlet on the one hand to allow gas from the gas inlet to pass into the heating chamber and on the other hand to reduce gas from the heating chamber from being vented into the feed and discharge relay chambers. In addition, the thermal barrier 40 may support the copper foil so that the copper foil is smoothly transferred to the heating chamber, and at the same time, may isolate or reduce the heat generated from the heating chamber from being diffused or transferred to the in-feed transfer chamber and the out-feed transfer chamber so as to maintain the initial ambient temperatures of the in-feed transfer chamber and the out-feed transfer chamber. It should be noted that the material and size of the thermal insulation barrier 40 are not specifically limited in the present application, and may be specifically limited according to the desired thermal insulation effect.
In one embodiment, the graphene production system further includes a cooling assembly 50, and the cooling assembly 50 is disposed between the feed transfer device 10 and the quartz heating device 20, and is used for reducing the temperature of the feed transfer device 10. The cooling module 50 may include a temperature sensor 510 and a water cooling device 520, the temperature sensor 510 may be disposed on a side of the in-feed transfer chamber near the outgoing side of the copper foil, and the water cooling device 520 may be disposed outside the in-feed transfer chamber. In this embodiment, the temperature of the inside of the feeding transfer chamber that temperature sensor 510 can measure, water cooling equipment 520 can adjust the relevant parameters such as water-cooling flow and velocity of flow according to the temperature that temperature sensor 510 measures, and then maintains the temperature in the feeding transfer chamber at the preset temperature to guarantee the stability of the interior copper foil performance of feeding transfer chamber, can not take place physics or chemical reaction promptly. It is understood that the outlet of the feed transfer chamber is a slit through which the copper foil can be transferred to the quartz heating apparatus 20. In one embodiment, the cooling device 520 may be a water-cooled flange, and the discharge port of the feeding transfer chamber and the quartz heating device 20 may be connected by a connecting flange 80.
In one embodiment, the graphene production system 100 further includes an output transfer device 60 and an output device 70. The discharging transfer device 60 is arranged at the discharging port of the quartz heating device 20 and is used for continuously winding the copper foil which finishes the growth of the graphene. The discharging device 70 is disposed at a discharging port of the discharging transfer device 60, and the copper foil after the winding treatment is taken out from the graphene production system through the discharging device 70. It is understood that the exit transfer device 60 surrounds to form an exit transfer chamber and the exit device 70 surrounds to form an exit processing chamber. The discharging transfer chamber is close to one side of the quartz heating device 20, which is used for transferring copper foil, the discharging transfer chamber is internally provided with an air inlet and a temperature sensor 510, and the discharging transfer chamber is externally provided with a water cooling device 520. In one embodiment, the flow rate and flow rate of the water cooling device 520 may be controlled according to the temperature of the temperature sensor 510. In this embodiment, the inside temperature of transfer chamber in the ejection of compact that temperature sensor 510 can measure, water-cooling equipment 520 can adjust relevant parameters such as water-cooling flow and velocity of flow according to the temperature that temperature sensor 510 measured, and then maintains the indoor temperature in the transfer of the ejection of compact at preset temperature to guarantee that the performance of the interior completion graphite alkene of transfer chamber in the ejection of compact copper foil that grows keeps stable, can not take place physics or chemical reaction promptly.
Referring also to fig. 7, in one embodiment, the out-feed transfer device 60 includes an out-feed transfer roller 610, an out-feed web cutting assembly 620, an out-feed transfer assembly 630, and an out-feed transfer window 640. The discharge transfer roller 610 is used to provide support for the copper foil that completes the graphene growth. The discharging winding cutting assembly 620 is used for winding the copper foil with the preset length and completing the graphene growth to the discharging transfer roller 610. The out-feed transfer assembly 630 is configured to receive and convey the out-feed transfer roller 610. The discharging transfer component 630 is used for transferring the discharging transfer roller 610 wound with copper foil to the discharging transfer window 640, and the discharging transfer window 640 is used for transferring the discharging transfer roller 610 not wound with copper foil back to the discharging transfer component 630.
In one embodiment, the outfeed roll severing assembly 620 comprises a second fixed roller 621, a third counter 622, a one-way retainer 623, a third cutter 624, a guide tape 625, and a second presser 626, wherein the one-way retainer 623 and the guide tape 625 may be replaced by a bi-directional retainer. It can be understood that the copper foil firstly carries out film pasting processing through the discharging film pasting component 650 after entering the discharging transfer chamber so as to prevent the copper foil grown with graphene from scratching and polluting in the subsequent transmission and winding processes. The copper foil is fixed on the protruding structure of the discharging transfer roller 610 through the second fixing roller 621, the one-way fixer 623 and the third cutter 624 after passing through the discharging film pasting assembly 650, the discharging transfer roller 610 drives the copper foil to rotate, and the winding and cutting process of the copper foil can be completed. The discharging transfer roller 610 wound with the copper foil after graphene growth can be conveyed to a discharging treatment chamber formed by the discharging device 70 through the discharging transfer window 640, wherein the discharging transfer window 640 forms a transfer chamber, and the discharging transfer window 640 comprises a pumping and ventilating device which is used for pumping gas in the transfer chamber and filling argon gas.
In one embodiment, the first transfer of the copper foil with completed graphene growth to the film pasting assembly 650, the second fixing roller 621 and the discharging transfer roller 610 in the discharging transfer chamber is performed manually, and a section of the copper foil is fixed on the discharging transfer roller 610 by the second presser 626. The discharging transfer roller 610 is provided with a plurality of grooves therein, and the side walls of the grooves form a plurality of protrusions, that is, the grooves and the protrusions can jointly form a barb groove structure. It will be appreciated that the location of the barb groove structures are aligned with the second presser 626 to press the copper foil to the out-feed turning roll 610. After the graphene growth is completed on a certain section of copper foil in the quartz heating device 20, the discharging transfer roller 610 rotates to drive the copper foil to wind on the surface of the discharging transfer roller 610. And a third counter 622 is arranged above the discharging transfer roller 610 to obtain the number of turns of the discharging transfer roller 610, and when the number of turns of the discharging transfer roller 610 is equal to the preset number of turns, the discharging transfer roller 610 stops rotating. At this time, the copper foil is clamped and fixed by the one-way holder 623 located above the guide belt 625, and the copper foil is cut by the third cutter 624. Subsequently, the turntable in the discharging transit assembly 630 firstly moves downwards for a distance, and rotates after avoiding the blocking of the guide belt 625 so as to drive the discharging transit roller 610 with the prepared graphene copper foil wound on the surface to align to the discharging transfer window 640, and convey the discharging transit roller 610 to the discharging processing chamber. It will be appreciated that the process of the exit transfer roller 610 entering the exit processing chamber is similar to the process of the entry transfer roller 110 entering the entry transfer chamber from the entry processing chamber.
After the copper foil roll on the surface of the discharging transfer roller 610 is unloaded and conveyed to the discharging treatment chamber, the discharging transfer roller 610 enters the discharging transfer chamber from the discharging treatment chamber, moves to the position where the copper foil where the discharging transfer roller 610 is to finish graphene growth around the roll along with the turntable in the discharging transfer assembly 630, and can realize the cyclic utilization of the discharging transfer roller 610. The one-way retainer 623 above the guide belt 625 clamps and fixes the copper foil and drives the copper foil to be conveyed to one end of the guide belt 625, which is far away from the second fixed roller 621, at the moment, the copper foil is conveyed to the position of the barb groove structure of the discharging transfer roller 610, and the barb groove structure of the discharging transfer roller 610 is aligned with the second presser 626. It will be appreciated that the guide strip 625 may be grooved so that the second presser 626 may press and hold the copper foil in the path of travel of the outfeed turn roll 610. After the copper foil is pressed, the second presser 626 can be retreated to the initial position, the one-way fixer 623 at the tail end of the guide belt 625 loosens the copper foil, the length of the copper foil for completing the growth of the graphene is continuously increased along with the growth of the graphene in the quartz heating device 20, the discharging transfer roller 610 rotates, and the third counter 622 arranged above the discharging transfer roller 610 can obtain the number of turns of the discharging transfer roller 610 wound. When the number of turns of the discharging transfer roller 610 around the coil reaches the preset number of turns, the discharging transfer roller 610 stops rotating, the one-way fixer 623 above the guide belt 625 clamps and fixes the copper foil at the moment, the third cutter 624 cuts off the copper foil, and the continuous discharging of the copper foil with the grown graphene can be completed in such a circulating manner.
In one embodiment, the exhaust device 70 includes an exhaust gas purification device 350, and the exhaust gas purification device 350 is disposed in the exhaust treatment chamber. It can be understood that exhaust purification device 350 is arranged in the discharging treatment chamber, so that waste gas generated in the process of growing graphene and diffused into the discharging transfer chamber and the discharging treatment chamber can be removed, the environment pollution caused by the waste gas is avoided, and the poisoning of a human body or the occurrence of combustion and explosion are avoided.
In one embodiment, the graphene production system 100 further includes a position sensor 910. The position sensor 910 may monitor the height and/or position of the copper foil to determine whether the copper foil is stretched in an over-tensioned or relaxed state. It is understood that stretching too tightly may cause the copper foil to be pulled apart or torn, and stretching relaxation may cause the copper foil to be wrinkled, thereby affecting the quality of graphene prepared on the surface of the copper foil. Therefore, the rotation speed of the first fixing roller 141, the film removing assembly 150, the second fixing roller 621 and the discharging film pasting assembly 650 can be adjusted by monitoring the height and/or the position of the copper foil through the position sensor 910, so that the tensile state of the copper foil is moderate, and the quality of graphene on the surface of the copper foil is guaranteed.
To sum up, graphite alkene production system 100 that this application provided can improve equipment utilization rate through setting up the feeding and cutting off subassembly 340, feeding compression fittings 140, the ejection of compact around rolling up cutting off subassembly 620 around rolling up, realizes serialization and large batch graphite alkene production, reduces graphite alkene preparation cost. In addition, graphite alkene production system 100 combines feeding pass-through window 120, ejection of compact pass-through window 640 and takes out the equipment of breathing in through forming feeding process chamber, feeding transfer-through chamber, ejection of compact process chamber, ejection of compact transfer-through chamber, can avoid the contact of gas in the quartzy heating device 20 with external environment and people when improve equipment rate of utilization, has improved the security of equipment, has avoided polluted environment and human injury.
Referring to fig. 8 to 9 together, it can be understood that the area of the copper foil in the quartz tube for growing graphene is limited by the length of the quartz tube in the heating zone and the diameter of the quartz tube, and thus the production efficiency of graphene is affected. Accordingly, the present application also provides a quartz holder 200. The quartz holder 200 includes a first holder 210 and a second holder 220. The first bracket 210 is provided with at least three first rolling rings 211, the first rolling rings 211 are sequentially arranged along the extending direction of the first bracket 210, and the heights of the positions of the adjacent first rolling rings 211 are different. The second bracket 220 is arranged opposite to the first bracket 210 and is provided with at least three second rolling rings 221, the second rolling rings 221 correspond to the first rolling rings 211 one by one, the heights of the positions of the second rolling rings 221 are the same as those of the corresponding first rolling rings 211, and the connecting line of the second rolling rings 221 and the corresponding first rolling rings 211 is perpendicular to the extending direction of the first bracket 210. The first rolling ring 211 and the second rolling ring 221 are used for supporting and conveying copper foil on which graphite is to be grown, and the first support 210, the second support 220, the first rolling ring 211 and the second rolling ring 221 are all made of quartz materials.
It can be understood that the quartz holder 200 of the present application is formed by providing the first holder 210 and the second holder 220, and providing at least three first rolling rings 211 on the first holder 210, and providing three second rolling rings 221 on the second holder 220, where the first rolling rings 211 and the second rolling rings 221 are in one-to-one correspondence, and the heights of the corresponding first rolling rings 211 and second rolling rings 221 are the same. The first rolling rings 211 are sequentially arranged along the extending direction of the first bracket 210, and the heights of the adjacent first rolling rings 211 are different. In the above structure, since the connection line between the second rolling ring 221 and the corresponding first rolling ring 211 is perpendicular to the extending direction of the first support 210, and the first rolling ring 211 and the second rolling ring 221 can support and convey the copper foil to be grown with graphite, the contact between the copper foil and the furnace tube can be avoided, and the area of the copper foil in the furnace tube can be increased on the premise of not increasing the diameter and length of the furnace tube, thereby increasing the area of growing graphene at a time. Therefore, the quartz support 200 can improve the production efficiency of graphene, and meanwhile, the phenomenon that graphene folds or tears are caused by the fact that copper foil in a furnace pipe is bonded with the wall of a quartz pipe is avoided, and the quality of graphene is improved.
In one embodiment, the quartz holder 200 further includes a holder body 230, the holder body 230 defines a through slot 231, one sidewall of the through slot 231 forms the first holder 210, the other sidewall forms the second holder 220, and the extending direction of the first holder 210 is the extending direction of the through slot 231. In this embodiment, the bracket body 230 has a through slot 231 in the vertical upward direction, and the bracket body 230 having the through slot 231 is half-i-shaped. It can be appreciated that forming the first and second supports 210 and 220 at both sides of the through-groove 231, respectively, can improve the stability of the first and second supports 210 and 220 and simplify the structure of the quartz support 200.
In one embodiment, the first bracket 210 is provided with at least three first through holes 212, the first through holes 212 are sequentially arranged along the extending direction of the through slot 231, the heights of the adjacent first through holes 212 are different, the second bracket 220 is provided with at least three second through holes 222, the second through holes 222 are in one-to-one correspondence with the first through holes 212, the heights of the positions of the second through holes 222 and the positions of the corresponding first through holes 212 are the same, and the connecting line of the second through holes 222 and the corresponding first through holes 212 is perpendicular to the extending direction of the through slot 231. The quartz bracket further comprises a plurality of rolling ring supporting rods 240, the rolling ring supporting rods 240 are respectively arranged in each first through hole 212 and each second through hole 222, the rolling ring supporting rods 240 are sleeved with the first rolling ring 211 and the second rolling ring 221, and the first rolling ring 211 and the second rolling ring 221 are used for rotating along the rolling ring supporting rods 240. It is understood that the first through hole 212 and the second through hole 222 may be threaded through holes, and one end of the rolling ring support rod 240 connected to the first through hole 212 and the second through hole 222 may be provided with threads, that is, the rolling ring support rod 240 may be respectively connected to the first through hole 212 and the second through hole 222 through threads, which may improve the stability of the connection between the rolling ring support rod 240 and the first through hole 212 and the second through hole 222 and simplify the structure of the quartz holder 200.
In one embodiment, the surface of the first and/or second rolling ring 211, 221 in contact with the rolling ring struts 240 is provided with a semicircular protrusion for reducing friction between the first and/or second rolling ring 211, 221 and the rolling ring struts 240.
Referring to fig. 10, in this embodiment, the semicircular protrusions disposed on the surface of the first rolling ring 211 and/or the second rolling ring 221 contacting the rolling ring support 240 may also be disposed on the surface of the rolling ring support 240, which is not limited in this application. Referring to fig. 11, the surfaces of the first and/or second rolling rings 211 and 221 contacting other components may be provided with semicircular protrusions. In one embodiment, the semicircular protrusions of the first and second rolling rings 211 and 221 may be positioned to contact the first and second brackets 210 and 220, respectively, on one side and the rolling ring struts 240 on the other side. It can be appreciated that by providing both sides of the first and/or second rolling rings 211 and 221 with semicircular protrusions, the contact surface can be reduced, thereby reducing the frictional force. It should be noted that the end of the rolling ring support rod 240 away from the first through hole 212 and the second through hole 222 may be a polished rod structure, and the semicircular protrusion may be disposed on the polished rod surface.
In one embodiment, the rolling ring strut 240 includes a strut head 241 and a strut rod 242, a first annular boss 243 is formed on a side of the strut head 241 close to the strut rod 242, and an outer diameter of the first annular boss 243 is smaller than a diameter of the strut head 241 and larger than a diameter of the strut rod 242. The side wall of the through groove 231 where the first through hole 212 and the second through hole 222 are located is processed with a second annular boss 232, and the outer diameter of the second annular boss 232 is the same as that of the first annular boss 243. The first rolling ring 211 is provided with annular grooves 213 at two ends along the axial direction, the diameter of the annular groove 213 is the same as the outer diameter of the first annular boss 243, the annular groove 213 is used for fixing two sides of the first rolling ring 211 to the first annular boss 243 and the second annular boss 232, and the second rolling ring 221 is the same as the first rolling ring 211 in structure. In one embodiment, the rolling ring struts 240 may be screws and the first and second through holes 212, 222 may be threaded through holes. Wherein, the surface of the bracket on one side of the through hole facing the through groove 231 is processed with a boss, i.e. a second annular boss 232. A first annular boss 243 is machined on the side of the screw head near the screw shaft. In this embodiment, the first and second rolling rings 211 and 221 may be installed on the bracket body 230 by screws and screw through holes in a screw-fit manner, and both sides of the first and second rolling rings 211 and 221 are in contact with the first and second annular bosses 243 and 232, respectively.
In one embodiment, the bracket body 230 defines two mounting grooves 233, the mounting grooves 233 are located at two ends of the bracket body 230 along the extending direction of the through slot 231, and located at one side of the bracket body 230 away from the through slot 231. The quartz bracket system further comprises two mounting stoppers 250, one end of each mounting stopper 250 abuts against the mounting groove 233, the other end of each mounting stopper 250 abuts against the quartz heating tube, and the mounting stoppers 250 and the mounting grooves 233 are used for fixing the bracket body 230. It can be understood that, since the quartz bracket 200 is used for supporting a copper foil in a furnace tube, the bracket body 230 can be fixed in the furnace tube by respectively forming symmetrical grooves, i.e., the mounting grooves 233, at both axial sides of the lower end of the quartz bracket body, in combination with the mounting stoppers 250 made of quartz material. The copper foil conveyed out of the feeding transfer chamber can enter the discharging transfer chamber through the conveying of each pair of the first rolling ring 211 and the second rolling ring 221.
In one embodiment, the side of the holder body 230 away from the through slot 231 is formed with an inclined surface for increasing the contact area with the inner wall of the quartz heating tube 260. The radial two sides of one end of the bracket body 230, which is attached to the wall of the quartz tube, are provided with a plurality of transition slopes, and the shape of the transition slopes is close to the shape of the inner wall of the quartz tube, which is contacted with the transition slopes. It is understood that a plurality of transition bevels (or polyline bevels) may fix the stent body 230, thereby preventing or reducing the radial rotation of the stent body 230 in the quartz heating tube 260 and improving the positional stability of the stent body 230.
Referring to fig. 12, based on the same inventive concept, the present application further provides a quartz heating apparatus, which includes a quartz holder and a quartz heating tube 260 according to any of the above embodiments, wherein the quartz heating tube 260 surrounds a heating cavity 261, and the quartz holder is located in the heating cavity 261. In one embodiment, the quartz heating tube 260 includes a quartz tube 263 and a heating device 262, and the heating device 262 is disposed on an outer wall of the quartz tube 263.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the claims. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. A quartz support, comprising:
the first support is provided with at least three first rolling rings, the first rolling rings are sequentially arranged along the extension direction of the first support, and the heights of the adjacent first rolling rings are different; and
the second support is arranged opposite to the first support and is provided with at least three second rolling rings, the second rolling rings correspond to the first rolling rings one by one, the heights of the positions of the second rolling rings are the same as those of the corresponding first rolling rings, and the connecting line of the second rolling rings and the corresponding first rolling rings is perpendicular to the extending direction of the first support;
the first rolling ring and the second rolling ring are used for supporting and conveying copper foils of graphite to be grown, and the first support, the second support, the first rolling ring and the second rolling ring are all made of quartz materials.
2. The quartz support according to claim 1, further comprising a support body defining a through slot, wherein one sidewall of the through slot forms the first support and the other sidewall forms the second support, and the extending direction of the first support is the extending direction of the through slot.
3. The quartz holder of claim 2,
the first support is provided with at least three first through holes, the first through holes are sequentially arranged along the extending direction of the through groove, the heights of the adjacent first through holes are different, the second support is provided with at least three second through holes, the second through holes correspond to the first through holes one to one, the heights of the positions of the second through holes are the same as the heights of the positions of the corresponding first through holes, and the connecting line of the second through holes and the corresponding first through holes is perpendicular to the extending direction of the through groove;
the quartz support further comprises a plurality of rolling ring supporting rods, wherein the rolling ring supporting rods are respectively arranged in each first through hole and each second through hole, the first rolling ring and the second rolling ring are sleeved on the rolling ring supporting rods, and the first rolling ring and the second rolling ring are used for rotating along the rolling ring supporting rods.
4. The quartz holder according to claim 3, wherein the surface of the first and/or second rolling ring in contact with the rolling ring struts is provided with semicircular protrusions for reducing friction between the first and/or second rolling ring and the rolling ring struts.
5. The quartz holder according to claim 3, wherein the rolling ring strut comprises a strut head and a strut rod, a first annular boss is machined on one side of the strut head close to the strut rod, and the outer diameter of the first annular boss is smaller than the diameter of the strut head and larger than the diameter of the strut rod;
a second annular boss is machined on the side wall of the through groove where the first through hole and the second through hole are located, and the outer diameter of the second annular boss is the same as that of the first annular boss;
the first rolling ring is provided with annular grooves at two ends in the axial direction, the diameter of each annular groove is the same as the outer diameter of the corresponding first annular boss, the annular grooves are used for fixing two sides of the first rolling ring to the first annular bosses and the second annular bosses respectively, and the second rolling ring is the same as the first rolling ring in structure.
6. The quartz holder according to claim 5, wherein the strut rod portion is in threaded connection with the first through hole and/or the second through hole.
7. The quartz support according to claim 2, wherein the support body defines two mounting grooves, the mounting grooves are located at two ends of the support body along the extending direction of the through groove and located at one side of the support body away from the through groove;
the quartz support system further comprises two mounting stop blocks, one end of each mounting stop block is abutted to the corresponding mounting groove, the other end of each mounting stop block is abutted to the corresponding quartz heating pipe, and the mounting stop blocks and the mounting grooves are used for fixing the support body.
8. The quartz holder according to claim 2, wherein a side of the holder body away from the through slot is formed with a bevel for fixing the holder body to an inner wall of the quartz heating tube.
9. A quartz heating device, comprising the quartz holder as claimed in any one of claims 1 to 8 and a quartz heating tube, wherein the quartz heating tube surrounds to form a heating chamber, and the quartz holder is located in the heating chamber.
10. The quartz heating device of claim 9, wherein the quartz heating tube comprises a quartz tube and a heating device, the heating device being disposed on an outer wall of the quartz tube.
CN202010646128.0A 2020-07-07 2020-07-07 Quartz support and quartz heating device Pending CN111733400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010646128.0A CN111733400A (en) 2020-07-07 2020-07-07 Quartz support and quartz heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010646128.0A CN111733400A (en) 2020-07-07 2020-07-07 Quartz support and quartz heating device

Publications (1)

Publication Number Publication Date
CN111733400A true CN111733400A (en) 2020-10-02

Family

ID=72655394

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010646128.0A Pending CN111733400A (en) 2020-07-07 2020-07-07 Quartz support and quartz heating device

Country Status (1)

Country Link
CN (1) CN111733400A (en)

Similar Documents

Publication Publication Date Title
CN212334600U (en) Graphene production system
JP6258610B2 (en) Spinning and drawing equipment
CN111675210A (en) Graphene production system
WO2003005480A1 (en) Secondary battery, manufacturing method for secondary battery, and manufacturing apparatus for secondary battery
JP2009094399A (en) Manufacturing apparatus of thin film solar cell
CN212505055U (en) Quartz support and quartz heating device
WO2023109011A1 (en) Coating system and coating production line
CN111733400A (en) Quartz support and quartz heating device
CN111668432A (en) Lithium ion battery coating diaphragm and processing technology thereof
JP6376685B2 (en) Thin film forming apparatus and thin film forming method
CN114986864B (en) Battery diaphragm stretching production line and stretching method thereof
CN206857807U (en) A kind of plastic foil production unloads winding apparatus automatically
KR20210147522A (en) Method for manufacturing electrode of battery
CN209851639U (en) Heat treatment device for battery diaphragm forming
KR101779969B1 (en) Method for manufacturing of piezoelectric film
CN212335287U (en) Linear tandem atomic layer deposition system
TWI789144B (en) Reel to reel plasma desmear machine
CN110565311A (en) Continuous purification device for soft felt
US20200131627A1 (en) Heat treatment apparatus for a vacuum chamber, deposition apparatus for depositing material on a flexible substrate, method of heat treatment of a flexible substrate in a vacuum chamber, and method for processing a flexible substrate
KR20150077119A (en) Apparatus for processing flexible substrate and method of processing flexible substrate using the same
KR200204631Y1 (en) An apparatus for compressing sponge automatically
KR101765230B1 (en) High Temperature Single-Axis Stretching Machine for Film
CN219793100U (en) Antistatic film production device
JPH09227705A (en) Device for treating surface of web
JP3297487B2 (en) Photovoltaic element, method for forming the same, and apparatus for forming the same

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination