CN111732869B - Composition for resisting atomic oxygen denudation and preparation method and application thereof - Google Patents

Composition for resisting atomic oxygen denudation and preparation method and application thereof Download PDF

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CN111732869B
CN111732869B CN202010634906.4A CN202010634906A CN111732869B CN 111732869 B CN111732869 B CN 111732869B CN 202010634906 A CN202010634906 A CN 202010634906A CN 111732869 B CN111732869 B CN 111732869B
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atomic oxygen
resins
resin
boron nitride
composition
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CN111732869A (en
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张晓静
沈志刚
刘磊
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Beihang University
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    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
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    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
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    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
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    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
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    • C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
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    • C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2427/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2427/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2427/16—Homopolymers or copolymers of vinylidene fluoride
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    • C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
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    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
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    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

Abstract

The invention belongs to the technical field of composite materials, and particularly relates to a composition for resisting atomic oxygen denudation and a preparation method and application thereof. The invention provides an atomic oxygen ablation resisting composition which comprises, by weight, 10-60 parts of resin, 1-80 parts of boron nitride nanosheets, 1-80 parts of solvent and 0.1-20 parts of auxiliary agent. The anti-atomic oxygen ablation composition has a good protection effect on the substrate layer and can effectively resist the ablation of atomic oxygen; and the density is low, the weight is light, and the method has wide application prospect in the field of aerospace.

Description

Composition for resisting atomic oxygen denudation and preparation method and application thereof
Technical Field
The invention belongs to the technical field of composite materials, and particularly relates to a composition for resisting atomic oxygen denudation and a preparation method and application thereof.
Background
Low Earth Orbit (LEO) generally refers to an orbit which is a short distance from the surface of the Earth, and is a main operation area for Earth observation satellites, meteorological satellites, space stations and other equipment. However, due to the close distance to the earth, the space environment is complex, and the spacecraft is easily affected by various factors, such as atomic oxygen corrosion, ultraviolet radiation, charged particle radiation, large temperature difference and the like, among which the atomic oxygen corrosion is the most harmful. During flight, the spacecraft collides with a large amount of atomic oxygen, which, due to its high relative velocity, generates a high temperature at the surface. Meanwhile, because atomic oxygen has strong activity and high energy, the atomic oxygen can directly generate oxidation reaction with most materials, which seriously damages the material performance and the service life of the spacecraft.
Atomic oxygen attack resistance of aircraft materials is dominated mainly by the development of new materials and the addition of protective films, which are mainly inorganic coatings. The inorganic coating is mainly an inorganic oxide protective coating (such as SiO)2And Al2O3) The high-hardness wear-resistant high-strength polyurethane elastomer has excellent performances of wear resistance, high hardness, high light transmittance, stable chemical property and the like, but also has the defects of poor flexibility, high preparation cost, weak inorganic and interface bonding force, high density and the like. Therefore, there is a need to develop a new corrosion resistant material or a new method for corrosion protection, and the corrosion resistant material needs to have the characteristics of wide application range, extremely small thickness, environmental friendliness, strong corrosion resistance and the like.
Disclosure of Invention
In order to solve the technical problem, the first aspect of the invention provides an atomic oxygen ablation resisting composition, which comprises, by weight, 10-60 parts of resin, 1-80 parts of boron nitride nanosheet, 1-80 parts of solvent and 0.1-20 parts of auxiliary agent.
As a preferable technical scheme, the boron nitride nano-sheet material comprises, by weight, 25-40 parts of resin, 10-30 parts of boron nitride nano-sheet, 35-60 parts of solvent and 1-3 parts of auxiliary agent.
As a preferable technical scheme, the resin is selected from one or more of natural resin, synthetic resin and modified resin; preferably, the resin is selected from one or more of epoxy resin, phenolic resin, polyester resin, unsaturated polyester resin, silicone resin, fluorocarbon resin, acrylic resin, acrylate oligomer, alkyd resin, vinyl resin, polyamide resin, vinyl chloride-vinyl acetate resin, polyurethane resin, polyvinylidene fluoride resin, and synthetic rubber.
As a preferable technical solution, the average thickness of the boron nitride nanosheets is less than or equal to 100 nm.
As a preferable technical solution, the average lateral dimension of the boron nitride nanosheet is greater than or equal to 2 microns.
As a preferable technical scheme, the average thickness of the boron nitride nanosheet is 20-100nm, and the average transverse dimension is 2-10 microns.
In a preferred embodiment, the solvent is one or more selected from water, aromatic hydrocarbons, aliphatic hydrocarbons, alicyclic hydrocarbons, halogenated hydrocarbons, alcohol ethers, esters, ketones, glycol derivatives, and mineral oils.
As a preferable technical solution, the auxiliary agent is selected from one or more of a dispersing agent, a stabilizing agent, a protecting agent, a film forming agent, a coupling agent, a plasticizer, an antifoaming agent, a thickening agent, a wetting agent, a leveling agent, a thixotropic agent, a cross-linking agent, a bactericide, a photoinitiator, a thermal initiator, an ultraviolet absorber and an accelerator.
In a second aspect, the present invention provides a method for preparing the atomic oxygen ablation resisting composition, which comprises the following steps: and (3) uniformly mixing the resin, the boron nitride, the solvent and the auxiliary agent to obtain the boron nitride/silicon/.
In a third aspect of the invention, the use of the atomic oxygen ablation resisting composition is provided, wherein the atomic oxygen ablation resisting composition is coated on a substrate to form a coating layer.
Has the advantages that: the anti-atomic oxygen ablation composition has a good protection effect on the substrate layer and can effectively resist the ablation of atomic oxygen; and the density is low, the weight is light, and the method has wide application prospect in the field of aerospace.
Detailed Description
For purposes of the following detailed description, it is to be understood that the invention may assume various alternative variations and step sequences, except where expressly specified to the contrary. Moreover, other than in any operating examples, or where otherwise indicated, all numbers expressing, for example, quantities of ingredients used in the specification and claims are to be understood as being modified in all instances by the term "about". Accordingly, unless indicated to the contrary, the numerical parameters set forth in the following specification and attached claims are approximations that may vary depending upon the desired properties to be obtained by the present invention. At the very least, and not as an attempt to limit the application of the doctrine of equivalents to the scope of the claims, each numerical parameter should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques.
Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements.
When a range of values is disclosed herein, the range is considered to be continuous and includes both the minimum and maximum values of the range, as well as each value between such minimum and maximum values. Further, when a range refers to an integer, each integer between the minimum and maximum values of the range is included. Further, when multiple range-describing features or characteristics are provided, the ranges may be combined. In other words, unless otherwise indicated, all ranges disclosed herein are to be understood to encompass any and all subranges subsumed therein. For example, a stated range from "1 to 10" should be considered to include any and all subranges between the minimum value of 1 and the maximum value of 10. Exemplary subranges of the range 1 to 10 include, but are not limited to, 1 to 6.1, 3.5 to 7.8, 5.5 to 10, and the like.
In order to solve the problems, the invention provides an atomic oxygen ablation resisting composition which comprises, by weight, 10-60 parts of resin, 1-80 parts of boron nitride nanosheets, 1-80 parts of solvent and 0.1-20 parts of auxiliary agent.
Preferably, the atomic oxygen ablation resisting composition comprises, by weight, 25-40 parts of resin, 10-30 parts of boron nitride nanosheets, 35-60 parts of solvent and 1-3 parts of auxiliary agent.
The resin is selected from one or more of natural resin, synthetic resin and modified resin; the resin is a commercial product; preferably, the resin is selected from one or more of epoxy resin, phenolic resin, polyester resin, unsaturated polyester resin, silicone resin, fluorocarbon resin, acrylic resin, acrylate oligomer, alkyd resin, vinyl resin, polyamide resin, vinyl chloride-vinyl acetate resin, polyurethane resin, polyvinylidene fluoride resin, and synthetic rubber.
In a preferred embodiment, the resin is a polyvinylidene fluoride resin. The polyvinylidene fluoride resin is a homopolymer of vinylidene fluoride or a copolymer of the vinylidene fluoride and other small amount of fluorine-containing vinyl monomers; the structure contains vinyl and difluorovinyl.
In a preferred embodiment, the resin is an epoxy resin and/or a silicone resin; further, the weight ratio of the epoxy resin to the silicone resin is 1: 1-3.
The epoxy resin molecule contains more than two epoxy groups, is a polycondensation product of epichlorohydrin and bisphenol A or polyhydric alcohol, and also contains hydroxyl; the organic silicon resin is a polymer formed by alternately connecting silicon atoms and oxygen atoms to form a framework, and different organic groups are connected with the silicon atoms, so that a highly-crosslinked three-dimensional network structure can be formed.
The average thickness of the boron nitride nanosheets is less than 100nm, and the average transverse dimension is greater than 2 microns; preferably, the average thickness of the boron nitride nanosheets is 20-100nm, and the average lateral dimension is 2-10 microns.
The transverse dimension refers to the longest dimension of the same plane of the boron nitride nanosheet.
The method for producing the boron nitride nanosheet is not particularly limited, and a liquid-phase exfoliation method, a vapor-phase deposition method, and the like can be exemplified; in the application, the preparation method of the boron nitride nanosheet is a liquid phase stripping method.
The liquid phase stripping method for preparing the boron nitride nanosheet comprises the following steps: adding boron nitride into a first solvent, stripping by using ultrasonic waves, testing the thickness and the transverse dimension of the boron nitride nanosheet after stripping for a certain time, and stopping ultrasonic treatment after the thickness and the transverse dimension meet the dimension requirement.
The solvent is one or more selected from water, aromatic hydrocarbons, aliphatic hydrocarbons, alicyclic hydrocarbons, halogenated hydrocarbons, alcohol ethers, esters, ketones, glycol derivatives and mineral oil. As examples of the aromatic hydrocarbon solvent, xylene, toluene, ethylbenzene, nitrobenzene; as examples of the aliphatic hydrocarbon solvent, hexane, pentane, octane, heptane; as examples of the alicyclic hydrocarbon solvent, cyclohexane, cyclopentane; as examples of the halogenated hydrocarbon solvent, chlorobenzene, terephthaloyl chloride, chlorophenol; as examples of the alcohol ether solvents, ethylene glycol monobutyl ether, propylene glycol methyl ether acetate; as examples of the ester solvent, there may be mentioned ethyl acetate, methyl acetate, ethyl propionate; as examples of the ketone solvent, acetone and methyl ethyl ketone can be cited.
Preferably, the solvent comprises at least one of xylene, propylene glycol methyl ether acetate, and ethylene glycol monobutyl ether.
In order to better achieve the object of the present invention, the composition further comprises an auxiliary agent; the auxiliary agent is selected from one or more of a dispersing agent, a stabilizing agent, a protective agent, a film forming agent, a coupling agent, a plasticizer, an antifoaming agent, a thickening agent, a wetting agent, a leveling agent, a thixotropic agent, a cross-linking agent, a bactericide, a photoinitiator, a thermal initiator, an ultraviolet absorber and an accelerator.
In some embodiments, the adjuvant comprises a coupling agent and/or an accelerator.
The coupling agent is a silane coupling agent and/or a titanate coupling agent; the silane coupling agent is at least one of KH550, A172, KH560, KH570, KH792, DL602 and DL 171. The titanate coupling agent comprises at least one of TMC-201, TMC-102, TMC-101, TMC-105, TMC-311 and TMC-TTS.
The accelerator is an amine accelerator; the amine accelerant comprises at least one of diethylenetriamine-acrylonitrile copolymer, N, N, N' -pentamethyl diethylenetriamine and tetramethyl ethylenediamine.
The second aspect of the present invention provides a method for producing the composition for atomic oxygen degradation, comprising the steps of: and (3) uniformly mixing the resin, the boron nitride, the solvent and the auxiliary agent to obtain the boron nitride/silicon/.
Preferably, the mixture is uniformly mixed by treating the mixture with a sand mill 300 and 1000 revolutions/min for 2 to 4 hours.
In a third aspect of the invention, the use of the atomic oxygen ablation resisting composition is enhanced by applying the atomic oxygen ablation resisting composition to a substrate to form a coating thereon.
The coating method comprises one of spraying, printing, dip coating and roll coating.
The base material comprises at least one of a PET film, a PC film, an LDPE film and a PVC film.
The PET is a thermoplastic polyester and is a condensation polymer of terephthalic acid and ethylene glycol.
The PC film refers to a polycarbonate film.
The boron nitride nanosheet is a novel two-dimensional nanomaterial, has a large surface area on one crystal face, and forms a compact protective layer. Each layer of the boron nitride nanosheet is of an infinitely extending hexagonal honeycomb structure formed by alternately arranging B atoms and N atoms; the applicant finds that the boron nitride nanosheets with a certain size, the resin material, the auxiliary agent and the like are mutually cooperated to form the composite material with good mechanical strength, and the damage of fillers to the mechanical property of the high polymer material is avoided. Particularly, after the coating is coated on a PET film base material, the damage of atomic oxygen to the film is greatly reduced; and the two-dimensional nano material is light in texture, the weight of the spacecraft can be reduced, and the design requirement can be well met.
The present invention will be specifically described below by way of examples. It should be noted that the following examples are only for illustrating the present invention and should not be construed as limiting the scope of the present invention, and that the insubstantial modifications and adaptations of the present invention by those skilled in the art based on the above disclosure are still within the scope of the present invention.
In addition, the starting materials used are all commercially available, unless otherwise specified.
Examples
Example 1
An atomic oxygen ablation resisting composition comprises, by weight, 40 parts of resin, 30 parts of boron nitride nanosheets, 50 parts of solvent xylene, and KH 5501 parts of assistant silane coupling agent.
The Resin is epoxy Resin with the model number Epon Resin1001 and the manufacturer is the American vast;
the preparation method of the boron nitride nanosheet comprises the following steps: adding boron nitride into isopropanol (the concentration is 1mg/mL), stripping by using ultrasonic waves, testing the thickness and the transverse size of the hexagonal boron nitride after stripping for a certain time to obtain the boron nitride nanosheet, wherein the average thickness is 80nm, the average transverse size is 5 microns, stopping ultrasonic treatment, performing suction filtration and drying.
The preparation method of the composition for atomic oxygen degradation comprises the following steps: and (3) treating the resin, the boron nitride nanosheet, the solvent and the auxiliary agent by using a sand mill at 500 rpm for 3 hours, and uniformly mixing to obtain the boron nitride nanosheet.
Coating the composition for atomic oxygen degradation on a PET film;
placing pure PET film and PET film coated with composition for atomic oxygen denudation simultaneously into a container with atomic oxygen flux density of 1.6 × 1020atoms/cm2On an atomic oxygen simulator for 20 hours, the results are: the pure PET film had a mass loss of 46%, and the PET film coated with the composition for atomic oxygen degradation had a weight loss of 0.6%.
The adhesion between the composition and the PET film is tested by a check method, wherein the composition has no shedding and good adhesion.
Example 2
An anti-atomic oxygen ablation composition comprises, by weight, 25 parts of resin, 15 parts of boron nitride nanosheets, 60 parts of a solvent, and an auxiliary titanate coupling agent TMC-2011.
The resin is polyvinylidene fluoride resin with the model of HSV900, and the manufacturer is French Dokema;
the solvent comprises xylene, propylene glycol methyl ether acetate and ethylene glycol monobutyl ether; the weight ratio of the xylene to the propylene glycol monomethyl ether acetate to the ethylene glycol monobutyl ether is 3: 2: 1.
the preparation method of the boron nitride nanosheet comprises the following steps: adding boron nitride into isopropanol (the concentration is 1mg/mL), stripping by using ultrasonic waves, testing the thickness and the transverse dimension of the hexagonal boron nitride after stripping for a certain time, stopping ultrasonic treatment when the average thickness of the obtained boron nitride nanosheet is 20nm and the average transverse dimension is 2 microns, performing suction filtration, and drying.
The preparation method of the composition for atomic oxygen degradation comprises the following steps: and (3) treating the resin, the boron nitride, the solvent and the auxiliary agent by using a sand mill at 300 revolutions per minute for 8 hours, and uniformly mixing to obtain the boron nitride/boron nitride/boron nitride/boron nitride/boron nitride/.
Coating the composition for atomic oxygen degradation on a PET film;
pure PET film and PET film coated with composition for atomic oxygen denudationWhile putting atomic oxygen flux density at 1.2X 1020atoms/cm2On an atomic oxygen ground effect simulator for 10 hours, the results are: the pure PET film had a mass loss of 26%, and the PET film coated with the composition for atomic oxygen degradation had a weight loss of 0.4%.
The adhesion between the composition and the PET film is tested by a check method, wherein the composition has no shedding and good adhesion.
Example 3
An atomic oxygen ablation resisting composition comprises, by weight, 30 parts of resin, 10 parts of boron nitride nanosheets, 35 parts of solvent xylene, 1722 parts of assistant silane coupling agent A and 1 part of assistant accelerator diethylenetriamine-acrylonitrile copolymer.
The diethylenetriamine-acrylonitrile copolymer is purchased from Zhang hong Yarui chemical Co., Ltd, and has the model of 591 #.
The resin is organic silicon resin and epoxy resin, the type of the organic silicon resin is Dow Corning RSN0808, the type of the epoxy resin is Barlin petrochemical, E12; the weight ratio of the organic silicon resin to the epoxy resin is 2: 1;
the preparation method of the boron nitride nanosheet comprises the following steps: adding boron nitride into isopropanol (the concentration is 1mg/mL), stripping by using ultrasonic waves, testing the thickness and the transverse dimension of the hexagonal boron nitride after stripping for a certain time, stopping ultrasonic treatment when the average thickness of the obtained boron nitride nanosheet is 100nm and the average transverse dimension is 8 microns, performing suction filtration, and drying.
The preparation method of the composition for atomic oxygen degradation comprises the following steps: and (3) treating the resin, the boron nitride, the solvent and the auxiliary agent by using a sand mill at 800 revolutions per minute for 4 hours, and uniformly mixing to obtain the boron nitride/boron nitride/boron nitride/boron nitride/boron/.
Coating the composition for atomic oxygen degradation on a PC film;
placing pure PET film and PET film coated with composition for atomic oxygen denudation simultaneously into a container with atomic oxygen flux density of 0.9 × 1020atoms/cm2On an atomic oxygen ground effect simulator for 30 hours, the results are: mass loss of pure PET film of 49%, weight of PET film coated with composition for atomic oxygen denudationThe loss was 0.3%.
The adhesion between the composition and the PET film is tested by a check method, wherein the composition has no shedding and good adhesion.
Comparative example 1
A composition, an embodiment of which is the same as example 3, except that, in the absence of boron nitride nanosheets, both the neat PET film and the PET film coated with the composition were placed simultaneously with an atomic oxygen flux density of 0.9X 1020atoms/cm2On an atomic oxygen ground effect simulator for 30 hours, the results are: the pure PET film mass loss was 49%, and the PET film coated with the composition had a weight loss of 2.5%.
Comparative example 2
A composition, whose embodiment is the same as example 3, except that 100 parts of boron nitride nanosheets are prepared by simultaneously placing a pure PET film and a PET film coated with the composition into a chamber having an atomic oxygen flux density of 0.9X 1020atoms/cm2On an atomic oxygen ground effect simulator for 30 hours, the results are: the pure PET film mass loss was 48%, and the PET film coated with the composition weight loss was 0.2%; the adhesion of the composition to PET films was tested by the one-hundred-grid method, where the composition drop area accounted for 73% of the total area, and the adhesion was poor.
Comparative example 3
A composition, an embodiment of which is the same as example 3, except that the boron nitride nanosheets have an average thickness of 20nm and an average transverse dimension of 1 micron, and that both the neat PET film and the PET film coated with the composition are simultaneously subjected to an atomic oxygen flux density of 0.9 x 1020atoms/cm2On an atomic oxygen ground effect simulator for 30 hours, the results are: the pure PET film mass loss was 49%, and the PET film coated with the composition weight loss was 0.9%.
Comparative example 4
A composition, an embodiment of which is the same as example 3, except that the boron nitride nanosheets have an average thickness of 400nm and an average transverse dimension of 10 microns, and that both the neat PET film and the PET film coated with the composition are simultaneously subjected to an atomic oxygen flux density of 0.9 x 1020atoms/cm2Atom of (2)Treatment on an oxygen ground effect simulator for 30 hours resulted in: the pure PET film mass loss was 50%, and the PET film coated with the composition weight loss was 1.2%.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in other forms, and any person skilled in the art may modify or change the technical content of the above disclosure into equivalent embodiments with equivalent changes, but all those simple modifications, equivalent changes and modifications made to the above embodiments according to the technical spirit of the present invention still belong to the protection scope of the present invention.

Claims (7)

1. An anti-atomic oxygen ablation composition is characterized by comprising, by weight, 25-40 parts of resin, 10-30 parts of boron nitride nanosheets, 35-60 parts of solvent and 1-3 parts of auxiliary agent;
the average thickness of the boron nitride nanosheet is 20-100nm, and the average transverse dimension is 2-10 microns.
2. The atomic oxygen ablation resistant composition according to claim 1, wherein the resin is selected from one or more of natural resins, synthetic resins, and modified resins.
3. The atomic oxygen ablation resistant composition of claim 1, wherein the resin is selected from one or more of epoxy resins, phenolic resins, polyester resins, silicone resins, fluorocarbon resins, acrylic resins, alkyd resins, vinyl resins, polyamide resins, vinyl chloride resins, polyurethane resins, polyvinylidene fluoride resins, and synthetic rubbers.
4. The atomic oxygen ablation resistant composition of claim 1, wherein the solvent is selected from one or more of water, aromatic hydrocarbons, aliphatic hydrocarbons, alicyclic hydrocarbons, halogenated hydrocarbons, alcohol ethers, esters, ketones, glycol derivatives, and mineral oils.
5. The atomic oxygen ablation resistant composition according to claim 1, wherein the auxiliary agent is selected from one or more of a dispersant, a stabilizer, a protectant, a film former, a coupling agent, a plasticizer, an antifoaming agent, a thickener, a wetting agent, a leveling agent, a thixotropic agent, a cross-linking agent, a bactericide, a photoinitiator, a thermal initiator, an ultraviolet absorber, and an accelerator.
6. A method of preparing an atomic oxygen ablation resistant composition according to any of claims 1 to 5, comprising the steps of: and uniformly mixing the resin, the boron nitride nanosheet, the solvent and the auxiliary agent to obtain the boron nitride nanosheet.
7. Use of an atomic oxygen ablation resisting composition according to any one of claims 1 to 5, wherein the atomic oxygen ablation resisting composition is applied to a substrate to form a coating.
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