CN111600307A - Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system - Google Patents
Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system Download PDFInfo
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- CN111600307A CN111600307A CN202010485542.8A CN202010485542A CN111600307A CN 111600307 A CN111600307 A CN 111600307A CN 202010485542 A CN202010485542 A CN 202010485542A CN 111600307 A CN111600307 A CN 111600307A
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J3/00—Circuit arrangements for ac mains or ac distribution networks
- H02J3/01—Arrangements for reducing harmonics or ripples
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
- G01R23/16—Spectrum analysis; Fourier analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
- G01R23/16—Spectrum analysis; Fourier analysis
- G01R23/20—Measurement of non-linear distortion
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J13/00—Circuit arrangements for providing remote indication of network conditions, e.g. an instantaneous record of the open or closed condition of each circuitbreaker in the network; Circuit arrangements for providing remote control of switching means in a power distribution network, e.g. switching in and out of current consumers by using a pulse code signal carried by the network
- H02J13/00001—Circuit arrangements for providing remote indication of network conditions, e.g. an instantaneous record of the open or closed condition of each circuitbreaker in the network; Circuit arrangements for providing remote control of switching means in a power distribution network, e.g. switching in and out of current consumers by using a pulse code signal carried by the network characterised by the display of information or by user interaction, e.g. supervisory control and data acquisition systems [SCADA] or graphical user interfaces [GUI]
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J13/00—Circuit arrangements for providing remote indication of network conditions, e.g. an instantaneous record of the open or closed condition of each circuitbreaker in the network; Circuit arrangements for providing remote control of switching means in a power distribution network, e.g. switching in and out of current consumers by using a pulse code signal carried by the network
- H02J13/00002—Circuit arrangements for providing remote indication of network conditions, e.g. an instantaneous record of the open or closed condition of each circuitbreaker in the network; Circuit arrangements for providing remote control of switching means in a power distribution network, e.g. switching in and out of current consumers by using a pulse code signal carried by the network characterised by monitoring
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/40—Arrangements for reducing harmonics
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y04—INFORMATION OR COMMUNICATION TECHNOLOGIES HAVING AN IMPACT ON OTHER TECHNOLOGY AREAS
- Y04S—SYSTEMS INTEGRATING TECHNOLOGIES RELATED TO POWER NETWORK OPERATION, COMMUNICATION OR INFORMATION TECHNOLOGIES FOR IMPROVING THE ELECTRICAL POWER GENERATION, TRANSMISSION, DISTRIBUTION, MANAGEMENT OR USAGE, i.e. SMART GRIDS
- Y04S40/00—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them
- Y04S40/12—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them characterised by data transport means between the monitoring, controlling or managing units and monitored, controlled or operated electrical equipment
- Y04S40/126—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them characterised by data transport means between the monitoring, controlling or managing units and monitored, controlled or operated electrical equipment using wireless data transmission
Abstract
The invention discloses a harmonic monitoring system and a monitoring method of a radio frequency power supply and a semiconductor equipment system, wherein the radio frequency power supply is used for supplying power to ferrite coupling induction plasma process equipment, and the harmonic monitoring system of the radio frequency power supply comprises the following components: the harmonic analyzer is connected with the radio frequency power supply and is used for measuring the harmonic of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply; and the monitor is connected with the harmonic analyzer and is used for displaying the total harmonic distortion in real time. The harmonic wave monitoring system and the monitoring method of the radio frequency power supply and the semiconductor equipment system can monitor the harmonic wave of the radio frequency power supply in real time.
Description
Technical Field
The invention relates to the technical field of semiconductor process equipment, in particular to a harmonic monitoring system and a monitoring method of a radio frequency power supply and a semiconductor equipment system.
Background
Plasma (plasma), also called plasma, is an ionized gaseous substance consisting of positive and negative ions generated by ionization of atoms and radicals, from which part of electrons are deprived, the motion of which is dominated by electromagnetic force and exhibits a remarkable collective behavior. Plasma is widely used in the production process of semiconductor devices, and in plasma etching or plasma deposition systems, an rf power source is required to provide rf energy to a process chamber to generate plasma.
When Ferrite Coupled Induction Plasma (FCIP) process equipment works, a magnetic field generated by the toroidal core may affect harmonics of the radio frequency power supply, so that the harmonics of the radio frequency power supply are easily too large, and power supply of the Ferrite Coupled Induction Plasma process equipment and other semiconductor process equipment sharing a power distribution board is abnormal, so that the Ferrite Coupled Induction Plasma process equipment and other semiconductor process equipment sharing the power distribution board work abnormally, and a poor process condition occurs.
Disclosure of Invention
The invention aims to solve the problem that ferrite coupling induction plasma process equipment influences harmonic waves of a radio frequency power supply to cause poor process.
The invention is realized by the following technical scheme:
a harmonic monitoring system for a radio frequency power supply for powering ferrite coupled inductive plasma processing equipment, comprising:
the harmonic analyzer is connected with the radio frequency power supply and is used for measuring the harmonic of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
a monitor connected to the harmonic analyzer, the monitor for displaying the total harmonic distortion in real time.
Optionally, the radio frequency power supply includes an AC input module, an AC-DC conversion module, and a radio frequency module, where the AC input module includes a transformer and a filter inductor;
the transformer is connected with the power distribution board and is used for carrying out transformation processing on the alternating current provided by the power distribution board;
the filter inductor is connected with the transformer and is used for filtering the alternating current output by the transformer;
the AC-DC conversion module is connected with the filter inductor and is used for converting the alternating current output by the filter inductor into direct current;
the radio frequency module is connected with the AC-DC conversion module and is used for converting the direct current output by the AC-DC conversion module into radio frequency current.
Optionally, the input of the harmonic analyzer is connected to an ac transmission line between the power distribution board and the transformer; alternatively, the first and second electrodes may be,
the input end of the harmonic analyzer is connected with an alternating current transmission line between the transformer and the filter inductor; alternatively, the first and second electrodes may be,
and the input end of the harmonic analyzer is connected with an alternating current transmission line between the filter inductor and the AC-DC conversion module.
Optionally, the monitor is further configured to display the harmonic upper limit value, the harmonic lower limit value, and the harmonic reference value.
Optionally, the harmonic monitoring system of the radio frequency power supply further includes:
a controller coupled to the monitor, the controller to store the total harmonic distortion.
Optionally, the controller is further configured to send an alarm signal to the ferrite-coupled inductive plasma processing apparatus and associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, where the associated equipment is processing equipment sharing a power distribution board with the ferrite-coupled inductive plasma processing apparatus; and/or the presence of a gas in the gas,
the controller is further configured to perform interlock control on the ferrite coupled inductive plasma process equipment and associated equipment to stop the operation of the ferrite coupled inductive plasma process equipment and the associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, where the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
Based on the same inventive concept, the present invention also provides a harmonic monitoring method of a radio frequency power supply, the radio frequency power supply is used for supplying power to ferrite coupling induction plasma process equipment, and the method comprises the following steps:
measuring the harmonic wave of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
and displaying the total harmonic distortion in real time.
Optionally, the harmonic monitoring method of the radio frequency power supply further includes:
and displaying the harmonic upper limit value, the harmonic lower limit value and the harmonic reference value.
Optionally, the harmonic monitoring method of the radio frequency power supply further includes:
when the total harmonic distortion is larger than the harmonic upper limit value or the harmonic reference value, sending an alarm signal to the ferrite coupled inductive plasma process equipment and associated equipment, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment; and/or the presence of a gas in the gas,
displaying a harmonic upper limit value, a harmonic lower limit value and a harmonic reference value, and performing interlocking control on the ferrite coupling induction plasma process equipment and associated equipment to stop the ferrite coupling induction plasma process equipment and the associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, wherein the associated equipment shares a power distribution board with the ferrite coupling induction plasma process equipment.
Based on the same inventive concept, the invention also provides a semiconductor equipment system which comprises the harmonic monitoring system of the radio frequency power supply.
Compared with the prior art, the invention has the following advantages and beneficial effects:
according to the harmonic monitoring system and the monitoring method of the radio frequency power supply, provided by the invention, the total harmonic distortion of the radio frequency power supply is obtained by measuring the harmonic of the radio frequency power supply, the total harmonic distortion is displayed in real time, and a process operator can monitor the harmonic of the radio frequency power supply in real time, so that corresponding measures can be taken for ferrite coupling induction plasma process equipment and associated equipment when the harmonic of the radio frequency power supply is too large, and the condition that the process is poor due to abnormal power supply of the ferrite coupling induction plasma process equipment and the associated equipment is avoided.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the principles of the invention. In the drawings:
FIG. 1 is a schematic circuit diagram of an RF power supply for powering ferrite coupled inductive plasma processing equipment;
FIG. 2 is a schematic structural diagram of a harmonic monitoring system of a radio frequency power supply according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a harmonic analyzer in connection with a radio frequency power supply according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a harmonic analyzer in accordance with another embodiment of the present invention connected to a radio frequency power supply;
FIG. 5 is a schematic diagram of a harmonic analyzer in connection with a radio frequency power supply according to yet another embodiment of the present invention;
FIG. 6 is a schematic diagram of a monitor displaying total harmonic distortion according to an embodiment of the present invention;
fig. 7 is a flow chart of a harmonic monitoring method of a radio frequency power supply according to an embodiment of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to examples and accompanying drawings, and the exemplary embodiments and descriptions thereof are only used for explaining the present invention and are not meant to limit the present invention.
The present embodiments provide a harmonic monitoring system for a radio frequency power supply used to power ferrite coupled inductive plasma processing equipment. Fig. 1 is a schematic circuit diagram of the rf power supply, which includes an AC input module 11, an AC-DC conversion module 12, and an rf module 13. The AC input module 11 is configured to transform and filter AC power provided by the power distribution board, the AC-DC conversion module 12 is configured to convert AC power output by the AC input module 11 into DC power, and the rf module 13 is configured to invert DC power output by the AC-DC conversion module 12 to generate rf current, where the rf current passes through the toroidal core 14 in the ferrite coupling induction plasma processing apparatus.
Fig. 2 is a schematic structural diagram of a harmonic monitoring system of a radio frequency power supply provided in this embodiment, where the harmonic monitoring system of a radio frequency power supply provided in this embodiment includes a harmonic analyzer 21 and a monitor 22.
Specifically, the Harmonic analyzer 21 is connected to the rf power supply, and is configured to measure a Harmonic of the rf power supply and obtain a total Harmonic distortion thd (total Harmonic distortion) of the rf power supply. In power systems, the root cause of harmonic generation is due to nonlinear loads. When current flows through a load, the current is not in a linear relation with the applied voltage, and non-sinusoidal current is formed, namely, harmonic waves are generated in the circuit. According to different detection principles, the harmonic analyzer 21 may be an analyzer that uses an analog band-stop or band-pass filter for detection, an analyzer that uses a neural network as a basis, an analyzer that uses a wavelet analysis method, or an analyzer that uses an FFT variation method. The specific structure of the harmonic analyzer 21 is not an improvement of the present invention, and it can be implemented using an existing harmonic analyzer, and thus the specific structure of the harmonic analyzer 21 will not be described.
The harmonic of the rf power supply, i.e. the harmonic of the ac power input to the rf power supply, is measured, and therefore the input of the harmonic analyzer 21 needs to be connected to the ac input module 11 in the rf power supply. Referring to fig. 3 to 5, the connection relationship between the input terminal of the harmonic analyzer 21 and the radio frequency power supply will be described below by taking an example in which the ac input module 11 includes a transformer TR and a filter inductor ACL. The transformer TR is connected to the power distribution board and is used for transforming the ac power supplied from the power distribution board. The filter inductor ACL is connected to the transformer TR, and is configured to filter the ac power output by the transformer TR. The AC-DC conversion module 12 is connected to the filter inductor ACL, and is configured to convert the AC power output by the filter inductor ACL into DC power. The rf module 13 is connected to the AC-DC conversion module 12, and is configured to convert the DC power output by the AC-DC conversion module 12 into an rf current. The input of the harmonic analyzer 21 can be connected to the AC power line between the filter inductor ACL and the AC-DC conversion module 12, as shown in fig. 3; the input of the harmonic analyzer 21 can also be connected to the ac line between the transformer TR and the filter inductor ACL, as shown in fig. 4; the input of the harmonic analyzer 21 can also be connected to the alternating current transmission line between the power distribution board and the transformer TR, as shown in fig. 5.
The structure of the ac input module 11 is not limited to the structure shown in fig. 3 to 5. According to different practical application requirements, the structure of the alternating current input module 11 is changed correspondingly. For example, in some application scenarios, the voltage value provided by the power distribution board matches the voltage value required by the equipment, and the ac input module 11 does not need to be provided with the transformer TR; in other application scenarios, the process equipment has a higher requirement on the reliability of the radio frequency power supply, and the ac input module 11 needs to be provided with a fuse.
With continued reference to fig. 2, a monitor 22 is connected to the harmonic analyzer 21 for displaying the total harmonic distortion THD in real time. The monitor 22 is provided with a display device that can display the total harmonic distortion THD in real time. It should be noted that the monitor 22 and the harmonic analyzer 21 may be separately installed or may be integrated. When the monitor 22 and the harmonic analyzer 21 are integrated together, an isolation device needs to be disposed between the monitor 22 and the harmonic analyzer 21 to prevent the monitor 22 from interfering with the harmonic analyzer 21, which results in a decrease in the accuracy of the detection result of the harmonic analyzer 21.
In the harmonic monitoring system of the radio frequency power supply provided by this embodiment, the harmonic analyzer 21 is used to measure the harmonic of the radio frequency power supply, so as to obtain the total harmonic distortion THD of the radio frequency power supply, and the monitor 22 is used to display the total harmonic distortion THD in real time, so that a process operator can monitor the harmonic of the radio frequency power supply in real time, and thus when the harmonic of the radio frequency power supply is too large, corresponding measures can be taken for the ferrite coupled inductive plasma process equipment and the associated equipment, so as to avoid the situation that the process is not good due to abnormal power supply of the ferrite coupled inductive plasma process equipment and the associated equipment, where the associated equipment is the process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
Referring to fig. 6, in an alternative implementation, the monitor 22 may display the harmonic upper value USL, the harmonic lower value LSL, and the harmonic reference value I/L in addition to the total harmonic distortion THD. The harmonic upper limit value USL, the harmonic lower limit value LSL, and the harmonic reference value I/L may be input to the monitor 22 by a user through an input device such as a key, a touch screen, or a voice capture device. By displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L, contrast data can be provided for total harmonic distortion THD, and process operators can conveniently and visually compare the data.
Referring to fig. 2, in an alternative implementation, the harmonic monitoring system of the radio frequency power supply provided in the present embodiment further includes a controller 23 connected to the monitor 22, where the controller 23 is configured to store the total harmonic distortion THD. Through the total harmonic distortion THD, the historical data of the total harmonic distortion THD can be recorded, and fault analysis personnel can conveniently call and check the historical data.
In an alternative implementation, the controller 23 is further configured to send an alarm signal to the ferrite coupled inductive plasma processing tool and associated tools when the total harmonic distortion THD is greater than the harmonic upper value USL or the harmonic reference value I/L, wherein the associated tools are process tools sharing a power distribution board with the ferrite coupled inductive plasma processing tool. By sending alarm signals to the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can record the condition of the radio frequency power supply with overlarge harmonic waves, so that fault analysis personnel can conveniently call and check alarm records.
In an optional implementation manner, the controller 23 is further configured to perform interlock control on the ferrite coupled inductive plasma processing apparatus and associated equipment to stop the operation of the ferrite coupled inductive plasma processing apparatus and associated equipment when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, where the associated equipment is a processing equipment sharing a power distribution board with the ferrite coupled inductive plasma processing apparatus. By performing interlocking control on the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can be automatically controlled to stop working when the radio frequency power supply has overlarge harmonic.
Based on the same inventive concept, the present embodiment further provides a harmonic monitoring method for a radio frequency power supply, which is the radio frequency power supply shown in fig. 1 and used for supplying power to the ferrite coupled induction plasma processing equipment. Fig. 7 is a flowchart of a harmonic monitoring method of the radio frequency power supply provided in this embodiment, where the harmonic monitoring method of the radio frequency power supply provided in this embodiment includes:
step S71, measuring the harmonic wave of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
and step S72, displaying the total harmonic distortion in real time.
Specifically, the harmonic analyzer may be used to measure the harmonic of the rf power source to obtain the total harmonic distortion THD of the rf power source. The harmonic analyzer may be an analyzer for detecting by using an analog band-stop or band-pass filter, an analyzer based on a neural network, an analyzer using a wavelet analysis method, or an analyzer using an FFT variation method. The harmonic of the rf power supply, i.e. the harmonic of the ac power input to the rf power supply, is measured, and therefore the input of the harmonic analyzer needs to be connected to the ac input module 11 in the rf power supply. The input end of the harmonic analyzer may be connected to the input end of the ac input module 11, may also be connected to the output end of the ac input module 11, and may also be connected to an ac power line between devices in the ac input module 11.
After obtaining the total harmonic distortion THD, the total harmonic distortion THD may be displayed in real time by using a monitor provided with a display device. The monitor and the harmonic analyzer may be separately installed or may be integrated together. When the monitor and the harmonic analyzer are integrated, an isolation device needs to be arranged between the monitor and the harmonic analyzer to prevent the monitor from interfering the harmonic analyzer, so that the accuracy of the detection result of the harmonic analyzer is reduced.
In the harmonic monitoring method of the radio frequency power supply provided by this embodiment, the total harmonic distortion THD of the radio frequency power supply is obtained by measuring the harmonic of the radio frequency power supply, and the total harmonic distortion THD is displayed in real time, so that a process operator can monitor the harmonic of the radio frequency power supply in real time, and when the harmonic of the radio frequency power supply is too large, corresponding measures can be taken for ferrite coupled inductive plasma process equipment and associated equipment, thereby avoiding a situation that the process is not good due to power supply abnormality of the ferrite coupled inductive plasma process equipment and the associated equipment, where the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L. By displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L, contrast data can be provided for total harmonic distortion THD, and process operators can conveniently and visually compare the data.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, sending an alarm signal to ferrite coupling induction plasma process equipment and associated equipment, wherein the associated equipment is the process equipment sharing a power distribution board with the ferrite coupling induction plasma process equipment. By sending alarm signals to the ferrite coupling induction plasma process equipment and the associated equipment, the condition that the radio frequency power supply has overlarge harmonic waves can be recorded by the ferrite coupling induction plasma process equipment and the associated equipment, and fault analysis personnel can conveniently call and check the alarm records.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, performing interlocking control on the ferrite coupling induction plasma process equipment and associated equipment to stop the ferrite coupling induction plasma process equipment and the associated equipment from working, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupling induction plasma process equipment. By performing interlocking control on the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can be automatically controlled to stop working when the radio frequency power supply has overlarge harmonic.
Based on the same inventive concept, the present embodiment also provides a semiconductor apparatus system including a radio frequency power supply and a harmonic monitoring system. The rf power supply is the rf power supply shown in fig. 1 for supplying power to the ferrite coupled inductive plasma processing apparatus, and the harmonic monitoring system is the harmonic monitoring system described in the previous embodiment.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are merely exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention, and any modifications, equivalent substitutions, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. A harmonic monitoring system for a radio frequency power supply for powering ferrite coupled inductive plasma processing equipment, comprising:
the harmonic analyzer is connected with the radio frequency power supply and is used for measuring the harmonic of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
a monitor connected to the harmonic analyzer, the monitor for displaying the total harmonic distortion in real time.
2. The harmonic monitoring system of claim 1 wherein the radio frequency power supply comprises an AC input module, an AC-DC conversion module, and a radio frequency module, the AC input module comprising a transformer and a filter inductor;
the transformer is connected with the power distribution board and is used for carrying out transformation processing on the alternating current provided by the power distribution board;
the filter inductor is connected with the transformer and is used for filtering the alternating current output by the transformer;
the AC-DC conversion module is connected with the filter inductor and is used for converting the alternating current output by the filter inductor into direct current;
the radio frequency module is connected with the AC-DC conversion module and is used for converting the direct current output by the AC-DC conversion module into radio frequency current.
3. The harmonic monitoring system of claim 2 wherein the input of the harmonic analyzer is connected to an ac power line between the power distribution board and the transformer; alternatively, the first and second electrodes may be,
the input end of the harmonic analyzer is connected with an alternating current transmission line between the transformer and the filter inductor; alternatively, the first and second electrodes may be,
and the input end of the harmonic analyzer is connected with an alternating current transmission line between the filter inductor and the AC-DC conversion module.
4. The harmonic monitoring system of claim 1 wherein the monitor is further configured to display a harmonic upper value, a harmonic lower value, and a harmonic reference value.
5. The harmonic monitoring system of claim 4 further comprising:
a controller coupled to the monitor, the controller to store the total harmonic distortion.
6. The harmonic monitoring system of claim 5 wherein the controller is further configured to send an alarm signal to the ferrite coupled inductive plasma processing equipment and associated equipment that shares a power distribution board with the ferrite coupled inductive plasma processing equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value; and/or the presence of a gas in the gas,
the controller is further configured to perform interlock control on the ferrite coupled inductive plasma process equipment and associated equipment to stop the operation of the ferrite coupled inductive plasma process equipment and the associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, where the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
7. A method for harmonic monitoring of a radio frequency power supply for powering ferrite coupled inductive plasma processing equipment, comprising:
measuring the harmonic wave of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
and displaying the total harmonic distortion in real time.
8. The method of harmonic monitoring of a radio frequency power supply of claim 7, further comprising:
and displaying the harmonic upper limit value, the harmonic lower limit value and the harmonic reference value.
9. The method of harmonic monitoring of a radio frequency power supply of claim 8, further comprising:
when the total harmonic distortion is larger than the harmonic upper limit value or the harmonic reference value, sending an alarm signal to the ferrite coupled inductive plasma process equipment and associated equipment, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment; and/or the presence of a gas in the gas,
and when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, performing interlocking control on the ferrite coupling induction plasma process equipment and associated equipment to stop the ferrite coupling induction plasma process equipment and the associated equipment from working, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupling induction plasma process equipment.
10. A semiconductor device system comprising a radio frequency power supply and the harmonic monitoring system of any of claims 1 to 6.
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2020
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