CN111575750A - Cyanide-free electroplating nano-silver additive - Google Patents

Cyanide-free electroplating nano-silver additive Download PDF

Info

Publication number
CN111575750A
CN111575750A CN202010666465.6A CN202010666465A CN111575750A CN 111575750 A CN111575750 A CN 111575750A CN 202010666465 A CN202010666465 A CN 202010666465A CN 111575750 A CN111575750 A CN 111575750A
Authority
CN
China
Prior art keywords
additive
cyanide
agent
diimide
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010666465.6A
Other languages
Chinese (zh)
Other versions
CN111575750B (en
Inventor
刘光明
甘鸿禹
唐荣茂
熊义
刘永强
刘欢欢
官宇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanchang Hangkong University
Original Assignee
Nanchang Hangkong University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanchang Hangkong University filed Critical Nanchang Hangkong University
Priority to CN202010666465.6A priority Critical patent/CN111575750B/en
Publication of CN111575750A publication Critical patent/CN111575750A/en
Application granted granted Critical
Publication of CN111575750B publication Critical patent/CN111575750B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/46Electroplating: Baths therefor from solutions of silver

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The cyanide-free electroplating nano silver additive disclosed by the invention respectively contains 60-80 g/L of main brightening agent, 10-20 g/L of auxiliary brightening agent, 5-10 g/L of surface wetting agent and 1-3 g/L of protective agent, wherein the main brightening agent consists of 25-50% of gamma-butenolide, 10-15% of polybutene diimide, 15-35% of pentenoic lactam, 10-15% of polypentene diimide and 10-15% of phthalimide. The additive can effectively improve the brightness and the discoloration resistance of the coating, can achieve high brightness and grain refinement effect at room temperature, the brightness of the coating can reach over 600Gu, and the grains can be refined to be nano-scale; the stability is strong, and the excellent brightening effect can be achieved after long-time electroplating operation or standing; and the production cost is low, the efficiency is high, and the environment is protected.

Description

Cyanide-free electroplating nano-silver additive
Technical Field
The invention relates to a cyanide-free electroplating nano-silver additive, which is an additive used in silver electroplating under direct current or pulse conditions in a cyanide-free plating solution, and particularly belongs to the technical field of electroplating additives.
Background
With the increasing living standard and the development of science and technology, the demand and the requirement of people on silver plating parts are increased day by day. The silver plating layer for industrial production generally adopts an electroplating means, the current mainstream silver electroplating system contains cyanide which is often extremely toxic, and the cyanide electroplating is gradually eliminated along with the enhancement of environmental protection consciousness and safety consciousness. However, in the silver electrodeposition layer prepared without any additive, it is difficult to obtain a dense and bright plating layer regardless of the plating conditions used, and a dendrite segregation phenomenon may even occur. Therefore, it is very important to develop a stable plating additive capable of effectively improving the plating state. At present, cyanide-free silver electroplating is the development direction of green electroplating, but the problems of poor glossiness, low binding force and the like exist, and cyanide electroplating is still difficult to replace. The cyanide-free bright silver plating solution mentioned in patent CN 107299367A has a current density range of 0.1-0.2A/dm2The current density of the conventional cyanide silver plating is 0.2-1.2A/dm2On the one hand, a lower current density leads to low production efficiency, and on the other hand, a narrower current density interval leads to lower yield. The alkaline cyanide-free silver plating electroplating solution and the silver plating method provided in patent CN 1073130841A have the plating temperature range of 40-60 ℃, and the plating can be carried out only by heating, so that the energy consumption in production is increased, the production cost is improved, and the production efficiency is lower. The cyanide-free bright silver plating bath mentioned in patent CN201710738117.3 gave a silver plating layer with a gloss of only 110 Gu.
Therefore, the additive of the cyanide-free silver electroplating solution, which is stable, efficient and environment-friendly, can improve the displacement capability of the plating solution, the glossiness of a silver coating and the grain refinement degree of the silver coating and widen the current density range of the plating solution at room temperature, is always a research hotspot in the field of cyanide-free silver plating.
Disclosure of Invention
The invention aims to provide a cyanide-free electroplating nano silver additive, which mainly depends on imide or lactam containing unsaturated bonds, can widen the current density range of a plating solution, effectively improve the anti-tarnishing capability and glossiness of a silver deposition layer obtained by electroplating and enable the plating layer to achieve mirror surface brightness.
The cyanide-free electroplating nano-silver additive disclosed by the invention consists of a main brightener 60-80 g/L, an auxiliary brightener 10-20 g/L, a surface wetting agent 5-10 g/L and a surface wetting agent 1-3 g/L;
the main brightening agent consists of 25-50% of gamma-butenolide, 10-15% of polybutene diimide, 15-35% of pentenyl lactam, 10-15% of polypentene diimide and 10-15% of phthalimide in percentage by mass; the auxiliary brightening agent consists of 40-50% of aminopyrimidine, 20-30% of 4-acetamidopyrimidine and 20-30% of sulfadiazine; the protective agent consists of 50-80% of sulfathiazole thioglycolic acid, 10-25% of sulfathiazole monoethanolamine and 10-25% of propane pyridinium sulfonate; the surface wetting agent consists of 30-40% of ammonium dodecyl sulfonate, 30-40% of sodium dodecyl benzene sulfonate and 30-40% of sodium dodecyl sulfate.
The preparation process of the additive comprises the following steps:
adjusting the pH value to 10-11 by using a sodium hydroxide or potassium hydroxide solution in 700 mL of pure water, sequentially adding 5-10 g of a surface wetting agent, 60-80 g of a main light agent and 10-20 g of an auxiliary brightening agent under the condition of fully and uniformly stirring, then adding a mixture of 1-3 g of a protective agent and 150mL of pure water, uniformly mixing, and continuously adding pure water until the volume of the mixture reaches 1L to obtain the cyanide-free electroplating nano-silver additive.
The molecular weight of the polybutylene diimide and the polypentene diimide is less than 2000.
The application conditions of the additive are as follows: the pH range is 7.5-11.5, and the temperature range is 10-55 ℃.
The invention has the beneficial effects that:
1. the cyanide-free electroplating nano silver additive can refine crystal grains of a plating layer and reduce internal stress of the plating layer, and mainly depends on imide or lactam of unsaturated bonds contained in the cyanide-free electroplating nano silver additive, so that the current density range of the plating solution can be widened, the anti-tarnishing capability and the glossiness of a silver deposition layer obtained by electroplating are effectively improved, the mirror surface brightness of the plating layer can be achieved, the maximum glossiness can reach more than 600Gu, the crystal grains of the plating layer can be refined to be nano-scale, and the average size is 30-80 nm.
2. The cyanide-free silver plating additive does not contain harmful cyanide components, is green and environment-friendly, belongs to the development direction of green electroplating, has strong stability, and still has good brightening effect after long-time electroplating operation or long-time standing.
3. The cyanide-free silver plating additive can play an excellent bright effect when being used for electroplating at room temperature, does not need heating in the electroplating process, and has low production cost and high efficiency.
Drawings
FIG. 1 is a diagram of a plated article obtained in a Hull cell without adding a brightener to the silver plating solution of the present invention;
FIG. 2 is a diagram of a plated article obtained in a Hull cell after addition of a cyanide-free silver plating additive in example 1 of the present invention;
FIG. 3 shows the gloss test results of the plated article obtained in a Hull cell after the cyanide-free silver plating additive was added in example 1 of the present invention;
FIG. 4 is an FESEM image of a plated article obtained in a Hell cell after a plating layer is enlarged by 10 ten thousand times after a cyanide-free silver plating additive is added in example 1 of the present invention.
Detailed Description
Example 1
The preparation process of the cyanide-free electroplating nano silver additive comprises the following steps: (1) 700 mL of pure water was added to a 1L container; (2) adding a proper amount of sodium hydroxide solution to adjust the pH value to 10.5; (3) adding 3g of ammonium dodecyl sulfonate, 3g of sodium dodecyl benzene sulfonate and 3g of sodium dodecyl sulfate into the container, stirring and dissolving; (4) adding 35g of gamma-butenolactam, 15 g of pentenolactam, 10g of phthalimide, 10g of polybutene diimide-1000 and 10g of polypentene diimide-1000 into the container, stirring and dissolving; (5) then 5g of aminopyrimidine, 2 g of 4-acetamidopyrimidine and 3g of sulfadiazine are added into the container, stirred and dissolved; (6) dissolving 1.85g of sulfathiazole thioglycolic acid, 0.3 g of sulfathiazole thioethanolamine and 0.35g of pyridinium propanesulfonate in 150mL of pure water, pouring into a container, and stirring to uniformly mix; (7) adding pure water to 1L. The cyanide-free electroplating nano silver additive is added into the silver plating solution produced in a certain factory, and a physical diagram obtained in a Hell cell is shown in figure 2. The plating layer can clearly reflect the characters on the book, and the mirror surface brightness is achieved; the gloss test result is shown in figure 3, and the gloss can reach over 600 Gu; the FESEM image of the coating is shown in figure 4, and the average size of the coating crystal grains is 30-80 nm.
Example 2
The preparation process of the cyanide-free electroplating nano silver additive comprises the following steps: (1) 700 mL of pure water was added to a 1L container; (2) adding a proper amount of potassium hydroxide solution to adjust the pH value to 10.8; (3) then adding 3g of ammonium dodecyl sulfonate, 3g of sodium dodecyl benzene sulfonate and 4 g of sodium dodecyl sulfate into the container, stirring and dissolving; (4) adding 35g of gamma-butenolactam, 15 g of pentenolactam, 10g of phthalimide, 10g of polybutene diimide-1000 and 10g of polypentene diimide-1000 into the container, stirring and dissolving; (5) then 5g of aminopyrimidine, 3g of 4-acetamidopyrimidine and 2 g of sulfadiazine are added into the container, stirred and dissolved; (6) dissolving 1.85g of sulfathiazole thioglycolic acid, 0.35g of sulfathiazole thioethanolamine and 0.35g of pyridinium propanesulfonate in 150mL of pure water, pouring into a container, and stirring to uniformly mix; (7) adding pure water to 1L.
Example 3
The preparation process of the cyanide-free electroplating nano silver additive comprises the following steps: (1) 700 mL of pure water was added to a 1L container; (2) adding a proper amount of sodium hydroxide solution to adjust the pH value to 10.5; (3) adding 4 g of ammonium dodecyl sulfonate, 3g of sodium dodecyl benzene sulfonate and 3g of sodium dodecyl sulfate into the container, stirring and dissolving; (4) adding 35g of gamma-butenolactam, 15 g of pentenolactam, 10g of phthalimide, 10g of polybutene diimide-1000 and 10g of polypentene diimide-1000 into the container, stirring and dissolving; (5) then 5g of aminopyrimidine, 2 g of 4-acetamidopyrimidine and 3g of sulfadiazine are added into the container, stirred and dissolved; (6) dissolving 1.5 g of sulfathiazole thioglycolic acid, 0.35g of sulfathiazole thioethanolamine and 0.35g of pyridinium propanesulfonate in 150mL of pure water, pouring into a container, and stirring to uniformly mix; (7) adding pure water to 1L.
Example 4
The preparation process of the cyanide-free electroplating nano silver additive comprises the following steps: (1) 700 mL of pure water was added to a 1L container; (2) adding a proper amount of sodium hydroxide solution to adjust the pH value to 10.8; (3) adding 3g of ammonium dodecyl sulfonate, 4 g of sodium dodecyl benzene sulfonate and 3g of sodium dodecyl sulfate into the container, stirring and dissolving; (4) then 40 g of gamma-butenolactam, 16 g of pentenolactam, 8g of phthalimide, 8g of polybutene diimide-1000 and 8g of polypentene diimide-1000 are added into the container, stirred and dissolved; (5) adding 4 g aminopyrimidine, 3g 4-acetamidopyrimidine and 3g sulfadiazine into the container, stirring and dissolving; (6) dissolving 1.5 g of sulfathiazole thioglycolic acid, 0.35g of sulfathiazole thioethanolamine and 0.35g of pyridinium propanesulfonate in 150mL of pure water, pouring into a container, and stirring to uniformly mix; (7) adding pure water to 1L.
The foregoing exemplary embodiments have described the invention in more detail and in greater detail, but are not intended to limit the invention to the details given herein. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (3)

1. The cyanide-free electroplating nano silver additive is characterized in that: the additive consists of a main brightener, an auxiliary brightener, a protective agent and a surface wetting agent, wherein the additive contains 60-80 g/L of the main brightener, 10-20 g/L of the auxiliary brightener, 5-10 g/L of the surface wetting agent and 1-3 g/L of the protective agent respectively;
the main brightening agent consists of 25-50% of gamma-butenolide, 10-15% of polybutene diimide, 15-35% of pentenyl lactam, 10-15% of polypentene diimide and 10-15% of phthalimide in percentage by mass; the auxiliary brightening agent consists of 40-50% of aminopyrimidine, 20-30% of 4-acetamidopyrimidine and 20-30% of sulfadiazine; the protective agent consists of 50-80% of sulfathiazole thioglycolic acid, 10-25% of sulfathiazole monoethanolamine and 10-25% of propane pyridinium sulfonate; the surface wetting agent consists of 30-40% of ammonium dodecyl sulfonate, 30-40% of sodium dodecyl benzene sulfonate and 30-40% of sodium dodecyl sulfate;
the preparation process of the additive comprises the following steps:
adjusting the pH value to 10-11 by using a sodium hydroxide or potassium hydroxide solution in 700 mL of pure water, sequentially adding 5-10 g of a surface wetting agent, 60-80 g of a main light agent and 10-20 g of an auxiliary brightening agent under the condition of fully and uniformly stirring, then adding a mixture of 1-3 g of a protective agent and 150mL of pure water, uniformly mixing, and continuously adding pure water until the volume of the mixture reaches 1L to obtain the cyanide-free electroplating nano-silver additive.
2. The cyanide-free electroplated nanosilver additive of claim 1, wherein: the molecular weight of the polybutylene diimide and the polypentene diimide is less than 2000.
3. The cyanide-free electroplated nanosilver additive of claim 1, wherein: the application conditions of the additive are as follows: the pH range is 7.5-11.5, and the temperature range is 10-55 ℃.
CN202010666465.6A 2020-07-13 2020-07-13 Cyanide-free electroplating nano-silver additive Active CN111575750B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010666465.6A CN111575750B (en) 2020-07-13 2020-07-13 Cyanide-free electroplating nano-silver additive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010666465.6A CN111575750B (en) 2020-07-13 2020-07-13 Cyanide-free electroplating nano-silver additive

Publications (2)

Publication Number Publication Date
CN111575750A true CN111575750A (en) 2020-08-25
CN111575750B CN111575750B (en) 2022-03-15

Family

ID=72110142

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010666465.6A Active CN111575750B (en) 2020-07-13 2020-07-13 Cyanide-free electroplating nano-silver additive

Country Status (1)

Country Link
CN (1) CN111575750B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113755911A (en) * 2021-09-28 2021-12-07 重庆立道新材料科技有限公司 Cyanide-free silver-plated anti-tarnish agent and application thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1032683A (en) * 1988-10-17 1989-05-03 上海轻工专科学校 Bright and hard silver electroplating
US6251249B1 (en) * 1996-09-20 2001-06-26 Atofina Chemicals, Inc. Precious metal deposition composition and process
CN104321464A (en) * 2011-12-15 2015-01-28 汉高知识产权控股有限责任公司 Selective coating of exposed copper on silver-plated copper
CN106048671A (en) * 2016-06-23 2016-10-26 嘉兴学院 Stabilizer applied to cyanide-free silver plating layer structure with crystals distributed at 10 to 100 nm, and preparation method of stabilizer
CN107299367A (en) * 2017-08-24 2017-10-27 重庆立道表面技术有限公司 Non-cyanide bright plate silver plating solution
CN107313084A (en) * 2017-08-10 2017-11-03 佛山市南博旺环保科技有限公司 A kind of alkaline non-cyanide plate silver plating solution and silver-coating method
CN109208042A (en) * 2018-11-05 2019-01-15 新沂市大明科技开发有限公司 Without cyanogen environment-friendly type silver plating liquid
WO2020038948A1 (en) * 2018-08-21 2020-02-27 Umicore Galvanotechnik Gmbh Electrolyte for the cyanide-free deposition of silver
US20210087702A1 (en) * 2018-02-08 2021-03-25 Daicel Corporation Plating film

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1032683A (en) * 1988-10-17 1989-05-03 上海轻工专科学校 Bright and hard silver electroplating
US6251249B1 (en) * 1996-09-20 2001-06-26 Atofina Chemicals, Inc. Precious metal deposition composition and process
CN104321464A (en) * 2011-12-15 2015-01-28 汉高知识产权控股有限责任公司 Selective coating of exposed copper on silver-plated copper
CN106048671A (en) * 2016-06-23 2016-10-26 嘉兴学院 Stabilizer applied to cyanide-free silver plating layer structure with crystals distributed at 10 to 100 nm, and preparation method of stabilizer
CN107313084A (en) * 2017-08-10 2017-11-03 佛山市南博旺环保科技有限公司 A kind of alkaline non-cyanide plate silver plating solution and silver-coating method
CN107299367A (en) * 2017-08-24 2017-10-27 重庆立道表面技术有限公司 Non-cyanide bright plate silver plating solution
US20210087702A1 (en) * 2018-02-08 2021-03-25 Daicel Corporation Plating film
WO2020038948A1 (en) * 2018-08-21 2020-02-27 Umicore Galvanotechnik Gmbh Electrolyte for the cyanide-free deposition of silver
CN109208042A (en) * 2018-11-05 2019-01-15 新沂市大明科技开发有限公司 Without cyanogen environment-friendly type silver plating liquid

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GAN HONGYU 等,: ""Comparison of three artificial neural networks for predict the electrodeposition of nano-silver film"", 《MATERIALS TODAY COMMUNICATIONS》 *
杨长江等: "银抗变色工艺研究进展", 《电镀与涂饰》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113755911A (en) * 2021-09-28 2021-12-07 重庆立道新材料科技有限公司 Cyanide-free silver-plated anti-tarnish agent and application thereof

Also Published As

Publication number Publication date
CN111575750B (en) 2022-03-15

Similar Documents

Publication Publication Date Title
CN102277601B (en) Cyanogen-free silver-plating electroplating liquid containing auxiliary complexing agent
CN101838830B (en) Electrolyte of electroplating palladium-nickel alloy
CN105088293A (en) Novel cyanide-free silver plating electroplating liquid and electroplating technology
CN103806053A (en) Dual-pulse gold plating process
CN111575750B (en) Cyanide-free electroplating nano-silver additive
CN101988211A (en) Metal surface multilayer nickel plating process with excellent corrosion resistance
CN102758228A (en) Sulfonic acid type semi-bright pure tin electroplating solution
CN102995081A (en) Cyanide-free bright silver plating electroplating solution
CN102383154A (en) Cyanide-free gold-plating electroplating solution
CN110219026B (en) Alkaline cyanide-free brush plating solution of multi-coordination system and preparation method thereof
CN104388991A (en) Copper electroplate liquid and preparation method thereof
CN102605394B (en) Cyanogen-free acidic cupronickel-tin plating solution
CN106521578A (en) Electroplating method of zinc nickel alloy
CN105350034A (en) Pearl nickel electroplating additive and application thereof
CN105671600A (en) Cyanogen-free alkaline copper electroplating solution
CN1932084B (en) Noncyanide electroplating solution additive and preparation process of noncyanide electroplating solution
CN110129842A (en) A kind of compound cyanide-free gold electroplating plating solution preparation and gold process is electroplated using its
CN106868571A (en) A kind of nanometer molybdenum palladium titanium electroplate liquid and preparation method thereof
CN102206840B (en) Alkaline chloride copper-plating treatment agent and preparation method thereof
CN105002535A (en) Copper alloy electroplating solution and electroplating method thereof
CN111188069A (en) Tin-plated bismuth alloy solution and preparation method thereof
CN212925172U (en) Environment-friendly rhodium-plated coating structure for zinc alloy die castings
CN107604390A (en) A kind of cadmium plating walks agent and without hydrogen embrittlement non-cyanide alkali cadmium plating electroplate liquid
US2677654A (en) Copper electroplating and compositions therefor
CN103789799A (en) Auxiliary brightening agent for potassium chloride galvanizing and preparation method and use of auxiliary brightening agent

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant