CN111521282A - Preparation method and device of standard reference light source for plane wavefront distortion correction - Google Patents
Preparation method and device of standard reference light source for plane wavefront distortion correction Download PDFInfo
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- CN111521282A CN111521282A CN202010249475.XA CN202010249475A CN111521282A CN 111521282 A CN111521282 A CN 111521282A CN 202010249475 A CN202010249475 A CN 202010249475A CN 111521282 A CN111521282 A CN 111521282A
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- 238000012937 correction Methods 0.000 title claims abstract description 16
- 238000002360 preparation method Methods 0.000 title claims description 7
- 238000000034 method Methods 0.000 claims abstract description 15
- 230000003287 optical effect Effects 0.000 abstract description 8
- 238000001228 spectrum Methods 0.000 abstract description 7
- 230000003044 adaptive effect Effects 0.000 abstract description 4
- 230000004075 alteration Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000001444 catalytic combustion detection Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
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- 230000035945 sensitivity Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J2009/002—Wavefront phase distribution
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Abstract
The invention relates to a method and a device for preparing a standard reference light source for correcting plane wavefront distortion, which utilize the characteristics of a point light source to conveniently prepare a standard light source with specific wavelength and spectrum, have universality and provide a reference light source for correcting various wavefront distortions for an adaptive optical system in the wavefront correction of plane light waves.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a method and a device for preparing a standard reference light source for plane wavefront distortion correction.
Background
During the generation and transmission of the light beam, there are many unpredictable disturbance factors that cause wavefront distortion. Disturbance factors exist in any link of an optical instrument, an object for observation or action, a light wave transmission channel and a working environment, so that wavefront aberration is introduced, and particularly for a large optical system working under severe conditions, the disturbance factors greatly reduce the quality of a transmitted light beam and seriously influence the application of the transmitted light beam. . Since the conventional optical technology does not have the ability to actively adapt to environmental changes, and dynamic disturbance factors changing with time, such as atmospheric turbulence, temperature and gravity changes, cannot be eliminated fundamentally, dynamic disturbance becomes an old problem which troubles optical workers for hundreds of years. In a wide range of applications, such as high-power lasers, high-power laser transmission, large astronomical telescopes and many other optical systems, real-time monitoring and compensation of wavefront distortion of a light beam are required, and therefore, adaptive optics technology has emerged and is one of the leading researches in the current optical field.
Hartmann wavefront sensing technology, which consists of a micro lens array and a CCD camera. The basic principle is shown in figure 2, the incident distorted wavefront is divided into a plurality of sub-wavefronts by the micro-lens array, then the sub-wavefronts are converged into the light spot array on the CCD respectively, and the distorted wavefront can be reconstructed by comparing the displacement of the light spot centroid position with the standard plane wave light spot centroid position. The method has a series of important advantages of high light energy utilization rate (almost 100%), large measurement dynamic range, no 2 pi uncertainty problem, capability of being used for white light wavefront detection and the like, and therefore, the method becomes a main form of the existing wavefront sensor. The accuracy of Hartmann wavefront sensors is continuously increasing with the successful development of new CCDs with large arrays, high diffraction rate microlens arrays, high sensitivity, high quantum efficiency, and low noise.
In the wavefront correction of the planar light wave, a standard light source is often required to be used as a reference light source of an adaptive optics system to complete the correction of various wavefront distortions. The wavefront of the standard light source is not distorted, but what light source and where the light source is made are standard and not distorted, and the unification is difficult to achieve. Particularly, in many applications, the wavelengths and the spectra of the light sources are different, which causes that the universality is difficult to achieve when the light sources are used as reference light, and a standard light source with a specific spectrum and wavelength needs to be prepared and applied in a targeted manner in practical application.
Disclosure of Invention
In view of the above, it is necessary to provide a method and an apparatus for preparing a standard reference light source for correcting plane wavefront distortion, which can conveniently prepare a standard light source with a specific wavelength and spectrum by using the characteristics of a point light source.
In order to solve the technical problems, the invention adopts the technical scheme that: a preparation method of a standard reference light source for correcting plane wavefront distortion comprises the following steps: selecting laser with any wavelength as reference light; the light beams of the reference light are converged on a small hole through a short-focus lens to obtain an approximately standard point light source; selecting a concave mirror to be placed at a position with the same distance from the small hole as the focal distance of the concave mirror, wherein the light of the point light source is changed into parallel light after reaching the concave mirror; and the parallel light is reflected to enter a Hardman wavefront sensor, and is collected and processed to obtain a standard reference light source.
Furthermore, the focal length of the concave mirror is five meters, and the distance between the concave mirror and the small hole is five meters.
Further, the wavelength of the reference light is 795 nm.
Further, the reference light is He — Ne light.
Further, the diameter of the small hole is 5 μm.
The invention also provides a preparation device of the standard reference light source for correcting the plane wavefront distortion, which comprises a laser, a short-focus lens, an aperture, a concave mirror and a Hardman wavefront sensor, wherein reference light emitted by the laser sequentially passes through the short-focus lens, the aperture and the concave mirror and then enters the Hardman wavefront sensor.
Further, the distance between the concave mirror and the small hole is the focal length of the concave mirror.
Further, the diameter of the small hole is 5 μm.
The invention has the beneficial effects that: the standard light source with specific wavelength and spectrum required by people is conveniently prepared by utilizing the characteristics of a point light source, has universality, and provides a standard reference light source for correcting various wavefront distortions in the wavefront correction of a plane light wave.
Drawings
FIG. 1 is a schematic flow chart of a method for preparing a standard reference light source for plane wavefront distortion correction according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a method for manufacturing a standard reference light source for plane wavefront distortion correction according to an embodiment of the present invention;
FIG. 3 is a schematic illustration of the standard light collected by the Hardman wavefront sensor of the present invention;
FIG. 4 is a schematic diagram of a two-dimensional energy distribution of a standard reference light source obtained by the present invention;
FIG. 5 is a schematic diagram of the three-dimensional energy distribution of a standard reference light source obtained by the present invention.
Description of reference numerals:
100. a laser; 200. a short focus lens; 300. a small hole; 400. a concave mirror; 500. a hadamard wavefront sensor.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the following describes in detail a method and an apparatus for manufacturing a standard reference light source for correcting plane wavefront distortion according to the present invention with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1-5, a method for preparing a standard reference light source for plane wavefront distortion correction includes the following steps: selecting laser with any wavelength as reference light; the light beams of the reference light are converged on a small hole 300 through a short-focus lens 200 to obtain an approximately standard point light source; a concave mirror 400 is selected to be placed at a position with the distance from the small hole 300 equal to the focal distance of the concave mirror 400, and the light of the point light source reaches the concave mirror 400 and then becomes parallel light; the parallel light is reflected into the Hardman wavefront sensor 500, and is collected and processed to obtain a standard reference light source.
The standard light source with specific wavelength and spectrum required by people is conveniently prepared by utilizing the characteristics of a point light source, has universality, and provides a standard reference light source for correcting various wavefront distortions in the wavefront correction of a plane light wave.
Hartmann wavefront sensor 500, Shack-Hartmann (SH) wavefront sensor (WFS), also known as a Hartmann wavefront sensor.
Preferably, concave mirror 400 has a focal length of five meters and the concave surface is five meters from aperture 300. The principle of the concave mirror 400 is reflection imaging, the concave mirror 400 not only can converge parallel light rays to a focal point, but also can diverge light rays emitted from the focal point into parallel light rays, that is, when reference light is focused to the focal point of the concave mirror 400, the reference light rays can be diverged into the parallel light rays, and the preferred focal length of the concave mirror 400 is five meters. The convex lens can also converge parallel light and refract light rays emitted from a focal point into the parallel light, but the concave mirror 400 is reflected for imaging, so that chromatic aberration does not occur, which is an advantage that any lens imaging cannot compare.
Specifically, the wavelength of the reference light is 795 nm. The laser with the wavelength of 795nm has strong stability, and is convenient to obtain and process.
Further, the reference light is He — Ne light. The helium neon laser has wide application, the helium neon laser 100 has mature technology, a light source with a proper wavelength can be conveniently manufactured, and the stability is strong.
Preferably, the diameter of the small hole 300 is 5 μm. A more perfect point source can be obtained with a 5 μm aperture 300.
Referring to fig. 2, a laser 100 emits a 795nm He-Ne light, which is focused on a 5 μm aperture 300 through a short focus lens 200 to obtain an approximately standard point light source; the concave mirror 400 with the focal length of five meters is placed at a position 300 five meters away from the small hole, and the light of the point light source is changed into parallel light after reaching the concave mirror 400; and finally, the light is reflected into the Hardman wavefront sensor 500, and the standard reference light source is obtained through collection and processing.
The invention also provides a preparation device of the standard reference light source for correcting the plane wavefront distortion, which comprises a laser 100, a short-focus lens 200, an aperture 300, a concave mirror 400 and a Hardman wavefront sensor 500, wherein reference light emitted by the laser 100 enters the Hardman wavefront sensor 500 after passing through the short-focus lens 200, the aperture 300 and the concave mirror 400 in sequence.
It will be appreciated that concave mirror 400 is spaced from aperture 300 by the focal length of concave mirror 400.
Preferably, the diameter of the small hole 300 is 5 μm. Simply, the aperture 300 may be formed by punching a mask.
In summary, the method and the apparatus for preparing a standard reference light source for plane wavefront distortion correction provided by the present invention utilize the characteristics of a point light source, conveniently prepare a standard light source with a specific wavelength and spectrum, have universality, and provide a standard reference light source for correcting various wavefront distortions in a plane light wave wavefront correction for an adaptive optical system.
Although the present invention has been described with reference to a preferred embodiment, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (8)
1. A preparation method of a standard reference light source for correcting plane wavefront distortion is characterized by comprising the following steps:
selecting laser with any wavelength as reference light;
the light beams of the reference light are converged on a small hole through a short-focus lens to obtain an approximately standard point light source;
selecting a concave mirror to be placed at a position with the same distance from the small hole as the focal distance of the concave mirror, wherein the light of the point light source is changed into parallel light after reaching the concave mirror;
and the parallel light is reflected to enter a Hardman wavefront sensor, and is collected and processed to obtain a standard reference light source.
2. The method as claimed in claim 1, wherein the concave mirror has a focal length of five meters, and the distance between the concave mirror and the aperture is five meters.
3. The method for preparing a standard reference light source for plane wavefront distortion correction of claim 1, wherein the wavelength of the reference light is 795 nm.
4. The method according to claim 1, wherein the reference light is He-Ne light.
5. The method for preparing a standard reference light source for plane wavefront distortion correction of claim 1, wherein the diameter of the small hole is 5 μm.
6. The preparation device of the standard reference light source for correcting the plane wavefront distortion is characterized by comprising a laser, a short-focus lens, an aperture, a concave mirror and a Hardman wavefront sensor, wherein reference light emitted by the laser sequentially passes through the short-focus lens, the aperture and the concave mirror and then enters the Hardman wavefront sensor.
7. The apparatus as claimed in claim 6, wherein the distance between the concave mirror and the aperture is the focal length of the concave mirror.
8. The apparatus for preparing a standard reference light source for plane wavefront distortion correction of claim 6, wherein the diameter of said small hole is 5 μm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010249475.XA CN111521282A (en) | 2020-04-01 | 2020-04-01 | Preparation method and device of standard reference light source for plane wavefront distortion correction |
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| CN202010249475.XA CN111521282A (en) | 2020-04-01 | 2020-04-01 | Preparation method and device of standard reference light source for plane wavefront distortion correction |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070133010A1 (en) * | 2005-12-12 | 2007-06-14 | Alex Klooster | Off-axis paraboloid interferometric mirror with off focus illumination |
| US20070258151A1 (en) * | 2003-09-14 | 2007-11-08 | Evgeny Frumker | Method of Making a High-Quality Optical System for the Cost of a Low-Quality Optical System |
| US20120154819A1 (en) * | 2010-12-17 | 2012-06-21 | Joshua Monroe Cobb | Interferometer with paraboloidal illumination and imaging optic and tilted imaging plane |
| CN103267489A (en) * | 2013-05-20 | 2013-08-28 | 中国计量科学研究院 | Calibration system and method of Hartmann wave-front sensor |
| CN203502204U (en) * | 2013-09-09 | 2014-03-26 | 南京英田光学工程有限公司 | Optical lens chromatic aberration measurement device based on confocal principle |
-
2020
- 2020-04-01 CN CN202010249475.XA patent/CN111521282A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070258151A1 (en) * | 2003-09-14 | 2007-11-08 | Evgeny Frumker | Method of Making a High-Quality Optical System for the Cost of a Low-Quality Optical System |
| US20070133010A1 (en) * | 2005-12-12 | 2007-06-14 | Alex Klooster | Off-axis paraboloid interferometric mirror with off focus illumination |
| US20120154819A1 (en) * | 2010-12-17 | 2012-06-21 | Joshua Monroe Cobb | Interferometer with paraboloidal illumination and imaging optic and tilted imaging plane |
| CN103267489A (en) * | 2013-05-20 | 2013-08-28 | 中国计量科学研究院 | Calibration system and method of Hartmann wave-front sensor |
| CN203502204U (en) * | 2013-09-09 | 2014-03-26 | 南京英田光学工程有限公司 | Optical lens chromatic aberration measurement device based on confocal principle |
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