CN111475061A - Preparation method of touch screen and touch screen - Google Patents
Preparation method of touch screen and touch screen Download PDFInfo
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- CN111475061A CN111475061A CN202010281191.9A CN202010281191A CN111475061A CN 111475061 A CN111475061 A CN 111475061A CN 202010281191 A CN202010281191 A CN 202010281191A CN 111475061 A CN111475061 A CN 111475061A
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- visible area
- material layer
- conductive material
- touch screen
- touch electrode
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
Abstract
The embodiment of the invention discloses a touch screen and a preparation method thereof. The preparation method of the touch screen comprises the following steps: providing a substrate, wherein the substrate comprises a visible area and a non-visible area; a first conductive material layer covering the visible area and the non-visible area is arranged on the substrate; forming a first non-visible area routing on the first conductive material layer positioned in the non-visible area; patterning the first conductive material layer to form a touch electrode circuit positioned in the visible area and a second non-visible area routing wire positioned in the non-visible area; in a direction perpendicular to the substrate, a projection of the first non-visible area trace is located within a projection of the second non-visible area trace. Compared with the prior art, the embodiment of the invention reduces the frame of the touch screen.
Description
Technical Field
The embodiment of the invention relates to the technical field of display, in particular to a touch screen and a preparation method thereof.
Background
As a simple and convenient human-computer interaction mode, the touch screen has been widely applied to various fields of our daily life, such as mobile phones, vehicle-mounted center controls, tablet computers, media players, navigation systems, digital cameras, game devices, displays, medical devices, and the like.
Referring to fig. 1 to 3, in the prior art, a basic process flow for manufacturing a touch screen is as follows: s110, manufacturing a touch electrode circuit 10 of a visible area (the touch electrode circuit 10 comprises a plurality of touch electrode blocks 11); s120, manufacturing non-visible area traces 20 of a non-visible area (i.e., a frame area) on the edge of the touch electrode line 10, where the non-visible area traces 20 form the touch electrode blocks 11 of the visible area in a one-to-one correspondence to form a via.
However, in the touch screen formed by the manufacturing method in the prior art, the width X (X > 0mm) of the overlapping portion of the touch electrode block 11 and the non-visible area trace 20 and the gap tolerance Y (Y > 0mm) between the non-visible area trace 20 and the touch electrode block 11 need to be reserved. The width X can ensure that the non-visible trace 20 is communicated with the corresponding touch electrode block 11 and the lap joint impedance is stable; the tolerance Y can ensure that the non-visible area trace 20 and the other touch electrode blocks 11 are not short-circuited. Therefore, although the prior art can meet the requirements that the non-visible wiring 20 is communicated with the corresponding touch electrode block 11, the impedance is stable, and short circuit is not easy to occur, the frame of the touch screen is large.
Disclosure of Invention
The embodiment of the invention provides a touch screen and a preparation method thereof, which are used for reducing the frame of the touch screen.
In a first aspect, an embodiment of the present invention provides a method for manufacturing a touch panel, including:
providing a substrate, wherein the substrate comprises a visible area and a non-visible area; a first conductive material layer covering the visible area and the non-visible area is arranged on the substrate;
forming a first non-visible area routing on the first conductive material layer positioned in the non-visible area;
patterning the first conductive material layer to form a touch electrode circuit positioned in the visible area and a second non-visible area routing wire positioned in the non-visible area; in a direction perpendicular to the substrate, a projection of the first non-visible area trace is located within a projection of the second non-visible area trace.
Optionally, patterning the first conductive material layer comprises:
forming a first photosensitive material layer on the first conductive material layer;
patterning the first photosensitive material layer to form a first opening; the first opening exposes a part of the first conductive material layer;
and etching the exposed first conductive material layer to form the touch electrode circuit and the second non-visible area routing.
Optionally, forming a first non-visible area trace on the first conductive material layer located in the non-visible area includes:
forming a second conductive material layer on the first conductive material layer;
and patterning the second conductive material layer positioned in the non-visible area to form the first non-visible area routing.
Optionally, the second conductive material layer includes at least one of a silver paste, a copper paste, and a carbon paste.
Optionally, forming a first non-visible area trace on the first conductive material layer located in the non-visible area includes:
printing a second conductive material layer on the first conductive material layer;
pre-curing the second conductive material layer;
exposing the pre-cured second conductive material layer;
developing the exposed second conductive material layer;
and curing the developed second conductive material layer to form the first non-visible area routing.
Optionally, the second conductive material layer comprises at least one of copper, aluminum, silver, nickel, titanium, and molybdenum aluminum molybdenum, and oxides thereof.
Optionally, forming a first non-visible area trace on the first conductive material layer located in the non-visible area includes:
forming a second conductive material layer on the first conductive material layer;
forming a second photosensitive material layer on the second conductive material layer;
patterning the second photosensitive material layer to form a second opening; the second opening exposes a part of the second conductive material layer;
etching the exposed second conductive material layer to form the first non-visible area routing;
and removing the second conductive material layer positioned in the visible area.
In a second aspect, an embodiment of the present invention further provides a touch screen, including:
a substrate including a visible region and a non-visible region;
the touch electrode circuit is positioned in the visible area;
the non-visible area routing is positioned in the non-visible area; the non-visible area wiring comprises a second non-visible area wiring and a first non-visible area wiring which are arranged in a stacked mode, and the projection of the first non-visible area wiring is located in the projection of the second non-visible area wiring.
Optionally, the second non-visible area trace and the touch electrode line are formed in the same process step.
Optionally, the material of the first non-visible area trace includes at least one of silver paste, copper paste, carbon paste, copper, aluminum, nickel, titanium, and molybdenum aluminum molybdenum.
Optionally, the touch electrode circuit includes a plurality of touch electrode blocks sequentially arranged along a first direction, and the touch electrode blocks extend along a second direction;
the second non-visible area trace is in contact with an end portion of the touch electrode circuit along the second direction.
Optionally, the end portion comprises a first end portion and a second end portion;
the number of the non-visible area wires is equal to the number of the touch electrode blocks, one non-visible area wire is in contact with the first end of one touch electrode block, or one non-visible area wire is in contact with the second end of one touch electrode block.
Optionally, the end portion comprises a first end portion and a second end portion;
the number of the non-visible area wires is twice that of the touch electrode blocks, one non-visible area wire is in contact with the first end of one touch electrode block, and the other non-visible area wire is in contact with the second end of one touch electrode block.
Optionally, part or all of the end portion is in routing contact with the second non-visible area.
In the embodiment of the invention, the first non-visible area routing of the non-visible area is firstly manufactured, and then the touch electrode circuit of the visible area and the second non-visible area routing of the non-visible area are manufactured, namely the second non-visible area routing and the touch electrode circuit of the visible area are manufactured in the same process step. Therefore, the touch screen prepared by the embodiment of the invention is provided with the second non-visible area routing under the first non-visible area routing of the non-visible area. Therefore, the overlapping area of the first non-visible area wiring and the touch electrode circuit is the area of the first non-visible area wiring of the whole non-visible area, and the overlapping is equivalently transferred to be overlapped with the first non-visible area wiring. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area wiring and the visible area touch electrode circuit, and improves the impedance stability and the impedance value of the first non-visible area wiring.
Drawings
Fig. 1 is a flowchart of a method for manufacturing a touch panel in the prior art;
fig. 2 is a schematic structural diagram of a touch panel formed by a method for manufacturing a touch panel in the prior art;
FIG. 3 is a cross-sectional view taken along line A-A' of FIG. 2;
fig. 4 is a flowchart of a method for manufacturing a touch screen according to an embodiment of the invention;
fig. 5 is a schematic structural diagram of the touch screen formed in S210 by the method for manufacturing a touch screen according to the first embodiment of the present invention;
FIG. 6 is a schematic cross-sectional view of FIG. 5;
fig. 7 is a schematic structural diagram of the touch screen formed in S220 by the method for manufacturing a touch screen according to the first embodiment of the present invention;
FIG. 8 is a cross-sectional view taken along line B-B' of FIG. 7;
fig. 9 is a schematic structural diagram of the touch screen formed in S230 by the method for manufacturing a touch screen according to the first embodiment of the present invention;
FIG. 10 is a cross-sectional view taken along line C-C' of FIG. 9;
fig. 11 is a schematic flowchart of a method for manufacturing a touch panel according to a second embodiment of the present invention;
fig. 12 is a schematic structural diagram of the touch screen formed in S320 by the method for manufacturing a touch screen according to the second embodiment of the present invention;
FIG. 13 is a cross-sectional view taken along line D-D' of FIG. 12;
fig. 14 is a schematic flowchart of a method for manufacturing a touch panel according to a third embodiment of the present invention;
fig. 15 is a schematic flowchart of a method for manufacturing a touch panel according to a fourth embodiment of the present invention;
fig. 16 is a schematic flowchart of a method for manufacturing a touch screen according to a fifth embodiment of the present invention;
fig. 17 is a schematic partial structure diagram of a touch screen according to a sixth embodiment of the present invention;
fig. 18 is a schematic partial structure diagram of another touch screen according to a sixth embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Example one
Fig. 4 is a flowchart of a method for manufacturing a touch screen according to an embodiment of the present invention. Referring to fig. 4, the method for manufacturing the touch screen includes the following steps:
s210, providing a substrate, wherein the substrate comprises a visible area and a non-visible area; a first conductive material layer covering the visible region and the non-visible region is arranged on the substrate.
Fig. 5 is a schematic structural diagram of the touch screen formed in S210 by the method for manufacturing the touch screen according to the first embodiment of the present invention, and fig. 6 is a schematic cross-sectional diagram of fig. 5. Referring to fig. 5 and 6, the substrate 200 includes a visible region 210 and a non-visible region 220; the substrate 200 is provided with a first conductive material layer 300 covering the visible region 210 and the non-visible region 220. The material of the substrate 200 may be, for example, plastic or rubber, and the substrate 200 may be formed by molding processes such as rolling, casting, and coating. The first conductive material layer 300 may be, for example, a transparent multi-component alloy (e.g., a mixture of metals and compounds thereof, such as Indium Tin Oxide (ITO), tin antimony oxide, aluminum-doped zinc oxide, indium zinc oxide, silver halide, silver, copper, aluminum, titanium, indium, tin, or zinc). The first conductive material layer 300 can be formed by sputtering, evaporation, plating, etc. On one hand, the touch electrode circuit has smaller resistance value by adopting the transparent multi-element alloy, and the touch sensitivity of the touch screen is favorably improved; on the other hand, the light transmission of the visible area is better, and the display effect of the touch screen is favorably improved.
S220, forming a first non-visible area trace on the first conductive material layer in the non-visible area.
Fig. 7 is a schematic structural diagram of the touch panel formed in S220 by the method for manufacturing a touch panel according to the first embodiment of the present invention, and fig. 8 is a cross-sectional view taken along B-B' in fig. 7. Referring to fig. 7 and 8, a first non-viewing area trace 40 is formed on the first conductive material layer 300 located in the non-viewing area 220. The material of the first non-viewing area trace 40 can be, for example, silver paste, copper paste, carbon paste, copper, aluminum, nickel, titanium, molybdenum aluminum molybdenum, or the like. The first non-visible area trace 40 is a conductive wire with a certain line width and line distance for transmitting the touch signal.
S230, patterning the first conductive material layer, and forming a touch electrode circuit located in the visible area and a second non-visible area routing located in the non-visible area.
Fig. 9 is a schematic structural diagram of the touch panel formed in S230 by the method for manufacturing a touch panel according to the first embodiment of the present invention, and fig. 10 is a cross-sectional view taken along C-C' in fig. 9. Referring to fig. 9 and 10, the first conductive material layer 300 is patterned to form a touch electrode line 30 located in the visible area 210 and a second non-visible area trace 32 located in the non-visible area 220, where the touch electrode line 30 includes a plurality of touch electrode blocks 31, and the second non-visible area trace 32 and the first non-visible area trace 31 are stacked to form the non-visible area trace of the touch screen. The touch electrode blocks 31 are correspondingly connected with the non-visible area wires. Specifically, the first conductive material layer 300 located in the visible area 210 is patterned to form the touch electrode line 30; the first conductive material layer 300 in the non-visible area 220 is patterned to form a second non-visible area trace 32. In a direction perpendicular to the substrate 200, a projection of the first non-visible area trace 40 is located within a projection of the second non-visible area trace 32, and optionally, the projection of the first non-visible area trace 40 overlaps with the projection of the second non-visible area trace 32.
In the embodiment of the invention, the first non-visible area trace 40 of the non-visible area 220 is firstly manufactured, and then the touch electrode line 30 of the visible area 210 and the second non-visible area trace 32 of the non-visible area 220 are manufactured, that is, the second non-visible area trace 32 and the touch electrode line 30 of the visible area 210 are manufactured in the same process step. Therefore, the touch screen prepared in the embodiment of the invention is provided with the second non-visible area trace 32 under the first non-visible area trace 40 in the non-visible area 220. In this way, the overlapping area of the first non-visible area trace 40 and the touch electrode line 30 is the area of the first non-visible area trace 40 in the whole non-visible area 220, which is equivalent to transferring the overlapping to coincide with the first non-visible area trace 40. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit 30, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area 220 routing and the visible area 210 touch electrode circuit 30, and improves the impedance stability and the impedance value of the first non-visible area routing.
Example two
On the basis of the first embodiment, the present embodiment further defines the manufacturing steps of the first non-visible area trace. Fig. 11 is a schematic flowchart of a method for manufacturing a touch screen according to a second embodiment of the present invention. Referring to fig. 11, the method for manufacturing the touch screen includes the following steps:
s310, providing a substrate, wherein the substrate comprises a visible area and a non-visible area; the substrate includes a first layer of conductive material covering a visible region and a non-visible region.
Since S210 of the first embodiment of the step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of the step in this embodiment, which is not repeated herein.
And S320, forming a second conductive material layer on the first conductive material layer.
Fig. 12 is a schematic structural view of the touch panel formed in S320 by the method for manufacturing a touch panel according to the second embodiment of the present invention, and fig. 13 is a cross-sectional view taken along D-D' in fig. 12. Referring to fig. 12 and 13, a second conductive material layer 400 is formed on the first conductive material layer 300. As exemplarily shown in fig. 12 and 13, the second conductive material layer 400 is disposed only in the non-visible region 220, in other embodiments, the second conductive material layer 400 may also be disposed in the visible region 210, and in a subsequent process step, the second conductive material layer 400 located in the visible region 210 is removed. The material of the second conductive material layer 400 may be, for example, silver paste, copper paste, carbon paste, copper, aluminum, nickel, titanium, molybdenum, aluminum, molybdenum, or the like. As can be seen, the second conductive material layer 400 uses the first conductive material layer 300 as a substrate, and in the subsequent process steps, the first conductive material layer 300 covered by the second conductive material layer 400 is not etched.
S330, patterning the second conductive material layer positioned in the non-visible area to form a first non-visible area routing.
The first non-visible area routing is a wire with a certain line width and line distance so as to transmit the touch signal. If the second conductive material layer 400 is only disposed in the non-visible region 220 in S320, the second conductive material layer 400 in the non-visible region 220 only needs to be patterned in S330; if the second conductive material layer 400 is not only disposed in the non-visible region 220 but also disposed in the visible region 210 in S320, in addition to patterning the second conductive material layer 400 located in the non-visible region 220, the second conductive material layer 400 located in the visible region 210 needs to be removed in S330 to avoid the influence of the second conductive material layer 400 on the first conductive material layer in the visible region 210. The patterning of the second conductive material layer 400 in the non-visible region 220 and the removing of the second conductive material layer 400 in the visible region 210 may be performed in the same process step or in different process steps.
S340, patterning the first conductive material layer, and forming a touch electrode circuit located in the visible area and a second non-visible area routing located in the non-visible area.
Since S230 of the first step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of this step in this embodiment, which is not repeated herein.
In the embodiment of the invention, the first non-visible area routing of the non-visible area is firstly manufactured, and then the touch electrode circuit of the visible area and the second non-visible area routing of the non-visible area are manufactured, namely the second non-visible area routing and the touch electrode circuit of the visible area are manufactured in the same process step. Therefore, the touch screen prepared by the embodiment of the invention is provided with the second non-visible area routing under the first non-visible area routing of the non-visible area. Therefore, the overlapping area of the first non-visible area wiring and the touch electrode circuit is the area of the first non-visible area wiring of the whole non-visible area, and the overlapping is equivalently transferred to be overlapped with the first non-visible area wiring. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area wiring and the visible area touch electrode circuit, and improves the impedance stability and the impedance value of the first non-visible area wiring.
EXAMPLE III
On the basis of the second embodiment, the present embodiment further defines the manufacturing steps of the first non-visible area trace. Fig. 14 is a schematic flowchart of a method for manufacturing a touch screen according to a third embodiment of the present invention. Referring to fig. 14, the method for manufacturing the touch screen includes the following steps:
s410, providing a substrate, wherein the substrate comprises a visible area and a non-visible area; the substrate includes a first layer of conductive material covering a visible region and a non-visible region.
Since S310 of the second embodiment of this step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of this step in this embodiment, which is not repeated herein.
And S420, printing a second conductive material layer on the first conductive material layer.
The second conductive material layer comprises at least one of silver paste, copper paste and carbon paste. The silver paste, the copper paste and the carbon paste are all photosensitive substances and are in a liquid state, i.e., the second conductive material layer can be formed by coating a wet film.
And S430, pre-curing the second conductive material layer.
The pre-curing process is, for example, drying, and the second conductive material layer may be pre-cured by drying.
And S440, exposing the pre-cured second conductive material layer.
In this case, the second conductive material layer is exposed by the exposure negative film in the exposure machine, and the second conductive material layer of the irradiated portion reacts. Since the first conductive material layer is covered by the second conductive material layer, the first conductive material layer is not irradiated.
And S450, developing the exposed second conductive material layer.
In an exemplary case, when the second conductive material layer is developed, the non-irradiated protection region and the irradiated exposed region are obtained through development, and the irradiated second conductive material layer is removed by using a developing solution to present a pattern of the first non-visible region routing. Since the first layer of conductive material is not irradiated, the first layer of conductive material is not removed during this step.
And S460, curing the developed second conductive material layer to form a first non-visible area routing.
The second conductive layer is patterned to form a first non-visible area wire, and the first conductive material layer is not patterned, so that the first conductive material layer is reserved under the first non-visible area wire.
S470, patterning the first conductive material layer, and forming a touch electrode circuit located in the visible area and a second non-visible area routing located in the non-visible area.
Since S340 in the second embodiment of this step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of this step in this embodiment, which is not repeated herein.
On the basis of the above technical solutions, optionally, before printing the second conductive material layer on the first conductive material layer, a roll shrinking process is further included.
In the embodiment of the invention, the first non-visible area routing of the non-visible area is firstly manufactured, and then the touch electrode circuit of the visible area and the second non-visible area routing of the non-visible area are manufactured, namely the second non-visible area routing and the touch electrode circuit of the visible area are manufactured in the same process step. Therefore, the touch screen prepared by the embodiment of the invention is provided with the second non-visible area routing under the first non-visible area routing of the non-visible area. Therefore, the overlapping area of the first non-visible area wiring and the touch electrode circuit is the area of the first non-visible area wiring of the whole non-visible area, and the overlapping is equivalently transferred to be overlapped with the first non-visible area wiring. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area wiring and the visible area touch electrode circuit, and improves the impedance stability and the impedance value of the first non-visible area wiring.
Example four
On the basis of the second embodiment, the present embodiment further defines the manufacturing steps of the first non-visible area trace. Fig. 15 is a schematic flowchart of a method for manufacturing a touch panel according to a fourth embodiment of the present invention. Referring to fig. 15, the method for manufacturing the touch screen includes the following steps:
s510, providing a substrate, wherein the substrate comprises a visible area and a non-visible area; the substrate includes a first layer of conductive material covering a visible region and a non-visible region.
Since S310 of the second embodiment of this step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of this step in this embodiment, which is not repeated herein.
S520, forming a second conductive material layer on the first conductive material layer.
Wherein the second conductive material layer comprises at least one of copper, aluminum, silver, nickel, titanium, molybdenum, aluminum, molybdenum, and oxides thereof. Copper, aluminum, silver, nickel, titanium and molybdenum aluminum molybdenum and oxides thereof are all in a solid state, i.e., a second conductive material layer is formed on the first conductive material layer by a dry film pressing process. Alternatively, the second conductive material layer may be formed only in the non-visible region, or the second conductive material layer may be formed not only in the non-visible region but also in the visible region.
And S530, forming a second photosensitive material layer on the second conductive material layer.
The material of the second photosensitive material layer may be, for example, a photosensitive resin.
S540, patterning the second photosensitive material layer to form a second opening; the second opening exposes a portion of the second conductive material layer.
The process of patterning the second photosensitive material layer may include exposing and developing, in the exposing process, the second photosensitive material layer of the irradiated portion reacts, and in the developing process, the second photosensitive material layer of the irradiated portion is removed to form a second opening, that is, a pattern of the first non-visible area routing.
And S550, etching the exposed second conductive material layer to form a first non-visible area wire.
And the second conductive material layer is partially exposed, so that the second conductive material layer corresponding to the second opening can be etched through an etching process to route the first non-visible area. Optionally, since the first conductive material layer and the second conductive material layer are made of different materials, the etching liquid does not affect the first conductive material layer.
And S560, removing the second conductive material layer positioned in the visible area.
If the second conductive material layer is not only formed in the non-visible region but also formed in the visible region in S520, the step is performed to remove the second conductive material layer located in the visible region, and the first conductive material layer of the visible region is left, wherein the thickness of the visible region circuit is thinner than that of the non-visible region circuit. If the second conductive material layer is disposed only in the non-visible region 220 in S520, this step may be omitted.
S570, patterning the first conductive material layer to form a touch electrode circuit in the visible area and a second non-visible area routing in the non-visible area.
Since S340 in the second embodiment of this step in this embodiment is the same, please refer to the corresponding description of this embodiment for the specific requirements and details of this step in this embodiment, which is not repeated herein.
In the embodiment of the invention, the first non-visible area routing of the non-visible area is firstly manufactured, and then the touch electrode circuit of the visible area and the second non-visible area routing of the non-visible area are manufactured, namely the second non-visible area routing and the touch electrode circuit of the visible area are manufactured in the same process step. Therefore, the touch screen prepared by the embodiment of the invention is provided with the second non-visible area routing under the first non-visible area routing of the non-visible area. Therefore, the overlapping area of the first non-visible area wiring and the touch electrode circuit is the area of the first non-visible area wiring of the whole non-visible area, and the overlapping is equivalently transferred to be overlapped with the first non-visible area wiring. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area wiring and the visible area touch electrode circuit, and improves the impedance stability and the impedance value of the first non-visible area wiring.
EXAMPLE five
On the basis of the above embodiments, the present embodiment further defines the step of patterning the first conductive material layer. Fig. 16 is a schematic flowchart of a method for manufacturing a touch screen according to a fifth embodiment of the present invention. Referring to fig. 16, the method for manufacturing the touch screen includes the following steps:
s610, providing a substrate, wherein the substrate comprises a visible area and a non-visible area; the substrate includes a first layer of conductive material covering a visible region and a non-visible region.
Since the steps in this embodiment are the same as those in the embodiments described above, the specific requirements and details of the steps in this embodiment refer to the corresponding descriptions in the embodiments described above, and the detailed description of this embodiment is omitted.
S620, forming a first non-visible area routing on the first conductive material layer located in the non-visible area.
Since the steps in this embodiment are the same as those in the embodiments described above, the specific requirements and details of the steps in this embodiment refer to the corresponding descriptions in the embodiments described above, and the detailed description of this embodiment is omitted.
S630, a first photosensitive material layer is formed on the first conductive material layer.
The first photosensitive material layer may be, for example, a photosensitive resin. Specifically, a first photosensitive material layer is coated on a first conductive material layer positioned in a visible area, a first non-visible area wiring positioned in a non-visible area is coated with the first photosensitive material layer, and the first photosensitive material layer is coated between the first non-visible area wiring positioned in the non-visible area.
S640, patterning the first photosensitive material layer to form a first opening; the first opening exposes a portion of the first conductive material layer.
The first photosensitive material layer patterning process comprises exposure treatment and development treatment so as to display the patterns of the touch electrode circuit and the second non-visible area. When the first photosensitive material layer is exposed, the first photosensitive material layer is placed in an exposure machine, the first photosensitive material layer is exposed through an exposure film, and ultraviolet rays are adopted to vertically irradiate the surface of the first photosensitive material layer through a preset film, so that the first photosensitive material layer of the irradiated part is reacted. When the first photosensitive material layer is subjected to the developing treatment only, the first photosensitive material layer irradiated by ultraviolet rays presents patterns of the touch electrode circuit and the second non-visible area wiring by adopting a developing solution in an area (the touch electrode circuit and the second non-visible area wiring) which is protected and an exposed area obtained by developing.
S650, etching the exposed first conductive material layer to form a touch electrode circuit located in the visible area and a second non-visible area routing located in the non-visible area.
In an exemplary embodiment, the redundant first conductive material layer may be removed by a chemical etching process to form patterns of the touch electrode line and the second non-visible area trace, so as to obtain a connected touch electrode line, and the touch electrode line is reliably connected to the first non-visible area trace and the second non-visible area trace. Therefore, on the basis of reserving the first non-visible area routing and the second non-visible area routing, a touch electrode circuit is formed.
On the basis of the above technical solutions, optionally, after S650, a printing insulation and a back end process are further included. The back-end process may be, for example, attaching the cover plate and the display screen.
It should be noted that, in the foregoing technical solution, the touch electrode lines and the second non-visible area traces are exemplarily shown to be formed by a photolithography process, and the invention is not limited thereto. In other embodiments, a laser etching process may be performed on the surface of the first conductive material layer to form a touch electrode line and a second non-visible area trace. The principle of laser etching is that the focus position of a high-energy laser beam is adjusted to directly act on the first conductive material layer, so that the first conductive material layer is instantly gasified, the etching effect is achieved, and meanwhile, due to the adjustable property of laser energy, the base plate at the bottom cannot be affected in the processing process. Compared with the photoetching process, the method has the advantages of smaller volume, easy operation, low cost and high yield.
In the embodiment of the invention, the first non-visible area routing of the non-visible area is firstly manufactured, and then the touch electrode circuit of the visible area and the second non-visible area routing of the non-visible area are manufactured, namely the second non-visible area routing and the touch electrode circuit of the visible area are manufactured in the same process step. Therefore, the touch screen prepared by the embodiment of the invention is provided with the second non-visible area routing under the first non-visible area routing of the non-visible area. Therefore, the overlapping area of the first non-visible area wiring and the touch electrode circuit is the area of the first non-visible area wiring of the whole non-visible area, and the overlapping is equivalently transferred to be overlapped with the first non-visible area wiring. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area wiring and the visible area touch electrode circuit, and improves the impedance stability and the impedance value of the first non-visible area wiring.
EXAMPLE six
The embodiment of the invention also provides a touch screen which can be applied to electronic equipment such as a mobile phone, a vehicle-mounted central control device, a tablet computer, a touch notebook computer, intelligent wearable equipment (such as an intelligent watch) or a digital camera. The touch screen can be prepared by adopting the preparation method of the touch screen provided by any embodiment of the invention. Referring to fig. 9 and 10, the touch screen includes: the substrate 200, the touch electrode circuit 30 and the non-visible area are wired. The substrate 200 includes a visible region 210 and a non-visible region 220; the touch electrode circuit 30 is located in the visible region 210; the non-visible area traces are located in the non-visible area 220, the non-visible area traces include a second non-visible area trace 32 and a first non-visible area trace 40 which are stacked, and the projection of the first non-visible area trace 40 is located in the projection of the second non-visible area trace 32.
With continued reference to fig. 9 and 10, the second non-visible area traces 32 and the touch electrode traces 30 are formed in the same process step, that is, the second non-visible area traces 32 and the touch electrode traces 30 are located on the same layer and have the same thickness.
On the basis of the above technical solutions, optionally, the material of the first non-visible area trace 40 includes at least one of silver paste, copper paste, carbon paste, copper, aluminum, nickel, titanium, and molybdenum, aluminum, and molybdenum.
With continued reference to fig. 9 and fig. 10, on the basis of the above technical solutions, optionally, the touch electrode circuit 30 includes a plurality of touch electrode blocks 31 sequentially arranged along a first direction, and the touch electrode blocks 31 extend along a second direction; the second non-visible area trace 32 is in contact with an end of the touch electrode line 30 along the second direction.
With continued reference to fig. 9 and 10, based on the above solutions, optionally, the end portion includes a first end portion and a second end portion; the number of the non-visible area traces is equal to the number of the touch electrode blocks 31, and one non-visible area trace is in contact with the first end of one touch electrode block 31 or one non-visible area trace is in contact with the second end of one touch electrode block 31.
Illustratively, a first end of the touch electrode block 31 located at the upper portion of the touch screen is in contact with the non-visible area trace, and a second end of the touch electrode block 31 located at the lower portion of the touch screen is in contact with the non-visible area trace.
It should be noted that, referring to fig. 9 and fig. 10, it is exemplarily shown that the number of the non-visible area traces is equal to the number of the touch electrode blocks 31, and one non-visible area trace is in contact with the first end of one touch electrode block 31 or one non-visible area trace is in contact with the second end of one touch electrode block 31, which is not a limitation of the present invention. In other embodiments, the number of the non-visible area traces may be twice that of the touch electrode blocks 31, such that one non-visible area trace contacts the first end of one touch electrode block 31 and the other non-visible area trace contacts the second end of the touch electrode block 31.
Based on the above solutions, optionally, a part of the end portion is in contact with the second non-visible area trace 32 (as shown in an area E in fig. 17) or all is in contact with the second non-visible area trace 32 (as shown in an area F in fig. 18).
On the basis of the above technical solutions, optionally, the touch screen is a GFF structure capacitive touch screen or a PFF structure capacitive touch screen.
In the touch screen provided by the embodiment of the invention, the second non-visible area trace 32 is arranged below the first non-visible area trace 40 in the non-visible area 220. In this way, the overlapping area of the first non-visible area trace 40 and the touch electrode line 30 is the area of the first non-visible area trace 40 in the whole non-visible area 220, which is equivalent to transferring the overlapping to coincide with the first non-visible area trace 40. Compared with the prior art, the embodiment of the invention does not need to additionally arrange the lap joint area and the tolerance between the lap joint area and the touch electrode circuit 30, thereby reducing the tolerance of the touch screen. In addition, the embodiment of the invention increases the overlapping area of the non-visible area 220 routing and the visible area 210 touch electrode circuit 30, and improves the impedance stability and the impedance value of the first non-visible area routing.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (14)
1. A preparation method of a touch screen is characterized by comprising the following steps:
providing a substrate, wherein the substrate comprises a visible area and a non-visible area; a first conductive material layer covering the visible area and the non-visible area is arranged on the substrate;
forming a first non-visible area routing on the first conductive material layer positioned in the non-visible area;
patterning the first conductive material layer to form a touch electrode circuit positioned in the visible area and a second non-visible area routing wire positioned in the non-visible area; in a direction perpendicular to the substrate, a projection of the first non-visible area trace is located within a projection of the second non-visible area trace.
2. The method for manufacturing the touch screen according to claim 1, wherein the patterning the first conductive material layer comprises:
forming a first photosensitive material layer on the first conductive material layer;
patterning the first photosensitive material layer to form a first opening; the first opening exposes a part of the first conductive material layer;
and etching the exposed first conductive material layer to form the touch electrode circuit and the second non-visible area routing.
3. The method for manufacturing the touch screen according to claim 1, wherein the step of forming a first non-visible area trace on the first conductive material layer in the non-visible area comprises:
forming a second conductive material layer on the first conductive material layer;
and patterning the second conductive material layer positioned in the non-visible area to form the first non-visible area routing.
4. The method for manufacturing the touch screen according to claim 3, wherein the second conductive material layer comprises at least one of silver paste, copper paste and carbon paste.
5. The method for manufacturing the touch screen according to claim 4, wherein the step of forming a first non-visible area trace on the first conductive material layer in the non-visible area comprises:
printing a second conductive material layer on the first conductive material layer;
pre-curing the second conductive material layer;
exposing the pre-cured second conductive material layer;
developing the exposed second conductive material layer;
and curing the developed second conductive material layer to form the first non-visible area routing.
6. The method for manufacturing a touch screen according to claim 3, wherein the second conductive material layer comprises at least one of copper, aluminum, silver, nickel, titanium, molybdenum, aluminum, molybdenum, and oxides thereof.
7. The method for manufacturing the touch screen according to claim 6, wherein the step of forming a first non-visible area trace on the first conductive material layer in the non-visible area comprises:
forming a second conductive material layer on the first conductive material layer;
forming a second photosensitive material layer on the second conductive material layer;
patterning the second photosensitive material layer to form a second opening; the second opening exposes a part of the second conductive material layer;
etching the exposed second conductive material layer to form the first non-visible area routing;
and removing the second conductive material layer positioned in the visible area.
8. A touch screen, comprising:
a substrate including a visible region and a non-visible region;
the touch electrode circuit is positioned in the visible area;
the non-visible area routing is positioned in the non-visible area; the non-visible area wiring comprises a second non-visible area wiring and a first non-visible area wiring which are arranged in a stacked mode, and the projection of the first non-visible area wiring is located in the projection of the second non-visible area wiring.
9. The touch screen of claim 8, wherein the second non-visible area traces and the touch electrode traces are formed in the same process step.
10. The touch screen of claim 8, wherein the material of the first non-viewing area trace comprises at least one of silver paste, copper paste, carbon paste, copper, aluminum, nickel, titanium, and molybdenum aluminum molybdenum.
11. The touch screen of claim 8, wherein the touch electrode trace comprises a plurality of touch electrode blocks arranged in sequence along a first direction, the touch electrode blocks extending along a second direction;
the second non-visible area trace is in contact with an end portion of the touch electrode circuit along the second direction.
12. The touch screen of claim 11, wherein the end portion comprises a first end portion and a second end portion;
the number of the non-visible area wires is equal to the number of the touch electrode blocks, one non-visible area wire is in contact with the first end of one touch electrode block, or one non-visible area wire is in contact with the second end of one touch electrode block.
13. The touch screen of claim 11, wherein the end portion comprises a first end portion and a second end portion;
the number of the non-visible area wires is twice that of the touch electrode blocks, one non-visible area wire is in contact with the first end of one touch electrode block, and the other non-visible area wire is in contact with the second end of one touch electrode block.
14. The touch screen of claim 11, wherein part or all of the end portion is in line contact with the second non-viewable area.
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| CN202010281191.9A CN111475061A (en) | 2020-04-10 | 2020-04-10 | Preparation method of touch screen and touch screen |
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| CN103246420A (en) * | 2013-05-13 | 2013-08-14 | 苏州欧菲光科技有限公司 | Monolayer multipoint capacitive touch screen |
| US20140232950A1 (en) * | 2013-02-19 | 2014-08-21 | Samsung Display Co., Ltd. | Touch screen panel and fabricating method thereof |
| CN107085480A (en) * | 2017-02-16 | 2017-08-22 | 京东方科技集团股份有限公司 | A kind of touch base plate and preparation method thereof, touch control display apparatus |
| CN108920008A (en) * | 2018-07-23 | 2018-11-30 | 意力(广州)电子科技有限公司 | Show equipment, touch panel, touch sensing and its manufacturing method |
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| US20140232950A1 (en) * | 2013-02-19 | 2014-08-21 | Samsung Display Co., Ltd. | Touch screen panel and fabricating method thereof |
| CN103246420A (en) * | 2013-05-13 | 2013-08-14 | 苏州欧菲光科技有限公司 | Monolayer multipoint capacitive touch screen |
| CN107085480A (en) * | 2017-02-16 | 2017-08-22 | 京东方科技集团股份有限公司 | A kind of touch base plate and preparation method thereof, touch control display apparatus |
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