CN111474616A - Method for preparing sub-wavelength metal grating by wide-beam femtosecond laser double pulses - Google Patents
Method for preparing sub-wavelength metal grating by wide-beam femtosecond laser double pulses Download PDFInfo
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Abstract
The invention discloses a method for preparing a sub-wavelength metal grating by a wide-beam femtosecond laser double pulse. The method can realize the high-efficiency controllable preparation of the large-area sub-wavelength metal grating, does not need precise mechanical parts, does not have a mask, does not have a chemical corrosive agent, and has loose processing environment; the whole preparation process is simple and easy to operate, and secondary damage of stress to the surface of the metal sample can be effectively avoided due to non-contact processing; the surface structure prepared by the method is more regular and uniform in spatial arrangement, and has a large laser spot irradiation range and high preparation efficiency.
Description
Technical Field
The invention relates to the technical field of laser processing, in particular to a method for preparing a sub-wavelength metal grating by using a wide-beam femtosecond laser double pulse.
Background
The grating is used as an important tool for analyzing spectral information, regulating and controlling light transmission performance and detecting optical electromagnetic field properties, and has important influence on various aspects of national defense and life. Compared with the conventional grating, the sub-wavelength metal grating has many unique points in the aspect of optical transmission performance, wide response spectrum, high transmittance and extinction ratio, and good polarization correlation, and has become the most potential optical element in the future. In general, a metal grating of sub-wavelength order is a core element in a spectrometer, a monochromator, a laser, and the like. In addition, the all-metal grating element has the characteristics of good pressure resistance, high temperature resistance, difficulty in damage and the like, can be normally used in various extreme environments, greatly improves the stability of instruments and equipment, and has wide application prospects in the fields of photoelectric detection, polarization imaging, optical sensing and the like.
In view of the fact that sub-wavelength metal gratings are important components constituting advanced instruments and devices, extensive and intensive research on methods for preparing them has been conducted. The current mature preparation method comprises the following steps: mechanical scribing, electron beam etching, extreme ultraviolet lithography, nanoimprint and the like, however, the preparation methods have respective limitations, and further development of the sub-wavelength metal grating is severely limited. In addition, the mechanical ruling machine, the electron beam etching system and the like are high in price, high in maintenance cost, strict in requirements on processing materials and environment, and high in processing cost, time-consuming and the like; however, the operation process of preparing the sub-wavelength metal grating by adopting the photoetching and imprinting methods is complex, mask treatment and the use of various chemical etching agents, resists and the like are required, a large amount of environmental pollutants are easily generated in the preparation process, and the preparation efficiency is low. Compared with the traditional sub-wavelength metal grating preparation method, the femtosecond laser becomes a novel tool for preparing the sub-wavelength structure due to the characteristics of high peak power, small heat affected zone and the like. Among them, the method and mechanism for generating (quasi-) periodic surface structures based on femtosecond laser induction have been extensively studied by numerous scholars. In summary, by controlling parameters such as spatial intensity distribution, temporal characteristics, energy density, number of pulses, and polarization direction of the incident femtosecond laser, the period, shape, and depth of the sub-wavelength structure on the surface of the material can be changed. However, at present, the preparation of sub-wavelength-scale (quasi-) periodic structures on metal surfaces by using femtosecond lasers mostly concentrates on the situation that a single incident beam is subjected to space tight focusing through an objective lens or other spherical optical elements, wherein the problems of small irradiation area of a focused light spot, low preparation efficiency in large area, uneven distribution of surface structures, poor regularity and the like obviously exist, and especially the example of carrying out the rapid preparation of large-area sub-wavelength gratings on the surfaces of high-melting-point and high-hardness materials such as metal tungsten has not been successfully realized. In conclusion, the application of the femtosecond laser to the field of high-efficiency preparation of large-area high-quality sub-wavelength metal gratings still has a plurality of difficulties.
Disclosure of Invention
The invention aims to solve the problems of small irradiation area of focused light spots, low preparation efficiency of large area, uneven distribution of surface structure, poor regularity and the like existing in the conventional method for preparing the sub-wavelength grating on the surface of metal by femtosecond laser, and particularly, the embodiment of carrying out the rapid preparation of the large-area sub-wavelength grating on the surface of a high-melting-point and high-hardness material, namely metal tungsten, is not successfully realized.
In order to achieve the purpose, the invention adopts the following technical scheme:
a method for preparing a sub-wavelength metal grating by using a wide-beam femtosecond laser double pulse comprises the following steps:
s1, outputting a processing light source by the femtosecond laser light source, and making the processing light source enter the optical beam expanding device;
s2, expanding the beam of the processing light source by the optical beam expanding device, and enabling the expanded light source to enter an energy adjusting device in an incident mode;
s3, the energy adjusting device adjusts the energy of the light source after beam expansion, and the light source after energy adjustment enters a double-pulse generating device in an incident mode;
s4, outputting femtosecond laser double pulses which are transmitted in a collinear way in space, delayed in time and vertical to each other in polarization direction by the double-pulse generating device, and enabling the femtosecond laser double pulses to enter the beam line focusing device in an incident mode;
s5, the beam line focusing device performs space focusing on the femtosecond laser double pulses and irradiates the femtosecond laser double pulses onto the surface of a metal to be processed on a sample moving and scanning device to prepare the sub-wavelength metal grating, and the sample moving and scanning device changes the number of overlapped pulses irradiated onto the surface of the metal to be processed by controlling the translation speed of the metal to be processed, so as to control the shape of the microstructure of the surface of the metal to be processed.
Further, the purity of the metal to be processed is more than 99%, and the roughness of the surface of the metal to be processed is 5-10 nanometers. Preferably, the metal to be processed is metal tungsten, the purity is 99.95%, and the surface roughness is 7.71 nanometers.
Further, the femtosecond laser source is a titanium-doped sapphire chirped pulse amplification laser, the repetition frequency of the output light source is 1 kilohertz, the pulse width is 40 femtoseconds, the central wavelength is 800 nanometers, and the diameter of a light spot is 5 millimeters.
Further, the optical beam expanding device is composed of plano-concave and plano-convex lenses, focal lengths of the plano-concave and plano-convex lenses are 38.1 mm and 125 mm respectively, and a light spot diameter of a light source output by the optical beam expanding device is 15 mm.
Further, the energy adjusting device consists of a half wave plate and a Glan-Taylor prism, and the continuous adjustment of the energy of the output light source of the energy adjusting device is controlled by rotating the crystal axis direction of the half wave plate.
Further, the double-pulse generating device is a yttrium vanadate birefringent crystal, an included angle between a polarization direction of a light source entering the double-pulse generating device and an optical axis of the yttrium vanadate birefringent crystal is 30 degrees or 60 degrees, and an energy ratio of femtosecond laser double pulses output by the double-pulse generating device is √ 3: 1.
Further, the thickness of the yttrium vanadate birefringent crystal is 1.684 millimeters, and the delay time of the femtosecond laser double pulse output by the double-pulse generating device is 1.2 picoseconds.
Further, the beam line focusing device is a plano-convex cylindrical lens, the diameter of the plano-convex cylindrical lens is 25.4 mm, the focal length of the plano-convex cylindrical lens is 50 mm, the plano-convex cylindrical lens is made of fused quartz material, and the beam line focusing device performs spatial focusing on the femtosecond laser double pulses output by the double-pulse generating device in the direction perpendicular to the bus bars of the lens.
Further, the sample moving and scanning device controls the translation speed of the metal to be processed, and the scanning speed of a light source irradiating the surface of the metal to be processed is 0.01-0.03 mm/s.
The method for preparing the sub-wavelength metal grating by the wide-beam femtosecond laser double pulses can realize the efficient preparation of the sub-wavelength metal grating on the surface of a high-melting-point and high-hardness material, namely metal tungsten. Compared with the existing methods such as mechanical etching, electron beam etching, photoetching and the like, the method not only can realize the high-efficiency controllable preparation of the large-area sub-wavelength metal grating, but also does not need precise mechanical parts, has no mask, has no chemical corrosive and has loose processing environment; the whole preparation process is simple and easy to operate, and secondary damage of stress to the surface of the metal tungsten sample can be effectively avoided due to non-contact processing; on the other hand, compared with the condition of single beam femtosecond laser irradiation, the surface structure prepared and formed by the method is more regular and uniform in spatial arrangement, the irradiation range of laser spots is large, and the preparation efficiency is high. In a word, the method for preparing the sub-wavelength grating on the metal surface by the time delay wide-beam femtosecond laser double pulses based on polarization crossing is a non-contact processing method which is low in processing cost, high in efficiency and controllable.
Drawings
FIG. 1 is a schematic diagram of an optical path of a method for efficiently manufacturing a sub-wavelength metal grating by using a wide-beam femtosecond laser double-pulse according to the invention;
FIG. 2 is an optical picture and laser intensity distribution of a spot focused on the surface of a tungsten metal in an embodiment of the present invention;
FIG. 3 is an optical photograph and a Scanning Electron Microscope (SEM) image of a sub-wavelength tungsten grating prepared in an embodiment of the present invention;
FIG. 4 is an atomic force scanning microscopy (AFM) image of a sub-wavelength tungsten grating and a depth of texture measurement curve thereof prepared in an embodiment of the present invention;
FIG. 5 is an SEM image of the structure appearance of a sub-wavelength tungsten grating prepared when the polarization direction of a light source incident to a yttrium vanadate birefringent crystal and the optical axis direction of the yttrium vanadate birefringent crystal are 30 degrees and 60 degrees;
FIG. 6 is a diagram showing the relationship between the laser energy passing through the energy adjusting device and the depth of the sub-wavelength tungsten grating structure;
description of reference numerals:
110-femtosecond laser source; 120-an optical beam expanding device; 130-energy regulating means; 140-double pulse generating means; 150-beam-line focusing means; 160-sample moving and scanning device.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not to be construed as limiting the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1, it is a schematic optical path diagram of the method for efficiently preparing a sub-wavelength metal grating by double-pulse wide-beam femtosecond laser according to the present invention, wherein a femtosecond laser source 110, an optical beam expanding device 120, an energy adjusting device 130, a double-pulse generating device 140, a beam line focusing device 150, and a sample moving and scanning device 160 are sequentially disposed along the optical path direction.
The femtosecond laser source 110 is used for generating a femtosecond laser beam, the optical beam expander 120 is used for expanding the femtosecond laser beam, the energy adjuster 130 is used for continuously adjusting the energy of the femtosecond laser beam, the double-pulse generator 140 is used for generating a femtosecond laser double pulse with a fixed time delay, the beam line focusing device 150 is used for focusing the femtosecond laser double pulse on the surface of a metal to be processed, and the sample moving and scanning device 160 is used for fixing and moving the metal to be processed.
The invention discloses a method for preparing a sub-wavelength metal grating by using a wide-beam femtosecond laser double pulse, which comprises the following steps:
s1, outputting a processing light source by the femtosecond laser light source 110, and making the processing light source incident into the optical beam expanding device 120;
s2, expanding the beam of the processing light source by the optical beam expanding device 120, and enabling the expanded light source to enter the energy adjusting device 130;
s3, the energy adjusting device 130 adjusts the energy of the expanded light source, and the light source after energy adjustment enters the double-pulse generating device 140;
s4, outputting femtosecond laser double pulses which are transmitted in a collinear way in space, delayed in time and vertical to each other in polarization direction by the double-pulse generating device 140, and enabling the femtosecond laser double pulses to enter the beam line focusing device 150 in an incident mode;
s5, the beam line focusing device 150 performs space focusing on the femtosecond laser double pulses and irradiates the surfaces of the metals to be processed on the sample moving and scanning device 160 to prepare the sub-wavelength metal grating, and the sample moving and scanning device 160 changes the number of overlapped pulses irradiated on the surfaces of the metals to be processed by controlling the translation speed of the metals to be processed, so as to control the shapes of the microstructures of the surfaces of the metals to be processed.
The purity of the metal to be processed is generally required to be more than 99%, the surface must be subjected to mechanical polishing treatment, and the roughness is 5-10 nanometers. In this embodiment, the metal to be processed is a tungsten wafer with a diameter of 15 mm, the purity is 99.95%, and the surface roughness is 7.71 nm.
In this embodiment, the femtosecond laser source 110 is a titanium sapphire chirped pulse amplification laser, and the output light source has a repetition frequency of 1 khz, a pulse width of 40 femtoseconds, a center wavelength of 800 nm, and a spot diameter of 5 mm.
In this embodiment, the optical beam expander 120 is composed of plano-concave and plano-convex lenses, the focal lengths of the plano-concave and plano-convex lenses are 38.1 mm and 125 mm, respectively, and the light spot diameter of the light source output by the optical beam expander 120 is 15 mm.
In other embodiments, the optical beam expander 120 may be a beam expander with different beam expanding magnifications composed of plano-concave and plano-convex lenses with other focal lengths, and the diameter of the expanded light spot is controlled to match the diameter of the metal to be processed.
In this embodiment, the energy adjusting device 130 is composed of a half-wave plate and a glan-taylor prism, and rotating the crystal axis direction of the half-wave plate controls the continuous adjustment of the energy of the output light source of the energy adjusting device 130.
In this embodiment, the double pulse generator 140 is a yttrium vanadate birefringent crystal with a thickness of 1.684 mm, an included angle between the polarization direction of the light source entering the double pulse generator 140 and the optical axis of the yttrium vanadate birefringent crystal is 30 ° or 60 °, the femtosecond laser double pulses output by the double pulse generator 140 are transmitted collinearly in space, have a time of 1.2 picoseconds, are perpendicular to each other in polarization direction, and have an energy ratio of √ 3: 1.
In this embodiment, the beam line focusing device 150 is a plano-convex cylindrical lens, the diameter of the plano-convex cylindrical lens is 25.4 mm, the focal length is 50 mm, and the plano-convex cylindrical lens is made of fused silica material, the beam line focusing device 150 performs spatial focusing on the femtosecond laser double pulses output by the double pulse generating device in the direction perpendicular to the lens bus, and the femtosecond laser double pulses keep the original size in the direction parallel to the lens bus, so that the irradiation range of the focused femtosecond laser double pulses is in a slender elliptical shape, wherein the length of the spot in the long axis direction of the ellipse is about 15 mm.
As shown in fig. 2, for the optical picture and the laser intensity distribution of the spot focused on the surface of the metal tungsten in this embodiment, after the processing light source output by the femtosecond laser source 110 passes through the optical beam expander 120, the energy adjuster 130, the double-pulse generator 140 and the beam line focusing device 150, the femtosecond laser double-pulse is focused on the surface of the metal tungsten to form an elongated elliptical shape, wherein the major axis of the ellipse is 15 mm, and the minor axis of the ellipse is the focusing direction.
Further, the normalized laser intensity distribution at the position of the dotted line of the light spot in fig. 2 shows that the laser intensity varying along the edge toward the center position in the short axis direction is sharply increased without the beam spatial focusing effect in the long axis direction, so that the femtosecond laser double pulse irradiated to the surface of the metal tungsten has a slowly varying intensity distribution in the direction. Based on this, the femtosecond laser double pulses output after being focused by the beam line focusing device 150 scan the metal tungsten along the short axis direction, which not only can obtain larger spot irradiation and single scanning area, but also can realize the uniform generation of the sub-wavelength tungsten grating in the spot range.
The sample moving and scanning device 160 generally comprises a three-dimensional precision moving platform and a computer, and the number of overlapping pulses irradiated on the surface of the metal to be processed is changed by controlling the translation speed of the metal to be processed on the three-dimensional precision moving platform through a computer program, so that the shape of the microstructure of the metal surface is controlled, and the preparation area on the metal surface is changed by controlling the moving direction of the metal to be processed. The scanning speed of the light source irradiating the surface of the metal to be processed is generally controlled to be 0.01 to 0.03 mm/sec. In the present embodiment, the scanning speed of the light source irradiated to the surface of the metal tungsten to be processed is 0.02 mm/sec.
As shown in fig. 3, it can be seen from the optical photograph and Scanning Electron Microscope (SEM) image of the sub-wavelength tungsten grating prepared according to the present embodiment that the sub-wavelength tungsten grating prepared according to the present embodiment has high regularity, is uniformly distributed on the whole surface of the sample, has a grating period of 510 ± 20 nm, and can exhibit iridescence under the irradiation of sunlight, indicating that it has a certain light-splitting capability and spatial dispersion effect. In addition, the sub-wavelength tungsten grating prepared by the embodiment has no surface damage caused by mechanical stress, the surface appearance of the grating is relatively consistent, and the grating is only subjected to ultrasonic cleaning by simple chemical solvents such as acetone, deionized water and ethanol in the processing process, so that the problems of impurity residue, environmental pollution and the like do not exist.
As shown in fig. 4, for an atomic force scanning microscopy (AFM) image and a depth of structure measurement curve of the sub-wavelength tungsten grating prepared in the present embodiment, it can be seen that the depth of structure of the sub-wavelength tungsten grating prepared in the present embodiment is about 200 nm, and the surface of the trench is smooth, so that a good grating preparation effect is achieved.
As shown in fig. 5, the prepared subwavelength tungsten grating structure morphology SEM image is obtained when the polarization direction of the light source incident on the yttrium vanadate birefringent crystal 140 and the optical axis direction of the yttrium vanadate birefringent crystal 140 are 30 ° and 60 °. It can be seen that under the condition of irradiation of given incident laser energy and under the condition of unchanged control conditions of other parameters, when the yttrium vanadate birefringent crystal 140 rotates to certain specific directions (for example, the included angles with the polarization direction of the incident laser are 30 ° and 60 °), a sub-wavelength tungsten grating structure regularly arranged in the whole area of a light spot can be obtained. At this time, due to the crystal birefringence effect, the processing beam is a time delay double pulse with collinear transmission, vertical polarization and energy ratio √ 3:1, and the direction of the sub-wavelength tungsten grating structure is always perpendicular to the polarization direction of the high-energy laser pulse (as shown by the black double arrow in the figure). In addition, when the angle between the crystal optical axis and the polarization direction of the incident light is not equal to 30 ° or 60 °, that is, the ratio of the delayed double pulse energies is not equal to √ 3:1, the regularity of the sub-wavelength fringe structure obtained on the tungsten surface is deteriorated. Based on this, the adoption of a double-pulse femtosecond laser with an energy ratio of √ 3:1 and a vertical polarization and a fixed time delay is an important processing parameter for realizing the preparation of the regular sub-wavelength tungsten grating.
As shown in fig. 6, which is a corresponding relationship diagram of the laser energy passing through the energy adjusting device and the structural depth of the manufactured sub-wavelength tungsten grating, it can be seen that the adjusting effect of the energy adjusting device 130 on the laser energy is changed, and the structural depth of the manufactured sub-wavelength tungsten grating is also changed under the condition that the control conditions of other parameters are not changed. The measurement result shows that along with the gradual increase of the femtosecond laser energy output by the energy adjusting device 130, the structural depth of the prepared sub-wavelength tungsten grating presents the change characteristic of increasing firstly and then decreasing, and when the femtosecond laser energy output by the energy adjusting device 130 is 194 milliwatts, the structural depth is about 210 nanometers at most; if the femtosecond laser energy output by the energy modulation device 130 is continued to increase to 254 milliwatts, the depth of the structure is reduced to about 85 nanometers. The above results indicate that, when the method for efficiently preparing the sub-wavelength metal grating by using the wide-beam femtosecond laser double pulses of the invention is used, the femtosecond laser energy output by the energy adjusting device 130 is an important processing parameter for effectively adjusting and controlling the depth of the grating groove.
The method for preparing the sub-wavelength metal grating by the wide-beam femtosecond laser double pulses can realize the efficient preparation of the sub-wavelength metal grating on the surface of a material with high melting point and high hardness, such as metal tungsten, has the characteristics of short time consumption, simplicity and easiness in operation, low cost, non-contact processing and the like, and is beneficial to the commercialization of large-area sub-wavelength metal gratings.
Compared with the existing methods such as mechanical etching, electron beam etching, photoetching and the like, the method for preparing the sub-wavelength metal grating by the wide-beam femtosecond laser double-pulse provided by the invention not only can realize the high-efficiency controllable preparation of the large-area sub-wavelength metal grating, but also has the advantages of no need of precise mechanical parts, no mask, no chemical corrosive and loose processing environment; the whole preparation process is simple and easy to operate, and secondary damage of stress to the surface of the metal tungsten sample can be effectively avoided due to non-contact processing; on the other hand, compared with the condition of single beam femtosecond laser irradiation, the surface structure prepared and formed by the method is more regular and uniform in spatial arrangement, the irradiation range of laser spots is large, and the preparation efficiency is high. In conclusion, the polarization-crossing-based time-delay wide-beam femtosecond laser double-pulse preparation of the sub-wavelength grating on the metal surface is a non-contact processing method which is low in processing cost, high in efficiency and controllable.
The specific embodiments of the present invention are not intended to limit the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A method for preparing a sub-wavelength metal grating by using a wide-beam femtosecond laser double pulse is characterized by comprising the following steps:
s1, outputting a processing light source by the femtosecond laser light source, and making the processing light source enter the optical beam expanding device;
s2, expanding the beam of the processing light source by the optical beam expanding device, and enabling the expanded light source to enter an energy adjusting device in an incident mode;
s3, the energy adjusting device adjusts the energy of the light source after beam expansion, and the light source after energy adjustment enters a double-pulse generating device in an incident mode;
s4, outputting femtosecond laser double pulses which are transmitted in a collinear way in space, delayed in time and vertical to each other in polarization direction by the double-pulse generating device, and enabling the femtosecond laser double pulses to enter the beam line focusing device in an incident mode;
s5, the beam line focusing device performs space focusing on the femtosecond laser double pulses and irradiates the femtosecond laser double pulses onto the surface of a metal to be processed on a sample moving and scanning device to prepare the sub-wavelength metal grating, and the sample moving and scanning device changes the number of overlapped pulses irradiated onto the surface of the metal to be processed by controlling the translation speed of the metal to be processed, so as to control the shape of the microstructure of the surface of the metal to be processed.
2. The method for preparing the sub-wavelength metal grating by the wide-beam femtosecond laser double pulse according to claim 1, wherein the purity of the metal to be processed is more than 99%, and the roughness of the surface of the metal to be processed is 5-10 nm.
3. The method for preparing sub-wavelength metal grating by using the wide-beam femtosecond laser double pulses as claimed in claim 2, wherein the metal to be processed is metal tungsten, the purity is 99.95%, and the surface roughness is 7.71 nm.
4. The method for preparing a sub-wavelength metal grating by using the wide-beam femtosecond laser double pulses as claimed in claim 1, wherein the femtosecond laser light source is a titanium-doped sapphire chirped pulse amplification laser, the repetition frequency of the output light source is 1 khz, the pulse width is 40 femtoseconds, the central wavelength is 800 nm, and the diameter of a light spot is 5 mm.
5. The method for preparing the sub-wavelength metal grating by the double pulses of the wide-beam femtosecond laser according to claim 1, wherein the optical beam expanding device is composed of plano-concave and plano-convex lenses, focal lengths of the plano-concave and plano-convex lenses are respectively 38.1 mm and 125 mm, and a light spot diameter of a light source output by the optical beam expanding device is 15 mm.
6. The method for preparing the sub-wavelength metal grating by the double pulses of the wide-beam femtosecond laser according to claim 1, wherein the energy adjusting device is composed of a half-wave plate and a Glan-Taylor prism, and the continuous adjustment of the energy of the output light source of the energy adjusting device is controlled by rotating the crystal axis direction of the half-wave plate.
7. The method for preparing the sub-wavelength metal grating by the double pulses of the wide-beam femtosecond laser according to claim 1, wherein the double-pulse generating device is a yttrium vanadate birefringent crystal, an included angle between a polarization direction of a light source incident into the double-pulse generating device and an optical axis of the yttrium vanadate birefringent crystal is 30 ° or 60 °, and an energy ratio of the femtosecond laser double pulses output by the double-pulse generating device is √ 3: 1.
8. The method for preparing a sub-wavelength metal grating by using the wide-beam femtosecond laser double pulses as claimed in claim 7, wherein the thickness of the yttrium vanadate birefringent crystal is 1.684 mm, and the delay time of the femtosecond laser double pulses output by the double-pulse generating device is 1.2 picoseconds.
9. The method for preparing the sub-wavelength metal grating by the double-pulse of the wide-beam femtosecond laser according to claim 1, wherein the beam line focusing device is a plano-convex cylindrical lens which has a diameter of 25.4 mm and a focal length of 50 mm and is made of fused silica material, and the beam line focusing device performs spatial focusing on the femtosecond laser double-pulse output by the double-pulse generating device in a direction perpendicular to a lens bus bar.
10. The method for preparing the sub-wavelength metal grating by the double pulses of the wide-beam femtosecond laser according to claim 1, wherein the sample moving and scanning device controls the translation speed of the metal to be processed to realize the scanning speed of a light source irradiating the surface of the metal to be processed to be 0.01-0.03 mm/s.
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| CN114779380B (en) * | 2021-12-29 | 2023-07-07 | 江苏集萃微纳自动化***与装备技术研究所有限公司 | Diffraction optical component preparation device and preparation method thereof |
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