CN111447695A - Manufacturing method and formula of graphene far infrared heating plate - Google Patents
Manufacturing method and formula of graphene far infrared heating plate Download PDFInfo
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- CN111447695A CN111447695A CN202010369376.5A CN202010369376A CN111447695A CN 111447695 A CN111447695 A CN 111447695A CN 202010369376 A CN202010369376 A CN 202010369376A CN 111447695 A CN111447695 A CN 111447695A
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- far infrared
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- graphene
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- heating plate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/145—Carbon only, e.g. carbon black, graphite
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/18—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/286—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an organic material, e.g. plastic
Abstract
The invention discloses a preparation method and a formula of a Graphene far infrared heating plate, wherein the solution comprises a main solution, an additive and deionized water, the preparation method of the main solution comprises the steps of putting 20-100 g of Graphene (Graphene), 1-10 g of tin tetrachloride (SnCl 4), 1-15 g of indium trichloride (InCl 3) and 1-10 g of ammonium fluoride (NH 4F) into a container, pouring 100-200m L of absolute ethyl alcohol (EtOH), stirring for 1-3 hours, standing for 5-30 hours to serve as a main solution, pouring the additive into the main solution container, stirring for 10-60 minutes, adding 5-30m L of hydrochloric acid, standing for 10-60 minutes, standing for 5-15 hours for later use, adding the hydrochloric acid to play a role of a stabilizer, and stabilizing the far infrared spectrum wavelength of the heating plate to be within the range of 4-14 mu m.
Description
Technical Field
The invention relates to the field of far infrared heating plates, in particular to a manufacturing method and a formula of a graphene far infrared heating plate.
Background
The heating plate is a safe and reliable electric heating flat plate which is electrified and has no electricity and open fire after being electrified and has a round or square shape. Because the heat is mainly radiated by far infrared when in use, the heat efficiency is high. According to scientific research, the far infrared ray with the wavelength of 8-14um is the same as the wave band radiated by a human body, and the far infrared ray with the same wavelength has good physical therapy effect on the human body, so the far infrared ray with the wave band becomes 'life light', the ray can also form resonance effect with water, large water molecular groups which are not easily absorbed by people generate resonance to depolymerize the molecular groups, and the large water molecular groups are recombined into smaller water molecular groups, (namely, the water molecules are activated and ionized), in the process, dirt substances adsorbed on the surfaces of the water molecular groups are removed, the irradiated water is more beneficial to the health of the human body, and the formula for manufacturing the far infrared heating plate in the prior art has complex components; and the emitted far infrared ray has low density and unstable wavelength or the main wavelength is not close to 4-18nm when the device works.
Disclosure of Invention
The present invention aims to overcome the above-mentioned shortcomings and provide a technical solution to solve the above-mentioned problems.
The manufacturing method of the graphene far infrared heating plate comprises the following steps:
step one, preparing a solution;
step two, heating the substrate;
step three, spraying the solution on a substrate;
step four, heating to generate far infrared rays;
as a further scheme of the invention: the solution is divided into a main solution, an additive and deionized water.
The further scheme of the invention is that the main solution preparation method comprises the steps of putting 20-100 g of Graphene (Graphene), 1-10 g of tin tetrachloride (SnCl 4), 1-15 g of indium trichloride (InCl 3) and 1-10 g of ammonium fluoride (NH 4F) into a container, pouring 100-200m L of absolute ethyl alcohol (EtOH), stirring for 1-3 hours, and standing for 5-30 hours to obtain the main solution.
The further scheme of the invention is that the additive preparation method comprises the steps of putting 1-10 g of manganese dichloride (MnCl 2), 1-10 g of antimony trichloride (SbCl 3), 1-10 g of ferric trichloride (FeCl 3), 1-10 g of nickel dichloride hexahydrate (NiCl2.6H2O), 1-15 g of ammonium chloride NH4Cl, 1-15 g of titanium (TiCl 3) and 1-10 g of bismuth trichloride (BIC L3) into a container, adding 10-50m L of isopropanol, stirring for 5-30 minutes, adding 1-10m L of glacial acetic acid, stirring for 1-3 hours, standing for 5-30 hours
The further scheme of the invention is that the additive is poured into the main solution container, stirred for 10-60 minutes, added with hydrochloric acid of 5-30m L, stirred for 10-60 minutes and then kept stand for 5-15 hours for later use, the hydrochloric acid is added to play a role of a stabilizer, and the additive is used for stabilizing the far infrared spectrum wavelength of the heating plate to be within the range of 4-20 mu m.
As a further scheme of the invention: when in use, the primary pulp solution is added into 5 to 20 parts of deionized water according to 0.5 to 3 parts of solution and is stirred for 5 to 20 minutes for use.
As a further scheme of the invention: the substrate is placed in a high temperature furnace and heated to 500-1000 ℃.
As a further scheme of the invention: and (3) putting the solution into ultrasonic spraying equipment, and uniformly spraying the solution on the surface of the substrate for 10-30 seconds by using an ultrasonic spray gun to prepare the graphene far infrared heating plate.
As a further scheme of the invention: adding the raw stock solution into 0.5-3 parts of deionized water according to 0.5-3 parts of the solution, uniformly stirring, printing the mixture on a glass or ceramic kettle by using a screen printing technology, and generating far infrared rays by using other heat sources for auxiliary heating, wherein the substrate is a ceramic substrate or a glass substrate.
The solution used in the manufacturing method of the Graphene far infrared heating plate comprises a main solution, an additive and deionized water, wherein the main solution comprises 20-100 g of Graphene (Graphene), 1-10 g of stannic chloride (SnCl 4), 1-15 g of indium trichloride (InCl 3), 1-10 g of ammonium fluoride (NH 4F) and 100-200m L of absolute ethyl alcohol (EtOH), and the additive comprises 1-10 g of manganese dichloride (MnCl 2), 1-10 g of antimony trichloride (SbCl 3), 1-10 g of ferric trichloride (FeCl 3), 1-10 g of nickel dichloride hexahydrate (NiCl2. H62O), 1-15 g of ammonium chloride NH4Cl, 1-15 g of titanium dichloride (TiCl 3), 1-10 g of bismuth trichloride (BIC L3) and 10-50m L of isopropanol.
Compared with the prior art, the invention has the beneficial effects that: the graphene far infrared heating plate manufactured by the method has stable wavelength, the wavelength of a far infrared spectrum can be stabilized to be within the range of 4-14 mu m and is close to 'life light', the ray can form a resonance effect with water, large water molecular groups which are not easy to be absorbed by people can resonate to depolymerize the molecular groups and recombine into smaller water molecular groups, (namely, the water molecules are activated and ionized), in the process, dirt substances adsorbed on the surfaces of the water molecular groups are removed, and the irradiated water is more beneficial to human health.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
The manufacturing method of the graphene far infrared heating plate comprises the following steps:
step one, preparing a solution;
step two, heating the substrate;
step three, spraying the solution on a substrate;
step four, heating to generate far infrared rays;
the solution is divided into a main solution, an additive and deionized water.
The preparation method of the main solution comprises the steps of putting 20-100 g of Graphene (Graphene), 1-10 g of stannic chloride (SnCl 4), 1-15 g of indium trichloride (InCl 3) and 1-10 g of ammonium fluoride (NH 4F) into a container, pouring 100-200m L of absolute ethyl alcohol (EtOH), stirring for 1-3 hours, and standing for 5-30 hours to obtain the main solution.
The additive is prepared by putting 1-10 g of manganese dichloride (MnCl 2), 1-10 g of antimony trichloride (SbCl 3), 1-10 g of ferric trichloride (FeCl 3), 1-10 g of nickel dichloride hexahydrate (NiCl2.6H2O), 1-15 g of ammonium chloride NH4Cl, 1-15 g of titanium (TiCl 3) and 1-10 g of bismuth trichloride (BIC L3) into a container, pouring 10-50m L isopropanol, stirring for 5-30 minutes, adding 1-10m L glacial acetic acid, stirring for 1-3 hours, standing for 5-30 hours
The additive is poured into the main solution container, is stirred for 10-60 minutes, then is added with hydrochloric acid of 5-30m L, is stirred for 10-60 minutes and then is kept stand for 5-15 hours for later use, the hydrochloric acid is added to play a role of a stabilizer, and the additive is used for stabilizing the far infrared spectrum wavelength of the heating plate to be within the range of 4-14 mu m.
When in use, the primary pulp solution is added into 5 to 20 parts of deionized water according to 0.5 to 3 parts of solution and is stirred for 5 to 20 minutes for use.
The substrate is placed in a high temperature furnace and heated to 500-1000 ℃.
And (3) putting the solution into ultrasonic spraying equipment, and uniformly spraying the solution on the surface of the substrate for 10-30 seconds by using an ultrasonic spray gun to prepare the graphene far infrared heating plate.
Adding the raw stock solution into 0.5-3 parts of deionized water according to 0.5-3 parts of the solution, uniformly stirring, printing the mixture on a glass or ceramic kettle by using a screen printing technology, and generating far infrared rays by using other heat sources for auxiliary heating, wherein the substrate is a ceramic substrate or a glass substrate.
Example 2
The manufacturing method of the graphene far infrared heating plate comprises the following steps:
step one, preparing a solution;
step two, heating the substrate;
step three, spraying the solution on a substrate;
step four, heating to generate far infrared rays;
the solution is divided into a main solution, an additive and deionized water.
The preparation method of the main solution comprises the steps of putting 50 g of Graphene (Graphene), 3 g of stannic chloride (SnCl 4), 5 g of indium trichloride (InCl 3) and 2 g of ammonium fluoride (NH 4F) into a container, pouring 100m L of absolute ethyl alcohol (EtOH), stirring for 1 hour, and standing for 10 hours to obtain the main solution.
The additive is prepared by putting 3 g of manganese dichloride (MnCl 2), 3 g of antimony trichloride (SbCl 3), 1 g of ferric trichloride (FeCl 3), 2 g of nickel dichloride hexahydrate (NiCl2.6H2O), 4 g of ammonium chloride NH4Cl, 5 g of titanium chloride (TiCl 3) and 1.5 g of bismuth trichloride (BIC L3) into a container, pouring 20m L isopropanol, stirring for 20 minutes, adding 5m L glacial acetic acid, stirring for 1 hour, standing for 10 hours after stirring for 1 hour
The additive is poured into the main solution container, is stirred for 30 minutes, is added with hydrochloric acid of 10m L, is stirred for 30 minutes and is kept stand for 8 hours for later use, the hydrochloric acid is added to play a role of a stabilizer, and the additive is used for stabilizing the far infrared spectrum wavelength of the heating plate to be within the range of 4-14 microns.
When in use, the primary pulp solution is added into 15 parts of deionized water according to 1 part of solution and stirred for 10 minutes.
The substrate was placed in a high temperature furnace and heated to 800 degrees.
And (3) putting the solution into ultrasonic spraying equipment, uniformly spraying the solution on the surface of the substrate for 10-30 seconds by using an ultrasonic spray gun to obtain the graphene far infrared heating plate, wherein the graphene far infrared heating plate prepared by the method is about 18W per square centimeter, and the working temperature is 650 ℃ for stable working.
Adding the virgin stock solution into 2 parts of deionized water according to 1 part of the virgin stock solution, uniformly stirring, printing the virgin stock solution on glass or a ceramic kettle by using a screen printing technology, and generating far infrared rays by using other heat sources for auxiliary heating, wherein the substrate is a ceramic substrate or a glass substrate.
Example 3
The solution comprises a main solution, an additive and deionized water, wherein the main solution comprises 20-100 g of Graphene (Graphene), 1-10 g of stannic chloride (SnCl 4), 1-15 g of indium trichloride (InCl 3), 1-10 g of ammonium fluoride (NH 4F) and 100-10 m of absolute ethyl alcohol (EtOH) L, and the additive comprises 1-10 g of manganese dichloride (MnCl 2), 1-10 g of antimony trichloride (SbCl 3), 1-10 g of ferric trichloride (FeCl 3), 1-10 g of nickel dichloride hexahydrate (NiCl2.6H2O), 1-15 g of ammonium chloride NH4Cl, 1-15 g of titanium chloride (TiCl 3), 1-10 g of bismuth trichloride (BIC L3) and 10-50m of L of isopropanol.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Claims (10)
1. The manufacturing method of the graphene far infrared heating plate is characterized by comprising the following steps:
step one, preparing a solution;
step two, heating the substrate;
step three, spraying the solution on a substrate;
step four, heating to generate far infrared rays.
2. The method for manufacturing a graphene far infrared heating panel according to claim 1, wherein the solution is divided into a main solution, an additive and deionized water.
3. The method for manufacturing the Graphene far infrared heating plate as claimed in claim 2, wherein the main solution is manufactured by putting 20-100 g of Graphene (Graphene), 1-10 g of tin tetrachloride (SnCl 4), 1-15 g of indium trichloride (InCl 3) and 1-10 g of ammonium fluoride (NH 4F) into a container, pouring 100-200m L of absolute ethyl alcohol (EtOH), stirring for 1-3 hours, and standing for 5-30 hours to obtain the main solution.
4. The method for manufacturing a graphene far infrared heating plate according to claim 2, characterized in that the additive manufacturing method comprises the steps of putting 1-10 g of manganese dichloride (MnCl 2), 1-10 g of antimony trichloride (SbCl 3), 1-10 g of ferric trichloride (FeCl 3), 1-10 g of nickel dichloride hexahydrate (NiCl2.6H2O), 1-15 g of ammonium chloride NH4Cl, 1-15 g of titanium (TiCl 3) chloride, and 1-10 g of bismuth trichloride (BIC L3) into a container, pouring 10-50m L of isopropanol, stirring for 5-30 minutes, adding 1-10m L of glacial acetic acid, stirring for 1-3 hours, and standing for 5-30 hours.
5. The method for manufacturing a graphene far infrared heating panel according to claim 2, wherein the additive is poured into the main solution container, stirred for 10-60 minutes, added with hydrochloric acid of 5-30m L, stirred for 10-60 minutes, and then left to stand for 5-15 hours for later use.
6. The method for manufacturing a graphene far infrared heating plate according to claim 2, wherein the raw stock solution is added into deionized water of 5-20 parts by weight according to 0.5-3 parts by weight and stirred for 5-20 minutes before use.
7. The method for manufacturing a graphene far infrared heating plate as claimed in claim 1, wherein the substrate is placed in a high temperature furnace and heated to 500-1000 ℃.
8. The method for manufacturing a graphene far infrared heating plate according to claim 1, wherein the solution is loaded into an ultrasonic spraying device, and an ultrasonic spray gun is used to uniformly spray the surface of the substrate for 10-30 seconds.
9. The method for manufacturing a graphene far infrared heating plate according to claim 1, wherein the raw stock solution is added into 0.5-3 parts of deionized water according to 0.5-3 parts of the solution and is uniformly stirred, and then the raw stock solution is printed on glass or a ceramic pot by a screen printing technology and is heated by other heat sources to generate far infrared rays, and the substrate is a ceramic substrate or a glass substrate.
10. A solution used in a manufacturing method of a Graphene far infrared heating plate according to any one of claims 1 to 9 is characterized in that the solution comprises a main solution, an additive and deionized water, wherein the main solution comprises 20 to 100 g of Graphene (Graphene), 1 to 10 g of tin tetrachloride (SnCl 4), 1 to 15 g of indium trichloride (InCl 3), 1 to 10 g of ammonium fluoride (NH 4F) and 100 g of 200m L absolute ethyl alcohol (EtOH), the additive comprises 1 to 10 g of manganese dichloride (MnCl 2), 1 to 10 g of antimony trichloride (SbCl 3), 1 to 10 g of ferric trichloride (FeCl 3), 1 to 10 g of nickel dichloride hexahydrate (NiCl2.6H2O), 1 to 15 g of ammonium chloride NH4Cl, 1 to 15 g of titanium dichloride (TiCl 3), 1 to 10 g of bismuth trichloride (BIC L3) and 10 to 50m L of isopropanol.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112408808A (en) * | 2020-10-23 | 2021-02-26 | 广东烯陶控股有限公司 | Terahertz technology, graphene far infrared heating plate manufacturing method and formula |
| CN112890300A (en) * | 2021-02-05 | 2021-06-04 | 东莞市中科智恒新材料有限公司 | Far infrared quartz tube applied to low-temperature non-combustible electronic cigarette atomizer and preparation method thereof |
| CN113194556A (en) * | 2021-04-20 | 2021-07-30 | 广东温道百镒健康科技有限公司 | Graphene radiation heating film and preparation method thereof |
| EP4087371A1 (en) * | 2021-05-07 | 2022-11-09 | Fujian Jingxi New Material Technology Co.,Ltd. | Semiconductor electrothermal film precursor solution and preparation method of semiconductor electrothermal film structure and electrothermal structure |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0280362A2 (en) * | 1987-02-21 | 1988-08-31 | Philips Patentverwaltung GmbH | Thin film heating element |
| CN1034107A (en) * | 1988-01-06 | 1989-07-19 | 孔德凯 | Large power, electrically heat exchange body and treatment technology thereof |
| US6051202A (en) * | 1997-01-22 | 2000-04-18 | You; Kyu Jae | Method for preparing far-infrared radiating material |
| CN1367494A (en) * | 2001-07-14 | 2002-09-04 | 潍坊润泰智能电气有限公司 | Tin-antimony oxide conducting film and its production method |
| CN101608074A (en) * | 2009-06-18 | 2009-12-23 | 东莞市龙记环保科技有限公司 | A kind of high-temperature resistance energy-saving nanometer electrothermal film water and preparation method thereof |
| CN101668359A (en) * | 2009-08-11 | 2010-03-10 | 罗日良 | Electrothermal film and manufacturing method thereof |
| US20150099214A1 (en) * | 2011-11-07 | 2015-04-09 | Dhkgraphenologies Llc | Physically Functionalized Graphene Hybrid Composite (GHC) and its Applications |
| CN106686772A (en) * | 2016-12-12 | 2017-05-17 | 深圳市中和纳米技术开发有限公司 | Making method of high-temperature transparent electrothermal film |
| CN107124778A (en) * | 2017-05-03 | 2017-09-01 | 广州厨霸电器有限公司 | Far-infrared electrothermal film, the manufacture craft of far-infrared electrothermal film and electric heater |
| CN110381614A (en) * | 2019-06-24 | 2019-10-25 | 东莞市中科智恒新材料有限公司 | Far infrared heating material, the preparation method of far infrared heater and far infrared heater |
-
2020
- 2020-05-05 CN CN202010369376.5A patent/CN111447695B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0280362A2 (en) * | 1987-02-21 | 1988-08-31 | Philips Patentverwaltung GmbH | Thin film heating element |
| CN1034107A (en) * | 1988-01-06 | 1989-07-19 | 孔德凯 | Large power, electrically heat exchange body and treatment technology thereof |
| US6051202A (en) * | 1997-01-22 | 2000-04-18 | You; Kyu Jae | Method for preparing far-infrared radiating material |
| CN1367494A (en) * | 2001-07-14 | 2002-09-04 | 潍坊润泰智能电气有限公司 | Tin-antimony oxide conducting film and its production method |
| CN101608074A (en) * | 2009-06-18 | 2009-12-23 | 东莞市龙记环保科技有限公司 | A kind of high-temperature resistance energy-saving nanometer electrothermal film water and preparation method thereof |
| CN101668359A (en) * | 2009-08-11 | 2010-03-10 | 罗日良 | Electrothermal film and manufacturing method thereof |
| US20150099214A1 (en) * | 2011-11-07 | 2015-04-09 | Dhkgraphenologies Llc | Physically Functionalized Graphene Hybrid Composite (GHC) and its Applications |
| CN106686772A (en) * | 2016-12-12 | 2017-05-17 | 深圳市中和纳米技术开发有限公司 | Making method of high-temperature transparent electrothermal film |
| CN107124778A (en) * | 2017-05-03 | 2017-09-01 | 广州厨霸电器有限公司 | Far-infrared electrothermal film, the manufacture craft of far-infrared electrothermal film and electric heater |
| CN110381614A (en) * | 2019-06-24 | 2019-10-25 | 东莞市中科智恒新材料有限公司 | Far infrared heating material, the preparation method of far infrared heater and far infrared heater |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112408808A (en) * | 2020-10-23 | 2021-02-26 | 广东烯陶控股有限公司 | Terahertz technology, graphene far infrared heating plate manufacturing method and formula |
| CN112890300A (en) * | 2021-02-05 | 2021-06-04 | 东莞市中科智恒新材料有限公司 | Far infrared quartz tube applied to low-temperature non-combustible electronic cigarette atomizer and preparation method thereof |
| CN113194556A (en) * | 2021-04-20 | 2021-07-30 | 广东温道百镒健康科技有限公司 | Graphene radiation heating film and preparation method thereof |
| EP4087371A1 (en) * | 2021-05-07 | 2022-11-09 | Fujian Jingxi New Material Technology Co.,Ltd. | Semiconductor electrothermal film precursor solution and preparation method of semiconductor electrothermal film structure and electrothermal structure |
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|---|---|
| CN111447695B (en) | 2022-12-30 |
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