CN111427238A - Laser direct writing system - Google Patents
Laser direct writing system Download PDFInfo
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- CN111427238A CN111427238A CN201910024774.0A CN201910024774A CN111427238A CN 111427238 A CN111427238 A CN 111427238A CN 201910024774 A CN201910024774 A CN 201910024774A CN 111427238 A CN111427238 A CN 111427238A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention provides a laser direct writing system, which comprises a server and a first terminal, wherein a data processing module is deployed on the server, a user main program, an alignment module, a motion control module, an exposure metering control module and a graph generation module are deployed on the first terminal, the server is in communication connection with the first terminal through a local area network, the user main program is in communication connection with the alignment module, the motion control module, the exposure metering control module, the graph generation module and the data processing module respectively, and a storage hard disk of the data processing module in the server is mapped onto the first terminal through the local area network to serve as a shared storage disk of the server and the first terminal. The laser direct writing system provided by the invention can reduce the complexity of later maintenance of software, reduce the influence of excessively occupying resources by a data processing program and improve the fluency of a main program of a user.
Description
Technical Field
The invention relates to the technical field of laser direct writing photoetching, in particular to a laser direct writing system.
Background
The laser direct writing photoetching technology does not need an intermediate mask exposure link, directly draws required patterns on a substrate, and greatly facilitates scientific research personnel and reduces the generation and manufacturing cost compared with the traditional mask exposure photoetching technology that the mask needs to be manufactured again when the pattern is changed once.
But the complexity of the system is increased while the system is convenient for users, and a typical laser direct writing system comprises subsystems such as optical imaging, motion control, exposure metering control, overlay alignment, data processing and the like. On one hand, the hardware model selection for different client type systems is different, so that different hardware types need to be adapted to upper software, and certain complexity is brought to software writing and later maintenance. On the other hand, because a typical laser direct writing system adopts a DMD as a pattern generator, the system has high data resolution (hundreds of nanometers) and large writing breadth, and therefore, when the writing pattern data is subjected to rasterization conversion, computer CPU resources and memory resources are extremely occupied, system jamming is often caused, and the smoothness of the operation of the upper software of a user is reduced.
In response to the above problems, those skilled in the art have sought solutions.
Disclosure of Invention
In view of this, the invention provides a laser direct writing system, which can reduce complexity of software later maintenance, reduce influence of excessively occupied resources of a data processing program, and improve fluency of a main program of a user, so that data resources can be shared and reused when the user purchases multiple devices, and user cost is reduced.
The invention provides a laser direct writing system which comprises a server and a first terminal, wherein a data processing module is deployed on the server, a user main program, an alignment module, a motion control module, an exposure metering control module and a graph generation module are deployed on the first terminal, the server is in communication connection with the first terminal through a local area network, the user main program is in communication connection with the alignment module, the motion control module, the exposure metering control module, the graph generation module and the data processing module respectively, and a storage hard disk of the data processing module in the server is mapped onto the first terminal through the local area network to serve as a shared storage disk of the server and the first terminal.
Specifically, the software of the laser direct writing system adopts a Net Remoting technical framework, and the user main program realizes the function call with the alignment module, the motion control module, the exposure metering control module, the graph generation module and the data processing module through interface functions.
Specifically, the user main program, the alignment module, the motion control module, the exposure metering control module, the pattern generation module and the data processing module can operate on different terminals through a Net Remoting technology, and the different terminals perform coordination work through network communication.
Specifically, the user main program is configured to receive processing task information input by a user, and transmit the processing task information to the shared storage disk of the first terminal.
Specifically, the data processing module is configured to receive a data processing instruction sent by the user main program, perform data processing on the processing task information according to the data processing instruction to obtain a processing task file and a task parameter, and store the processing task file and the task parameter in the shared storage disk.
Specifically, the user main program is further configured to process according to the task parameter to obtain overlay alignment information, and send the overlay alignment information to the overlay alignment module; the alignment module is used for executing alignment operation according to the alignment information.
Specifically, the user main program is further configured to obtain an exposure metering parameter according to the task parameter processing, and send the exposure metering parameter to the exposure metering control module; and the exposure metering control module is used for executing the setting of the exposure metering according to the exposure metering parameters.
Specifically, the user main program is further configured to obtain a processing start instruction according to the processing task file processing, and send the processing start instruction to the graph generation control module; and the pattern generation control module is used for reading the data of the shared storage disk according to the processing starting instruction and uploading a corresponding pattern to the pattern generation device.
Specifically, the user main program is further configured to process according to the task parameter to obtain motion control information, and send the motion control information to the motion control module;
and the motion control module is used for controlling the laser direct writing platform to execute corresponding motion operation according to the motion control information.
Specifically, the user main program is further configured to obtain a coordination instruction according to the task parameter processing, perform motion control, exposure control, and pattern generation control on the laser direct writing platform according to the coordination instruction, and execute the lithography operation corresponding to the processing task file.
Specifically, the laser direct writing system further comprises at least one second terminal, the second terminal is in communication connection with the server through a local area network, and a storage hard disk of a data processing module in the server is mapped to the first terminal and the second terminal through the local area network respectively to serve as a shared storage disk among the server, the first terminal and the second terminal, so that when a user purchases multiple devices, data resources can be shared and reused, and user cost is reduced.
Specifically, in the laser direct writing system provided in this embodiment, the data processing module is deployed on the server, and the user main program, the overlay alignment module, the motion control module, the exposure metering control module and the graph generation module are deployed on the first terminal, the server is in communication connection with the first terminal through the local area network, the user main program is in communication connection with the overlay alignment module, the motion control module, the exposure metering control module, the graph generation module and the data processing module respectively, and the storage hard disk of the data processing module in the server is mapped onto the first terminal through the local area network to serve as a shared storage disk of the server and the first terminal, so that complexity of software post-maintenance can be reduced, influence of the data processing program on excessively occupying resources is reduced, and smoothness of the user is improved.
The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, the present invention may be implemented in accordance with the content of the description, and in order to make the above and other objects, features, and advantages of the present invention more clearly understood, the following preferred embodiments are described in detail with reference to the accompanying drawings.
Drawings
Fig. 1 is a block diagram of a laser direct writing system according to a first embodiment of the present invention;
FIG. 2 is a schematic diagram of the alignment module of FIG. 1 coupled to a CCD;
FIG. 3 is a schematic diagram of the connection between the motion control module and the laser direct writing platform in FIG. 1;
FIG. 4 is a schematic diagram of the connection of the exposure dose control module of FIG. 1 to a laser;
FIG. 5 is a schematic diagram of the connection of the pattern generation module and the pattern generator of FIG. 1;
FIG. 6 is a schematic diagram of the connection between the data processing module and the GDSII in FIG. 1;
FIG. 7 is a diagram of a software architecture of the laser direct write system of FIG. 1;
FIG. 8 is a diagram of the software architecture between the user main program and the motion control module of FIG. 1;
FIG. 9 is a schematic diagram of the connection between the server and the first terminal in FIG. 1;
fig. 10 is a block diagram of a laser direct writing system according to a second embodiment of the present invention.
Detailed Description
To further explain the technical means and effects of the present invention adopted to achieve the predetermined objects, the present invention will be described in detail below with reference to the accompanying drawings and preferred embodiments.
Fig. 1 is a block diagram of a laser direct writing system 10 according to a first embodiment of the present invention, and fig. 9 is a schematic diagram illustrating a connection between a server 100 and a first terminal 200 in fig. 1. As shown in fig. 1 and 9, the laser direct writing system 10 of the present embodiment includes a server 100 and a first terminal 200. Specifically, the server 100 and the first terminal 200 are communicatively connected via a local area network.
Specifically, in one embodiment, the data processing module 110 is deployed on the server 100, and the user main program 210, the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, and the pattern generation module 250 are deployed on the first terminal 200.
Specifically, in one embodiment, the user main program 210 is communicatively connected to the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, the pattern generation module 250, and the data processing module 110, respectively. Specifically, the user may, but not limited to, map the storage hard disk of the data processing module 110 in the server 100 onto the first terminal 200 through the local area network, so as to serve as a shared storage disk for the server 100 and the first terminal 200, thereby reducing complexity of software post-maintenance, reducing influence of the data processing program on excessively occupying resources, and improving fluency of the user main program 210.
Referring to fig. 2, fig. 2 is a schematic diagram illustrating a connection between the overlay alignment module 220 and the CCD222 in fig. 1. As shown in fig. 1 and 2, the overlay alignment module 220 is connected to a CCD 222. Specifically, the overlay alignment module 220 is used to provide management of the CCD222 for graphic Mark recognition measurement alignment. Specifically, in one embodiment, the overlay alignment module 220 acquires a CCD image and performs an identification measurement on the Mark image.
Referring to fig. 3, fig. 3 is a schematic diagram illustrating a connection between the motion control module 230 and the laser direct writing platform 232 in fig. 1. As shown in fig. 1-3, the motion control module 230 is connected to a laser direct write platform 232. Specifically, the motion control module 230 is used for managing the laser direct writing platform 232, and controlling the motion and focus of the laser direct writing platform 232.
Referring to fig. 4, fig. 4 is a schematic diagram illustrating a connection between the exposure dose control module 240 and the laser 242 in fig. 1. As shown in fig. 1 to 4, the exposure dose control module 240 is connected to a laser 242. Specifically, the exposure dose control module 240 is used to manage the laser 242 and set the exposure dose of the laser 242. Specifically, in one embodiment, the exposure metering control module 240 is used to control the laser switch of the laser 242, the exposure metering setting, the laser energy monitoring record, and the like.
Referring to fig. 5, fig. 5 is a schematic diagram illustrating a connection between the pattern generation module 250 and the pattern generator 252 in fig. 1. As shown in fig. 1-5, the pattern generation module 250 is coupled to a pattern generator 252. In particular, the graphics generation module 250 is used to manage the graphics generator 252 to control the playback of the graphics queue. Specifically, in one embodiment, the graphics generation module 250 is configured to perform task allocation to control the order and timing of graphics playback.
Referring to fig. 6, fig. 6 is a schematic diagram illustrating a connection between the data processing module 110 and the GDSII112 in fig. 1. As shown in fig. 1-6, the data processing module 110 is connected to the GDSII 112. In particular, the data processing module 110 is used to rasterize the pre-processed graphics into the graphics generator 252 format. Specifically, in one embodiment, the data processing module 110 is configured to task distribute the pre-processed graphics and rasterize the pre-processed graphics in a task distribution order to form the graphics format required by the graphics generator 252.
Referring to fig. 7, fig. 7 is a schematic software architecture diagram of the laser direct writing system 10 in fig. 1. As shown in fig. 1 and 7, the software of the laser direct writing system 10 adopts a Net Remoting technical framework. The user main program implements function calls with the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, the pattern generation module 250, and the data processing module 110 through interface functions. In particular, in an embodiment, the interface function may be, but is not limited to being, an API function.
Specifically, in one embodiment, the user main program 210, the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, the pattern generation module 250, and the data processing module 110 may operate on different terminals through the Net Remoting technology, and the different terminals may perform coordination work through network communication. Specifically, in one embodiment, the terminal may be, but is not limited to, a PC, a server, a computer, and the like.
Specifically, in one embodiment, the user main program 210 is used for providing user login, interface operation, logging and coordination function called by each sub-function module. Specifically, the sub-function modules may include, but are not limited to, an overlay alignment module 220, a motion control module 230, an exposure metering control module 240, a pattern generation module 250, and a data processing module 110.
Specifically, in one embodiment, the software of the laser direct writing system 10 employs a Net Remoting programming framework, and common functions of the functional modules, such as the data processing module 110, the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, and the graphics generation module 250, are made to be API function interfaces to connect with the user main program 210. Specifically, in one embodiment, the user main program 210 is connected to a data processing API function interface 211, an overlay alignment API function interface 212, a motion control API function interface 213, an exposure metering control API function interface 214, and a graphics generation API function interface 215, respectively. The data processing API function interface 211 is also coupled to the data handler 114, and the data handler 114 is also coupled to the GDSII112 and the DXF file. The overlay alignment API function interface 212 is also coupled to an overlay alignment program 224, and the overlay alignment program 224 is also coupled to the CCD 222. The motion control API function interface 213 is further connected to a motion control program 234, and the motion control program 234 is further connected to the laser direct writing platform 232. The exposure metering API function interface 214 is also coupled to an exposure metering program 244, and the exposure metering program 244 is also coupled to the laser 242. Graphics generation API function interface 215 is also coupled to graphics generation program 254, and graphics generation program 254 is also coupled to graphics generator 252.
Referring to fig. 8, fig. 8 is a schematic diagram of a software architecture between the user main program 210 and the motion control module 230 in fig. 1. As shown in fig. 1 to 8, in the present embodiment, taking the motion control module 230 as an example for explanation, functions such as Jog motion 216, PTP motion 217, and initiation 218 are designed as common interface functions and are packaged in imotion.dll 219. Specifically, in one embodiment, the imotion.dll219 may be, but is not limited to, connected to one or more of motion1.exe261, motion2.exe262, and motion3.exe263, with motion1.exe261 also connected to platform model 1, motion2.exe262 also connected to platform model 2, and motion3.exe263 also connected to platform model 3.
Specifically, in an embodiment, the laser direct writing platform 232 is changed from the platform model 1 to the platform model 2, and the overall software architecture of the laser direct writing system 10 is not changed, and only the motion control part motion1.exe261 program needs to be changed into motion2.exe262, so as to be responsible for implementing the motion control function.
Specifically, in one embodiment, the user main program 210 is configured to receive processing task information input by a user, and transmit the processing task information to the shared memory disk of the first terminal 200.
Specifically, in an embodiment, the data processing module 110 is configured to receive a data processing instruction sent by the user main program 210, perform data processing on the processing task information according to the data processing instruction to obtain a processing task file and task parameters, and store the processing task file and the task parameters in a shared storage disk.
Specifically, in an embodiment, the user main program 210 is further configured to obtain overlay alignment information according to the task parameter processing, and send the overlay alignment information to the overlay alignment module 220. The overlay alignment module 220 is used for performing an overlay alignment operation according to the overlay alignment information.
Specifically, in an embodiment, the user main program 210 is further configured to obtain an exposure metering parameter according to the task parameter processing, and send the exposure metering parameter to the exposure metering control module 240. And an exposure metering control module 240, configured to perform setting of an exposure metering according to the exposure metering parameter.
Specifically, in an embodiment, the user main program 210 is further configured to obtain a processing start instruction according to the processing of the processing task file, and send the processing start instruction to the graphics generation control module. And the pattern generation control module is used for reading the data of the shared storage disk according to the processing starting instruction and uploading the corresponding pattern to the pattern generator 252.
Specifically, in one embodiment, the user main program 210 is further configured to obtain motion control information according to the task parameter processing, and send the motion control information to the motion control module 230. And the motion control module 230 is configured to control the laser direct writing platform 232 to perform a corresponding motion operation according to the motion control information.
Specifically, in an embodiment, the user main program 210 is further configured to obtain a coordination instruction according to the task parameter processing, so as to perform motion control, exposure control, and pattern generation control on the laser direct writing platform 232 according to the coordination instruction, so as to perform the lithography operation corresponding to the processing task file.
Specifically, in one embodiment. By deploying the user main program 210, the overlay alignment module 220, the motion control module 230, the exposure metering control module 240 and the pattern generation module 250 on the first terminal 200, the data processing module 110 is deployed on the server 100, and the user main program 210, the overlay alignment module 220, the motion control module 230, the exposure metering control module 240, the pattern generation module 250 and the data processing module 110 are set to be automatically started for startup. Specifically, the first terminal 200 is connected to the server 100 through a high-speed local area network, and the storage hard disk of the data processing module 110 in the server 100 is mapped onto the first terminal 200 through the local area network as the shared storage disk Z disk.
Specifically, in one embodiment, the network address of the first terminal 200 is 192.168.0.10. The network address of the server 100 is 192.168.0.20. The network address and port of each module are set in the user main program 210 on the first terminal 200. For example, but not limited to, the overlay alignment module 220 has a network address of 192.168.0.10 port 9000, the motion control module 230 has a network address of 192.168.0.10 port 9001, the exposure dose control module 240 has a network address of 192.168.0.10 port 9002, the pattern generation module 250 has a network address of 192.168.0.10 port 9003, and the data processing module 110 has a network address of 192.168.0.20 port 9004.
Specifically, in one embodiment, the main program 210 is started on the first terminal 200, connects the modules, and sends an initialization instruction to complete the initialization of the device. The user main program 210 receives the user processing task file and the task parameter, and transfers the processing task file to the shared memory disk Z of the first terminal 200.
Specifically, in one embodiment, the first terminal 200 sends a data processing instruction to the data processing module 110 of the server 100, and the data processing module 110 processes data and stores the data in the shared storage disk Z.
Specifically, in one embodiment, the user main program 210 sends overlay alignment information to the overlay alignment module 220 according to the task parameters, and the overlay alignment module 220 completes the overlay alignment of the task.
Specifically, in one embodiment, the user main program 210 further sends the exposure metering parameters to the exposure metering control module 240 according to the task parameters, and the exposure metering control module 240 completes the setting of the exposure metering.
Specifically, in one embodiment, user host program 210 also initiates task start file processing, and pattern generation module 250 reads shared memory disk Z disk data and uploads the pattern to pattern generator 252.
Specifically, in one embodiment, the user main program 210 coordinates the motion control, exposure control, and pattern generation control of the stage to complete the task of lithography.
Referring to fig. 10, fig. 10 is a block diagram of a laser direct writing system 10 according to a second embodiment of the present invention. As shown in fig. 1 to 10, in particular, in the present embodiment, the laser direct writing system 10 further includes at least one second terminal 300. Specifically, in an embodiment, the second terminal 300 is in communication connection with the server 100 through a local area network, and the storage hard disk of the data processing module 110 in the server 100 is mapped onto the first terminal 200 and the second terminal 300 through the local area network, respectively, so as to serve as a shared storage disk among the server 100, the first terminal 200, and the second terminal 300, so that when a user purchases multiple devices, data resources can be shared and reused, and user cost is reduced.
Specifically, in one embodiment, the laser direct writing system 10 includes a plurality of devices, and specifically, two devices are exemplified. The data processing module 110 is deployed on the server 100 through the high-speed local area network, the user main program 210 of the first device is deployed on the first terminal 200, and the user main program 210 of the second device is deployed on the second terminal 300, so that resources of the data processing module 110 are shared between the first device and the second device through the network, complexity of software post-maintenance can be reduced, influence of the data processing program 114 on excessively occupying resources is reduced, fluency of the user main program 210 is improved, resource sharing and multiplexing of the data processing module 110 can be achieved when a user purchases a plurality of devices, and further user cost is reduced.
For the specific process of implementing each function of each functional unit of the second terminal 300, please refer to the specific contents described in the second terminal 200 in the embodiments shown in fig. 1 to fig. 9, which are not described herein again.
Specifically, in the laser direct writing system provided by this embodiment, the data processing module is deployed on the server, the user main program, the overlay alignment module, the motion control module, the exposure metering control module and the graphics generation module are deployed on the first terminal, the server and the first terminal are in communication connection through the local area network, the user main program is in communication connection with the overlay alignment module, the motion control module, the exposure metering control module, the graphics generation module and the data processing module, respectively, and the storage hard disk of the data processing module in the server is mapped onto the first terminal through the local area network to serve as a shared storage disk of the server and the first terminal, so that complexity of software post-maintenance can be reduced, influence of the data processing program on excessively occupying resources can be reduced, smoothness of the user can be improved, and when the user purchases multiple devices, the data resources can be shared and reused, and the user cost is reduced.
In addition, an embodiment of the present invention further provides a computer-readable storage medium, in which computer-executable instructions are stored, where the computer-readable storage medium is, for example, a non-volatile memory such as an optical disc, a hard disc, or a flash memory. The computer-executable instructions are used to make a computer or similar computing device perform various operations in the laser direct writing system.
It should be noted that, in the present specification, the embodiments are all described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments may be referred to each other. For the terminal class embodiment, since it is basically similar to the method embodiment, the description is relatively simple, and for relevant points, reference may be made to part of the description of the method embodiment.
Claims (11)
1. A laser direct writing system is characterized by comprising a server and a first terminal, wherein a data processing module is deployed on the server, a user main program, an alignment module, a motion control module, an exposure metering control module and a graph generation module are deployed on the first terminal, the server is in communication connection with the first terminal through a local area network, the user main program is in communication connection with the alignment module, the motion control module, the exposure metering control module, the graph generation module and the data processing module respectively, and a storage hard disk of the data processing module in the server is mapped onto the first terminal through the local area network to serve as a shared storage disk of the server and the first terminal.
2. The laser direct writing system of claim 1, wherein the software of the laser direct writing system adopts a NetRemoving technology architecture, and the user main program realizes function calls with the overlay alignment module, the motion control module, the exposure metering control module, the pattern generation module and the data processing module through interface functions.
3. The laser direct writing system of claim 1, wherein the user main program, the overlay alignment module, the motion control module, the exposure metering control module, the pattern generation module, and the data processing module all operate on different terminals and are coordinated through network communication.
4. The laser direct writing system of claim 1, wherein the user main program is configured to receive processing task information input by a user and transmit the processing task information to the common storage disk of the first terminal.
5. The laser direct-writing system of claim 4, wherein the data processing module is configured to receive a data processing instruction sent by the user main program, perform data processing on the processing task information according to the data processing instruction to obtain a processing task file and task parameters, and store the processing task file and the task parameters in the shared storage disk.
6. The laser direct writing system of claim 5, wherein the user main program is further configured to process according to the task parameter to obtain overlay alignment information, and send the overlay alignment information to the overlay alignment module;
the alignment module is used for executing alignment operation according to the alignment information.
7. The laser direct writing system of claim 5, wherein the user main program is further configured to obtain an exposure metering parameter according to the task parameter processing, and send the exposure metering parameter to the exposure metering control module;
and the exposure metering control module is used for executing the setting of the exposure metering according to the exposure metering parameters.
8. The laser direct writing system of claim 5, wherein the user main program is further configured to obtain a processing start instruction according to the processing task file processing, and send the processing start instruction to the graphics generation control module;
and the pattern generation control module is used for reading the data of the shared storage disk according to the processing starting instruction and uploading a corresponding pattern to the pattern generation device.
9. The laser direct writing system of claim 5, wherein the user main program is further configured to process motion control information according to the task parameters and send the motion control information to the motion control module;
and the motion control module is used for controlling the laser direct writing platform to execute corresponding motion operation according to the motion control information.
10. The laser direct writing system according to any one of claims 6 to 9, wherein the user main program is further configured to obtain a coordination instruction according to the task parameter processing, so as to perform motion control, exposure control, and pattern generation control on the laser direct writing platform according to the coordination instruction, so as to perform the lithography operation corresponding to the processing task file.
11. The laser direct-writing system according to claim 1, further comprising at least one second terminal, wherein the second terminal is communicatively connected to the server through a local area network, and the storage hard disk of the data processing module in the server is mapped to the first terminal and the second terminal through the local area network, respectively, so as to serve as a shared storage disk among the server, the first terminal, and the second terminal.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910024774.0A CN111427238A (en) | 2019-01-10 | 2019-01-10 | Laser direct writing system |
| PCT/CN2019/116586 WO2020143295A1 (en) | 2019-01-10 | 2019-11-08 | Laser direct writing system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910024774.0A CN111427238A (en) | 2019-01-10 | 2019-01-10 | Laser direct writing system |
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| CN111427238A true CN111427238A (en) | 2020-07-17 |
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| CN201910024774.0A Pending CN111427238A (en) | 2019-01-10 | 2019-01-10 | Laser direct writing system |
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| WO (1) | WO2020143295A1 (en) |
Citations (4)
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