CN111394700A - Evaporation coating manufacturing device and method - Google Patents

Evaporation coating manufacturing device and method Download PDF

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Publication number
CN111394700A
CN111394700A CN202010323641.6A CN202010323641A CN111394700A CN 111394700 A CN111394700 A CN 111394700A CN 202010323641 A CN202010323641 A CN 202010323641A CN 111394700 A CN111394700 A CN 111394700A
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evaporation
baffle
point
film thickness
film
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胡茂横
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Shenzhen Huntek Technology Ltd
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Shenzhen Huntek Technology Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
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Abstract

The invention discloses an evaporation coating manufacturing device and an evaporation coating manufacturing method, wherein the evaporation coating manufacturing device comprises a vacuum cavity, a rotary table, two substrates, two baffles, a rotating shaft and an evaporation central plane; the rotary table is internally arranged in the vacuum cavity, one end of the rotary shaft is connected with the rotary table, and the other end of the rotary shaft penetrates out of the vacuum cavity; the two substrates are respectively arranged at two sides of the turntable, and a baffle is arranged below one of the substrates; the evaporation central plane is arranged in the vacuum cavity corresponding to the turntable.

Description

Evaporation coating manufacturing device and method
Technical Field
The invention relates to the technical field of evaporation coating, in particular to an evaporation coating manufacturing device and an evaporation coating manufacturing method.
Background
In the past, people also adopt a baffle plate to correct the uniformity of the electron beam evaporation coating, but the shape of the baffle plate is estimated and manufactured according to the thickness value of a tested film, the baffle plate is corrected according to the deviation obtained by the test after the baffle plate is installed, and the methods of coating, testing and correcting … … are used, so that the time and the labor are not consumed, and the high uniformity and the high precision are not achieved all the time.
Technical problem to be solved
Aiming at the defects of the prior art, the invention provides an evaporation coating manufacturing device and an evaporation coating manufacturing method, and the evaporation coating manufacturing device and the evaporation coating manufacturing method have the advantages of same coating thickness, uniformity, accurate baffle correction and simple structure.
(II) technical scheme
In order to achieve the purpose, the invention provides the following technical scheme: an evaporation coating manufacturing device comprises a vacuum cavity, a rotary table, two substrates, two baffles, a rotating shaft and an evaporation central plane; the rotary table is internally arranged in the vacuum cavity, one end of the rotary shaft is connected with the rotary table, and the other end of the rotary shaft penetrates out of the vacuum cavity; the two substrates are respectively arranged at two sides of the turntable, and a baffle is arranged below one of the substrates; the evaporation central plane is arranged in the vacuum cavity corresponding to the turntable, an evaporation device and an electron beam emitting device are arranged in the evaporation central plane, and the evaporation device and the electron beam emitting device are respectively arranged corresponding to the baffle.
Preferably, the evaporation device is a crucible, and the crucible is used for placing the coating material; the electron beam emitting device is configured as an electron gun.
The evaporation coating manufacturing method based on the evaporation coating manufacturing device comprises the following specific steps:
s1; establishing in vacuum environment with vacuum degree of 1x 10-5mathematical formula of electron beam evaporation coating above mbr
Figure BDA0002462374780000011
Wherein: t-film formation thickness nm at a point on the substrate above the evaporation point in a certain time
K-constant related to evaporation material, evaporation parameter
α -angle between space connecting line of evaporation point and film forming point and vertical normal of evaporation center
L-length cm of space connecting line between evaporation point and film forming point
n is cosine index, which is different due to evaporation material and evaporation control parameter and is measured by thickness experiment and fitting;
s2; in order to make the film thickness of each point on the substrate the same, make a baffle, in order to block the redundant membrane material, make the substrate have the same film thickness no matter how far away from the centre of rotation of the spindle;
in which the substrate is rotated so that the film thickness is the same over an annulus of equal radius, i.e. over an annulus of equal radius
Film thickness T of any point on R radius annular beltR：
Figure BDA0002462374780000021
Where α is a function of R and β.
In addition, the zone farthest from the rotation center is the thinnest part of the film, and the film thickness of the thinnest zone is set to be TminThen, a baffle needs to be arranged again, so that after the baffle blocks the redundant films, the film thickness of any point is equal to Tmin. Namely, it is
TR＝TminR＝0-Rmax
Preferably, the method for manufacturing an evaporation coating film further includes the step of calculating T in step S3RWhen Rmax is 60, R0 is 30cm, and the turntable height H is 63.5cm, N is R cos β, M is R sin β, and D is R0-N，
Figure BDA0002462374780000022
Preferably, the method for manufacturing the evaporation coating further comprises the step of S4 of manufacturing an excel table, wherein the horizontal unit is the radius R from any point to the rotation center, the longitudinal unit is the normal of the rotation center to the evaporation center at the middle position of the evaporation device, and the vertical unit is the included angle β between the projection point of the point on the evaporation plane and the rotation center;
wherein, the length of N and M is N-R cos β and M-Rsin β;
calculating the length of D and a: r ═ D0-N，
Figure BDA0002462374780000023
Calculate included angle α
∵tg
Figure BDA0002462374780000024
∴
Figure BDA0002462374780000031
Calculate T over the arc segment for each radius R:
Figure BDA0002462374780000032
the film thickness on the same radius is the same as
Figure BDA0002462374780000033
Dividing the angle into 10 degrees and one equal part, dividing R into 2cm and one equal part, calculating the T of each R ring beltR. If the score is sufficiently fine, sufficient accuracy can be achieved.
Figure BDA0002462374780000034
Preferably, the method of manufacturing an evaporation coating film further includes the step of setting the reference T at step S5R，Namely setting TminObserve which TRMinimum, i.e. reference Tminβ need only calculate 180 ° because of symmetry.
Preferably, in the step S5, the reference T is usedminDeleting T in redundant arc segmentRiSet to zero until ∑ TRi≈TminThe removed arc section is the part shielded by the baffle, and the removed arc section is the arc section near β being 0, so as to facilitate the effective baffle and the baffle.
Preferably, a baffle shape is drawn in S2: all the arc sections which are cancelled or/and partially cancelled are theoretical baffle plate outline shielding areas; various R circles are drawn, one to one, according to the size of the disk, and each 10 degree angular ray.
Preferably, in S2, the substrate is mounted on the turntable with high-speed rotation motion, and the baffle is fixedly mounted, and a safe motion gap must be left between the substrate and the baffle, which is a miniature of the actual baffle profile; and correcting the edge of the baffle according to the similar proportional geometric relationship of the baffle and the baffle.
Preferably, the method of fabricating an evaporation coating film further comprises the step of obtaining a uniform coating film by the step of S6
Figure BDA0002462374780000035
Figure BDA0002462374780000036
The measurement and fitting precision of the middle n is generally more than or equal to 3, the film thickness after evaporation for a certain time needs to be measured by a turntable in a static mode, the film thickness under α at different angles is determined, the value of n is deduced, and the smaller the segment sizes of R and β, the higher the precision is, the calculation precision can be generally more than one thousandth;
the precision of the correction baffle is carefully corrected on the basis of calculation, so that higher precision can be obtained;
the baffle installation accuracy keeps the installation clearance the same as the correction clearance, so that the baffle is accurately positioned.
(III) advantageous effects
The invention provides an evaporation coating manufacturing device and an evaporation coating manufacturing method, which have the following beneficial effects:
(1) the invention makes the film thickness of each point on the substrate the same, makes a baffle plate to block the redundant film material, so that the substrate has the same film thickness no matter how far away from the rotation center of the rotating shaft; wherein the substrate is rotated so that the film thickness is the same in zones of equal radius, i.e. the film thickness T at any point in the zone of R radiusR：
Figure BDA0002462374780000041
Where α is a function of R and β, and where the zone furthest from the center of rotation is the thinnest zone, the film thickness at the thinnest zone is set to TminThen, a baffle needs to be arranged again, so that after the baffle blocks the redundant films, the film thickness of any point is equal to Tmin. Namely TR＝Tmin，R＝0-Rmax(ii) a The treatment mode can realize the same technical effect of the thickness of the coating film;
(2) the invention is achieved by
Figure BDA0002462374780000042
The measurement and fitting precision of the middle n is generally more than or equal to 3, the film thickness after evaporation for a certain time needs to be measured by the turntable in a static mode, the film thickness under α with different angles is determined, the value of n is deduced, the smaller the segment size of R and β, the higher the precision is, the calculation precision can be generally more than one thousandth, and the technical effect of high-precision baffle correction can be achieved by correcting the precision of the baffle and the baffle installation precision and keeping the installation clearance the same as the correction clearance, so that the uniformity of the coating film and the height of the baffle correction precision can be realized.
(3) The device for manufacturing the hair coating film comprises a vacuum cavity, a rotary table, a substrate, a baffle, a rotating shaft and an evaporation central plane; therefore, the device has the advantages of simple design structure and low production cost.
Drawings
FIG. 1 is a view showing a structure of an apparatus for manufacturing an evaporation coating film according to the present invention;
FIG. 2 is a schematic view of the baffle of the present invention with an evaporation center and a rotation center;
FIG. 3 is a schematic view showing the geometrical relationship of the method for producing an evaporation coating film according to the present invention;
FIG. 4 is a front view showing the geometrical relationship of the method for producing an evaporation coating film according to the present invention;
FIG. 5 is a top plan view of a geometrical relationship of the method for manufacturing an evaporation coating according to the present invention;
FIG. 6 is a schematic perspective view of the method for manufacturing an evaporation coating according to the present invention;
FIG. 7 is a geometric relationship diagram of theoretical and actual baffles of the present invention;
FIG. 8 is a schematic view showing the thickness distribution of a coating film before the baffle plate is used in the present invention
FIG. 9 is a schematic view of the thickness of a coating film corrected by a baffle according to the present invention;
FIG. 10 is a modified uniformity diagram of the baffle of the present invention;
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments; all other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 and 2, the present invention provides a technical solution: an evaporation coating manufacturing device comprises a vacuum cavity 1, a turntable 2, two substrates 3, a baffle 6, a rotating shaft 4 and an evaporation central plane 8; the rotary table 2 is arranged in the vacuum cavity 1, one end of a rotary shaft 4 is connected with the rotary table 2, and the other end of the rotary shaft 4 penetrates out of the vacuum cavity 1; the two substrates 3 are respectively arranged at two sides of the turntable 2, and a baffle 6 is arranged below one substrate 3; the evaporation central plane is arranged in the vacuum cavity 1 corresponding to the turntable 2, an evaporation device and an electron beam emission device are arranged in the evaporation central plane, and the evaporation device 81 and the electron beam emission device 82 are respectively arranged corresponding to the baffle 6.
The evaporation device 81 is a crucible, and the crucible is used for placing a coating material; the electron beam emitting device 82 is configured as an electron gun.
Example 1
An evaporation coating manufacturing device shown in fig. 1 and fig. 2 comprises a vacuum chamber 1, a turntable 2, two substrates 3, two baffles 6, a rotating shaft 4 and an evaporation central plane 8; the rotary table 2 is arranged in the vacuum cavity 1, one end of a rotary shaft 4 is connected with the rotary table 2, and the other end of the rotary shaft 4 penetrates out of the vacuum cavity 1; the two substrates 3 are respectively arranged at two sides of the turntable 2, and a baffle 6 is arranged below one substrate 3; the evaporation central plane 8 is arranged in the vacuum cavity 1 corresponding to the turntable 2, an evaporation device 81 and an electron beam emitting device are arranged in the evaporation central plane 8, and the evaporation device 81 and the electron beam emitting device are respectively arranged corresponding to the baffle 6.
The evaporation device 81 is a crucible, and the crucible is used for placing a coating material; the electron beam emitting device 82 is configured as an electron gun.
And a vacuum cavity 1 and a rotary disc 2 are in vacuum seal.
The turntable 2 is provided with two clamps 5 corresponding to the substrates 3, and the two clamps 5 respectively clamp two ends of the corresponding substrates 3; the distance between the clamp 5 and the baffle 6 can be conveniently adjusted.
The evaporation coating manufacturing device further comprises a support 7, wherein the support 7 is arranged at the lower end of the baffle 6 and used for supporting or fixedly connecting the baffle 6.
Example 2
As shown in fig. 1 to 9, the evaporation coating manufacturing method of the evaporation coating manufacturing device includes the following steps:
s1; establishing in vacuum environment with vacuum degree of 1x 10-5mathematical formula of electron beam evaporation coating above mbr
Figure BDA0002462374780000061
Wherein: t-thickness of film formed at a point on the substrate 3 above the evaporation point within a certain time period, nm
K-constant related to evaporation material, evaporation parameter
α -angle between the space connecting line of evaporation point and film forming point and the normal line 811 of evaporation center
L-length cm of space connecting line between evaporation point and film forming point
n is cosine index, which is different due to evaporation material and evaporation control parameter and is measured by thickness experiment and fitting;
s2; in order to make the film thickness of each point on the substrate 3 the same, make a baffle 6, in order to block the redundant membrane material, make the substrate 3 have the same film thickness no matter how far away from the centre of rotation of the spindle 4;
in which the substrate 3 is rotated so that the film thickness is the same in zones of equal radius, i.e. the film thickness T at any point in the zone of R radiusR：
Figure BDA0002462374780000062
Where α is a function of R and β.
In addition, the zone farthest from the rotation center is the thinnest part of the film, and the film thickness of the thinnest zone is set to be TminThen, the baffle 6 is needed to be arranged again, so that after the baffle 6 blocks the redundant films, the film thickness of any point is equal to Tmin. Namely, it is
TR＝TminR＝0-Rmax
The method for producing an evaporation coating film further includes a step S3 of calculating TRWhen the Rmax is set to 60,
when R0 is 30cm, height H of turntable 2 is 63.5cm, N is R cos β, M is R sin β, D is R0-N，
Figure BDA0002462374780000071
The method for manufacturing the evaporation coating further comprises the step S4 of manufacturing an excel table, wherein the horizontal unit is the radius R from any point to the rotation center 41, the longitudinal unit is the evaporation center normal 811 between the rotation center 41 and the middle position of the evaporation device 81, and the included angle β between the projection point of the point on the evaporation plane and the rotation center 41;
wherein, the length of N and M is N-R cos β and M-Rsin β;
calculating the length of D and a: r ═ D0-N，
Figure BDA0002462374780000072
Calculate included angle α
∵tg
Figure BDA0002462374780000073
∴
Figure BDA0002462374780000074
Calculate T over the arc segment for each radius R:
Figure BDA0002462374780000075
the film thickness on the same radius is the same as
Figure BDA0002462374780000076
Dividing the angle into 10 degrees and one equal part, dividing R into 2cm and one equal part, calculating the T of each R ring beltR. If the score is sufficiently fine, sufficient accuracy can be achieved.
Figure BDA0002462374780000081
The method for producing an evaporation coating film further includes a step S5 of setting a reference TR，Namely setting TminObserve which TRMinimum, i.e. reference Tminβ need only calculate 180 ° because of symmetry.
In the step S5, the reference T is usedminDeleting T in redundant arc segmentRiSet to zero until ∑ TRi≈TminThe removed arc segment is the shielding part of the baffle 6, and the removed arc segment is the arc segment near 0 of β, so that the baffle 6 is effectively blocked and facilitated.
In said S2, the shape of the baffle 6 is drawn: all or part of the arc segments which are cancelled or/and partially cancelled are the outline shielding areas of the theoretical baffle plate 62; various R circles are drawn, one for one, according to the size of the turntable 2, and each 10 degree angular ray.
In S2, the substrate 3 is mounted on the high-speed rotating turntable 2, and the baffle 6 is fixedly mounted, and a safe moving gap must be left between the two, which is a miniature of the outline of the actual baffle 61; and correcting the edge of the baffle 6 according to the similar proportional geometric relationship of the baffle and the baffle.
Example 3
The method of fabricating the uniformity of the evaporation plating film shown in FIG. 10 includes a step S6 of obtaining a uniform plating film by
Figure BDA0002462374780000082
Measurement ofDetermining the fitting precision, wherein n is more than or equal to 3 generally, the film thickness after evaporation for a certain time needs to be measured by the turntable 2 in a stationary mode, the film thickness under α with different angles is determined, and accordingly the value of n is deduced, and the smaller the R and β segmentation size, the higher the precision is, the calculation precision can be generally more than one thousandth;
the precision of the correction baffle 6 is carefully corrected on the basis of calculation, so that higher precision can be obtained;
the installation accuracy of the baffle 6 keeps the installation clearance the same as the correction clearance, so that the baffle 6 is positioned accurately.
Example 4
The invention provides an evaporation coating manufacturing device and an evaporation coating manufacturing method, which have the following beneficial effects:
(1) the invention makes the film thickness of each point on the substrate 3 the same, makes a baffle 6 to block the redundant film material, so that the substrate 3 has the same film thickness no matter how far away from the rotating center 41 of the rotating shaft 4; in which the substrate 3 is rotated so that the film thickness is the same in zones of equal radius, i.e. the film thickness T at any point in the zone of R radiusR：
Figure BDA0002462374780000091
Where α is a function of R and β, and where the zone furthest from the center of rotation 41 is the thinnest zone, the thickness of the film in the thinnest zone is set to TminThen, the baffle 6 is needed to be arranged again, so that after the baffle 6 blocks the redundant films, the film thickness of any point is equal to Tmin. Namely TR＝Tmin，R＝0-Rmax(ii) a The treatment mode can realize the same technical effect of the thickness of the coating film;
(2) the invention is provided by
Figure BDA0002462374780000092
The measurement and fitting precision of the middle n is generally more than or equal to 3, the film thickness after the evaporation for a certain time needs to be measured by the turntable 2 in a stationary mode, the film thickness under different angles α is determined, the value of n is deduced according to the film thickness, and the smaller the segment sizes of R and β, the higher the precision is, the calculation precision can be generally up to thousandthMore than one, the technical effect of high precision baffle 6 correction can be achieved by correcting the precision of the baffle 6 and the mounting precision of the baffle 6 and keeping the same mounting clearance as the correction clearance, thereby realizing the uniform and high precision of the coating.
(3) The device for manufacturing the hair coating film comprises a vacuum cavity 1, a turntable 2, a substrate 3, a baffle 6, a rotating shaft 4 and an evaporation center 811 plane 8; therefore, the device has the advantages of simple design structure and low production cost.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (10)

1. An evaporation coating manufacturing device comprises a vacuum cavity, a rotary table, two substrates, two baffles, a rotating shaft and an evaporation central plane; is characterized in that: the rotary table is internally arranged in the vacuum cavity, one end of the rotary shaft is connected with the rotary table, and the other end of the rotary shaft penetrates out of the vacuum cavity; the two substrates are respectively arranged at two sides of the turntable, and a baffle is arranged below one of the substrates; the evaporation central plane is arranged in the vacuum cavity corresponding to the turntable, an evaporation device and an electron beam emitting device are arranged in the evaporation central plane, and the evaporation device and the electron beam emitting device are respectively arranged corresponding to the baffle.
2. The evaporation coating manufacturing device and the evaporation coating manufacturing method according to claim 1, wherein: the evaporation device is a crucible which is used for placing coating materials; the electron beam emitting device is configured as an electron gun.
3. A method of producing an evaporation coating film involving the evaporation coating film producing apparatus of claim 1 or 2, characterized in that: the method comprises the following steps:
s1; establishing in vacuum environment with vacuum degree of 1x 10-5mathematical formula of electron beam evaporation coating above mbr
Figure FDA0002462374770000011
Wherein: t-film formation thickness nm at a point on the substrate above the evaporation point in a certain time
K-constant related to evaporation material, evaporation parameter
α -angle between space connecting line of evaporation point and film forming point and vertical normal of evaporation center
L-length cm of space connecting line between evaporation point and film forming point
n is cosine index, which is different due to evaporation material and evaporation control parameter and is measured by thickness experiment and fitting;
s2; in order to make the film thickness of each point on the substrate the same, make a baffle, in order to block the redundant membrane material, make the substrate have the same film thickness no matter how far away from the centre of rotation of the spindle;
wherein the substrate is rotated so that the film thickness is the same in zones of equal radius, i.e. the film thickness T at any point in the zone of R radiusR：
Figure FDA0002462374770000012
Wherein α is a function of R and β
In addition, the zone farthest from the rotation center is the thinnest part of the film, and the film thickness of the thinnest zone is set to be TminThen, a baffle needs to be arranged again, so that after the baffle blocks the redundant films, the film thickness of any point is equal to TminNamely, it is
TR＝TminR＝0-Rmax。
4. The method of producing an evaporation coating film according to claim 3, characterized in that: the method for manufacturing the evaporation coating film further comprises the step of calculating T in step S3RWhen Rmax is 60, R0 is 30cm, and the turntable height H is 63.5cm, N is R cos β, M is Rsin β, and D is R0-N，
Figure FDA0002462374770000021
Figure FDA0002462374770000022
5. The method of claim 3, further comprising a step S4 of preparing an excel table, wherein the horizontal unit is a radius R from any point to a rotation center, and the vertical unit is an angle β between a normal of the rotation center and an evaporation center at a middle position of the evaporation device and a projection point of the point on the evaporation plane and the rotation center;
wherein, the length of N and M is N-R cos β and M-Rsin β;
calculating the length of D and a: r ═ D0-N，
Figure FDA0002462374770000023
Calculate included angle α
∵tg
Figure FDA0002462374770000024
∴
Figure FDA0002462374770000025
Calculate T over the arc segment for each radius R:
Figure FDA0002462374770000026
the film thickness on the same radius is the same as
Figure FDA0002462374770000031
Dividing the angle into 10 degrees and one equal part, dividing R into 2cm and one equal part, calculating the T of each R ring beltR. If the score is sufficiently fineSufficient accuracy can be achieved.
Figure FDA0002462374770000032
6. The method of producing an evaporation coating film according to claim 3, characterized in that: the method for producing an evaporation coating film further includes a step S5 of setting a reference TRI.e. setting TminObserve which TRMinimum, i.e. reference Tminβ need only calculate 180 ° because of symmetry.
7. The method for producing an evaporation coating according to claim 6, wherein in the step S5, the reference T is usedminDeleting T in redundant arc segmentRiSet to zero until ∑ TRi≈TminThe removed arc section is the part shielded by the baffle, and the removed arc section is the arc section near β being 0, so as to facilitate the effective baffle and the baffle.
8. The method of producing an evaporation coating according to claim 3, wherein a shape of a baffle is drawn in the S2: all the arc sections which are cancelled or/and partially cancelled are theoretical baffle plate outline shielding areas; various R circles are drawn, one to one, according to the size of the disk, and each 10 degree angular ray.
9. The method according to claim 8, wherein in step S2, the substrate is mounted on a turntable which rotates at a high speed, and the baffle is fixedly mounted, and a safe moving gap must be left between the two, which is a miniature of the actual baffle profile; and correcting the edge of the baffle according to the similar proportional geometric relationship of the baffle and the baffle.
10. The method of producing an evaporation coating according to claim 3, further comprising a step S6 of obtaining a uniform coating film by
Figure FDA0002462374770000033
The measurement and fitting precision of the middle n is generally more than or equal to 3, the film thickness after evaporation for a certain time needs to be measured by a turntable in a static mode, the film thickness under α at different angles is determined, the value of n is deduced, and the smaller the segment sizes of R and β, the higher the precision is, the calculation precision can be generally more than one thousandth;
the precision of the correction baffle is carefully corrected on the basis of calculation, so that higher precision can be obtained;
the baffle installation accuracy keeps the installation clearance the same as the correction clearance, so that the baffle is accurately positioned.
CN202010323641.6A 2020-04-22 2020-04-22 Evaporation coating manufacturing device and method Pending CN111394700A (en)

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CN112501562A (en) * 2020-11-30 2021-03-16 深圳恒泰克科技有限公司 Multi-source electron beam evaporation coating device and film thickness uniformity correction method
CN112695290A (en) * 2021-03-22 2021-04-23 苏州盟萤电子科技有限公司 High-reliability intelligent evaporation device
CN113445011A (en) * 2021-06-22 2021-09-28 湖南国创同芯科技有限公司 Silver-palladium sputtering device for film plating machine

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CN102732844A (en) * 2012-07-12 2012-10-17 中国科学院光电技术研究所 Design method of coating uniformity correction baffle plate of spherical optical element on planetary rotating fixture of vacuum coating machine
CN202786405U (en) * 2012-08-24 2013-03-13 北京奇峰蓝达光学科技发展有限公司 Optical element coating device
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CN112501562A (en) * 2020-11-30 2021-03-16 深圳恒泰克科技有限公司 Multi-source electron beam evaporation coating device and film thickness uniformity correction method
CN112695290A (en) * 2021-03-22 2021-04-23 苏州盟萤电子科技有限公司 High-reliability intelligent evaporation device
CN112695290B (en) * 2021-03-22 2021-07-16 苏州盟萤电子科技有限公司 High-reliability intelligent evaporation device
CN113445011A (en) * 2021-06-22 2021-09-28 湖南国创同芯科技有限公司 Silver-palladium sputtering device for film plating machine

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Application publication date: 20200710