CN111257997B - Method for manufacturing augmented reality grating waveguides in batch - Google Patents
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- CN111257997B CN111257997B CN202010167098.5A CN202010167098A CN111257997B CN 111257997 B CN111257997 B CN 111257997B CN 202010167098 A CN202010167098 A CN 202010167098A CN 111257997 B CN111257997 B CN 111257997B
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
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Abstract
The invention provides a method for manufacturing augmented reality grating waveguides in batch, which comprises the following steps: preparing an imprinting master plate with a preset pattern; coating imprinting glue on the imprinting master plate, and transferring the grating waveguide pattern onto a soft film substrate by a nano imprinting process to obtain a soft film with the grating waveguide pattern; and directly sticking the soft film with the grating waveguide pattern on the waveguide substrate to obtain the augmented reality grating waveguide. According to the invention, two times of nano-imprinting are reduced to one time of nano-imprinting, so that the production efficiency of the monolithic grating waveguide is improved, and the batch rapid production is facilitated; on the other hand, the soft film substrate or the impression glue pasted on the waveguide substrate is made of flexible materials, so that the soft film or the impression glue with the grating waveguide pattern can be pasted on a flat waveguide substrate and can also be pasted on a curved surface, thereby obtaining grating waveguides with various curvatures and more easily obtaining the grating waveguides conforming to human engineering.
Description
Technical Field
The invention relates to the technical field of display, in particular to a method for manufacturing augmented reality grating waveguides in batch.
Background
Augmented reality is a technology for organically integrating images of a virtual world and scenes of a real world, and has extremely wide application scenes. The augmented reality needs to see both the real external world and the virtual information, so that an imaging system cannot be kept in front of the sight line, and therefore, one or one group of optical combiners are additionally added, and the virtual information and the real scene are integrated, supplemented and mutually enhanced in a 'stacked' mode. The grating waveguide is an augmented reality display scheme, and the technology breaks through the constraint of traditional optics through an optical diffraction effect and can be extremely light and thin.
At present, the grating waveguide can be prepared in batch by adopting a nano-imprinting process, but in the prior art, the prior art for preparing the grating waveguide by nano-imprinting needs to perform two times of structure transfer printing, namely, the structure on the master mask is firstly transferred to the soft film, and then the structure on the soft film is transferred to the waveguide substrate. The processes of glue homogenizing, impressing, curing and demolding are required for the two times of transfer printing, unnecessary time and material waste can be caused, and the production efficiency has a space for further improving. In addition, the prior art uses a plane-to-plane imprinting method, and the grating waveguide manufactured by using the method has a series of problems of low filling rate, uneven filling and the like.
The above drawbacks are expected to be overcome by those skilled in the art.
Disclosure of Invention
Technical problem to be solved
In order to solve the above problems in the prior art, the present invention provides a method for batch-manufacturing an augmented reality grating waveguide, which solves the problems in the prior art that the processing efficiency is low and it is difficult to manufacture a grating waveguide structure on a curved surface due to multiple transfer printing when processing the augmented reality grating waveguide in batch.
(II) technical scheme
In order to achieve the purpose, the invention adopts the main technical scheme that:
the invention provides a method for manufacturing augmented reality grating waveguides in batch, which comprises the following steps:
s1: preparing an imprinting master plate with a preset pattern;
s2: coating imprinting glue on the imprinting master plate, and transferring the grating waveguide pattern onto a soft film substrate by a nano imprinting process to obtain a soft film with the grating waveguide pattern;
s3: and directly sticking the soft film with the grating waveguide pattern on the waveguide substrate to obtain the augmented reality grating waveguide.
In an exemplary embodiment of the present invention, the preset pattern in step S1 is opposite to the ruggedness of the grating waveguide pattern on the augmented reality grating waveguide.
In an exemplary embodiment of the present invention, step S1 includes:
s11: uniformly coating photoresist on the master substrate;
s12: exposing and developing the photoresist on the master plate substrate by adopting an exposure process to form the photoresist with a preset pattern on the master plate substrate;
s13: partially etching the master substrate according to the photoresist with the preset pattern, and forming the preset pattern on the master substrate;
s14: and removing the photoresist to obtain the imprinting master plate with the preset pattern.
In an exemplary embodiment of the present invention, the material of the imprint master in step S1 is one of silicon, quartz, or glass.
In an exemplary embodiment of the present invention, the nano-imprinting in step S2 is one of uv-imprinting or thermal-imprinting or other imprinting methods.
In an exemplary embodiment of the present invention, step S2 includes:
s21: uniformly spin-coating imprint glue on the imprint master mask;
s22: attaching the soft film substrate to an imprinting master mask, and applying pressure to enable imprinting glue to be filled into the grating waveguide pattern of the imprinting master mask;
s23: and transferring the imprinting glue with the grating waveguide pattern onto the soft film substrate by utilizing ultraviolet light or thermal curing and demolding to obtain the soft film with the grating waveguide pattern.
In an exemplary embodiment of the invention, in step S2, the material of the soft film substrate is one of a PET material, a PDMS material, or a fluoroplastic material, and the imprint glue is a flexible material.
In an exemplary embodiment of the present invention, step S3 includes:
s31: irradiating the soft film with the grating waveguide pattern by using ultraviolet rays, and carrying out plasma oxidation on the surface attached to the waveguide substrate;
s32: and pasting the surface of the oxidized soft film plasma with the waveguide substrate to obtain the augmented reality grating waveguide.
In an exemplary embodiment of the present invention, the pellicle with the grating waveguide pattern includes a pellicle substrate and an imprint glue with the grating waveguide pattern, and the step S3 includes:
s31': stripping the solidified imprinting glue with the grating waveguide pattern from the soft film substrate;
s32': and directly sticking the stamping glue with the grating waveguide pattern after being stripped to the waveguide substrate to obtain the augmented reality grating waveguide.
In an exemplary embodiment of the present invention, the waveguide substrate is a planar substrate or a curved substrate.
(III) advantageous effects
The invention has the beneficial effects that: on one hand, the method for manufacturing the augmented reality grating waveguide in batches provided by the embodiment of the invention reduces the two-time nano-imprinting into one-time nano-imprinting, so that the production efficiency of a single grating waveguide is improved, and the method is convenient for batch rapid production; on the other hand, the soft film substrate or the impression glue pasted on the waveguide substrate is made of flexible materials, so that the soft film or the impression glue with the grating waveguide pattern can be pasted on a flat waveguide substrate and can also be pasted on a curved surface, thereby obtaining grating waveguides with various curvatures and more easily obtaining the grating waveguides conforming to human engineering.
Drawings
Fig. 1 is a flowchart illustrating steps of a method for batch manufacturing an augmented reality grating waveguide according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a structure of a grating waveguide in an embodiment of the present invention;
FIG. 3 is a flowchart of step S1 according to an embodiment of the present invention;
FIG. 4 is a schematic diagram illustrating a manufacturing process of step S1 according to an embodiment of the present invention;
FIG. 5 is a flowchart of step S2 according to an embodiment of the present invention;
FIG. 6 is a schematic diagram illustrating a manufacturing process of step S2 according to an embodiment of the present invention;
FIG. 7 is a flowchart illustrating one processing manner of step S3 according to an embodiment of the present invention;
FIG. 8 is a schematic diagram illustrating a manufacturing process of step S3 according to an embodiment of the present invention;
FIG. 9 is a flowchart illustrating another processing manner of step S3 according to the embodiment of the present invention;
fig. 10 is a schematic view of a manufacturing process of another processing manner of step S3 in the embodiment of the present invention.
Description of reference numerals:
21: coupling in a grating;
22: the grating is coupled out.
Detailed Description
For the purpose of better explaining the present invention and to facilitate understanding, the present invention will be described in detail by way of specific embodiments with reference to the accompanying drawings.
All technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The method for preparing the gratings in batch by adopting the nano-imprinting process in the related embodiment of the invention comprises the following steps:
step 1: and preparing an imprinting master plate with a preset pattern.
Step 2: and transferring the grating waveguide pattern of the imprinting master plate to a soft film through a nano imprinting process to obtain a reverse pattern with the grating waveguide pattern on the soft film.
And step 3: and transferring the reverse pattern of the grating waveguide pattern on the soft film to the waveguide substrate again through a nano-imprinting process to finally obtain a grating waveguide product.
The material for imprinting the master mask is usually hard materials such as silicon or quartz, and the grating waveguide structure on the master mask is firstly transferred to the flexible soft film so as to protect the hard master mask and avoid the master mask from structural damage in the demolding process, thereby increasing the use times of the master mask. However, the two times of structure transfer printing are long, the generation efficiency needs to be improved, and the waste of processing materials is caused. On the other hand, because the existing stamping method is surface stamping, if the substrate material is a curved surface, the existing stamping method can cause a series of problems such as reduction of filling rate, uneven filling and the like.
Based on the above, the present invention provides a method for batch manufacturing an augmented reality grating waveguide, and fig. 1 is a flowchart of steps of the method for batch manufacturing the augmented reality grating waveguide provided in an embodiment of the present invention, as shown in fig. 1, specifically including the following steps:
step S1: preparing an imprinting master plate with a preset pattern;
step S2: coating imprinting glue on the imprinting master plate, and transferring the grating waveguide pattern onto a soft film substrate by a nano imprinting process to obtain a soft film with the grating waveguide pattern;
step S3: and directly sticking the soft film with the grating waveguide pattern on the waveguide substrate to obtain the augmented reality grating waveguide.
Based on the preparation method, the method is suitable for the scene of rapidly producing the augmented reality grating waveguide in batches, and the step of transferring the soft film structure onto the waveguide substrate again can be omitted, so that twice nano-imprinting is reduced to one-time nano-imprinting, the production efficiency of the single-chip augmented reality grating waveguide is improved, rapid production in batches is facilitated, and production materials can be saved due to the reduction of the number of times of imprinting. On the other hand, the preparation method can ensure that the imprinting technology does not depend on the shape of the substrate any more, and the flexible film or the imprinting adhesive with the grating waveguide pattern can be pasted on a flat waveguide substrate and also can be pasted on a curved surface, so that various grating waveguides with different curvatures can be obtained, and the grating waveguide conforming to the human engineering can be obtained more easily.
The method for batch fabrication of augmented reality grating waveguides is described in detail below with reference to the steps shown in fig. 1:
in step S1, an imprint master having a predetermined pattern needs to be prepared.
Fig. 2 is a schematic structural diagram of a grating waveguide according to an embodiment of the present invention, the grating waveguide mainly includes an incoupling grating 21 and an outcoupling grating 22, as shown in fig. 2, wherein the incoupling grating 21 has a one-dimensional grating structure, and the outcoupling grating 22 has a two-dimensional grating structure. Correspondingly, the grating waveguide pattern refers to the structural shape of the corresponding grating on the grating waveguide, that is, the grating waveguide pattern in this embodiment includes the structural shapes of the in-grating and the out-grating. It should be noted that the structure of the grating waveguide in this embodiment is only an example, and in other embodiments of the present invention, the structure of the grating waveguide is not limited to the grating structure shown in fig. 2.
Fig. 3 is a flowchart of step S1 in the embodiment of the present invention, fig. 4 is a schematic diagram of a manufacturing process of step S1 in the embodiment of the present invention, and as shown in fig. 3, step S1 specifically includes the following steps:
step S11: and uniformly coating the photoresist on the master substrate, for example, coating the photoresist by adopting a spin coating mode. In order to improve the preparation adaptability of the imprinting master, the master substrate can be made of one of materials such as silicon, quartz or glass.
Step S12: and exposing and developing the photoresist on the master plate substrate by adopting an exposure process to form the photoresist with a preset pattern on the master plate substrate. The exposure process in the step can select modes such as an electron beam exposure method, a laser direct writing method or a holographic exposure method, and in order to improve efficiency and reduce cost, the exposure process can also adopt a mode of combining the processes to complete the preparation of the imprinting master mask. In this step, a photoresist having a predetermined pattern is formed using a predetermined mask.
Step S13: and etching the master substrate according to the photoresist with the preset pattern, and forming the preset pattern on the master substrate.
Step S14: and removing the photoresist to obtain the imprinting master plate with the preset pattern. The preset pattern is opposite to the concave-convex of the grating waveguide pattern on the augmented reality grating waveguide, so that the imprinting master plate with the preset pattern obtained in the step is specifically as follows: the convex part in the grating waveguide is a concave structure which is just opposite to the convex part on the stamping master, and conversely, the concave part in the grating waveguide is a convex structure which is just matched with the concave part on the stamping master.
Based on the above, the material of the imprint master having the preset pattern obtained in step S1 is also one of silicon, quartz, or glass.
In the step S2, the soft film having the grating waveguide pattern is prepared by a one-time nanoimprint process, and the nanoimprint in this embodiment adopts ultraviolet imprint with a fast replication speed, so that the production efficiency is improved due to the fast nanoimprint process, which is beneficial to realizing batch production of the grating waveguide. However, in other embodiments of the present invention, instead of using uv imprinting, nanoimprinting may use thermal imprinting or a hybrid process of uv imprinting and thermal imprinting.
Fig. 5 is a flowchart of step S2 in the embodiment of the present invention, and fig. 6 is a schematic diagram of a manufacturing process of step S2 in the embodiment of the present invention, as shown in fig. 5, step S2 specifically includes the following steps:
step S21: and uniformly spin-coating imprint glue on the imprint master mask. The imprinting glue used for ultraviolet imprinting in the step is characterized by small viscosity, high photocuring speed, excellent demolding performance and excellent dry etching resistance. For example, acrylate ultraviolet printing glue which is composed of organic monomer, silicon-containing monomer, cross-linking agent, free radical initiator and the like can be adopted; epoxy type ultraviolet imprint glue, vinyl ether type ultraviolet imprint glue, and the like can also be adopted. The imprint adhesive of this step is not limited to the ultraviolet adhesive, but may be a thermosetting type imprint adhesive such as a silicone-based material, or a mixture of ultraviolet imprint and thermosetting imprint.
Step S22: and attaching the soft film substrate to the imprinting master mask, and applying pressure to fill the imprinting glue into the grating waveguide pattern of the imprinting master mask. Since the imprint glue after spin coating in step S21 cannot be completely filled into the grating waveguide pattern of the imprint master, pressure must be applied to the outside after the attachment of the soft film substrate, and the imprint glue can extrude the air remaining in the grating waveguide pattern and completely fill the grating waveguide pattern of the imprint master. The soft film substrate in the step can be one of a PET material, a PDMS material or a fluoroplastic material, and the soft film substrate can reduce the damage risk to the master mask in the demolding process.
Step S23: and transferring the imprinting glue with the grating waveguide pattern onto the soft film substrate by ultraviolet light curing and demolding to obtain the soft film with the grating waveguide pattern.
As shown in fig. 6, after pressurization and UV curing, the imprint glue forms a grating waveguide pattern by extrusion, and a soft film with the grating waveguide pattern is obtained by demolding, taking fig. 6 as an example, the soft film with the grating waveguide pattern comprises a soft film substrate and the imprint glue with the grating waveguide pattern from top to bottom.
In an exemplary embodiment of the present invention, step S3 may attach the mold-released imprint paste to the waveguide substrate together with a flexible film substrate (i.e., the flexible film having the grating waveguide pattern), or may attach the inverse pattern imprint paste having the grating waveguide pattern to the waveguide substrate separately after separating the cured imprint paste from the flexible film substrate.
Fig. 7 is a flowchart of one processing method in step S3 in the embodiment of the present invention, fig. 8 is a schematic diagram of a manufacturing process of one processing method in step S3 in the embodiment of the present invention, and as shown in fig. 7, step S3 specifically includes the following steps:
step S31: irradiating the soft film with the grating waveguide pattern by using ultraviolet rays, and carrying out plasma oxidation on the surface of the soft film attached to the waveguide substrate;
step S32: and pasting the surface of the oxidized soft film plasma with the waveguide substrate to obtain the augmented reality grating waveguide.
The pasting in the step S32 is a permanent pasting step, i.e. irradiating the soft film with ultraviolet rays to plasma-oxidize the contact surface of the soft film and the waveguide substrate, and the soft film is permanently bonded with the waveguide substrate with high strength after plasma oxidation.
The waveguide substrate may be a planar substrate or a curved substrate, as shown in fig. 8, fig. 8(a) is a case of planar bonding, and fig. 8(b) is a case of curved bonding. The flexible film is made of flexible material, so that the flexible film can be adhered to a flat waveguide substrate, can also be adhered to a curved substrate, and can be suitable for curved substrates with different curvatures, thereby obtaining various grating waveguides with different curvatures, more easily obtaining the grating waveguides conforming to human engineering, and having wider application range.
In addition, fig. 9 is a flowchart of another processing manner of step S3 in the embodiment of the present invention, fig. 10 is a schematic diagram of a manufacturing process of another processing manner of step S3 in the embodiment of the present invention, and as shown in fig. 9, step S3 specifically includes the following steps:
step S31': stripping the solidified imprinting glue with the grating waveguide pattern from the soft film substrate;
step S32': and directly sticking the stamping glue with the grating waveguide pattern after being stripped to the waveguide substrate to obtain the augmented reality grating waveguide. For example, because the adhesive force between the imprinting adhesive and the substrate is good, the imprinting adhesive with the grating waveguide pattern and the surface of the waveguide substrate to which the imprinting adhesive is adhered can be directly adhered to the waveguide substrate by coating a layer of tackifier, and the process flow can be reduced without ultraviolet irradiation.
According to another processing method shown in fig. 9 and 10, in order to reduce the thickness of the final product and lighten the final product, the cured imprinting adhesive may be peeled off from the flexible film substrate first, and then the peeled imprinting adhesive is attached to the waveguide substrate, instead of attaching the flexible film substrate to the waveguide substrate, as shown in fig. 10. Therefore, the thickness of the final augmented reality grating waveguide product is only the sum of the thickness of the waveguide substrate and the thickness of the impression glue, the thickness of the soft film substrate is omitted, the light and thin product is realized, and the method is suitable for more scenes with requirements on the thickness of the product.
Similarly, the waveguide substrate in the flow shown in fig. 9 may be a planar substrate or a curved substrate, and since the stamping glue peeled off is also a flexible material, the stamping glue can be attached to a flat waveguide substrate or a curved substrate, and can be applied to curved substrates with different curvatures, thereby obtaining grating waveguides with different curvatures, and obtaining grating waveguides conforming to ergonomics more easily, and the application range is wider. Fig. 10 only shows the case where the peeled off imprint paste is pasted to a planar substrate, and similarly to the case where the imprint paste is pasted to a curved substrate, the description thereof is omitted.
It should be noted that the manufacturing method herein is described by taking manufacturing of a grating waveguide as an example, but the manufacturing method is also applicable to, but not limited to, batch manufacturing of gratings, and therefore, the manufacturing method of the present invention may also be used to process gratings of a planar or curved type in a batch manufacturing process to obtain gratings of various curvatures, and the manufactured gratings have a wider application scenario.
In summary, the method for manufacturing the augmented reality grating waveguides in batch provided by the embodiment of the invention has the following effects:
on one hand, in the method, after the imprinting of the soft film pattern is finished, the soft film or the imprinting glue stripped from the soft film substrate is directly attached to the waveguide substrate to obtain the augmented reality grating waveguide product, and the grating waveguide pattern on the soft film is not required to be transferred to the waveguide substrate again through a nano-imprinting process in the traditional process. In the aspect of processing technology, the step of transferring the soft film structure to the waveguide substrate is omitted, so that two times of nano-imprinting are reduced to one time of nano-imprinting, and the production efficiency of the single-chip grating waveguide is improved; in the aspect of processing raw materials, one-time nano-imprinting is omitted, production materials can be saved, and the processing cost is favorably reduced.
On the other hand, because the soft film substrate or the impression glue pasted on the waveguide substrate is made of flexible material, the soft film or the impression glue with the grating waveguide pattern can be pasted on the flat waveguide substrate and can also be pasted on the curved surface, thereby obtaining the grating waveguides with various curvatures and more easily obtaining the grating waveguides conforming to the human engineering.
In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium; either as communication within the two elements or as an interactive relationship of the two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, a first feature may be "on" or "under" a second feature, and the first and second features may be in direct contact, or the first and second features may be in indirect contact via an intermediate. Also, a first feature "on," "above," and "over" a second feature may be directly or obliquely above the second feature, or simply mean that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the second feature, or may simply mean that the first feature is at a lower level than the second feature.
In the description herein, the description of the terms "one embodiment," "some embodiments," "an embodiment," "an example," "a specific example" or "some examples" or the like, means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it should be understood that the above embodiments are illustrative and not restrictive, and that those skilled in the art may make changes, modifications, substitutions and alterations to the above embodiments without departing from the scope of the present invention.
Claims (10)
1. A method of batch fabrication of augmented reality grating waveguides, comprising:
s1: preparing an imprinting master plate with a preset pattern;
s2: coating imprinting glue on the imprinting master plate, and transferring the grating waveguide pattern onto a soft film substrate through a nano imprinting process to obtain a soft film with the grating waveguide pattern, wherein the soft film with the grating waveguide pattern comprises a soft film substrate and the imprinting glue with the grating waveguide pattern;
s3: and directly sticking the soft film with the grating waveguide pattern on the waveguide substrate to obtain the augmented reality grating waveguide.
2. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the preset pattern in step S1 is opposite to the concave-convex of the grating waveguide pattern on the augmented reality grating waveguide.
3. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the step S1 includes:
s11: uniformly coating photoresist on the master substrate;
s12: exposing and developing the photoresist on the master plate substrate by adopting an exposure process to form the photoresist with a preset pattern on the master plate substrate;
s13: partially etching the master substrate according to the photoresist with the preset pattern, and forming the preset pattern on the master substrate;
s14: and removing the photoresist to obtain the imprinting master plate with the preset pattern.
4. The method for batch fabrication of augmented reality grating waveguides of claim 1, wherein the material of the imprint master in step S1 is one of silicon, quartz or glass.
5. The method for batch fabrication of augmented reality grating waveguides of claim 1, wherein the nanoimprinting in step S2 is uv imprint or thermal imprint or a hybrid process of both.
6. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the step S2 includes:
s21: uniformly spin-coating imprint glue on the imprint master mask;
s22: attaching the soft film substrate to an imprinting master mask, and applying pressure to enable imprinting glue to be filled into the grating waveguide pattern of the imprinting master mask;
s23: and transferring the imprinting glue with the grating waveguide pattern onto the soft film substrate by ultraviolet light curing and demolding to obtain the soft film with the grating waveguide pattern.
7. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the material of the soft film substrate in step S2 is one of a PET material, a PDMS material, or a fluoroplastic material, and the imprint gel is a flexible material.
8. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the step S3 includes:
s31: irradiating the soft film with the grating waveguide pattern by using ultraviolet rays, and carrying out plasma oxidation on the surface attached to the waveguide substrate;
s32: and pasting the surface of the oxidized soft film plasma with the waveguide substrate to obtain the augmented reality grating waveguide.
9. The method for batch manufacturing of augmented reality grating waveguides according to claim 1, wherein the step S3 includes:
s33: stripping the solidified imprinting glue with the grating waveguide pattern from the soft film substrate;
s34: and directly sticking the stamping glue with the grating waveguide pattern after being stripped to the waveguide substrate to obtain the augmented reality grating waveguide.
10. The method for batch fabrication of augmented reality grating waveguides of any one of claims 1-9, wherein the waveguide substrate is a planar substrate or a curved substrate.
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