CN111169056B - Method for manufacturing anti-dazzle diffusion film - Google Patents
Method for manufacturing anti-dazzle diffusion film Download PDFInfo
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- CN111169056B CN111169056B CN201811342057.4A CN201811342057A CN111169056B CN 111169056 B CN111169056 B CN 111169056B CN 201811342057 A CN201811342057 A CN 201811342057A CN 111169056 B CN111169056 B CN 111169056B
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- nano
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D7/00—Producing flat articles, e.g. films or sheets
- B29D7/01—Films or sheets
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0215—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having a regular structure
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention discloses a method for manufacturing an anti-dazzle light diffusion film, which comprises the following specific steps: s1: providing an anti-dazzle mold with a micro-nano grid groove and a spherical micro-nano protruding structure, wherein the spherical micro-nano protruding structure is formed by baking and curing; s2: providing a support layer; s3: coating a UV adhesive layer on the supporting layer; s4: and carrying out UV imprinting on the UV adhesive layer by using the anti-dazzle mold, wherein the UV adhesive layer after UV imprinting forms a micro-nano anti-dazzle structural layer. The spherical micro-nano-level protruding structure with the anti-dazzle function is manufactured in a baking and curing mode, and the spherical micro-nano-level protruding structure is simple to operate and high in controllability.
Description
Technical Field
The invention relates to the technical field of anti-glare, in particular to a manufacturing method of an anti-glare diffusion film.
Background
In 1995, CIE (international commission on illumination) proposed the concept of anti-Glare of a luminaire, and unified Glare value ugr (unified Glare rating) was used as an index for evaluating discomfort Glare of an indoor lighting environment. In 2014, the european union made UGR limit as a mandatory standard for lighting fixtures, rather than just as reference as before, generally requiring UGR < 19. Adding an anti-glare diffusion film to a luminaire is the most effective, easiest to use, and least costly solution.
At present, an anti-dazzle diffusion film is manufactured by mainly adopting an anti-dazzle mould for auxiliary manufacturing. At present, the anti-dazzle mold is manufactured at home and abroad by depending on a precision machining technology, and the technology has great difficulty in manufacturing the anti-dazzle mold with micro-nano scale, longer manufacturing period and lower manufacturing precision, thereby influencing the quality and the cost of the anti-dazzle diffusion film. Therefore, it is very important to manufacture a micro-nano scale anti-glare mold with high precision and short period.
Disclosure of Invention
The invention mainly aims to provide a method for manufacturing an anti-dazzle diffusion film, which manufactures a micro-nano scale anti-dazzle diffusion film with high precision and good effect by manufacturing a micro-nano scale grid groove and an anti-dazzle mold with a spherical micro-nano scale protruding structure in a baking and curing mode.
In order to achieve the above object, the present invention provides a method for manufacturing an antiglare diffusion film, comprising the steps of:
s1: providing an anti-dazzle mold with a micro-nano grid groove and a spherical micro-nano protruding structure, wherein the spherical micro-nano protruding structure is formed by baking and curing;
s2: providing a support layer;
s3: coating a UV adhesive layer on the supporting layer;
s4: and carrying out UV imprinting on the UV adhesive layer by using the anti-dazzle mold, wherein the UV adhesive layer after UV imprinting forms a micro-nano anti-dazzle structural layer.
In one embodiment, in step S1, an anti-glare mold having the micro-nano grid grooves and the spherical micro-nano protruding structures is manufactured by using a photolithography technique.
In one embodiment, the specific method for manufacturing the anti-glare mold comprises the following steps:
s101: providing a glass substrate;
s102: coating a photoresist layer on the glass substrate;
s103: manufacturing the photoresist layer into a plurality of spherical micro-nano raised structures separated by the micro-nano grid grooves;
s104: and transferring the spherical micro-nano protruding structure to a mold through UV transfer printing or metal growth to obtain the anti-glare mold with the micro-nano grid grooves.
In one embodiment, in step S103, the making the photoresist layer into a plurality of spherical micro-nano protruding structures separated by grids includes: exposing and developing the photoresist layer to form a plurality of micro-nano raised structures isolated by the micro-nano grid grooves; and baking and curing the micro-nano protruding structures to form a plurality of spherical micro-nano protruding structures.
In one embodiment, the exposure and development method is: and exposing the photoresist layer according to a required pattern, and etching the developed photoresist in the photoresist layer to form the micro-nano raised structure isolated by the micro-nano grid groove.
In one embodiment, the baking and curing method is as follows: and placing the micro-nano convex structure and the glass substrate in an oven with the temperature of 130-160 ℃ for baking for 20-50 minutes to form the spherical micro-nano convex structure.
In one embodiment, the anti-glare structure layer comprises a plurality of micro-nano anti-glare units divided by a plurality of concave units, each anti-glare unit is of a spherical structure, and the concave units are in regular patterns which are periodically arranged.
In one embodiment, the anti-glare cell has a height of 12-27 μm, the recessed cell has a depth of 12-27 μm, and a width of 3-10 μm.
In one embodiment, the thickness of the anti-glare structure layer is 15-30 μm.
The embodiment of the invention provides a method for manufacturing an anti-dazzle diffusion film, which is used for manufacturing a spherical micro-nano level protrusion structure with an anti-dazzle function in a baking and curing mode, and is simple to operate and high in controllability.
Drawings
FIG. 1 is a flow chart of the production of an antiglare diffusion film according to an embodiment of the present invention;
FIG. 2 is a flow chart illustrating a process for manufacturing an anti-glare mold according to an embodiment of the present invention;
FIG. 3 is a schematic structural view of an antiglare diffusion film of an embodiment of the invention;
fig. 4 is a schematic structural diagram of fig. 3 from another view angle.
Detailed Description
To further illustrate the technical solutions and effects of the present invention adopted to achieve the predetermined objects, the following detailed description of the embodiments, structures, features and effects of the present invention will be made with reference to the accompanying drawings and examples.
Referring to fig. 1 and fig. 2, an embodiment of the present invention discloses a method for manufacturing an anti-glare diffusion film, which includes the following specific steps.
S1: the method comprises the steps of providing an anti-dazzle mold with a micro-nano grid groove and a spherical micro-nano protruding structure, wherein the spherical micro-nano protruding structure is formed through baking and curing.
Specifically, the anti-glare mold with the micro-nano grid grooves is manufactured by adopting a photoetching technology, and the manufacturing method specifically comprises the following steps.
S101: a glass substrate is provided.
S102: a photoresist layer is coated on the glass substrate.
Specifically, a layer of photoresist with the thickness of 10-25 μm is coated on the glass substrate by a coating mode.
S103: and manufacturing the photoresist layer into a spherical micro-nano raised structure isolated by the micro-nano grid grooves.
Carrying out exposure and development: and exposing the photoresist layer according to a required pattern, etching off part of the developed photoresist, and forming a micro-nano raised structure (photoresist which is not etched) isolated by the micro-nano grid grooves on the photoresist layer. Specifically, the micro-nano protruding structure isolated by the micro-nano grid groove comprises a plurality of grid units with the same graph in the middle. The grid units are arranged periodically or non-periodically. The grid cells are in a regular or irregular pattern, such as one of regular hexagons and squares. In this embodiment, the grid cells are squares periodically arranged, the width of each square is 3-10 μm, and the depth of each square is equal to the thickness of the photoresist layer.
And then curing: and placing the glass substrate and the micro-nano raised structures isolated by the micro-nano grid grooves on the glass substrate together in an oven at the temperature of 130-160 ℃ for baking for 20-50 minutes to form the spherical micro-nano raised structures on the glass substrate. Specifically, under a high temperature state, the surface of the micro-nano convex structure is changed into a liquid state, the surface tension can gradually change the surface of the photoresist into a spherical shape, and an unstable state with the minimum surface energy is achieved. When the solvent in the photoresist is completely volatilized, the spherical surface is changed into a stable state. During baking, the micro-nano convex structure is effectively prevented from bridging through grid isolation.
S104: and transferring the spherical micro-nano protruding structure to a mold through UV transfer printing or metal growth to obtain the anti-dazzle mold with the micro-nano grid grooves.
In this embodiment, the spherical micro-nano protruding structure is transferred to the surface of the mold by means of UV transfer printing, so as to obtain the anti-glare mold with micro-nano grid grooves. In other embodiments, the anti-glare mold with the micro-nano grid grooves can be obtained by growing metal through electroforming, and the anti-glare mold with the micro-nano grid grooves can also be obtained in other manners.
S2: a support layer is provided.
Specifically, the support layer is made of a transparent flexible polymer material, such as PET (polyethylene terephthalate) or PC (polycarbonate). In other embodiments, the support layer 1 may be another high molecular organic compound with good transparency.
S3: and coating a UV adhesive layer on the supporting layer.
Specifically, a UV glue layer with the thickness of 15-30 μm is coated on the support layer.
S4: and carrying out UV imprinting on the UV adhesive layer by using the anti-glare mold, and forming a micro-nano anti-glare structural layer on the UV adhesive layer after the UV imprinting. The support layer and the anti-glare structure layer form an anti-glare diffusion film.
Specifically, referring to fig. 3 and 4, the anti-glare structure layer 2 is disposed on the support layer 1.
In the embodiment, the anti-glare structure layer 2 is micro-nano grade, and the thickness is 15-30 μm.
The anti-glare structure layer 2 includes a plurality of micro-nano-scale anti-glare cells 21 divided by a plurality of recess cells 23. The anti-glare unit 21 has a spherical structure and a height of 12-27 μm.
The plurality of recess units 23 are arranged periodically or aperiodically. The plurality of concave units 23 are in one of regular or irregular patterns, such as one of regular hexagon and square. In the present embodiment, the recess units 23 are square and are periodically arranged. The depth of the concave unit 23 is 12-27 μm, and the width is 3-10 μm.
The present invention has many advantages.
1. The spherical micro-nano-level protruding structure with the anti-dazzle function is manufactured in a baking and curing mode, and the spherical micro-nano-level protruding structure is simple to operate and high in controllability.
2. The micro-nano anti-glare mold is manufactured by the photoetching technology, the period is short, the operation is simple, and the effect is good.
3. The anti-dazzle mould manufactured by the method of UV transfer printing or metal growth has high precision.
4. The anti-dazzle diffusion film is manufactured by the UV impressing technology, so that the precision is high, the effect is good, the yield is high, and the manufacturing cost of the anti-dazzle diffusion film is low.
The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (7)
1. A method for manufacturing an anti-dazzle diffusion film is characterized by comprising the following specific steps:
s1: providing an anti-dazzle mold with a micro-nano grid groove and a spherical micro-nano protruding structure, wherein the spherical micro-nano protruding structure is formed by baking and curing; the micro-nano raised structure is formed by isolating the micro-nano grid grooves;
s2: providing a supporting layer;
s3: coating a UV adhesive layer on the supporting layer;
s4: carrying out UV imprinting on the UV adhesive layer by using the anti-glare mold, and forming a micro-nano anti-glare structural layer on the UV adhesive layer subjected to UV imprinting;
the specific method for manufacturing the anti-glare mold comprises the following steps:
s101: providing a glass substrate;
s102: coating a photoresist layer on the glass substrate;
s103: manufacturing the photoresist layer into a plurality of spherical micro-nano raised structures separated by the micro-nano grid grooves;
s104: and transferring the spherical micro-nano protruding structure to a mold through UV transfer printing or metal growth to obtain the anti-dazzle mold with the micro-nano grid grooves.
2. The method for manufacturing an antiglare diffusion film according to claim 1, wherein in step S103, the step of forming the photoresist layer into a plurality of spherical micro-nano-scale raised structures separated by grids comprises: exposing and developing the photoresist layer to form a plurality of micro-nano raised structures isolated by the micro-nano grid grooves; and baking and curing the micro-nano protruding structures to form a plurality of spherical micro-nano protruding structures.
3. The method for producing an antiglare diffusion film according to claim 2, wherein the exposure and development method is: and exposing the photoresist layer according to a required pattern, and etching the developed photoresist in the photoresist layer to form the micro-nano raised structure isolated by the micro-nano grid groove.
4. The method for producing an antiglare diffusion film according to claim 1, wherein the baking curing mode is: and placing the micro-nano convex structure and the glass substrate together in an oven with the temperature of 130-160 ℃ for baking for 20-50 minutes to form the spherical micro-nano convex structure.
5. The method of manufacturing an anti-glare diffusion film according to claim 1, wherein the anti-glare structure layer comprises micro-nano-scale anti-glare units divided by a plurality of concave units, the anti-glare units are spherical structures, and the concave units are in regular patterns arranged periodically.
6. The method for producing an antiglare diffusion film according to claim 5, wherein the antiglare element has a height of 12 to 27 μm, the depressed element has a depth of 12 to 27 μm, and a width of 3 to 10 μm.
7. The method for producing an antiglare diffusion film according to claim 1 or 5, wherein the antiglare structure layer has a thickness of 15 to 30 μm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811342057.4A CN111169056B (en) | 2018-11-12 | 2018-11-12 | Method for manufacturing anti-dazzle diffusion film |
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| CN201811342057.4A CN111169056B (en) | 2018-11-12 | 2018-11-12 | Method for manufacturing anti-dazzle diffusion film |
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| CN111169056A CN111169056A (en) | 2020-05-19 |
| CN111169056B true CN111169056B (en) | 2022-08-05 |
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| CN111730792B (en) * | 2020-08-05 | 2020-12-18 | 上海鲲游光电科技有限公司 | Integrally-formed resin light homogenizing element and manufacturing method thereof |
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Address after: No.68 Xinchang Road, Suzhou Industrial Park, Suzhou, Jiangsu Province Patentee after: Suzhou Weiyeda Technology Co.,Ltd. Address before: No.68 Xinchang Road, Suzhou Industrial Park, Suzhou, Jiangsu Province Patentee before: IVTOUCH Co.,Ltd. |