CN111155061A - Preparation method of WTi alloy target - Google Patents
Preparation method of WTi alloy target Download PDFInfo
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- CN111155061A CN111155061A CN201811321786.1A CN201811321786A CN111155061A CN 111155061 A CN111155061 A CN 111155061A CN 201811321786 A CN201811321786 A CN 201811321786A CN 111155061 A CN111155061 A CN 111155061A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F2003/145—Both compacting and sintering simultaneously by warm compacting, below debindering temperature
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- Manufacturing & Machinery (AREA)
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Abstract
A preparation method of a WTi alloy target comprises the steps of mixing tungsten powder and iron-containing titanium powder to generate mixed powder; and (3) filling the mixed powder into a mold, and performing a hot-pressing sintering process on the mixed powder after mold filling. By carrying out a powder mixing process on the tungsten powder and the iron-containing titanium powder, the titanium powder containing iron elements is selected in the aspect of providing raw materials, so that direct addition of iron powder in the powder mixing process is avoided, and oxidation of broken iron powder in the powder mixing process can be avoided, so that oxygen elements in the mixed powder are avoided; in the process of mixing the powder, the content of the iron element in the mixed powder can be controlled by only controlling the proportion of the tungsten powder to the titanium powder. And (3) filling the mixed powder into a mold, performing a hot-pressing sintering process on the mixed powder after mold filling, and controlling the whole sintering process through a strict mold filling process to ensure that impurities do not enter the mixed powder, thereby ensuring the quality of the finally formed WTi alloy target.
Description
Technical Field
The invention relates to the technical field of target preparation, in particular to a preparation method of a WTi (tungsten titanium) alloy target.
Background
The WTi (tungsten titanium) alloy has low resistivity, good thermal stability and oxidation resistance; the diffusion barrier layer is widely applied to Al, Cu and Ag wiring; generally speaking, the higher the purity of the WTi target material is, the better the purity is, that is, the lower the content of impurity elements in the WTi alloy target material, such as Na, K, Fe, O, etc., the better the purity is, so that the quality of the sputtered WTi film is more stable. However, in the Gold Bump industry, due to special process requirements, not only is the purity of the WTi target required to be ensured to be as high as possible, but also the content of Fe in the WTi target is required to be ensured not to be too low, if the content of Fe in the WTi target is too low, the etching rate of the WTi sputtered film is affected, and further, due to the non-uniformity of the distribution of Fe, Fe causes the diffusion barrier property of the film to be unstable, so the content of Fe is not too high. The Gold Bump industry generally stipulates that the Fe element content in the WTi target is 30-50 mass ppm.
In the prior art, the content of Fe element in the WTi alloy is controlled and the uniform distribution of the Fe element is ensured by controlling the size and the content of Fe molecular particles in the doping process through a mode of directly doping Fe molecules, but fine Fe powder is easy to oxidize; therefore, the technical scheme can greatly increase the oxygen content in the WTi alloy, and the oxygen content in the WTi alloy is increased, so that metal particles and abnormal discharge are generated in the use process of the WTi alloy target material, the yield of a chip is influenced, and the normal use of the WTi alloy target material is finally influenced.
Therefore, a new method is needed to strictly control the content of the Fe element in the WTi alloy target and ensure that the content of the oxygen element is not increased during the manufacturing process.
Disclosure of Invention
The invention solves the problem that the Fe element content and the oxygen element content are not easy to control in the WTi alloy target manufacturing process.
In order to solve the above problems, the present invention provides a method for preparing a WTi (tungsten titanium) alloy target, comprising: tungsten powder and iron-titanium-containing powder, and performing a powder mixing process on the tungsten powder and the iron-titanium-containing powder to generate mixed powder; and (3) filling the mixed powder into a mold, and performing a hot-pressing sintering process on the mixed powder after mold filling.
Optionally, the specification of the tungsten powder is 5N tungsten powder containing iron of less than 1 mass ppm; the specification of the iron-containing titanium powder is 3N5 titanium powder containing iron 350-450 mass ppm.
Optionally, powder mixing equipment is provided, and the tungsten powder and the iron-containing titanium powder are placed into the powder mixing equipment to be mixed.
Optionally, the powder mixing device is made of a titanium material.
Optionally, before the tungsten powder and the iron-containing titanium powder are put into the powder mixing device for powder mixing, the method further includes the following steps: and filling inert gas into the powder mixing equipment, wherein the pressure of the inert gas is 0.02-0.06 MPa.
Optionally, the inert gas is argon.
Optionally, the rotating speed of the powder mixing equipment is 6r/min-15r/min, and the powder mixing time is controlled within 2h-5 h.
Optionally, providing a titanium ball, and stirring the titanium ball, the tungsten powder and the iron-containing titanium powder together.
Optionally, providing graphite paper, and before filling the mixed powder into a mold, further comprising the steps of: and (3) filling the graphite paper into a mold to prevent the mixed powder from directly contacting with the grinding tool.
Optionally, in the hot-pressing sintering process, the temperature in the hot-pressing sintering furnace is 1250-1350 ℃, and the pressure is 25-35 Mpa.
Compared with the prior art, the technical scheme of the invention has the following advantages:
providing tungsten powder and iron-titanium-containing powder, performing a powder mixing process on the tungsten powder and the iron-titanium-containing powder to generate mixed powder, and selecting the titanium powder containing iron element in the aspect of providing raw materials, so that the direct addition of iron powder in the powder mixing process is avoided, and the oxidation of broken iron powder in the powder mixing process is avoided, so that the oxygen element in the mixed powder is avoided; in the process of mixing the powder, the content of the iron element in the mixed powder can be controlled by only controlling the proportion of the tungsten powder to the titanium powder. And (3) filling the mixed powder into a mold, performing a hot-pressing sintering process on the mixed powder after mold filling, and controlling the whole sintering process through a strict mold filling process to ensure that impurities do not enter the mixed powder, thereby ensuring the purity of the finally formed WTi alloy target.
Drawings
Fig. 1 is a process flow diagram of a method for preparing a WTi alloy target according to an embodiment of the invention.
Detailed Description
As known from the background art, in the Gold Bump (au Bump) industry, it is necessary to ensure that the purity of the WTi target is as high as possible, and there is a strict requirement for the range of the Fe element content in the WTi target.
Analysis shows that in the prior art, the iron powder with small diameter is added into the tungsten powder and the titanium powder, and then the iron powder, the tungsten powder and the titanium powder are subjected to ball milling and grinding together to enable the diameter of the iron powder to be smaller, so that mixed powder with a fixed content of iron element is obtained, and the iron powder is ground as far as possible to enable the iron powder to be uniformly distributed in the mixed powder; however, the fine iron powder is very easy to be oxidized, so that the content of oxygen in the finally obtained tungsten-titanium alloy is greatly increased by the method, and metal particles and abnormal discharge are easily generated in the use process of the WTi alloy target material, so that the yield of the chip is influenced and the use is influenced.
In order to solve the problems, the invention provides a new method, which provides tungsten powder and iron-containing titanium powder, wherein the proportion of tungsten and titanium in the prepared tungsten-titanium alloy target material is fixed, so that the titanium powder containing iron element is selected in the aspect of providing raw materials, so that the direct addition of iron powder in the powder mixing process is avoided, and the oxidation of broken iron powder in the powder mixing process is avoided, so that the oxygen element in the mixed powder is avoided; in the process of mixing the powder, the content of the iron element in the mixed powder can be controlled by only controlling the proportion of the tungsten powder to the titanium powder. Further, in the process of die filling of the mixed powder, the die filling process is strictly controlled, the whole sintering process is controlled, and impurities are prevented from entering the mixed powder, so that the purity of the finally formed WTi alloy target is guaranteed.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
Referring to fig. 1, a process flow diagram of the method for preparing the WTi alloy target of the present embodiment is shown.
Step S1 is executed to provide qualified tungsten powder and iron-titanium-containing powder.
In the present example, the specification of the tungsten powder is 5N tungsten powder containing iron of 1 mass ppm or less; the 5N powder is tungsten powder with the purity higher than 99.999%. The specification of the iron-containing titanium powder is 3N5 titanium powder containing iron 350-450 mass ppm, and the 3N5 titanium powder is titanium powder with the purity higher than 99.95%. And the ratio of the tungsten powder to the 3N5 titanium powder is 90: 10. Therefore, when the tungsten-titanium alloy with a certain size needs to be manufactured, only enough tungsten powder and titanium powder need to be provided, and the proportion is well controlled. It should be noted that the titanium powder at this time is the iron-containing titanium powder, where mass ppm is mass million, and for any mixed substance: for example, when titanium powder containing iron in an amount of 350 ppm by mass, that is, 1000000 units of titanium powder contains iron in an amount of 350 units, the ratio of the tungsten powder to the titanium powder is 90:10, and the iron content is finally 35 ppm by mass.
In this embodiment, in the powder selecting process, the particle diameter of the tungsten powder is required to be 3um to 5um, and the particle diameter of the iron-containing titanium powder is 35um to 50 um. The particle diameter of the tungsten powder in this range is beneficial to the later mixing process and is beneficial to the sintering process; if the particle diameter is too large, the subsequent hot-pressing sintering process is influenced, so that the sintered alloy has an uneven internal structure. The particle diameter of the iron-titanium-containing powder in the range can ensure the uniformity of an alloy structure sintered after a sintering process, and the particle diameter in the range can reduce the possibility of oxidation of iron element in the iron-titanium-containing powder, so that the aim of controlling oxygen element can be fulfilled.
It should be noted that the proportion of the required tungsten-titanium alloy can be adjusted according to actual needs, and since the tungsten powder is high-purity tungsten powder containing iron of 1 mass ppm or less, and the specification of the titanium powder is iron-containing titanium powder containing iron of 350 mass ppm or less, the proportion of iron element in the whole mixed powder or alloy can be known according to the proportion of the iron-containing titanium powder in the whole mixed powder, so in other embodiments, the content of iron element can be adjusted to be within the range of 30-50 mass ppm during the batching.
And step S2, providing powder mixing equipment, and carrying out powder mixing process on the tungsten powder and the iron-containing titanium powder.
In this embodiment, the tungsten powder and the iron-containing titanium powder are put into a powder mixing device for powder mixing, the powder mixing device is made of a titanium material, and the purity of titanium is more than 99.999%, in the process of powder mixing of the tungsten powder and the iron-containing titanium powder, stirring is needed to make the powder mixing more uniform, in the process of stirring of the tungsten powder and the iron-containing titanium powder, friction cannot be avoided in the powder mixing device, in the process of friction, when the inner wall of the powder mixing device is rubbed, the inner wall material cannot be abraded, so that molecules of the inner wall material can be mixed with the tungsten powder and the iron-containing titanium powder, thereby affecting the purity of the mixed powder after mixing; therefore, when a high-purity titanium material is used as a container material of a powder mixing device, when a small amount of high-purity titanium molecules are mixed into the mixed powder during stirring, the content of the titanium element in the mixed powder is only slightly increased, and the purity of the mixed powder is not influenced.
Before the tungsten powder and the iron-containing titanium powder are put into the powder mixing equipment for powder mixing, the method also comprises the following steps: and filling inert gas into the powder mixing equipment, wherein the inert gas is used as protective gas, and the pressure is controlled to be 0.02-0.06MPa, so that a proper amount of inert gas is in the powder mixing equipment.
In this embodiment, the inert gas is argon, and the argon is introduced into the powder mixing equipment for a sufficient time to ensure that no air is present in the powder mixing equipment after the argon is introduced, so that on one hand, impurities in the air are prevented from contacting the tungsten powder and the iron-containing titanium powder to affect the purity of the mixed powder after the powder mixing; on the other hand, because the iron element is easily oxidized, when the iron element is oxidized, the content of the oxygen element in the mixed powder is increased after mixing, and the quality of the tungsten-titanium alloy target material manufactured in the later period is affected, so that the step can prevent oxygen in the air from contacting with the iron element in the iron-containing titanium powder.
In the powder mixing process, a plurality of titanium balls are also provided, and the titanium balls, the tungsten powder and the iron-containing titanium powder are stirred together. The rotating speed of the powder mixing equipment is 6r/min-15r/min, and the powder mixing time is controlled within 2h-5 h. The titanium ball is pure titanium with the purity higher than 99.999 percent, the diameter of the titanium ball is 10mm-30mm, the titanium ball is suitable for being placed into the powder mixing equipment to rotate in the range, the tungsten powder and the iron-containing titanium powder are crushed better and mixed more uniformly by utilizing the titanium ball in the powder mixing process. Therefore, in the process of mixing the powder, the more the powder mixing process can be efficiently and quickly completed, the more the possibility that the tungsten powder and the iron-containing titanium powder are influenced by impurities can be reduced, and the purity in the process of powder mixing process can be further ensured.
It should be noted that, the higher the rotation speed of the mixing and distributing device is, the more quickly and uniformly mixing the mixed powder in the powder mixing device is enabled, and the time for the mixing process is shorter. However, the rotating speed is not suitable to be too high, and if the rotating speed is too high, the particles inside the titanium balls are easy to be centrifuged, that is, the titanium balls inside the titanium balls rotate along the edge of the inner wall of the powder mixing device, and cannot play a role in stirring the mixed powder. If the rotating speed of the powder mixing equipment is too low, the powder mixing efficiency is extremely poor, time waste is caused, and the possibility of impurity invasion in the powder mixing process is increased.
In this embodiment, the rotating speed of the powder mixing equipment in the mixing process is 8r/min, the powder mixing time can be controlled within 3 hours, the tungsten powder and the iron-containing titanium powder can be uniformly mixed, and the purity of the mixed powder cannot be affected by impurities.
Step S3 is executed to provide a mold and graphene paper to mold the mixed powder.
The material of the mould is graphite material, the size and shape of the mould are manufactured according to the size and shape of the corresponding tungsten-titanium alloy, and the graphite material has high strength, high temperature resistance and oxidation resistance and cannot be bonded with the mixed powder through chemical reaction. Before the die is filled, the die is wiped clean, and impurities and water stain residues are avoided as much as possible.
In other embodiments, the material of the mold may be alumina, zirconia, or cermet.
In this embodiment, before the mixed powder is molded, the method further includes: providing graphite paper, and filling the graphite paper into a mold to prevent the mixed powder from directly contacting with the grinding tool. The purity of the graphite paper is higher than 99.999%, the graphite paper needs to be cut before being filled into the die, and the size of the graphite paper corresponds to that of the die. Because the purity of the mold is not high and other metal impurities are contained in the mold, if the mixture is in direct contact with the mold, the impurities can invade into the mixed powder to influence the purity, or some impurity metals can react with the mixed powder to influence the purity, so that the purity of the graphite paper added is very high, and the purpose is to avoid the mixed powder from being in direct contact with the mold. And when the mixed powder is placed into a die on which the graphite paper is laid, tamping the mixed powder by using a tool, covering the die with the graphite paper, and finally placing a graphite pressure head.
In other embodiments, 2 or 3 layers of the graphite paper may be used, so that the mixed powder can be better isolated from the mold, and the purity of the mixed powder is further ensured. It should be noted that the purity of the graphite paper is very high, the price is expensive, and the number of layers is too large, which is not favorable for the cost of the production process.
In other embodiments, the purity of the graphite mold is 99.999%, the graphite mold is clean and free of impurities, the mixed powder can be directly placed into the mold and sealed, and the impurities cannot invade after sealing.
And step S4, performing a hot-pressing sintering process on the molded mixed powder.
Preparing a hot-pressing sintering furnace, hanging the graphite mold in the hot-pressing sintering furnace, performing single cold pressing, wherein the cold pressing pressure is not more than 12 tons, and after the cold pressing is completed, starting vacuumizing, wherein the vacuum degree is less than 1E-1 Pa; this process is to make the mixed powder preliminarily molded and can reduce the sintering temperature drop required in the subsequent sintering process and shorten the sintering time.
In the embodiment, the temperature of the hot-pressing sintering furnace is increased to 1000 ℃, and the temperature increasing speed in the temperature increasing process is 10 ℃/min; simultaneously, the pressure intensity is increased to 10MPa-15MPa, specifically 15MPa, and the temperature and pressure are kept for 1 hour; the primary hot-pressing sintering process is completed in the process, the temperature rising speed can be relatively high, the heating and pressurizing range is the range easily borne by the graphite mold, and the pressure is increased to 15MPa, so that the space among the mixed powder crystal grains is smaller, and the density is high and good.
After the heat preservation and pressure maintaining are finished, continuously increasing the temperature of the hot-pressing sintering furnace to 1250-1350 ℃ at a speed of 5 ℃/min, specifically 1300 ℃, simultaneously increasing the pressure to 25-35 MPa, specifically 30MPa, and continuously preserving heat and pressure for 1-2 h, and then finishing the sintering process; further sintering is carried out, the heating speed is controlled, the heating speed is slow, the density of the formed tungsten-titanium alloy is better in the dynamic sintering process, the internal structure is more uniform, the tungsten-titanium alloy is heated to 1300 ℃ and the pressure is 30Mpa, and then heat preservation and pressure maintaining are carried out, so that the internal molecular force of the formed tungsten-titanium alloy is stable and is not deformed. And the heating temperature and pressure are not too high, so that the bearable range of the graphite mold is ensured.
Step S5 is performed for machining, testing, packaging, and shipping.
When the hot-pressing sintering process is completed, the tungsten-titanium alloy can be machined to be processed into the shape or size required by a customer, then detection pretreatment is carried out, and finally the processes of cleaning, drying, packaging and the like are completed, so that the tungsten-titanium alloy can be delivered after being made into a qualified tungsten-titanium alloy target.
In the process of the tungsten-titanium alloy processing method provided by the invention, a mode of directly adding iron powder in the prior art is avoided, the possibility of oxygen entering is reduced by selecting proper iron-containing titanium powder, and the content and proportion of raw materials to be added are strictly calculated, so that the content of iron element meets the technical requirements: the etching rate of the tungsten-titanium film is ensured to be more than 30 mass ppm and less than 50 mass ppm, and the powder mixing time is reduced as much as possible in the processing process, so that the possibility of impurities which can be contacted by the mixed powder is reduced to the minimum, and the quality of the tungsten-titanium alloy in the whole sintering process is ensured.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. A preparation method of a WTi alloy target is characterized by comprising the following steps:
tungsten powder and iron-titanium-containing powder, and performing a powder mixing process on the tungsten powder and the iron-titanium-containing powder to generate mixed powder;
filling the mixed powder into a mold;
and carrying out hot-pressing sintering process on the mixed powder after the mold is filled.
2. The preparation method of the WTi alloy target material according to claim 1, wherein the specification of the tungsten powder is 5N tungsten powder containing iron less than 1 mass ppm; the specification of the iron-containing titanium powder is 3N5 titanium powder containing iron 350-450 mass ppm.
3. The method for preparing a WTi alloy target according to claim 1, comprising: and providing powder mixing equipment, and putting the tungsten powder and the iron-containing titanium powder into the powder mixing equipment for powder mixing.
4. The method for preparing a WTi alloy target according to claim 3, wherein the powder mixing device is made of titanium.
5. The preparation method of the WTi alloy target material according to claim 3, wherein before the tungsten powder and the iron-containing titanium powder are put into the powder mixing equipment for powder mixing, the method further comprises the following steps: and filling inert gas into the powder mixing equipment, wherein the pressure of the inert gas is 0.02-0.06 MPa.
6. The method for preparing a WTi alloy target according to claim 5, wherein the inert gas is argon.
7. The preparation method of the WTi alloy target material according to claim 3, wherein the rotation speed of the powder mixing equipment is 6r/min-15r/min, and the powder mixing time is controlled within 2h-5 h.
8. The method for preparing a WTi alloy target according to claim 3, comprising: providing titanium balls, and stirring the titanium balls, the tungsten powder and the iron-containing titanium powder.
9. The method for preparing a WTi alloy target according to claim 1, wherein before the step of loading the mixed powder into a mold, the method further comprises the steps of: providing graphite paper; and (3) filling the graphite paper into a mould to prevent the mixed powder from directly contacting with a grinding tool.
10. The method for preparing a WTi alloy target according to claim 1, wherein in the hot pressing sintering process, the temperature in the hot pressing sintering furnace is 1250 ℃ to 1350 ℃ and the pressure is 25Mpa to 35 Mpa.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112111713A (en) * | 2020-09-11 | 2020-12-22 | 宁波江丰电子材料股份有限公司 | Preparation method of WTi alloy sputtering target material |
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| US5470527A (en) * | 1992-04-21 | 1995-11-28 | Kabushiki Kaisha Toshiba | Ti-W sputtering target and method for manufacturing same |
| JP4747368B2 (en) * | 2007-03-05 | 2011-08-17 | 三菱マテリアル株式会社 | W-Ti target for sputtering for forming a W-Ti diffusion prevention film |
| CN104694895A (en) * | 2013-12-05 | 2015-06-10 | 有研亿金新材料股份有限公司 | W-Ti alloy target material and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112111713A (en) * | 2020-09-11 | 2020-12-22 | 宁波江丰电子材料股份有限公司 | Preparation method of WTi alloy sputtering target material |
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