CN111129193A - Atomic oxygen protection silver interconnection sheet for space solar cell and preparation method - Google Patents
Atomic oxygen protection silver interconnection sheet for space solar cell and preparation method Download PDFInfo
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- CN111129193A CN111129193A CN201911266828.0A CN201911266828A CN111129193A CN 111129193 A CN111129193 A CN 111129193A CN 201911266828 A CN201911266828 A CN 201911266828A CN 111129193 A CN111129193 A CN 111129193A
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- palladium
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 73
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 38
- 239000004332 silver Substances 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title abstract description 5
- 239000010410 layer Substances 0.000 claims abstract description 57
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 50
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052737 gold Inorganic materials 0.000 claims abstract description 30
- 239000010931 gold Substances 0.000 claims abstract description 30
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 25
- 238000000151 deposition Methods 0.000 claims abstract description 17
- 230000008021 deposition Effects 0.000 claims abstract description 13
- 238000002955 isolation Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims abstract description 6
- 239000011241 protective layer Substances 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims abstract description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 230000005012 migration Effects 0.000 abstract description 4
- 238000013508 migration Methods 0.000 abstract description 4
- 230000007613 environmental effect Effects 0.000 abstract description 3
- 230000002708 enhancing effect Effects 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 150000002500 ions Chemical class 0.000 description 16
- 230000000694 effects Effects 0.000 description 4
- 238000001883 metal evaporation Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910020442 SiO2—TiO2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PQTCMBYFWMFIGM-UHFFFAOYSA-N gold silver Chemical compound [Ag].[Au] PQTCMBYFWMFIGM-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/05—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
- H01L31/0504—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
- H01L31/0512—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module made of a particular material or composition of materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
The invention relates to an atomic oxygen protection silver interconnection sheet for a space solar cell and a preparation method thereof, belonging to the technical field of space power supply, wherein the atomic oxygen protection silver interconnection sheet for the space solar cell is made of a silver foil material; the silver foil is characterized in that the upper surface and the lower surface of the silver foil are plated with palladium layers; gold layers are plated on the surfaces of the palladium layers; the thickness of the palladium layer ranges from 0.5 μm to 1 μm; the thickness of the gold layer ranges from 1.5 μm to 2.5 μm. The ion source is used for pre-cleaning the silver foil and performing auxiliary deposition on the metal coating, so that the firmness of the film can be greatly improved, and the porosity of the film layer is reduced, thereby improving the reliability of the product and enhancing the atomic oxygen protection capability. Due to the aid of the ion source and the use of the palladium isolation protective layer, the thickness of the gold layer is reduced, and the production cost of the product is greatly reduced. Meanwhile, the palladium layer effectively prevents diffusion between gold and silver, silver migration is avoided, and the environmental tolerance of the product is enhanced.
Description
Technical Field
The invention belongs to the technical field of space power supplies, and particularly relates to an atomic oxygen protection silver interconnection sheet for a space solar cell and a preparation method of the atomic oxygen protection silver interconnection sheet.
Background
In a low earth orbit region (200 km-600 km), the environmental components contain a large amount of atomic oxygen, and the atomic oxygen has high activity and strong oxidizability. When the satellite is operated at high speed in the area, atomic oxygen can cause great degradation and oxidation of the satellite components exposed to the environment, thereby causing the component to partially or even wholly fail.
The interconnection sheet is an important component for connecting the single solar cells in the satellite solar cell array, and the single solar cells can realize current output meeting satellite load after being connected in series through the interconnection sheet. The main material of the interconnection sheet is silver foil with the thickness of tens of microns, and the silver interconnection sheet can be seriously oxidized under the atomic oxygen environment in a low earth orbit to generate non-conductive oxide, so that the normal work and the service life of the solar cell array are influenced. And the generated oxide has a loose structure and is easy to fall off, so that the solar cell array is likely to be broken in a large area, and the satellite loses the on-orbit working capability.
In current space products, a common atomic oxygen protection measure is to coat the surface of the component to be exposed to the atomic oxygen environment with a protective material, such as ITO-MgF2Hybrid coating, SiO2-TiO2Hybrid coatings and silicones, etc. Wherein ITO-MgF2The coating is oxidized by atomic oxygen to generate denaturation risk, and other materials belong to insulating materials, which can influence the welding and assembly between the interconnection sheet and the battery, so that the coating is not suitable for atomic oxygen protection of the silver interconnection sheet.
Chinese patent (publication No. CN 109786490A) proposes a method for realizing atomic oxygen protection by evaporating a gold layer with the thickness of 2-5 μm on the surface of a silver foil in an electron beam thermal evaporation mode. The thickness of the gold layer is thick, so that the oxidation stripping of atomic oxygen to the silver interconnection sheet can be effectively prevented, and the gold layer has good weldability and bonding force and can be suitable for welding and assembling of the interconnection sheet.
However, the gold layer deposition is carried out by simply using electron beam thermal evaporation, and the gold layer obtained by deposition has poor uniformity and large porosity. The thickness of the gold layer has to be increased in order to enhance reliability, which causes the cost of the product to increase significantly. On the other hand, because the atomic volumes and covalent radii of gold and silver are relatively similar, intermetallic diffusion is easy to occur on a gold-silver interface, if micropores exist on the surface of a gold plating layer, the silver migration effect is very obvious in a humid storage environment, and finally, silver oxide impurities appear on the surface of the gold layer, so that adverse effects are caused on subsequent production and product reliability.
Disclosure of Invention
The invention aims to provide an atomic oxygen protection silver interconnection sheet for a space solar cell and a preparation method thereof, which are used for improving the atomic oxygen protection capability and reliability of the atomic oxygen protection silver interconnection sheet for the space solar cell.
The invention provides an atomic oxygen protection silver interconnection sheet for a space solar cell, which is made of a silver foil material; plating palladium layers on the upper surface and the lower surface of the silver foil; and gold layers are plated on the surfaces of the palladium layers.
Further, the palladium layer has a thickness ranging from 0.5 μm to 1 μm.
Further, the thickness of the gold layer ranges from 1.5 μm to 2.5 μm.
A second object of the present invention is to provide a method for preparing an atomic oxygen protected silver interconnect sheet for a space solar cell, comprising the steps of:
s1, depositing a palladium layer on the surface of the silver foil to serve as an isolation protective layer;
and S2, depositing a gold layer on the surface of the palladium layer to be used as an atomic oxygen protective layer.
Further, before S1, the method further includes: pretreating the silver foil; the method specifically comprises the following steps:
firstly, cleaning silver foil;
then, the silver foil is spread and fixed on the workpiece plate right above the evaporation source, and when the vacuum degree in the vacuum chamber reaches 1 multiplied by 10-3Opening an ion source at Pa to pre-clean the surface of the silver foil; the ion source is a Hall ion source, and the working gas is argon;
then argon is introduced, and the pressure in the vacuum chamber is controlled to be 1 multiplied by 10-2Pa-2×10-2Pa, anode acceleration voltage of 80V-200V and electron beam current of 2.5A-6.5A; removing impurities and contaminants on the surface of the silver foil by means of argon atoms emitted by an ion source; the rotating speed of the workpiece disc is 5r/min-10r/min, and the pretreatment time is 5min-10 min.
Further, in the S1 and S2, the ion source is in an on state.
Further, the S1 specifically includes: the thickness of the evaporated palladium layer is 0.5-1 μm, and the deposition rate is 0.5-1 nm/s.
Further, the S2 specifically includes: the thickness of the gold vapor-plating layer is 1.5-2.5 μm, and the deposition rate is 0.5-1 nm/s.
The invention has the advantages and positive effects that:
the invention uses the ion source to pre-clean the silver foil and auxiliary deposit the metal coating, which can greatly improve the firmness of the film and reduce the porosity of the film layer, thereby improving the reliability of the product and enhancing the atomic oxygen protection capability. Due to the aid of the ion source and the use of the palladium isolation protective layer, the thickness of the gold layer is reduced, and the production cost of the product is greatly reduced. Meanwhile, the palladium layer effectively prevents diffusion between gold and silver, silver migration is avoided, and the environmental tolerance of the product is enhanced.
Drawings
Fig. 1 is a block diagram of a preferred embodiment of the present invention.
Detailed Description
The invention is further described with reference to the following figures and specific embodiments.
Please refer to fig. 1;
the invention provides an atomic oxygen protection silver interconnection sheet for a space solar cell, which is characterized in that a layer of palladium is firstly deposited on the surface of a silver foil as an isolation protection layer and a layer of gold is deposited as an atomic oxygen protection layer in an electron beam thermal evaporation and ion source auxiliary mode. The atomic volume and covalent radius of palladium are both smaller than those of gold and silver, so that the diffusion between the gold layer and the silver layer can be effectively blocked, and the influence of silver migration on the appearance and reliability of the product is reduced. Meanwhile, the palladium, the gold and the silver have good binding force, so that the firmness of the plating layer can meet the technical requirements. Due to the existence of the isolation protection layer, the thickness of the gold can be reduced, and the production cost of the product is further reduced.
Spreading and fixing the cleaned silver foil on the workpiece plate right above the evaporation source, and when the vacuum degree in the vacuum chamber reaches 1 × 10-3And when Pa, turning on an ion source to pre-clean the surface of the silver foil. The ion source is Hall ion source, the working gas is argon, the pressure in the vacuum chamber is controlled at 1 x 10 after the argon is introduced-2Pa-2×10-2Pa, anode accelerating voltage of 80V-200V and electron beam current of 2.5A-6.5A. The argon atoms emitted by the ion source can effectively remove impurities and contamination on the surface of the silver foil, and the film forming quality is improved. The rotation speed of the workpiece disc is 5r/min-10r/min, and metal evaporation is started after pretreatment is carried out for 5min-10 min.
In the metal evaporation process, the ion source is continuously kept in an open state, the firmness of the film can be increased, the porosity of the surface of the film layer is reduced, the deposition rate of the film layer is more stable, and the thickness of the film layer is more uniform. The deposition rate of the film layer is not too high, and the generation of local pores in the film forming process is avoided. Firstly, a palladium layer is evaporated, the thickness is 0.5-1 μm, and the deposition rate is 0.5-1 nm/s. Then, gold layer is vapor-plated with the thickness of 1.5-2.5 μm and the deposition rate of 0.5-1 nm/s.
And (3) inflating to take out the workpiece disc after the single-sided evaporation is finished, turning over the silver foil, and performing back evaporation according to the operation to finally obtain the atomic oxygen protection silver interconnection sheet as shown in figure 1.
A method of making an atomic oxygen protected silver interconnect sheet for a space solar cell, comprising the steps of:
(1) the silver foil is subjected to chemical cleaning treatment to remove organic contamination and inorganic impurities on the surface.
(2) And flatly laying and fixing the silver foil on a workpiece disc, wherein the workpiece disc is fixed in a vacuum coating machine, and the silver foil is positioned right above the evaporation source.
(3) Closing the hatch of the vacuum chamber, and vacuumizing to 1 × 10-3And when Pa, turning on an ion source to pre-clean the surface of the silver foil. Introducing argon as working gas, and keeping the pressure in the vacuum chamber at 1.5 × 10-2Pa, setting the anode accelerating voltage to be 100V, the electron beam current to be 3.5A and the rotating speed of the workpiece disc to be 5 r/min. And starting metal evaporation after the ion source is started to perform pretreatment for 8 min.
(4) In the metal evaporation process, the ion source keeps working state continuously. First, a palladium layer was evaporated, with a thickness set to 0.8 μm and a deposition rate of 0.8 nm/s. And after the palladium layer is evaporated, evaporating a gold layer, wherein the thickness is set to be 2 mu m, and the deposition rate is 0.8 nm/s.
(5) And (3) cooling for 30min after the evaporation is finished, opening the vacuum chamber, taking out the workpiece disc, repeating the operations in (3) and (4) after the silver foil is turned over, and taking out the product after the evaporation is finished to obtain the atomic oxygen protection silver interconnection sheet.
(6) After the atomic oxygen protective silver interconnection sheet prepared by the method is subjected to tape stripping and bending tests, the coating is not peeled off, and the binding force of the coating meets the requirement. Through atomic oxygen environment test, the atomic oxygen protective silver interconnection sheet has stronger atomic oxygen tolerance, and the external plating layer of the atomic oxygen protective silver interconnection sheet has good protection effect on the silver foil substrate.
While one embodiment of the present invention has been described in detail, the description is only a preferred embodiment of the present invention and should not be taken as limiting the scope of the invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.
Claims (8)
1. An atomic oxygen protective silver interconnection sheet for a space solar cell; is made of silver foil material; the silver foil is characterized in that the upper surface and the lower surface of the silver foil are plated with palladium layers; and gold layers are plated on the surfaces of the palladium layers.
2. The atomic oxygen shielding silver interconnect sheet for a space solar cell according to claim 1, wherein the palladium layer has a thickness in the range of 0.5 μm to 1 μm.
3. The atomic oxygen protected silver interconnect sheet for a space solar cell according to claim 1, wherein the gold layer has a thickness in the range of 1.5 μ ι η to 2.5 μ ι η.
4. A method for preparing an atomic oxygen protected silver interconnect sheet for a space solar cell according to claim 1, comprising the steps of:
s1, depositing a palladium layer on the surface of the silver foil to serve as an isolation protective layer;
and S2, depositing a gold layer on the surface of the palladium layer to be used as an atomic oxygen protective layer.
5. The method for preparing an atomic oxygen protection silver interconnection sheet for a space solar cell according to claim 4, further comprising, before S1: pretreating the silver foil; the method specifically comprises the following steps:
firstly, cleaning silver foil;
then, the silver foil is spread and fixed on the workpiece plate right above the evaporation source, and when the vacuum degree in the vacuum chamber reaches 1 multiplied by 10-3Opening an ion source at Pa to pre-clean the surface of the silver foil; the ion source is a Hall ion source, and the working gas is argon;
then argon is introduced, and the pressure in the vacuum chamber is controlled to be 1 multiplied by 10-2Pa-2×10-2Pa, anode acceleration voltage of 80V-200V and electron beam current of 2.5A-6.5A; removing impurities and contaminants on the surface of the silver foil by means of argon atoms emitted by an ion source; the rotating speed of the workpiece disc is 5r/min-10r/min, and the pretreatment time is 5min-10 min.
6. The method for preparing an atomic oxygen protection silver interconnection sheet for a space solar cell according to claim 4 or 5, wherein in the S1 and S2, the ion source is in an ON state.
7. The method for preparing the atomic oxygen protection silver interconnection sheet for the space solar cell according to claim 4 or 5, wherein the S1 is specifically: the thickness of the evaporated palladium layer is 0.5-1 μm, and the deposition rate is 0.5-1 nm/s.
8. The method for preparing the atomic oxygen protection silver interconnection sheet for the space solar cell according to claim 4 or 5, wherein the S2 is specifically: the thickness of the gold vapor-plating layer is 1.5-2.5 μm, and the deposition rate is 0.5-1 nm/s.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911266828.0A CN111129193A (en) | 2019-12-11 | 2019-12-11 | Atomic oxygen protection silver interconnection sheet for space solar cell and preparation method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911266828.0A CN111129193A (en) | 2019-12-11 | 2019-12-11 | Atomic oxygen protection silver interconnection sheet for space solar cell and preparation method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113459609A (en) * | 2021-06-30 | 2021-10-01 | 中南大学 | Solar cell array interconnection material and preparation method thereof |
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| CN101928916A (en) * | 2010-09-06 | 2010-12-29 | 厦门大学 | Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate |
| CN103668368A (en) * | 2013-11-20 | 2014-03-26 | 天津大学 | Preparation process of molybdenum/palladium/silver laminar metal matrix composite |
| KR20150083744A (en) * | 2014-01-10 | 2015-07-20 | 엘지전자 주식회사 | Interconnector for solar cell module |
| CN106024975A (en) * | 2016-06-03 | 2016-10-12 | 天津大学 | Preparation method of nano-porous molybdenum foil based molybdenum/platinum/silver laminar composite material |
| CN107768336A (en) * | 2016-08-18 | 2018-03-06 | 罗门哈斯电子材料有限责任公司 | Multilayer electric contact element |
| CN109786490A (en) * | 2018-12-27 | 2019-05-21 | 中国电子科技集团公司第十八研究所 | Method for preventing atomic oxygen corrosion of solar cell interconnection sheet and silver-gold-plated solar cell interconnection sheet |
-
2019
- 2019-12-11 CN CN201911266828.0A patent/CN111129193A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928916A (en) * | 2010-09-06 | 2010-12-29 | 厦门大学 | Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate |
| CN103668368A (en) * | 2013-11-20 | 2014-03-26 | 天津大学 | Preparation process of molybdenum/palladium/silver laminar metal matrix composite |
| KR20150083744A (en) * | 2014-01-10 | 2015-07-20 | 엘지전자 주식회사 | Interconnector for solar cell module |
| CN106024975A (en) * | 2016-06-03 | 2016-10-12 | 天津大学 | Preparation method of nano-porous molybdenum foil based molybdenum/platinum/silver laminar composite material |
| CN107768336A (en) * | 2016-08-18 | 2018-03-06 | 罗门哈斯电子材料有限责任公司 | Multilayer electric contact element |
| CN109786490A (en) * | 2018-12-27 | 2019-05-21 | 中国电子科技集团公司第十八研究所 | Method for preventing atomic oxygen corrosion of solar cell interconnection sheet and silver-gold-plated solar cell interconnection sheet |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113459609A (en) * | 2021-06-30 | 2021-10-01 | 中南大学 | Solar cell array interconnection material and preparation method thereof |
| CN113459609B (en) * | 2021-06-30 | 2023-04-28 | 中南大学 | Solar cell array interconnection material and preparation method thereof |
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