CN111121652B - Optical microscopic film thickness meter capable of realizing local measurement - Google Patents
Optical microscopic film thickness meter capable of realizing local measurement Download PDFInfo
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- CN111121652B CN111121652B CN201911373049.0A CN201911373049A CN111121652B CN 111121652 B CN111121652 B CN 111121652B CN 201911373049 A CN201911373049 A CN 201911373049A CN 111121652 B CN111121652 B CN 111121652B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
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Abstract
The invention relates to the technical field of semiconductor thin film optics, in particular to an optical microscopic film thickness instrument capable of realizing local measurement. The optical path component includes: the device comprises an image sensor, a first tube lens, a measuring light source, a coaxial illuminator, a spectroscope, a second tube lens, an optical fiber, a spectrometer, an objective converter and an objective. The image sensor is fixed at one end of the first tube mirror, and the other end of the first tube mirror is fixed on the coaxial illuminator; the measuring light source is connected with the coaxial illuminator; the coaxial illuminator is connected with one end of the spectroscope, and the other end of the spectroscope is connected with the objective lens converter; the objective lens is connected with the objective lens converter; the spectrometer is connected with one end of the second tube mirror through an optical fiber, and the other end of the second tube mirror is connected with the spectroscope; the coaxial illuminator is fixedly connected with the rack assembly; the sample is placed on a rack assembly. The optical microscope film thickness instrument capable of realizing local measurement provided by the invention can realize accurate measurement of local areas of a sample, and has the advantages of non-destructiveness, rapidness and low cost.
Description
Technical Field
The invention relates to the technical field of semiconductor thin film optics, in particular to an optical microscopic film thickness instrument capable of realizing local measurement.
Background
With the recent deepening of optical films in the fields of space remote sensing, precision optics and the like, and the characteristics of low cost, light weight and stable optical properties of the optical films, the ability to design and mass-produce high-precision and high-performance optical films has become a common pursuit of a plurality of research institutions and optical enterprises. For the optical thin film in the working waveband, the thickness of the optical thin film is an important factor for restricting the optical performance of the thin film, so how to quickly and accurately measure the thickness of each actual film layer in the development process of the optical thin film plays an important role in optimizing the structure of a film system and improving the preparation process.
With the continuous development of science and technology in recent years, various special applications also put forth various requirements on optical thin films, from nano-scale to micron-scale in size, and because the thickness of the optical thin film controls the optical, mechanical and electromagnetic properties of the optical thin film, the thickness of materials is required to be strictly controlled in many fields and applications. In the semiconductor industry today, most semiconductor devices and integrated circuit structures are formed from various thin film layers, so that it is a strategic key technology in any country to accurately control the thickness of optical films.
Conventional film thickness measurement is roughly divided into two types, that is, a non-optical measurement method and an optical measurement method, and the non-optical measurement method includes a quartz crystal method, a microbalance method, a resistance method, a capacitance method, an eddy current method, an ultrasonic method, a probe measurement method, and the like, and details thereof are not repeated herein. The optical methods are mainly classified into photoelectric extremum method, ellipsometry method, spectroscopic method, and the like. The photoelectrode value method can only carry out integral monitoring on the whole film system, has low measurement precision and has limitation on monitoring the thickness of the film system. Although ellipsometry can characterize a plurality of parameters such as film thickness, depolarization factor, absorption factor, etc., its measurement depends on ellipsometry, which is expensive and has high requirements for measurement environment, and is generally only used in scientific research. The method has mature principle, simple hardware realization, easy integration and wide use environment, and most of film thickness measurement adopts the method.
A common spectral reflection type film thickness meter utilizes the interference principle of light, and particularly, when the film thickness meter transmits measurement light in a known spectral range to a film to be measured, reflected light of an interface between the film and air interferes with reflected light from an interface between the film and a substrate, the interference at the moment is related to the thickness of the film, and the thickness of the film of a sample to be measured can be obtained through a series of calculations. The size of a detection light spot of the spectral reflection type film thickness instrument is generally 0.5-3 mm, the thickness measurement range of the spectral reflection type film thickness instrument is 50 nm-20 um, and the absolute accuracy and the measurement accuracy of the spectral reflection type film thickness instrument are generally 0.1 nm. In summary, in the spectral reflection type film thickness meter, the size of the detection light spot is millimeter magnitude, but the measurement requirement of micron is already met in the measurement requirement of micro area, so the common spectral reflection type film thickness meter cannot meet the measurement requirement of micro area.
Most of the instruments on the market for measuring the thickness of the thin film currently carry out a five-point measurement method on the thin film, and then obtain an average value of the five-point film thickness to approximate the real thickness of the thin film. In addition, currently, a film thickness measuring instrument designed based on a spectrum method calculates the film thickness by measuring the transmittance curve of the film, so that the instrument structure is large in size, devices are dispersed and difficult to integrate, and the instrument is difficult to apply to online detection.
Disclosure of Invention
The invention provides an optical microscopic film thickness instrument capable of realizing local measurement, aiming at the technical problem that the common spectral reflection type film thickness instrument in the prior art cannot meet the measurement requirement of a micro-area.
The technical scheme for solving the technical problems is as follows:
an optical microscope film thickness instrument capable of realizing local measurement comprises: a rack assembly and a light path assembly; the light path component is fixed on the rack component;
the optical path component includes: the device comprises an image sensor, a first tube lens, a measuring light source, a coaxial illuminator, a spectroscope, a second tube lens, an optical fiber, a spectrometer, an objective converter and an objective; the image sensor is fixed at one end of the first tube mirror, and the other end of the first tube mirror is fixed on the coaxial illuminator; the measuring light source is connected with the coaxial illuminator; the coaxial illuminator is connected with one end of the spectroscope, and the other end of the spectroscope is connected with the objective lens converter; the objective lens is connected with the objective lens converter; the spectrometer is connected with one end of the second tube mirror through the optical fiber, and the other end of the second tube mirror is connected with the spectroscope; the coaxial illuminator is fixedly connected with the rack assembly; a sample is placed on the rack assembly;
the measuring light source is changed into parallel light through the coaxial illuminator, the parallel light enters the spectroscope, and the light beam is irradiated on the surface of the sample through the spectroscope; and light on the surface of the sample returns along the original light path after surface interference, and the returned light beam is reflected to the second tube mirror by the spectroscope and is received by the spectrometer through the optical fiber.
In the preferred scheme, the method further comprises the following steps: the first connecting piece, the second connecting piece and the third connecting piece;
the image sensor is connected with the first tube mirror through the first connecting piece; the coaxial illuminator is connected with the spectroscope through the second connecting piece; the spectroscope is connected with the objective lens converter through the third connecting piece.
In the preferred scheme, the method further comprises the following steps: an optical fiber pitch adjustment mechanism;
the second tube mirror is connected with the spectroscope through the optical fiber pitching adjusting mechanism.
In a preferred embodiment, the optical fiber pitch adjustment mechanism includes: the optical fiber adjusting top plate, the optical fiber adjusting bottom plate, the adjusting spring and the adjusting bolt;
the optical fiber adjusting top plate and the optical fiber adjusting bottom plate are vertically arranged; one side of the optical fiber adjusting bottom plate is fixedly connected with the spectroscope, and the optical fiber adjusting top plate is arranged on the outer side of the optical fiber adjusting bottom plate;
the adjusting bolt is arranged on the outer side of the optical fiber adjusting top plate, and the threaded end of the adjusting bolt penetrates through the optical fiber adjusting top plate and the optical fiber adjusting bottom plate; the adjusting bolts are respectively arranged at four directions of the outer side of the optical fiber adjusting top plate, namely the upper direction, the lower direction, the left direction and the right direction;
the adjusting spring is arranged between the optical fiber adjusting top plate and the optical fiber adjusting bottom plate, one end of the adjusting spring is connected with the inner side of the optical fiber adjusting top plate, and the other end of the adjusting spring is connected with the inner side of the optical fiber adjusting bottom plate.
In a preferred embodiment, the image sensor is an industrial camera.
In its preferred scheme, the frame subassembly includes: the device comprises a rack base, a rack vertical plate, a rack cross beam, a three-axis motion mechanism, a sample table, an adsorption structure and an air pump;
the lower end of the vertical plate of the rack is fixedly connected with the upper end of the base of the rack; the rack cross beam is arranged above the rack base, and one end of the rack cross beam is fixedly connected with the rack vertical plate;
the three-axis movement mechanism is fixed on the rack base, and the sample table is fixed on the three-axis movement mechanism; the adsorption structure is connected with an adsorption hole formed in the platform; the adsorption structure is connected with the air pump, and a switch valve is arranged on a pipeline between the adsorption structure and the air pump.
In the preferred scheme, the method further comprises the following steps: reinforcing ribs;
the reinforcing ribs are fixedly connected with the rack base and the rack vertical plate respectively.
In a preferred scheme, the magnification of the objective lens is 50 times; the focal length of the first tube mirror and the second tube mirror is 200 mm.
In the preferred embodiment, the core diameter of the optical fiber is 200-500 μm.
The optical microscope film thickness instrument capable of realizing local measurement provided by the invention at least has the following beneficial effects or advantages:
according to the optical microscope film thickness instrument capable of realizing local measurement, a measurement light source is changed into parallel light through a coaxial illuminator, the parallel light enters a spectroscope, and light beams are irradiated on the surface of a sample through the spectroscope; the light on the surface of the sample returns along the original light path after surface interference, and the returned light beam is reflected to the second tube mirror by the spectroscope and then is received by the spectrometer through the optical fiber. And obtaining the reflectivity through the light intensity, finding a fitting spectrum with the highest matching degree with the measured spectrum in the library through a library matching method, wherein the film thickness value corresponding to the theoretical spectrum is the actual film thickness value of the sample to be measured. The optical microscope film thickness instrument capable of realizing local measurement provided by the invention can realize accurate measurement of a local area of a sample by matching with related calculation, the size of the measurement area can be adjusted by the amplification factor of the optical fiber aperture and the objective lens, and the optical microscope film thickness instrument has the advantages of non-destructiveness, rapidness and low cost.
Drawings
FIG. 1 is a schematic structural diagram of an optical microscope film thickness gauge capable of performing local measurement according to an embodiment of the present invention;
FIG. 2 is a schematic view of a partial structure of an optical microscope film thickness meter capable of performing partial measurement according to an embodiment of the present invention;
in the drawings, the components represented by the respective reference numerals are listed below:
1-image sensor, 2-first tube lens, 3-measuring light source, 4-coaxial illuminator, 5-spectroscope, 6-objective lens converter, 7-objective lens, 8-sample stage, 9-three-axis movement mechanism, 10-rack vertical plate, 11-rack beam, 12-second tube lens, 13-reinforcing rib, 14-rack base, 15-spectrometer, 16-optical fiber pitch adjusting mechanism, 161-optical fiber adjusting bottom plate, 162-optical fiber adjusting top plate and 17-optical fiber.
Detailed Description
Aiming at the technical problem that the common spectral reflection type film thickness instrument in the prior art cannot meet the measurement requirement of a micro-area, the invention provides an optical microscope film thickness instrument capable of realizing local measurement.
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1 and fig. 2, an embodiment of the present invention provides an optical microscope film thickness meter capable of performing local measurement, including: a rack assembly and a light path assembly; the light path assembly is fixed on the frame assembly. The optical path component includes: the device comprises an image sensor 1, a first connecting piece, a first tube lens 2, a measuring light source 3, a coaxial illuminator 4, a second connecting piece, a spectroscope 5, a third connecting piece, a second tube lens 12, an optical fiber 17, a spectrometer 15, an objective lens converter 6 and an objective lens 7. The image sensor 1 is fixed at one end of the first tube mirror 2 through a first connecting piece, and the other end of the first tube mirror 2 is fixed on the coaxial illuminator 4. The measurement light source 3 is connected to a coaxial illuminator 4. The coaxial illuminator 4 is connected with one end of the spectroscope 5 through a second connecting piece, and the other end of the spectroscope 5 is connected with the objective converter 6 through a third connecting piece; the objective lens 7 is connected to the objective lens changer 6. The spectrometer 15 is connected with one end of the second tube mirror 12 through an optical fiber 17, and the other end of the second tube mirror 12 is connected with the spectroscope 5; the coaxial illuminator 4 is fixedly connected with the frame assembly; the sample is placed on a rack assembly. In the present embodiment, the image sensor 1 is an industrial camera. The magnification of the objective lens 7 is 50 times; the focal length of the first tube mirror 2 and the second tube mirror 12 is 200 mm. The core diameter of the optical fiber 17 is 200-500 μm. The measuring light source 3 is changed into parallel light through the coaxial illuminator 4, the parallel light enters the spectroscope 5, and the light beam is irradiated on the surface of the sample through the spectroscope 5; the light on the surface of the sample returns along the original light path after surface interference, and the returned light beam is reflected to the second tube mirror 12 by the beam splitter 5 and then received by the spectrometer 15 through the optical fiber 17. When light reflected from the surface of the sample piece returns along the original optical path, when the light beam passes through the spectroscope 5, according to the principle that the spectroscope 5 is semi-transparent and semi-reflective, a part of light is reflected to the second tube mirror 12 by the spectroscope, and finally is captured by the optical fiber, and the other part of light passes through the spectroscope 5 and then reaches the coaxial illuminator, and finally is captured and imaged by the image sensor 1.
In a preferred embodiment provided in the embodiment of the present invention, referring to fig. 1 and fig. 2, the optical microscope film thickness meter capable of achieving local measurement further includes: a fiber pitch adjustment mechanism 16. The second tube mirror 12 is connected with the spectroscope 5 through the optical fiber pitch adjusting mechanism 16; since the size of the aperture of the optical fiber 17 is the size of the measurement area, the optical fiber pitch adjusting mechanism 16 is used for adjusting the illumination area of the aperture of the optical fiber 17 in the measurement; in addition, because the spectrometer 15 collects the light intensity of the sample to be measured through the optical fiber hole, but if the optical fiber hole diameter and the collected light beam are not parallel but have a certain inclination angle, the collection of the light intensity is affected, and the measurement accuracy is affected, so the pitching angle of the optical fiber 17 is changed by adjusting the optical fiber pitching adjusting mechanism 16, and the optical fiber hole diameter is ensured to be collected to obtain the maximum light intensity sum. Specifically, referring to fig. 2, the fiber pitch adjustment mechanism 16 includes: a fiber adjusting top plate 162, a fiber adjusting bottom plate 161, an adjusting spring and an adjusting bolt. The optical fiber adjusting top plate 162 and the optical fiber adjusting bottom plate 161 are vertically arranged; one side of the optical fiber adjusting bottom plate 161 is fixedly connected with the spectroscope 5, and the optical fiber adjusting top plate 162 is arranged outside the optical fiber adjusting bottom plate 161. The adjusting bolt is arranged on the outer side of the optical fiber adjusting top plate 162, and the threaded end of the adjusting bolt penetrates through the optical fiber adjusting top plate 162 and the optical fiber adjusting bottom plate 161; adjusting bolts are respectively arranged at four positions of the outer side of the optical fiber adjusting top plate 162. The adjusting spring is arranged between the optical fiber adjusting top plate 162 and the optical fiber adjusting bottom plate 161, one end of the adjusting spring is connected with the inner side of the optical fiber adjusting top plate 162, and the other end of the adjusting spring is connected with the inner side of the optical fiber adjusting bottom plate 161. The pitching angle of the optical fiber can be adjusted by adjusting the tightness of the adjusting bolt.
In a preferred embodiment provided in the embodiment of the present invention, referring to fig. 1, the rack assembly includes: the device comprises a rack base 14, a rack vertical plate 10, a rack cross beam 11, a three-axis motion mechanism 9, a sample table 8, an adsorption structure, an air pump and a reinforcing rib 13. The lower end of a vertical plate 10 of the frame is fixedly connected with the upper end of a base 14 of the frame; the frame crossbeam 11 is arranged above the frame base 14, and one end of the frame crossbeam 11 is fixedly connected with the frame vertical plate 10. The three-axis movement mechanism 9 is fixed on the frame base 14, and the sample table 8 is fixed on the three-axis movement mechanism 9; the three-axis movement mechanism 9 can realize the adjustment of the X-axis, the Y-axis and the Z-axis directions. The adsorption structure is connected with an adsorption hole arranged on the sample table 8; the adsorption structure is connected with the air pump, a switch valve is arranged on a pipeline between the adsorption structure and the air pump, and the adsorption structure is used for adsorbing and fastening a sample in an adsorption hole on the sample table 8. The reinforcing ribs 13 are fixedly connected with the rack base 14 and the rack vertical plate 10 respectively, and the reinforcing ribs 13 are used for increasing the mechanical strength of the rack assembly.
The measuring method of the optical microscope film thickness instrument capable of realizing local measurement provided by the embodiment of the invention comprises the following steps:
step S10, measuring reflectivity spectrumA0 black sample reflects the intensity spectrum and is labeled Ib(λ)。
Step S20, measuring the reflection spectrum as Rr(λ) and is labeled as Is(λ)。
Step S30, measuring the reflection light intensity spectrum of the sample piece to be measured with unknown reflectivity spectrum, and marking as Is(λ)。
Step S40, after obtaining the above parameters, according to
And obtaining the actually measured reflectivity spectrum of the sample piece to be measured.
Step S50 shows the functional relationship with the film thickness as one parameter of the functional relationship, assuming that d is [ d ]1,d2,d3...dn]And calculating to obtain a corresponding reflectivity spectrum sequence for the film thickness sequence.
Step S60, expressing the fitting degree through MSE (mean square error) of the actually measured reflectivity spectrum of the theoretical reflectivity spectrum; wherein
Wherein n is the number of wavelength points, RcaleAnd RmeasCalculating a reflectivity spectrum and measuring the reflectivity spectrum; the minimum value obtained by MSE can be used to judge whether the optimal R is obtainedcaleAnd RmeasAt this time RcaleThe corresponding thickness d is the thickness of the film to be measured.
Wherein in the measuring step the spots need to be located and marked. The present embodiment mainly uses the fiber aperture to mark and locate the measurement region. The optical fiber 17 adopts a one-to-two optical fiber for illumination and collection, the optical core diameter of the optical fiber is 400um, and the requirement of a 50um marking area can be met by combining optical path components. But this only guarantees the size of the marked measurement area. The area to be measured is moved to the mark measuring area by adjusting the pitch angle of the optical fiber 17 and adjusting the X/Y displacement of the sample wafer, thereby ensuring the accuracy of measurement.
The optical microscope film thickness instrument capable of realizing local measurement provided by the embodiment of the invention at least has the following beneficial effects or advantages:
according to the optical microscope film thickness meter capable of realizing local measurement, provided by the embodiment of the invention, a measurement light source is changed into parallel light through a coaxial illuminator, the parallel light is incident to a spectroscope, and a light beam is irradiated on the surface of a sample through the spectroscope; the light on the surface of the sample returns along the original light path after surface interference, and the returned light beam is reflected to the second tube mirror by the spectroscope and then is received by the spectrometer through the optical fiber. And obtaining the reflectivity through the light intensity, finding a fitting spectrum with the highest matching degree with the measured spectrum in the library through a library matching method, wherein the film thickness value corresponding to the theoretical spectrum is the actual film thickness value of the sample to be measured. The optical microscope film thickness instrument capable of realizing local measurement provided by the invention can realize accurate measurement of a local area of a sample by matching with related calculation, the size of the measurement area can be adjusted by the amplification factor of the optical fiber aperture and the objective lens, and the optical microscope film thickness instrument has the advantages of non-destructiveness, rapidness and low cost.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (9)
1. An optical microscope film thickness meter capable of realizing local measurement is characterized by comprising: a rack assembly and a light path assembly; the light path component is fixed on the rack component;
the optical path component includes: the device comprises an image sensor (1), a first tube lens (2), a measuring light source (3), a coaxial illuminator (4), a spectroscope (5), a second tube lens (12), an optical fiber (17), a spectrometer (15), an objective converter (6) and an objective (7); the image sensor (1) is fixed at one end of the first tube mirror (2), and the other end of the first tube mirror (2) is fixed on the coaxial illuminator (4); the measuring light source (3) is connected with the coaxial illuminator (4); the coaxial illuminator (4) is connected with one end of the spectroscope (5), and the other end of the spectroscope (5) is connected with the objective lens converter (6); the objective (7) is connected with the objective converter (6); the spectrometer (15) is connected with one end of the second tube mirror (12) through the optical fiber (17), and the other end of the second tube mirror (12) is connected with the spectroscope (5); the coaxial illuminator (4) is fixedly connected with the rack assembly; a sample is placed on the rack assembly;
the measuring light source (3) is changed into parallel light through the coaxial illuminator (4), the parallel light enters the spectroscope (5), and the light beam is irradiated on the surface of the sample through the spectroscope (5); the light on the surface of the sample returns along the original light path after surface interference, the returned light beam is reflected to the second tube mirror (12) by the spectroscope (5) and then is received by the spectrometer (15) through an optical fiber (17);
the measuring steps of the optical microscope film thickness instrument capable of realizing local measurement comprise:
the intensity spectrum of the reflected light of the black sample piece with the reflectivity spectrum of 0 is measured and marked as Ib(λ)；
Measuring the reflectance spectrum as Rr(λ) and is labeled as Is(λ)；
Measuring the reflected light intensity spectrum of the sample piece to be measured with unknown reflectivity spectrum, and marking as Is(λ)；
After obtaining the above parameters, according to
Obtaining an actual measurement reflectivity spectrum of a sample to be measured;
the film thickness is taken as a parameter of the functional relationship, the functional relationship is expressed, and d is assumed to be [ d ]1,d2,d3...dn]Calculating to obtain a corresponding reflectivity spectrum sequence for the film thickness sequence;
expressing the degree of fitting by the MSE of the actually measured reflectivity spectrum of the theoretical reflectivity spectrum; wherein
Wherein n is the number of wavelength points, RcaleAnd RmeasCalculating a reflectivity spectrum and measuring the reflectivity spectrum; the minimum value obtained by MSE can be used to judge whether the optimal R is obtainedcaleAnd RmeasAt this time RcaleThe corresponding thickness d is the thickness of the film to be measured.
2. The optical microscope film thickness meter capable of realizing local measurement according to claim 1, further comprising: the first connecting piece, the second connecting piece and the third connecting piece;
the image sensor (1) is connected with the first tube mirror (2) through the first connecting piece; the coaxial illuminator (4) is connected with the spectroscope (5) through the second connecting piece; the spectroscope (5) is connected with the objective lens converter (6) through the third connecting piece.
3. The optical microscope film thickness meter capable of realizing local measurement according to claim 1, further comprising: a fiber pitch adjustment mechanism (16);
the second tube mirror (12) is connected with the spectroscope (5) through the optical fiber pitch adjusting mechanism (16).
4. The optical microscope film thickness meter capable of realizing local measurement according to claim 3, wherein the optical fiber pitch adjusting mechanism (16) comprises: the optical fiber adjusting device comprises an optical fiber adjusting top plate (162), an optical fiber adjusting bottom plate (161), an adjusting spring and an adjusting bolt;
the optical fiber adjusting top plate (162) and the optical fiber adjusting bottom plate (161) are vertically arranged; one side of the optical fiber adjusting bottom plate (161) is fixedly connected with the spectroscope (5), and the optical fiber adjusting top plate (162) is arranged on the outer side of the optical fiber adjusting bottom plate (161);
the adjusting bolt is arranged on the outer side of the optical fiber adjusting top plate (162), and the threaded end of the adjusting bolt penetrates through the optical fiber adjusting top plate (162) and the optical fiber adjusting bottom plate (161); the adjusting bolts are respectively arranged at four directions of the outer side of the optical fiber adjusting top plate (162) from top to bottom and from left to right;
the adjusting spring is arranged between the optical fiber adjusting top plate (162) and the optical fiber adjusting bottom plate (161), one end of the adjusting spring is connected with the inner side of the optical fiber adjusting top plate (162), and the other end of the adjusting spring is connected with the inner side of the optical fiber adjusting bottom plate (161).
5. The optical microscopic film thickness meter capable of realizing local measurement according to claim 1, wherein the image sensor (1) is an industrial camera.
6. The optical microscope film thickness instrument capable of realizing local measurement according to claim 1, wherein the rack assembly comprises: the device comprises a rack base (14), a rack vertical plate (10), a rack cross beam (11), a three-axis movement mechanism (9), a sample table (8), an adsorption structure and an air pump;
the lower end of the vertical plate (10) of the rack is fixedly connected with the upper end of the base (14) of the rack; the rack cross beam (11) is arranged above the rack base (14), and one end of the rack cross beam (11) is fixedly connected with the rack vertical plate (10);
the three-axis movement mechanism (9) is fixed on the rack base (14), and the sample table (8) is fixed on the three-axis movement mechanism (9); the adsorption structure is connected with an adsorption hole formed in the sample table (8); the adsorption structure is connected with the air pump, and a switch valve is arranged on a pipeline between the adsorption structure and the air pump.
7. The optical microscope film thickness instrument capable of realizing local measurement according to claim 6, further comprising: a reinforcing rib (13);
the reinforcing ribs (13) are fixedly connected with the rack base (14) and the rack vertical plate (10) respectively.
8. The optical microscopic film thickness instrument capable of realizing local measurement according to any one of claims 1-7, wherein the magnification of the objective lens (7) is 50 times; the focal length of the first tube mirror (2) and the second tube mirror (12) is 200 mm.
9. Optical microscopic film thickness instrument capable of realizing local measurement according to any one of claims 1-7, wherein the core diameter of the optical fiber (17) is 200-500 μm.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103760655A (en) * | 2014-01-23 | 2014-04-30 | 中国科学院上海光学精密机械研究所 | Two-dimension angular adjustment mechanism with high bearing capacity |
| CN105066889A (en) * | 2015-09-01 | 2015-11-18 | 武汉颐光科技有限公司 | A portable thin film thickness measuring device and a film thickness measuring method thereof |
| CN106441126A (en) * | 2016-10-26 | 2017-02-22 | 电子科技大学 | Method and system for measuring optical film thicknesses based on reflectivity spectra |
| CN109540004A (en) * | 2018-11-29 | 2019-03-29 | 中国科学院微电子研究所 | Optical detection system and detection method thereof |
| CN109781015A (en) * | 2019-01-03 | 2019-05-21 | 西安交通大学 | A kind of method of Spectral Confocal line scanning rapid survey body surface step |
| CN209246953U (en) * | 2019-01-25 | 2019-08-13 | 奥谱天成（厦门）光电有限公司 | A kind of full spectrum measured film thickness instrument |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190296406A1 (en) * | 2018-03-23 | 2019-09-26 | Sf Motors, Inc. | In-situ ellipsometry for electric vehicle battery cell lithium plating characterization |
-
2019
- 2019-12-26 CN CN201911373049.0A patent/CN111121652B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103760655A (en) * | 2014-01-23 | 2014-04-30 | 中国科学院上海光学精密机械研究所 | Two-dimension angular adjustment mechanism with high bearing capacity |
| CN105066889A (en) * | 2015-09-01 | 2015-11-18 | 武汉颐光科技有限公司 | A portable thin film thickness measuring device and a film thickness measuring method thereof |
| CN106441126A (en) * | 2016-10-26 | 2017-02-22 | 电子科技大学 | Method and system for measuring optical film thicknesses based on reflectivity spectra |
| CN109540004A (en) * | 2018-11-29 | 2019-03-29 | 中国科学院微电子研究所 | Optical detection system and detection method thereof |
| CN109781015A (en) * | 2019-01-03 | 2019-05-21 | 西安交通大学 | A kind of method of Spectral Confocal line scanning rapid survey body surface step |
| CN209246953U (en) * | 2019-01-25 | 2019-08-13 | 奥谱天成（厦门）光电有限公司 | A kind of full spectrum measured film thickness instrument |
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