CN111100333B - Hollow PMMA @ SiO2Light diffusing agent, PC light diffusing plate and preparation method - Google Patents
Hollow PMMA @ SiO2Light diffusing agent, PC light diffusing plate and preparation method Download PDFInfo
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Abstract
The invention relates to hollow PMMA @ SiO2Light diffusant, PC light diffusion plate and preparation method, wherein the light diffusant is PMMA-SiO composite2Hollow ball, PMMA coated on surface modified hollow SiO2A surface; the PC light diffusion plate takes PC as a matrix and is hollow PMMA @ SiO2The light diffusant is dispersed in the PC matrix; when preparing the PC light diffusion plate, firstly preparing hollow SiO2And by silylating the hollow SiO2Then in the alkylation of hollow SiO2Coating PMMA on the surface to obtain hollow PMMA @ SiO2Light diffusant, and then mixing PC and hollow PMMA @ SiO according to the proportion2Mixing the light diffusion agent and the antioxidant, melting and uniformly mixing, and tabletting to obtain the PC light diffusion plate. Compared with the prior art, the light diffusion plate provided by the invention not only improves the light diffusion effect and the light effect uniformity of the light diffusion plate; and has high haze and enhanced light efficiency.
Description
Technical Field
The invention belongs to the technical field of polymer composite materials, relates to a light diffusion composite material, and particularly relates to a light diffusion composite materialHollow PMMA @ SiO2Light diffusion agent, PC light diffusion plate and preparation method.
Background
The light diffusion composite material has certain transparency and strong light scattering property, and is a good light source composite material. The light diffusing agent mainly includes an inorganic light diffusing agent and an organic light diffusing agent. The inorganic light diffusant mainly comprises: nano barium sulfate, calcium carbonate, silica, etc., which can refract light several times through the surface of the fine particles to achieve the effect of light diffusion, i.e., light homogenization, but can affect brightness or light transmission.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a hollow PMMA @ SiO2Light diffusion agent, PC light diffusion plate and preparation method. With appropriate PMMA @ SiO2The light diffusant and PC (polycarbonate) are melted and blended, so that the light diffusivity of the PC board is improved, the light scattering and transmission are increased, and the light is softer and more attractive. The PC light diffusion plate has light diffusibility, high light transmittance and high haze.
The applicants have found that the inability of light to pass through the solid spheres affects the transmission of much light for inorganic light diffusers, with only a portion of the light passing through refraction, thus affecting brightness or transmission.
In the invention, the light diffusant adopts hollow silicon dioxide pellets (hollow SiO)2) Light can carry out numerous times of photorefractive through the surface of hollow silica pellet and reach the photodiffusion be even effect of light, and this hollow silica can be seen through to light simultaneously, improves luminance and light transmissivity.
Polymethyl methacrylate (PMMA), commonly known as organic glass, has excellent optical properties, insulating properties, processability and weather resistance. PMMA has very low birefringence, is the most excellent high-molecular transparent material at present, has the light transmittance of 92 percent and is higher than the transmittance of glass. PMMA has small specific gravity, high anti-fragmentation capability, good insulativity and mechanical strength and excellent corrosion resistance. Under the condition of irradiating ultraviolet light, PMMA has better stability compared with polycarbonate.
Polycarbonate (abbreviated as PC) is a high molecular polymer containing carbonate groups in molecular chains, and PC is an almost colorless amorphous polymer in a glassy state and has good optical properties. The PC plate has high strength, fatigue resistance, stable size and small creep (the PC plate is rarely changed under the high-temperature condition), and can be used for automobiles, airplane windshield glass, corrugated plates, folded plates, building window glass, ceiling glass of sports facilities and the like. In the existing preparation of the light diffusion material, no relevant report that PMMA @ SiO2-PC is combined to form a new composite material exists.
The purpose of the invention can be realized by the following technical scheme:
the invention provides a hollow PMMA @ SiO2The light diffusion agent is PMMA-SiO composite2Hollow ball, PMMA coated on surface modified hollow SiO2A surface.
Preferably, the SiO is hollow2The surface modification of (A) is alkylation surface modification, hollow SiO2The particle size of (D) is 400-800 nm.
The invention provides a PC light diffusion plate which takes polycarbonate as a matrix, and the hollow PMMA @ SiO2The light diffuser is dispersed in the polycarbonate matrix.
Preferably, the light diffusion plate is made of hollow PMMA @ SiO2The light diffusion agent, the antioxidant and the polycarbonate are prepared according to the weight ratio of 0.01-2:0.2: 100.
Further preferably, the light diffusion plate is made of hollow PMMA @ SiO2The light diffusion agent, the antioxidant and the polycarbonate are prepared according to the weight ratio of 0.05-1.4:0.2: 100.
The third aspect of the present invention provides a method for preparing the PC light diffusion plate, wherein the method comprises the steps of firstly preparing hollow SiO2And by silylating the hollow SiO2Then in the alkylation of hollow SiO2Coating PMMA on the surface to obtain hollow PMMA @ SiO2Light diffusant, and then polycarbonate and hollow PMMA @ SiO are mixed according to the proportion2And mixing the light diffusion agent and the antioxidant, uniformly melting and mixing, and tabletting to obtain the PC light diffusion plate.
Preferably, the method comprises the following steps:
(1) under the condition of stirring at room temperature, uniformly stirring the mixed solution of water and ethanol and hexadecyl trimethyl ammonium bromide, slowly dropwise adding ammonia water and the mixed solution of tetraethoxysilane and gamma-aminopropyl triethoxysilane, reacting, washing and drying to prepare hollow silicon dioxide pellets, namely the hollow SiO2；
(2) Taking the hollow SiO2Dissolving in toluene, adding silane coupling agent, ultrasonic treating, reacting at 110-130 deg.C, standing, washing, and drying to obtain alkylated hollow SiO2；
(3) Taking the alkylated hollow SiO2Dissolving in water, adding sodium dodecyl sulfate, nonylphenol polyoxyethylene ether and isopropanol, slowly dripping the mixed solution of MMA and 0.1-0.5% of KSP at 70-80 ℃, reacting at 75-85 ℃, washing and drying to obtain hollow PMMA @ SiO2A light diffusing agent;
(4) taking hollow PMMA @ SiO according to the proportion2Mixing the light diffusion agent, the polycarbonate and the antioxidant, stirring by an internal mixer, controlling the temperature of the materials to be 240-250 ℃, uniformly stirring, tabletting by a tabletting machine, and forming at the temperature of 250-300 ℃ to obtain the PC light diffusion plate.
Preferably, in the step (1), the volume ratio of water to ethanol in the mixed solution of water and ethanol is 1:1-1: 3. Further preferably, the water and ethanol are in a volume ratio of 1: 1.
Preferably, in step (1), the volume ratio of tetraethoxysilane to gamma-aminopropyltriethoxysilane is from 1:2 to 2: 1. Further preferably, the volume ratio of tetraethoxysilane and gamma-aminopropyltriethoxysilane is 2: 1.
Preferably, in the step (1), the ratio of the amount of the mixed solution of water and ethanol to the amount of the mixed solution of cetyltrimethylammonium bromide, ammonia, tetraethoxysilane and gamma-aminopropyltriethoxysilane used is 20-80ml:0.02-0.12g:0.3-0.8ml:1.0-2.0 ml. Further preferably, in the step (1), the ratio of the amount of the mixed solution of water and ethanol to the amount of the mixed solution of cetyltrimethylammonium bromide, ammonia, tetraethoxysilane and gamma-aminopropyltriethoxysilane used is 40ml:0.08g:0.5ml:1.5 ml.
Preferably, in step (1), the reaction time is 6 h.
Preferably, in the step (2), the silane coupling agent comprises 3-methacryloxypropyltrimethoxysilane. Other silane coupling agents may also be used.
Preferably, in step (2), the SiO is hollow2And toluene in a ratio of 1g:150-250 ml. Further preferably, the hollow SiO2The amount of toluene used was 1g to 200 ml.
Preferably, in the step (2), the volume of the silane coupling agent is 0.5 to 15% of the volume of the toluene.
Preferably, in the step (2), the ultrasonic time is 10 min.
Preferably, in the step (2), the reaction time is 4 hours, and the standing time is 24 hours.
Preferably, in step (2), the washing is with acetone.
Preferably, in the step (3), the mass ratio of the sodium dodecyl sulfate to the polyoxyethylene nonyl phenyl ether is 2: 1.
Preferably, in step (3), the sodium dodecyl sulfate is alkylated hollow SiO22-4% of the mass. Further preferably, the sodium lauryl sulfate is alkylated hollow SiO23% by mass.
Preferably, in step (3), the nonylphenol polyoxyethylene ether is alkylated hollow SiO21-2% of the mass. Further preferably, the nonylphenol polyoxyethylene ether is alkylated hollow SiO21.5% of the mass.
Preferably, in step (3), MMA is reacted with the alkylated hollow SiO2The mass ratio is 1:1-5: 1. Further preferably, MMA is alkylated with hollow SiO2The mass ratio is 3: 1.
Preferably, in step (3), water is mixed with the alkylated hollow SiO2The ratio of the amount of (A) to (B) is 75-115ml to 1 g. Further preferably, water is mixed with the alkylated hollow SiO2The amount of (2) is 95ml to 1 g.
Preferably, in step (3), isopropanol is alkylatedHollow SiO2The mass ratio of (a) to (b) is 2: 1.
Preferably, in step (3), 0.1% -0.5% of KSP is reacted with alkylated hollow SiO2The ratio of the amount of (A) to (B) is 3-8ml to 1 g. Further preferably, 0.2% KSP is used and is reacted with alkylated hollow SiO2The amount of (2) is 5ml to 1 g.
Preferably, in step (3), the reaction time is 1 h.
Preferably, in the step (3), under the condition of 75 ℃ of water bath, a mixed solution of MMA and 0.1% -0.5% of KSP is slowly added dropwise, and the reaction is carried out under the condition of 80 ℃.
Preferably, in the step (4), the material temperature is controlled to be 250 ℃ and the forming temperature is controlled to be 280 ℃ during the stirring process of the internal mixer.
Compared with the prior art, in the invention, PMMA @ SiO2When the light is uniformly dispersed in a PC matrix, the light can be refracted for countless times through the surfaces of the hollow silica spheres when passing through the PC light diffusion plate to achieve the effect of light diffusion, namely light homogenization, and meanwhile, the light can pass through the hollow silica, so that the brightness and the light transmittance are improved; PMMA @ SiO2The light diffusion plate has the characteristics of scraping resistance, corrosion resistance, weather resistance, good insulativity and the like of PMMA, and the light diffusion effect and the light efficiency uniformity of the PC light diffusion plate are greatly improved by the hollow silicon dioxide; therefore, the thickness of the plate is reduced, the material cost is reduced, the problems of low haze and high light transmittance of raw materials are solved, and the effects of energy conservation and high efficiency are achieved. The optimal light diffusion plate has the haze of 92.4% and the light transmittance of 82.3%.
Drawings
FIG. 1 shows the haze and transmittance of different light diffuser plates.
Detailed Description
The invention is described in detail below with reference to the figures and specific embodiments.
Example 1
40ml of a mixture of water and ethanol (volume range of mixture: 20 to 80 ml; preferably: 40 ml; water: ethanol ═ 1:1, as exemplified below: 40ml) and 0.08g of cetyltrimethylammonium bromide (range: 0.02 to 0.12 g; preferably: 0.08g1, as exemplified below: 40ml) were added to a beaker with stirring at 25 ℃0.08g), stirring evenly, slowly dripping 0.5ml of ammonia water (the range is 0.3-0.8 ml; preferably: 0.5ml, selected as an example below, 0.5ml), lml tetraethoxysilane and 0.5ml of a mixed solution of γ -aminopropyltriethoxysilane (mixed solution range: 1.0-2.0 ml; preferably: 1.5 ml; the volume ratio is 2:1, the following examples are 1.5ml), the reaction is carried out for 6h, and the hollow silica spheres (hollow SiO) are prepared by washing and drying2) (ii) a The above 1g of hollow silica beads were dissolved in 200ml of toluene (range: 150:. about.250 ml; preferably: 200 ml; in the following example: 200ml), 2.1ml of 3-methacryloxypropyltrimethoxysilane (range: 1.4-2.8 ml; preferably: 2.1 ml; in the following example: 2.1ml) was added, the mixture was subjected to ultrasonic treatment for 10min, subjected to oil bath at 120 ℃ for 4 hours, allowed to stand for 24 hours, washed with acetone and dried to obtain alkylated silica beads (alkylated hollow SiO. RTM. beads)2) (ii) a Then 1g of the prepared alkylated silica pellets is weighed and dissolved in 95ml of water (range: 75-115 ml; preferably: 95 ml; hereinafter, referred to as example: 95ml), 0.03g of sodium dodecyl sulfate, 0.015g of nonylphenol polyoxyethylene ether and 2g of isopropanol are added, a mixture of 3g of MMA (mass range: 1g-5 g; preferably: 3 g; hereinafter, referred to as example: 75 ℃) and 5ml of 0.2% of KSP (volume range: 3-8 ml; preferably: 5 ml; hereinafter, referred to as example: 0.1-0.5% of KSP) is slowly added dropwise in a water bath at 75 ℃ (range: 70-80 ℃, preferably: 75 ℃, hereinafter, referred to as example: 75 ℃) and reacted for 1 hour at 80 ℃ (range: 75-85 ℃, preferably: 80 ℃, hereinafter, referred to as example: 80 ℃), and the mixture is washed, Drying to obtain the product PMMA @ SiO2(hollow PMMA @ SiO)2A light diffusing agent). Hollow PMMA @ SiO2Hollow SiO in light diffusing agents2The particle size is preferably 400-800 nm.
Example 2
Under the condition of stirring at 25 ℃, adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:2) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker, uniformly stirring, slowly dropwise adding a mixed solution (volume ratio is 2:1) of 0.5ml of ammonia water, lml tetraethoxysilane and 0.5ml of gamma-aminopropyl triethoxysilane, reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving the above 1g hollow silica spheres in 200ml toluene, adding 2.1ml 3-methacryloxypropyltrimethoxysilaneCarrying out ultrasonic treatment for 10min, carrying out oil bath for 4h at the temperature of 120 ℃, standing for 24h, washing and drying with acetone to obtain alkylated silicon dioxide pellets; weighing 1g of the prepared alkylated silica spheres, dissolving in 95ml of water, adding 0.03g of sodium dodecyl sulfate, 0.015g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
Example 3
Under the condition of stirring at 25 ℃, adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:3) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker, uniformly stirring, slowly dropwise adding a mixed solution (volume ratio is 2:1) of 0.5ml of ammonia water, l ml of tetraethoxysilane and 0.5ml of gamma-aminopropyl triethoxysilane, reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving the 1g of hollow silica spheres in 200ml of toluene, adding 2.1ml of 3-methacryloxypropyltrimethoxysilane, performing ultrasonic treatment for 10min, performing oil bath for 4h at the temperature of 120 ℃, standing for 24h, washing and drying with acetone to obtain alkylated silica; weighing 1g of the prepared alkylated silica spheres, dissolving in 95ml of water, adding 0.03g of sodium dodecyl sulfate, 0.015g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
Example 4
Adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:2) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker under the condition of stirring at 25 ℃, uniformly stirring, slowly dropwise adding a mixed solution of 0.5ml of ammonia water, 0.5ml of tetraethoxysilane and 1.0ml of gamma-aminopropyl triethoxysilane (volume ratio is 1:2), reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving the hollow silica spheres 1g in toluene 200ml, adding 3-methacryloxypropyltrimethoxysilane 2.1ml, performing ultrasonic treatment for 10min, performing oil bath at 120 ℃ for 4h, standing for 24h, washing with acetone, and drying to obtain the alkylated dioxideSilicon beads; weighing 1g of the prepared alkylated silica spheres, dissolving in 95ml of water, adding 0.03g of sodium dodecyl sulfate, 0.015g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
Example 5
Adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:2) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker under the condition of stirring at 25 ℃, uniformly stirring, slowly dropwise adding a mixed solution of 0.5ml of ammonia water, 1.0ml of tetraethoxysilane and 0.5ml of gamma-aminopropyl triethoxysilane (volume ratio is 2:1), reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving the hollow silica spheres 1g in toluene 200ml, adding other silane coupling agents (vinyl triethoxysilane, vinyl trimethoxy silane, etc.) 2.1ml, performing ultrasonic treatment for 10min, performing oil bath at 120 ℃ for 4h, standing for 24h, washing with acetone, and drying to obtain alkylated silica spheres; weighing 1g of the prepared alkylated silica spheres, dissolving in 95ml of water, adding 0.03g of sodium dodecyl sulfate, 0.015g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
Example 6
Under the condition of stirring at 25 ℃, adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:2) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker, uniformly stirring, slowly dropwise adding a mixed solution (volume ratio is 1:2) of 0.5ml of ammonia water, l ml of tetraethoxysilane and 0.5ml of gamma-aminopropyl triethoxysilane, reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving the 1g of hollow silica spheres in 200ml of toluene, adding 2.1ml of 3-methacryloxypropyltrimethoxysilane, performing ultrasonic treatment for 10min, performing oil bath for 4h at the temperature of 120 ℃, standing for 24h, washing and drying with acetone to obtain alkylated silica; then the prepared alkylated silicon dioxide pellets are weighedDissolving 1g of the mixture in 95ml of water, adding 0.02g of sodium dodecyl sulfate, 0.01g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
Example 7
Under the condition of stirring at 25 ℃, adding 40ml of a mixed solution of water and ethanol (water: ethanol is 1:2) and 0.08g of hexadecyl trimethyl ammonium bromide into a beaker, uniformly stirring, slowly dropwise adding a mixed solution (volume ratio is 1:2) of 0.5ml of ammonia water, l ml of tetraethoxysilane and 0.5ml of gamma-aminopropyl triethoxysilane, reacting for 6 hours, washing and drying to prepare hollow silica spheres; dissolving 1g of the hollow silica in 200ml of toluene, adding 2.1ml of 3-methacryloxypropyltrimethoxysilane, performing ultrasonic treatment for 10min, performing oil bath for 4h at 120 ℃, standing for 24h, washing with acetone and drying to obtain alkylated silica; weighing 1g of the prepared alkylated silica spheres, dissolving in 95ml of water, adding 0.04g of sodium dodecyl sulfate, 0.02g of nonylphenol polyoxyethylene ether and 2g of isopropanol, slowly dropwise adding a mixed solution of 3g of MMA and 5ml of 0.2% of KSP in a water bath at 75 ℃, reacting for 1h at 80 ℃, washing and drying to obtain a product PMMA @ SiO2。
PMMA@SiO2-PC light diffuser plate and examples 8-14
Example 8
Mixing 40g of PC and 0.08g of antioxidant, uniformly mixing, transferring to an internal mixer for stirring, controlling the temperature of materials to be 250 ℃, uniformly stirring, cutting particles, tabletting by using a tablet press, forming at 280 ℃, and finally preparing the PC light diffusion plate, wherein the PC light diffusion plate is numbered: and (3) a PC.
Example 9
PMMA @ SiO prepared in example 22Weighing 0.02g and 0.08g of antioxidant for pre-dispersion, adding 40g of PC, transferring to an internal mixer for stirring, controlling the temperature of the materials to be 250 ℃, uniformly stirring, cutting particles, tabletting by using a tabletting machine, and finally preparing PMMA @ SiO by the shaping temperature of 280 DEG C2PC light diffuser plate, no: PC-0.05% -PMMA @ SiO2。
Example 10
PMMA @ SiO prepared in example 22Weighing 0.08g of PMMA @ SiO2Pre-dispersing with 0.08g antioxidant, adding 40g PC, transferring into an internal mixer, stirring, controlling the temperature of the material at 250 ℃, uniformly stirring, cutting, tabletting by a tabletting machine, and forming at 280 ℃ to finally obtain PMMA @ SiO2PC light diffuser plate, no: PC-0.2% -PMMA @ SiO2。
Example 11
PMMA @ SiO prepared in example 22Weighing 0.16g of PMMA @ SiO2Pre-dispersing with 0.08g antioxidant, adding 40g PC, transferring into an internal mixer, stirring, controlling the temperature of the material at 250 ℃, uniformly stirring, cutting into granules, tabletting by a tabletting machine, and forming at 280 ℃ to finally obtain PMMA @ SiO2PC light diffuser plate, no: PC-0.4% -PMMA @ SiO2。
Example 12
PMMA @ SiO prepared in example 22Weighing 0.32g of PMMA @ SiO2Pre-dispersing with 0.08g antioxidant, adding 40g PC, transferring into an internal mixer, stirring, controlling the temperature of the material at 250 ℃, uniformly stirring, cutting into granules, tabletting by a tabletting machine, and forming at 280 ℃ to finally obtain PMMA @ SiO2PC light diffuser plate, no: PC-0.8% -PMMA @ SiO2。
Example 13
PMMA @ SiO prepared in example 22Weighing 0.4g of PMMA @ SiO2Pre-dispersing with 0.08g antioxidant, adding 40g PC, transferring into an internal mixer, stirring, controlling the temperature of the material at 250 ℃, uniformly stirring, cutting into granules, tabletting by a tabletting machine, and forming at 280 ℃ to finally obtain PMMA @ SiO2PC light diffuser plate, no: PC-1.0% -PMMA @ SiO2。
Example 14
PMMA @ SiO from example 22Weighing 0.56g of PMMA @ SiO2Pre-dispersing with 0.08g antioxidant, adding 40g PC, transferring into an internal mixer, stirring, controlling the temperature of the materials at 250 deg.C, stirring, cutting,tabletting with a tabletting machine, and finally preparing PMMA @ SiO at the forming temperature of 280 DEG C2PC light diffuser plate, no: PC-1.4% -PMMA @ SiO2。
Performance testing
Measured according to GB/T0-2008 using a light transmittance/haze meter (WGT-S, Saddy instruments, Zhejiang, Ltd.) according to American society for testing and materials Standard ASTM D003-61 (1997). The light transmittance and haze of the light diffuser plates (examples 8 to 14) were measured, and the thickness of the test sample was 2 mm. The test results are shown in table 1. FIG. 1 shows different PMMA @ SiO2Haze and transmittance of the PC light diffuser plate at contents.
TABLE 1
Example 15
This example is substantially the same as example 9 except that in this example, the PMMA @ SiO is hollow2The weight ratio of the light diffusant to the antioxidant to the polycarbonate is 0.01:0.2: 100.
Example 16
This example is substantially the same as example 9 except that in this example, the PMMA @ SiO is hollow2The light diffusant, the antioxidant and the polycarbonate are mixed according to the weight ratio of 2:0.2: 100.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (8)
1. A PC light diffusion plate is characterized in that the light diffusion plate takes polycarbonate as a matrix and is hollow PMMA @ SiO2The light diffusant is dispersed in a polycarbonate matrix, and the hollow PMMA @ SiO2The light diffusant is PMMA-SiO composite2Hollow ball, PMMA coated on surface modified hollow SiO2A surface;
the preparation method of the PC light diffusion plate comprises the steps of firstly preparing hollow SiO2And by silylating the hollow SiO2Then in the alkylation of hollow SiO2Coating PMMA on the surface to obtain hollow PMMA @ SiO2Light diffusant, and then polycarbonate and hollow PMMA @ SiO are mixed according to the proportion2And mixing the light diffusion agent and the antioxidant, uniformly melting and mixing, and tabletting to obtain the PC light diffusion plate.
2. The hollow PMMA @ SiO of claim 12The light diffusing agent is characterized in that the light diffusing agent is hollow SiO2The surface modification of (A) is alkylation surface modification, hollow SiO2The particle size of (D) is 400-800 nm.
3. The PC light diffuser plate of claim 1, wherein the light diffuser plate is made of hollow PMMA @ SiO2The light diffusion agent, the antioxidant and the polycarbonate are prepared according to the weight ratio of 0.01-2:0.2: 100.
4. The method of preparing a PC light diffuser plate as claimed in claim 1, wherein the hollow SiO is prepared first2And by silylating the hollow SiO2Then in the alkylation of hollow SiO2Coating PMMA on the surface to obtain hollow PMMA @ SiO2Light diffusant, and then polycarbonate and hollow PMMA @ SiO are mixed according to the proportion2And mixing the light diffusion agent and the antioxidant, uniformly melting and mixing, and tabletting to obtain the PC light diffusion plate.
5. The method of manufacturing a PC light diffuser plate according to claim 4, comprising the steps of:
(1) under the condition of stirring at room temperature, uniformly stirring the mixed solution of water and ethanol and hexadecyl trimethyl ammonium bromide, slowly dropwise adding ammonia water and the mixed solution of tetraethoxysilane and gamma-aminopropyl triethoxysilane, reacting, washing and drying to prepare hollow silicon dioxide pellets, namely the hollow SiO2；
(2) Taking the hollow SiO2Dissolving in toluene, adding silane coupling agent, ultrasonic treating, reacting at 110-130 deg.C, standing, washing, and drying to obtain alkylated hollow SiO2；
(3) Taking the alkylated hollow SiO2Dissolving in water, adding sodium dodecyl sulfate, nonylphenol polyoxyethylene ether and isopropanol, slowly dripping the mixed solution of MMA and 0.1-0.5% of KSP at 70-80 ℃, reacting at 75-85 ℃, washing and drying to obtain hollow PMMA @ SiO2A light diffusing agent;
(4) taking hollow PMMA @ SiO according to the proportion2Mixing the light diffusion agent, the polycarbonate and the antioxidant, stirring by an internal mixer, controlling the temperature of the materials to be 240-250 ℃, uniformly stirring, tabletting by a tabletting machine, and forming at the temperature of 250-300 ℃ to obtain the PC light diffusion plate.
6. The method for manufacturing a PC light diffuser plate as recited in claim 5, wherein the step (1) includes any one or more of the following conditions:
(1-1) in the mixed solution of water and ethanol, the volume ratio of the water to the ethanol is 1:1-1: 3;
(1-2) the volume ratio of tetraethoxysilane to gamma-aminopropyltriethoxysilane is 1:2-2: 1;
(1-3) the ratio of the amount of the mixed solution of water and ethanol to the amount of the mixed solution of cetyltrimethylammonium bromide, ammonia water, tetraethoxysilane and gamma-aminopropyltriethoxysilane used is 20-80ml:0.02-0.12g:0.3-0.8ml:1.0-2.0 ml;
(1-4) the reaction time was 6 hours.
7. The method for manufacturing a PC light diffuser plate as recited in claim 5, wherein the step (2) includes any one or more of the following conditions:
(2-1) the silane coupling agent includes 3-methacryloxypropyltrimethoxysilane;
(2-2) hollow SiO2And toluene in a ratio of 1g to 150-250 ml;
(2-3) the volume of the silane coupling agent is 0.5-15% of that of the toluene;
(2-4) the ultrasonic time is 10 min;
(2-5) the reaction time is 4 hours, and the standing time is 24 hours;
and (2-6) washing by using acetone.
8. The method for manufacturing a PC light diffuser plate as recited in claim 5, wherein the step (3) includes any one or more of the following conditions:
(3-1) the mass ratio of the sodium dodecyl sulfate to the polyoxyethylene nonyl phenyl ether is 2: 1;
(3-2) sodium dodecyl sulfate as alkylated hollow SiO22-4% of the mass;
(3-3) Polyoxyethylene nonyl phenyl Ether as alkylated hollow SiO21% -2% of the mass;
(3-4) MMA and alkylated hollow SiO2The mass ratio is 1:1-5: 1;
(3-5) Water and alkylated hollow SiO2The usage amount ratio of (1) to (75-115) ml;
(3-6) Isopropanol with alkylated hollow SiO2The mass ratio of (A) to (B) is 2: 1;
(3-7) 0.1% -0.5% of KSP and alkylated hollow SiO2The usage amount ratio of (1) is 3-8ml:1 g;
(3-8) the reaction time is 1 h.
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| WO2007037202A1 (en) * | 2005-09-28 | 2007-04-05 | Sekisui Plastics Co., Ltd. | Silica-combined polymer particle, process for producing the same, and use thereof |
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| CN103064138A (en) * | 2012-12-28 | 2013-04-24 | 深圳大学 | Light diffusion materials and preparation method thereof |
| CN108697595A (en) * | 2016-02-29 | 2018-10-23 | 积水化成品工业株式会社 | Interior silica containing microcapsule resin particle, its production method and application thereof |
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| WO2007037202A1 (en) * | 2005-09-28 | 2007-04-05 | Sekisui Plastics Co., Ltd. | Silica-combined polymer particle, process for producing the same, and use thereof |
| CN101672935A (en) * | 2008-09-08 | 2010-03-17 | 达信科技股份有限公司 | Glare-resistance film and manufacture method |
| CN102993229A (en) * | 2012-12-19 | 2013-03-27 | 宁波工程学院 | Amphoteric electrolyte-modified hybrid silica gel material and solid-phase extraction method thereof |
| CN103064138A (en) * | 2012-12-28 | 2013-04-24 | 深圳大学 | Light diffusion materials and preparation method thereof |
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