CN110954508A - Method for measuring reflectance at opening of integrating sphere and method for absolute measurement of diffuse reflectance - Google Patents
Method for measuring reflectance at opening of integrating sphere and method for absolute measurement of diffuse reflectance Download PDFInfo
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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Abstract
The invention relates to the field of optics and provides a method for measuring the reflectance at an opening of an integrating sphere and a method for measuring the absolute reflectance of diffuse reflectance. The method for measuring the reflectance at the opening of the integrating sphere comprises the following steps: s01, obtaining the opening area ratio of two integrating spheres with different radiuses and same inner wall reflection ratio; s02, measuring the relative spectrum signals of the two integrating spheres by using a spectral photometric measuring device; s03, determining the internal wall reflectance represented by the spectral relative signals of the two integrating spheres and the opening area ratio of the two integrating spheres; and S04, determining the reflectance at the opening represented by the spectral relative signals of the two integrating spheres and the ratio of the opening areas of the two integrating spheres. According to the method for measuring the reflectance at the opening of the integrating sphere, the reflectance at the opening represented by the relative signals of the spectrums of the two integrating spheres is obtained by respectively measuring the relative signals of the spectrums of the two integrating spheres, so that the requirement on the uniformity of the surface of the integrating sphere in the measuring process can be reduced, and the measuring precision is improved.
Description
Technical Field
The invention relates to the field of optics, in particular to a method for measuring the reflectance at an opening of an integrating sphere and a method for absolutely measuring the diffuse reflectance.
Background
Diffuse reflectance is defined by the international bureau of metrology as one of six key physical quantities in the field of optical parameters, belonging to key comparative physical quantities, the accurate measurement of which is of paramount importance. For diffuse reflectance measurements, the measurement methods are broadly classified into relative measurement and absolute measurement, i.e., relative measurement using a reference standard sample (not limited to a plane) with a known absolute reflectance and an unknown or measured sample to obtain the reflectance of the measured sample. The accuracy of the reflectance depends heavily on the accuracy of the absolute reflectance of the reference sample. Whereas the absolute reflectance needs to be obtained by means of an absolute measurement method. There are currently three absolute measurement methods based on published literature.
The first method comprises the following steps: according to the sharp-Lit method, a single integrating sphere with a blocking screen inside is used for measuring the diffuse reflectance of a tested sample or material, the illumination of a certain point on the inner surface of the integrating sphere is sequentially measured when the blocking screen exists, and the diffuse reflectance of the tested sample or material can be calculated according to a correlation formula by combining the geometric size of the integrating sphere.
And the second method comprises the following steps: the Kott method utilizes the principle of an integrating sphere, a sample or a material to be detected is placed at the center of the integrating sphere, and the integrating sphere hemisphere performs diffusion illumination on the sample or the material to be detected. This method has an advantage in that it is free from complicated formula derivation, but has a disadvantage in that the integrating sphere increases in volume because the light source is placed inside the integrating sphere, and the temperature inside the sphere increases with the passage of time.
And the third is that: the auxiliary integrating sphere method, also called a double sphere method, utilizes an auxiliary integrating sphere and a diffuse reflection plate, respectively measures the spectral response of the auxiliary integrating sphere and the spectral response of the diffuse reflection plate, and calculates the absolute spectral diffuse reflection ratio of the diffuse reflection plate through a certain formula.
The first method and the second method require that the measured sample is planar, namely, the absolute reflectance of a planar material can be measured. The third method requires an auxiliary integrating sphere and a planar sample made by the same process, and can simultaneously measure the absolute reflectance of the plane and the sphere.
The three methods have a common disadvantage, and at least one of the methods is required to be a planar sample. Furthermore, the planar sample must have good surface uniformity, otherwise it has a significant effect on the accuracy of the measurement results.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art or the related art.
One of the objects of the invention is: the method for measuring the reflectance at the opening of the integrating sphere and the method for absolutely measuring the diffuse reflectance are provided, and the problem that the high-precision diffuse reflectance absolute measurement cannot be realized under the condition that the surface uniformity of a sample to be measured cannot be effectively guaranteed in the prior art is solved.
In order to achieve the object, the present invention provides a method for measuring reflectance at an opening of an integrating sphere, comprising:
s01, obtaining the opening area ratio of two integrating spheres with different radiuses and the same inner wall reflection ratio, wherein the opening area ratio is the ratio of the area of a corresponding spherical crown at the opening of the integrating sphere to the actual inner surface area of the integrating sphere;
s02, measuring the relative spectrum signals of the two integrating spheres by using a spectral photometric measuring device;
s03, determining the internal wall reflection ratio represented by the spectral relative signals of the two integrating spheres and the opening area ratio of the two integrating spheres based on the relationship among the spectral relative signals of the two integrating spheres, the opening area ratio and the internal wall reflection ratio;
and S04, determining the reflectance at the opening represented by the spectral relative signals of the two integrating spheres and the ratio of the opening areas of the two integrating spheres based on the relationship among the reflectance at the opening of the integrating spheres, the reflectance of the inner wall and the ratio of the opening areas.
In one embodiment, in S03:
calculating to obtain the inner wall reflectance rho;
two of the integrating spheres comprise a first integrating sphere and a second integrating sphere, QS1Is the spectral relative signal, f, of the first integrating sphere measured using the spectrophotometric measuring device in S021Is the ratio of the open area of the first integrating sphere, QS2Is the spectral relative signal, f, of the second integrating sphere measured using the spectrophotometric measuring device in S022Is the ratio of the open area of the second integrating sphere.
In one embodiment, in S04:
calculating to obtain the reflectance rho at the opening of the first integrating spheres1。
In one embodiment, in S04:
calculating to obtain the reflectance rho at the opening of the second integrating spheres2。
In one embodiment, in S02, the two integrating spheres are a first integrating sphere and a second integrating sphere;
and measuring the spectral relative signals of the first integrating sphere and the second integrating sphere by using a spectrophotometric measuring device with a detection integrating sphere.
In one embodiment, the light inlet and the light outlet of the detection integrating sphere and the opening of the integrating sphere are positioned on the same straight line, and the reflected light at the opening of the first integrating sphere or the second integrating sphere completely enters the detection integrating sphere;
the reflected light partially enters a detector of the spectrophotometric measuring device for detecting the integrating sphere in the first integrating sphere or the second integrating sphere.
In order to achieve the object, the present invention provides a method for absolute measurement of diffuse reflectance, comprising:
measuring the reflectance at the opening of the integrating sphere by adopting the measuring method;
and obtaining the diffuse reflection ratio of the detected sample based on the comparison between the detected sample and the integrating sphere.
In one embodiment, the step of obtaining the diffuse reflectance of the measured sample based on the comparison between the measured sample and the integrating sphere comprises:
measuring the spectral relative signal of the measured sample by adopting a spectral photometric measuring device;
and determining the diffuse reflection ratio of the measured sample based on the ratio of the spectral relative signal of the integrating sphere to the spectral relative signal of the measured sample and the ratio of the reflection ratio at the opening of the integrating sphere to the diffuse reflection ratio of the measured sample.
In one embodiment, the step of determining the diffuse reflectance of the measured sample based on a ratio between the spectral relative signal of the integrating sphere and the spectral relative signal of the measured sample, and a ratio between the reflectance at the opening of the integrating sphere and the diffuse reflectance of the measured sample, includes:
based on the formula:calculating the diffuse reflectance of the measured sampleAlternatively, the first and second electrodes may be,
For measuring the spectral relative signal of the measured sample by using the spectrophotometric measuring device,is the spectral relative signal of the first integrating sphere,is the reflectance at the opening of the first integrating sphere,is the spectral relative signal of the second integrating sphere,is the reflectance at the opening of the second integrating sphere.
In one embodiment, in the step of measuring the spectral relative signal of the measured sample by using the spectrophotometric measuring device, the spectrophotometric measuring device is the above-mentioned spectrophotometric measuring device.
The technical scheme of the invention has the following advantages: according to the method for measuring the reflection ratio at the opening of the integrating sphere, the two integrating spheres with different radiuses and the same inner wall reflection ratio are arranged, the relative spectrum signals of the two integrating spheres are respectively measured, and the reflection ratio at the opening represented by the relative spectrum signals of the two integrating spheres is finally obtained, so that the requirement on the uniformity of the integrating sphere in the measuring process can be reduced, and the measuring precision is improved.
In addition to the technical problems addressed by the present invention, the technical features constituting the technical solutions and the advantages brought by the technical features of the technical solutions described above, other technical features of the present invention and the advantages brought by the technical features of the technical solutions will be further explained with reference to the accompanying drawings.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a reflectance measurement method at an opening of an integrating sphere according to an embodiment of the present invention;
in the figure: 1: a detector; 2: a first integrating sphere; 3: a second integrating sphere; 4: a baffle plate; 5: incident light; 6: scattering light; 7: reflecting the light.
Detailed Description
The embodiments of the present invention will be described in further detail with reference to the drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example" or "some examples" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this description, a schematic representation of the above terms does not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "connected" and "connected" are to be interpreted broadly, e.g., as being fixed or detachable or integrally connected; can be mechanically or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Also, in the description of the present invention, unless otherwise specified, "a plurality", and "a plurality" mean two or more, and "several", and "several groups" mean one or more.
Referring to fig. 1, a method for measuring reflectance at an opening of an integrating sphere according to an embodiment of the present invention includes:
s01, obtaining the opening area ratio of two integrating spheres with different radiuses and the same inner wall reflection ratio, wherein the opening area ratio is the ratio of the area of a corresponding spherical crown at the opening of the integrating sphere to the actual inner surface area of the integrating sphere; wherein, the actual inner surface area of the integrating sphere is the remaining inner surface area except the opening or other gaps;
s02, measuring relative signals of the spectrums of the two integrating spheres by using a spectrophotometry measuring device, such as light intensity parameters;
s03, determining the internal wall reflection ratio represented by the spectral relative signals of the two integrating spheres and the opening area ratio of the two integrating spheres based on the relationship among the spectral relative signals of the two integrating spheres, the opening area ratio and the internal wall reflection ratio;
and S04, determining the reflectance at the opening represented by the spectral relative signals of the two integrating spheres and the ratio of the opening areas of the two integrating spheres based on the relationship among the reflectance at the opening of the integrating spheres, the reflectance of the inner wall and the ratio of the opening areas.
Here, S01 to S04 are only for convenience of description, and do not constitute a timing limitation on the steps of the reflectance measurement method at the opening of the integrating sphere. Likewise, the subsequent steps have no special requirements on timing without special description.
According to the method for measuring the reflectance at the opening of the integrating sphere, because the two integrating spheres with different radiuses and the same inner wall reflectance are arranged, the reflectance at the opening, which is represented by the relative signals of the spectrums of the two integrating spheres, is finally obtained by respectively measuring the relative signals of the spectrums of the two integrating spheres, so that the requirement on the uniformity of the integrating sphere in the measuring process can be reduced, and the measuring precision is improved.
According to the embodiment of the present invention, in S01, there is no particular requirement on the relationship between the radii of the two integrating spheres as long as the radii of the two integrating spheres are not equal, for example, the ratio between the radii of the two integrating spheres may be 1:2 to 1:10, and may be in other intervals. For each integrating sphere, the ratio of open area refers to: the opening of the integrating sphere corresponds to the ratio of the area of the spherical crown to the actual internal surface area. And the two integrating spheres are made of the same material and are obtained by the same processing technology, so that the same inner wall reflectance ratio of the two integrating spheres is ensured. In addition, the opening area ratio of the integrating sphere should not be too large to ensure its normal operation. In order to facilitate the distinction between the two integrating spheres having different radii, the integrating sphere having a smaller radius will be referred to as a first integrating sphere 2, and the integrating sphere having a larger radius will be referred to as a second integrating sphere 3.
According to the embodiment of the present invention, in S02, the specific type of the spectrophotometric measuring device is not limited as long as the relative spectral signals of the two integrating spheres can be accurately measured. For example, the main components of the spectrophotometric measuring device are a detection integrating sphere and a detector 1, and then the incident light 5 enters the integrating sphere to be measured (i.e. the first integrating sphere 2 or the second integrating sphere 3) from the light inlet and the light outlet of the detection integrating sphere based on the installation positions of the detection integrating sphere and the integrating sphere to be measured (the integrating spheres without limitation in the foregoing refer to the integrating spheres to be measured, i.e. different from the first integrating sphere and the second integrating sphere of the detection integrating sphere); the light is reflected at the opening of the integrating sphere to be measured and is received by the detection integrating sphere of the spectrophotometry measuring device until reaching the detector 1 to obtain an electric signal. Wherein the spectrophotometric measuring device may consist of only the detection integrating sphere and the detector 1, but of course the spectrophotometric measuring device may also comprise a light source or other components for emitting incident light 5.
For example, the light inlet, the light outlet, and the opening of the integrating sphere of the detection integrating sphere may be positioned on the same line, and the reflected light 7 at the opening of the integrating sphere may all enter the detection integrating sphere. In fig. 1, the light inlet and the light outlet of the detection integrating sphere and the opening of the integrating sphere are located on the same horizontal straight line, so as to facilitate the installation of the detection integrating sphere and the integrating sphere to be measured. Of course, the light inlet and the light outlet of the detection integrating sphere and the opening of the integrating sphere can be located on the same vertical line or on the same oblique line. Even, the light inlet and the light outlet of the detection integrating sphere and the opening of the integrating sphere may not be on the same straight line.
When the spectral photometry device with the detection integrating sphere is used for measuring the reflectance at the opening of the integrating sphere, the incident light 5 can be irradiated into the detection integrating sphere through the light inlet of the integrating sphere, the incident light 5 enters into the integrating sphere to be measured through the light outlet of the detection integrating sphere and the opening of the integrating sphere to be measured, the reflected light 7 is obtained at the opening of the integrating sphere to be measured, and the scattered light 6 is obtained inside the integrating sphere to be measured.
In fig. 1, a baffle 4 is provided between the detector 1 and the light outlet of the detection integrating sphere, thereby preventing reflected light 7 from directly entering the detector 1 in a straight line. It should be noted that the positions of the baffle 4 and the detector 1 may also be changed relative to the position of the light outlet, for example, the detector 1 may also be disposed at the lower part of the integrating sphere, and similarly, the baffle 4 may also be disposed at the lower part of the integrating sphere.
It should be noted that fig. 1 only shows a schematic diagram of the assembly relationship between the detection integrating sphere and the first integrating sphere 2, and the second integrating sphere 3 and the detection integrating sphere are in an unassembled state at this time. The arrow in fig. 1 indicates the position where second integrating sphere 3 can be replaced to first integrating sphere 2.
In S02, spectral relative signals of the first integrating sphere 2 and the second integrating sphere 3 are measured by a spectrophotometric measuring device, and the relative signals are measured without any order.
In one embodiment, in S03:
calculating to obtain the inner wall reflectance rho;
two said integrating spheres comprise a first integrating sphere and a second integrating sphereThe ball is a ball with a ball-shaped inner surface,is the spectral relative signal, f, of the first integrating sphere measured using the spectrophotometric measuring device in S021Is the ratio of the open area of the first integrating sphere,is the spectral relative signal, f, of the second integrating sphere measured using the spectrophotometric measuring device in S022Is the ratio of the open area of the second integrating sphere.
According to one embodiment of the present invention, in S03:
the relationship between the spectral relative signal, the open area ratio, and the internal wall reflectance of the first integrating sphere 2 is:
is the spectral relative signal of the first integrating sphere 2 measured by the spectral photometry device in S02, k is the detection response coefficient of the spectral photometry device in S02, f1Is the opening area ratio of the first integrating sphere 2, and rho is the inner wall reflectance;
the relationship between the spectral relative signal, the open area ratio, and the internal wall reflectance of second integrating sphere 3 is:
is the spectral relative signal of the second integrating sphere 3 measured by the spectral photometry device in S02, k is the detection response coefficient of the spectral photometry device in S02, f2The opening area ratio of the second integrating sphere 3, and rho is the inner wall reflectance;
In one embodiment, in S04:
According to one embodiment of the present invention, in S04:
the relation among the reflectance at the opening of the first integrating sphere 2, the internal wall reflectance and the opening area ratio is determined based on the integrating sphere theory as follows:
ρs1is the reflectance at the opening of the first integrating sphere 2;
in one embodiment, in S04:
The relation among the reflectance at the opening of the second integrating sphere 3, the internal wall reflectance and the opening area ratio is determined based on the integrating sphere theory as follows:
according to an embodiment of the present invention, there is provided a method of absolute measurement of diffuse reflectance, including:
s101, measuring the reflectance at the opening of the integrating sphere by adopting the measuring method;
s102, obtaining the diffuse reflection ratio of the detected sample based on the comparison between the detected sample and the integrating sphere.
In one embodiment, step S102 includes:
s1021, measuring the spectrum relative signal of the measured sample by adopting a spectral photometric measurement device;
and S1022, determining the diffuse reflection ratio of the detected sample based on the ratio of the spectral relative signal of the integrating sphere to the spectral relative signal of the detected sample and the ratio of the reflection ratio at the opening of the integrating sphere to the diffuse reflection ratio of the detected sample.
Further, step S1022 includes:
based on the formula:calculating the diffuse reflectance of the measured sampleAlternatively, the first and second electrodes may be,
For measuring the spectral relative signal of the measured sample by using the spectrophotometric measuring device,is the spectral relative signal of the first integrating sphere,is the reflectance at the opening of the first integrating sphere,is the spectral relative signal of the second integrating sphere,is the reflectance at the opening of the second integrating sphere.
Wherein when the reflectance at the opening of the first integrating sphere has been obtainedAnd the spectral relative signal of the first integrating sphere at the detector of the spectrophotometric measuring deviceAt the moment, the light is obtained by a detector of the spectrophotometric measuring deviceThe diffuse reflectance of the measured sample can be obtained
Similarly, when the reflectance at the opening of the second integrating sphere has been obtainedAnd the spectral relative signal of the second integrating sphere at the detector of the spectrophotometric measuring deviceAt the moment, the light is obtained by a detector of the spectrophotometric measuring deviceThe diffuse reflectance of the measured sample can be obtained
In S1021, the spectrophotometric measuring device may be the above-mentioned spectrophotometric measuring device for measuring the spectral relative signals of the first integrating sphere and the second integrating sphere. When the spectrophotometric measuring device comprises the detection integrating sphere, the sample to be measured only needs to be placed at the light outlet of the detection integrating sphere, and the incident light is ensured to penetrate through the light outlet and irradiate on the surface of the sample to be measured.
The measured sample can be an integrating sphere, certainly can also be a standard flat plate sample, and the specific structural form is not limited, so that the diffuse reflectance of the measured sample material in any structural form can be measured by the diffuse reflectance absolute measurement method provided by the embodiment of the invention.
The above embodiments are merely illustrative of the present invention and are not to be construed as limiting the invention. Although the present invention has been described in detail with reference to the embodiments, it should be understood by those skilled in the art that various combinations, modifications or equivalents may be made to the technical solution of the present invention without departing from the spirit and scope of the technical solution of the present invention, and the technical solution of the present invention is covered by the claims of the present invention.
Claims (10)
1. A method for measuring reflectance at an opening of an integrating sphere, comprising:
s01, obtaining the opening area ratio of two integrating spheres with different radiuses and the same inner wall reflection ratio, wherein the opening area ratio is the ratio of the area of a corresponding spherical crown at the opening of the integrating sphere to the actual inner surface area of the integrating sphere;
s02, measuring the relative spectrum signals of the two integrating spheres by using a spectral photometric measuring device;
s03, determining the internal wall reflection ratio represented by the spectral relative signals of the two integrating spheres and the opening area ratio of the two integrating spheres based on the relationship among the spectral relative signals of the two integrating spheres, the opening area ratio and the internal wall reflection ratio;
and S04, determining the reflectance at the opening represented by the spectral relative signals of the two integrating spheres and the ratio of the opening areas of the two integrating spheres based on the relationship among the reflectance at the opening of the integrating spheres, the reflectance of the inner wall and the ratio of the opening areas.
2. The method for measuring reflectance at an opening of an integrating sphere according to claim 1, wherein in S03:
calculating to obtain the inner wall reflectance rho;
the two integrating spheres comprise a first integrating sphere and a second integrating sphere,is the spectral relative signal, f, of the first integrating sphere measured using the spectrophotometric measuring device in S021Is the ratio of the open area of the first integrating sphere,is the spectral relative signal, f, of the second integrating sphere measured using the spectrophotometric measuring device in S022Is the ratio of the open area of the second integrating sphere.
5. The method according to any one of claims 1 to 4, wherein in the step S02, the two integrating spheres are a first integrating sphere and a second integrating sphere;
and measuring the spectral relative signals of the first integrating sphere and the second integrating sphere by using a spectrophotometric measuring device with a detection integrating sphere.
6. The method for measuring the reflectance at the opening of the integrating sphere according to claim 5, wherein the light inlet, the light outlet and the opening of the integrating sphere of the detection integrating sphere are positioned on the same straight line, and the reflected light at the opening of the first integrating sphere or the second integrating sphere is totally entered into the detection integrating sphere;
the reflected light partially enters a detector of the spectrophotometric measuring device for detecting the integrating sphere in the first integrating sphere or the second integrating sphere.
7. A method of absolute measurement of diffuse reflectance, comprising:
measuring reflectance at an opening of the integrating sphere by the measuring method according to any one of claims 1 to 6;
and obtaining the diffuse reflection ratio of the detected sample based on the comparison between the detected sample and the integrating sphere.
8. The method of absolute measurement of diffuse reflectance according to claim 7, wherein the step of obtaining the diffuse reflectance of the measured sample based on the comparison of the measured sample and the integrating sphere comprises:
measuring the spectral relative signal of the measured sample by adopting a spectral photometric measuring device;
and determining the diffuse reflection ratio of the measured sample based on the ratio of the spectral relative signal of the integrating sphere to the spectral relative signal of the measured sample and the ratio of the reflection ratio at the opening of the integrating sphere to the diffuse reflection ratio of the measured sample.
9. The method of absolute measurement of diffuse reflectance according to claim 8, wherein the step of determining the diffuse reflectance of the sample under test based on the ratio between the spectral relative signal of the integrating sphere and the spectral relative signal of the sample under test and the ratio between the reflectance at the opening of the integrating sphere and the diffuse reflectance of the sample under test comprises:
based on the formula:calculating the diffuse reflectance of the measured sampleAlternatively, the first and second electrodes may be,
For measuring the spectral relative signal of the measured sample by using the spectrophotometric measuring device,is the spectral relative signal of the first integrating sphere,is the reflectance at the opening of the first integrating sphere,is the spectral relative signal of the second integrating sphere,is the reflectance at the opening of the second integrating sphere.
10. A method for absolute measurement of diffuse reflectance according to claim 8, wherein in the step of measuring the relative signal of the spectrum of the sample under test with a spectrophotometric measuring device, the spectrophotometric measuring device is according to any one of claims 1-6.
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2665682Y (en) * | 2003-12-01 | 2004-12-22 | 中国科学院安徽光学精密机械研究所 | Diffuse reflection integral laser power energy measuring device |
TW200923337A (en) * | 2007-11-20 | 2009-06-01 | Ind Tech Res Inst | A reflectance measuring apparatus |
DE102009040642B3 (en) * | 2009-09-09 | 2011-03-10 | Von Ardenne Anlagentechnik Gmbh | Method and device for measuring optical characteristics of transparent, scattering measuring objects |
JP2011154047A (en) * | 2011-05-18 | 2011-08-11 | Shimadzu Corp | Instrument for measuring absolute reflectivity |
CN102539387A (en) * | 2011-12-28 | 2012-07-04 | 北京奥博泰科技有限公司 | Method and device for measuring glass reflectance |
CN102749306A (en) * | 2012-06-11 | 2012-10-24 | 中国科学院安徽光学精密机械研究所 | Bidirectional reflection distribution function (BRDF) absolute measure device |
US20170212047A1 (en) * | 2014-05-23 | 2017-07-27 | Hamamatsu Photonics K.K. | Optical measurement device and optical measurement method |
-
2019
- 2019-12-17 CN CN201911304782.7A patent/CN110954508B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2665682Y (en) * | 2003-12-01 | 2004-12-22 | 中国科学院安徽光学精密机械研究所 | Diffuse reflection integral laser power energy measuring device |
TW200923337A (en) * | 2007-11-20 | 2009-06-01 | Ind Tech Res Inst | A reflectance measuring apparatus |
DE102009040642B3 (en) * | 2009-09-09 | 2011-03-10 | Von Ardenne Anlagentechnik Gmbh | Method and device for measuring optical characteristics of transparent, scattering measuring objects |
JP2011154047A (en) * | 2011-05-18 | 2011-08-11 | Shimadzu Corp | Instrument for measuring absolute reflectivity |
CN102539387A (en) * | 2011-12-28 | 2012-07-04 | 北京奥博泰科技有限公司 | Method and device for measuring glass reflectance |
CN102749306A (en) * | 2012-06-11 | 2012-10-24 | 中国科学院安徽光学精密机械研究所 | Bidirectional reflection distribution function (BRDF) absolute measure device |
US20170212047A1 (en) * | 2014-05-23 | 2017-07-27 | Hamamatsu Photonics K.K. | Optical measurement device and optical measurement method |
Non-Patent Citations (3)
Title |
---|
PICKERING,JW ET AL.: "DOUBLE-INTEGRATING-SPHERE SYSTEM FOR MEASURING THE OPTICAL-PROPERTIES OF TISSUE", 《APPLIED OPTICS》 * |
胡威捷 等: "《现代颜色技术原理及应用》", 31 October 2007, 北京理工大学出版社 * |
许丹丹 等: "定向-半球光谱反射比的测量与分析", 《工程热物理学报》 * |
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