CN110880444B - 一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 - Google Patents
一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 Download PDFInfo
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- CN110880444B CN110880444B CN201911192401.0A CN201911192401A CN110880444B CN 110880444 B CN110880444 B CN 110880444B CN 201911192401 A CN201911192401 A CN 201911192401A CN 110880444 B CN110880444 B CN 110880444B
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- optical device
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- channel steel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32807—Construction (includes replacing parts of the apparatus)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32889—Connection or combination with other apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32908—Utilities
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
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Application Number | Priority Date | Filing Date | Title |
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CN201911192401.0A CN110880444B (zh) | 2019-11-28 | 2019-11-28 | 一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 |
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CN201911192401.0A CN110880444B (zh) | 2019-11-28 | 2019-11-28 | 一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 |
Publications (2)
Publication Number | Publication Date |
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CN110880444A CN110880444A (zh) | 2020-03-13 |
CN110880444B true CN110880444B (zh) | 2022-04-12 |
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CN201911192401.0A Active CN110880444B (zh) | 2019-11-28 | 2019-11-28 | 一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114879332B (zh) * | 2022-05-26 | 2023-08-18 | 星浪光学科技(江苏)有限公司 | 一种滤波片生产用智能无尘烘烤设备 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5090443B2 (ja) * | 2007-05-14 | 2012-12-05 | 株式会社アルバック | ドライエッチング方法 |
CN109310010B (zh) * | 2018-10-29 | 2019-12-20 | 南京溧航仿生产业研究院有限公司 | 一种具有自动清理及防误碰功能的智能蚀刻机 |
CN109371398A (zh) * | 2018-11-27 | 2019-02-22 | 胡旭燕 | 一种具有双面雕刻结构的可调节智能雕刻蚀刻设备 |
CN110113883B (zh) * | 2019-05-10 | 2024-04-02 | 无锡睿龙新材料科技有限公司 | 一种双面蚀刻装置 |
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CB03 | Change of inventor or designer information |
Inventor after: Zhu Qiaofen Inventor after: Zhang Ruoya Inventor after: Luo Yuehao Inventor after: Liu Xiuhong Inventor after: Zhang Lei Inventor after: Xi Sixing Inventor before: Zhu Qiaofen Inventor before: Liu Xiuhong Inventor before: Zhang Lei Inventor before: Xi Sixing |
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Application publication date: 20200313 Assignee: Hebei Rongzhong Information Technology Co.,Ltd. Assignor: HEBEI University OF ENGINEERING Contract record no.: X2023980041429 Denomination of invention: A device for continuous double-sided etching of optical devices based on plasma etching Granted publication date: 20220412 License type: Common License Record date: 20230907 |
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