CN110879111A - Flexible electrode supporting structure - Google Patents
Flexible electrode supporting structure Download PDFInfo
- Publication number
- CN110879111A CN110879111A CN201911188540.6A CN201911188540A CN110879111A CN 110879111 A CN110879111 A CN 110879111A CN 201911188540 A CN201911188540 A CN 201911188540A CN 110879111 A CN110879111 A CN 110879111A
- Authority
- CN
- China
- Prior art keywords
- flexible electrode
- electrode
- flexible
- supporting structure
- support structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000000956 alloy Substances 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 230000005489 elastic deformation Effects 0.000 abstract description 3
- 230000006835 compression Effects 0.000 description 11
- 238000007906 compression Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
- G01L1/142—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
Abstract
The invention discloses a flexible electrode supporting structure which is of a circular ring square wave structure and is arranged at a step of a flexible electrode shell for supporting a ceramic fixed electrode and adjusting the capacitance distance between the ceramic fixed electrode and a metal moving electrode. The flexible electrode supporting structure provided by the invention adopts a circular square wave structure, and in a high-precision film sensor, the flexible electrode supporting structure is used as a connecting medium, so that mechanical hysteresis caused by different thermal expansion coefficients of ceramic and metal is absorbed and released through elastic deformation when the temperature changes, and the mechanical hysteresis caused by different thermal expansion coefficients of a metal moving electrode and a ceramic fixed electrode can be effectively avoided.
Description
Technical Field
The invention relates to the field of sensors, in particular to a flexible electrode supporting structure.
Background
A capacitive pressure sensor is generally configured using a moving electrode made of a metal diaphragm and a fixed electrode made of an insulating material such as ceramic as a base. The metallic moving electrode and the ceramic fixed electrode are separated by a fixed electrode structure so as to establish capacitance. Although capacitive pressure sensors may be good at securing the fixed electrodes, there may be slight variations in geometry over time, such as changes in temperature. The coefficient of thermal expansion of the metal housing is typically greater than the coefficient of thermal expansion of the ceramic electrode. Thus, heating or cooling the capacitive sensor assembly may generate internal stresses within the assembly, thereby affecting the geometry, in particular the distance between the metal diaphragm and the ceramic fixed electrode. Mechanical stresses can build up to a certain extent during heating or cooling, and when the stresses are sufficiently great, the electrode and the housing can move relative to each other to relieve the stresses. This motion is referred to as "stick-slip" or "mechanical hysteresis". These stick-slip motions affect the geometry and can adversely affect the accuracy of the capacitive sensor assembly, are less repeatable, and cannot be predicted and compensated for. Therefore, it is necessary to design a flexible electrode support for a capacitive pressure sensor, which can improve the electrode gap control at a lower pressure, and prevent mechanical hysteresis such as temperature drift, thereby improving the measurement capability of the pressure sensor at a lower pressure.
In the prior art, an I-shaped supporting ring is usually adopted to support a ceramic fixed electrode, and an ultra-thin spacer is used to adjust a capacitance distance value, as shown in fig. 1, an I-shaped supporting ring is adopted to support a ceramic fixed electrode, which has the disadvantages that a single supporting ring cannot counteract mechanical hysteresis caused by different expansion coefficients through elastic deformation of the single supporting ring when the temperature of a sensor changes, the ultra-thin spacer is too thin and is not easy to process, and a large number of thickness gradients are required to adjust and search for a proper capacitance distance.
Disclosure of Invention
Technical problem to be solved
The invention mainly aims to provide a flexible electrode supporting structure to solve the problem that the distance value between a metal diaphragm and a ceramic fixed electrode is influenced due to mechanical delay caused by different thermal expansion coefficients of the metal moving electrode and the ceramic fixed electrode.
(II) technical scheme
The flexible electrode supporting structure is a circular ring square wave structure, is arranged at the step of a flexible electrode shell and is used for supporting a ceramic fixed electrode and adjusting the capacitance distance between the ceramic fixed electrode and a metal moving electrode.
In the scheme, the flexible electrode supporting structure is formed by stamping the low-expansion alloy circular ring.
In the scheme, the flexible electrode supporting structure is made of a nickel-based alloy material.
In the above scheme, the elastic coefficient of the flexible electrode supporting structure is 5 times to 10 times that of the ceramic fixed electrode compression spring.
In the scheme, the elastic coefficient of the flexible electrode support is 2500N/mm to 5000N/mm.
In the scheme, the unfolding-rotating ratio of the flexible electrode supporting structure is greater than 2: 1.
(III) advantageous effects
1. The flexible electrode supporting structure provided by the invention adopts a circular square wave structure, mechanical hysteresis caused by different thermal expansion coefficients of ceramic and metal is caused due to temperature change in a high-precision film sensor, the flexible electrode supporting structure is used as a connecting medium, and the mechanical hysteresis caused by different thermal expansion coefficients of ceramic and metal is absorbed and released by elastic deformation of the flexible electrode supporting structure when the temperature is changed, so that the mechanical hysteresis caused by different thermal expansion coefficients of a metal moving electrode and a ceramic fixed electrode can be effectively avoided.
2. The flexible electrode supporting structure provided by the invention adjusts the initial flexible supporting distance by adjusting the deformation distance of the fixed electrode compression spring, namely the distance between the fixed electrode and the upper cover of the shell, and as the elastic coefficient of the flexible support is far greater than that of the compression spring, the large deformation of the compression spring can be changed into the small deformation of the flexible support, so that the capacitor distance can be controlled more accurately.
3. The flexible electrode supporting structure provided by the invention adopts a circular square wave structure, and can ensure the balance of the pressure of the first chamber and the pressure of the second chamber.
Drawings
FIG. 1 is a schematic diagram illustrating a method for adjusting capacitance distance in the prior art;
FIG. 2 is a schematic diagram of a capacitive pressure sensor in accordance with an embodiment of the present invention;
FIG. 3 is a flexible electrode support structure according to an embodiment of the invention.
Description of reference numerals: 1: ceramic fixed electrode, 2: ultrathin pad, 3: type I support ring, 4: a housing, 11: first chamber, 12: upper cover, 13: outer shell, 14: ceramic fixed electrode, 15 diaphragm moving electrode, 16: second chamber, 17: flexible electrode support structure, 18: compressing the spring.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to specific embodiments and the accompanying drawings.
As shown in fig. 3, fig. 3 is a schematic diagram of a flexible electrode supporting structure according to an embodiment of the present invention, which is a circular ring square wave structure and is formed by stamping a low expansion alloy circular ring. The flexible support structure is arranged at the step of the shell and used for supporting the ceramic fixed electrode and adjusting the capacitance distance between the ceramic fixed electrode and the metal moving electrode through the flexible support structure.
The position of the flexible electrode supporting structure in the pressure sensor is shown in fig. 2, the flexible electrode supporting structure is made of a metal low-expansion alloy, and the low-expansion alloy is a nickel-based alloy such as GH 3600. The elastic coefficient of the flexible electrode supporting structure is greater than that of the ceramic fixed electrode compression spring, specifically, the elastic coefficient of the flexible electrode support is 2500N/mm to 5000N/mm, and the capacitance distance is obtained by subtracting the deformation distance of the flexible electrode supporting structure from the initial distance of the flexible electrode supporting structure, namely
Wherein d represents the distance between the ceramic fixed electrode and the metal movable electrode, H represents the initial height of the flexible support, and k1Representing the spring constant, k, of the compression spring of the flexible electrode2The elastic coefficient of the flexible support is shown, and h represents the compression distance of the compression spring, namely the distance between the fixed electrode and the upper cover. Wherein k is1Is much greater than K2Range of ratios thereofThe circumference is 5 times to 10 times, and the purpose is as follows:
after the compression spring is compressed, the flexible support is slightly deformed, and errors caused by the fact that the deformation exceeds the elastic range due to overlarge deformation are avoided;
and (II) because the capacitance is measured with high precision, the smaller the capacitance distance is, the better the capacitance distance is, the distance of the capacitance distance is changed by adjusting the compression distance h of the compression spring.
According to the flexible electrode supporting structure provided by the embodiment of the invention, the unfolding-rotating ratio of the flexible electrode supporting structure is more than 2: 1, and the flexible electrode supporting structure is made of a metal low-expansion alloy material, specifically, a nickel-based alloy such as GH3600, or the same material as a moving electrode or a shell.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. The flexible electrode supporting structure is characterized in that the flexible electrode supporting structure is of a circular ring square wave structure, is arranged at the step of a flexible electrode shell and is used for supporting a ceramic fixed electrode and adjusting the capacitance distance between the ceramic fixed electrode and a metal movable electrode.
2. The flexible electrode support structure of claim 1, wherein the flexible electrode support structure is stamped from a low expansion alloy circular ring.
3. The flexible electrode support structure of claim 1, wherein the flexible electrode support structure is fabricated from a nickel-based alloy material.
4. The compliant electrode support structure of claim 1 having a spring rate that is 5 to 10 times greater than the ceramic fixed electrode hold down spring.
5. The flexible electrode support structure of claim 4, wherein the flexible electrode support has a spring rate of 2500 to 5000N/mm.
6. The flexible electrode support structure of claim 1, wherein the ratio of splay to twist of the flexible electrode support structure is greater than 2: 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911188540.6A CN110879111B (en) | 2019-11-27 | 2019-11-27 | Flexible electrode supporting structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911188540.6A CN110879111B (en) | 2019-11-27 | 2019-11-27 | Flexible electrode supporting structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110879111A true CN110879111A (en) | 2020-03-13 |
| CN110879111B CN110879111B (en) | 2021-07-27 |
Family
ID=69730000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911188540.6A Active CN110879111B (en) | 2019-11-27 | 2019-11-27 | Flexible electrode supporting structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110879111B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114088282A (en) * | 2021-11-24 | 2022-02-25 | 北京七星华创流量计有限公司 | Pressure sensor |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3965746A (en) * | 1974-11-04 | 1976-06-29 | Teledyne Industries, Inc. | Pressure transducer |
| JPH11108783A (en) * | 1997-10-06 | 1999-04-23 | Omron Corp | Capacitance type pressure sensor and fixing structure thereof |
| US6105436A (en) * | 1999-07-23 | 2000-08-22 | Mks Instruments, Inc. | Capacitive pressure transducer with improved electrode support |
| CN101604654A (en) * | 2008-06-13 | 2009-12-16 | 佳能安内华股份有限公司 | Baseplate support device and apparatus for processing plasma |
| CN103998909A (en) * | 2011-09-29 | 2014-08-20 | Mks仪器公司 | Capacitive pressure sensor with improved electrode structure |
| CN204439255U (en) * | 2015-03-23 | 2015-07-01 | 南通昌荣机电有限公司 | A kind of compensation vibrating wire sensor with elastic component |
| CN105829853A (en) * | 2013-12-18 | 2016-08-03 | 恩德莱斯和豪瑟尔两合公司 | Pressure sensor |
-
2019
- 2019-11-27 CN CN201911188540.6A patent/CN110879111B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3965746A (en) * | 1974-11-04 | 1976-06-29 | Teledyne Industries, Inc. | Pressure transducer |
| JPH11108783A (en) * | 1997-10-06 | 1999-04-23 | Omron Corp | Capacitance type pressure sensor and fixing structure thereof |
| US6105436A (en) * | 1999-07-23 | 2000-08-22 | Mks Instruments, Inc. | Capacitive pressure transducer with improved electrode support |
| CN101604654A (en) * | 2008-06-13 | 2009-12-16 | 佳能安内华股份有限公司 | Baseplate support device and apparatus for processing plasma |
| CN103998909A (en) * | 2011-09-29 | 2014-08-20 | Mks仪器公司 | Capacitive pressure sensor with improved electrode structure |
| CN105829853A (en) * | 2013-12-18 | 2016-08-03 | 恩德莱斯和豪瑟尔两合公司 | Pressure sensor |
| CN204439255U (en) * | 2015-03-23 | 2015-07-01 | 南通昌荣机电有限公司 | A kind of compensation vibrating wire sensor with elastic component |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114088282A (en) * | 2021-11-24 | 2022-02-25 | 北京七星华创流量计有限公司 | Pressure sensor |
| WO2023093627A1 (en) * | 2021-11-24 | 2023-06-01 | 北京七星华创流量计有限公司 | Pressure sensor |
| TWI832567B (en) * | 2021-11-24 | 2024-02-11 | 大陸商北京七星華創流量計有限公司 | pressure sensor |
| CN114088282B (en) * | 2021-11-24 | 2024-05-10 | 北京七星华创流量计有限公司 | Pressure sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110879111B (en) | 2021-07-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6568274B1 (en) | Capacitive based pressure sensor design | |
| US4168518A (en) | Capacitor transducer | |
| US6205861B1 (en) | Transducer having temperature compensation | |
| CN202141554U (en) | Ceramic structure metal sensitive diaphragm capacitance pressure transducer | |
| JPH06502721A (en) | Pressure transmitter disconnect device | |
| JP2002500350A (en) | Manufacturing method of ceramic pressure measurement sensor | |
| CN114088282B (en) | Pressure sensor | |
| CN110879111B (en) | Flexible electrode supporting structure | |
| CN102472679A (en) | Method for pressure measurement at changing temperatures and pressure transducer for pressure measurement at changing temperatures | |
| EP1309840B1 (en) | Capacitive based pressure sensor design | |
| CN110987281B (en) | Annular supporting structure and ceramic capacitive pressure sensor applying same | |
| EP2990773B1 (en) | Capacitive pressure sensor | |
| CN110926662B (en) | Thin film type capacitance sensor | |
| US6487999B2 (en) | Liner mounting structure for measuring piston friction | |
| CN107843384A (en) | Vacuum gauge tube for quartz film sheet | |
| US4288835A (en) | Pressure sensor | |
| CN201476928U (en) | High-precision and high-frequency piezoelectric type pressure sensor | |
| CN115235655A (en) | Differential capacitance pressure sensor | |
| JPS59214727A (en) | Electrostatic capacity type pressure sensor | |
| CN107957312A (en) | The capacitive pressure transducer of corrugated moving electrode | |
| CN208155505U (en) | A kind of extra-high tension pressure sensor | |
| JP2011163915A (en) | Pressure sensor | |
| JP2004212388A (en) | Electrostatic capacity pressure sensor | |
| JP2009236666A (en) | Pressure sensor | |
| CA1081989A (en) | Capacitive pressure sensor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |