CN110873960A - Light beam adjusting device, device and method for stabilizing light beam - Google Patents
Light beam adjusting device, device and method for stabilizing light beam Download PDFInfo
- Publication number
- CN110873960A CN110873960A CN201811014159.3A CN201811014159A CN110873960A CN 110873960 A CN110873960 A CN 110873960A CN 201811014159 A CN201811014159 A CN 201811014159A CN 110873960 A CN110873960 A CN 110873960A
- Authority
- CN
- China
- Prior art keywords
- light beam
- detector
- light
- adjustment unit
- stabilizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
The invention provides a light beam adjusting device, a device and a method for stabilizing light beams, which comprise the following steps: the device comprises an initial adjusting unit and a real-time adjusting unit, wherein the initial adjusting unit performs initial adjustment, and the real-time adjusting unit performs real-time adjustment. The automatic initial parameter setting of the light beam and the automatic real-time compensation or correction of the position and the direction of the light beam are realized by adopting the initial adjusting unit and the real-time adjusting unit. The apparatus and method for stabilizing a light beam can simultaneously achieve the adjustment of the position and orientation of the light beam during the initial assembly process and the real-time correction of the position and orientation deviation of the light beam during the operation process by using the light beam adjusting apparatus. By realizing automatic setting of initial parameters, frequent checking and adjustment of an operator in a light beam transmission path are avoided; the same equipment simultaneously adjusts the position and the direction of the light beam, combines the initial adjustment and the real-time adjustment, and reduces the installation precision requirement of the device in the light path.
Description
Technical Field
The present invention relates to the field of semiconductors, and in particular, to a light beam adjusting apparatus, a light beam stabilizing apparatus, and a light beam stabilizing method.
Background
The projection photoetching technology in the semiconductor manufacture utilizes an optical system to accurately project and expose patterns on a mask plate onto a silicon wafer coated with photoresist, the basic principle of the projection photoetching technology is that a light source forms the mask plate which meets the requirement and is fixed on a mask plate table with a high uniform illumination field of view through an illumination unit, the mask plate is provided with the required photoetching patterns, and a projection objective images the illuminated mask patterns onto a substrate fixed on a workpiece table without aberration to cause the photoresist on the surface of the silicon wafer to be photosensitive. And obtaining an exposed photoresist pattern on the photoresist by developing, and transferring the exposed photoresist pattern to a silicon wafer by subsequent processes such as etching, photoresist removing and the like to obtain the required fine structure.
As shown in fig. 1, the light beam from the laser 1 exits the beam transmission system and enters the beam expander 2, then passes through the movable mirror mechanism 3, the reflective mirror 4 and the light beam detector 5 and then enters the basic illumination system 6, which is implemented by the basic illumination system, and the light beam is incident on the mask 7 through the reflective mirror in the basic illumination system to transfer the geometric pattern on the mask 7 to the silicon wafer 8, so that the illumination system has very good stability (telecentricity and uniformity) during the lithography exposure. However, before the laser beam enters the illumination system, the drift of the beam is monitored and corrected in real time because the instability of the laser itself, vibration of the ground, and gas vibration in the transmission path of the beam cause the drift of the beam in the transmission direction and position.
As shown in fig. 2, CN201010256374 in china mentions a drift scheme of adjusting 2 mirrors by piezoelectric motors to compensate the position and the direction of a light beam respectively, where each mirror can adjust two degrees of freedom of Rx and Ry, but in this scheme, the initial positions and angles of two mirrors need to be manually found and determined when implemented, because a single mirror L1 or L2 cannot achieve the adjustment of the position and the direction of the light beam, and the single mirror affects the position and the direction at the same time, and in order to achieve the simultaneous control of L1 and L2 to adjust the position and the direction of the light beam, strict requirements on the installation of L1 and L2 mirrors are necessarily met.
As shown in fig. 3, another chinese invention CN201010582736 proposes a scheme for adjusting the position and the direction of a light beam by using three mirrors capable of performing linear and rotational motions in cooperation with a near-field and far-field detector, and if only one mirror device is used for performing rotational and linear motions to adjust the position and the direction of the light beam in the embodiment of the scheme, a bearing structure of the mirror in an optical path is also required to have higher installation accuracy to achieve decoupling of the position and the direction of the light beam, but if a plurality of mirror devices are used for performing linear and rotational motions, complexity of the system is increased, and a control algorithm of the control system is very complex when calculating motion types and motion amounts of the plurality of mirrors.
Therefore, it is desirable to provide a light beam adjusting apparatus, a light beam stabilizing apparatus and a light beam stabilizing method, so as to solve the problems of the prior art, such as strict installation requirements of the apparatus, complex motion algorithm of the apparatus and easy deviation of the light beam in the light path.
Disclosure of Invention
The present invention is directed to an apparatus and a method for stabilizing a light beam to solve the problem of the prior art that the instability of a laser, the vibration of a ground, the gas vibration in a light beam transmission path, etc. cause the light beam to drift in the transmission direction and position.
In order to solve the problems in the prior art, the present invention provides a light beam adjusting apparatus, comprising: the novel reflector comprises a reflector, a reflector mounting seat, an initial adjustment unit and a fine adjustment unit, wherein the initial adjustment unit is connected with the reflector mounting seat, the reflector is installed on the reflector mounting seat through the fine adjustment unit, the initial adjustment unit drives the reflector mounting seat to move, and the fine adjustment unit drives the reflector to move relative to the reflector mounting seat.
Optionally, the initial adjustment unit drives the mirror mounting base to perform tilting motion, and specifically includes:
the light beam initial position adjusting mechanism drives the reflector mounting base to move around the X direction;
and the light beam initially points to the adjusting mechanism to drive the reflector mounting base to move around the Y direction.
Optionally, the fine adjustment unit includes three piezoelectric actuators, each having a degree of freedom in a normal direction of the mirror mount.
Optionally, the three piezoelectric actuators are arranged in an isosceles triangle or an equilateral triangle.
Optionally, each piezoelectric actuator and the mirror are connected by a flexible connector.
Optionally, the fine adjustment unit further includes a position sensor for detecting the amount of movement of each piezoelectric actuator.
The invention also provides a device for stabilizing light beams, which is arranged between the light source generator and the light source using equipment, and comprises: the light beam stabilizing detection device detects a signal of the output end light beam and sends the signal to the controller, and the controller calculates the position and the direction of the output end light beam according to the received detection signal and controls the light beam adjusting device to adjust the input end light beam according to the requirement of a target light beam.
Optionally, the device for stabilizing the light beam further includes a first beam splitter and a second beam splitter, and the device for detecting the light beam stabilization includes a first detector and a second detector; the output end light beam is incident to the first spectroscope and is divided into first reflected light and first transmitted light, the first transmitted light is incident to the first detector, the first reflected light is incident to the second spectroscope and is divided into second reflected light and second transmitted light, the second reflected light is incident to the light source using equipment, the second transmitted light is incident to the second detector, and the controller reads signals detected by the first detector and the second detector.
Optionally, the first detector is configured to detect a position of the output end beam in the Y direction; the second detector is used for detecting the position of the output end light beam in the X direction.
Optionally, a storage device is disposed in the controller, and stores adjustment parameters when the initial adjustment unit initializes or resets the position of the reflector mount, and a difference correction model according to which the fine adjustment unit corrects the position and pointing deviation between the output end light beam and the target light beam, where the difference correction model includes a plurality of adjustment modes and adjustment amounts of the fine adjustment unit, and a position and pointing direction of the output end light beam corresponding to the adjusted fine adjustment unit.
The invention also provides a method for stabilizing the light beam, which is characterized in that the device for stabilizing the light beam is adopted,
step 1: when the device for stabilizing the light beam is installed, according to the position and pointing requirements of the target light beam, the detection signal of the light beam stabilization detection device is combined to control the initial adjustment unit to drive the reflector installation seat to move;
step 2: when the light source using equipment works, the light beam stabilization detection device detects the output end light beam and feeds back the output end light beam to the controller, the controller compares the position and pointing deviation between the output end light beam and the target light beam, and the micro-motion adjusting unit is controlled to drive the reflector to move relative to the reflector mounting base so as to correct the position and pointing deviation.
Optionally, the adjustment parameters of the initial adjustment unit after the installation are stored in the controller, and when the device is stopped and restarted or reset, the initial adjustment unit is controlled to automatically adjust the position of the reflector mounting base according to the stored adjustment parameters.
Optionally, step 1 includes the following steps:
step S11: controlling the initial adjustment unit to drive the reflector mounting base to move around the X direction in combination with a detection signal of the first detector, so that the optical axis of the light beam is located at a reference position of the first detector, wherein the reference position of the first detector is the center of the first detector or a certain predefined specific position on the first detector;
step S12: and controlling the initial adjustment unit to drive the reflector mounting base to move around the Y direction in combination with a detection signal of the second detector, so that the optical axis of the light beam is located at a reference position of the second detector, wherein the reference position of the second detector is the center of the second detector or a certain predefined specific position on the second detector.
Optionally, after step S12, the method further includes:
step S13: and judging whether the position and the direction of the adjusted output end beam meet the requirements of the target beam, and if not, returning to and repeatedly executing the steps S11 and S12.
Optionally, the step 2 includes the following steps:
step S21: when the light beam using equipment works, the first detector and the second detector detect the output light beam and feed back the output light beam to the controller, and the controller compares the deviation of the position of the output light beam on the first detector with the reference position of the first detector and compares the deviation of the position of the output light beam on the second detector with the reference position of the second detector;
step S22: and calculating the adjustment mode and the adjustment amount of the fine adjustment unit required for correcting the deviation, and controlling the fine adjustment unit to execute adjustment.
Optionally, the step S22 specifically includes storing a difference correction model in the controller, where the difference correction model includes a plurality of adjustment modes and adjustment amounts of the fine adjustment unit, and adjustment amounts of the adjusted corresponding beam position and beam direction, and calculating an adjustment mode and an adjustment amount of the fine adjustment unit required for correcting the deviation according to the difference correction model, and controlling the fine adjustment unit to execute the movement.
Optionally, in step S11, the initial adjustment unit drives the mirror mounting base to move around the X direction by a movement angle θRXSatisfies the following conditions:
wherein Y is1Is the actual position of incidence of the first transmitted light on the first detector, Y0The reference position of the first detector is shown, and D is the distance between the light beam adjusting device and the first detector in the Y direction;
the movement angle theta of the initial adjustment unit driving the mirror mounting base to move around the Y direction in step S12RYSatisfies the following conditions:
wherein X1Is the actual position, X, of the second transmitted light incident on the second detector0And L is the distance between the light beam adjusting device and the second detector in the X direction, wherein L is the reference position of the second detector.
Optionally, the fine adjustment unit includes three piezoelectric actuators, and the three piezoelectric actuators are connected between the mirror and the mirror mounting seat in a triangular distribution.
Optionally, the three piezoelectric actuators are respectively a first piezoelectric actuator, a second piezoelectric actuator and a third piezoelectric actuator, the first piezoelectric actuator is located on an axis in the Y direction of the reflector mounting base, the second piezoelectric actuator and the third piezoelectric actuator are symmetrically distributed about the axis in the Y direction, and the adjustment modes of the three piezoelectric actuators include that when the first piezoelectric actuator, the second piezoelectric actuator and the third piezoelectric actuator move in the same direction and with the same displacement, the light beam reflected by the reflector moves in the Z direction; the first piezoelectric actuator is fixed, the second piezoelectric actuator and the third piezoelectric actuator move towards the same direction, and the light beam reflected by the reflector moves around the X direction; when the first piezoelectric actuator is fixed and the second piezoelectric actuator and the third piezoelectric actuator move along opposite directions, the light beam reflected by the reflector moves around the Y direction.
In a light beam adjusting apparatus, an apparatus for stabilizing a light beam, and a method thereof provided by the present invention, the light beam adjusting apparatus includes: the device comprises an initial adjusting unit and a fine adjusting unit, wherein the initial adjusting unit is used for roughly adjusting the light beam in a large range, and the fine adjusting unit is used for finely adjusting the light beam in a small range. The device and the method for stabilizing the light beam utilize the light beam adjusting device, and can simultaneously realize the adjustment of the position and the direction of the light beam during the initial assembly or the stop reset and the real-time correction of the position and the direction deviation of the light beam during the operation.
The invention can only have one light beam adjusting device, has the capability of initial adjustment and real-time adjustment, and reduces the requirements on the installation and adjustment precision of the device and improves the installation and adjustment efficiency by controlling the adjustment of algorithm decoupling position and direction.
Furthermore, the invention combines two measuring devices to measure the beam position at the near end and the beam direction at the far end respectively, and the initial parameter setting of the beam stabilizing device can be completed without the need of directly observing the beam by personnel according to the method of adjusting the position and then adjusting the direction.
Drawings
Fig. 1 is a schematic structural diagram of an exposure system according to an embodiment of the present invention:
fig. 2 is a schematic view of a patent CN201010256374 solution provided by an embodiment of the present invention;
fig. 3 is a schematic diagram of a patent CN201010582736 scheme provided by an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of an apparatus for stabilizing a light beam according to an embodiment of the present invention;
FIG. 5 is a schematic view of a light beam adjusting apparatus according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a fine adjustment beam process provided by an embodiment of the present invention;
FIG. 7 is a schematic diagram of the movement of the mirror about the X direction according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of the movement of the mirror about the Y direction according to the embodiment of the present invention;
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. Advantages and features of the present invention will become apparent from the following description and claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
As shown in fig. 5, the present invention provides a beam steering apparatus 42, comprising: the initial adjustment unit is connected with the reflector mounting seat 420, the reflector is mounted on the reflector mounting seat 420 through the fine adjustment unit, and the initial adjustment unit drives the reflector mounting seat 420 to move and is used for adjusting an output end light beam emitted by the reflector to a reference position during initial mounting or resetting; the micro-motion adjusting unit drives the reflector to move relative to the reflector mounting base 420, and adjusts the actual position of the output end light beam in real time to keep the output end light beam at the reference position.
The apparatus and method for stabilizing a light beam can simultaneously perform adjustment of the position and orientation of the light beam during initial assembly and real-time correction of the position and orientation deviation of the light beam during operation by using the light beam adjusting apparatus 42. By realizing automatic setting of initial parameters, frequent checking and adjustment of an operator in a light beam transmission path are avoided; the same equipment simultaneously adjusts the position and the direction of the light beam, combines the initial adjustment and the real-time adjustment, and reduces the installation precision requirement of the device in the light path.
Specifically, the initial adjustment unit includes: a beam initial position adjusting mechanism 421 for driving the mirror mounting base 420 to move around the X degree of freedom to adjust the beam position; the initial beam pointing adjustment mechanism 422 drives the mirror mount 420 to move about the Y degree of freedom to adjust the beam pointing. The initial position adjustment mechanism 421 adjusts the initial position state of the light beam emitted from the light source generator 41, and the initial pointing adjustment mechanism 422 adjusts the initial pointing state of the light beam emitted from the light source generator 41.
Further, the fine adjustment unit includes three piezoelectric actuators, each of which is movable in Z degree of freedom. Preferably, the piezoelectric actuators are provided with flexible connectors in a matching manner, the piezoelectric actuators are connected with the reflecting mirror through the flexible connectors, and the movement of the three piezoelectric actuators is free from interference and mechanical constraint. The micro-motion adjusting unit further comprises a position sensor for detecting the motion amount of each piezoelectric actuator.
As shown in fig. 4, the present invention provides an apparatus for stabilizing a light beam, comprising: arranged between the light source generator 41 and the light source using device, the device for stabilizing the light beam comprises: the light beam stabilizing detection device 42 receives the input end light beam output by the light source generator 41, the output end light beam emitted after being adjusted by the light beam adjusting device 42 is incident to the light source using equipment, the light beam stabilizing detection device detects the output end light beam signal and sends the output end light beam signal to the controller 46, the controller 46 calculates the position and the direction of the output end light beam according to the received detection signal, and controls the light beam adjusting device 42 to adjust the input end light beam according to the requirement of the target light beam.
Further, the device for stabilizing the light beam further comprises a first beam splitter 431, a second beam splitter 432 and a reflector, and the device for detecting the light beam stabilization comprises a first detector 44 and a second detector 45; the light beam adjusting device 42 receives the input end light beam emitted by the light source generator 41, the output end light beam emitted after being adjusted by the light beam adjusting device 42 is incident to the first beam splitter 431 to generate first reflected light and first transmitted light, the first transmitted light is incident to the first detector 44, the first reflected light is reflected to the second beam splitter 432 through the reflector to generate second reflected light and second transmitted light, the second reflected light is incident on the light source usage device, the second transmitted light is incident on a second detector 45, the first detector 44 transmits the received information of the first transmitted light to the controller 46, the second detector 45 transmits the received information of the second transmitted light to the controller 46, the controller 46 controls the beam adjusting device 42 to adjust the position and direction of the input beam according to the received information.
In one embodiment, the first detector 44 is used for detecting the position of the output end beam in the Y direction, the first detector 44 is disposed at the near end of the optical path, i.e. closer to the light source generator 41, and the detection surface of the first detector 44 is perpendicular to the ideal incident optical axis; the second detector 45 is used for detecting the position of the output end beam in the X direction, the second detector 45 is arranged at the far end of the optical path, that is, at a position closer to the light source using equipment, and the detection surface of the second detector 45 is parallel to the ideal incident optical axis. Optionally, the first detector 44 and the second detector 45 are linear sensors, and may also be four-quadrant sensors, charge coupled device sensors, or complementary metal oxide semiconductor sensors.
Further, a storage device is disposed in the controller 46, and is used for storing adjustment parameter information for initializing or resetting the position of the reflector by the initial adjustment unit and a difference correction model according to which the fine adjustment unit corrects the position and pointing deviation between the actual light beam and the target light beam, where the difference correction model includes a plurality of adjustment modes and adjustment amounts of the fine adjustment unit, and a position and pointing adjustment amount of the corresponding output end light beam after adjustment.
In particular, the beam steering arrangement 42, the first detector 44 and the second detector 45 are controlled by a controller 46. The controller 46 controls the beam adjusting device 42 to perform a large stroke initial adjustment and a small stroke fine adjustment in real time. As shown in fig. 7 and 8, the initial adjustment of the large stroke is realized by controlling the initial position adjustment mechanism 421 and the initial direction adjustment mechanism 422 of the light beam to move the mirror mounting base 420 around the X and Y directions; as shown in fig. 6, the small-stroke micro-motion real-time adjustment is realized by controlling the micro-motion adjustment unit to move the mirror along the Z direction, around the X direction and around the Y direction. The light source generator 41 can be selected as a laser, the Z-position of the reflector mounting base 420 is ensured by mounting at the beginning, and the light beam is adjusted in real time by the fine adjustment unit in the using process of the light beam so as to correct the light beam offset caused by instability of the emergent pulse light of the laser.
The invention also provides a method for stabilizing the light beam by using the light beam stabilizing device, which comprises the following steps:
step 1: the device for stabilizing the light beam is arranged in the light path between the light source generator 41 and the light source using equipment, and when the device is installed, according to the position and the pointing requirement of the target light beam, the device is combined with the detection signal of the light beam stabilization detection device to control the initial adjustment unit to drive the reflector mounting seat 420 to move, and the position and the pointing of the light beam are initialized according to the requirement;
step 2: when the light source using device works, the light beam stabilization detection device detects the output end light beam and feeds back the output end light beam to the controller 46, the controller 46 compares the position and pointing deviation between the output end light beam and the target light beam, and controls the micro-motion adjustment unit to drive the reflector to move relative to the reflector mounting seat 420 so as to correct the position and pointing deviation.
And storing the adjustment parameters of the initial adjustment unit after the installation to a controller, and controlling the initial adjustment unit to automatically adjust the position of the reflector mounting seat according to the stored adjustment parameters when the device is stopped and restarted or reset.
Specifically, the initialization method in step 1 includes the following steps:
step S11: in combination with the detection signal of the first detector 44, the beam initial position adjustment mechanism 421 is controlled to drive the mirror mount 420 to move around the X direction, so that the optical axis of the beam is located at the reference position of the first detector 44, where the reference position of the first detector is the center of the first detector 44 or a predefined specific position on the first detector 44.
During initial adjustment, the micro-adjustment unit is kept still, the piezoelectric actuator of the default micro-adjustment unit is in the middle of the stroke, and the reflecting mirror is parallel to the planes of the three voltage actuators.
The initial position adjustment mechanism 421 of the light beam drives the reflector mounting seat 420 to move around the X direction, and the controller obtains the reading of the first detector 44, and the reading of the sensor is preset to be Y when the position of the light beam is located at the center of the first detector 44 or a certain predefined specific position (there is a difference between the positions corresponding to different types of detectors selected to be used)0Fig. 7 is a schematic diagram showing the movement process of the beam initial position adjustment mechanism 421.
Step S12: and in combination with a detection signal of the second detector 45, controlling the beam initial direction adjustment mechanism 422 to drive the mirror mounting seat 420 to move around the Y direction, so that the optical axis of the beam is located at a reference position of the second detector 45, where the reference position of the second detector is a center of the second detector 45 or a predefined specific position on the second detector 45.
Control while keeping the result of step S11 unchangedThe controller controls the initial pointing direction of the light beam to the adjusting mechanism 422 and obtains the reading of the second detector 45, and the reading of the sensor is X when the optical axis of the light beam is located at the center of the second detector 45 or at a certain position defined in advance0The schematic diagram of the movement process of the initial beam pointing adjustment mechanism 422 is shown in fig. 8.
Step S13: and judging whether the position and the direction of the adjusted output end beam meet the requirements of the target beam or not, and otherwise, repeatedly executing the steps S11 and S12.
Further, in step S11, the beam initial position adjustment mechanism 421 drives the mirror mount 420 to rotate around the rotation amount θ in the X directionRXSatisfies the following conditions:
wherein the actual position of the optical axis of the first transmitted light impinging on the first detector 44 is Y1The reference position of the first detector 44 is Y0A distance D in the Y direction between the beam adjusting device 42 and the first detector 44;
in step S12, the beam initial pointing adjustment mechanism 422 drives the mirror mount 420 to rotate about the Y direction by the rotation amount θRYSatisfies the following conditions:
wherein the actual position of the optical axis of the second transmitted light impinging on the second detector 45 is X1The reference position of the second detector 45 is X0The distance between the beam adjusting device 42 and the second detector 45 in the X direction is L.
Next, the real-time adjustment method in step 3 includes the following steps:
step S21: the reference position Y of the light beam detected by the first detector 44 and the second detector 45, which is confirmed during the adjustment, is defined while the initial adjustment unit is kept still0、X0The reference position Y is read for the readings of the target beam on the first detector 44 and the second detector 45, respectively0、X0The light beam emitted by the light beam adjusting device is detected at the first positionMeasurement readings Y on the detector 44 and the second detector 45act、XactComparing;
step S22: and calculating an adjusting mode and an adjusting amount of a fine adjustment unit required for correcting the deviation, and controlling the fine adjustment unit to execute adjustment.
Optionally, a difference correction model is stored in the controller 46, and the difference correction model is formed by fitting a plurality of adjustment modes and adjustment amounts of three piezoelectric actuators in the fine adjustment unit, and adjustment amounts of the adjusted corresponding beam position and beam direction. And calculating the adjustment modes and adjustment amounts of the three piezoelectric actuators required for correcting the deviation according to the difference correction model, and controlling the three piezoelectric actuators and the flexible mechanisms connected with the three piezoelectric actuators to move and execute.
Optionally, a certain deviation tolerance is preset, and before performing step S22, it is determined whether the calculated deviation of the output end beam with respect to the target beam exceeds the deviation tolerance, and if so, step S22 is executed.
The controller 46 repeatedly performs steps S21 and S22 by reading the actual position of the real-time reading light beam of the first detector 44 and the second detector 45 as a feedback signal during the time the light beam is used, so as to perform closed-loop adjustment of the light beam such that the light beam is maintained at the reference position.
Further, the fine adjustment unit includes three piezoelectric actuators, which are a first piezoelectric actuator 4201, a second piezoelectric actuator 4202, and a third piezoelectric actuator 4203, and the three piezoelectric actuators are mounted on the mirror mount in a triangular distribution, where the first piezoelectric actuator 4201 is located on a central axis of the mirror mount in the Y direction, and the second piezoelectric actuator 4202 and the third piezoelectric actuator 4203 are symmetrically distributed about the central axis of the Y direction;
the three piezoelectric actuators are adjusted in a manner that the light beam reflected by the mirror moves in the Z direction when the first piezoelectric actuator 4201, the second piezoelectric actuator 4202 and the third piezoelectric actuator 4203 move in the same displacement in the same direction; when the first piezoelectric actuator 4201 is fixed and the second piezoelectric actuator 4202 and the third piezoelectric actuator 4203 move in the same direction by the same displacement, the light beam reflected by the mirror moves in the X direction; when the first piezoelectric actuator 4201 is fixed and the second piezoelectric actuator 4202 and the third piezoelectric actuator 4203 are moved in opposite directions by the same displacement, the beam reflected by the mirror moves in the Y direction.
In summary, in the light beam adjusting apparatus, the apparatus for stabilizing a light beam and the method thereof provided by the present invention, the light beam adjusting apparatus includes: the device comprises an initial adjustment unit and a micro-adjustment unit, wherein the initial adjustment unit performs initial adjustment, and the micro-adjustment unit performs real-time adjustment. The device and the method for stabilizing the light beam can simultaneously realize the adjustment of the position and the direction of the light beam in the initial assembly process and the real-time correction of the position and the direction deviation of the light beam in the operation process by utilizing the light beam adjusting device.
The invention can only have one light beam adjusting device, has the capability of initial adjustment and real-time adjustment, and reduces the requirements on the installation and adjustment precision of the device and improves the installation and adjustment efficiency by controlling the adjustment of algorithm decoupling position and direction.
Furthermore, the invention combines two measuring devices to measure the beam position at the near end and the beam direction at the far end respectively, and the initial parameter setting of the beam stabilizing device can be completed without the need of directly observing the beam by personnel according to the method of adjusting the position and then adjusting the direction.
The foregoing embodiments are merely illustrative of the principles of the invention and its efficacy, and are not to be construed as limiting the invention. Those skilled in the art can make various changes, substitutions and alterations to the disclosed embodiments and technical contents without departing from the spirit and scope of the present invention.
Claims (21)
1. A beam steering arrangement, comprising: the novel reflector comprises a reflector, a reflector mounting seat, an initial adjustment unit and a fine adjustment unit, wherein the initial adjustment unit is connected with the reflector mounting seat, the reflector is installed on the reflector mounting seat through the fine adjustment unit, the initial adjustment unit drives the reflector mounting seat to move, and the fine adjustment unit drives the reflector to move relative to the reflector mounting seat.
2. The beam steering arrangement according to claim 1, wherein the initial steering unit drives the mirror mount to tilt, in particular comprising:
the light beam initial position adjusting mechanism drives the reflector mounting base to move around the X direction;
and the light beam initially points to the adjusting mechanism to drive the reflector mounting base to move around the Y direction.
3. The beam adjustment device of claim 1 wherein the fine adjustment unit comprises three piezoelectric actuators, each having a degree of freedom in a direction normal to the mirror mount.
4. The beam conditioning device of claim 3, wherein the three piezoelectric actuators are arranged in an isosceles or equilateral triangle.
5. A beam steering arrangement according to claim 3, wherein each said piezoelectric actuator is connected to said mirror by a flexible connector.
6. The beam adjusting apparatus according to claim 3, wherein the fine adjustment unit further comprises a position sensor for detecting an amount of movement of each of the piezoelectric actuators.
7. An apparatus for stabilizing a light beam, disposed between a light source generator and a light source using device, the apparatus for stabilizing a light beam comprising: the light beam adjusting device of any one of claims 1 to 6, wherein an input end of the light beam adjusting device receives an input end light beam output by the light source generator, an output end light beam emitted after adjustment by the light beam adjusting device is incident to the light source using equipment, the light beam stabilizing detecting device detects a signal of the output end light beam and sends the signal to the controller, and the controller calculates a position and a direction of the output end light beam according to the received detection signal and controls the light beam adjusting device to adjust the input end light beam according to a requirement of a target light beam.
8. The apparatus for stabilizing a light beam according to claim 7, wherein the apparatus for stabilizing a light beam further comprises a first beam splitter and a second beam splitter, and the apparatus for detecting a stabilization of a light beam comprises a first detector and a second detector; the output end light beam is incident to the first spectroscope and is divided into first reflected light and first transmitted light, the first transmitted light is incident to the first detector, the first reflected light is incident to the second spectroscope and is divided into second reflected light and second transmitted light, the second reflected light is incident to the light source using equipment, the second transmitted light is incident to the second detector, and the controller reads signals detected by the first detector and the second detector.
9. The apparatus for stabilizing a light beam according to claim 8, wherein said first detector is adapted to detect the position of said output light beam in the Y direction; the second detector is used for detecting the position of the output end light beam in the X direction.
10. The apparatus according to claim 7, wherein a storage device is disposed in the controller, and stores adjustment parameters when the initial adjustment unit initializes or resets the position of the mirror mount, and a difference correction model according to which the fine adjustment unit corrects the position and orientation deviation between the output end beam and the target beam, wherein the difference correction model includes a plurality of adjustment modes and adjustment amounts of the fine adjustment unit, and the position and orientation of the adjusted corresponding output end beam.
11. A method of stabilizing a light beam, characterized by using the apparatus for stabilizing a light beam according to claim 7,
step 1: when the device for stabilizing the light beam is installed, according to the position and pointing requirements of the target light beam, the detection signal of the light beam stabilization detection device is combined to control the initial adjustment unit to drive the reflector installation seat to move;
step 2: when the light source using equipment works, the light beam stabilization detection device detects the output end light beam emitted by the light beam adjusting device and feeds back the output end light beam to the controller, the controller compares the position and pointing deviation between the output end light beam and the target light beam, and the micro-motion adjusting unit is controlled to drive the reflector to move relative to the reflector mounting base so as to correct the position and pointing deviation.
12. The method of claim 11, wherein the adjustment parameters of the initial adjustment unit after completion of the installation are stored in a controller, and the initial adjustment unit is controlled to automatically adjust the position of the mirror mount according to the stored adjustment parameters when the apparatus is stopped and restarted or reset.
13. The method of claim 11, wherein the means for stabilizing the light beam further comprises a first beam splitter and a second beam splitter, and the means for detecting the stabilization of the light beam comprises a first detector and a second detector; the output end light beam is incident to the first spectroscope and is divided into first reflected light and first transmitted light, the first transmitted light is incident to the first detector, the first reflected light is incident to the second spectroscope and is divided into second reflected light and second transmitted light, the second reflected light is incident to the light source using equipment, the second transmitted light is incident to the second detector, and the controller reads signals detected by the first detector and the second detector.
14. A method of stabilizing a light beam according to claim 13, wherein the first detector is adapted to detect the position of the output light beam in the Y direction; the second detector is used for detecting the position of the output end light beam in the X direction.
15. The method of stabilizing a light beam according to claim 14, wherein the step 1 comprises the steps of:
step S11: controlling the initial adjustment unit to drive the reflector mounting base to move around the X direction in combination with a detection signal of the first detector, so that the optical axis of the light beam is located at a reference position of the first detector, wherein the reference position of the first detector is the center of the first detector or a certain predefined specific position on the first detector;
step S12: and controlling the initial adjustment unit to drive the reflector mounting base to move around the Y direction in combination with a detection signal of the second detector, so that the optical axis of the light beam is located at a reference position of the second detector, wherein the reference position of the second detector is the center of the second detector or a certain predefined specific position on the second detector.
16. The method for stabilizing a light beam according to claim 15, further comprising, after step S12:
step S13: and judging whether the position and the direction of the adjusted output end beam meet the requirements of the target beam, and if not, returning to and repeatedly executing the steps S11 and S12.
17. A method of stabilizing a light beam according to claim 15, wherein said step 2 comprises the steps of:
step S21: when the light beam using equipment works, the first detector and the second detector detect the output light beam and feed back the output light beam to the controller, and the controller compares the deviation of the position of the output light beam on the first detector with the reference position of the first detector and compares the deviation of the position of the output light beam on the second detector with the reference position of the second detector;
step S22: and calculating the adjustment mode and the adjustment amount of the fine adjustment unit required for correcting the deviation, and controlling the fine adjustment unit to execute adjustment.
18. The method for stabilizing a light beam according to claim 17, wherein the step S22 specifically includes storing a difference correction model in the controller, the difference correction model including a plurality of adjustment modes and adjustment amounts of the fine adjustment unit and adjustment amounts of the adjusted corresponding light beam position and light beam direction, calculating the adjustment mode and adjustment amount of the fine adjustment unit required for correcting the deviation according to the difference correction model, and controlling the fine adjustment unit to perform the movement.
19. The method of stabilizing a light beam according to claim 15,
a movement angle θ of the initial adjustment unit driving the mirror mount to move around the X direction in the step S11RXSatisfies the following conditions:
wherein Y is1Is the actual position of incidence of the first transmitted light on the first detector, Y0The reference position of the first detector is shown, and D is the distance between the light beam adjusting device and the first detector in the Y direction;
the movement angle theta of the initial adjustment unit driving the mirror mounting base to move around the Y direction in step S12RYSatisfies the following conditions:
wherein X1Is the actual position, X, of the second transmitted light incident on the second detector0And L is the distance between the light beam adjusting device and the second detector in the X direction, wherein L is the reference position of the second detector.
20. The method of claim 18, wherein the fine adjustment unit comprises three piezoelectric actuators connected in a triangular arrangement between the mirror and the mirror mount.
21. The method for stabilizing a light beam according to claim 20, wherein the three piezoelectric actuators are a first piezoelectric actuator, a second piezoelectric actuator and a third piezoelectric actuator, respectively, the first piezoelectric actuator is located on a Y-direction central axis of the reflector mounting base, the second piezoelectric actuator and the third piezoelectric actuator are symmetrically distributed about the Y-direction central axis, and the three piezoelectric actuators are adjusted in a manner that the light beam reflected by the reflector moves in a Z-direction when the first piezoelectric actuator, the second piezoelectric actuator and the third piezoelectric actuator move in the same direction by the same displacement; the first piezoelectric actuator is fixed, the second piezoelectric actuator and the third piezoelectric actuator move towards the same direction, and the light beam reflected by the reflector moves around the X direction; when the first piezoelectric actuator is fixed and the second piezoelectric actuator and the third piezoelectric actuator move along opposite directions, the light beam reflected by the reflector moves around the Y direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811014159.3A CN110873960A (en) | 2018-08-31 | 2018-08-31 | Light beam adjusting device, device and method for stabilizing light beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811014159.3A CN110873960A (en) | 2018-08-31 | 2018-08-31 | Light beam adjusting device, device and method for stabilizing light beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110873960A true CN110873960A (en) | 2020-03-10 |
Family
ID=69715341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811014159.3A Pending CN110873960A (en) | 2018-08-31 | 2018-08-31 | Light beam adjusting device, device and method for stabilizing light beam |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110873960A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102103329B (en) * | 2010-12-06 | 2013-10-02 | 中国科学院光电技术研究所 | Light beam stabilizing device for photoetching equipment |
| CN204256241U (en) * | 2014-12-08 | 2015-04-08 | 上海卫星装备研究所 | Plane mirror three-dimension adjusting mechanism |
| CN108205193A (en) * | 2016-12-16 | 2018-06-26 | 深圳先进技术研究院 | Two dimensional control speculum and its control method are with including its laser scanner |
-
2018
- 2018-08-31 CN CN201811014159.3A patent/CN110873960A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102103329B (en) * | 2010-12-06 | 2013-10-02 | 中国科学院光电技术研究所 | Light beam stabilizing device for photoetching equipment |
| CN204256241U (en) * | 2014-12-08 | 2015-04-08 | 上海卫星装备研究所 | Plane mirror three-dimension adjusting mechanism |
| CN108205193A (en) * | 2016-12-16 | 2018-06-26 | 深圳先进技术研究院 | Two dimensional control speculum and its control method are with including its laser scanner |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7280225B2 (en) | Stage apparatus and control method including first and second measurement systems for measuring a stage position and a switching unit for switching between the measurement systems | |
| JP5498243B2 (en) | Exposure apparatus, exposure method, and device manufacturing method | |
| US5473424A (en) | Tilting apparatus | |
| JP2785146B2 (en) | Automatic focus adjustment controller | |
| JPH09180989A (en) | Exposure system and method | |
| US20100195085A1 (en) | Positioning apparatus, exposure apparatus, and device manufacturing method | |
| KR20010093056A (en) | Lithographic apparatus, device manufacturing method, and device manufactured thereby | |
| US11448968B2 (en) | Beam-forming and illuminating system for a lithography system, lithography system, and method | |
| US9529282B2 (en) | Position-measurement systems | |
| US6084244A (en) | Scanning exposure apparatus that compensates for positional deviation caused by substrate inclination | |
| US10481508B2 (en) | Exposure apparatus and method of manufacturing article | |
| US11754934B2 (en) | Projection exposure apparatus for semiconductor lithography having an optical element with sensor reference and method for aligning the sensor reference | |
| CN110873960A (en) | Light beam adjusting device, device and method for stabilizing light beam | |
| US8416389B2 (en) | Exposure apparatus and method of manufacturing device | |
| US20140113234A1 (en) | Lithography apparatus, and method of manufacturing an article | |
| JP5395643B2 (en) | Orthogonality measuring method, stage mechanism and transfer device | |
| JPH11325832A (en) | Method and apparatus for measuring position, and aligner | |
| CN110750034B (en) | Optical device, projection optical system, exposure device, and method for manufacturing article | |
| US10838306B2 (en) | Optical system, in particular for a microlithographic projection exposure apparatus | |
| JP2014143429A (en) | Exposure device, exposure method, and device manufacturing method | |
| JP3584314B2 (en) | Projection exposure equipment | |
| KR102199964B1 (en) | Substrate deformation apparatus for proximity exposure and substrate deformation method for proximity exposure using the same | |
| JPH10163090A (en) | Rotation control method and stage device using the same | |
| JP2010102130A (en) | Exposure apparatus | |
| JP2001255139A (en) | Controllability evaluation method for control system, and planarity measuring method of aligner and substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200310 |