CN110869536A - 一种抛光剂、不锈钢件及其抛光处理方法 - Google Patents
一种抛光剂、不锈钢件及其抛光处理方法 Download PDFInfo
- Publication number
- CN110869536A CN110869536A CN201780092839.4A CN201780092839A CN110869536A CN 110869536 A CN110869536 A CN 110869536A CN 201780092839 A CN201780092839 A CN 201780092839A CN 110869536 A CN110869536 A CN 110869536A
- Authority
- CN
- China
- Prior art keywords
- parts
- stainless steel
- polishing
- polishing agent
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- ing And Chemical Polishing (AREA)
Abstract
一种抛光剂、不锈钢件及其抛光处理方法。抛光剂用于不锈钢件表面预处理,以200重量份计,包括如下重量份数的成分:10‑50份双氧水,2‑10份尿素,3‑8份硼砂,6‑20份冰醋酸,0.5‑5份金刚石微粉,0.5‑2份十二烷基苯磺酸钠和余量水。经过上述抛光剂处理后,不锈钢件表面清洁光亮,而且整个抛光处理方法工艺简单、环保,无气味无NO 2逸出,操作方便,使用成本低。
Description
PCT国内申请,说明书已公开。
Claims (1)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2017/091539 WO2019006605A1 (zh) | 2017-07-03 | 2017-07-03 | 一种抛光剂、不锈钢件及其抛光处理方法 |
Publications (1)
Publication Number | Publication Date |
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CN110869536A true CN110869536A (zh) | 2020-03-06 |
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ID=64950469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201780092839.4A Withdrawn CN110869536A (zh) | 2017-07-03 | 2017-07-03 | 一种抛光剂、不锈钢件及其抛光处理方法 |
Country Status (2)
Country | Link |
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CN (1) | CN110869536A (zh) |
WO (1) | WO2019006605A1 (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030022502A1 (en) * | 2001-07-30 | 2003-01-30 | Kabushiki Kaisha Toshiba | Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function |
CN101851470A (zh) * | 2009-04-03 | 2010-10-06 | 比亚迪股份有限公司 | 一种化学抛光液及抛光方法 |
CN102311706A (zh) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | 一种纳米级抛光液及其调配方法 |
CN105624683A (zh) * | 2016-03-28 | 2016-06-01 | 苏州市晶协高新电子材料有限公司 | 一种抛光剂及其制备方法 |
CN106811751A (zh) * | 2017-02-16 | 2017-06-09 | 河南科技学院 | 一种304不锈钢化学机械抛光用抛光剂和抛光液及其制备方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2902954B2 (ja) * | 1994-09-20 | 1999-06-07 | 鐘紡株式会社 | 金コロイド溶液の製造方法および金コロイド溶液 |
JPWO2015152383A1 (ja) * | 2014-04-04 | 2017-04-13 | 株式会社フジミインコーポレーテッド | 硬質材料の研磨用組成物 |
CN105623524A (zh) * | 2016-01-28 | 2016-06-01 | 繁昌县陈氏金属制品有限公司 | 一种用于不锈钢表面抛光的多磨料表面处理剂 |
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2017
- 2017-07-03 WO PCT/CN2017/091539 patent/WO2019006605A1/zh active Application Filing
- 2017-07-03 CN CN201780092839.4A patent/CN110869536A/zh not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030022502A1 (en) * | 2001-07-30 | 2003-01-30 | Kabushiki Kaisha Toshiba | Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function |
CN101851470A (zh) * | 2009-04-03 | 2010-10-06 | 比亚迪股份有限公司 | 一种化学抛光液及抛光方法 |
CN102311706A (zh) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | 一种纳米级抛光液及其调配方法 |
CN105624683A (zh) * | 2016-03-28 | 2016-06-01 | 苏州市晶协高新电子材料有限公司 | 一种抛光剂及其制备方法 |
CN106811751A (zh) * | 2017-02-16 | 2017-06-09 | 河南科技学院 | 一种304不锈钢化学机械抛光用抛光剂和抛光液及其制备方法 |
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Publication number | Publication date |
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WO2019006605A1 (zh) | 2019-01-10 |
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