CN110867493A - Multi-main-grid solar cell, interconnection structure and printing method thereof - Google Patents
Multi-main-grid solar cell, interconnection structure and printing method thereof Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000007639 printing Methods 0.000 title claims abstract description 19
- 238000003466 welding Methods 0.000 claims abstract description 91
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000007650 screen-printing Methods 0.000 claims description 15
- 229910052709 silver Inorganic materials 0.000 claims description 13
- 239000004332 silver Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
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- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000001465 metallisation Methods 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/12—Stencil printing; Silk-screen printing
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022433—Particular geometry of the grid contacts
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/05—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
- H01L31/0504—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
- H01L31/0516—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module specially adapted for interconnection of back-contact solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
- H01L31/188—Apparatus specially adapted for automatic interconnection of solar cells in a module
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention discloses a multi-main-grid solar cell, an interconnection structure and a printing method thereof, belonging to the technical field of solar cell manufacturing, wherein the multi-main-grid solar cell comprises a front electrode and a back electrode, the front electrode comprises a plurality of thin grid lines and main grid lines, the number of the main grid lines is not less than 9, the thin grid lines are mutually vertical to the main grid lines, two ends of the main grid lines extend outwards to be connected with end welding sheets, end welding sheets arranged at two ends of the main grid lines are provided with end welding areas, and no welding spot is arranged at the intersection point of the main grid lines and the thin grid lines. The invention adopts the design of connecting the welding sheets at the two ends and the middle part of the main grid line, cancels the welding spot structure on the original main grid line, further cancels the MBB automatic welding wire welding process of the component end, saves the working procedures, cancels the interconnection of the component manufacturing end by the welding wire, thereby improving the alignment precision, avoiding the white exposure or the false welding problem, only arranging the welding areas at the two ends and the middle part of the multi-main-grid cell, saving the conductive silver paste, reducing the shading area and improving the conversion efficiency.
Description
Technical Field
The invention belongs to the technical field of solar cell manufacturing, and particularly relates to a multi-main-grid solar cell, an interconnection structure and a printing method of the interconnection structure.
Background
Metallization is a key step in the production process of the solar cell, photogenerated carriers can be effectively collected only through a conductive electrode formed by metallization, and the metallization process of the solar cell has the following direct influences on the optical and electrical properties of the cell and the component end:
(1) the solar cell module has the advantages that optical performance is influenced, the battery metallization covers the surface of the light receiving surface of the battery, and the area can shield and reflect light with a certain area on light radiation energy incident to the battery piece, so that short-circuit current of the solar cell and the module is directly influenced;
(2) the solar cell comprises a front side silver paste conductive electrode, a back side main grid silver paste electrode, a thin metal grid conductive resistor, a metal-semiconductor contact resistor and a diode resistor.
In order to improve the efficiency of the battery and the power of the assembly, the optimized metalized electrode of the battery should reduce the shielding and resistance loss as much as possible, and the optimized optical and electrical matching electrode design, and the Multi-main grid MBB (Multi-busbar) technology is one of the effective approaches. As the number of primary gates increases, the distance that the secondary gates conduct current decreases, with a corresponding power loss inversely proportional to the square of the transmission distance. The cell efficiency and component power loss gradually decrease as the number of main gates increases. In addition, in order to reduce the front shading of the solar cell by considering optical design, the width of the main grid of the MBB is further reduced, the shape of the main grid is gradually developed from a straight-through type to a bamboo joint type or even a node type, and the silver paste consumption can be greatly reduced on the premise of keeping or improving the power of the assembly by reducing the width of the main grid and matching the number of the matched fine grids. By matching the MBB design with improved screen printing plates, sizing agents and printing parameters, the conversion efficiency of the battery is improved by + 0.08-0.15%, and the wet weight of the positive electrode main grid and the secondary grid is reduced by more than 25% compared with the target wet weight of the conventional battery piece.
Disclosure of Invention
The invention aims to: in order to solve the problems of poor welding reliability, low conversion efficiency, high shading area and high cost caused by a main grid line structure in the prior art, the multi-main-grid high-efficiency solar cell adopts a circular welding wire at the welding end of the assembly, and the problems of exposure caused by difficult alignment during welding or lower welding tension are solved. The interconnection of the assembly manufacturing end by welding wires is eliminated by the battery pattern design of the metallization process at the battery manufacturing end and matching with a proper assembly series welding linking mode, thereby improving the alignment precision, avoiding the white exposure/false soldering problem, reducing the introduction of a high-volume complete set of automatic alignment equipment facilities to a certain extent, providing a multi-main grid solar cell, an interconnection structure and a printing method thereof, wherein the multi-main grid lines are manufactured by adopting a screen printing thick film conductive adhesive mode, all node/pad point designs are cancelled, no welding spot is arranged on the intersection point of the positive electrode main grid line and the auxiliary grid line, only the welding areas of XX-XXmm are reserved at the two ends of the main grid line, can reduce the shading area of the grid line to the minimum, reduce the Ag consumption, reduce the pattern design of shading loss of welding spots, meanwhile, only two ends of the back surface are reserved with XX-XXmm welding areas, and the consumption of the back surface silver paste is also reduced. Because the welding wire is not aligned and welded in series at the back end component, the welding strip material is saved, the operation is convenient, and the risk that the whole thinned circular welding strip cannot be inclined due to alignment, so that the false welding and shading loss are caused by offset exposure is avoided. The main grid line can also be designed into two sections, the design is compatible with a half-sheet design, and a small section of welding area with a wider main grid of XX-XXmm is designed at the tail end of each section of main grid, so that the welding of the battery is facilitated.
The technical scheme adopted by the invention is as follows:
the front electrode comprises a plurality of thin grid lines and main grid lines, the number of the main grid lines is not less than 9, the thin grid lines are perpendicular to the main grid lines, two ends of the main grid lines extend outwards to be connected with end welding pieces, end welding pieces arranged at two ends of the main grid lines are provided with end welding areas, and no welding spot is arranged at the intersection point of the main grid lines and the thin grid lines.
In a further preferred embodiment of the present invention, an inner bonding pad is extended and connected to a middle portion of the main gate line, and an inner bonding region is formed on the inner bonding pad disposed at the middle portion of the main gate line.
In a further preferred embodiment of the present invention, the width of the main gate line is 30um to 300um, and the thickness of the main gate line is 20 um to 200 um.
According to the invention, the width of the thin grid line is 20-50 um, and the thickness of the thin grid line is 20-80 um.
According to a further preferred embodiment of the present invention, four positioning dots are disposed around the front electrode, and the positioning dots are used for positioning and aligning the screen printing.
Further preferably, the paste for screen printing is silver paste, copper paste or a combination thereof.
A multi-master-grid solar cell, the structure of said cell comprising the multi-master-grid interconnect structure of any one of claims 1-6.
A printing method of a multi-main-grid solar cell interconnection structure is characterized in that a multi-main-grid line is manufactured in a mode of screen printing thick-film conductive adhesive, and comprises the following steps:
the first step is as follows: theoretically calculating the grid line body resistance, the contact resistance of the thin grid lines and the silicon, the silicon sheet body resistance and the like, and designing the optimal number of the thin grid lines, the optimal width of the main grid lines and the optimal width of the thin grid lines;
the second step is that: designing the total area of a positive electrode pattern;
the third step: adopting a distributed printing procedure, namely respectively printing a main grid line and a thin grid line to obtain a grid line pattern with required width and height, and forming a front electrode pattern;
the fourth step: and the two pieces of the assembly are smoothly in series contact at the end of the assembly, and are interconnected with the edge two-end welding areas of the main grid of the positive electrode and the main grid of the back electrode through the bent short welding pieces.
In summary, due to the adoption of the technical scheme, the invention has the beneficial effects that:
1. compared with the prior art, the invention adopts the design of connecting welding sheets at the two ends and the middle part of the main grid line, cancels the welding spot structure on the original main grid line, further cancels the MBB automatic welding wire welding process at the component end, saves the process, cancels the interconnection of the component manufacturing end by the welding wire, thereby improving the contraposition precision, avoiding the white exposure or the false welding problem, reducing the introduction of a high-volume complete set of automatic alignment equipment facilities to a certain extent, only arranging the welding zones at the two ends and the middle part of the multi-main-grid cell, saving the conductive silver paste, reducing the shading area, further improving the conversion efficiency, reducing the widths of the main grid line and the fine grid line by canceling the welding spot on the main grid line, reducing the shading area and further increasing the photoelectric conversion efficiency, preparing the multi-main grid line by adopting screen printing, reducing the paste consumption, greatly reducing the cost.
2. According to the invention, the four positioning dots are arranged on the periphery of the front electrode, so that accurate printing contact of the main grid line and the fine grid line is ensured, and deformation and displacement are avoided.
3. The invention is compatible with the equipment related to the traditional crystal silicon battery, does not need to introduce a high-cost complete set of automatic alignment equipment any more, can complete the encapsulation of the MBB battery and the component by less manpower and material cost, has low manufacturing cost and has better industrial application prospect.
4. Compared with the design of the conventional MBB battery conductive electrode, the design of welding sheets at two ends of the main grid is adopted, so that a welding strip and a complex and accurate alignment process of the welding strip are saved, and the current of the battery sheet is directly connected in series by the welding sheets at the two ends.
Drawings
The invention will now be described, by way of example, with reference to the accompanying drawings, in which:
FIG. 1 is a schematic diagram of a front electrode structure of the present invention;
FIG. 2 is a schematic view of another front electrode configuration of the present invention;
fig. 3 is a schematic view of a bus bar of the front electrode of the present invention;
fig. 4 is a schematic view of a thin grid line of the front motor of the present invention.
Reference numerals: 1-main grid line, 2-fine grid line, 3-end welding sheet, 4-inner welding sheet and 5-positioning dot.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are for purposes of illustration only and are not to be construed as limiting the invention, i.e., the described embodiments are merely a few embodiments of the invention, rather than all embodiments, and that all of the features disclosed in this specification, or all of the steps in any method or process disclosed, may be combined in any manner, except for mutually exclusive features and/or steps.
It should be noted that the terms "length," "width," "height," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "head," "tail," and the like, indicate orientations or positional relationships that are based on the orientations or positional relationships illustrated in the drawings, are used for convenience in describing the invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated, and therefore should not be construed as limiting the invention.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
It is noted that relational terms such as "first" and "second," and the like, may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The present invention is described in detail below with reference to fig. 1-4.
The first embodiment is as follows: a multi-main-grid solar cell interconnection structure comprises a front electrode and a back electrode, wherein the front electrode comprises a plurality of thin grid lines 2 and main grid lines 1, the number of the main grid lines 1 is not less than 9, as shown in figure 1, the main grid lines 1 are exemplified by 12 main grid lines 1, the main grid lines 1 are vertically arranged on a silicon chip, a plurality of thin grid lines 2 are uniformly distributed on the main grid lines 1, the thin grid lines 2 are mutually vertical to the main grid lines 1, two ends of the main grid lines 1 extend outwards to be connected with end welding sheets 3, the end welding sheets 3 arranged at two ends of the main grid lines 1 are provided with end welding areas, no welding spot is arranged at the intersection of the main grid lines 1 and the thin grid lines 2, the structure of the welding spot is cancelled, so that the shading area is reduced, the photoelectric conversion efficiency is improved, meanwhile, the welding spot design in the prior art is cancelled, the limitation of conventional thinking, for example, the cost is greatly reduced due to the fact that the number of the foreign MBB automatic welding wire welding equipment is tens of millions and the number of the foreign MBB automatic welding wire welding equipment is millions and millions, the process flow is shortened, the sheet forming rate is improved, four positioning circular dots 5 are arranged on the periphery of the front electrode, the positioning circular dots 5 are used for positioning and aligning screen printing, the paste of the screen printing is silver paste, copper paste or combination of the silver paste and the copper paste, accurate printing contact of the main grid line 1 and the fine grid line 2 is guaranteed, and deformation and displacement are avoided.
The width of main grid line 1 is 30um ~ 300um, and the thickness of main grid line 1 is 20-200um, and the width of thin grid line 2 is 20 ~ 50um, and thin grid line 2 thickness is at 20-80um, compares in traditional technology, has reduced main grid line 1's width, further reduces the shading area, further reduces silver thick liquid consumption.
The second embodiment: a multi-main-grid solar cell interconnection structure comprises a front electrode and a back electrode, wherein the front electrode comprises a plurality of thin grid lines 2 and main grid lines 1, the number of the main grid lines 1 is not less than 9, as shown in figure 2, 12 main grid lines 1 are illustrated as an example, the main grid lines 1 are vertically arranged on a silicon chip, a plurality of thin grid lines 2 are uniformly distributed on the main grid lines 1, the thin grid lines 2 are mutually vertical to the main grid lines 1, the two ends of the main grid lines 1 are outwards extended and connected with end welding pieces 3, the end welding pieces 3 arranged at the two ends of the main grid lines 1 form end welding areas, the middle part of the main grid lines 1 is upwards extended and connected with inner welding pieces 4, the inner welding pieces 4 arranged at the middle part of the main grid lines 1 form inner welding areas, no welding spot is arranged at the intersection points of the main grid lines 1 and the thin grid lines 2, the structure with no welding spot is arranged, so that the shading, the method overcomes the limitation of conventional thinking, cancels the process of welding equipment of welding points (cancels welding equipment, for example, a set of foreign MBB automatic welding wire welding equipment is more than ten million and less than millions, greatly reduces the cost), shortens the process flow, improves the sheet forming rate, is provided with four positioning dots 5 around the front electrode, the positioning dots 5 are used for positioning and aligning screen printing, the slurry of the screen printing is silver paste, copper paste or the combination thereof, ensures the accurate printing contact of the main grid line 1 and the fine grid line 2, and avoids deformation and displacement.
The width of main grid line 1 is 100um ~ 300um, and the thickness of main grid line 1 is 20-200um, and the width of thin grid line 2 is 20 ~ 50um, and thin grid line 2 thickness is at 20-60um, compares in traditional technology, has reduced main grid line 1's width, further reduces the shading area, further reduces silver thick liquid consumption.
The third embodiment is as follows: a multi-main grid solar cell comprises a front electrode and a back electrode, wherein the front electrode comprises a plurality of thin grid lines 2 and main grid lines 1, the number of the main grid lines 1 is not less than 9, as shown in figure 2, the main grid lines 1 are exemplified as 12 main grid lines 1, the main grid lines 1 are vertically arranged on a silicon chip, a plurality of thin grid lines 2 are uniformly distributed on the main grid lines 1, the thin grid lines 2 are mutually vertical to the main grid lines 1, the two ends of the main grid lines 1 are outwards extended and connected with end welding sheets 3, the end welding sheets 3 arranged at the two ends of the main grid lines 1 form end welding areas, the middle part of the main grid lines 1 is upwards extended and connected with inner welding sheets 4, the inner welding sheets 4 arranged at the middle part of the main grid lines 1 form inner welding areas, no welding spots are arranged at the intersection points of the main grid lines 1 and the thin grid lines 2, the structure of arranging the welding spots is cancelled, so, the method overcomes the limitation of conventional thinking, cancels the process of welding equipment of welding points (cancels welding equipment, for example, a set of foreign MBB automatic welding wire welding equipment is more than ten million and less than millions, greatly reduces the cost), shortens the process flow, improves the sheet forming rate, is provided with four positioning dots 5 around the front electrode, the positioning dots 5 are used for positioning and aligning screen printing, the slurry of the screen printing is silver paste, copper paste or the combination thereof, ensures the accurate printing contact of the main grid line 1 and the fine grid line 2, and avoids deformation and displacement.
The width of main grid line 1 is 180um ~ 300um, and the thickness of main grid line 1 is 25-40um, and the width of thin grid line 2 is 30 ~ 50um, and thin grid line 2 thickness is at 20-45um, compares in traditional technology, has reduced main grid line 1's width, further reduces the shading area, further reduces silver thick liquid consumption, improves photoelectric conversion efficiency.
The fourth embodiment is as follows: a printing method of a multi-main-grid solar cell interconnection structure is characterized in that a multi-main-grid line is manufactured in a mode of screen printing thick-film conductive adhesive, and comprises the following steps:
the first step is as follows: theoretically calculating the grid line body resistance, the contact resistance of the thin grid lines 2 and silicon, the silicon sheet body resistance and the like, and designing the optimal number of the thin grid lines 2, the optimal width of the main grid lines 1 and the optimal width of the thin grid lines 2;
the second step is that: designing the total area of a positive electrode pattern;
the third step: adopting a distributed printing procedure, namely respectively printing a main grid line 1 and a thin grid line 2 to obtain a grid line pattern with required width and height, and forming a front electrode pattern;
the fourth step: and the two pieces of the assembly are smoothly in series contact at the end of the assembly, and are interconnected with the edge two-end welding areas of the main grid of the positive electrode and the main grid of the back electrode through the bent short welding pieces.
The fixed connection, fixed mounting or fixed arrangement mode comprises the existing common technologies, such as bolt fixing, welding, riveting and the like, and all the technologies play a role in fixing without influencing the overall effect of the device.
Although the invention has been described herein with reference to a number of illustrative embodiments thereof, it should be understood that numerous other modifications and embodiments can be devised by those skilled in the art that will fall within the spirit and scope of the principles of this disclosure. More specifically, various variations and modifications are possible in the component parts and/or arrangements of the subject combination arrangement within the scope of the disclosure and claims of this application. In addition to variations and modifications in the component parts and/or arrangements, other uses will also be apparent to those skilled in the art.
Claims (8)
1. The utility model provides a many main grids solar cell interconnect structure, includes front electrode and back electrode, and front electrode includes many thin grid line (2) and main grid line (1), its characterized in that, the quantity of main grid line (1) is no less than 9, and thin grid line (2) and main grid line (1) mutually perpendicular, the outside extension in both ends of main grid line (1) is connected with end welding piece (3), the end welding piece (3) that main grid line (1) both ends set up are formed with the end weld area, the crossing of main grid line (1) and thin grid line (2) does not set up the solder joint.
2. The multi-main-grid solar cell interconnection structure according to claim 1, wherein the inner bonding tab (4) extends upwards from the middle of the main grid line (1), and the inner bonding tab (4) arranged at the middle of the main grid line (1) is formed with an inner bonding region.
3. The multi-main-gate solar cell interconnection structure according to claim 1, wherein the width of the main gate line (1) is 30um to 300um, and the thickness of the main gate line (1) is 20 to 200 um.
4. The multi-main-grid solar cell interconnection structure according to claim 1, wherein the width of the thin grid lines (2) is 20-50 um, and the thickness of the thin grid lines (2) is 20-80 um.
5. The multi-main-grid solar cell interconnection structure according to claim 1, wherein four positioning dots (5) are arranged around the front electrode, and the positioning dots (5) are used for positioning and aligning screen printing.
6. The multi-master-gate solar cell interconnect structure of claim 5, wherein the screen printed paste is silver paste, copper paste or a combination thereof.
7. A multi-primary-grid solar cell, characterized in that the structure of the cell comprises a multi-primary-grid interconnection structure according to any one of claims 1 to 6.
8. A printing method of a multi-main-grid solar cell interconnection structure is characterized in that a multi-main-grid line is manufactured in a mode of screen printing thick-film conductive adhesive, and comprises the following steps:
the first step is as follows: theoretically calculating the contact resistance of grid line body resistance, the thin grid lines (2) and silicon, the silicon sheet body resistance and the like, and designing the optimal number of the thin grid lines (2), the optimal width of the main grid lines (1) and the optimal width of the thin grid lines (2);
the second step is that: designing the total area of a positive electrode pattern;
the third step: adopting a distributed printing procedure, namely respectively printing a main grid line (1) and a thin grid line (2) to obtain a grid line pattern with required width and height, and forming a front electrode pattern;
the fourth step: and the two pieces of the assembly are smoothly in series contact at the end of the assembly, and are interconnected with the edge two-end welding areas of the main grid of the positive electrode and the main grid of the back electrode through the bent short welding pieces.
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| CN111959105A (en) * | 2020-09-01 | 2020-11-20 | 晋能光伏技术有限责任公司 | Solar cell printing screen and printing process thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111959105A (en) * | 2020-09-01 | 2020-11-20 | 晋能光伏技术有限责任公司 | Solar cell printing screen and printing process thereof |
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