CN110865464A - Laser projection device - Google Patents

Laser projection device Download PDF

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Publication number
CN110865464A
CN110865464A CN201911163795.7A CN201911163795A CN110865464A CN 110865464 A CN110865464 A CN 110865464A CN 201911163795 A CN201911163795 A CN 201911163795A CN 110865464 A CN110865464 A CN 110865464A
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CN
China
Prior art keywords
lens group
laser projection
projection device
zoom
group
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Pending
Application number
CN201911163795.7A
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Chinese (zh)
Inventor
王笑冰
柯华恒
黄燕燕
郑邦坚
成刚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Shenda Aurora Technology Co Ltd
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Shenzhen Shenda Aurora Technology Co Ltd
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Publication date
Application filed by Shenzhen Shenda Aurora Technology Co Ltd filed Critical Shenzhen Shenda Aurora Technology Co Ltd
Priority to CN201911163795.7A priority Critical patent/CN110865464A/en
Publication of CN110865464A publication Critical patent/CN110865464A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48Laser speckle optics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/095Refractive optical elements
    • G02B27/0955Lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30Collimators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/208Homogenising, shaping of the illumination light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Projection Apparatus (AREA)
  • Lenses (AREA)

Abstract

The laser projection device provided by the invention has the advantages that incident laser beams enter the zoom lens group after being expanded by the front fixed beam expanding lens group, the zoom lens group selects the diameter of the expanded beams and enters the compensating lens group, the compensating lens group compensates the light output by the zoom lens group and outputs collimated beams, the collimated beams are converged at the rear focal plane of the focusing lens group after passing through the focusing lens group, the beams diverged by the random bit picture at the rear focal plane are collimated by the rear fixed collimating lens group and then enter the fixed collimating lens group, and the collimated beams after being expanded are output by the rear fixed collimating lens group Collimation, light uniformization and speckle elimination.

Description

Laser projection device
Technical Field
The invention relates to the technical field of laser display, in particular to a laser projection device.
Background
The laser has the characteristics of directivity, good coherence and high brightness, and is widely applied to the fields of projection display, projection photoetching illumination systems and the like. Especially, the laser projection photoetching illuminating system in the field of micro-nano processing has higher requirements on the uniformity and the collimation of laser after beam expansion. Meanwhile, due to coherence of the laser, when the laser passes through components or reaches a display panel, serious speckle noise can be generated due to reflection, refraction, interference, diffraction, scattering and the like, and the photoetching quality is seriously influenced.
At present, the laser beam expander has two kinds of laser beam expanders of fixed multiplying power and variable multiplying power. Fixed power beam expanders, which expand the laser divergence angle, typically by a fixed lens group combination; the zooming beam expander changes the relative position of the lens group to regulate the divergence angle of light beams. The laser beam expanding collimating lens expands the diameter of a light beam according to a certain multiplying power. The product of the spot size and the divergence angle of the laser beam output from the laser is optically invariant, approximately a certain value. The compression laser divergence angle is actually the laser collimation. The compression divergence angle does not improve the beam quality, i.e. pure laser beam expansion does not. In the prior art, a micro-lens array or a phase picture and other devices are added in a collimation light path after laser beam expansion and collimation lens to homogenize light and eliminate speckles. The laser beam expanding collimating lens and the spot dissipating device are independent and have a loose structure, and a light beam after light homogenizing is surface divergent light, so that a high-quality collimated light beam is difficult to obtain by using a lens group. Another technique is to add a vibro-phase picture to the original laser beam and then collimate it with a fourier lens. Because the diameter of the output beam of a common laser is larger than 3mm, after a phase photo with a certain divergence angle, a high-quality uniform collimated beam is difficult to obtain by collimation of an integrated lens group.
In the existing laser display or projection lithography illumination system, speckle elimination and light uniformization collimation are generally realized by adopting a plurality of discrete optical elements, and the system has the advantages of complex and loose structure, poor stability and high power consumption.
Disclosure of Invention
Therefore, there is a need to provide a laser projection apparatus capable of simultaneously achieving continuous variable-power beam expansion, collimation, light uniformization and speckle elimination, which is directed to the defects existing in the prior art.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a laser projection device, comprising: preceding fixed beam expanding lens group, zoom lens group, compensation mirror group, focusing mirror group, random position photograph and back fixed collimating lens group that set gradually along laser beam propagation direction, wherein:
the laser beam enters the zoom lens group after being expanded by the front fixed beam expander group, the zoom lens group selects the expanded beam diameter and enters the compensation lens group, the compensation lens group compensates the light output by the zoom lens group and outputs collimated light beams, the collimated light beams are converged at the rear focal plane of the focusing lens group after passing through the focusing lens group, the light beams diverged by the random position photo positioned at the rear focal plane enter the fixed collimating lens group and are collimated by the rear fixed collimating lens group, and the collimated light beams are output, wherein the random position photo plays a role in weakening the spatial coherence of the incident collimated light beams.
In some preferred embodiments, the front fixed beam expander group can enlarge the beam divergence angle, and the front fixed beam expander group is a single lens or a multi-lens combination.
In some preferred embodiments, the beam diameter can be selected by adjusting the position of the variable power lens group back and forth, and the variable power lens group is a single lens or a multi-lens combination.
In some preferred embodiments, the compensating lens group can collimate the light beam by adjusting the position back and forth, and the compensating lens group is a single lens or a multi-lens combination.
In some preferred embodiments, the focusing lens group is a single lens or a multi-lens combination.
In some preferred embodiments, the random bit prints are mounted with a vibration driver that can rotate the random bit prints at high speed or vibrate radially at a fast speed, with a vibration frequency greater than 1000 Hz.
In some preferred embodiments, the random bitmaps are thin components with microstructures etched on quartz glass or other transparent hard materials, and the microstructures are randomly arranged concave-convex grains.
In some preferred embodiments, the front zoom lens group and the compensation lens group are linked to realize zoom beam expansion, the beam expansion magnification of the zoom beam expansion is continuously changed within a range of 0.3X to 10X, and the combined beam expansion magnification of the rear focusing lens group and the rear fixed collimating lens group is 5X.
In some preferred embodiments, the beam expansion factor of the laser projection device can be continuously changed within a range of 1.5X to 50X.
The invention adopts the technical scheme that the method has the advantages that:
the laser projection device provided by the invention has the advantages that incident laser beams enter the zoom lens group after being expanded by the front fixed beam expanding lens group, the zoom lens group selects the diameter of the expanded beams and enters the compensation lens group, the compensation lens group compensates the light output by the zoom lens group and outputs collimated beams, the collimated beams are converged at the rear focal plane of the focusing lens group after passing through the focusing lens group, the beams after being dispersed by the random position photo at the rear focal plane enter the fixed collimation lens group, and the expanded collimated beams are output by the rear fixed collimation lens group. Compared with laser beams which are not expanded, the laser projection device provided by the invention has the advantages that the beams which are expanded and then focused can be converged into a smaller focus, and can be approximately regarded as a standard focus of a rear collimating mirror group. The random bit photo is placed at the focusing point position, so that good light uniformizing and speckle eliminating effects can be achieved, and meanwhile, the high-quality collimated light beam is realized by the rear collimating lens group without being influenced, so that the continuous variable-magnification beam expanding, collimating, light uniformizing and speckle eliminating are realized, the light path design is simplified, the light path integration and miniaturization are facilitated, the light path adjusting difficulty is reduced, and the mounting precision is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a laser projection apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic view of a linkage mode of the zoom lens group and the compensating lens group in the continuous zoom beam expanding process of the laser projection apparatus provided in the embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, the present invention provides a laser projection apparatus, which includes a front fixed beam expander set 01, a zoom lens set 02, a compensation lens set 03, a focusing lens set 04, a random bit photo 05 and a rear fixed collimator set 07, which are sequentially arranged along a propagation direction of a laser beam.
The laser projection device works as follows:
the incident laser beam is expanded by the front fixed beam expander set 01 and then enters the zoom lens set 02, the zoom lens set 02 selects the expanded beam diameter and enters the compensating lens set 03, the compensating lens set 03 compensates the light output by the zoom lens set 02 and outputs a collimated beam, the collimated beam is converged at the rear focal plane of the focusing lens set 04 after passing through the focusing lens set 04, the beam scattered by the random bit photo at the rear focal plane is collimated by the rear fixed collimating lens set 07 and then enters the fixed collimating lens set 07, and the collimated beam after being expanded is output by the rear fixed collimating lens set 07, wherein the random bit photo 05 plays a role in weakening spatial coherence to the incident collimated beam.
In some preferred embodiments, the front fixed beam expander group 01 can enlarge the beam divergence angle, and the front fixed beam expander group 01 is a single lens or a multi-lens combination.
In some preferred embodiments, the variable power lens group 02 can select the beam diameter by adjusting the position back and forth, and the variable power lens group 02 is a single lens or a multi-lens combination.
It can be understood that the beam diameter is selected by the position of the zoom lens group 02, and the minimum distance between the zoom lens group 02 and the front fixed beam expander group 01 is that the two are not in contact.
In some preferred embodiments, the compensating lens group 03 can collimate the light beam by adjusting the position back and forth, and the compensating lens group 03 is a single lens or a multi-lens combination.
It can be understood that the minimum distance between the compensating lens group 03 and the focusing lens group 04 is that the compensating lens group 03 and the focusing lens group 04 are not in contact with each other, the position of the compensating lens group 03 is also constrained by the position of the zoom lens group 02, and the compensating lens group 03 and the zoom lens group 02 are linked to each other to realize the optimal distance.
In some preferred embodiments, the focusing lens group 04 is a single lens or a multi-lens combination, the focusing lens group 04 can focus the incident light beam, and the focal length of the focusing lens group 04 is preferably 10 mm.
In some preferred embodiments, the random bit-print 05 is installed with a vibration driver 06, the vibration driver 06 can rotate the random bit-print 05 at a high speed or vibrate the random bit-print radially at a high speed, the vibration frequency is greater than 1000Hz, and the random bit-print can homogenize and eliminate speckles of the passing light beams.
In some preferred embodiments, the random bit pattern 05 is a thin component formed by etching a microstructure on quartz glass or other transparent hard material, wherein the microstructure is randomly arranged concave-convex grains, and the size of the concave-convex grains is preferably 1 μm.
It can be understood that the random bit photo 05 is designed according to the principle of light wave interference, and a modern optical micromachining process technology is adopted to etch a thin component of a microstructure on quartz glass or other transparent hard materials, and the vibrating surface microstructure weakens the spatial coherence of laser on a large program, thereby achieving the effect of weakening speckles.
Because the random number photograph 05 is placed at the focus point of the light beam after the focusing lens group 04, the collimation degree of the rear fixed collimating lens group 07 on the light beam can be ensured to a great extent.
In some preferred embodiments, the front zoom lens group 02 and the compensating lens group 03 are linked to realize zoom beam expansion, the beam expansion ratio of the zoom beam expansion is continuously changed within a range of 0.3X to 10X, and the combined beam expansion ratio of the rear focusing lens group 04 and the rear fixed collimating lens group 07 is 5X.
It can be understood that, due to the combination of the rear fixed collimating lens group 07 and the focusing lens group 04, the beam expansion effect on the collimated light beams incident to the focusing lens group is achieved, and the beam expansion factor is equal to the ratio of the focal lengths of the rear fixed collimating lens group 07 and the focusing lens group 04.
The focusing lens group 04 plays a role in focusing light beams on the random photo 05 to realize light-homogenizing and spot-dissipating functions, and simultaneously forms a Fourier transform system with the rear fixed collimating lens group 07 to further expand the light beams, wherein the expansion multiple is 5X, and the whole device finally realizes the functions of 1.5X-50X continuous variable-power expansion, collimation, light-homogenizing and spot-dissipating.
In some preferred embodiments, the beam expansion factor of the laser projection device can be continuously changed within a range of 1.5X to 50X.
Referring to fig. 2, a schematic diagram of a linkage manner of the zoom lens group and the compensating lens group in the continuous zoom beam expanding process of the laser projection apparatus 02 according to the present invention includes a front fixed beam expanding lens group 01, a zoom lens group 02, a compensating lens group 03, a focusing lens group 04, a random photo 05, and a rear fixed collimating lens group 07, which are sequentially arranged along a propagation direction of a laser beam. Wherein:
12 is the distance between the front fixed beam expander set 01 and the zoom lens set 02, 23 is the distance between the zoom lens set 02 and the compensating lens set 03, 34 is the distance between the compensating lens set 03 and the focusing lens set 04, 45 is the distance between the focusing lens set 04 and the random bit picture 05, and 56 is the distance between the random bit picture 05 and the fixed collimator lens set 07.
In the above schematic diagrams, the positions of the zoom lens group 02 and the compensating lens group 03 are adjusted simultaneously and linked, and the schematic diagrams 021, 022 and 023 are schematic diagrams of the relationship between the positions of the front zoom lens group 02 and the compensating lens group 03 when they are linked during the zoom beam expanding process, and the schematic diagrams illustrate the working way of changing the diameter of the original laser beam by 0.3X to 10X times.
Compared with laser beams which are not expanded, the laser projection device provided by the invention has the advantages that the beams which are expanded and then focused can be converged into a smaller focus which can be approximately regarded as a standard focus of a rear collimating lens group, a random bit photo is placed at the position of the focus, good light uniformizing and speckle eliminating effects can be realized, and meanwhile, the rear collimating lens group is not influenced to realize high-quality collimated beams, so that the continuous variable-magnification expanding, collimating, light uniformizing and speckle eliminating effects are realized, the light path design is simplified, the light path integration and miniaturization are more convenient, the light path adjustment difficulty is reduced, and the installation precision is improved.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
Of course, the cathode material of the laser projection apparatus of the present invention may have various changes and modifications, and is not limited to the specific structure of the above-described embodiments. In conclusion, the scope of the present invention should include those changes or substitutions and modifications which are obvious to those of ordinary skill in the art.

Claims (9)

1. A laser projection device, comprising: preceding fixed beam expanding lens group, zoom lens group, compensation mirror group, focusing mirror group, random position photograph and back fixed collimating lens group that set gradually along laser beam propagation direction, wherein:
the laser beam enters the zoom lens group after being expanded by the front fixed beam expander group, the zoom lens group selects the expanded beam diameter and enters the compensation lens group, the compensation lens group compensates the light output by the zoom lens group and outputs collimated light beams, the collimated light beams are converged at the rear focal plane of the focusing lens group after passing through the focusing lens group, the light beams diverged by the random position photo positioned at the rear focal plane enter the fixed collimating lens group and are collimated by the rear fixed collimating lens group, and the collimated light beams are output, wherein the random position photo plays a role in weakening the spatial coherence of the incident collimated light beams.
2. The laser projection device as claimed in claim 1, wherein the front fixed beam expander set is capable of magnifying the beam divergence angle, and the front fixed beam expander set is a single lens or a multi-lens combination.
3. The laser projection apparatus as claimed in claim 1, wherein the variable power lens group is a single lens or a multi-lens combination, and the beam diameter can be selected by adjusting the position back and forth.
4. The laser projection device as claimed in claim 1, wherein the compensating optical group is a single lens or a multi-lens combination for collimating the light beam by adjusting the position back and forth.
5. The laser projection device of claim 1, wherein the focusing mirror assembly is a single lens or a multi-lens combination.
6. The laser projection apparatus as claimed in claim 1, wherein the random bit picture is installed with a vibration driver, the vibration driver can rotate the random bit picture at a high speed or vibrate the random bit picture radially at a high speed, and the vibration frequency is greater than 1000 Hz.
7. The laser projection device as claimed in claim 6, wherein the random bitmap is a thin component formed by etching a microstructure on quartz glass or other transparent hard materials, and the microstructure is randomly arranged concave-convex grains.
8. The laser projection device according to claim 1, wherein the front zoom lens group and the compensating lens group are linked to realize zoom beam expansion, the beam expansion ratio of the zoom beam expansion is continuously changed within a range of 0.3X to 10X, and the combined beam expansion ratio of the rear focusing lens group and the rear fixed collimating lens group is 5X.
9. The laser projection device as claimed in claim 1, wherein the beam expansion factor of the laser projection device can be continuously changed within a range of 1.5X to 50X.
CN201911163795.7A 2019-11-25 2019-11-25 Laser projection device Pending CN110865464A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111812856A (en) * 2020-07-24 2020-10-23 深圳市点睛创视技术有限公司 Three-primary-color laser speckle-dissipating device and micro-projection display system
CN112404704A (en) * 2020-11-03 2021-02-26 深圳市韵腾激光科技有限公司 Variable-power laser beam expander and laser processing system
CN112872582A (en) * 2020-12-29 2021-06-01 武汉华工激光工程有限责任公司 Continuously adjustable large-size shaping system and method
CN115373206A (en) * 2021-05-21 2022-11-22 中强光电股份有限公司 Illumination system and projection device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090114645A (en) * 2008-04-30 2009-11-04 엘지전자 주식회사 Laser projection device
CN104252047A (en) * 2013-06-26 2014-12-31 Cq科技有限公司 Laser projection system with speckle elimination function
CN107976794A (en) * 2018-01-12 2018-05-01 苏州大学 A kind of variable mating plate thickness and the mating plate of length illuminate microscopical lighting system
CN208224631U (en) * 2018-06-25 2018-12-11 陈琛 A kind of optical system generating low speckle annular beam
CN208752314U (en) * 2018-06-26 2019-04-16 王璞 A kind of laser zooming collimating and beam expanding system
CN211318897U (en) * 2019-11-25 2020-08-21 深圳市深大极光科技有限公司 Laser projection device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090114645A (en) * 2008-04-30 2009-11-04 엘지전자 주식회사 Laser projection device
CN104252047A (en) * 2013-06-26 2014-12-31 Cq科技有限公司 Laser projection system with speckle elimination function
CN107976794A (en) * 2018-01-12 2018-05-01 苏州大学 A kind of variable mating plate thickness and the mating plate of length illuminate microscopical lighting system
CN208224631U (en) * 2018-06-25 2018-12-11 陈琛 A kind of optical system generating low speckle annular beam
CN208752314U (en) * 2018-06-26 2019-04-16 王璞 A kind of laser zooming collimating and beam expanding system
CN211318897U (en) * 2019-11-25 2020-08-21 深圳市深大极光科技有限公司 Laser projection device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111812856A (en) * 2020-07-24 2020-10-23 深圳市点睛创视技术有限公司 Three-primary-color laser speckle-dissipating device and micro-projection display system
CN112404704A (en) * 2020-11-03 2021-02-26 深圳市韵腾激光科技有限公司 Variable-power laser beam expander and laser processing system
CN112872582A (en) * 2020-12-29 2021-06-01 武汉华工激光工程有限责任公司 Continuously adjustable large-size shaping system and method
CN115373206A (en) * 2021-05-21 2022-11-22 中强光电股份有限公司 Illumination system and projection device
CN115373206B (en) * 2021-05-21 2024-05-24 中强光电股份有限公司 Illumination system and projection device

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