CN110860504B - Cleaning device and cleaning method for quartz glass slag - Google Patents
Cleaning device and cleaning method for quartz glass slag Download PDFInfo
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- CN110860504B CN110860504B CN201810984045.5A CN201810984045A CN110860504B CN 110860504 B CN110860504 B CN 110860504B CN 201810984045 A CN201810984045 A CN 201810984045A CN 110860504 B CN110860504 B CN 110860504B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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Abstract
The invention provides a quartz glass slag cleaning device and a cleaning method, wherein the device comprises a quartz glass fixing device, a vibration table, a vibration driving device, a supercritical carbon dioxide fluid generating device, an even distributor, a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device; the supercritical fluid, the chemical cleaning agent and the mechanical vibration are adopted to carry out composite cleaning, the three can generate synergistic effect, the mechanical vibration can enhance the contact area of the chemical cleaning agent and the slag, meanwhile, the permeability of the supercritical fluid is also enhanced, and the supercritical fluid can further enhance the permeability of the chemical cleaning agent to the slag, thereby enhancing the reaction capability of the chemical cleaning agent and the slag.
Description
Technical Field
The invention relates to the technical field of quartz glass processing, in particular to a cleaning device and a cleaning method for quartz glass slag.
Background
The quartz glass has a series of excellent physicochemical properties such as high hardness, good thermal property, high insulativity, high light transmittance to various wave bands, good chemical stability and the like, becomes a high and new technical material which is increasingly widely applied, is widely applied to the fields of semiconductors, photoelectrons, optics, aerospace industry and the like, and along with the development of modern scientific technology, various applications put higher requirements on the processing precision and the surface quality of the quartz glass.
The technology of cutting quartz glass by laser is that the quartz glass is locally heated by utilizing the energy concentration of laser, and the temperature of a material of a laser irradiation point is sharply increased after the material absorbs the energy of the laser, so that the material is melted and gasified, and a cavity is formed, thereby realizing the purpose of locally removing the quartz glass. The laser cutting technology has the characteristics of excellent processing quality, high efficiency, wide processing range, easiness in realizing automatic control and the like, and solves the problem of poor applicability of the traditional mechanical processing method. However, in the laser cutting process, slag of the quartz glass remains at the position of the cutting seam, and even if various methods such as adding auxiliary gas are adopted in the processing process, the formation of the slag cannot be completely avoided, the existence of the slag directly influences the surface processing quality and the processing precision of the quartz glass, and an effective cleaning method for completely removing the slag is not available at present.
Disclosure of Invention
The invention aims to provide a cleaning device and a cleaning method for quartz glass slag, aiming at solving the problem that the cleaning method in the prior art can not completely clean the slag at the cutting position of the quartz glass, and the cleaning device and the cleaning method can effectively clean the slag at the cutting position of the quartz glass.
A cleaning device for quartz glass slag comprises a quartz glass fixing device, a vibration table, a vibration driving device, a supercritical carbon dioxide fluid generating device, an even distributor, a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
the quartz glass fixing device is used for fixing the quartz glass to be cleaned on the vibration table;
the vibration table is electrically connected with the vibration driving device, and the vibration driving device is used for driving the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction;
the supercritical carbon dioxide fluid generation device is provided with a fluid outflow pipeline, the first cleaning agent storage device is provided with a first inflow pipeline and a first outflow pipeline, the second cleaning agent storage device is provided with a second inflow pipeline and a second outflow pipeline, the third cleaning agent storage device is provided with a third inflow pipeline and a third outflow pipeline, and the uniform distributor is provided with a gas-liquid inflow pipeline and a gas-liquid ejection outlet;
the first cleaning agent storage device, the second cleaning agent storage device and the third cleaning agent storage device are connected in parallel, the first inflow pipeline, the second inflow pipeline and the third inflow pipeline are all connected with the fluid outflow pipeline, and the first outflow pipeline, the second outflow pipeline and the third outflow pipeline are all connected with the gas-liquid inflow pipeline;
the first inflow pipeline is provided with a first control valve, the second inflow pipeline is provided with a second control valve, the third inflow pipeline is provided with a third control valve, the first outflow pipeline is provided with a fourth control valve, the second outflow pipeline is provided with a fifth control valve, and the third outflow pipeline is provided with a sixth control valve.
Further, a first heating device is arranged in the first cleaning agent storage device, a second heating device is arranged in the second cleaning agent storage device, and a third heating device is arranged in the third cleaning agent storage device.
A cleaning method of quartz glass slag adopts the cleaning device of quartz glass slag to clean quartz glass to be cleaned, and the method comprises the following steps:
fixing the quartz glass to be cleaned on a vibrating table through a quartz glass fixing device;
preparing a first cleaning agent, a second cleaning agent and a third cleaning agent, and respectively placing the first cleaning agent, the second cleaning agent and the third cleaning agent in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
opening a first control valve, a second control valve and a third control valve to enable supercritical carbon dioxide fluid to enter the first cleaning agent storage device, the second cleaning agent storage device and the third cleaning agent storage device respectively;
the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction, and simultaneously controls to open a corresponding fourth control valve, a corresponding fifth control valve and/or a corresponding sixth control valve, and a first cleaning agent carrying supercritical carbon dioxide fluid, a second cleaning agent carrying supercritical carbon dioxide fluid and/or a third cleaning agent carrying supercritical carbon dioxide fluid enter the uniform distributor to be uniformly dispersed and then are sprayed out from the gas-liquid spraying outlet, so that the quartz glass to be cleaned is cleaned in multiple stages;
after the multi-stage cleaning, the quartz glass is taken out and is cleaned by deionized water.
And drying the quartz glass cleaned by the deionized water.
Further, the quartz glass to be cleaned is fixed on the vibrating table through the quartz glass fixing device, so that the lower position corresponding to the laser cutting part of the quartz glass to be cleaned is hollow.
Further, the method comprises the following steps of preparing a first cleaning agent, a second cleaning agent and a third cleaning agent, and respectively placing the first cleaning agent, the second cleaning agent and the third cleaning agent in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
heating the first cleaning agent, the second cleaning agent and the third cleaning agent to boiling points.
Further, the quartz glass to be cleaned is subjected to multistage cleaning, which comprises the following steps:
in the first cleaning stage, a vibration driving device drives a vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 8Hz-10Hz, the amplitude is 1mm-2mm, and meanwhile, a fourth control valve is opened, so that a first cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of a quartz glass joint to be cleaned, and the cleaning time is 5min-8 min;
in the second cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 12Hz-20Hz, the amplitude is 0.6mm-0.8mm, and meanwhile, a fifth control valve is opened, so that a second cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of the cutting seam of the quartz glass to be cleaned, and the cleaning time is 8min-10 min;
in the third cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 25Hz-30Hz, the amplitude is 0.4mm-0.6mm, and meanwhile, the sixth control valve is opened, so that the third cleaning agent carrying the supercritical carbon dioxide fluid cleans the position of the cutting seam of the quartz glass to be cleaned, and the cleaning time is 8min-10 min.
Further, the width of the contact range of the first cleaning agent carrying the supercritical carbon dioxide fluid, the second cleaning agent carrying the supercritical carbon dioxide fluid and the third cleaning agent carrying the supercritical carbon dioxide fluid and the quartz glass to be cleaned is not less than 3mm, and the central line of the width is a laser cutting edge.
Further, the quartz glass is cleaned by deionized water, the ultrasonic cleaning time in the deionized water is 5min-10min, and the ultrasonic frequency is 90kHz-120 kHz.
Further, the drying time is 10min-15min, and the drying temperature is 80 ℃ to 90 ℃.
Further, the first cleaning agent is nitric acid, the second cleaning agent is hydrofluoric acid, and the third cleaning agent is isopropanol.
The cleaning device and the cleaning method for the quartz glass slag provided by the invention at least have the following beneficial effects:
the cleaning device for the quartz glass slag provided by the embodiment at least has the following beneficial effects:
(1) the permeability of the supercritical carbon dioxide fluid and the reaction characteristic of the chemical cleaning agent and the slag are utilized, so that the cleaning of the slag is facilitated;
(2) the quartz glass to be cleaned is driven by the vibrating table to vibrate at different frequencies and amplitudes, so that the slag can be uniformly and effectively contacted with the chemical cleaning agent, and the aim of efficiently cleaning the slag is fulfilled;
(3) after the supercritical carbon dioxide fluid and the cleaning agent are homogenized by the homogenizer, the cleaning agent carrying the supercritical carbon dioxide fluid can uniformly and stably act on the position of the joint to be cleaned, so that the cleaning reliability is improved;
(4) the supercritical fluid, the chemical cleaning agent and the mechanical vibration are adopted to carry out composite cleaning, the three can generate synergistic effect, the mechanical vibration can enhance the contact area of the chemical cleaning agent and the slag, meanwhile, the permeability of the supercritical fluid is also enhanced, and the supercritical fluid can further enhance the permeability of the chemical cleaning agent to the slag, thereby enhancing the reaction capability of the chemical cleaning agent and the slag.
Drawings
FIG. 1 is a schematic structural view of an embodiment of a cleaning apparatus for silica glass slag according to the present invention.
FIG. 2 is a flow chart of an embodiment of a method for cleaning silica glass slag provided by the present invention.
Detailed Description
In order to make the objects, technical solutions and effects of the present invention clearer and clearer, the present invention is further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example one
Referring to fig. 1, the present embodiment provides a cleaning apparatus for quartz glass slag, which includes a quartz glass fixing device 8, a vibration table 9, a vibration driving device 10, a supercritical carbon dioxide fluid generating device 1, a uniform distributor 6, a first cleaning agent storage device 3, a second cleaning agent storage device 4, and a third cleaning agent storage device 5;
the quartz glass fixing device 8 is used for fixing the quartz glass 7 to be cleaned on the vibration table 9;
the vibration table 9 is electrically connected with a vibration driving device 10, and the vibration driving device 10 is used for driving the vibration table 9 to do reciprocating motion in the X-axis direction and the Y-axis direction;
the supercritical carbon dioxide fluid generation device 1 is provided with a fluid outflow pipeline 11, the first cleaning agent storage device 3 is provided with a first inflow pipeline 12 and a first outflow pipeline 13, the second cleaning agent storage device 4 is provided with a second inflow pipeline 14 and a second outflow pipeline 15, the third cleaning agent storage device 5 is provided with a third inflow pipeline 16 and a third outflow pipeline 17, and the uniform distributor 6 is provided with a gas-liquid inflow pipeline 18 and a gas-liquid injection outlet 19;
the first cleaning agent storage device 3, the second cleaning agent storage device 4 and the third cleaning agent storage device 5 are connected in parallel, a first inflow pipeline 12, a second inflow pipeline 14 and a third inflow pipeline 16 are all connected with a fluid outflow pipeline 11, and a first outflow pipeline 13, a second outflow pipeline 15 and a third outflow pipeline 17 are all connected with a gas-liquid inflow pipeline;
the first inflow line 12 is provided with a first control valve 20, the second inflow line 14 is provided with a second control valve 21, the third inflow line 16 is provided with a third control valve 22, the first outflow line 13 is provided with a fourth control valve 23, the second outflow line 15 is provided with a fifth control valve 24, and the third outflow line 17 is provided with a sixth control valve 25.
In a preferred embodiment, a first heating device (not shown) is provided in the first cleaning agent storage device 3, a second heating device (not shown) is provided in the second cleaning agent storage device 4, and a third heating device (not shown) is provided in the third cleaning agent storage device 5.
For some cleaning agents which need to be heated, heating can be performed by the first heating device, the second heating device and the third heating device.
Specifically, the quartz glass to be cleaned is fixed on the vibration table 9 through a quartz glass fixing device 8, the quartz glass fixing device 8 can be a clamping device or a device with a clamping groove, the quartz glass to be cleaned is clamped into the clamping groove, and the lower position corresponding to the laser cutting position of the quartz glass to be cleaned is hollow.
The vibration table 9 can reciprocate in the X-axis direction and the Y-axis direction according to different preset frequencies and amplitudes under the driving of the vibration driving device 10.
The supercritical carbon dioxide fluid generation device 1 can provide supercritical carbon dioxide fluid, which enters the first cleaning agent storage device 3, the second cleaning agent storage device 4 and the third cleaning agent storage device 5 through the fluid outflow pipeline 11, the first inflow pipeline 12, the second inflow pipeline 14 and the third inflow pipeline 16, the supercritical carbon dioxide fluid is respectively mixed with the first cleaning agent, the second cleaning agent and the third cleaning agent, and enters the uniform distributor 6 through a first outflow pipeline 13, a second outflow pipeline 15, a third outflow pipeline 17 and a gas-liquid inflow pipeline 18, uniformly dispersing in the uniform distributor 6, then forming a first cleaning agent carrying supercritical carbon dioxide fluid, a second cleaning agent carrying supercritical carbon dioxide fluid and a third cleaning agent carrying supercritical carbon dioxide fluid, and the molten slag is sprayed out through the gas-liquid spraying outlet 19 to reach the cutting position of the quartz glass to be cleaned, wherein the molten slag exists.
The cleaning device for the quartz glass slag provided by the embodiment at least has the following beneficial effects:
(1) the permeability of the supercritical carbon dioxide fluid and the reaction characteristic of the chemical cleaning agent and the slag are utilized, so that the cleaning of the slag is facilitated;
(2) the quartz glass to be cleaned is driven by the vibrating table to vibrate at different frequencies and amplitudes, so that the slag can be uniformly and effectively contacted with the chemical cleaning agent, and the aim of efficiently cleaning the slag is fulfilled;
(3) after the supercritical carbon dioxide fluid and the cleaning agent are homogenized by the homogenizer, the cleaning agent carrying the supercritical carbon dioxide fluid can uniformly and stably act on the position of the joint to be cleaned, so that the cleaning reliability is improved;
(4) the supercritical fluid, the chemical cleaning agent and the mechanical vibration are adopted to carry out composite cleaning, the three can generate synergistic effect, the mechanical vibration can enhance the contact area of the chemical cleaning agent and the slag, meanwhile, the permeability of the supercritical fluid is also enhanced, and the supercritical fluid can further enhance the permeability of the chemical cleaning agent to the slag, thereby enhancing the reaction capability of the chemical cleaning agent and the slag.
Example two
Referring to fig. 2, this embodiment provides a method for cleaning quartz glass slag, in which a cleaning apparatus for quartz glass slag provided in the first embodiment is used to clean quartz glass to be cleaned, and the method includes:
step S201, fixing the quartz glass to be cleaned on a vibration table through a quartz glass fixing device;
step S202, preparing a first cleaning agent, a second cleaning agent and a third cleaning agent, and respectively placing the first cleaning agent, the second cleaning agent and the third cleaning agent in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
step S203, preparing a first cleaning agent, a second cleaning agent and a third cleaning agent, and respectively placing the first cleaning agent, the second cleaning agent and the third cleaning agent in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
step S204, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction, meanwhile, the corresponding fourth control valve, the corresponding fifth control valve and/or the corresponding sixth control valve are controlled to be opened, a first cleaning agent carrying supercritical carbon dioxide fluid, a second cleaning agent carrying supercritical carbon dioxide fluid and/or a third cleaning agent carrying supercritical carbon dioxide fluid enter the uniform distributor to be uniformly dispersed and then are sprayed out from the gas-liquid spraying outlet, and the quartz glass to be cleaned is cleaned in multiple stages;
in step S205, the quartz glass is taken out after the multi-stage cleaning, and deionized water cleaning is performed.
And S206, drying the quartz glass cleaned by the deionized water.
Please refer to the first embodiment for the structure of the cleaning apparatus for quartz glass slag, which is not described herein again.
Specifically, step S201 is executed to fix the quartz glass to be cleaned on the vibrating table through the quartz glass fixing device, so that the lower position corresponding to the laser cutting portion of the quartz glass to be cleaned is hollowed out.
Step S202 is executed, a first cleaning agent, a second cleaning agent and a third cleaning agent are configured and respectively placed in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device, and if heating is needed, the first cleaning agent, the second cleaning agent and the third cleaning agent can be respectively heated to boiling points through a first heating device, a second heating device and a third heating device.
And S203, opening the first control valve, the second control valve and the third control valve, so that the supercritical carbon dioxide fluid respectively enters the first cleaning agent storage device, the second cleaning agent storage device and the third cleaning agent storage device, and the first cleaning agent, the second cleaning agent and the third cleaning agent all carry the supercritical carbon dioxide fluid.
Step S204 is executed, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction, and the quartz glass to be cleaned is cleaned in multiple stages:
in the first cleaning stage, a vibration driving device drives a vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 8Hz-10Hz, the amplitude is 1mm-2mm, a fourth control valve is opened simultaneously, so that a first cleaning agent carrying supercritical carbon dioxide fluid cleans the position of a quartz glass cutting seam to be cleaned, the cleaning time is 5min-8min, and then the fourth control valve is closed;
in the second cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 12Hz-20Hz, the amplitude is 0.6mm-0.8mm, meanwhile, a fifth control valve is opened, so that a second cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of the cutting seam of the quartz glass to be cleaned, the cleaning time is 8min-10min, and then the fifth control valve is closed;
in the third cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 25Hz-30Hz, the amplitude is 0.4mm-0.6mm, meanwhile, the sixth control valve is opened, so that the third cleaning agent carrying the supercritical carbon dioxide fluid cleans the cutting position of the quartz glass to be cleaned, the cleaning time is 8min-10min, and then the sixth control valve is closed.
As a preferred embodiment, the contact range of the first cleaning agent carrying the supercritical carbon dioxide fluid, the second cleaning agent carrying the supercritical carbon dioxide fluid and the third cleaning agent carrying the supercritical carbon dioxide fluid with the quartz glass to be cleaned is not less than 3mm in width, and the center line of the width is the laser cutting edge.
In a preferred embodiment, the first cleaning agent is nitric acid, the second cleaning agent is hydrofluoric acid, and the third cleaning agent is isopropyl alcohol.
And S205 is executed, the quartz glass is taken out, ultrasonic cleaning is carried out in deionized water, the cleaning time is 5min-10min, and the ultrasonic frequency is 90kHz-120 kHz.
And S206, drying after deionized water cleaning, wherein the drying time is 10min-15min, and the drying temperature is 80-90 ℃.
The cleaning method of the quartz glass slag provided by the embodiment at least comprises the following beneficial effects:
(1) the permeability of the supercritical carbon dioxide fluid and the reaction characteristic of the chemical cleaning agent and the slag are utilized, so that the cleaning of the slag is facilitated;
(2) the quartz glass to be cleaned is driven by the vibrating table to vibrate at different frequencies and amplitudes, so that the slag can be uniformly and effectively contacted with the chemical cleaning agent, and the aim of efficiently cleaning the slag is fulfilled;
(3) after the supercritical carbon dioxide fluid and the cleaning agent are homogenized by the homogenizer, the cleaning agent carrying the supercritical carbon dioxide fluid can uniformly and stably act on the position of the joint to be cleaned, so that the cleaning reliability is improved;
(4) the supercritical fluid, the chemical cleaning agent and the mechanical vibration are adopted to carry out composite cleaning, the three can generate synergistic effect, the mechanical vibration can enhance the contact area of the chemical cleaning agent and the slag, meanwhile, the permeability of the supercritical fluid is also enhanced, and the supercritical fluid can further enhance the permeability of the chemical cleaning agent to the slag, thereby enhancing the reaction capability of the chemical cleaning agent and the slag.
It will be understood that modifications and variations can be made by persons skilled in the art in light of the above teachings and all such modifications and variations are intended to be included within the scope of the invention as defined in the appended claims.
Claims (5)
1. A quartz glass slag cleaning method is characterized in that a quartz glass slag cleaning device is adopted to clean quartz glass to be cleaned, and the quartz glass slag cleaning device comprises a quartz glass fixing device, a vibration table, a vibration driving device, a supercritical carbon dioxide fluid generating device, an even distributor, a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device;
the quartz glass fixing device is used for fixing the quartz glass to be cleaned on the vibration table;
the vibration table is electrically connected with the vibration driving device, and the vibration driving device is used for driving the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction;
the supercritical carbon dioxide fluid generation device is provided with a fluid outflow pipeline, the first cleaning agent storage device is provided with a first inflow pipeline and a first outflow pipeline, the second cleaning agent storage device is provided with a second inflow pipeline and a second outflow pipeline, the third cleaning agent storage device is provided with a third inflow pipeline and a third outflow pipeline, and the uniform distributor is provided with a gas-liquid inflow pipeline and a gas-liquid ejection outlet;
the first cleaning agent storage device, the second cleaning agent storage device and the third cleaning agent storage device are connected in parallel, the first inflow pipeline, the second inflow pipeline and the third inflow pipeline are all connected with the fluid outflow pipeline, and the first outflow pipeline, the second outflow pipeline and the third outflow pipeline are all connected with the gas-liquid inflow pipeline;
a first control valve is arranged on the first inflow pipeline, a second control valve is arranged on the second inflow pipeline, a third control valve is arranged on the third inflow pipeline, a fourth control valve is arranged on the first outflow pipeline, a fifth control valve is arranged on the second outflow pipeline, and a sixth control valve is arranged on the third outflow pipeline;
a first heating device is arranged in the first cleaning agent storage device, a second heating device is arranged in the second cleaning agent storage device, and a third heating device is arranged in the third cleaning agent storage device;
the method comprises the following steps:
fixing the quartz glass to be cleaned on a vibrating table through a quartz glass fixing device;
preparing a first cleaning agent, a second cleaning agent and a third cleaning agent, and respectively placing the first cleaning agent, the second cleaning agent and the third cleaning agent in a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device, wherein the first cleaning agent is nitric acid, the second cleaning agent is hydrofluoric acid, and the third cleaning agent is isopropanol;
opening a first control valve, a second control valve and a third control valve to enable supercritical carbon dioxide fluid to respectively enter a first cleaning agent storage device, a second cleaning agent storage device and a third cleaning agent storage device, and heating the first cleaning agent, the second cleaning agent and the third cleaning agent to boiling points;
the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction, the corresponding fourth control valve, the corresponding fifth control valve or the corresponding sixth control valve are opened by simultaneous control, a first cleaning agent carrying supercritical carbon dioxide fluid, a second cleaning agent carrying supercritical carbon dioxide fluid or a third cleaning agent carrying supercritical carbon dioxide fluid enter the uniform distributor to be uniformly dispersed and then are sprayed out from the gas-liquid spraying outlet, and the quartz glass to be cleaned is cleaned in multiple stages:
in the first cleaning stage, a vibration driving device drives a vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 8Hz-10Hz, the amplitude is 1mm-2mm, and meanwhile, a fourth control valve is opened, so that a first cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of a quartz glass joint to be cleaned, and the cleaning time is 5min-8 min;
in the second cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 12Hz-20Hz, the amplitude is 0.6mm-0.8mm, and meanwhile, a fifth control valve is opened, so that a second cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of the cutting seam of the quartz glass to be cleaned, and the cleaning time is 8min-10 min;
in the third cleaning stage, the vibration driving device drives the vibration table to do reciprocating motion in the X-axis direction and the Y-axis direction by adopting the frequency of 25Hz-30Hz, the amplitude is 0.4mm-0.6mm, and meanwhile, a sixth control valve is opened, so that a third cleaning agent carrying supercritical carbon dioxide fluid is used for cleaning the position of the cutting seam of the quartz glass to be cleaned, and the cleaning time is 8min-10 min;
taking out the quartz glass after the multi-stage cleaning, and cleaning with deionized water;
and drying the quartz glass cleaned by the deionized water.
2. The method for cleaning quartz glass slag according to claim 1, wherein the quartz glass to be cleaned is fixed on a vibrating table by a quartz glass fixing device, so that the lower position corresponding to the laser cutting part of the quartz glass to be cleaned is hollowed out.
3. The method for cleaning quartz glass slag according to claim 1, wherein the contact range width of the first cleaning agent carrying the supercritical carbon dioxide fluid, the second cleaning agent carrying the supercritical carbon dioxide fluid and the third cleaning agent carrying the supercritical carbon dioxide fluid with the quartz glass to be cleaned is not less than 3mm, and the center line of the width is the laser cutting edge.
4. The method for cleaning quartz glass slag according to claim 1, wherein the quartz glass is cleaned with deionized water, the ultrasonic cleaning time in the deionized water is 5min to 10min, and the ultrasonic frequency is 90kHz to 120 kHz.
5. The method for cleaning quartz glass slag according to claim 1, wherein the drying time is 10min to 15min and the drying temperature is 80 ℃ to 90 ℃.
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| CN115475794A (en) * | 2022-10-10 | 2022-12-16 | 安徽光智科技有限公司 | Lens cleaning method |
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