CN110837145A - Method for regulating and controlling spectrum of narrow-band filter - Google Patents
Method for regulating and controlling spectrum of narrow-band filter Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 42
- 238000001228 spectrum Methods 0.000 title claims abstract description 26
- 230000001276 controlling effect Effects 0.000 title claims abstract description 9
- 230000001105 regulatory effect Effects 0.000 title claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 55
- 230000003595 spectral effect Effects 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000012360 testing method Methods 0.000 claims description 17
- 238000000137 annealing Methods 0.000 claims description 14
- 238000002834 transmittance Methods 0.000 claims description 7
- 239000005350 fused silica glass Substances 0.000 claims description 6
- 238000000411 transmission spectrum Methods 0.000 claims description 6
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 238000004321 preservation Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 16
- 239000010408 film Substances 0.000 abstract description 15
- 239000012788 optical film Substances 0.000 abstract description 4
- 238000013461 design Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract description 3
- 239000010453 quartz Substances 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000007735 ion beam assisted deposition Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
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Abstract
The invention relates to a method for regulating and controlling a spectrum of a narrow-band filter, belonging to the technical field of optical films. The invention designs a regulating and controlling method of a narrow-band filter spectrum, which can effectively change the wavelength position and the waveform of the narrow-band filter spectrum by adopting a high-temperature heat treatment method and adjusting heat treatment process parameters. In the implementation process, the wide-cut narrow-band filter film is prepared on a K9 or quartz substrate, the prepared filter is subjected to heat treatment, and the spectral position and the shape of the narrow-band filter can be effectively adjusted by changing the heat treatment time and the heat treatment temperature. The result shows that the method can translate the spectral position of the optical filter and adjust the spectral position to a position meeting the requirement, greatly improves the qualified rate of the finished product of the narrow-band optical filter, and has an important effect on the preparation of the narrow-band optical filter.
Description
Technical Field
The invention belongs to the technical field of optical thin films, and particularly relates to a method for regulating and controlling a spectrum of a narrow-band filter.
Background
With the rapid development of optical systems, narrow-band filters have become an important research content in the field of optical thin films at present. The narrow-band filter is used as a device for filtering and selecting spectral lines, has wide application in laser technology, optical communication technology, high-resolution imaging, laser radar, satellite remote sensing detection and the like, and is especially important in a high-resolution imaging system. The research on narrow-band filters at home and abroad is highly focused, and the efforts of expanding cut-off wavelength, narrowing line width, reducing non-uniformity, and improving peak transmittance and reliability are continuously carried out, and become one of the most active subjects in the field of optical thin films.
In high-precision optical element applications, the methods currently used for depositing optical films can be broadly divided into: physical vapor deposition and chemical vapor deposition. The mainstream film forming method is still physical vapor deposition, which means that a film layer is prepared by a physical method, and the physical vapor deposition method mainly comprises electron beam evaporation, ion beam sputtering, ion beam assisted deposition, magnetron sputtering and the like. The narrow-band filter has small bandwidth and small central wavelength tolerance, so the requirement on the control precision of the film thickness is extremely high. In the film forming process, the systematic error of film deposition depends on the film thickness monitoring precision of the film monitoring system, which puts high precision and high stability requirements on the optical film thickness instrument. The high-precision monitoring system has high requirements on the resolution of the monochromator and the stability of signals. Meanwhile, the intensity and stability of the light source directly affect the stability of the final signal, so that the selection of the optical film thickness instrument has great difficulty in accurately preparing the narrow-band filtering film. When the substrate rotation mode of the commonly used dual-ion-beam sputter coating machine adopts a planetary rotation working mode at present, the film thickness monitoring mainly takes deposition time as a control parameter, so that the spectral characteristics of the prepared narrow-band filter have deviation from the designed spectral characteristics, and therefore, the research on the narrow-band filter spectrum regulation and control technology needs to be developed.
In summary, no report is found on the current method for spectrum control of the narrow-band filter.
Disclosure of Invention
Technical problem to be solved
The technical problem to be solved by the invention is as follows: how to design a method capable of adjusting the spectrum of the optical filter realizes the adjustment of the spectrum of the narrow-band optical filter, eliminates the spectrum deviation caused by preparation errors, and improves the qualification rate of optical filter products.
(II) technical scheme
In order to solve the technical problem, the invention provides a method for regulating and controlling the spectrum of a narrow-band filter, which comprises the following steps:
1) preparing a narrow-band filter;
2) testing the spectrum of the prepared narrow-band filter;
3) selecting heat treatment process parameters, and carrying out heat treatment on the narrow-band filter;
4) testing the spectrum of the narrow-band filter after heat treatment;
5) according to the technical requirements, proper heat treatment process parameters are selected, so that the spectral characteristics of the narrow-band filter meet the technical requirements.
Preferably, in step 1, the ion beam sputtering deposition technique is selected to prepare a narrow-band filter with a central wavelength of λ on a fused silica or glass substrateiUnit is nm, bandwidth is DjIn units of nm, where λiIn the range of 300nm to 2000nm, DjThe range is 1 to 100 nm.
Preferably, in step 2, a spectrophotometer is used to test the spectrum of the prepared narrowband filter with the central wavelength of λ1Bandwidth of D1。
Preferably, in step 3, the process parameters for performing the heat treatment on the narrowband filter are as follows: heat treatment temperature TkIn the range of 20 ℃ to 500 ℃ for a heat treatment time HmThe range of (1) is 2 to 48 hours.
Preferably, in step 4, a spectrophotometer is used to test the spectrum of the heat-treated narrowband filter with the center wavelength of λ2Bandwidth of D2。
Preferably, in step 1, a 365nm narrow-band filter film is prepared on one side of a fused quartz substrate, and a 365nm short-wave pass is prepared on the other side.
Preferably, in step 2, a spectrophotometer is adopted to test the transmission spectrum of the prepared 365nm narrow-band filter, the central wavelength is 362.3nm, and the bandwidth is 8.5 nm.
Preferably, in step 3, the narrowband filter is subjected to heat treatment by an atmospheric heat treatment, the heat treatment temperature points are selected to be 150 ℃, 200 ℃, 250 ℃, 300 ℃ and 350 ℃, the annealing time of each temperature point is 12 hours, the temperature rise time from the normal temperature to the annealing temperature point is 2 hours, and the temperature is naturally reduced to the normal temperature after 12 hours of heat preservation.
Preferably, in step 4, after each heat treatment temperature point is processed, a spectrophotometer is used to measure a transmittance spectrum of the narrowband filter, a transmittance test curve under different annealing temperature conditions is used to obtain a central wavelength and a bandwidth of the narrowband filter, so as to obtain a correlation between the central wavelength and the temperature of the 365nm narrowband filter, the correlation between the half-height width and the temperature of the 365nm narrowband filter gradually red-shifts the central wavelength of the 365nm narrowband filter with the increase of the heat treatment temperature, after 350 ℃ heat treatment, the central wavelength red-shifts by 2.9nm, and with the increase of the heat treatment temperature, the bandwidth of the 365nm narrowband filter gradually increases, and after 350 ℃ heat treatment, the bandwidth changes from 8.53nm to 8.87 nm.
Preferably, in step 5, a suitable annealing temperature point is selected to obtain the desired spectral characteristics of the narrowband filter.
(III) advantageous effects
The invention designs a regulating and controlling method of a narrow-band filter spectrum, which can effectively change the wavelength position and the waveform of the narrow-band filter spectrum by adopting a high-temperature heat treatment method and adjusting heat treatment process parameters. In the implementation process, the wide-cut narrow-band filter film is prepared on a K9 or quartz substrate, the prepared filter is subjected to heat treatment, and the spectral position and the shape of the narrow-band filter can be effectively adjusted by changing the heat treatment time and the heat treatment temperature. The result shows that the method can translate the spectral position of the optical filter and adjust the spectral position to a position meeting the requirement, greatly improves the qualified rate of the finished product of the narrow-band optical filter, and has an important effect on the preparation of the narrow-band optical filter.
Drawings
FIG. 1 is a schematic diagram of a 365nm narrow-band filter structure;
FIG. 2 is a graph of a 365nm narrow band filter transmittance test;
FIG. 3 is a temperature profile of a thermal processing parameter;
FIG. 4 is a graph of transmittance test of a 365nm narrow-band filter under different annealing temperature conditions;
FIG. 5 is a graph of the correlation between the center wavelength of a 365nm narrowband filter and temperature;
FIG. 6 is a graph of the correlation between the half-width of the 365nm narrowband filter and temperature.
Detailed Description
In order to make the objects, contents, and advantages of the present invention clearer, the following detailed description of the embodiments of the present invention will be made in conjunction with the accompanying drawings and examples.
The invention provides a method for regulating and controlling a spectrum of a narrow-band optical filter, which comprises the following steps:
1) firstly, selecting ion beam sputtering deposition technology, preparing narrow-band filter with central wavelength of lambda on fused quartz or glass substrateiUnit is nm, bandwidth is DjIn units of nm, where λiIn the range of 300nm to 2000nm, DjThe range is 1 to 100 nm.
2) Testing the spectrum of the prepared narrow-band filter with a spectrophotometer with a central wavelength of lambda1Bandwidth of D1；
3) Selecting heat treatment process parameters, and performing heat treatment on the narrow-band filter at a heat treatment temperature TkIn units of ℃ and heat treatment time of HmIn units of h, where TkIn the range of 20 ℃ to 500 ℃, HmThe range of (1) is 2 to 48 hours;
4) testing the spectrum of the heat-treated narrow-band filter by using a spectrophotometer with the central wavelength of lambda2Bandwidth of D2。
5) According to the technical requirements, proper heat treatment process parameters are selected, so that the spectral characteristics of the narrow-band filter meet the technical requirements.
The following example experiments were performed with a 365nm narrow band filter, and the experimental procedure was as follows:
1) firstly, selecting an ion beam sputtering deposition technology, preparing a 365nm narrow-band light filtering film on one surface of a fused quartz substrate, and preparing 365nm short-wave pass light on the other surface, wherein the schematic structural diagram of the 365nm narrow-band light filtering film is shown in figure 1.
2) A spectrophotometer is adopted to test the transmission spectrum of the prepared 365nm narrow-band filter, the test result is shown in figure 2, the central wavelength is 362.3nm, and the bandwidth is 8.5 nm.
3) And (3) carrying out heat treatment on the narrow-band filter by adopting an atmospheric heat treatment mode, wherein specific heat treatment process parameters are shown in figure 3, heat treatment temperature points are selected to be 150 ℃, 200 ℃, 250 ℃, 300 ℃ and 350 ℃, the annealing time of each temperature point is 12 hours, the temperature rise time from the normal temperature to the annealing temperature point is 2 hours, and the temperature is naturally reduced to the normal temperature after 12 hours of heat preservation.
4) After each heat treatment temperature point, a spectrophotometer is adopted to measure the transmittance spectrum of the film, and a transmittance test curve of the 365nm narrow-band filter under different annealing temperature conditions is shown in figure 4. The center wavelength and the bandwidth of the narrow-band filter are obtained from transmittance test curves under different annealing temperature conditions, the correlation between the center wavelength and the temperature of the 365nm narrow-band filter is shown in fig. 5, and the correlation between the half-height width and the temperature of the 365nm narrow-band filter is shown in fig. 6. As can be seen from fig. 5, the central wavelength of the 365nm narrowband filter gradually red-shifts with the increase of the heat treatment temperature, and the central wavelength red-shifts by 2.9nm after the heat treatment at 350 ℃. As can be seen from FIG. 6, the 365nm narrowband filter gradually becomes wider with the increase of the heat treatment temperature, and the bandwidth changes from 8.53nm to 8.87nm after the heat treatment at 350 ℃.
5) And selecting a proper annealing temperature point to obtain the required spectral characteristics of the narrow-band filter.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A method for regulating and controlling a narrow-band filter spectrum is characterized by comprising the following steps:
1) preparing a narrow-band filter;
2) testing the spectrum of the prepared narrow-band filter;
3) selecting heat treatment process parameters, and carrying out heat treatment on the narrow-band filter;
4) testing the spectrum of the narrow-band filter after heat treatment;
5) according to the technical requirements, proper heat treatment process parameters are selected, so that the spectral characteristics of the narrow-band filter meet the technical requirements.
2. The method of claim 1, wherein in step 1, the ion beam sputter deposition technique is selected to produce a narrow band filter centered at λ on a fused silica or glass substrateiUnit is nm, bandwidth is DjIn units of nm, where λiIn the range of 300nm to 2000nm, DjThe range is 1 to 100 nm.
3. The method of claim 2, wherein in step 2, the prepared narrowband filter spectrum is tested using a spectrophotometer with a center wavelength λ1Bandwidth of D1。
4. The method of claim 3, wherein in step 3, the process parameters for performing the heat treatment on the narrowband filter are as follows: heat treatment temperature TkIn the range of 20 ℃ to 500 ℃ for a heat treatment time HmThe range of (1) is 2 to 48 hours.
5. The method of claim 4, wherein in step 4, the spectrum of the heat-treated narrowband filter is tested using a spectrophotometer with a center wavelength λ2Bandwidth of D2。
6. The method of claim 5, wherein in step 1, a 365nm narrow band filter film is formed on one side of the fused silica substrate and a 365nm short wavelength pass is formed on the other side.
7. The method of claim 6, wherein in step 2, the prepared 365nm narrowband filter transmission spectrum is tested by a spectrophotometer, and the center wavelength is 362.3nm, and the bandwidth is 8.5 nm.
8. The method of claim 7, wherein in step 3, the narrowband filter is subjected to heat treatment by means of atmospheric heat treatment, the heat treatment temperature points are selected to be 150 ℃, 200 ℃, 250 ℃, 300 ℃ and 350 ℃, the annealing time of each temperature point is 12 hours, the heating time from the normal temperature to the annealing temperature point is 2 hours, and the temperature is naturally reduced to the normal temperature after 12 hours of heat preservation.
9. The method as claimed in claim 8, wherein in step 4, after each heat treatment temperature point, a transmittance spectrum is measured by a spectrophotometer, the central wavelength and bandwidth of the narrowband filter are obtained from transmittance test curves at different annealing temperatures, the correlation between the central wavelength and temperature of the 365nm narrowband filter is obtained, the correlation between the half-height width and temperature of the 365nm narrowband filter is obtained, the central wavelength of the 365nm narrowband filter gradually red-shifts with the rise of the heat treatment temperature, the central wavelength red-shifts by 2.9nm after the heat treatment at 350 ℃, the bandwidth of the 365nm narrowband filter gradually becomes larger with the rise of the heat treatment temperature, and the bandwidth changes from 8.53nm to 8.87nm after the heat treatment at 350 ℃.
10. The method of claim 9, wherein in step 5, a suitable annealing temperature point is selected to obtain the desired spectral characteristics of the narrowband filter.
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Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0835467A1 (en) * | 1995-06-26 | 1998-04-15 | Minnesota Mining And Manufacturing Company | Transparent multilayer device |
| US20040084437A1 (en) * | 2002-11-05 | 2004-05-06 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
| CN1516821A (en) * | 2001-06-18 | 2004-07-28 | 伊吉斯半导体公司 | Index tunable thin film interference coatings |
| EP1497235A2 (en) * | 2002-04-25 | 2005-01-19 | PPG Industries Ohio, Inc. | Method of making coated articles having an oxygen barrier coating and coated articles made thereby |
| CN101045550A (en) * | 2006-03-27 | 2007-10-03 | 东芝照明技术株式会社 | Ultraviolet cut material, ultraviolet cut filter, discharge lamp and lighting apparatus |
| CN101393294A (en) * | 2007-05-31 | 2009-03-25 | 肖特股份公司 | Interference filter and method for its production |
| US20110267825A1 (en) * | 2010-04-28 | 2011-11-03 | Fujifilm Corporation | Insulated light-reflective substrate |
| CN103116200A (en) * | 2013-02-05 | 2013-05-22 | 李金宗 | Adaptor system achieved based on narrow band interference filter and active marker |
| CN107561614A (en) * | 2017-09-01 | 2018-01-09 | 天津津航技术物理研究所 | A kind of heavy caliber uniformity optical filter and preparation method thereof |
| CN108007568A (en) * | 2017-12-19 | 2018-05-08 | 湖南宏动光电有限公司 | A kind of light spectrum image-forming type micro optical filter and preparation method thereof |
| CN109143600A (en) * | 2018-09-04 | 2019-01-04 | 长春理工大学光电信息学院 | A kind of 3D eyeglass and preparation method thereof |
| US20190025483A1 (en) * | 2017-07-24 | 2019-01-24 | Viavi Solutions Inc. | Optical filter |
| CN109809689A (en) * | 2017-11-22 | 2019-05-28 | 肖特股份有限公司 | Substrate and optical filter for optical filter |
-
2019
- 2019-11-21 CN CN201911146781.4A patent/CN110837145B/en active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0835467A1 (en) * | 1995-06-26 | 1998-04-15 | Minnesota Mining And Manufacturing Company | Transparent multilayer device |
| CN1516821A (en) * | 2001-06-18 | 2004-07-28 | 伊吉斯半导体公司 | Index tunable thin film interference coatings |
| EP1497235A2 (en) * | 2002-04-25 | 2005-01-19 | PPG Industries Ohio, Inc. | Method of making coated articles having an oxygen barrier coating and coated articles made thereby |
| US20040084437A1 (en) * | 2002-11-05 | 2004-05-06 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
| CN101045550A (en) * | 2006-03-27 | 2007-10-03 | 东芝照明技术株式会社 | Ultraviolet cut material, ultraviolet cut filter, discharge lamp and lighting apparatus |
| CN101393294A (en) * | 2007-05-31 | 2009-03-25 | 肖特股份公司 | Interference filter and method for its production |
| US20110267825A1 (en) * | 2010-04-28 | 2011-11-03 | Fujifilm Corporation | Insulated light-reflective substrate |
| CN103116200A (en) * | 2013-02-05 | 2013-05-22 | 李金宗 | Adaptor system achieved based on narrow band interference filter and active marker |
| US20190025483A1 (en) * | 2017-07-24 | 2019-01-24 | Viavi Solutions Inc. | Optical filter |
| CN107561614A (en) * | 2017-09-01 | 2018-01-09 | 天津津航技术物理研究所 | A kind of heavy caliber uniformity optical filter and preparation method thereof |
| CN109809689A (en) * | 2017-11-22 | 2019-05-28 | 肖特股份有限公司 | Substrate and optical filter for optical filter |
| CN108007568A (en) * | 2017-12-19 | 2018-05-08 | 湖南宏动光电有限公司 | A kind of light spectrum image-forming type micro optical filter and preparation method thereof |
| CN109143600A (en) * | 2018-09-04 | 2019-01-04 | 长春理工大学光电信息学院 | A kind of 3D eyeglass and preparation method thereof |
Non-Patent Citations (4)
| Title |
|---|
| CETINORGU, E等: "The effect of annealing on filtered vacuum arc deposited ZnO thin films", 《SURFACE & COATINGS TECHNOLOGY》 * |
| 尚鹏等: "多金属层诱导透射紫外"日盲"探测成像滤光片设计与低温制备研究", 《红外与激光工程》 * |
| 张宇翔等: "快速光热退火制备多晶硅薄膜", 《半导体光电》 * |
| 王成等: "应力变化对多层薄膜窄带滤光片透射光谱的影响", 《光学 精密工程》 * |
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