CN110773505B - Silicon wafer cleaning device and method - Google Patents
Silicon wafer cleaning device and method Download PDFInfo
- Publication number
- CN110773505B CN110773505B CN201911063219.5A CN201911063219A CN110773505B CN 110773505 B CN110773505 B CN 110773505B CN 201911063219 A CN201911063219 A CN 201911063219A CN 110773505 B CN110773505 B CN 110773505B
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- CN
- China
- Prior art keywords
- cleaning
- silicon wafer
- roller
- lines
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 189
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 146
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 145
- 239000010703 silicon Substances 0.000 title claims abstract description 145
- 238000000034 method Methods 0.000 title claims abstract description 26
- 235000012431 wafers Nutrition 0.000 claims abstract description 141
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 238000005520 cutting process Methods 0.000 claims abstract description 5
- 239000012530 fluid Substances 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 description 6
- 239000004570 mortar (masonry) Substances 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911063219.5A CN110773505B (en) | 2019-10-31 | 2019-10-31 | Silicon wafer cleaning device and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911063219.5A CN110773505B (en) | 2019-10-31 | 2019-10-31 | Silicon wafer cleaning device and method |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110773505A CN110773505A (en) | 2020-02-11 |
CN110773505B true CN110773505B (en) | 2022-06-28 |
Family
ID=69388654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911063219.5A Active CN110773505B (en) | 2019-10-31 | 2019-10-31 | Silicon wafer cleaning device and method |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110773505B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114226294A (en) * | 2020-09-09 | 2022-03-25 | 中国科学院微电子研究所 | Wafer cleaning device and wafer cleaning method |
CN114361078A (en) * | 2022-01-06 | 2022-04-15 | 淮安永捷电子有限公司 | Wafer cleaning equipment and method for electronic product manufacturing |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6523553B1 (en) * | 1999-03-30 | 2003-02-25 | Applied Materials, Inc. | Wafer edge cleaning method and apparatus |
JP2002313767A (en) * | 2001-04-17 | 2002-10-25 | Ebara Corp | Substrate processor |
CN102658273A (en) * | 2012-05-09 | 2012-09-12 | 上海宏力半导体制造有限公司 | Cleaning device |
KR20140088714A (en) * | 2013-01-03 | 2014-07-11 | 주식회사 엘지실트론 | An apparatus for slicing an ingot |
CN203281546U (en) * | 2013-05-31 | 2013-11-13 | 浙江金乐太阳能科技有限公司 | Silicon wafer bubble washing device |
CN206296237U (en) * | 2016-12-07 | 2017-07-04 | 安徽爱森能源有限公司 | A kind of surface cleaning apparatus of silicon rod |
CN208098664U (en) * | 2017-09-01 | 2018-11-16 | 高皓淳 | A kind of use for laboratory wave carrier piece cleaning device |
CN109411393A (en) * | 2018-10-25 | 2019-03-01 | 德淮半导体有限公司 | Wafer cleaning device |
CN109604251B (en) * | 2018-12-29 | 2022-04-05 | 西安奕斯伟材料科技有限公司 | Cleaning device and cleaning method |
CN110252727A (en) * | 2019-06-26 | 2019-09-20 | 西安奕斯伟硅片技术有限公司 | A kind of crystal bar cleaning device |
-
2019
- 2019-10-31 CN CN201911063219.5A patent/CN110773505B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN110773505A (en) | 2020-02-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20211022 Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant after: Xi'an yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: Room 1323, block a, city gate, No.1 Jinye Road, high tech Zone, Xi'an, Shaanxi 710065 Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |