CN110745830B - 多晶硅生产中二氯硅烷的平衡控制方法及*** - Google Patents
多晶硅生产中二氯硅烷的平衡控制方法及*** Download PDFInfo
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- CN110745830B CN110745830B CN201810811595.7A CN201810811595A CN110745830B CN 110745830 B CN110745830 B CN 110745830B CN 201810811595 A CN201810811595 A CN 201810811595A CN 110745830 B CN110745830 B CN 110745830B
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- trichlorosilane
- dichlorosilane
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
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CN201810811595.7A CN110745830B (zh) | 2018-07-23 | 2018-07-23 | 多晶硅生产中二氯硅烷的平衡控制方法及*** |
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CN110745830A CN110745830A (zh) | 2020-02-04 |
CN110745830B true CN110745830B (zh) | 2021-08-06 |
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CN115445231B (zh) * | 2022-10-09 | 2023-06-16 | 新特能源股份有限公司 | 一种精馏塔产品的在线监控调节***、方法及装置 |
CN116654942B (zh) * | 2023-05-31 | 2024-06-14 | 宁夏润阳硅材料科技有限公司 | 一种多晶硅还原原料中回收高纯二硅测算控制方法及*** |
CN116495741B (zh) * | 2023-05-31 | 2024-06-18 | 宁夏润阳硅材料科技有限公司 | 一种多晶硅生产伴生二硅原料化利用方法及*** |
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CN101357288B (zh) * | 2007-07-31 | 2011-08-10 | 中国恩菲工程技术有限公司 | 一种从生产多晶硅所产生的尾气中循环回收氯化氢的方法 |
DE102010040293A1 (de) * | 2010-09-06 | 2012-03-08 | Wacker Chemie Ag | Verfahren zur Herstellung von polykristallinem Silicium |
CN203033766U (zh) * | 2013-01-23 | 2013-07-03 | 内蒙古盾安光伏科技有限公司 | 多晶硅生产中副产物的回收*** |
CN206444413U (zh) * | 2017-02-06 | 2017-08-29 | 江苏鑫华半导体材料科技有限公司 | 一种电子级多晶硅尾气吸收的控制*** |
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Application publication date: 20200204 Assignee: Xinte silicon based new materials Co.,Ltd. Assignor: XINTE ENERGY Co.,Ltd. Contract record no.: X2022990000325 Denomination of invention: Balance control method and system of dichlorosilane in polysilicon production Granted publication date: 20210806 License type: Common License Record date: 20220627 Application publication date: 20200204 Assignee: Inner Mongolia Xinte silicon material Co.,Ltd. Assignor: XINTE ENERGY Co.,Ltd. Contract record no.: X2022990000326 Denomination of invention: Balance control method and system of dichlorosilane in polysilicon production Granted publication date: 20210806 License type: Common License Record date: 20220627 |