Device and method for measuring wavefront distortion of atomic absolute gravimeter in real time
Technical Field
The invention belongs to the field of wavefront distortion measurement of an atomic absolute gravimeter, and particularly relates to a device for measuring wavefront distortion of the atomic absolute gravimeter in real time and a measuring method for measuring wavefront distortion of the atomic absolute gravimeter in real time.
Background
The atomic absolute gravimeter is a novel gravimeter based on an atomic interferometer, and the basic principle of the atomic absolute gravimeter is that a group of atoms is thrown up or freely falls down in vacuum, the beam splitting, reflection and interference of the group of atoms are realized by utilizing the control of a pair of Raman lights (with the wavelength of 780nm), and interference fringes containing gravity information are obtained, so that the value of absolute gravity acceleration is deduced. Since the interferometer measurement relies on the phase difference between its two paths, each atom acts like a separate gravity detector and is not subject to drift, aging or wear. The development of atomic absolute gravimeters has been over decades, and has become one of the main instruments for high-precision absolute gravity measurement.
One important factor affecting the measurement accuracy of the atomic absolute gravimeter is the influence caused by wavefront distortion. FIG. 1 shows
Is a drawing of an experimental apparatus and process for implementing atomic interference in a vacuum chamber by using a raman pulse (pulse laser with a wavelength of 780nm) sequence. The atomic average transition probability obtained finally is:
wherein, Δ φ ═ Δ φ0+ delta phi, the part containing gravity information being delta phi0=keffgT2And delta phi is the phase shift caused by the systematic error of wavefront distortion. The measurement error δ g of gravity can therefore be expressed as:
keffis the effective wave vector, which can be written as keff=ka+kbAnd T is the atom free evolution time.
The phase error of wavefront distortion means that the measurement of g is shifted due to non-parallelism of the wavefront of raman light (780nm wavelength laser). Its wavefront aberration can be expressed as:
Δφwavefront=Δφ1-2Δφ2+Δφ3,
Δφ
1、Δφ
2、Δφ
3are respectively shown in
Pulse-pi pulse
Wavefront distortion at pulseAs shown in fig. 2, the phase error caused by the wave front distortion after the interference process is that since the atoms have a lateral diffusion velocity and the phase of the atoms is related to the position of the atomic group:
n
i(r) represents
Pulse, pi pulse,
The distribution of the radicals in the pulse is different from stage to stage because the atoms have a transverse diffusion speed. Delta phi
wfReferring to the phase difference of the raman wave front, the collimated raman light can be regarded as a plane wave, so the wave front aberration is caused by the fact that a window at the bottom of a vacuum cavity in the device, a quarter wave plate and a raman light reflector at the bottom of the device are not strictly planes as shown in fig. 1. Under the condition that the mirror distortion of the optical element cannot be eliminated, the optimal method is to measure the surface shapes of the cavity bottom window, the quarter-wave plate and the bottom reflector and calculate the wavefront distortion and the brought deviation of the Raman light.
In fact, we can measure the profile of the measured element using a Shack Hartmann wavefront analyzer. As shown in fig. 4, the surface shape of the transmission element is measured, and the wavefront distortion introduced by the transmission of the laser light through the element can be known only by measuring the collimated laser light (the laser light with 780nm wavelength is selected as the raman wavelength in the atomic interferometer) with the same area as or larger than the surface shape to be measured as the reference surface shape, putting the element to be measured into the optical path and measuring the result by the wavefront analyzer, and subtracting the two results to obtain the surface shape of the element. The wavefront distortion caused by the quarter-wave plate and the reflecting mirror can be easily measured by the method, but because the vacuum cavity is closed, the laser emitted from the interior of the vacuum cavity can not be used as reference light to be measured in real time in the technical aspect, and therefore the uncertainty of the measurement of g caused by the wavefront distortion cannot be analyzed by the ideal method for system errors. Solving the wavefront distortion added by the vacuum chamber bottom louver is the key to solving our proposed problem.
At present, the most common method is to use the deviation value of g obtained each time to fit and reshape the wave surface shape by changing the conditions of Raman light spot size or temperature. Because the signal-to-noise ratio of interference signals is extremely low after the diameter of the light spot is small to a certain degree, the wave surface cannot be perfectly fitted, and the extrapolation through the known data is predicted according to the trend of the known data, so that the uncertainty is still high. The existing technical method cannot be accurately obtained.
Disclosure of Invention
The invention aims to overcome the defects of the existing method, provide a device for measuring the wavefront distortion of the atomic absolute gravimeter in real time, and also provide a measuring method for measuring the wavefront distortion of the atomic absolute gravimeter in real time.
The purpose of the invention is realized by the following technical scheme:
a device for measuring wave front distortion of an atomic absolute gravimeter in real time comprises a laser source, a laser coupling head, a beam splitter flat sheet, a reflector, a WFS wave front analyzer, and a vacuum cavity bottom window sheet arranged on a vacuum cavity,
the laser light source emits laser through the laser coupling head, the laser emitted by the laser coupling head forms transmission light and reflection light through the light splitting flat sheet, the transmission light emits to the reflecting mirror, the reflecting mirror reflects the transmission light, the transmission light reflected by the reflecting mirror returns to the light splitting flat sheet along an original light path, and the light splitting flat sheet reflects the transmission light reflected by the reflecting mirror to the WFS wavefront analyzer; the reflected light enters the vacuum cavity bottom window sheet, the vacuum cavity bottom window sheet reflects the reflected light, the original light path of the reflected light reflected by the vacuum cavity bottom window sheet returns to the light splitting flat sheet and transmits the light splitting flat sheet to enter the WFS wavefront analyzer.
The laser source emits laser as first laser or second laser through the laser coupling head, a first reflecting film is plated on one surface of the outer side of the window sheet at the bottom of the vacuum cavity, the wavelength of the first laser is the same as the reflecting wavelength of the first reflecting film, a second reflecting film is plated on one surface of the inner side of the window sheet at the bottom of the vacuum cavity, and the wavelength of the second laser is the same as the reflecting wavelength of the second reflecting film.
The laser coupling head is plated with a full-transmission film, and the wavelength range of the first laser to the second laser is included in the transmission wavelength range of the full-transmission film.
A method for measuring wavefront distortion of an atomic absolute gravimeter in real time comprises the following steps:
step 1, emitting first laser by a laser source through a laser coupling head, shielding a window sheet at the bottom of a vacuum cavity, enabling the first laser to partially transmit a beam splitter to emit to a reflector, reflecting the first laser by the reflector, reflecting the beam splitter back by a first laser original optical path reflected by the reflector and reflecting the beam splitter to a WFS wavefront analyzer by the beam splitter, recording a first surface type measurement result measured by the WFS wavefront analyzer,
step 2, shielding a reflector, reflecting a first laser part to a vacuum cavity bottom window sheet after the first laser part is reflected by a light splitting flat sheet, reflecting the first laser by a first reflection film plated on one side of the outer side of the vacuum cavity bottom window sheet, reflecting the first laser back to the light splitting flat sheet through a first laser original light path reflected by the first reflection film and transmitting the light splitting flat sheet to a WFS (wavefront analyzer), recording a second surface type measurement result measured by the WFS wavefront analyzer, and subtracting the first surface type measurement result from the second surface type measurement result to obtain a first surface type difference value;
step 3, emitting a second laser by the laser source through the laser coupling head, shielding the window sheet at the bottom of the vacuum cavity, enabling the second laser to partially transmit the beam splitter to emit to the reflector, reflecting the second laser by the reflector, reflecting the second laser back to the beam splitter through a second laser original optical path reflected by the reflector and reflecting the second laser back to the WFS wavefront analyzer through the beam splitter, recording a third surface type measurement result measured by the WFS wavefront analyzer,
step 4, shielding a reflector, reflecting a second laser part to a vacuum cavity bottom window sheet after the second laser part is reflected by a light splitting flat sheet, reflecting the second laser by a second reflecting film plated on one side of the inner side of the vacuum cavity bottom window sheet, reflecting the second laser back to the light splitting flat sheet through a second laser original light path reflected by the second reflecting film, transmitting the light splitting flat sheet to a WFS (window grating surface) wavefront analyzer, recording a fourth surface type measurement result measured by the WFS wavefront analyzer, and subtracting the third surface type measurement result from the fourth surface type measurement result to obtain a second surface type difference value;
obtaining a surface type function H of one surface of the window sheet at the bottom of the vacuum cavity, which is plated with the first reflecting film, through the following equation system2And the surface type function H of the surface of the vacuum cavity bottom window sheet with the second reflecting film plated on the inner side1,
Wherein k is1、k2Wave vectors, n, of the first laser light and the second laser light, respectively1,n2The refractive indices of the first laser light and the second laser light respectively in the bottom pane of the vacuum chamber,
the wave front distortion delta of the laser with the wavelength between the first laser wavelength and the second laser wavelength, which is added by the laser passing through the window at the bottom of the vacuum cavity, is obtained through the following formula3:
δ3=k3(n3-1){H1-H2}
k3The wave vector of the third laser, the wavelength of the third laser is between the first laser wavelength and the second laser wavelength, n3Is the refractive index of the third laser in the bottom pane of the vacuum chamber.
Compared with the prior art, the invention has the following beneficial effects:
after the vacuum cavity is vacuumized, the real-time measurement can be carried out outside the vacuum cavity, the wavefront distortion of laser passing through the window at the bottom of the vacuum cavity can be obtained, the difficulty of measuring the surface type of the window at the bottom of the vacuum cavity after the vacuum cavity is installed is overcome, the surface type of the window 5 at the bottom of the vacuum cavity can be measured in real time, and the method is more accurate compared with the method mainly used at home and abroad for evaluating the system error of the wavefront distortion by an extrapolation method.
Drawings
FIG. 1 is an atomic absolute gravimeter experimental apparatus and schematic diagram;
FIG. 2 is a schematic diagram of wavefront distortion; k is a radical ofa,kbIs Raman light with a wavelength of 780 nm;
FIG. 3 is a schematic view of a measuring device according to the present invention;
FIG. 4 is a schematic diagram of a WFS wavefront analyzer (Shack Hartmann wavefront analyzer) in use;
FIG. 5 is a schematic view of the vacuum chamber bottom window coating.
Detailed Description
The present invention will be described in further detail with reference to examples for the purpose of facilitating understanding and practice of the invention by those of ordinary skill in the art, and it is to be understood that the present invention has been described in the illustrative embodiments and is not to be construed as limited thereto.
Example 1
The device for measuring the wave front distortion of the atomic absolute gravimeter in real time comprises a laser coupling head 1, a light splitting flat sheet 2, a reflecting mirror 3, a WFS wave front analyzer 4, a vacuum cavity bottom window sheet 5 and a laser light source 6.
The laser source 6 emits laser through the laser coupling head 1, the laser emitted by the laser coupling head 1 forms transmission light and reflection light through the light splitting flat sheet 2, the transmission light emits to the reflecting mirror 3, the reflecting mirror 3 reflects the transmission light, the transmission light reflected by the reflecting mirror 3 returns to the light splitting flat sheet 2 along an original light path, and the light splitting flat sheet 2 reflects the transmission light reflected by the reflecting mirror 3 to the WFS wavefront analyzer 4; the reflected light enters the vacuum cavity bottom window 5, the vacuum cavity bottom window 5 reflects the reflected light, the original light path of the reflected light reflected by the vacuum cavity bottom window 5 returns to the light splitting flat sheet 2 and transmits the light splitting flat sheet 2 to enter the WFS wavefront analyzer 4.
The laser source 6 emits laser as first laser or second laser through the laser coupling head 1. A first reflective film is plated on one side of the outer side of the vacuum chamber bottom window piece 5, the wavelength of the first laser (the wavelength of the first laser in this embodiment is 630nm) is the same as the reflection wavelength of the first reflective film, the first reflective film only reflects the first laser (totally transmits laser except the wavelength of the first laser), a second reflective film is plated on one side of the inner side of the vacuum chamber bottom window piece 5, the wavelength of the second laser (the wavelength of the second laser in this embodiment is 850nm) is the same as the reflection wavelength of the second reflective film, and the second reflective film only reflects the second laser (totally transmits laser except the wavelength of the second laser).
The laser coupling head 1 is plated with a full-transmission film, and the wavelength range from the first laser to the second laser is contained in the transmission wavelength range of the full-transmission film, so that the emergent light paths of the laser light source 6 for emitting the first laser and the second laser through the laser coupling head 1 are the same.
The surface roughness RMS of the reflecting surface of the reflecting mirror 3 is less than 1/20 λ, which is the wavelength of the laser beam emitted from the laser light source 6 through the laser coupling head 1.
The WFS wavefront analyzer 4 can measure the wavefront of incident light using a Shack-Hartmann sensor and the wavefront of the optical element in the presence of a reference surface pattern.
In this embodiment, the transmission wavelength range of the total transmission film is 600nm to 900nm, the wavelength of the first laser is 630nm, and the wavelength range of the second laser is 850 nm.
A method for measuring wavefront distortion of an atomic absolute gravimeter in real time comprises the following steps:
step 1, emitting first laser (in this embodiment, the wavelength of the first laser is 630nm) from a laser light source 6 through a laser coupling head 1, shielding a window 5 at the bottom of a vacuum chamber, so that the first laser partially transmits through a beam splitter 2 to a reflector 3, reflecting the first laser by the reflector 3, reflecting the first laser back to the beam splitter 2 through a first laser original optical path reflected by the reflector 3 and reflecting the first laser back to a WFS wavefront analyzer 4 through the beam splitter 2, and recording a first surface type measurement result measured by the WFS wavefront analyzer 4 as δ at this time360(0),
Step 2, shielding a reflector 3, reflecting the first laser part by the beam splitter flat sheet 2 and then irradiating the first laser part to a vacuum cavity bottom window sheet 5, reflecting the first laser by a first reflecting film plated on one side of the outer side of the vacuum cavity bottom window sheet 5, reflecting the first laser part by a first laser original light path reflected by the first reflecting film back to the beam splitter flat sheet 2 and transmitting the beam splitter flat sheet 2 to enter a WFS wavefront analyzer 4, and recording a second surface type measurement result measured by the WFS wavefront analyzer 4 at the moment as delta360(1)The second surface type measurement minus the secondObtaining a first surface type difference value delta from the surface type measurement result360I.e. delta360=δ360(1)-δ360(0);
Step 3, emitting a second laser (in this embodiment, the wavelength of the second laser is 850nm) from the laser light source 6 through the laser coupling head 1, shielding the window 5 at the bottom of the vacuum chamber, allowing the second laser to partially transmit through the beam splitter 2 and emit to the reflector 3, reflecting the second laser by the reflector 3, reflecting the second laser back to the beam splitter 2 through the original optical path of the second laser reflected by the reflector 3 and reflecting the second laser to the WFS wavefront analyzer 4 through the beam splitter 2, and recording a third surface type measurement result measured by the WFS wavefront analyzer 4 as δ at this time850(0),
Step 4, shielding the reflector 3, reflecting the second laser part by the beam splitter 2 and then irradiating the second laser part to the vacuum cavity bottom window 5, reflecting the second laser by a second reflecting film plated on one side of the inner side of the vacuum cavity bottom window 5, reflecting the second laser part by a second laser original light path reflected by the second reflecting film back to the beam splitter 2 and transmitting the beam splitter 2 to the WFS wavefront analyzer 4, and recording a fourth surface type measurement result measured by the WFS wavefront analyzer 4 as delta850(1)Subtracting the third profile measurement result from the fourth profile measurement result to obtain a second profile difference value delta850,δ850=δ850(1)-δ850(0);
From the physical process of the first and second laser light reflected at both sides of the vacuum chamber bottom pane 5 as shown in FIG. 5, the following system of equations can be obtained
Wherein k is1、k2Wave vectors, n, of the first laser light and the second laser light, respectively1,n2The refractive indexes of the first laser and the second laser in the vacuum chamber bottom window 5 are known quantities, and the surface type function H of the surface of the vacuum chamber bottom window 5 coated with the first reflective film (630nm reflective film) can be obtained through the equation system2And the surface of one side of the vacuum chamber bottom window 5 with the second reflecting film (850nm reflecting film) plated on the inner sideType function H1,
Finally we can follow the following equation
δ3=k3(n3-1){H1-H2}
Calculating the wavefront distortion delta of a third laser (e.g. 780nm wavelength laser) applied through the bottom pane 5 of the vacuum chamber3. Wherein k is3The wave vector of the third laser light is that the wavelength of the third laser light is between the first laser wavelength (630nm) and the second laser wavelength (850nm), n3Is the refractive index of the third laser in the vacuum chamber bottom pane 5.
Description of constituent members in the present embodiment:
the laser coupling head 1 is plated with a full-transmission film which is completely transparent to the first laser and the second laser, so that the paths of the first laser (with the wavelength of 630nm) and the second laser (with the wavelength of 850nm) emitted by the laser coupling head 1 are completely the same.
In the embodiment, the wavelength of the first laser is 630nm, the wavelength of the second laser is 850nm, and the total transmission wavelength range of the total transmission film of the laser coupling head 1 is 600nm to 900 nm.
The beam splitting flat sheet 2 is 1.5mm thick and is used for splitting laser beams.
A mirror 3 for providing a surface profile for measuring the bottom pane 5 of the vacuum chamber, the surface roughness RMS of the reflecting surface of the mirror 3 being <1/20 lambda, the laser wavelength.
The WFS wavefront analyzer 4 can detect the wavefront of the incident laser beam and can also be used to measure the surface shape of the optical element, but it needs to measure a reference surface as a reference, and the reference surface shape is provided by the reflected light of the reflector 3.
The window sheet 5 at the bottom of the vacuum cavity is provided with a first reflecting film on one side of the outer side, the wavelength of the first laser is the same as the reflecting wavelength of the first reflecting film, the first reflecting film only reflects the first laser (totally transmits laser except the wavelength of the first wavelength laser), a second reflecting film is coated on one side of the inner side, the wavelength of the second laser is the same as the reflecting wavelength of the second reflecting film, and the second reflecting film only reflects the second laser (totally transmits laser except the wavelength of the second wavelength laser).
In this embodiment, the reflection wavelength of the first reflective film is 630nm, and the reflection wavelength of the second reflective film is 850 nm. The first reflective film and the second reflective film are completely transparent to laser light having a wavelength of 780nm, as shown in fig. 5.
Two laser light sources 6 with different wavelengths are used for providing a first laser light and a second laser light with the wavelengths of 630nm and 850nm respectively.
In summary, compared with the existing method for extrapolating parameters such as changing Raman optical radius and temperature to obtain the window at the bottom of the vacuum cavity, the method can most directly and accurately measure the additional phase of the laser wavefront brought by the window at the bottom of the vacuum cavity, thereby accurately calculating the system error of wavefront distortion.
The embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made or substituted in a similar manner to the embodiments described herein by those skilled in the art without departing from the spirit of the invention or exceeding the scope thereof as defined in the appended claims.