CN110620329A - Terahertz saturable absorption device for quantum cascade laser - Google Patents
Terahertz saturable absorption device for quantum cascade laser Download PDFInfo
- Publication number
- CN110620329A CN110620329A CN201910994604.5A CN201910994604A CN110620329A CN 110620329 A CN110620329 A CN 110620329A CN 201910994604 A CN201910994604 A CN 201910994604A CN 110620329 A CN110620329 A CN 110620329A
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- CN
- China
- Prior art keywords
- terahertz
- saturable absorption
- gst
- layer
- quantum cascade
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0601—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising an absorbing region
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910994604.5A CN110620329B (en) | 2019-10-18 | 2019-10-18 | Terahertz saturable absorption device for quantum cascade laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910994604.5A CN110620329B (en) | 2019-10-18 | 2019-10-18 | Terahertz saturable absorption device for quantum cascade laser |
Publications (2)
Publication Number | Publication Date |
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CN110620329A true CN110620329A (en) | 2019-12-27 |
CN110620329B CN110620329B (en) | 2020-07-28 |
Family
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Family Applications (1)
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CN201910994604.5A Active CN110620329B (en) | 2019-10-18 | 2019-10-18 | Terahertz saturable absorption device for quantum cascade laser |
Country Status (1)
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CN (1) | CN110620329B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114300941A (en) * | 2021-12-30 | 2022-04-08 | 北京工业大学 | Spontaneous pulse type photon cascade semiconductor laser |
CN116031743A (en) * | 2022-11-30 | 2023-04-28 | 深圳大学 | Broadband saturable absorber and multi-soliton laser |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104143580A (en) * | 2014-08-08 | 2014-11-12 | 电子科技大学 | Terahertz wave detector and manufacturing method thereof |
CN105703216A (en) * | 2016-04-22 | 2016-06-22 | 中国科学院上海微***与信息技术研究所 | Terahertz quantum level cascaded laser with integration of absorption waveguide and fabrication method of terhertz quantum level cascaded laser |
US20170077667A1 (en) * | 2015-09-14 | 2017-03-16 | The Regents Of The University Of California | Quantum cascade external cavity laser with metasurfaces |
CN108801969A (en) * | 2018-03-30 | 2018-11-13 | 深圳市华讯方舟太赫兹科技有限公司 | A kind of Terahertz detection device |
CN109031707A (en) * | 2018-08-22 | 2018-12-18 | 电子科技大学 | A kind of the vanadium dioxide Terahertz modulator and its regulation method of vertical structure |
US20190250435A1 (en) * | 2014-08-01 | 2019-08-15 | Mohammad A. Mazed | Fast optical switch and its applications in optical communication |
-
2019
- 2019-10-18 CN CN201910994604.5A patent/CN110620329B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20190250435A1 (en) * | 2014-08-01 | 2019-08-15 | Mohammad A. Mazed | Fast optical switch and its applications in optical communication |
CN104143580A (en) * | 2014-08-08 | 2014-11-12 | 电子科技大学 | Terahertz wave detector and manufacturing method thereof |
US20170077667A1 (en) * | 2015-09-14 | 2017-03-16 | The Regents Of The University Of California | Quantum cascade external cavity laser with metasurfaces |
CN105703216A (en) * | 2016-04-22 | 2016-06-22 | 中国科学院上海微***与信息技术研究所 | Terahertz quantum level cascaded laser with integration of absorption waveguide and fabrication method of terhertz quantum level cascaded laser |
CN108801969A (en) * | 2018-03-30 | 2018-11-13 | 深圳市华讯方舟太赫兹科技有限公司 | A kind of Terahertz detection device |
CN109031707A (en) * | 2018-08-22 | 2018-12-18 | 电子科技大学 | A kind of the vanadium dioxide Terahertz modulator and its regulation method of vertical structure |
Non-Patent Citations (2)
Title |
---|
HUA LI ET AL.: "Graphene-Coupled Terahertz Semiconductor Lasers for Enhanced Passive Frequency Comb Operation", 《ADVANCED SCIENCE》 * |
TUN CAO ET AL.: "Broadband polarization-independent perfect absorber using a phase-change metamaterial at visible frequencies", 《 SCIENTIFIC REPORTS》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114300941A (en) * | 2021-12-30 | 2022-04-08 | 北京工业大学 | Spontaneous pulse type photon cascade semiconductor laser |
CN116031743A (en) * | 2022-11-30 | 2023-04-28 | 深圳大学 | Broadband saturable absorber and multi-soliton laser |
Also Published As
Publication number | Publication date |
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CN110620329B (en) | 2020-07-28 |
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Effective date of registration: 20200422 Address after: Room 1 and 2, floor 1-2, building 1, No. 2, Huizhu Road, Yubei District, Chongqing 401123 Applicant after: Chongqing Research Institute of East China Normal University Applicant after: EAST CHINA NORMAL University Applicant after: University of Shanghai for Science and Technology Address before: Room 1 and 2, floor 1-2, building 1, No. 2, Huizhu Road, Yubei District, Chongqing 401123 Applicant before: Chongqing Research Institute of East China Normal University |
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Effective date of registration: 20210108 Address after: 401123 rooms 1 and 2, floor 1-2, building 1, No.2, Huizhu Road, Yubei District, Chongqing Patentee after: Chongqing Research Institute of East China Normal University Patentee after: SHANGHAI LANGYAN OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Patentee after: EAST CHINA NORMAL University Patentee after: University of Shanghai for Science and Technology Address before: 401123 rooms 1 and 2, floor 1-2, building 1, No.2, Huizhu Road, Yubei District, Chongqing Patentee before: Chongqing Research Institute of East China Normal University Patentee before: EAST CHINA NORMAL University Patentee before: University of Shanghai for Science and Technology |
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