CN110616405B - Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof - Google Patents
Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof Download PDFInfo
- Publication number
- CN110616405B CN110616405B CN201910973802.3A CN201910973802A CN110616405B CN 110616405 B CN110616405 B CN 110616405B CN 201910973802 A CN201910973802 A CN 201910973802A CN 110616405 B CN110616405 B CN 110616405B
- Authority
- CN
- China
- Prior art keywords
- layer
- resistant
- substrate
- oxide
- wear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating which is prepared from a CoNiCrAlY high-entropy alloy bonding layer, alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer, the AlTiCrO oxide transition layer and the AlTiCrN nitride wear-resistant layer are integrated, the five sublayers are arranged from inside to outside, and the total thickness of the coating is 1-3.5 mu m. The preparation method comprises the following steps: after the substrate is heated and ion-etched, depositing a CoNiCrAlY layer on the substrate by utilizing an arc evaporation plating process; then using cathode arc ion plating process to continuously and sequentially deposit alpha-Cr2O3Layer, alpha-Al2O3A layer, an AlTiCrO layer, and an AlTiCrN layer. alpha-Al2O3The reasonable matching with the nitride hard wear-resistant layer ensures that the coating has good resistance to element atom diffusion and wear resistance, and the preparation process is simple and easy to implement.
Description
Technical Field
The invention belongs to the technical field of surface coatings of cutting tools, and particularly relates to an aluminum oxide/aluminum titanium chromium nitride composite coating resistant to wear and diffusion and a preparation method thereof.
Background
The severe frictional wear between the surface of the cutting tool and the material being machined during cutting results in the tool being subjected to relatively high temperatures, especially temperatures of up to 1000 c or more under dry cutting conditions. For coated tools it is important whether the coating is wear resistant under high temperature conditions. It is found that as the working temperature rises, oxygen in the air accelerates to diffuse into the coating, and simultaneously, element atoms in the coating also strongly diffuse to the surface of the coating, when the working temperature of the nitride hard coating exceeds a certain temperature, the coating is oxidized, the nitride coating is converted into an oxide layer, in the conversion process, the coating is greatly applied to the interior of the coating due to expansion of coating crystal lattices, and is easy to peel off, and on the other hand, the converted oxide layer is loose in structure, low in hardness and not wear-resistant. Therefore, the problems of wear resistance and atomic diffusivity of the nitride hard coating under high-temperature cutting processing conditions need to be solved urgently.
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provide an aluminum oxide/aluminum titanium chromium nitride composite coating which is resistant to wear and diffusion.
The invention also aims to provide a preparation method of the wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating.
The wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating is characterized in that the coating is an integral body formed by five sublayers, namely a high-entropy alloy bonding layer, an oxide template layer, an oxide diffusion-resistant layer, an oxide transition layer and a nitride wear-resistant layer, the five sublayers are arranged from inside to outside in sequence, and the total thickness of the coating is 1-3.5 mu m.
Wherein, in the coating, the high-entropy alloy bonding layer is CoaNibCrcAldYeThe thickness of the film is 50-200 nm, wherein a + b + c + d + e =1, the ranges of a, b, c, d and e are 0.15-0.4.
Wherein, in the coating, the oxide template layer is alpha-Cr2O3The thickness is 100 to 300 nm.
Wherein, in the coating, the oxide diffusion-resistant layer is alpha-Al2O3The thickness is 500-2000 nm.
In the coating, the oxide transition layer is AlTiCrO, and the thickness is 50-200 nm.
In the coating, the nitride wear-resistant layer is AlTiCrN, and the thickness of the nitride wear-resistant layer is 300-800 nm.
The preparation method of the wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating provided by the invention comprises the following steps:
A. loading the cleaned substrate material into a vacuum chamber of a coating device, vacuumizing and heating;
B. carrying out ion etching on the surface of the substrate;
C. preparing a high-entropy alloy bonding layer by using an arc evaporation process;
D. preparing an oxide template layer by using a cathodic arc coating process;
E. preparing an oxide diffusion-resistant layer by using a cathodic arc coating process;
F. preparing an oxide transition layer by using a cathodic arc coating process;
G. and preparing the nitride wear-resistant layer by using a cathodic arc coating process.
In the step A of the method, the vacuumizing and heating are performed by vacuumizing the back bottom to 0.05Pa or below, opening an auxiliary heating device of a furnace wall to heat the substrate, and simultaneously opening a rack rotating power supply to enable the substrate to perform rotation and revolution motion in a vacuum chamber until the temperature of the substrate reaches 380 ℃; in the step B of the method, the ion etching is to introduce argon into the vacuum chamber, adjust the flow of the argon to ensure that the pressure is 0.1-0.25 Pa, then apply a direct current bias of-100 to-200V and a pulse bias of-200 to-400V on the substrate, and utilize the ionized Ar+Etching the surface of the substrate for 30-90 min; in the step C of the method, the working pressure of the prepared high-entropy alloy bonding by the arc evaporation process is 0.1-0.2 Pa, the arc current passing through the evaporation crucible is 180-220A, and the material placed in the evaporation crucible is CoaNibCrcAldYeThe alloy with high entropy, a + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the evaporation time is 5-10 min; in the step D of the method, the working gas for preparing the oxide template layer by the cathodic arc coating process is Ar + O2The working pressure is 1.5-3.5 Pa, the working target material is a Cr arc target, the target current is 50-100A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 8-20 min; in the step E of the method, the working gas for preparing the oxide diffusion-resistant layer by the cathodic arc coating process is Ar + O2The working pressure is 1.0-3.0 Pa, the working target material is an Al arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 40-150 min; in step F, the working gas for preparing the oxide transition layer by the cathodic arc coating process is Ar + O2The working pressure is 1.0-3.0Pa, the working target material is an AlTiCr alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 8-15 min; in the step G of the method, the working gas for preparing the nitride wear-resistant layer by the cathodic arc coating process is N2The working pressure is 1.5-3.5 Pa, the working target material is an AlTiCr alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 20-45 min.
Compared with the prior art, the invention has the following advantages:
1) the wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating provided by the invention is composed of five sublayers with different functions and components, and firstly, compared with the traditional Cr and Ti pure metal bonding layer and TiAl alloy bonding layer, the high-entropy alloy bonding layer has higher toughness, can play a good bonding role between a cutter substrate material and a surface coating material, and enables the coating to be firmly combined with the substrate; next, alpha-Cr is used2O3The oxide template layer is beneficial to Al2O3According to alpha-Cr2O3The crystal structure epitaxial growth solves the problem of preparing alpha-Al by a physical vapor deposition method due to low temperature2O3The problem of difficulty; thirdly, alpha-Al2O3The oxide diffusion-resistant layer is combined with the AlTiCrN nitride wear-resistant layer, so that the problems of low red hardness and insufficient high-temperature wear resistance of a pure oxide coating and the problem of low diffusion resistance of a pure nitride coating are solved; finally, the AlTiCrO oxide transition layer realizes alpha-Al2O3Organic transition of the layer and the AlTiCrN layer avoids alpha-Al2O3The problem of overlarge stress or unstable interlayer combination caused by the interface mutation of the oxide diffusion-resistant layer and the AlTiCrN nitride wear-resistant layer.
2) The invention provides a preparation method of an aluminum oxide/aluminum titanium chromium nitride composite coating with wear resistance and diffusion resistance, which is a combined type ion plating process mainly based on cathode arc deposition and assisted by preparing a bonding layer through an evaporation plating process. Before coating, the impurities adsorbed in the substrate material are released by heating, and the ionized Ar + is adopted to carry out bombardment etching on the surface of the substrate, so that the coating and the coating are enhancedBonding of substrates; the high-entropy alloy material is evaporated by adopting an electric arc evaporation process, a high-entropy alloy bonding layer is deposited on the substrate, the bonding capacity of the coating and the substrate is further enhanced, the bonding layer is prepared by electric arc evaporation, the advantages of high deposition rate and almost unlimited size and shape of the evaporation raw material are that the evaporation raw material is weighed and then put into an evaporation crucible, and the bonding layer is deposited by adopting cathode electric arc ion plating, so that the evaporation raw material is required to be prepared into a target material with a certain shape and size; high ionization rate of particles and high ion energy in the process of cathode arc ion plating, and alpha-Al is easier to obtain than magnetron sputtering2O3. In the process of depositing the coating, the preparation of the multilayer composite coating is easy by switching different arc targets, and the operation process is simple and easy to master and control.
Detailed Description
The present invention is further illustrated by the following specific examples, but the present invention is not limited to the following examples.
Example 1
Loading a clean metal ceramic substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.05Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.20Pa, applying-200V DC bias and-400V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 30 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.15Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 180A, and the evaporation raw material is Co0.15Ni0.15Cr0.4Al0.15Y0.15Blocking, evaporating and depositing for 10 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 80A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 3.0Pa, applying bias voltage of-60V to the substrate, and depositing for 15 min; starting Al arc target, setting target current to 98A, and then closing pure Cr arc targetThe source is used for adjusting the gas flow, controlling the pressure to be 2.2Pa, and continuously depositing for 135min with the substrate bias voltage kept unchanged; starting an AlTiCr alloy arc target, setting the target current to be 115A, then closing an Al arc target power supply, adjusting the gas flow, controlling the working pressure to be 2.0Pa, setting the substrate bias voltage to be-45V, and depositing for 10 min; and introducing nitrogen, closing oxygen and argon, adjusting the flow to keep the pressure at 2.5Pa, adjusting the target current to 100A, setting the substrate bias voltage to-90V, and finishing the deposition after 45 min. The prepared wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating consists of a CoNiCrAlY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer, the AlTiCrO oxide transition layer and the AlTiCrN nitride wear-resistant layer are composed of five sublayers, all the sublayers and the coating are firmly combined with the substrate, and the high-temperature wear-resistant oxide diffusion-resistant coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 2
Putting a clean hard alloy substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.05Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.15Pa, applying-200V DC bias and-300V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 80 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.2Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 220A, and the evaporation raw material is Co0.2Ni0.2Cr0.2Al0.2Y0.2Blocking, evaporating and depositing for 5 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 90A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 3.0Pa, applying bias voltage of-70V to the substrate, and depositing for 15 min; starting Al arc target, setting target current at 120A, then closing Cr arc target power supply, adjusting gas flow, controlling pressure at 2.5Pa, adjusting substrate bias voltage to-85V, and depositing 120 min; starting an AlTiCr alloy arc target, setting the target current to be 80A, then closing a pure Al arc target power supply, adjusting the gas flow, controlling the working pressure to be 2.5Pa, adjusting the substrate bias voltage to be-30V, and depositing for 15 min; closing oxygen and argon, opening nitrogen, adjusting the flow rate to ensure that the pressure is 3.0Pa, the target current is adjusted to 90A, the substrate bias voltage is adjusted to-45V, and the deposition is finished after 20 min. The prepared wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating consists of a CoNiCrAlY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer, the AlTiCrO oxide transition layer and the AlTiCrN nitride wear-resistant layer are composed of five sublayers, all the sublayers and the coating are firmly combined with the substrate, and the high-temperature wear-resistant oxide diffusion-resistant coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 3
Loading a clean metal ceramic substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.04Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.25Pa, applying-100V DC bias and-300V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 90 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.15Pa, starting an evaporation plating main arc power supply to carry out evaporation plating, wherein the main arc current on a crucible is 210A, and the evaporation raw material is Co0.2Ni0.2Cr0.2Al0.2Y0.2Blocking, evaporating and depositing for 7 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 50A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 1.5Pa, applying bias voltage of-60V to the substrate, and depositing for 15 min; starting an Al arc target, setting the target current to be 110A, then closing a pure Cr arc target power supply, adjusting the gas flow, controlling the pressure to be 2.5Pa, and continuously depositing for 90min with the substrate bias voltage kept unchanged; starting the AlTiCr alloy arc target, setting the target current to 120A, and then closing the Al arc target power supplyAdjusting the gas flow, controlling the working pressure to be 1.7Pa, keeping the substrate bias voltage unchanged, and depositing for 8 min; and introducing nitrogen, closing oxygen and argon, adjusting the flow to ensure that the pressure is 2.0Pa, keeping the target current and the substrate bias voltage unchanged, and finishing the deposition after 30 min. The prepared wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating consists of a CoNiCrAlY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer, the AlTiCrO oxide transition layer and the AlTiCrN nitride wear-resistant layer are composed of five sublayers, all the sublayers and the coating are firmly combined with the substrate, and the high-temperature wear-resistant oxide diffusion-resistant coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 4
Putting a clean hard alloy substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.05Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.1Pa, applying-100V direct current bias and-150V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 60 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.2Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 200A, and the evaporation raw material is Co0.2Ni0.2Cr0.2Al0.2Y0.2Blocking, evaporating and depositing for 8 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 60A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 2.5Pa, applying bias voltage of-45V to the substrate, and depositing for 10 min; starting an Al arc target, setting the target current to be 90A, then closing a Cr arc target power supply, keeping the working pressure and the substrate bias voltage unchanged, and continuing to deposit for 120 min; starting an AlTiCr alloy arc target, setting the target current to be 100A, then closing an Al arc target power supply, adjusting the gas flow, controlling the working pressure to be 2.0Pa, adjusting the substrate bias voltage to be-60V, and depositing for 10 min; introducing nitrogen, and closing oxygen and argonAnd gas, regulating the flow rate to keep the pressure at 2.7Pa, keeping the target current and the substrate bias voltage unchanged, and finishing the deposition after 30 min. The prepared wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating consists of a CoNiCrAlY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer, the AlTiCrO oxide transition layer and the AlTiCrN nitride wear-resistant layer are composed of five sublayers, all the sublayers and the coating are firmly combined with the substrate, and the high-temperature wear-resistant oxide diffusion-resistant coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Claims (2)
1. The wear-resistant diffusion-resistant aluminum oxide/aluminum nitride titanium chromium composite coating is characterized in that the coating is an integral body formed by five sublayers, namely a high-entropy alloy bonding layer, an oxide template layer, an oxide diffusion-resistant layer, an oxide transition layer and a nitride wear-resistant layer, wherein the five sublayers are arranged from inside to outside, and the total thickness of the coating is 1-3.5 mu m; the high-entropy alloy bonding layer is CoaNibCrcAldYeA + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the thickness is 50-200 nm; the oxide template layer is alpha-Cr2O3The thickness is 100-300 nm; the oxide diffusion-resistant layer is alpha-Al2O3The thickness is 500-2000 nm; the oxide transition layer is AlTiCrO, and the thickness of the oxide transition layer is 50-200 nm; the nitride wear-resistant layer is AlTiCrN, and the thickness of the nitride wear-resistant layer is 300-800 nm.
2. The preparation method of the wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating according to claim 1, characterized by comprising the following steps:
A. loading a clean substrate material into a vacuum chamber of coating equipment, vacuumizing and heating, firstly vacuumizing the back to 0.05Pa or below, opening an auxiliary heating device of a furnace wall to heat the substrate, and simultaneously opening a frame rotating power supply to enable the substrate to perform rotation and revolution motion in the vacuum chamber until the temperature of the substrate reaches 380 ℃;
B. performing ion etching on the surface of the substrate to vacuumIntroducing argon into the chamber, adjusting the flow of the argon to ensure that the pressure is 0.1-0.25 Pa, then applying a direct current bias of-100 to-200V and a pulse bias of-200 to-400V to the substrate, and utilizing the ionized Ar+Etching the surface of the substrate for 30-90 min;
C. the high-entropy alloy bonding layer is prepared by an arc evaporation process, the working pressure is 0.1-0.2 Pa, the arc current passing through an evaporation crucible is 180-220A, and the material placed in the evaporation crucible is CoaNibCrcAldYeThe alloy with high entropy, a + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the evaporation time is 5-10 min;
D. preparing an oxide template layer by using a cathodic arc coating process, wherein the working gas is Ar + O2The working pressure is 1.5-3.5 Pa, the working target material is a Cr arc target, the target current is 50-100A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 8-20 min;
E. preparing an oxide diffusion-resistant layer by using a cathodic arc coating process, wherein the working gas is Ar + O2The working pressure is 1.0-3.0 Pa, the working target material is an Al arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 40-150 min;
F. preparing an oxide transition layer by using a cathodic arc coating process, wherein the working gas is Ar + O2The working pressure is 1.0-3.0 Pa, the working target material is an AlTiCr alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 8-15 min;
G. preparing a nitride wear-resistant layer by using a cathodic arc coating process, wherein the working gas is N2The working pressure is 1.5-3.5 Pa, the working target material is an AlTiCr alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-90V, and the deposition time is 20-45 min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910973802.3A CN110616405B (en) | 2019-10-14 | 2019-10-14 | Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910973802.3A CN110616405B (en) | 2019-10-14 | 2019-10-14 | Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110616405A CN110616405A (en) | 2019-12-27 |
| CN110616405B true CN110616405B (en) | 2021-11-12 |
Family
ID=68925796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910973802.3A Active CN110616405B (en) | 2019-10-14 | 2019-10-14 | Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110616405B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115305441B (en) * | 2022-08-25 | 2023-09-05 | 株洲钻石切削刀具股份有限公司 | Composite Coated Cutting Tool with Multiple Oxide Layer Structure |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1821445A (en) * | 2005-02-18 | 2006-08-23 | 通用电气公司 | Diffusion barrier for assemblies with metallic and silicon containing components and method therefor |
| JP2006312767A (en) * | 2005-05-09 | 2006-11-16 | Ayabo:Kk | Surface treatment method for imparting abrasion resistance and oxidation resistance to steel member |
| CN104862643A (en) * | 2015-04-27 | 2015-08-26 | 大连理工大学 | Steel and titanium alloy low-temperature pulse ion nitrocarburizing and cathode arc ion plating M/MN alternate plating thick-film technology |
| CN106086806A (en) * | 2016-08-18 | 2016-11-09 | 兰州空间技术物理研究所 | A kind of AlTiCrN high-temperature wear resistant coating and preparation method thereof |
| CN108517488A (en) * | 2018-05-14 | 2018-09-11 | 武汉大学 | A kind of alloy material parts surface anticorrosion antiwear composite coating and preparation method thereof |
| CN108517492A (en) * | 2018-03-26 | 2018-09-11 | 天津大学 | Chromium aluminium titanium nitrogen alloy coating and preparation method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE526604C2 (en) * | 2002-03-22 | 2005-10-18 | Seco Tools Ab | Coated cutting tool for turning in steel |
| CN104087898B (en) * | 2014-07-18 | 2017-05-03 | 上海理工大学 | TiSiCN nanometer composite coating with ultrahigh hardness and low friction coefficient and preparation method of TiSiCN nanometer composite coating |
| CN105506622A (en) * | 2015-12-13 | 2016-04-20 | 河南广度超硬材料有限公司 | Composite coating knife and manufacturing method thereof |
| CN105887083B (en) * | 2016-04-14 | 2018-12-21 | 富耐克超硬材料股份有限公司 | Hard coat, coating production and cutter for cutter |
| DE102016108734B4 (en) * | 2016-05-11 | 2023-09-07 | Kennametal Inc. | Coated body and method of making the body |
| CN107354438B (en) * | 2017-06-28 | 2019-07-09 | 缙云县先锋工具有限公司 | A kind of composite Nano coating on saw blade surface |
-
2019
- 2019-10-14 CN CN201910973802.3A patent/CN110616405B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1821445A (en) * | 2005-02-18 | 2006-08-23 | 通用电气公司 | Diffusion barrier for assemblies with metallic and silicon containing components and method therefor |
| JP2006312767A (en) * | 2005-05-09 | 2006-11-16 | Ayabo:Kk | Surface treatment method for imparting abrasion resistance and oxidation resistance to steel member |
| CN104862643A (en) * | 2015-04-27 | 2015-08-26 | 大连理工大学 | Steel and titanium alloy low-temperature pulse ion nitrocarburizing and cathode arc ion plating M/MN alternate plating thick-film technology |
| CN106086806A (en) * | 2016-08-18 | 2016-11-09 | 兰州空间技术物理研究所 | A kind of AlTiCrN high-temperature wear resistant coating and preparation method thereof |
| CN108517492A (en) * | 2018-03-26 | 2018-09-11 | 天津大学 | Chromium aluminium titanium nitrogen alloy coating and preparation method |
| CN108517488A (en) * | 2018-05-14 | 2018-09-11 | 武汉大学 | A kind of alloy material parts surface anticorrosion antiwear composite coating and preparation method thereof |
Non-Patent Citations (2)
| Title |
|---|
| TiC、TiN和Al2O3涂层硬质合金结构的磨损研究;王志阳等;《河南理工大学学报（自然科学版）》;20151231;第845-850页 * |
| 高功率脉冲磁控溅射低温沉积α-(Al,Cr)2O3薄膜及其性能的研究;王书林;《中国优秀硕士学位论文全文数据库 工程科技 I辑》;20190115;B022-647 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110616405A (en) | 2019-12-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111349901B (en) | Preparation method of high-temperature-resistant alumina thick film coating for cutting tool | |
| CN107022761A (en) | Composite thick film and its film plating process based on DLC film | |
| US6503373B2 (en) | Method of applying a coating by physical vapor deposition | |
| CN109628896A (en) | A kind of gradient-structure TiAlSiYN polynary nanometer coating and preparation method thereof | |
| CN108118304A (en) | Nano-composite coating and its preparation process | |
| CN110643953B (en) | Aluminum oxide/titanium aluminum nitrogen composite coating suitable for milling and preparation method thereof | |
| CN110643936B (en) | Multilayer composite coating suitable for milling and preparation method thereof | |
| CN110616405B (en) | Wear-resistant diffusion-resistant aluminum oxide/aluminum titanium chromium nitride composite coating and preparation method thereof | |
| CN108866481B (en) | Nano composite Al-Ti-V-Cu-N coating and preparation method and application thereof | |
| CN106756841A (en) | A kind of preparation method of cutter composite coating | |
| CN110656313B (en) | Zirconium aluminum nitride/aluminum oxide composite coating firmly combined with hard alloy and preparation method thereof | |
| CN110643951B (en) | High-temperature oxidation resistant aluminum-chromium-silicon-nitrogen-aluminum oxide multilayer composite coating and preparation method thereof | |
| CN108823544A (en) | Based on nitridation titanium compound film and preparation method thereof | |
| WO2024065970A1 (en) | Composite deposition method for hard oxide coating, and coated cutting tool | |
| WO2021072623A1 (en) | Coated cutting tool for machining titanium alloy and high-temperature alloy and preparation method therefor | |
| CN108130518A (en) | A kind of AlB with high high-temp stability2Type WB2(N) ganoine thin film and preparation method thereof | |
| CN110670019B (en) | Anti-crater wear aluminum-titanium-zirconium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof | |
| CN109666887B (en) | TiAlN hard coating and preparation method and application thereof | |
| CN110643952B (en) | Oxidation-resistant aluminum oxide/titanium nitride silicon composite coating and preparation method thereof | |
| CN110791733B (en) | Wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof | |
| CN110643935B (en) | Anti-crater wear titanium aluminum nitride/aluminum oxide composite coating and preparation method thereof | |
| CN106637116B (en) | A kind of simple preparation method of secondary film | |
| CN110670020B (en) | Zirconium-aluminum-nitrogen-aluminum oxide multilayer composite coating firmly combined with metal ceramic and preparation method thereof | |
| CN112941461A (en) | Composite superhard tough coating material and preparation method thereof | |
| CN110565051B (en) | Diamond coated cutting tool with color layer, preparation method thereof and processing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |