CN110540372B - Non-close-packed silicon dioxide ring nano array and preparation method thereof - Google Patents
Non-close-packed silicon dioxide ring nano array and preparation method thereof Download PDFInfo
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- CN110540372B CN110540372B CN201910823256.5A CN201910823256A CN110540372B CN 110540372 B CN110540372 B CN 110540372B CN 201910823256 A CN201910823256 A CN 201910823256A CN 110540372 B CN110540372 B CN 110540372B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
Abstract
The invention discloses a non-close-packed silicon dioxide ring nano array and a preparation method thereof, wherein the preparation method comprises the following steps: cleaning a quartz plate, drying the cleaned clean quartz plate, and then placing the quartz plate in an ultraviolet ozone cleaning machine for irradiation so as to prepare the clean quartz plate with hydrophilic surface; preparing a single-layer polystyrene colloid ball array which is arranged closely on the surface of a clean quartz plate by adopting a gas-liquid interface self-assembly method; taking a single-layer polystyrene colloid ball array on a quartz plate as a template, and depositing a silver film on the surface of the template by adopting a magnetron sputtering deposition method; carrying out heat treatment on the single-layer polystyrene colloid ball array with the silver film deposited on the surface so as to prepare a silver nanoparticle array of the quartz substrate; and soaking the silver nanoparticle array of the quartz substrate in nitric acid to remove the silver nanoparticles, thereby preparing the non-close-packed silicon dioxide ring nano array. The invention has the advantages of high mechanical strength and firmness of the nano array, simple preparation process, low cost and low requirement on equipment.
Description
Technical Field
The invention relates to the field of silicon dioxide nano materials, in particular to a non-close-packed silicon dioxide ring nano array and a preparation method thereof.
Background
In the last decade, nano materials have been widely used in production and life. From the nanodevice point of view, the nanoscale volume not only facilitates integration with existing technologies, but also exhibits many unique, excellent new physical properties. The nano particles are arranged according to a specific mode to form an ordered nano structure array, which is one of important schemes for constructing nano devices, and the controllable two-dimensional nano structure array and the micro pattern have important significance for manufacturing micro-nano optoelectronic devices, sensors and biochips.
SiO2The nano material has excellent optical performance, and the array structure of the nano material is widely applied to the field of optics. But SiO2The application of nanomaterials in optical nanodevices is mainly limited by SiO2Construction of two-dimensional nanostructures by nanoparticles or etchingAnd (4) array. For example, SiO can be formed by electrostatic self-assembly techniques2The nano particles are assembled on different optical devices to be used as solar antireflection films, but the mechanical strength and firmness of the nano particles subjected to electrostatic self-assembly are poor; or the microarray structure can be directly constructed on the silicon dioxide substrate by electron beam etching or laser etching, but the process is complex, the cost is high, and the requirement on equipment is high. In addition, the investigation shows that SiO is not constructed in the prior art2The technical scheme of the ring micro-nano array is that a preparation method with simple process, low cost and low requirement on equipment is urgently needed to prepare SiO with high mechanical strength and firmness2And (4) a ring nano array.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides the non-close-packed silicon dioxide ring nano array and the preparation method thereof, so that the nano array has high mechanical strength and firmness, and the preparation process is simple, the cost is low and the requirement on equipment is low.
The purpose of the invention is realized by the following technical scheme:
a preparation method of a non-close-packed silicon dioxide ring nano array comprises the following steps:
step A, cleaning a quartz plate, drying the cleaned clean quartz plate, and then placing the quartz plate in an ultraviolet ozone cleaning machine for irradiation to prepare a clean quartz plate with a hydrophilic surface;
step B, preparing a single-layer polystyrene colloid ball array (namely a single-layer PS ball array) which is tightly arranged on the surface of the clean quartz plate with the hydrophilic surface by adopting a gas-liquid interface self-assembly method;
step C, taking a single-layer polystyrene colloid ball array on a quartz plate as a template, and depositing a silver film on the surface of the template by adopting a magnetron sputtering deposition method;
step D, carrying out heat treatment on the single-layer polystyrene colloid ball array with the silver film deposited on the surface, and setting the temperature to rise from room temperature to 850 ℃ for 170min, and carrying out heat preservation for 1-5 hours to obtain a silver nanoparticle array of the quartz substrate;
and E, soaking the silver nanoparticle array of the quartz substrate in nitric acid to remove silver nanoparticles, thereby preparing the non-close-packed silicon dioxide ring nano array.
Preferably, the cleaning the quartz wafer comprises: putting the quartz plate into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; and finally, repeatedly cleaning the quartz plate by using deionized water to obtain the cleaned clean quartz plate.
Preferably, the preparing of the densely arranged single-layer polystyrene colloid sphere array on the surface of the clean quartz plate with hydrophilic surface by adopting a gas-liquid interface self-assembly method comprises the following steps: taking the polystyrene colloidal sphere suspension, mixing the polystyrene colloidal sphere suspension with ethanol in the same volume, and performing ultrasonic oscillation treatment to prepare uniformly dispersed polystyrene colloidal sphere ethanol diluent; uniformly dropwise adding the ethanol diluent of the polystyrene colloidal spheres onto a glass sheet with a layer of deionized water film covered on the surface, so that the polystyrene colloidal spheres form a single-layer film; then absorbing water from one side of the glass sheet, and transferring the polystyrene colloid ball single-layer film into water after drying for a period of time; and then the single-layer polystyrene colloid ball film in the water is fished up by using a clean quartz plate with hydrophilic surface, so that a single-layer polystyrene colloid ball array which is closely arranged is prepared on the surface of the clean quartz plate.
Preferably, the glass sheet with the surface covered with the deionized water film is formed by covering a clean glass sheet with a hydrophilic surface with a deionized water film: the preparation method of the clean glass sheet with hydrophilic surface comprises the following steps: putting the glass sheet into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; finally, repeatedly cleaning the glass sheet by using deionized water to obtain a cleaned clean glass sheet; and drying the cleaned clean glass sheet, and then placing the cleaned clean glass sheet in an ultraviolet ozone cleaning machine for irradiation for 10-40 min, thereby preparing the clean glass sheet with hydrophilic surface.
The non-close-packed silicon dioxide ring nano array is prepared by adopting the preparation method of the non-close-packed silicon dioxide ring nano array.
According to the technical scheme provided by the invention, the non-close-packed silicon dioxide ring nano array provided by the invention has the advantages that the polystyrene colloid spheres are self-assembled on the glass sheet and transferred to the quartz sheet by a lossless transfer method to form a single-layer polystyrene colloid sphere array which is closely arranged, then a silver film is deposited by taking the single-layer polystyrene colloid sphere array as a template, and then the steps of heat treatment and silver nanoparticle removal are carried out, so that the non-close-packed silicon dioxide ring nano array directly growing on the quartz substrate can be prepared, the mechanical strength and firmness of the nano array are high, the preparation process is simple, the cost is low, and the requirement on equipment is low.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on the drawings without creative efforts.
Fig. 1 is an SEM image of a quartz-based silver nanoparticle array in step d of example 1 of the present invention.
FIG. 2 is an SEM image of a non-close-packed silica ring nano-array finally obtained in example 1 of the present invention.
FIG. 3 is a schematic diagram of an absorption spectrum of a non-close-packed silica ring nano-array finally obtained after the temperature preservation for different time in step d of example 1.
Fig. 4 is a schematic flow chart of a method for preparing a non-close-packed silicon dioxide ring nano array according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention are clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
The non-close-packed silica ring nano-array and the preparation method thereof provided by the present invention are described in detail below. Details which are not described in detail in the embodiments of the invention belong to the prior art which is known to the person skilled in the art.
A preparation method of a non-close-packed silicon dioxide ring nano array can comprise the following steps:
and step A, cleaning the quartz plate, drying the cleaned clean quartz plate, and then placing the quartz plate in an ultraviolet ozone cleaning machine for irradiation for 10-40 min to prepare the clean quartz plate with hydrophilic surface.
And step B, preparing a closely-arranged single-layer polystyrene colloid ball array on the surface of the clean quartz plate with the hydrophilic surface by adopting a gas-liquid interface self-assembly method.
And step C, taking the single-layer polystyrene colloid ball array of the quartz substrate as a template, and depositing a silver film on the surface of the template by adopting a magnetron sputtering deposition method.
And D, placing the single-layer polystyrene colloid ball array with the silver film deposited on the surface into a muffle furnace for heat treatment, and setting the temperature to rise from room temperature to 850 ℃ for 170min, and keeping the temperature for 1-5 hours to obtain the silver nanoparticle array of the quartz substrate.
And E, soaking the silver nanoparticle array of the quartz substrate in nitric acid to remove silver nanoparticles, thereby preparing the non-close-packed silicon dioxide ring nano array.
Specifically, the preparation method of the non-close-packed silica ring nano array may include the following embodiments:
(1) the step of cleaning the quartz wafer comprises the following steps: putting the quartz plate into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; and finally, repeatedly cleaning the quartz plate by using deionized water to obtain the cleaned clean quartz plate.
(2) Preparing a closely-arranged single-layer polystyrene colloid ball array on the surface of the clean quartz plate with hydrophilic surface by adopting a gas-liquid interface self-assembly method, wherein the single-layer polystyrene colloid ball array comprises the following components: taking the polystyrene colloidal sphere suspension, mixing the polystyrene colloidal sphere suspension with ethanol in the same volume, and performing ultrasonic oscillation treatment to prepare uniformly dispersed polystyrene colloidal sphere ethanol diluent; uniformly dropwise adding the ethanol diluent of the polystyrene colloidal spheres onto a glass sheet with a layer of deionized water film covered on the surface, so that the polystyrene colloidal spheres form a single-layer film; then absorbing water from one side of the glass sheet, and transferring the polystyrene colloid ball single-layer film into water after drying for a period of time; and then the single-layer polystyrene colloid ball film in the water is fished up by using a clean quartz plate with hydrophilic surface, so that a single-layer polystyrene colloid ball array which is closely arranged is prepared on the surface of the clean quartz plate. In practical application, the glass sheet with the surface covered with the deionized water film is formed by covering a clean glass sheet with a hydrophilic surface with a deionized water film: the preparation method of the clean glass sheet with hydrophilic surface comprises the following steps: putting the glass sheet into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; finally, repeatedly cleaning the glass sheet by using deionized water to obtain a cleaned clean glass sheet; and drying the cleaned clean glass sheet, and then placing the cleaned clean glass sheet in an ultraviolet ozone cleaning machine for irradiation for 10-40 min, thereby preparing the clean glass sheet with hydrophilic surface.
Further, the preparation method of the non-close-packed silicon dioxide ring nano array at least has the following advantages:
(1) the preparation method of the non-close-packed silicon dioxide ring nano array provided by the invention has the advantages of simple preparation process, low cost and low requirement on equipment.
(2) The non-close-packed silicon dioxide ring nano-array prepared by the invention is uniformly distributed, directly grows on a quartz substrate, and has high mechanical strength and firmness.
(3) In the non-close-packed silicon dioxide ring nano array prepared by the invention, the distance between the silicon dioxide rings can be adjusted by adjusting the size of the polystyrene colloid spheres, the size of the silicon dioxide ring hole can be adjusted by adjusting the silver deposition time, and the light absorption performance of the non-close-packed silicon dioxide ring nano array can be changed by adjusting the heat preservation time.
In conclusion, the embodiment of the invention has the advantages of high mechanical strength and firmness of the nano array, simple preparation process, low cost and low requirement on equipment.
In order to more clearly show the technical scheme and the technical effects thereof provided by the present invention, the non-close-packed silica ring nano-array and the preparation method thereof provided by the present invention are described in detail with specific embodiments below.
Example 1
As shown in fig. 4, a method for preparing a non-close-packed silica ring nano-array may include the following steps:
step a, putting glass sheets and quartz sheets into a beaker, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring the waste liquid in the beaker, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the beaker, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; and finally, repeatedly cleaning with deionized water to obtain the cleaned clean glass sheet and the cleaned clean quartz sheet. And drying the cleaned clean glass sheet and clean quartz sheet by using an oven, and then placing the cleaned clean glass sheet and clean quartz sheet in an ultraviolet ozone cleaning machine for irradiation for 30min, thereby preparing the clean quartz sheet and clean glass sheet with hydrophilic surfaces.
And b, taking PS ball suspension with the diameter of 500nm (namely polystyrene colloidal balls), mixing the PS ball suspension with ethanol in the same volume, and performing ultrasonic oscillation treatment for 5min to uniformly disperse the PS ball suspension, thereby preparing uniformly dispersed PS ball ethanol diluent. Uniformly dropwise adding the PS sphere ethanol diluent to a glass sheet with a layer of deionized water film covered on the surface, so that the PS spheres form a single-layer film; then, water was sucked from one side of the glass plate with filter paper, and after drying for a while, the single-layer film of the PS spheres was transferred to water (in which surfactant SDS was added); and then a 2cm multiplied by 2cm hydrophilic clean quartz plate with a surface is used for fishing out the PS ball single-layer film in the water, so that a single-layer PS ball array which is closely arranged is prepared on the surface of the clean quartz plate.
Step c, taking the quartz substrate single-layer PS ball array as a template, and depositing a silver film on the surface of the template by adopting a magnetron sputtering deposition method, wherein magnetron sputtering parameters are as follows: the vacuum degree is 30mTorr, the current is 25-30 mA, and the coating time is 50 s.
And d, putting the quartz substrate single-layer PS ball array with the silver film deposited on the surface into a muffle furnace for heat treatment, raising the temperature from room temperature to 850 ℃ for 170min, preserving the heat for 1-5 hours, and cooling along with the furnace to obtain the silver nanoparticle array (the SEM picture of which is shown in figure 1) of the quartz substrate.
And e, soaking the silver nanoparticle array of the quartz substrate in concentrated nitric acid for 12 hours to remove the silver nanoparticles, thereby preparing the non-close-packed silicon dioxide ring nano array (the SEM image of which is shown in figure 2).
Specifically, the absorption spectra of the non-close-packed silica ring nanoarrays finally prepared by respectively preserving the heat for 1 hour, 2 hours, 3 hours, 4 hours and 5 hours in step d of example 1 of the present invention are shown in fig. 3; as can be seen from fig. 3: the preparation method provided by the invention can change the light absorption performance of the non-close-packed silicon dioxide ring nano array by adjusting the heat preservation time.
In conclusion, the embodiment of the invention has the advantages of high mechanical strength and firmness of the nano array, simple preparation process, low cost and low requirement on equipment.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (5)
1. A preparation method of a non-close-packed silicon dioxide ring nano array is characterized by comprising the following steps:
step A, cleaning a quartz plate, drying the cleaned clean quartz plate, and then placing the quartz plate in an ultraviolet ozone cleaning machine for irradiation to prepare a clean quartz plate with a hydrophilic surface;
step B, preparing a single-layer polystyrene colloid ball array which is closely arranged on the surface of the clean quartz plate with the hydrophilic surface by adopting a gas-liquid interface self-assembly method;
step C, taking a single-layer polystyrene colloid ball array on a quartz plate as a template, and depositing a silver film on the surface of the template by adopting a magnetron sputtering deposition method;
step D, carrying out heat treatment on the single-layer polystyrene colloid ball array with the silver film deposited on the surface, and setting the temperature to rise from room temperature to 850 ℃ for 170min, and carrying out heat preservation for 1-5 hours to obtain a silver nanoparticle array of the quartz substrate;
and E, soaking the silver nanoparticle array of the quartz substrate in nitric acid to remove silver nanoparticles, thereby preparing the non-close-packed silicon dioxide ring nano array.
2. The method for preparing a non-close-packed silica ring nano array according to claim 1, wherein the cleaning the quartz plate comprises: putting the quartz plate into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; and finally, repeatedly cleaning the quartz plate by using deionized water to obtain the cleaned clean quartz plate.
3. The method for preparing the non-close-packed silica ring nano array according to claim 1 or 2, wherein the step of preparing the closely-arranged single-layer polystyrene colloid sphere array on the surface of the clean quartz plate with the hydrophilic surface by adopting a gas-liquid interface self-assembly method comprises the following steps: taking the polystyrene colloidal sphere suspension, mixing the polystyrene colloidal sphere suspension with ethanol in the same volume, and performing ultrasonic oscillation treatment to prepare uniformly dispersed polystyrene colloidal sphere ethanol diluent; uniformly dropwise adding the ethanol diluent of the polystyrene colloidal spheres onto a glass sheet with a layer of deionized water film covered on the surface, so that the polystyrene colloidal spheres form a single-layer film; then absorbing water from one side of the glass sheet, and transferring the polystyrene colloid ball single-layer film into water after drying for a period of time; and then the single-layer polystyrene colloid ball film in the water is fished up by using a clean quartz plate with hydrophilic surface, so that a single-layer polystyrene colloid ball array which is closely arranged is prepared on the surface of the clean quartz plate.
4. The method for preparing a non-close-packed silica ring nano array according to claim 3, wherein the glass sheet with the surface covered with the deionized water film is prepared by covering a clean glass sheet with a hydrophilic surface with a deionized water film: the preparation method of the clean glass sheet with hydrophilic surface comprises the following steps: putting the glass sheet into a cleaning container, adding acetone, alcohol and deionized water in a volume ratio of 1:1:1, covering with a preservative film, and ultrasonically cleaning for 45 min; pouring out the waste liquid in the cleaning container, adding concentrated sulfuric acid and hydrogen peroxide in a volume ratio of 3:1, standing for 8 hours, and then ultrasonically cleaning for 30 min; pouring the waste liquid in the cleaning container, adding deionized water, ammonia water and hydrogen peroxide in a volume ratio of 3:1:1, covering with a preservative film, and ultrasonically cleaning for 30 min; finally, repeatedly cleaning the glass sheet by using deionized water to obtain a cleaned clean glass sheet; and drying the cleaned clean glass sheet, and then placing the cleaned clean glass sheet in an ultraviolet ozone cleaning machine for irradiation for 10-40 min, thereby preparing the clean glass sheet with hydrophilic surface.
5. A non-close-packed silica ring nano-array, which is prepared by the method for preparing a non-close-packed silica ring nano-array according to any one of claims 1 to 4.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1483661A (en) * | 2003-07-05 | 2004-03-24 | 吉林大学 | Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film |
| CN101161378A (en) * | 2007-11-23 | 2008-04-16 | 暨南大学 | Silicon dioxide monocaryon bismuth-silver double cap shaped complex nanometer particle and its preparing method |
| CN102417307A (en) * | 2011-08-23 | 2012-04-18 | 陕西科技大学 | Preparation method of inorganic and organic electrochromic film |
| CN102460249A (en) * | 2009-06-08 | 2012-05-16 | 康宁股份有限公司 | Microstructured transmission optical fiber |
| CN102747320A (en) * | 2012-07-31 | 2012-10-24 | 武汉大学 | Preparation method of noble metal nano-particle array |
| CN108046211A (en) * | 2017-11-23 | 2018-05-18 | 中国科学院合肥物质科学研究院 | A kind of preparation method and applications of silicon substrate thorniness shape nanocone oldered array |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9279759B2 (en) * | 2012-05-01 | 2016-03-08 | University Of Maryland, College Park | Nanoparticle array with tunable nanoparticle size and separation |
-
2019
- 2019-09-02 CN CN201910823256.5A patent/CN110540372B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1483661A (en) * | 2003-07-05 | 2004-03-24 | 吉林大学 | Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film |
| CN101161378A (en) * | 2007-11-23 | 2008-04-16 | 暨南大学 | Silicon dioxide monocaryon bismuth-silver double cap shaped complex nanometer particle and its preparing method |
| CN102460249A (en) * | 2009-06-08 | 2012-05-16 | 康宁股份有限公司 | Microstructured transmission optical fiber |
| CN102417307A (en) * | 2011-08-23 | 2012-04-18 | 陕西科技大学 | Preparation method of inorganic and organic electrochromic film |
| CN102747320A (en) * | 2012-07-31 | 2012-10-24 | 武汉大学 | Preparation method of noble metal nano-particle array |
| CN108046211A (en) * | 2017-11-23 | 2018-05-18 | 中国科学院合肥物质科学研究院 | A kind of preparation method and applications of silicon substrate thorniness shape nanocone oldered array |
Non-Patent Citations (1)
| Title |
|---|
| Controlling the Interaction and Non-Close-;Madlen Schmudde et al.;《ACS Nano》;20160226;第3525-3535 * |
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