CN110539212A - multi-workpiece ion beam polishing system and method - Google Patents
multi-workpiece ion beam polishing system and method Download PDFInfo
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- CN110539212A CN110539212A CN201910928280.5A CN201910928280A CN110539212A CN 110539212 A CN110539212 A CN 110539212A CN 201910928280 A CN201910928280 A CN 201910928280A CN 110539212 A CN110539212 A CN 110539212A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- ing And Chemical Polishing (AREA)
Abstract
The invention discloses a multi-workpiece ion beam polishing system and a method, which comprises a vacuum chamber, wherein an ion source required for generating ion beams, a clamp for clamping workpieces and a movement mechanism for processing control are arranged in the vacuum chamber, and a plurality of workpieces are simultaneously clamped on the clamp; the multi-workpiece ion beam polishing system and the method adopt a multi-workpiece clamp, and the multi-workpiece ion beam polishing system and the method can simultaneously process a plurality of surfaces of a multi-workpiece by clamping a plurality of workpieces at one time and reducing the time required by a machine for vacuumizing and debugging a single workpiece, thereby greatly saving the processing time and the processing cost and greatly improving the processing efficiency.
Description
Technical Field
the invention relates to the technical field of ion beam polishing, in particular to a multi-workpiece ion beam polishing system and a multi-workpiece ion beam polishing method.
Background
The ion beam is a group of ions which move along almost the same direction at approximately the same speed, the ion beam shape modification process is to modify the shape of a workpiece by the ion beam, the ion beam is used for processing, the processing precision can be improved, the product quality can be ensured, and the ion beam polishing process belongs to one of the ion beam shape modification processes.
at present, ion beam shape modification processing equipment is usually designed by adopting a single vacuum chamber or a double vacuum chamber, and is similar to a common processing system, and a motion mechanism, an ion source and a workpiece clamp are arranged in the ion beam processing system.
However, the existing ion beam processing system adopts a vacuum structure, is very troublesome to assemble and disassemble, mostly adopts a chuck structure, has high installation difficulty due to high processing precision, consumes time and labor, and greatly influences the production efficiency.
disclosure of Invention
In view of the deficiencies of the prior art, the present invention provides a multi-workpiece ion beam polishing system and method that solves the problems set forth above in the background.
In order to achieve the above object, the present invention is achieved by a multi-workpiece ion beam polishing system including a vacuum chamber in which an ion source for generating an ion beam, a jig for holding a workpiece, and a moving mechanism for machining control are provided, the jig holding a plurality of workpieces at the same time.
further, anchor clamps include the clamping board, be connected with a plurality of locating plates on the clamping board, be provided with the structure of fixed work piece on the locating plate.
furthermore, the positioning plate is determined according to the shape of the workpiece and is set to be circular or square, and the structure for fixing the workpiece is clamping lock.
Further, the vacuum chamber is a single vacuum chamber.
furthermore, the vacuum chamber is a double vacuum chamber, the vacuum chamber is divided into a main vacuum chamber and an auxiliary vacuum chamber, a gate valve for controlling the on-off of the main vacuum chamber and the auxiliary vacuum chamber is arranged between the main vacuum chamber and the auxiliary vacuum chamber, the ion source is positioned in the main vacuum chamber, and the clamp for clamping multiple workpieces is arranged in the auxiliary vacuum chamber to load and unload the multiple workpieces.
furthermore, a butt joint guide rail is arranged in the main vacuum chamber and the auxiliary vacuum chamber, and the multi-workpiece clamp enters and exits the main vacuum chamber from the auxiliary vacuum chamber through the butt joint guide rail.
Further, the motion mechanism comprises a first motion mechanism arranged in the main vacuum chamber and a second motion mechanism arranged in the auxiliary vacuum chamber, and the two motion mechanisms can cooperate to complete the feeding and processing of the workpiece.
Furthermore, the first motion mechanism has two-dimensional freedom degree of motion, the second motion mechanism has one-dimensional freedom degree of motion, and the first motion mechanism and the second motion mechanism move cooperatively to enable the ion source to have X/Y/Z three-axis motion capability relative to the workpiece.
Furthermore, the first motion mechanism comprises an X-direction motion unit and a Y-direction motion unit which are perpendicular to each other, the second motion mechanism is a Z-direction motion unit which is perpendicular to the X, Y-direction motion unit, an A-direction rotation unit which can rotate around the Y-direction motion unit is arranged on the Y-direction motion unit, and a B-direction rotation unit which can rotate around the Z-direction motion unit is arranged on the Z-direction motion unit.
the invention also provides a polishing method of the multi-workpiece ion beam polishing system, which comprises the following steps:
Step 1: preparing for processing according to the existing method;
Step 2: mounting a plurality of workpieces on a multi-workpiece clamp;
And step 3: judging the distances among the multiple workpieces, if the distance between any two workpieces is larger than the diameter of the ion beam, continuing to execute the step 4, otherwise, jumping to the step 7;
And 4, step 4: independently calculating the processing residence time of each workpiece according to the existing calculation method;
and 5: processing each workpiece one by one in sequence according to the existing processing method and the calculated plurality of processing residence times;
step 6: jumping to the step 10;
and 7: splicing the surface shape errors of a plurality of workpieces to form a large surface shape error;
And 8: calculating the processing residence time of the splicing surface shape error according to the existing calculation method;
And step 9: processing according to the existing processing method and the calculated processing residence time;
step 10: and finishing the processing.
Further, in the polishing method, if the vacuum chamber is a single vacuum chamber, in the step 5, the vacuum chamber is pumped to the required vacuum environment to perform ion beam polishing on each workpiece; if the vacuum chamber is a double vacuum chamber, when the step 2 is carried out, firstly, each workpiece is arranged on the clamp in the auxiliary vacuum chamber, then, the auxiliary vacuum chamber is closed, the auxiliary vacuum chamber is pumped to the pressure state in the main vacuum chamber, the gate valve is opened, the workpieces are conveyed to the main vacuum chamber through the butt joint guide rail to carry out ion beam polishing on each workpiece, the gate valve is closed, the gate valve is opened after the processing is finished, then, the auxiliary vacuum chamber is inflated to the atmospheric pressure, and finally, the workpieces are returned to the auxiliary vacuum chamber to be taken out.
the invention has the following beneficial effects:
The multi-workpiece ion beam polishing system disclosed by the invention adopts the multi-workpiece fixture, can simultaneously process a plurality of surfaces of a plurality of workpieces, greatly reduces the disassembly and assembly of the workpieces, reduces the disassembly and assembly difficulty, and also reduces the time required by the machine for vacuumizing and debugging a single workpiece due to the fact that the plurality of workpieces are clamped at one time, thereby greatly saving the processing time and the processing cost and greatly improving the processing efficiency.
In a preferred scheme, the polishing system of the multi-workpiece ion beam polishing system is provided with the double vacuum chambers, the ion source has an X/Y/Z three-axis motion structure relative to the workpiece through the cooperative motion of the motion mechanisms of the main vacuum chamber and the auxiliary vacuum chamber, and on the basis of the same processing requirement, the motion device level of the ion source is reduced, so that the stability of the ion source is improved, the accumulated error is reduced, and the device can meet the requirement of higher precision.
The polishing method of the invention is provided with the multi-station clamp in the polishing system, can simultaneously clamp a plurality of groups of workpieces for simultaneous processing, further improves the production efficiency of the machine, and can realize the purpose of simultaneously polishing the workpieces with different sizes on the same clamp by judging the distance between the workpieces and adopting a proper processing method,
meanwhile, the plurality of rotating units are arranged in the moving mechanism, so that the direction of the multi-station fixture can be adjusted, the multi-angle, multi-face, multiple and simultaneous polishing purposes of workpieces can be realized by matching with the ion source capable of converting the angle, the equipment is high in flexibility, multi-face targeted polishing treatment can be performed on the same workpiece, and polishing processing of a plurality of workpieces can be completed simultaneously.
Drawings
FIG. 1 is a schematic view of the overall structure of embodiment 1 of the present invention;
FIG. 2 is a schematic view of the overall structure of embodiment 2 of the present invention;
FIG. 3 is a schematic view of the overall structure of the clamp of the present invention;
FIG. 4 is a front view of the clamp of the present invention.
In the figure: 1. a vacuum chamber; 101. a main vacuum chamber; 102. a secondary vacuum chamber; 2. an ion source; 3. a clamp; 301. installing a clamping plate; 302. positioning a plate; 303. locking; 4. a motion mechanism; 5. a gate valve; 6. butting guide rails; 7. an X-direction motion unit; 8. a Y-direction moving unit; 801. an A-direction rotating unit; 9. a Z-direction motion unit; 901. a B-direction rotating unit; 10. and (5) a workpiece.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "upper", "lower", "left", "right", "inner", "outer", "front", "rear", "head", "tail", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the invention. Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
the following embodiments are merely illustrative, and are not intended to limit the manner in which features may be combined, and any features may be combined as appropriate across the embodiments.
example 1
Referring to fig. 1, 3 and 4, in the multi-workpiece ion beam polishing system of the present embodiment, the vacuum chamber is a single vacuum chamber, an ion source 2 for generating an ion beam, a clamp 3 for clamping a workpiece 10, and a moving mechanism 4 for process control are disposed in the vacuum chamber 1, and a plurality of workpieces 10 are simultaneously clamped on the clamp 3.
in this embodiment, the fixture 3 includes a clamping plate 301, the clamping plate 301 is connected to a plurality of positioning plates 302, and the positioning plates 302 are provided with a structure for fixing a workpiece.
In this embodiment, the positioning plate 302 is determined according to the shape of the workpiece 10, and is configured to be circular, and the structure for fixing the workpiece is a latch 303.
In this embodiment, the moving mechanism 4 includes an X-direction moving unit 7, a Y-direction moving unit 8, and a Z-direction moving unit 9 that are perpendicular to each other, an a-direction rotating unit 801 that can rotate around the Y-direction moving unit 8 is provided on the Y-direction moving unit 8, and a B-direction rotating unit 901 that can rotate around the Z-direction moving unit 9 is provided on the Z-direction moving unit 9.
In the embodiment, the multi-workpiece fixture 3 is adopted, multiple surfaces of workpieces 10 of multiple types can be simultaneously machined, workpiece disassembly and assembly are greatly reduced, the disassembly and assembly difficulty is reduced, time required by the machine for vacuumizing and debugging of a single workpiece 10 is also reduced due to the fact that multiple workpieces 10 are clamped at one time, machining time and machining cost are greatly saved, and machining efficiency is greatly improved.
the embodiment also provides a polishing method of the multi-workpiece ion beam polishing system, which comprises the following steps:
Step 1: preparing for processing according to the existing method;
Step 2: mounting a plurality of workpieces 10 on a multi-workpiece fixture 3;
And step 3: judging the distances among the workpieces 10, if the distances between any two workpieces 10 are larger than the diameter of the ion beam, continuing to execute the step 4, otherwise, jumping to the step 7;
and 4, step 4: calculating the processing residence time of each workpiece 10 individually according to the existing calculation method;
And 5: processing each workpiece 10 one by one in sequence according to the existing processing method and the calculated plurality of processing dwell times;
step 6: jumping to the step 10;
and 7: splicing the surface shape errors of the workpieces 10 to form a large surface shape error;
and 8: calculating the processing residence time of the splicing surface shape error according to the existing calculation method;
and step 9: processing according to the existing processing method and the calculated processing residence time;
step 10: and finishing the processing.
In the polishing method, when the step 5 is carried out, the vacuum chamber is firstly pumped to the required vacuum environment to carry out ion beam polishing on each workpiece.
According to the polishing method provided by the embodiment, the polishing system is provided with the multi-station clamp 3, and can clamp a plurality of groups of workpieces 10 at the same time so as to process the workpieces at the same time, so that the production efficiency of the machine is further improved, and the workpieces 10 with different sizes on the same clamp 3 can be polished at the same time by judging the distance between the workpieces 10 and adopting a proper processing method.
example 2
The difference from the embodiment 1 is that the vacuum chamber in this embodiment is a double vacuum chamber, the vacuum chamber 1 is divided into a main vacuum chamber 101 and an auxiliary vacuum chamber 102, a gate valve 5 for controlling the on-off of the main vacuum chamber and the auxiliary vacuum chamber is arranged between the main vacuum chamber 101 and the auxiliary vacuum chamber 102, the ion source 2 is located in the main vacuum chamber 101, and the clamp 3 for clamping multiple workpieces is arranged in the auxiliary vacuum chamber 102 for loading and unloading multiple workpieces.
In this embodiment, the main and sub vacuum chambers are provided with a docking guide 6, and the multi-workpiece holder 3 is moved into and out of the main vacuum chamber from the sub vacuum chamber through the docking guide 6.
in this embodiment, the Z-direction moving unit 9 and the docking guide 6 are the same device.
in the present embodiment, the movement mechanism 4 includes a first movement mechanism, a part of which is provided in the main vacuum chamber 101, and a second movement mechanism, a part of which is provided in the sub vacuum chamber 102, and the two movement mechanisms can cooperate to perform feeding and processing of the workpiece.
meanwhile, the first motion mechanism has two-dimensional motion freedom degree, the second motion mechanism has one-dimensional motion freedom degree, and the first motion mechanism and the second motion mechanism move cooperatively to enable the ion source 2 to have X/Y/Z three-axis motion capability relative to the workpiece 10.
The first motion mechanism comprises an X-direction motion unit 7 and a Y-direction motion unit 8 which are perpendicular to each other, the second motion mechanism is a Z-direction motion unit 9 which is perpendicular to the X, Y-direction motion unit, an A-direction rotation unit 801 which can rotate around the Y-direction motion unit 8 is arranged on the Y-direction motion unit 8, and a B-direction rotation unit 901 which can rotate around the Z-direction motion unit 9 is arranged on the Z-direction motion unit 9.
in the multi-workpiece ion beam polishing system in the embodiment, the polishing system is arranged into the double vacuum chambers, and the ion source 3 has X/Y/Z three-axis motion capability relative to the workpiece 10 through the coordinated motion of the motion mechanisms 4 of the main vacuum chamber and the auxiliary vacuum chamber.
Meanwhile, the embodiment correspondingly provides a polishing method using the multi-workpiece ion beam polishing system in the embodiment, which comprises the following steps:
Step 1: preparing for processing according to the existing method;
step 2: mounting a plurality of workpieces 10 on a multi-workpiece fixture 3;
And step 3: judging the distances among the workpieces 10, if the distances between any two workpieces 10 are larger than the diameter of the ion beam, continuing to execute the step 4, otherwise, jumping to the step 7;
And 4, step 4: calculating the processing residence time of each workpiece 10 individually according to the existing calculation method;
And 5: processing each workpiece 10 one by one in sequence according to the existing processing method and the calculated plurality of processing dwell times;
Step 6: jumping to the step 10;
And 7: splicing the surface shape errors of the workpieces 10 to form a large surface shape error;
And 8: calculating the processing residence time of the splicing surface shape error according to the existing calculation method;
And step 9: processing according to the existing processing method and the calculated processing residence time;
Step 10: and finishing the processing.
In the polishing method, when the step 2 is carried out, firstly, each workpiece 10 is arranged on a clamp 3 in an auxiliary vacuum chamber 102, then the auxiliary vacuum chamber 102 is closed, the auxiliary vacuum chamber 102 is pumped to the pressure state in a main vacuum chamber 101, a gate valve 5 is opened, the workpiece is conveyed to the main vacuum chamber 101 through a butt joint guide rail 6, namely a Z-direction movement unit 9, ion beam polishing is carried out on each workpiece 10, the gate valve 5 is closed, the gate valve 5 is opened after the processing is finished, then the auxiliary vacuum chamber 102 is inflated to the atmospheric pressure, and finally the workpiece 10 is returned to the auxiliary vacuum chamber 102 to be taken out of the workpiece 10.
according to the polishing method provided by the embodiment, the moving mechanism is provided with the A-direction rotating unit 801 and the B-direction rotating unit 901, so that the direction of the multi-station fixture 3 can be adjusted, and the multi-angle, multi-surface and simultaneous polishing purposes of the workpieces 10 can be realized by matching with the ion source 2 capable of changing the angle.
the above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (11)
1. A multi-workpiece ion beam polishing system comprising a vacuum chamber in which an ion source required for generating an ion beam, a jig for holding a workpiece, and a moving mechanism for machining control are provided, characterized in that: the fixture simultaneously holds a plurality of workpieces.
2. The multi-workpiece ion beam polishing system of claim 1, wherein the fixture comprises a clamping plate, a plurality of positioning plates are attached to the clamping plate, and a workpiece-securing structure is disposed on the positioning plates.
3. The multi-workpiece ion beam polishing system of claim 2, wherein the positioning plate is configured to be round or square, depending on the shape of the workpiece, and the structure for securing the workpiece is snap fit.
4. a multi-workpiece ion beam polishing system according to any of claims 1-3, wherein the vacuum chamber is a single vacuum chamber.
5. A multi-workpiece ion beam polishing system as claimed in any one of claims 1 to 3, wherein the vacuum chamber is a double vacuum chamber, the vacuum chamber is divided into a main vacuum chamber and an auxiliary vacuum chamber, a gate valve for controlling the on-off of the main vacuum chamber and the auxiliary vacuum chamber is provided between the main vacuum chamber and the auxiliary vacuum chamber, the ion source is located in the main vacuum chamber, and the multi-workpiece loading and unloading is performed by a fixture for holding the multi-workpiece arranged in the auxiliary vacuum chamber.
6. the multi-workpiece ion beam polishing system of claim 5, wherein the main and sub vacuum chambers have docking guides for the multi-workpiece holder to enter and exit the main vacuum chamber from the sub vacuum chamber through the docking guides.
7. The multi-workpiece ion beam polishing system of claim 5, wherein the motion mechanism comprises a first motion mechanism disposed in the primary vacuum chamber and a second motion mechanism disposed in the secondary vacuum chamber, the two motion mechanisms cooperating to accomplish the feeding and processing of the workpiece.
8. the multi-workpiece ion beam polishing system of claim 7, wherein the first motion mechanism has two degrees of freedom of motion and the second motion mechanism has one degree of freedom of motion, the first and second motion mechanisms cooperating to provide X/Y/Z three-axis motion capability of the ion source relative to the workpiece.
9. The multi-workpiece ion beam polishing system of claim 8, wherein the first moving mechanism comprises an X-direction moving unit and a Y-direction moving unit perpendicular to each other, the second moving mechanism is a Z-direction moving unit perpendicular to the X, Y-direction moving unit, the Y-direction moving unit is provided with an a-direction rotating unit capable of rotating around the Y-direction moving unit, and the Z-direction moving unit is provided with a B-direction rotating unit capable of rotating around the Z-direction moving unit.
10. a polishing method using the multi-workpiece ion beam polishing system of any one of claims 1, 2, 3, 6, 7, 8, 9, characterized in that: the method comprises the following steps:
Step 1: preparing for processing according to the existing method;
Step 2: mounting a plurality of workpieces on a multi-workpiece clamp;
And step 3: judging the distances among the multiple workpieces, if the distance between any two workpieces is larger than the diameter of the ion beam, continuing to execute the step 4, otherwise, jumping to the step 7;
And 4, step 4: independently calculating the processing residence time of each workpiece according to the existing calculation method;
and 5: processing each workpiece one by one in sequence according to the existing processing method and the calculated plurality of processing residence times;
Step 6: jumping to the step 10;
And 7: splicing the surface shape errors of a plurality of workpieces to form a large surface shape error;
and 8: calculating the processing residence time of the splicing surface shape error according to the existing calculation method;
and step 9: processing according to the existing processing method and the calculated processing residence time;
Step 10: and finishing the processing.
11. the multi-workpiece ion beam polishing system as recited in claim 10, wherein if the vacuum chamber is a single vacuum chamber, the vacuum chamber is evacuated to a desired vacuum environment to perform the ion beam polishing on each workpiece in step 5; if the vacuum chamber is a double vacuum chamber, when the step 2 is carried out, firstly, each workpiece is arranged on the clamp in the auxiliary vacuum chamber, then, the auxiliary vacuum chamber is closed, the auxiliary vacuum chamber is pumped to the pressure state in the main vacuum chamber, the gate valve is opened, the workpieces are conveyed to the main vacuum chamber through the butt joint guide rail or the movement mechanism to carry out ion beam polishing on each workpiece, the gate valve is closed, the gate valve is opened after the processing is finished, then, the auxiliary vacuum chamber is inflated to the atmospheric pressure, and finally, the workpieces return to the auxiliary vacuum chamber to be taken out.
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| CN201910928280.5A CN110539212B (en) | 2019-09-28 | 2019-09-28 | Multi-workpiece ion beam polishing system and method |
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| CN201910928280.5A CN110539212B (en) | 2019-09-28 | 2019-09-28 | Multi-workpiece ion beam polishing system and method |
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| CN110539212A true CN110539212A (en) | 2019-12-06 |
| CN110539212B CN110539212B (en) | 2021-03-12 |
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| CN113695991A (en) * | 2021-09-07 | 2021-11-26 | 成都极致智造科技有限公司 | Ion beam polishing device for optical element |
| CN114346767A (en) * | 2021-12-09 | 2022-04-15 | 核工业西南物理研究院 | High-efficiency low-damage defect surface ion beam polishing equipment and polishing method |
| CN117697503A (en) * | 2024-02-04 | 2024-03-15 | 成都沃特塞恩电子技术有限公司 | Negative pressure adsorption type clamp system, workpiece processing equipment and method |
| CN117863008A (en) * | 2024-03-11 | 2024-04-12 | 湖南戴斯光电有限公司 | Magneto-rheological processing device for optical device |
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| CN117863008B (en) * | 2024-03-11 | 2024-05-31 | 湖南戴斯光电有限公司 | Magneto-rheological processing device for optical device |
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| CN110539212B (en) | 2021-03-12 |
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