CN110519907B - Vacuum chamber high-voltage power supply introduction device - Google Patents
Vacuum chamber high-voltage power supply introduction device Download PDFInfo
- Publication number
- CN110519907B CN110519907B CN201910738230.0A CN201910738230A CN110519907B CN 110519907 B CN110519907 B CN 110519907B CN 201910738230 A CN201910738230 A CN 201910738230A CN 110519907 B CN110519907 B CN 110519907B
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- vacuum chamber
- flange
- voltage
- insulating flange
- power supply
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- 230000005684 electric field Effects 0.000 description 6
- 239000010963 304 stainless steel Substances 0.000 description 3
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/14—Vacuum chambers
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention relates to a vacuum chamber high-voltage power supply introduction device. The vacuum chamber comprises a vacuum chamber, wherein a mounting hole is formed in a wall of the vacuum chamber, a first insulating flange is arranged in the mounting hole, and a high-voltage sleeve is arranged in the first insulating flange. The two ends of the high-voltage sleeve pipe extend into the vacuum chamber and the outside of the vacuum chamber respectively, and the two ends of the high-voltage sleeve pipe are internally provided with a second insulating flange and a positioning flange respectively. Two through holes are formed in the second insulating flange and the positioning flange, and two electrodes are arranged in the high-voltage sleeve. The inner ends of the two electrodes respectively penetrate through the two through holes on the second insulating flange and then extend out of the inner side of the second insulating flange, and the outer ends of the two electrodes respectively penetrate through the two through holes on the positioning flange and then extend out of the outer side of the positioning flange. By adopting the device, the influence on the electron accelerator can be avoided, and the electron accelerator can work normally. The high-voltage power supply is suitable for introducing high-voltage power into a vacuum chamber.
Description
Technical Field
The present invention relates to a high voltage power supply. Specifically, the power supply introduction mechanism introduces high-voltage power into the vacuum chamber. The high-voltage power supply is suitable for introducing high-voltage power into a vacuum chamber where the filament of the electron accelerator is positioned.
Background
It is known in the electron accelerator production industry that electron accelerator filaments are mounted in a vacuum chamber, the power supply required for their operation being a high voltage power supply and having to be introduced from the outside. The high-voltage power supply introduction mechanism is an important component of the electronic vacuum system of the electronic accelerator, and whether the electronic accelerator can bear high vacuum, high air pressure and high voltage is an important condition for normal and stable operation of the electronic accelerator.
The traditional vacuum chamber high-voltage power supply introduction device is characterized in that a mounting hole is formed in a wall of a vacuum chamber, a first insulating flange is arranged in the mounting hole, and a high-voltage sleeve is arranged in the first insulating flange. The inner end and the outer end of the high-voltage sleeve pipe extend into the vacuum chamber and out of the vacuum chamber respectively, and a second insulating flange and a positioning flange are arranged in the two ends of the high-voltage sleeve pipe respectively. Two through holes are formed in the second insulating flange and the positioning flange, and two electrodes are arranged in the high-voltage sleeve. The inner ends of the two electrodes 4 respectively penetrate through the two through holes on the second insulating flange and then extend out of the inner side of the second insulating flange, and the outer ends of the two electrodes respectively penetrate through the two through holes on the positioning flange and then extend out of the positioning flange. Wherein both sides of the first insulating flange are plane surfaces. Because the two surfaces of the first insulating flange are both planes, the creepage distance of the electric arc along the surface of the first insulating flange is short, and therefore the high-voltage breakdown resistance of the first insulating flange is reduced. And because no shielding measure exists between the high-voltage sleeve and the first insulating flange, the distorted electric field and the high-voltage discharge between the high-voltage sleeve and the first insulating flange are difficult to shield and uniform. In addition, since the inner ends of the two electrodes 4 respectively pass through the two through holes on the second insulating flange and then extend out of the inner side of the second insulating flange, the inner ends of the two electrodes 4 are free from shielding measures, and the discharge phenomenon caused by the distortion of the electric field caused by the uniform irregular shape and the tip of the metal part cannot be shielded. In summary, all of the above problems affect the proper operation of the electron accelerator.
Disclosure of Invention
The invention aims to provide a vacuum chamber high-voltage power supply introduction device. By adopting the device, the influence on the electron accelerator can be avoided, and the electron accelerator can work normally.
The above problems to be solved by the present invention are realized by the following technical solutions:
The invention relates to a vacuum chamber high-voltage power supply introduction device which comprises a vacuum chamber, wherein a mounting hole is formed in the wall of the vacuum chamber, a first insulating flange is arranged in the mounting hole, and a high-voltage sleeve is arranged in the first insulating flange. The two ends of the high-voltage sleeve pipe extend into the vacuum chamber and the outside of the vacuum chamber respectively, and the two ends of the high-voltage sleeve pipe are internally provided with a second insulating flange and a positioning flange respectively. Two through holes are formed in the second insulating flange and the positioning flange, and two electrodes are arranged in the high-voltage sleeve. The inner ends of the two electrodes respectively penetrate through the two through holes on the second insulating flange and then extend out of the inner side of the second insulating flange, and the outer ends of the two electrodes respectively penetrate through the two through holes on the positioning flange and then extend out of the positioning flange, and the device is characterized in that: both sides of the first insulating flange are wavy, and shielding rings are sleeved on the high-voltage sleeves at both sides of the first insulating flange.
In a further development of the invention, the high-voltage bushing has a shielding cap at the end located in the vacuum chamber.
According to a further improvement scheme, the shielding cover is a short pipe, the pipe wall of the short pipe is spherical, and the caliber of one end of the short pipe is matched with the outer diameter of the high-voltage sleeve pipe and is connected with the outer diameter of the high-voltage sleeve pipe.
According to the scheme, as the two surfaces of the first insulating flange are wavy, the area of the two surfaces of the first flange is increased, so that the creepage distance of an electric arc along the surface of the electric arc is prolonged, and the high-voltage breakdown resistance of the first insulating flange is enhanced.
And because the high-voltage sleeves at the two sides of the first insulating flange are sleeved with the shielding rings, the distorted electric field between the high-voltage sleeves and the first insulating flange is effectively shielded and uniform, and thus, the occurrence of high-voltage discharge is avoided.
In addition, since the high-voltage bushing is provided with the shielding cover at the end positioned in the vacuum chamber, the discharge phenomenon caused by the electric field distortion caused by the irregular shape and the tip of the metal part is effectively shielded and uniform.
In short, the invention can ensure the normal operation of the electron accelerator.
Drawings
Fig. 1 is a schematic view of a vacuum chamber high voltage power supply introduction apparatus of the present invention.
Detailed Description
As shown in fig. 1, the vacuum chamber high voltage power supply introduction device of the present invention comprises a vacuum chamber, wherein a mounting hole is processed on a wall 8 of the vacuum chamber, and a first insulating flange 1 is installed in the mounting hole. The first insulating flange is a flange plate made of 95 # ceramic, and both surfaces of the center of the first insulating flange are plane and are provided with rubber sealing rings for isolating vacuum and gas. A high-voltage bushing 3 is arranged in the first insulating flange 1. The high-voltage sleeve 3 is a 304 stainless steel product, two ends of the high-voltage sleeve extend into the vacuum chamber and the outside of the vacuum chamber respectively, shielding rings 2 are sleeved on the high-voltage sleeve 3 on two sides of the first insulating flange 1, the shielding rings 2 are metal rings with arc-shaped surfaces supported by 304 stainless steel, the arc-shaped surfaces of the two shielding rings face towards the plane of the center of the first insulating flange 1 and are welded with the high-voltage sleeve 3 together, and the high-voltage sleeve is used for shielding high-voltage discharge caused by an electric field distorted at the welding part of the high-voltage sleeve 3 and the first insulating flange 1.
A second insulating flange 5 and a positioning flange 7 are respectively arranged at the two ends of the high-voltage sleeve 3. The second insulating flange 5 and the positioning flange 7 are all 95 # ceramic products, two through holes are formed in the second insulating flange 5 and the positioning flange 7, and two electrodes 4 are arranged in the high-voltage sleeve 3. The inner ends of the two electrodes 4 respectively pass through the two through holes on the second insulating flange 5 and then extend out of the inner side of the second insulating flange 5, and the outer ends of the two electrodes 4 respectively pass through the two through holes on the positioning flange 7 and then extend out of the positioning flange 7. Wherein: both sides of the first insulating flange 1 are wavy.
The high voltage bushing 3 has a shield 6 at the end located in the vacuum chamber. The shielding cover 6 is a short pipe made of 304 stainless steel, the pipe wall of the short pipe is spherical, and the caliber of one end of the short pipe is matched with the outer diameter of the high-voltage sleeve 3 and is connected with the outer diameter of the high-voltage sleeve. Can be used for shielding the non-uniform electric field of the end head of the high-voltage sleeve 3 and the electrode 4.
Claims (3)
1. The vacuum chamber high-voltage power supply introduction device comprises a vacuum chamber, wherein a wall (8) of the vacuum chamber is provided with a mounting hole, a first insulating flange (1) is arranged in the mounting hole, and a high-voltage sleeve (3) is arranged in the first insulating flange (1); two ends of the high-voltage sleeve (3) extend into the vacuum chamber and the outside of the vacuum chamber respectively, and a second insulating flange (5) and a positioning flange (7) are arranged in the two ends of the high-voltage sleeve (3) respectively; two through holes are formed in the second insulating flange (5) and the positioning flange (7), and two electrodes (4) are arranged in the high-voltage sleeve (3); the inner ends of the two electrodes (4) respectively penetrate through the two through holes on the second insulating flange (5) and then extend out of the inner side of the second insulating flange (5), and the outer ends of the two electrodes (4) respectively penetrate through the two through holes on the positioning flange (7) and then extend out of the positioning flange (7); the method is characterized in that: both sides of the first insulating flange (1) are wavy, and shielding rings (2) are sleeved on high-voltage sleeves (3) at both sides of the first insulating flange (1).
2. The vacuum chamber high voltage power supply introduction device according to claim 1, wherein: the end of the high-voltage sleeve (3) positioned in the vacuum chamber is provided with a shielding cover (6).
3. The vacuum chamber high voltage power supply introduction device according to claim 2, wherein: the shielding cover (6) is a short pipe, the pipe wall of the short pipe is spherical, and the caliber of one end of the short pipe is matched with the outer diameter of the high-voltage sleeve (3) and is connected with the outer diameter of the high-voltage sleeve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910738230.0A CN110519907B (en) | 2019-08-23 | 2019-08-23 | Vacuum chamber high-voltage power supply introduction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910738230.0A CN110519907B (en) | 2019-08-23 | 2019-08-23 | Vacuum chamber high-voltage power supply introduction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110519907A CN110519907A (en) | 2019-11-29 |
| CN110519907B true CN110519907B (en) | 2024-05-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910738230.0A Active CN110519907B (en) | 2019-08-23 | 2019-08-23 | Vacuum chamber high-voltage power supply introduction device |
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| Country | Link |
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| CN (1) | CN110519907B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113571394A (en) * | 2021-06-04 | 2021-10-29 | 宁波中物光电杀菌技术有限公司 | Anti-creep electricity sterilization electron gun |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1242869A (en) * | 1997-01-02 | 2000-01-26 | 应用先进技术公司 | Electron beam accelerator |
| US6346677B1 (en) * | 1999-09-08 | 2002-02-12 | Electro Composites, Inc. | High-voltage bushing provided with external shields |
| CN1673550A (en) * | 2004-03-22 | 2005-09-28 | 阿尔卡特公司 | Damping connection for vacuum pump |
| CN201036092Y (en) * | 2007-04-13 | 2008-03-12 | 大连北方互感器有限公司 | Shielding high-voltage insulating tube |
| CN104717825A (en) * | 2015-03-30 | 2015-06-17 | 同方威视技术股份有限公司 | Electron curtain accelerator |
| CN204559041U (en) * | 2015-05-14 | 2015-08-12 | 国家电网公司 | Composite high-voltage insulator wall bushing |
| CN107580405A (en) * | 2017-10-13 | 2018-01-12 | 中国科学技术大学 | The high-voltage electrode flange transferred for high vacuum chamber and hyperbar room |
| CN208922872U (en) * | 2018-12-04 | 2019-05-31 | 宁波天互电器有限公司 | A kind of transformer high-voltage bushing |
| CN210899789U (en) * | 2019-08-23 | 2020-06-30 | 无锡爱邦辐射技术有限公司 | High-voltage power supply lead-in device of vacuum chamber |
-
2019
- 2019-08-23 CN CN201910738230.0A patent/CN110519907B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1242869A (en) * | 1997-01-02 | 2000-01-26 | 应用先进技术公司 | Electron beam accelerator |
| US6346677B1 (en) * | 1999-09-08 | 2002-02-12 | Electro Composites, Inc. | High-voltage bushing provided with external shields |
| CN1673550A (en) * | 2004-03-22 | 2005-09-28 | 阿尔卡特公司 | Damping connection for vacuum pump |
| CN201036092Y (en) * | 2007-04-13 | 2008-03-12 | 大连北方互感器有限公司 | Shielding high-voltage insulating tube |
| CN104717825A (en) * | 2015-03-30 | 2015-06-17 | 同方威视技术股份有限公司 | Electron curtain accelerator |
| CN204559041U (en) * | 2015-05-14 | 2015-08-12 | 国家电网公司 | Composite high-voltage insulator wall bushing |
| CN107580405A (en) * | 2017-10-13 | 2018-01-12 | 中国科学技术大学 | The high-voltage electrode flange transferred for high vacuum chamber and hyperbar room |
| CN208922872U (en) * | 2018-12-04 | 2019-05-31 | 宁波天互电器有限公司 | A kind of transformer high-voltage bushing |
| CN210899789U (en) * | 2019-08-23 | 2020-06-30 | 无锡爱邦辐射技术有限公司 | High-voltage power supply lead-in device of vacuum chamber |
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| CN110519907A (en) | 2019-11-29 |
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