CN110482871A - Glass workpiece and preparation method thereof, glass shell component and electronic equipment - Google Patents
Glass workpiece and preparation method thereof, glass shell component and electronic equipment Download PDFInfo
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- CN110482871A CN110482871A CN201910877237.0A CN201910877237A CN110482871A CN 110482871 A CN110482871 A CN 110482871A CN 201910877237 A CN201910877237 A CN 201910877237A CN 110482871 A CN110482871 A CN 110482871A
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- Prior art keywords
- glass
- face
- glass workpiece
- etching liquid
- etching
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
Abstract
This application provides glass workpiece and preparation method thereof, glass shell component and electronic equipments.The method for preparing glass workpiece includes: to contact the cutting end face of original sheet glass with etching liquid, is performed etching to cutting end face, to obtain glass workpiece, wherein etching liquid includes: at least one of ammonium fluoride and ammonium acid fluoride；Boric acid；And water, strong acid and hydrofluoric acid are not contained in etching liquid.Thus, by slowing down the reaction rate of original sheet glass and hydrofluoric acid, the rate of etching liquid etching glass original piece cutting end face can be slowed down, and slowly etch rate is conducive to improve the surface smoothness of cutting end face, and surface roughness is reduced, and then effectively promote the intensity of the glass workpiece of preparation；Moreover, the application can guarantee etching liquid etching glass original piece using boric acid, the rate for eliminating crackle will not be too slow, i.e., etch period will not be made too long, in order to avoid reduce the production efficiency of glass workpiece.
Description
Technical field
This application involves glass technology fields, specifically, being related to glass workpiece and preparation method thereof, glass shell component and electricity
Sub- equipment.
Background technique
Glass can generate certain crackle after cutting, in cutting end face, and the presence of crackle seriously affects glass
Intensity can make to cut end face and contacted with the corrosive liquid containing hydrofluoric acid so in order to promote the intensity of glass, pass through hydrofluoric acid
Segment glass with crackle is eroded, to achieve the purpose that eliminate crackle.But the above method is there are still many problems,
The intensity of glass cannot be promoted well.
It is still needed to be studied accordingly, with respect to the preparation method of glass.
Summary of the invention
The application is intended to solve at least some of the technical problems in related technologies.For this purpose, the application
One purpose is to propose that a kind of method for preparing glass workpiece, the intensity of the glass workpiece of this method preparation are preferable.
In the one aspect of the application, this application provides a kind of methods for preparing glass workpiece.According to the implementation of the application
Example, the method for preparing glass workpiece includes: to contact the cutting end face of original sheet glass with etching liquid, is carved to the cutting end face
Erosion, to obtain the glass workpiece, wherein the etching liquid includes: at least one of ammonium fluoride and ammonium acid fluoride；Boric acid；
And water, strong acid and hydrofluoric acid are not contained in the etching liquid.As a result, in etching liquid do not contain hydrofluoric acid, but by boric acid with
Ammonium fluoride and/or ammonium acid fluoride reaction, generate hydrofluoric acid indirectly, can slow down reacting for original sheet glass and hydrofluoric acid significantly in this way
Rate, the hydrofluoric acid corrosion cutting end face obtained by above-mentioned reaction, the crackle for cutting end face is eliminated, promote glass workpiece with this
Intensity；Further, strong acid is not contained in etching liquid, and acid and ammonium fluoride can further be slowed down using acid weaker boric acid
And/or ammonium acid fluoride reaction generates the rate of hydrofluoric acid, and then slows down the reaction rate of original sheet glass and hydrofluoric acid.In this way, logical
The reaction rate for slowing down original sheet glass and hydrofluoric acid is crossed, the rate of etching liquid etching glass original piece cutting end face can be slowed down, and
Slow etch rate is conducive to improve the surface smoothness of cutting end face, reduces surface roughness, and then effectively promote preparation
Glass workpiece intensity；Moreover, the application using boric acid both guaranteed etching liquid can effective etching glass original piece, eliminate crackle,
And etch rate will not be made too slow, i.e., etch period will not be made too long, in order to avoid reduce the production efficiency of glass workpiece.
In further aspect of the application, this application provides a kind of glass workpieces.According to an embodiment of the present application, the glass
Glass part is prepared by the mentioned-above method for preparing glass workpiece.The glass workpiece has good intensity and shock resistance as a result,
Performance.
In the another aspect of the application, this application provides a kind of glass workpieces.According to an embodiment of the present application, the glass
The side end face of glass part has raised or sunken, and the depth of the height of the protrusion or the recess is less than or equal to 600 nanometers.By
This, the side end face of the glass workpiece has preferable flatness, and defect is less, so that glass workpiece has good intensity and resists
Impact property.
In the another aspect of the application, this application provides a kind of glass shell components.According to an embodiment of the present application,
At least part of the glass shell component is made of mentioned-above glass workpiece.The glass shell component has as a result,
Preferably intensity and shock resistance promote its market competitiveness so as to extend the service life of glass shell component.This
Field technical staff is appreciated that the glass shell component has all feature and advantage of glass workpiece noted earlier, herein not
It is repeated after more.
In the another aspect of the application, this application provides a kind of electronic equipment.According to an embodiment of the present application, described
Electronic equipment includes: mentioned-above glass shell component；Display screen component, the display screen component and the glass shell group
Part is connected, and limits installation space between the display screen component and the glass shell component；And mainboard, the mainboard are set
It sets in the installation space and is electrically connected with the display screen component.The shell of the electronic equipment has preferably anti-as a result,
Impact property can extend the service life of electronic equipment, promote its market competitiveness.It will be understood by those skilled in the art that
The electronic equipment has all feature and advantage of glass shell component noted earlier, no longer excessively repeats herein.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of electronic equipment in the application one embodiment.
Specific embodiment
Embodiments herein is described below in detail.The embodiments described below is exemplary, and is only used for explaining this Shen
Please, it should not be understood as the limitation to the application.Particular technique or condition are not specified in embodiment, according to text in the art
It offers described technology or conditions or is carried out according to product description.Reagents or instruments used without specified manufacturer,
For can be with conventional products that are commercially available.
In the one aspect of the application, this application provides a kind of methods for preparing glass workpiece.According to the implementation of the application
Example, the method for preparing glass workpiece includes: to contact the cutting end face of original sheet glass with etching liquid, is carved to the cutting end face
Erosion, to obtain the glass workpiece, wherein the etching liquid includes: at least one of ammonium fluoride and ammonium acid fluoride；Boric acid；
And water, strong acid and hydrofluoric acid are not contained in the etching liquid.As a result, in etching liquid do not contain hydrofluoric acid, but by boric acid with
Ammonium fluoride and/or ammonium acid fluoride reaction, generate hydrofluoric acid indirectly, can slow down reacting for original sheet glass and hydrofluoric acid significantly in this way
Rate is cut end face by the hf etching that above-mentioned reaction obtains, eliminates the crackle for cutting end face with this, promote glass workpiece
Intensity；Further, strong acid is not contained in etching liquid, but uses acid weaker boric acid, the hydrogen ion in boric acid be with
Progress the dissociateing gradually of etching reaction, compared to hydrionic strong acid is directly provided, boric acid can further slow down acid and fluorine
Change ammonium and/or ammonium acid fluoride reaction generates the rate of hydrofluoric acid, and then slows down the reaction rate of original sheet glass and hydrofluoric acid.Such as
This can slow down the speed of etching liquid etching glass original piece cutting end face by slowing down the reaction rate of original sheet glass and hydrofluoric acid
Rate, and slowly etch rate is conducive to improve the surface smoothness of cutting end face, reduces surface roughness, and then is effectively promoted
The intensity of the glass workpiece of preparation；Moreover, the application had both guaranteed that etching liquid can effectively be split in etching glass original piece, elimination using boric acid
Line, and etch rate will not be made too slow, i.e., etch period will not be made too long, in order to avoid reduce the production efficiency of glass workpiece.
Wherein, make the cutting end face of original sheet glass contacted with etching liquid include: in the opposite first surface of original sheet glass and
Protective layer is formed on second surface；It will be equipped in the original sheet glass merging etching liquid of protective layer.The setting of protective layer as a result, can
To effectively prevent the first surface and second surface of original sheet glass to react with etching liquid, the intensity of original sheet glass is influenced；It will be equipped with
The original sheet glass of protective layer is put into etching liquid, can make the cutting end face of original sheet glass and etching liquid is full and uniform connects
Touching guarantees the uniformity that cutting end face is corroded by hydrofluoric acid, and then effectively promotes the flatness of the side end face obtained after etching.
Term " first ", " second " be used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or
Implicitly indicate the quantity of indicated technical characteristic." first " is defined as a result, the feature of " second " can be expressed or imply
Ground includes one or more of the features.In the description of the present application, the meaning of " plurality " is two or more, unless
Separately there is clearly specific restriction.
Wherein, for the specific type and size of original sheet glass there is no limit requirement, those skilled in the art can be according to glass
The actual conditions flexible choices such as the application of part.In some embodiments, original sheet glass is the 2D glass of the healthy and free from worry GG5 of 300*400mm
Glass, with a thickness of 0.55mm；In further embodiments, required glass workpiece is the glass workpiece of 2.5D or 3D structure, then
Before the cutting end face of original sheet glass and etching liquid contact, it further can carry out hot bending processing by the original sheet glass to 2D, obtain institute
The original sheet glass of the 2.5D or 3D structure needed.
Further, before the cutting end face of original sheet glass and etching liquid contact, those skilled in the art can be according to glass
The actual conditions such as the application of glass part further carry out CNC bevelling, grinding out to original sheet glass, clear off and side throwing light processing, with this
Meet the different application and process demand of glass workpiece, and advantageously reduce the surface roughness of cutting end face, it is flat to promote surface
Whole property.
Wherein, the specific material of above-mentioned protective layer and thickness do not have particular/special requirement, and those skilled in the art are according to reality
Situation flexible choice does not react with etching liquid as long as protective layer keeps stablizing in etching liquid, reaches and effectively prevent glass
The purpose reacted with etching liquid of surface.In some embodiments, protective layer is anti-etching ink or big white glue, wherein
The thickness of protective layer can for 0.02~0.5 micron (such as 0.02 micron, 0.05 micron, 0.1 micron, 0.2 micron, it is 0.3 micro-
Rice, 0.4 micron or 0.5 micron), the protecting effect of above-mentioned material is preferable as a result,；Protective layer in above-mentioned thickness range can have
Effect avoids the first surface and second surface of glass elements from reacting with the hydrofluoric acid in etching liquid；If thickness less than 0.02 micron,
Then protecting effect is relatively bad；If thickness is greater than 0.5 micron, first waste raw material, second ink protective layer relatively easily occurs
Paint is collapsed, and then causes protecting effect bad.
Wherein, the etching liquid includes: at least one in the ammonium fluoride solution and ammonium hydrogen fluoride solution of 10~30 parts by volume
Kind, the mass concentration of ammonium fluoride solution and ammonium hydrogen fluoride solution is respectively 20%~30% (that is: total matter based on ammonium fluoride solution
Amount, the mass percent of ammonium fluoride are 20%~30%；Gross mass based on ammonium hydrogen fluoride solution, the quality percentage of ammonium acid fluoride
Number is 20%~30%)；The mass concentration of the boric acid solution of 3~10 parts by volume, boric acid solution (that is: is based on for 10%~20%
The gross mass of boric acid solution, the mass percent of boric acid are 10%~20%)；The water of 60~87 parts by volume.Above-mentioned etching as a result,
In liquid, react to obtain the hydrofluoric acid of suitable concentration with ammonium fluoride and/or ammonium acid fluoride by boric acid, so that hydrofluoric acid slowly etches
The glass of endface is cut, and then the satisfactory flatness of side end face obtained after etching is effectively ensured and lower surface is thick
Rugosity.
Wherein, when containing ammonium fluoride solution and ammonium hydrogen fluoride solution in etching liquid simultaneously, the ratio of parts by volume between the two
There is no limit requirements for example, and when due to using ammonium hydrogen fluoride solution, reaction rate is faster than the reaction rate of ammonium fluoride, so ability
Field technique personnel flexibly set proportion between the two according to actual needs.
Further, etching liquid further include: the mass concentration of the enveloping agent solution of 8~20 parts by volume, enveloping agent solution is
5%~15% ((that is: based on the gross mass of enveloping agent solution, the mass percent of complexing agent is 5%~15%).Pass through as a result,
The addition of complexing agent can prevent the infusible precipitate (such as silicate) generated in etching process deposition to be attached to original sheet glass
Cutting end face, if infusible precipitate deposition be attached to cutting end face, hydrofluoric acid can be prevented to the etching of cutting section, in this way,
Just fully the crackle for cutting end face cannot be eliminated, but also will affect the surface smoothness of the side end face obtained after etching,
Increase its surface roughness, and then is unfavorable for the promotion of glass workpiece intensity and impact resistance；Furthermore the addition of complexing agent, effectively
Prevent infusible precipitate deposition to be attached to the cutting end face of original sheet glass, so can reduce the wash number after etching or when
Between；Further, by avoiding infusible precipitate deposition from being attached to the cutting end face of original sheet glass, promotion glass workpiece is also helped
Glossiness, and then when the glass workpiece be applied to electronic equipment housing unit when, facilitate promoted housing unit appearance effect
Fruit.
Further, complexing agent is selected from disodium ethylene diamine tetraacetate.As a result, to the complexing of infusible precipitate compared with
It is good, infusible precipitate can be effectively prevented in the deposition attachment of cutting end face.
In the etching liquid that said ratio obtains with suitable concentration hydrofluoric acid, and in etching hydrofluoric acid generating rate
Also more slowly, so that the rate of entire etching process is more slow.In embodiments herein, the time of etching is
10~20 minutes, such as 10 minutes, 12 minutes, 14 minutes, 16 minutes, 18 minutes or 20 minutes.Etching can be promoted as a result,
The surface smoothness of obtained side end face, and will not to influence production efficiency but rate is excessively slow；If etch period
Less than 10 minutes, then relative deficiency was completely to fall the cracking corrosion for cutting end face；If etch period is greater than 20 minutes, can make
At the excessive erosion of cutting end face, cause the flatness of the side end face of the glass workpiece obtained relatively worse, surface roughness is opposite
It is bigger.
The method for preparing glass workpiece further include: the glass product after the etching is successively molten in alkaline solution, acidity
It is cleaned in liquid and water, wherein the acid solution includes at least one of sulfuric acid and hydrochloric acid.As a result, by alkalinity
It cleans, the remaining acid solution in side end face after etching can be neutralized, to prevent remaining acid solution to the side of glass workpiece in solution
Face continues to etch, and influences the surface smoothness and surface smoothness of side end face, to influence the intensity and impact resistance of glass workpiece；
By cleaning in the acid solution of sulfuric acid and/or hydrochloric acid, a small amount of infusible precipitate (network for being attached to side end face can be washed
The addition of mixture not can guarantee can completely avoid generation all infusible precipitates deposition be attached to cutting end face).
Wherein, above-mentioned alkaline solution can be 15%~28% ammonium hydroxide or 10%~30% sodium hydroxide, cleaning
Time can be 15~60s, thus, it is possible to completely neutralize the remaining acid solution in side end face after etching, and will not be to glass
Part generates side effect.
It wherein, can be acid using ultrasonic treatment, in some embodiments while cleaning glass workpiece using acid solution
Solution is cleaned by ultrasonic 160~200 seconds, such as 180 seconds.Thus, it is possible to deposition is preferably attached to the side end face of glass workpiece
A small amount of infusible precipitate washes.
Wherein, using the concrete mode of clear water cleaning, there is no limit requirements, in some embodiments, can be using spray
Mode carries out 60~120s of cleaning, clearly more clean as a result,.
Further, the method for glass workpiece is prepared further include: toast the glass after cleaning, wherein baking temperature is
30~150 DEG C (such as 30 DEG C, 50 DEG C, 70 DEG C, 90 DEG C, 110 DEG C, 130 DEG C or 150 DEG C), the time is 20~60 minutes (such as 20
Minute, 30 minutes, 40 minutes, 50 minutes or 60 minutes).Thus, it is possible to the glass for remaining moisture after cleaning is dried, so as to
The progress of subsequent technique.
Further, the method for glass workpiece is prepared further include: removal protective layer, to first surface and second surface
Learn intensive treatment.As a result, by chemical intensification treatment, the intensity and impact resistance of glass workpiece can be further promoted.Wherein, change
The specific method for learning intensive treatment does not have a particular/special requirement, those skilled in the art's flexible choice routine techniques hand according to the actual situation
Section.
Further, the method for glass workpiece is prepared further include: optical adhesive layer is arranged in cutting end face after the etch.By
This, setting optical adhesive layer can the side end face to glass workpiece further protect, to prevent by extraneous damage or shock；Moreover,
The transparency and light transmittance of optical cement are higher, and when glass workpiece is applied to handset shell, the setting of optical adhesive layer will not be to shell
Appearance have a negative impact.
Wherein, optical adhesive layer with a thickness of 0.05~0.2 micron, such as 0.05 micron, 0.1 micron, 0.15 micron or 0.2
Micron.Thus, it is possible to the side end face of effective protection glass workpiece.
Wherein, the forming method of optical adhesive layer includes but is not limited to 3D printing, coating and spraying, as a result, above method work
Skill is simple, mature, easy to implement and industrialized production.
According to an embodiment of the present application, the surface smoothness of the side end face of the glass workpiece prepared by the above method is good,
Specific: the side end face of glass workpiece has raised or sunken, and the depth of raised height or recess is less than or equal to 600 nanometers
(such as 600 nanometers, 500 nanometers, 400 nanometers, 300 nanometers, 200 nanometers or 100 nanometers)；The surface of the side end face of glass workpiece is thick
Rugosity Ra is less than or equal to 5 nanometers (such as 1 nanometer, 2 nanometers, 3 nanometers, 4 nanometers or 5 nanometers)；Glass workpiece to fall energy big
In 1.5J, (calculation method for falling energy is；Using the bead of constant weight m, hit on glass workpiece at glass workpiece h,
Glass workpiece falls energy=mgh, wherein g=9.8kgm/s without damage, rupture2), compared to only doing chemical intensification treatment
Glass workpiece, the glass workpiece of the application fall energy and can promote 30%~45%.
In further aspect of the application, this application provides a kind of glass workpieces.According to an embodiment of the present application, the glass
Glass part is prepared by the mentioned-above method for preparing glass workpiece.The glass workpiece has good intensity and shock resistance as a result,
Performance.
Wherein, the specific structure type of the glass workpiece does not have particular/special requirement, and those skilled in the art can be according to practical need
Flexible choice is sought, for example, the structure of glass workpiece can be 2D structure, 2.5D structure or 3D structure.
In the another aspect of the application, this application provides a kind of glass workpieces.According to an embodiment of the present application, the glass
The side end face of glass part have it is raised or sunken, the depth of the height of the protrusion or recess less than or equal to 600 nanometers (such as
600 nanometers, 500 nanometers, 400 nanometers, 300 nanometers, 200 nanometers or 100 nanometers).As a result, the side end face of the glass workpiece have compared with
Good flatness, defect is less, so that glass workpiece has good intensity and shock resistance.
Further, the surface roughness Ra of side end face is less than or equal to 5 nanometers of (such as 1 nanometer, 2 nanometers, 3 nanometers, 4
Nanometer or 5 nanometers).The side end face of the glass workpiece has preferable flatness as a result, and defect is less, so that glass workpiece has
There are good intensity and shock resistance.
Wherein, glass workpiece fall energy more than or equal to 1.5J (such as 1.5J, 1.8J, 2.0J, 2.5J, 3.0J,
3.5J,4.0J).Glass workpiece has good intensity and shock resistance as a result, and can effectively extend glass workpiece uses the longevity
Life.
Further, the side end face is provided with optical adhesive layer.Setting optical adhesive layer can be to the side of glass workpiece as a result,
Face is further protected, to prevent glass workpiece side end face by extraneous damage or shock；Moreover, the transparency and light transmission of optical cement
Rate is higher, and when glass workpiece is applied to handset shell, the setting of optical adhesive layer will not generate negative shadow to the appearance of shell
It rings.
Wherein, optical adhesive layer with a thickness of 0.05~0.2 micron, such as 0.05 micron, 0.1 micron, 0.15 micron or 0.2
Micron.Thus, it is possible to the side end face of effective protection glass workpiece.
It should be noted that the above-mentioned restriction to flatness and surface roughness refers to the front end face of setting optical adhesive layer
Flatness and surface roughness, do not mean that setting optical adhesive layer after, the flatness and surface roughness of optical adhesive layer.Separately
Outside, after the side end face setting optical adhesive layer of glass workpiece, the size for falling energy of glass workpiece is not influenced, i.e. setting optical cement
Layer front and back, glass workpiece fall energy and will not change.
Wherein, the specific structure type of the glass workpiece does not have particular/special requirement, and those skilled in the art can be according to practical need
Flexible choice is sought, for example, the structure of glass workpiece can be 2D structure, 2.5D structure or 3D structure.
Wherein, which can be prepared by the mentioned-above method for preparing glass workpiece, wherein specific system
This is no longer going to repeat them for Preparation Method and requirement.
In the another aspect of the application, this application provides a kind of glass shell components.According to an embodiment of the present application,
At least part of the glass shell component is made of mentioned-above glass workpiece.The glass shell component has as a result,
Preferably intensity and shock resistance promote its market competitiveness so as to extend the service life of glass shell component.This
Field technical staff is appreciated that the glass shell component has all feature and advantage of glass workpiece noted earlier, herein not
It is repeated after more.
Wherein, the contour structures of glass shell component can be 2D structure, 2.5D structure or 3D structure, when glass shell group
When part is 2.5D structure or 3D structure, the rear cover and center of shell are integrally formed, and obtain glass integral housing.
In the another aspect of the application, this application provides a kind of electronic equipment.According to an embodiment of the present application, reference
Fig. 1, electronic equipment 1000 include: mentioned-above glass shell component 100；Display screen component 200, display screen component 200 with
Glass shell component 100 is connected, and limits installation space between display screen component 200 and glass shell component 100；Mainboard (Fig. 1
In be not shown), mainboard, which is arranged in installation space and with display screen component, to be electrically connected.The shell of the electronic equipment has as a result,
Preferable shock resistance can extend the service life of electronic equipment, promote its market competitiveness.Those skilled in the art can
To understand, which has all feature and advantage of glass shell component noted earlier, no longer excessively repeats herein.
Wherein, the specific type of electronic equipment does not have particular/special requirement, and those skilled in the art can be clever according to actual needs
Selection living, for example, electronic equipment can be the electronic equipments such as mobile phone (as shown in Figure 1), iPad, notebook.
Embodiment
Embodiment 1
1. the 2D original sheet glass of the healthy and free from worry GG5 of one piece of 300*400mm is provided, with a thickness of 0.55mm；
2. above-mentioned original sheet glass is carried out sawing sheet, CNC bevelling, grinding out, hot bending, is cleared off, formation 3D original piece after side throwing；
3. distinguishing one layer 0.3 μm of 3D printing of anti-etching ink in the opposite first surface and second surface of original sheet glass
Protective layer, the cutting end face of original sheet glass are allowed to exposed without spraying；
4. preparing etching liquid, etching liquid includes:
The mass concentration of 12 parts by volume be 30% ammonium hydrogen fluoride solution,
The mass concentration of 3 parts by volume be 20% boric acid solution,
The mass concentration of 12 parts by volume be 10% disodium ethylene diamine tetraacetate,
The water of 70 parts by volume；
It is performed etching 5. the original sheet glass that step 3 has been handled is placed in etching liquid；
Neutralize 60 seconds 6. the glass product after etching is put at once in 25% ammonia spirit；
7. the glass product after neutralization is put into the mixed acid of sulfuric acid and hydrochloric acid, it is cleaned by ultrasonic 180 seconds, removes cut end
The infusible precipitate of face attachment；
8. the glass product after step 7 cleaning is carried out spray with pure water to clean, scavenging period 120 seconds；
9. the glass product that step 8 is cleaned up toasts, baking temperature is 105 DEG C, and the time is 30 minutes；
10. the ink protective layer in the glass product that step 9 is obtained removes, and carries out chemical intensification treatment.
11. using 3D printing technique to prepare a layer thickness in the side end face of glass workpiece as 0.1 after glass reinforced processing
The optical adhesive layer of micron.
Embodiment 2
The method that glass workpiece is prepared in embodiment 2 is same as Example 1, and difference is: including 5 parts by volume in etching liquid
Boric acid solution.
Embodiment 3
The method that glass workpiece is prepared in embodiment 3 is same as Example 1, and difference is: including 8 parts by volume in etching liquid
Boric acid solution.
Embodiment 4
The method that glass workpiece is prepared in embodiment 4 is same as Example 1, and difference is: including 10 parts by volume in etching liquid
Boric acid solution.
Embodiment 5
The method that glass workpiece is prepared in embodiment 5 is same as Example 1, and difference is: including 13 parts by volume in etching liquid
Boric acid solution.
Embodiment 6
The method that glass workpiece is prepared in embodiment 6 is same as Example 1, and difference is: including 15 parts by volume in etching liquid
Boric acid solution.
Embodiment 7
The method that glass workpiece is prepared in embodiment 7 is same as Example 1, and difference is: including 18 parts by volume in etching liquid
Boric acid solution.
Embodiment 8
The method that glass workpiece is prepared in embodiment 8 is same as Example 4, and difference is: not including complexing agent in etching liquid.
Embodiment 9
The method that glass workpiece is prepared in embodiment 9 is same as Example 4, and difference is: it does not include complexing agent in etching liquid,
And do not include the steps that being cleaned by ultrasonic in the mixed acid of hydrochloric acid and sulfuric acid in preparation step.
Comparative example 1
The method that glass workpiece is prepared in comparative example 1 is same as Example 4, and difference is: the boric acid solution in etching liquid is more
Be changed to phosphoric acid solution, and in phosphoric acid solution hydrionic content (having been dissociated including phosphoric acid and two parts hydrogen that is not dissociating from
Son) with embodiment 1 in boric acid solution hydrogen ion content (two parts hydrogen ion that is having been dissociated including boric acid solution and not dissociating)
It is identical.
Comparative example 2
The method that glass workpiece is prepared in comparative example 2 is same as Example 4, and difference is: the boric acid solution in etching liquid is more
Be changed to sulfuric acid solution, and in the hydrionic content in sulfuric acid solution and embodiment 4 boric acid solution hydrogen ion content (including boron
Acidolysis has been dissociated and two parts hydrogen ion that is not dissociating) it is identical.
Comparative example 3
The method that glass workpiece is prepared in comparative example 3 is same as Example 4, and difference is: the boric acid solution in etching liquid is more
It is changed to hydrofluoric acid solution, and the hydrionic content in hydrofluoric acid solution (having dissociated and not dissociating two including hydrofluoric acid
Point hydrogen ion) hydrogen ion content (two parts hydrogen that is having been dissociated including boric acid solution and not dissociating with boric acid solution in embodiment 4
Ion) it is identical.
Comparative example 4
The method that glass workpiece is prepared in comparative example 4 is same as Example 4, and difference is: the boric acid solution in etching liquid is more
It is changed to phenol solution, and the hydrionic content in phenol solution is (including dissociated in phenol solution and do not dissociate two
Point hydrogen ion) hydrogen ion content (two parts hydrogen that is having been dissociated including boric acid solution and not dissociating with boric acid solution in embodiment 4
Ion) it is identical.
The glass workpiece obtained in embodiment 1-9 and comparative example 1-4 is tested, test result is as follows table 1.
Table 1
In table 1, the depth of the height or recess of the side end face protrusion of the numerical value expression glass workpiece of side surface evenness
Maximum value, the smaller expression flatness of numerical value are better；Falling energy is when impacting glass workpiece using the steel ball of 100g, to be calculated
Fall energy.
By embodiment 1-7 it is found that with boric acid dosage increase, the planarization of the side end face of glass workpiece falls energy
First gradually improve, be then deteriorated again, in 10 parts by volume or so, the planarization of the side end face of glass workpiece is best, impact resistance and
Intensity is best.
By embodiment 4 and 8 it is found that the addition of complexing agent can preferably avoid infusible precipitate from cutting in original sheet glass
The deposition of end face, not only can preferably improve the planarization of the side end face of glass workpiece, and then preferably promote its impact resistance
Can and intensity, and can preferably promote the glossiness of glass workpiece, when it is used for the housing unit of mobile phone, can contribute to mention
Rise the appearance of housing unit.
By the comparison of embodiment 8 and 9 it is found that the presence or absence of acid solution supersound washing step, not to the intensity effect of glass workpiece
Greatly, but the ultrasonic cleaning of acid solution can be further reduced the deposition of infusible precipitate, when glass workpiece is used for the shell group of mobile phone
When part, the appearance for promoting housing unit can be further helped in.
By the comparison of embodiment 4, comparative example 1-4 it is found that since the reaction of embodiment 4 is slow, in a relatively short period of time,
Planarization and the surface roughness variation of side end face are smaller, make its reaction process convenient for control, take from etching liquid in glass workpiece
Out and during subsequent cleaning, it can be very good control etching liquid and reacted with the further of glass, side can be effectively prevent
The surface roughness and planarization of end face have greatly changed；But comparative example 1-3 is due to reacting comparatively fast, in the shorter time
Interior, planarization and the surface roughness variation of side end face are very fast, it is not easy to control to lead to reaction, and then lead to overreact, so that
The planarization of the side end face of glass workpiece is poor and surface roughness is larger, and then causes the intensity of glass workpiece poor；And comparative example 4
In, since the acidity of phenol is too weak, reaction rate is too slow, although reaction process convenient for control, also available better performances
Glass workpiece, but it is too slow due to reacting, cause the reaction time longer, and then relative reduction production efficiency, promotes production cost.
Although embodiments herein has been shown and described above, it is to be understood that above-described embodiment is example
Property, it should not be understood as the limitation to the application, those skilled in the art within the scope of application can be to above-mentioned
Embodiment is changed, modifies, replacement and variant.
Claims (15)
1. a kind of method for preparing glass workpiece characterized by comprising
It contacts the cutting end face of original sheet glass with etching liquid, the cutting end face is performed etching, to obtain the glass
Part, wherein the etching liquid includes:
At least one of ammonium fluoride and ammonium acid fluoride；
Boric acid；And
Water,
Strong acid and hydrofluoric acid are not contained in the etching liquid.
2. the method according to claim 1, wherein making the cutting end face of the original sheet glass and the etching liquid
Contact includes:
Protective layer is formed in the opposite first surface and second surface of the original sheet glass；
The original sheet glass for being equipped with the protective layer is placed in the etching liquid.
3. method according to claim 1 or 2, which is characterized in that the etching liquid includes:
At least one of ammonium fluoride solution and ammonium hydrogen fluoride solution of 10~30 parts by volume, the ammonium fluoride solution and hydrogen fluoride
The mass concentration of ammonium salt solution is respectively 20%~35%；
The boric acid solution of 5~15 parts by volume, the mass concentration of the boric acid solution are 10%~20%；
The water of 60~87 parts by volume.
4. according to the method described in claim 3, it is characterized in that, the etching liquid further include:
The enveloping agent solution of 8~20 parts by volume, the mass concentration of the enveloping agent solution are 5%~15%,
Optional, the complexing agent is selected from disodium ethylene diamine tetraacetate.
5. method according to claim 1 or 2, which is characterized in that the time of the etching is 10~20 minutes.
6. method according to claim 1 or 2, which is characterized in that further include: by the glass product after the etching according to
It is secondary to be cleaned in alkaline solution, acid solution and water, wherein the acid solution includes at least one in sulfuric acid and hydrochloric acid
Kind.
7. according to the method described in claim 2, it is characterized in that, remove the protective layer, to the first surface and described
Second surface carries out chemical intensification treatment.
8. according to claim 1, method described in 2 or 7, which is characterized in that further include: the cutting after the etching
Optical adhesive layer is arranged in end face,
It is optional, the optical adhesive layer with a thickness of 0.05~0.2 micron.
9. a kind of glass workpiece, which is characterized in that the glass workpiece is prepared by method according to any one of claims 1 to 8
's.
10. a kind of glass workpiece, which is characterized in that the side end face of the glass workpiece has raised or sunken, the height of the protrusion
Or the depth of the recess is less than or equal to 600 nanometers.
11. glass workpiece according to claim 9 or 10, which is characterized in that the surface roughness Ra of the side end face is less than
Or it is equal to 5 nanometers.
12. glass workpiece according to claim 9 or 10, which is characterized in that the energy that falls of the glass workpiece is greater than or waits
In 1.5J.
13. glass workpiece according to claim 9 or 10, which is characterized in that the side end face is provided with optical adhesive layer.
14. a kind of glass shell component, which is characterized in that at least part of the glass shell component is by claim 9
Glass workpiece described in any one of~13 is constituted.
15. a kind of electronic equipment characterized by comprising
Glass shell component described in claim 14；
Display screen component, the display screen component are connected with the glass shell component, the display screen component and the glass
Installation space is limited between housing unit；And
Mainboard, the mainboard are arranged in the installation space and are electrically connected with the display screen component.
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| CN201910877237.0A CN110482871A (en) | 2019-09-17 | 2019-09-17 | Glass workpiece and preparation method thereof, glass shell component and electronic equipment |
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| CN201910877237.0A CN110482871A (en) | 2019-09-17 | 2019-09-17 | Glass workpiece and preparation method thereof, glass shell component and electronic equipment |
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| CN113955945A (en) * | 2021-10-20 | 2022-01-21 | 清华大学 | Surface modification method of quartz glass revolving body workpiece by liquid drop wall-attached chemical processing |
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