CN110459133A - Image display system and preparation method of reflective type super-structure surface device - Google Patents
Image display system and preparation method of reflective type super-structure surface device Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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Abstract
The embodiment of the invention discloses an image display system and a preparation method of a reflective type super-structure surface device, which comprises the following steps: a light source; a polarizer that converts light emitted from the light source into linearly polarized light; the surface of the reflective super-structure surface device is provided with a super-structure surface functional unit pattern meeting preset phase distribution, and the super-structure surface functional unit pattern reflects the linearly polarized light to form a reflected light corresponding to a preset image; and the detachable analyzer is used for analyzing the reflected light rays and then displaying the preset image. According to the technical scheme provided by the embodiment of the invention, the detachable analyzer is used for reflecting and imaging the external incident light through the reflective super-structure surface device, so that the technical problem that an imaging system in the prior art is not beneficial to image encryption and display is solved.
Description
Technical field
The present embodiments relate to super structure field of surface technology more particularly to a kind of image display systems and reflective super
The preparation method of structure surface device.
Background technique
Uneven brightness and distribution of color possessed by the image of human eye perception and cameras record, this is by light and substance phase
The luminous intensity and wavelength change that interaction generates are formed by.
Traditional imaging system is mainly the intensity and wavelength of light after recording light interacts with object
Information change, since the image presented has apparent brightness and color difference, image information can be directly by human eye
Or camera is collected, processing, though simple, intuitive, is unfavorable for image encryption and shows.
Summary of the invention
In view of this, the embodiment of the invention provides a kind of image display system and the systems of reflective super structure surface device
Preparation Method, to solve the technical issues of imaging system in the prior art is unfavorable for image encryption display.
In a first aspect, the embodiment of the invention provides a kind of image display systems, comprising:
Light source；
The light that the light source issues is transformed into linearly polarized light by the polarizer, the polarizer；
Reflective super structure surface device, the reflective super structure surface device surface, which is formed with, meets preset phase distribution
The linearly polarized light is reflected to form pre-set image pair by super structure function of surface unit pattern, the super structure function of surface unit pattern
The reflection light answered；And
Detachable analyzer, the detachable analyzer show the default figure after carrying out analyzing to the reflection light
Picture.
Optionally, the preset phase distribution is reflected fixed according to setup parameter combination Malus' law and broad sense Si Nieer
Rule determine, wherein the parameter include the intensity of the linearly polarized light and through the detachable analyzer to the reflected light
Line carries out the intensity of the light after analyzing.
Optionally, the linearly polarized light include by three colour cell of red, green and blue at white light.
Optionally, the reflective super structure surface device includes:
Substrate；
Positioned at the super structure function of surface unit pattern of the substrate, the super structure function of surface unit pattern meets institute
State preset phase distribution.
Optionally, the super structure function of surface unit pattern includes super structure function of surface structure, the super structure function of surface
Structure includes multiple super structure function of surface units, and the super structure function of surface unit includes anisotropic sub-wavelength structure, institute
The phase for stating sub-wavelength structure introducing meets the preset phase distribution.
Optionally, sub-wavelength structure includes rodlike and/or oval.
Optionally, the reflective super structure surface device designed according to geometric phase principle in shellfish, out of phase are corresponding
The sub-wavelength structure azimuth it is different.
Optionally, the super structure function of surface unit includes metallic reflector, dielectric layer and anisotropic metal Asia wave
The laminated construction of long structure；Alternatively, the super structure function of surface unit includes metallic reflector and anisotropic metal Asia wave
The laminated construction of the laminated construction or metallic reflector of long structure and anisotropic medium sub-wavelength structure.
Second aspect, the embodiment of the invention provides a kind of preparation methods of reflective super structure surface device, comprising:
Substrate is provided；
The super structure function of surface unit pattern for meeting preset phase distribution, the super structure surface are formed in the substrate
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by functional unit pattern.
Optionally, the preset phase distribution is reflected fixed according to setup parameter combination Malus' law and broad sense Si Nieer
Rule determine, wherein the parameter include the linearly polarized light intensity and through detachable analyzer to the reflection light into
The intensity of light after row analyzing.
Optionally, include: in the super structure function of surface unit pattern that substrate formation meets preset phase distribution
Super structure function of surface structure is formed in the substrate, wherein the super structure function of surface structure includes multiple
Super structure function of surface unit, the super structure function of surface unit include anisotropic sub-wavelength structure, the sub-wavelength structure
The phase of introducing meets the preset phase distribution.
Optionally, forming super structure function of surface structure in the substrate includes:
The reflective metal layer of lamination is successively deposited in the substrate using electron beam evaporation or hot evaporation process
And dielectric layer；
Spin coating electronic pastes or photoresist on the dielectric layer, using electron beam exposure or light shield exposure technology to the electricity
Sub- glue or the photoresist are patterned, so that the patterned electronic pastes or the photoresist meet the preset phase
The super structure function of surface unit pattern of distribution；
Using electron beam evaporation or hot evaporation process in the dielectric layer surface and the remaining electronic pastes or institute
Photoresist surface evaporated metal layer is stated, and removes the remaining electronic pastes or the photoresist, to retain the dielectric layer table
The metal layer in face forms the pattern of the sub-wavelength structure.
Optionally, described that figure is carried out to the electronic pastes or the photoresist using electron beam exposure or light shield exposure technology
Case further include:
Based on surface plasmon resonance or nanostructure scattering theory, using electron beam exposure or light shield exposure technology
The electronic pastes or the photoresist are patterned.
Reflective super structure surface device surface provided in this embodiment is formed with the super structure surface for meeting preset phase distribution
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by functional unit pattern, super structure function of surface unit pattern, tool
Body, the super structure function of surface unit pattern for meeting preset phase distribution can be real with the polarization, amplitude and phase of Effective Regulation light
The distribution and information encryption of image are realized in the regulation that at least one polarization direction is now carried out to a linear polarization incident light.It is removable
After analyzer is unloaded to the progress analyzing of pre-set image corresponding reflection light, realizes the decryption to pre-set image, show pre-set image.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of image display system provided in an embodiment of the present invention；
Fig. 2 is the structural schematic diagram of another image display system provided in an embodiment of the present invention；
Fig. 3 is a kind of structural schematic diagram of super structure function of surface structure provided in an embodiment of the present invention；
Fig. 4 is a kind of structural schematic diagram of super structure function of surface unit provided in an embodiment of the present invention；
Fig. 5 is the flow diagram of the preparation method of the reflective super structure surface device of one kind provided in an embodiment of the present invention；
Fig. 6 is the process signal of the preparation method of another reflective super structure surface device provided in an embodiment of the present invention
Figure；
Fig. 7-Figure 10 is the corresponding sectional view of each process of the preparation method of the reflective super structure surface device of Fig. 6.
Specific embodiment
To further illustrate the technical scheme of the present invention below with reference to the accompanying drawings and specific embodiments.It is understood that
It is that specific embodiment described herein is used only for explaining the present invention rather than limiting the invention.It further needs exist for illustrating
, only the parts related to the present invention are shown for ease of description, in attached drawing rather than entire infrastructure.
Uneven brightness and distribution of color possessed by the image of human eye perception and cameras record, this is by light and substance phase
The luminous intensity and wavelength change that interaction generates are formed by.Traditional imaging system is mainly that recording light and object are sent out
The intensity of light and wavelength information variation after raw interaction, since the image presented has apparent brightness and colour-difference
It is different, therefore image information can be collected directly by human eye or camera, processing, though simple, intuitive, is unfavorable for image encryption and shows.
The embodiment of the invention provides a kind of image display system, it can be achieved that the encryption for image is shown.
Fig. 1 is a kind of structural schematic diagram of image display system provided in an embodiment of the present invention, and referring to Fig. 1, the image is aobvious
Show that system includes: light source 100；The light that light source issues is transformed into linearly polarized light by the polarizer 200, the polarizer 200；Reflective super structure
Surface device 300, reflective super 300 surface of structure surface device are formed with the super structure function of surface unit for meeting preset phase distribution
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by pattern, super structure function of surface unit pattern；And it is detachable
Analyzer 400, detachable analyzer 400 show pre-set image after carrying out analyzing to reflection light.
Reflective super 300 surface of structure surface device provided in this embodiment is formed with the super structure table for meeting preset phase distribution
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by face functional unit pattern, super structure function of surface unit pattern,
Specifically, meet preset phase distribution super structure function of surface unit pattern can with the polarization, amplitude and phase of Effective Regulation light,
It realizes the regulation for carrying out at least one polarization direction to a linear polarization incident light, realizes the distribution and information encryption of image.It can
After analyzer 400 is dismantled to the progress analyzing of pre-set image corresponding reflection light, realize that the decryption to pre-set image, display are default
Image.Here, removing detachable analyzer 400 does not then observe pre-set image, it can be achieved that the encryption for image is shown.
Preset phase distribution design principle provided in this embodiment is as follows: preset phase is distributed according to setup parameter combination horse
Lv Si law and broad sense Si Nieer reflection law determine, wherein parameter includes the intensity of linearly polarized light and detachably examined
Inclined device carries out the intensity of the light after analyzing to reflection light.
It is I that Malus' law, which can be regarded as intensity,0Incident ray polarized light light after analyzer intensity be equal to I=
I0cos2θ, wherein θ is the angle between the polarization direction of incident ray polarized light and analyzer polarization direction.Therefore, in incident ray
In the case that the intensity of polarised light and the intensity of the light after detachable analyzer carries out analyzing to reflection light are certain,
Learn the angle theta between the polarization direction of incident ray polarized light and analyzer polarization direction.Incident ray polarized light is being determined
After angle theta between polarization direction and analyzer polarization direction, in the case where the incidence angle of known incident linearly polarized light, knot
Broad sense Nie Er reflection law is closed, can learn the angle of reflection of the corresponding reflection light of pre-set image.
According to broad sense Si Nieer reflection law, when incident light and anisotropic metal or medium sub-wavelength structure phase interaction
Used time, angle of reflectionWherein d φ/dx is phase gradient provided by interface, λ0It is incident
The wavelength of light, θiIt is the incidence angle of incident light, niIt is refractive index.Therefore, it may be implemented by designing the phase gradient on super structure surface
To angle of reflection θrAny regulation.
The angle of reflection of the corresponding reflection light of pre-set image is being determined according to Malus' law, in the incidence of linearly polarized light
When angle and angle of reflection determine, phase gradient can be learnt, it can show that preset phase is distributed.Illustratively, referring to Fig. 1,
Pre-set image is a bird, and detachable analyzer 400, can if do not passed through to the image for showing bird after reflection light progress analyzing
Analyzer 400 is dismantled to observe pre-set image, the image of bird will be can't see.
Optionally, based on the above technical solution, linearly polarized light include by three colour cell of red, green and blue at white light.
The super structure function of surface unit pattern for meeting preset phase distribution can be with the polarization, amplitude and phase of Effective Regulation light, realization pair
One linear polarization incident light carries out the regulation of at least one polarization direction, realizes the intensity profile and information encryption of color image.
Optionally, based on the above technical solution, referring to fig. 2, reflective super structure surface device 300 includes: substrate
301；Super structure function of surface unit pattern on substrate 301, super structure function of surface unit pattern meet preset phase point
Cloth.The material of substrate 301 can be the materials such as silicon, glass or ITO.
Optionally, based on the above technical solution, referring to figs. 2 and 3, super structure function of surface unit pattern includes super
Structure function of surface structure 302, super structure function of surface structure 302 include multiple super structure function of surface units 3021, super structure surface work
Energy unit 3021 includes anisotropic sub-wavelength structure 3022, and the phase that sub-wavelength structure 3022 introduces meets preset phase point
Cloth.Optionally, based on the above technical solution, sub-wavelength structure 3022 includes rodlike and/or oval.
In the present embodiment, super structure function of surface unit pattern includes super structure function of surface structure 302, super structure function of surface knot
Structure 302 includes multiple super structure function of surface units 3021, i.e., super structure function of surface unit pattern is by the super structure with spatial variations
The interface that function of surface unit 3021 is constituted, can be with the polarization, amplitude and phase of Effective Regulation light；It can be used for realizing efficient
Optical holographic imaging, high numerical aperture lens and generation optical rail angular momentum etc..The two dimensional attributes on super structure surface, which reduce, to be added
Work difficulty, and there is volume compact, low advantage is lost, it is compatible with existing complementary metal oxide semiconductor techniques.
Wherein, the arrangement of sub-wavelength structure 3022 is consistent, and the polarization direction for the light being emitted through sub-wavelength structure 3022 is consistent.
The phase that anisotropic sub-wavelength structure 3022 introduces meets preset phase distribution, through anisotropic sub-wavelength structure 3022
The polarization direction of the light of outgoing meets the polarization direction of the corresponding reflection light of pre-set image.
Based on the above-mentioned technical proposal, the reflective super structure surface device designed according to geometric phase principle in shellfish, different phases
The azimuth of the corresponding sub-wavelength structure in position is different.Specifically, by geometric phase principle, i.e. circularly polarized light and anisotropy in shellfish
Sub-wavelength structure interaction, can make incident circularly polarized light circular polarization state occur reversion and meanwhile introduce the geometric phase factorWherein σ=± 1 represents the circular polarization state of incident light；It is the orientation of anisotropic sub-wavelength structure in the plane
Angle, thus, the azimuth by simply changing anisotropic sub-wavelength structure can realize the company to incident light phase from 0-2 π
Continuous regulation, and phase change symbol caused by the incident light of different circular polarization states is opposite.And incident linearly polarized light is decomposable
For left circularly polarized light and right-circularly polarized light, left circularly polarized light and right-circularly polarized light are by sub-wavelength structure generation size
Equal, the opposite phase change of symbol, synthesis can form linearly polarized light again, and polarization direction isIt can thus be seen that
Azimuth by simply changing anisotropic sub-wavelength structure, which can be realized, carries out the polarization direction of incident linearly polarized light
Regulation, therefore, one timing of polarization direction of online polarized incident light, according to the linear polarization shape of the corresponding reflection light of pre-set image
State distribution can realize the regulation of the polarization direction to linear polarization incident light, meet emergent light by sub-wavelength structure of arranging
The linear polarization state of the corresponding reflection light of pre-set image is distributed.
The present embodiment utilizes reflective super structure surface device, and anisotropic sub-wavelength structure is inclined by corresponding incident line
Vibration incident light is reflected through anisotropic sub-wavelength structure, is converted into the corresponding reflection light of pre-set image of another polarization direction
Outgoing, to realize the regulation to light beam polarization direction, and can stablize and repeatedly use, process flow is simple, at low cost.
Meanwhile can be distributed according to the linear polarization state of the corresponding reflection light of pre-set image, design sub-wavelength structure in super structure surface
Arrangement.
Optionally, based on the above technical solution, super structure function of surface unit include metallic reflector, dielectric layer and
The laminated construction of anisotropic metal sub-wavelength structure；Alternatively, super structure function of surface unit include metallic reflector and respectively to
The laminated construction of anisotropic metal sub-wavelength structure or the lamination knot of metallic reflector and anisotropic medium sub-wavelength structure
Structure.
Illustratively, referring to fig. 4, super structure function of surface unit 3021 includes metallic reflector 3023,3024 and of dielectric layer
The laminated construction of anisotropic metal sub-wavelength structure 3022.Specific film of the embodiment of the present invention to super structure function of surface unit
Layer structure with no restriction, specifically can be depending on actual conditions.
Based on the above embodiment, the embodiment of the invention also provides a kind of preparation method of reflective super structure surface device,
As shown in figure 5, the preparation method of the reflective super structure surface device includes:
Step 110 provides substrate；
Wherein, the material of substrate can be the materials such as silicon, glass or ITO.Illustratively, according to the super structure of substrate
The material of function of surface unit pattern selects the substrate in relevant work wave band, to adapt to the incident light of different operating wave band.
Step 120 forms the super structure function of surface unit pattern for meeting preset phase distribution, super structure surface in substrate
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by functional unit pattern.
Optionally, based on the above technical solution, preset phase distribution is according to setup parameter combination Malus' law
And broad sense Si Nieer reflection law determine, wherein parameter include the intensity of linearly polarized light and through detachable analyzer to anti-
Penetrate the intensity for the light that light carries out after analyzing.
Optionally, based on the above technical solution, the super structure table for meeting preset phase and being distributed is formed in substrate
Face functional unit pattern includes:
Super structure function of surface structure is formed in substrate, wherein super structure function of surface structure includes multiple super structure surfaces
Functional unit, super structure function of surface unit include anisotropic sub-wavelength structure, and the phase that sub-wavelength structure introduces meets pre-
If phase distribution.
Include: referring to Fig. 6, step 120, in the super structure function of surface structure that substrate is formed
Step 1201, the reflection gold that lamination is successively deposited in substrate using electron beam evaporation or hot evaporation process
Belong to layer and dielectric layer.
Referring to Fig. 7, the metal of lamination is successively deposited on substrate 301 using electron beam evaporation or hot evaporation process
Layer reflection 3023 and dielectric layer 3024.Wherein, the material of metallic reflector 3023 and dielectric layer 3024 can be according to the work of system
Wave band is selected, for example, the material of metallic reflector 3023 can be the metals such as gold, silver or aluminium in visible near-infrared wave band
Material, the material of dielectric layer 3024 can be silica or titanium dioxide；In infrared band, the material of metallic reflector 3023
It can be gold, silver, aluminium, silica or titanium dioxide, the material of dielectric layer 3024 can be CaF2、MgF2, Ge, polytetrafluoroethyl-ne
The media such as alkene；It can be the metal materials such as gold, silver, aluminium or copper, dielectric layer in the material of microwave band, metallic reflector 3023
3024 material can be crystalline ceramics etc..
Step 1202, spin coating electronic pastes or photoresist on dielectric layer, using electron beam exposure or light shield exposure technology pair
Electronic pastes or photoresist are patterned, so that patterned electronic pastes or photoresist meet the super structure surface of preset phase distribution
Functional unit pattern.
Illustratively, with reference to Fig. 8, spin coating electronic pastes or photoresist 3025 on dielectric layer 3024, using electron beam exposure
Or light shield exposure technology patterns photoresist 3025, so that patterned electronic pastes or photoresist 3025 meet default phase
The super structure function of surface unit pattern of bit distribution.
In the present embodiment, electronic pastes should be patterned using electron beam lithography, and photoresist should be carried out using ultraviolet photolithographic
Patterning.For different service bands, the size for the sub-wavelength structure being subsequently formed be will be different, and then the step uses
Photoetching process also can be different, for example, mostly using electron beam lithography in visible light wave range；In infrared band, ultraviolet light may be selected
It carves.In addition, printed-board technology can be used in microwave band.
Step 1203, using electron beam evaporation or hot evaporation process in dielectric layer surface and remaining electronic pastes or light
Photoresist surface evaporated metal layer, and remaining electronic pastes or photoresist are removed, to retain the metal layer of dielectric layer surface, formed sub-
The pattern of wavelength structure.
Referring to Fig. 9, electron beam evaporation can be used in 3024 surface of dielectric layer and remaining electronic pastes or photoresist
3025 (patterned electronic pastes or photoresist) surface evaporated metal layers 3026, wherein remaining electronic pastes or photoresist 3025
Limited opening gone out to be formed in 3024 surface of dielectric layer sub-wavelength structure shape, size and azimuth.
With reference to Figure 10, glue is gone to remove remaining electronic pastes or photoresist 3025 using corresponding, and then peel off simultaneously
It is formed in the metal layer 3026 on 3025 surface of remaining electronic pastes or photoresist, retains the metal layer on 3024 surface of dielectric layer, from
And form sub-wavelength structure 3022.
Step 1202 patterns electronic pastes or photoresist using electron beam exposure or light shield exposure technology further include:
Based on surface plasmon resonance or nanostructure scattering theory, using electron beam exposure or light shield exposure technology
Electronic pastes or photoresist are patterned.
By adjusting the geometric dimension for the sub-wavelength structure being subsequently formed, realize that high optics is anti-in required service band
Efficiency is penetrated, and then improves the utilization rate of incident light, reduces the loss of incident light, for focusing and imaging system, imaging can be improved
Quality.
Note that the above is only a better embodiment of the present invention and the applied technical principle.It will be appreciated by those skilled in the art that
The invention is not limited to the specific embodiments described herein, be able to carry out for a person skilled in the art it is various it is apparent variation,
It readjusts, be combined with each other and substitutes without departing from protection scope of the present invention.Therefore, although by above embodiments to this
Invention is described in further detail, but the present invention is not limited to the above embodiments only, is not departing from present inventive concept
In the case of, it can also include more other equivalent embodiments, and the scope of the invention is determined by the scope of the appended claims.
Claims (13)
1. a kind of image display system characterized by comprising
Light source；
The light that the light source issues is transformed into linearly polarized light by the polarizer, the polarizer；
Reflective super structure surface device, the reflective super structure surface device surface are formed with the super structure for meeting preset phase distribution
Function of surface unit pattern, it is corresponding that the linearly polarized light is reflected to form pre-set image by the super structure function of surface unit pattern
Reflection light；And
Detachable analyzer, the detachable analyzer show the pre-set image after carrying out analyzing to the reflection light.
2. image display system according to claim 1, which is characterized in that the preset phase distribution is according to setup parameter
It is determined in conjunction with Malus' law and broad sense Si Nieer reflection law, wherein the setup parameter includes the linearly polarized light
The intensity of intensity and the reflected light after the detachable analyzer carries out analyzing to the reflection light.
3. image display system according to claim 1, which is characterized in that
The linearly polarized light include by three colour cell of red, green and blue at white light.
4. image display system according to claim 1 to 3, which is characterized in that the reflective super structure surface device
Include:
Substrate；
Positioned at the super structure function of surface unit pattern of the substrate, the super structure function of surface unit pattern meets described pre-
If phase distribution.
5. image display system according to claim 1 to 3, which is characterized in that the super structure function of surface unit figure
Case includes super structure function of surface structure, and the super structure function of surface structure includes multiple super structure function of surface units, the super structure
Function of surface unit includes anisotropic sub-wavelength structure, and the phase that the sub-wavelength structure introduces meets the preset phase
Distribution.
6. image display system according to claim 5, which is characterized in that sub-wavelength structure includes rodlike and/or oval.
7. image display system according to claim 5, which is characterized in that the institute designed according to geometric phase principle in shellfish
Reflective super structure surface device is stated, the azimuth of the corresponding sub-wavelength structure of out of phase is different.
8. image display system according to claim 5, which is characterized in that the super structure function of surface unit includes metal
Reflecting layer, dielectric layer and anisotropic metal sub-wavelength structure laminated construction；Alternatively, the super structure function of surface unit packet
Include the laminated construction or metallic reflector and anisotropic medium of metallic reflector and anisotropic metal sub-wavelength structure
The laminated construction of sub-wavelength structure.
9. a kind of preparation method of reflective super structure surface device characterized by comprising
Substrate is provided；
The super structure function of surface unit pattern for meeting preset phase distribution, the super structure function of surface are formed in the substrate
Linearly polarized light is reflected to form the corresponding reflection light of pre-set image by unit pattern.
10. according to the method described in claim 9, it is characterized in that, preset phase distribution is according to setup parameter combination horse
Lv Si law and broad sense Si Nieer reflection law determine, wherein the setup parameter include the intensity of the linearly polarized light with
And the intensity of the light after detachable analyzer carries out analyzing to the reflection light.
11. method according to claim 9 or 10, which is characterized in that meet preset phase in substrate formation
Distribution super structure function of surface unit pattern include:
Super structure function of surface structure is formed in the substrate, wherein the super structure function of surface structure includes multiple super structures
Function of surface unit, the super structure function of surface unit includes anisotropic sub-wavelength structure, and the sub-wavelength structure introduces
Phase meet preset phase distribution.
12. according to the method for claim 11, which is characterized in that form super structure function of surface structure in the substrate
Include:
Reflective metal layer and the Jie of lamination is successively deposited in the substrate using electron beam evaporation or hot evaporation process
Matter layer；
Spin coating electronic pastes or photoresist on the dielectric layer, using electron beam exposure or light shield exposure technology to the electronic pastes
Or the photoresist is patterned, so that the patterned electronic pastes or the photoresist meet the preset phase distribution
Super structure function of surface unit pattern；
Using electron beam evaporation or hot evaporation process in the dielectric layer surface and the remaining electronic pastes or the light
Photoresist surface evaporated metal layer, and the remaining electronic pastes or the photoresist are removed, to retain the dielectric layer surface
Metal layer forms the pattern of the sub-wavelength structure.
13. according to the method for claim 12, which is characterized in that described to use electron beam exposure or light shield exposure technology pair
The electronic pastes or the photoresist are patterned further include:
Based on surface plasmon resonance or nanostructure scattering theory, using electron beam exposure or light shield exposure technology to institute
It states electronic pastes or the photoresist is patterned.
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