CN110433087B - Nano invisible mask and manufacturing process thereof - Google Patents

Nano invisible mask and manufacturing process thereof Download PDF

Info

Publication number
CN110433087B
CN110433087B CN201910856344.5A CN201910856344A CN110433087B CN 110433087 B CN110433087 B CN 110433087B CN 201910856344 A CN201910856344 A CN 201910856344A CN 110433087 B CN110433087 B CN 110433087B
Authority
CN
China
Prior art keywords
nano
spinning
particles
mask
invisible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910856344.5A
Other languages
Chinese (zh)
Other versions
CN110433087A (en
Inventor
闫晓宇
曹晨
张维
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hangzhou Long Beach Technology Co ltd
Original Assignee
Shaoxing Longbi Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shaoxing Longbi Technology Co ltd filed Critical Shaoxing Longbi Technology Co ltd
Priority to CN201910856344.5A priority Critical patent/CN110433087B/en
Publication of CN110433087A publication Critical patent/CN110433087A/en
Application granted granted Critical
Publication of CN110433087B publication Critical patent/CN110433087B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/02Cosmetics or similar toiletry preparations characterised by special physical form
    • A61K8/0212Face masks
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/25Silicon; Compounds thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/84Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions otherwise than those involving only carbon-carbon unsaturated bonds
    • A61K8/88Polyamides
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q17/00Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
    • A61Q17/04Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01DMECHANICAL METHODS OR APPARATUS IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS
    • D01D5/00Formation of filaments, threads, or the like
    • D01D5/0007Electro-spinning
    • D01D5/0015Electro-spinning characterised by the initial state of the material
    • D01D5/003Electro-spinning characterised by the initial state of the material the material being a polymer solution or dispersion
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01DMECHANICAL METHODS OR APPARATUS IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS
    • D01D5/00Formation of filaments, threads, or the like
    • D01D5/0007Electro-spinning
    • D01D5/0061Electro-spinning characterised by the electro-spinning apparatus
    • D01D5/0092Electro-spinning characterised by the electro-spinning apparatus characterised by the electrical field, e.g. combined with a magnetic fields, using biased or alternating fields
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K2800/00Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
    • A61K2800/80Process related aspects concerning the preparation of the cosmetic composition or the storage or application thereof
    • A61K2800/82Preparation or application process involves sonication or ultrasonication

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Birds (AREA)
  • Dermatology (AREA)
  • Chemical & Material Sciences (AREA)
  • Textile Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Nonwoven Fabrics (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Cosmetics (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)

Abstract

The invention discloses a nano invisible mask which comprises the following raw material components, by mass, 3-30% of polyamide, 65-96.9% of organic acid and 0.1-5% of silicon dioxide particles; the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer, and the nanofiber layer is formed between the base material bottom layer and the protective layer. The nano invisible mask prepared from the raw materials has excellent skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, strong adsorption capacity, good invisible effect and convenience for use in public places. The invention also discloses a nano invisible mask which comprises the following raw material components, by mass, 3% -30% of polyamide, 60% -96.8% of organic acid, 0.1% -5% of silica particles and 0.1% -5% of titanium dioxide particles, wherein the raw materials are mixed and then are subjected to electrostatic spinning to form a nano fiber layer, and the nano fiber layer is formed between the base material bottom layer and the protective layer. The prepared nano invisible facial mask has the effects of ultraviolet resistance and sun protection.

Description

Nano invisible mask and manufacturing process thereof
Technical Field
The invention relates to the field of beauty and skin care products, in particular to a nano invisible mask and a manufacturing process thereof.
Background
With the improvement of living standard, people pay more and more attention to facial skin care, and the facial mask temporarily isolates external air pollution by using a short time of covering the face, supplements moisture and nutrients for the skin and enables the skin to be naturally bright and elastic. The mask paper mainly comprises non-woven fabrics, silk cloth and biological fiber paper in the market at present, and is mainly characterized in that a certain amount of mask liquid is absorbed by the mask paper to be applied to the face, so that the skin achieves an absorption effect, the traditional mask paper is thick, uneven in texture and different in pore size, cannot be perfectly attached to the face of a human body, and the visual sense is very poor.
However, the nanometer invisible mask can make up for the defects, and the nanometer invisible mask is thin, small in fiber aperture, high in porosity, thin and uniform in film quality, strong in water locking capacity, and highly attached to the face of a human body so as to reserve and supplement water and nutrients required by the skin of the human body to the maximum extent. Because the facial mask is invisible when in use, the face does not show the existence of the existing facial mask, does not influence work, study and life, has compact facial mask application feeling and extremely good anti-wrinkle effect, and is convenient for various crowds to use and care skin under various states.
At present, the dry type nano-fiber mask is prepared by doping the nutrient solution of the mask into organic or inorganic solvent and preparing the electro-spinning solution into the nano-fiber mask by the electro-spinning process, when in use, the nano-fiber mask is prepared by being sprayed with water, the mask is dissolved in the water on the skin, namely the definition of the invisible facial mask, the dry facial mask has no membrane and no tightness, although the dry facial mask is convenient to carry, in the production and preparation process, the facial mask nutrient solution is formed into the cellosilk by the process of preparing the membrane cloth by electrospinning, the process is easy to be infected with bacteria, the nutrient components are easy to deteriorate, for example, Chinese patent applications 201810053724.0, 201811456355.6, 201811338900.1 and the like, the facial mask liquid is directly subjected to electrostatic spinning to prepare a composite nanofiber membrane, and then the composite nanofiber membrane is dried, cut, formed, sealed and packaged in a box for sterilization to obtain a dry facial mask, however, if the electrospinning process is carried out, the nutritional ingredients are oxidized, reacted and even deteriorated when contacting with the outside air for a period of time, and even if sterilization is carried out, the nutritional ingredients of the nanofibers cannot be guaranteed to be unchanged. Moreover, the invisible mask adheres to the efficacy of the mask liquid to achieve the effects of moisturizing and the like, and the same effect can be achieved by matching the mask liquid with the needed efficacy with the common traditional mask cloth.
Disclosure of Invention
In a first aspect, the present application provides a nano invisible mask having strong adsorption and soil removal capabilities and long-term water-locking and moisturizing effects.
Aiming at the first aspect, the nano invisible mask comprises the following raw material components, by mass, 3% -30% of polyamide, 65% -96.9% of organic acid and 0.1% -5% of silicon dioxide particles; the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer, and the nanofiber layer is formed between the base material bottom layer and the protective layer. The nano invisible mask prepared from the raw materials has excellent skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, strong adsorption capacity, good invisible effect and convenience for use in public places.
The invention also provides an improvement aiming at the first aspect, the nano invisible mask comprises the following raw material components, by mass, 8% -20% of polyamide, 78% -91.5% of organic acid and 0.5% -2% of silicon dioxide particles; the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer, and the nanofiber layer is formed between the base material bottom layer and the protective layer.
The invention also provides an improvement aiming at the first aspect, the nano invisible mask comprises the following raw material components, by mass percentage, 10% of polyamide, 89% of organic acid and 1% of silica particles, and the raw materials are mixed and then are subjected to electrostatic spinning to form a nano fiber layer and the nano fiber layer is formed between the base material bottom layer and the protective layer. The nano invisible mask prepared from the raw materials has the advantages of good skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, strong adsorption capacity, good invisible effect and convenience for use in public places.
The invention also provides an improvement aiming at the first aspect, the nano invisible mask comprises the following raw material components, by mass percentage, 20% of polyamide, 78% of organic acid and 2% of silica particles, and the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer and are formed between a base material bottom layer and a protective layer. The nano invisible mask prepared from the raw materials has the advantages of good skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, strong adsorption capacity, good invisible effect and convenience for use in public places.
The invention also provides a modification of the first aspect, wherein the silica particles have a particle size of from 5nm to 300 nm; the particle size of the titanium dioxide particles is 5 nm-200 nm; the organic acid is one or a mixture of formic acid and acetic acid. Preferably, the particle size of the silicon dioxide particles is 5-100nm, the particle size of the titanium dioxide particles is 5-100nm, and when the organic acid is a mixture of formic acid and acetic acid, the mass ratio of formic acid to acetic acid is 1: 2.
In a second aspect, the application also provides a nano invisible mask, which not only has strong adsorption and decontamination capability and long-time water locking and moisturizing effects, but also has an anti-ultraviolet effect.
Aiming at the second aspect, the technical scheme of the nano invisible mask provided by the application is as follows: a nano invisible mask comprises the following raw material components, by mass, 3% -30% of polyamide, 60% -96.8% of organic acid, 0.1% -5% of silica particles and 0.1% -5% of titanium dioxide particles, wherein after the raw materials are mixed, a nano fiber layer is formed by electrostatic spinning between a base material bottom layer and a protective layer. The nano invisible mask prepared from the raw materials has the advantages of excellent skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, extremely strong adsorption capacity, ultraviolet and sun protection effects, good invisible effects and convenience for use in public places.
The invention also provides an improvement scheme aiming at the second aspect, the nano invisible mask comprises the following raw materials, by mass, 8% -20% of polyamide, 75% -91% of organic acid, 0.5% -2% of silica particles and 0.5% -3% of titanium dioxide particles, and after the raw materials are mixed, a nano fiber layer is obtained through electrostatic spinning and is formed between the base material bottom layer and the protective layer.
The invention also provides an improvement of the second aspect, the nano invisible mask comprises raw material components, wherein the raw material components comprise, by mass, 8% of polyamide, 90% of organic acid, 1% of silica particles and 1% of titanium dioxide particles, and the raw material components are mixed and then are subjected to electrostatic spinning to form a nanofiber layer between the base material bottom layer and the protective layer. The nano invisible mask prepared from the raw materials has the advantages of excellent skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, extremely strong adsorption capacity, ultraviolet and sun protection effects, good invisible effects and convenience for use in public places.
The invention also provides an improvement of the second aspect, the nano invisible mask comprises the following raw material components, by mass, 20% of polyamide, 75% of organic acid, 2% of silica particles and 3% of titanium dioxide particles, and the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer between the base material bottom layer and the protective layer. The nano invisible mask prepared from the raw materials has the advantages of excellent skin adherence, long water locking and moisturizing time, good skin tightening and anti-wrinkle effects, extremely strong adsorption capacity, ultraviolet and sun protection effects, good invisible effects and convenience for use in public places.
The invention also provides an improvement to the second aspect, wherein the silica particles have a particle size of from 5nm to 300 nm; the particle size of the titanium dioxide particles is 5 nm-200 nm; the organic acid is one or a mixture of formic acid and acetic acid. Preferably, the particle size of the silicon dioxide particles is 5-100nm, the particle size of the titanium dioxide particles is 5-100nm, and when the organic acid is a mixture of formic acid and acetic acid, the mass ratio of formic acid to acetic acid is 1: 2.
In addition, aiming at the first aspect, the application also provides a preparation process of the nano invisible mask, which comprises the following steps: the preparation process comprises the following steps:
1) mixing polyamide and organic acid according to mass percent to obtain electrospinning liquid, fully and uniformly stirring at the stirring speed of 300-;
2) adding SiO2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the stirring speed is 200-;
3) spinning a nanofiber layer on the bottom layer of the base material by using an electrostatic spinning machine for the solution obtained after the treatment in the step 2), and then covering a protective layer on the nanofiber layer to finally prepare the nano invisible mask, wherein in the electrostatic spinning process, the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃. The preparation process is simple in scheme and easy to operate, and the nutritional ingredients of the mask liquid can be furthest guaranteed not to be changed in quality for a long time due to the fact that the mask liquid does not participate in electrostatic spinning during preparation.
Aiming at the technical scheme, the application also provides an improved scheme, and the preparation process of the nano invisible mask comprises the following steps:
1) dissolving polyamide with the mass fraction of 30% as a solute in a formic acid solvent with the mass fraction of 65% to form an electrospinning solution, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 600r/min, and the stirring time is 6 hours;
2) adding 5 percent of nano SiO by mass2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 100 nm;
3) spinning a nanofiber layer on the bottom layer of the non-woven fabric base material by using the solution treated in the step 2) through an electrostatic spinning machine, covering a protective layer on the nanofiber layer, and finally preparing a nano invisible mask; wherein, the technological parameters in the electrostatic spinning are as follows:
the electrode voltage is 80KV, the spinning electrode spacing is 180mm, the spinning liquid feeding speed is 300mm/s, the base material transmission speed is 200mm/min, the spinning humidity is 30%, and the spinning temperature is 27 ℃.
The application also provides a preparation process of the nano invisible mask aiming at the second aspect, which comprises the following steps:
the method comprises the following steps:
1) mixing polyamide and organic acid according to mass percent to obtain electrospinning liquid, fully and uniformly stirring at the stirring speed of 300-;
2) adding SiO2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the stirring speed is 200-;
3) continued addition of TiO2Carrying out ultrasonic oscillation stirring on the particles at the speed of 200 and 500r/min for 4 h;
4) spinning a nanofiber layer on the bottom layer of the base material by using an electrostatic spinning machine for the solution obtained after the treatment in the step 3), and then covering a protective layer on the nanofiber layer to finally prepare the nano invisible mask, wherein in the electrostatic spinning process, the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃.
Aiming at the scheme, the application also provides an improved process of the nano invisible mask, which comprises the following steps: the mass fraction of polyamide in the step 1) is 10%, the mass fraction of organic acid is 89%, and the mixture of formic acid and acetic acid is in a mass ratio of 1:2, and SiO in the step 2)2The mass fraction of the particles is 0.5%, the particle diameter of the particles is 80nm, and the TiO in the step 3)2The mass fraction of the particles is 0.5 percent, and the particle diameter of the particles is 60 nm;
or the SiO in step 2) is prepared by using a formic acid solvent and the polyamide in step 1) in a mass fraction of 30% and the organic acid in a mass fraction of 60%2TiO in step 3) with a particle mass fraction of 5% and a particle diameter of 5nm2The mass fraction of the particles is 5 percent, and the particle diameter of the particles is 200 nm;
or, the mass fraction of polyamide in the step 1) is 3%, the mass fraction of organic acid is 96.8%, acetic acid solvent is used, and SiO in the step 2)2The mass fraction of the particles is 0.1% and the particle diameter of the particles is 300nm, TiO in step 3)2The mass fraction of the particles was 0.1% and the particle size was 5 nm.
The nano invisible mask disclosed by the invention is used for preparing a nano fibrous membrane (a mask sheet) as a mask carrier through an electrostatic spinning process, and then is matched with a mask liquid (the mask is insoluble), so that the invisible effect of the mask during application can be achieved, and the freshness and the sterility of the components of a mask nutrient solution can be ensured. SiO is newly added in the preparation of the mask sheet of the invention2Nanoparticles and TiO2The nano particles endow the mask sheet with strong water-locking and moisture-keeping functions, face cleaning and ultraviolet prevention.
The invention provides a nano invisible mask and a manufacturing process thereof; the invisible mask disclosed by the invention has the advantages of good invisible effect, immediate appearance when meeting water, compact application feeling, good anti-wrinkle effect, long-time water locking and moisture retention, extremely strong adsorption capacity, capability of cleaning and removing facial dirt, and ultraviolet-proof and sun-proof effects.
The utility model provides a stealthy facial mask of nanometer includes non-woven fabrics substrate bottom, novel nanofiber layer and nanofiber protective layer, wherein novel nanofiber layer adopts electrostatic spinning technique to form on the non-woven fabrics substrate bottom with in the middle of the nanofiber protective layer, this novel nanofiber layer includes:
3 to 30 mass percent of polyamide is taken as a solute;
60-96.8% of organic acid in mass fraction as solvent;
0.1-5% by mass of silica particles and
0.1-5% by mass of titanium dioxide particles;
wherein the polyamide is PA6, PA66, PA46 and the like without limiting the type class of the polyamide; wherein the organic acid solvent is one or a mixture of formic acid and acetic acid.
The technical scheme is as follows:
a nano invisible mask comprises the following raw materials: 3 to 30 percent of polyamide as solute, 60 to 96.8 percent of organic acid as solvent, 0.1 to 5 percent of nano-silica particles and 0.1 to 5 percent of nano-titania particles. The specific steps are as follows,
mixing a certain amount of solute and a certain amount of solvent in proportion, stirring for 2-6h at the speed of 600r/min, fully and uniformly stirring, standing and defoaming;
adding a certain amount of SiO2The ultrasonic oscillation stirring speed of the particles in the electrospinning liquid is 200-; the SiO2The particle diameter of the particles is 5 nm-300 nm, preferably 5-100 nm; SiO in the mixed electrospinning liquid2The proportion of the particles is preferably 0.5-2%;
adding a certain amount of TiO2The ultrasonic oscillation stirring speed of the particles in the electrospinning liquid is 200-; the TiO is2The particle diameter of the particles is 5 nm-200 nm, preferably 5-100 nm; TiO in the mixed electrospinning liquid2The proportion of the particles is preferably 0.5-3%.
Wherein said SiO2And TiO2Respectively has an adsorption cleaning faceThe effect and the ultraviolet-proof effect can be achieved by respectively adding the electrospinning solution for electrostatic spinning to obtain the nano invisible surface membrane with the specific effect, and simultaneously adding the electrospinning solution for electrostatic spinning to obtain the nano invisible surface membrane with double functions.
The nanofiber is prepared by adopting an electrostatic spinning technology, an Elmarco electrostatic spinning machine is preferably selected, and the equipment and the process parameters are as follows: adjusting the electrode voltage to be 20-80KV, the spinning electrode spacing to be 150-.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and represents a male and a female respectively. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
Spun-bonded non-woven fabrics with different colors are used as a nanofiber receiving and supporting layer to distinguish different mask styles, such as blue base fabric for men and pink base fabric for women. The facial mask for men and the facial mask for women have different sizes, the facial shapes of the facial masks for men are slightly larger, and the facial shapes of the facial masks for women are slightly smaller, and the facial masks for women are purchased by consumers.
Covering a layer of white non-woven fabric on the nanofiber surface as a protective layer, and cutting into facial mask pieces with corresponding human face patterns by using a cutting machine, wherein the facial mask pieces are matched with facial mask liquid with corresponding effects. The mask sheet can be in a whole sheet type, a left-right split type, a local type or an up-down split type. Wherein, the upper and lower parts are preferred for better fitting the mask on the cheek, the shape of the mask is as shown in figure 2, and the fitting degree of the orbit and the nose bridge part is much improved compared with the common whole mask.
The nano invisible mask disclosed by the invention is small in fiber aperture, 80nm in average fiber diameter, excellent in skin adherence, long in water locking and moisturizing time, good in skin tightening and anti-wrinkle effects, extremely strong in adsorption capacity, good in invisible effect, capable of cleaning and removing facial dirt, and capable of preventing ultraviolet and sun, and convenient to use at will in public places.
Drawings
Fig. 1 is an SEM image of the nano invisible mask prepared in example 2 of the present application;
FIG. 2 is a schematic view of the construction of a facial mask;
fig. 3 is a facial comparison picture of the nano invisible mask prepared in example 2 of the present application before and after use (wherein, reference numeral 1 is a facial picture before applying the mask, reference numeral 2 is a facial picture for 1 minute after applying the mask, reference numeral 3 is a facial picture for 10 minutes after applying the mask, and reference numeral 4 is a facial picture after applying the mask).
Detailed Description
Example 1
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving 15 mass percent of polyamide (PA6) serving as a solute in 84 mass percent of formic acid-acetic acid mixed solvent to form electrospinning solution, wherein the mass percent of the methanoic acid-acetic acid mixed solvent is 1:2 (namely the mass ratio of formic acid to acetic acid is 1:2), fully stirring uniformly, standing and defoaming, wherein the stirring speed is 500r/min, and the stirring time is 4 hours;
step 2): then adding 1 percent of nano SiO in percentage by mass2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 45 nm;
step 3) spinning the solution obtained after the treatment in the step 2) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; when the electrostatic spinning machine is used, the technological parameters of the electrostatic spinning machine are as follows:
electrode voltage 70KV, spinning electrode spacing 220mm, spinning liquid feeding speed 100mm/s, base material transmission speed 100mm/min, spinning humidity 20%, and spinning temperature 25 ℃.
In this embodiment 1, the nanofiber layer is electrospun on the substrate bottom layer by using an electrospinning machine, so that the nanofiber layer can be well adhered to the substrate bottom layer, when the nano invisible mask sheet prepared in embodiment 1 is used, the protective layer is firstly removed, the exposed nanofiber layer is covered on the skin, then the mask solution is coated, and after the mask sheet is completely wetted, the outermost substrate bottom layer is removed.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
The nano invisible mask sheet prepared by the scheme of the embodiment 1 is matched with a mask liquid with moisturizing and whitening effects, so that the whole mask has the effects of cleaning the face, locking water and moisturizing, and is invisible and compact.
Example a
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving 30% of polyamide (PA66) serving as a solute in 65% of formic acid solvent by mass fraction to form an electrospinning solution, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 600r/min, and the stirring time is 6 hours;
step 2): then adding 5 percent of nano SiO in mass fraction2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 100 nm;
step 3) spinning the solution obtained after the treatment in the step 2) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; when the electrostatic spinning machine is used, the technological parameters of the electrostatic spinning machine are as follows:
the electrode voltage is 80KV, the spinning electrode spacing is 180mm, the spinning liquid feeding speed is 300mm/s, the base material transmission speed is 200mm/min, the spinning humidity is 30%, and the spinning temperature is 27 ℃.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
The nano invisible mask sheet prepared by the scheme of the embodiment a is matched with the mask liquid with the moisturizing and whitening effects, so that the whole mask has the effects of cleaning the face, locking water and moisturizing, and is invisible and compact.
Example b
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving polyamide (PA46) with the mass fraction of 3% as a solute in acetic acid solvent with the mass fraction of 96.9% to form electrospinning liquid, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 300r/min, and the stirring time is 2 hours;
step 2): then adding 0.1 percent of nano SiO in percentage by mass2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 200r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 300 nm;
step 3) spinning the solution obtained after the treatment in the step 2) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; when the electrostatic spinning machine is used, the process parameters of the electrostatic spinning machine are as follows:
the electrode voltage is 40KV, the spinning electrode spacing is 240mm, the spinning liquid feeding speed is 200mm/s, the base material transmission speed is 40mm/min, the spinning humidity is 20%, and the spinning temperature is 22 ℃.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
The nano invisible mask sheet prepared by the scheme of the embodiment b is matched with the mask liquid with the moisturizing and whitening effects, so that the whole mask has the effects of cleaning the face, locking water and moisturizing, and is invisible and compact.
Example 2
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving 10% of polyamide (PA66) as a solute in 89% of formic acid-acetic acid mixed solvent by mass fraction to obtain an electrospinning solution, wherein the ratio of the methyl to the acetic acid is 1:2 (namely the mass ratio of the formic acid to the acetic acid is 1:2), fully stirring uniformly, standing for defoaming, and stirring at the speed of 400r/min for 5 hours;
step 2): adding 0.5 percent of nano SiO in mass fraction2The particles are stirred in the electrospinning liquid for 4 hours at the ultrasonic oscillation stirring speed of 500 r/min; wherein the used nano SiO2The particle size of the particles is 80 nm;
step 3) adding 0.5 percent of nano TiO in mass fraction into the solution obtained after the treatment in the step 2)2Carrying out ultrasonic oscillation on the particles, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the nano TiO is used2The particle size of the particles is 60 nm;
step 4) spinning the solution obtained after the treatment of the step 3) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; the technical parameters of the electrostatic spinning machine are as follows:
the electrode voltage is 80KV, the spinning electrode spacing is 230mm, the spinning liquid feeding speed is 150mm/s, the base material transmission speed is 100mm/min, the spinning humidity is 25%, and the spinning temperature is 25 ℃.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
The nano invisible mask sheet prepared by the scheme of the embodiment 2 is matched with a mask liquid with moisturizing and whitening effects, so that the whole mask has the face cleaning effect, the ultraviolet protection and sun protection level of UPF30+, and the mask has the advantages of long-time water locking, moisturizing, invisible and compact effects. The mask sheet can be hidden when in use, does not influence the facial image and has a sun-proof function, so the mask sheet is more suitable for occasions such as seasides, trips and the like, and can prevent sun while playing and is convenient for applying the mask sheet to moisturize and maintain the skin.
Fig. 1 is an SEM image showing the nanofiber mask prepared in example 2. From the SEM image, it can be seen that the average diameter of the nanofibers was 80nm, SiO2And TiO2Has an average particle diameter of 60 to 80 nm.
FIG. 2 shows a planar CAD graph of a nano-stealth surface membrane. The facial mask is divided up and down, so that the facial mask can be conveniently applied to the face and is tightly attached to the face.
Fig. 3 shows a front and back face comparison using a nano invisible mask. From this comparison it is evident that the figure numbered 2 is the face condition just applied with the mask, the mask sheet being clearly visible; the figure of reference numeral 3 is the face condition in the application process, the edge trace of the mask sheet is not easy to be seen, namely, the mask sheet is invisible and transparent; the figure of reference numeral 4 in fig. 3 shows that the rear part of the mask is removed, and the comparison with reference numeral 3 shows that the nano invisible mask has a very remarkable invisible effect.
Example 3
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving 30% of polyamide (PA6) serving as a solute in a formic acid solvent with the mass fraction of 60% in mass fraction to form an electrospinning solution, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 500r/min, and the stirring time is 4 hours;
step 2): then adding 5 percent of nano SiO in mass fraction2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 5 nm;
step 3) adding 5% of nano TiO in mass fraction into the solution obtained after the treatment in the step 2)2Carrying out ultrasonic oscillation on the particles, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the nano-particles are usedTiO2The particle size of the particles is 200 nm;
step 4) spinning the solution obtained after the treatment of the step 3) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; when the electrostatic spinning machine is used, the technological parameters of the electrostatic spinning machine are as follows:
electrode voltage 70KV, spinning electrode spacing 220mm, spinning liquid feeding speed 100mm/s, base material transmission speed 100mm/min, spinning humidity 20%, and spinning temperature 25 ℃.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
Example 4
A preparation method based on a nano invisible mask comprises the following steps:
step 1): dissolving 3 mass percent of polyamide (PA66) serving as a solute in 96.8 mass percent of acetic acid solvent to form an electrospinning solution, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 500r/min, and the stirring time is 4 hours;
step 2): then adding 0.1 percent of nano SiO in percentage by mass2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid at the ultrasonic oscillation stirring speed of 500r/min for 4 h; wherein the used nano SiO2The particle size of the particles is 300 nm;
step 3) adding 0.1 mass percent of nano TiO into the solution obtained after the treatment in the step 2)2Carrying out ultrasonic oscillation on the particles, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the nano TiO is used2The particle size of the particles is 5 nm;
step 4) spinning the solution obtained after the treatment of the step 3) by using an Elmarco electrostatic spinning machine, taking a non-woven fabric substrate as a substrate bottom layer, spinning on the substrate bottom layer to obtain a nanofiber layer, covering a white non-woven fabric layer on the nanofiber layer to serve as a protective layer, and finally preparing the nano invisible surface diaphragm; when the electrostatic spinning machine is used, the technological parameters of the electrostatic spinning machine are as follows:
the electrode voltage is 80KV, the spinning electrode spacing is 210mm, the spinning liquid feeding speed is 100mm/s, the base material transmission speed is 100mm/min, the spinning humidity is 20%, and the spinning temperature is 25 ℃.
The bottom layer of the non-woven fabric substrate is used as a novel nanofiber receiving layer. Wherein the bottom layer of the non-woven fabric base material is blue or pink and respectively represents a male and a female. Wherein the size of the male mask sheet is larger, and the size of the female mask sheet is smaller.
And (3) ultraviolet effect detection: the nano invisible surface membrane (without membrane liquid) prepared in each example and a certain brand silk surface membrane (without membrane liquid) are subjected to ultraviolet-proof effect detection and comparison, as shown in table 1, table 1
Figure BDA0002198387580000171
The method comprises the steps of respectively placing the nano invisible surface membrane and the silk mask membrane of a certain brand prepared in each embodiment into a sample cabin by using a YG (B)912E type textile ultraviolet resistance tester, and detecting an ultraviolet resistance effect according to the national standard GB/T18830, wherein the higher the ultraviolet protection coefficient value (UPF), the lower the ultraviolet transmittance (UVA and UVB), and the better the ultraviolet resistance effect is shown, as shown in Table 1, the UPF values of the nano invisible surface membranes of the embodiments 2 to 4 are higher than the UPF values of the parameter surface membranes of the certain brand and the embodiments 1, a and b, and the lowest the UVA and UVB transmittances are shown, and the TiO is added2The nano invisible surface membrane of the particles has good sun-proof effect. Further, from
As can be seen in Table 1, example 3 has the highest UPF value because this example 3 has the largest proportion of nano-titania content.
And (3) detecting the water locking and moisturizing effect: the nano invisible facial mask (without mask liquid) and the silk facial mask (without mask liquid) of a certain brand prepared in each embodiment are taken as the same 3X3cm square-shaped facial mask, soaked in 10ml of physiological saline for 10 minutes, taken out and applied to the back of a cleaned hand, wherein the silk facial mask of a certain brand is a control group, the facial mask to be detected is removed after 30 minutes, and the skin moisture content of the facial mask applied to a volunteer between 20 and 45 years old is detected by an intelligent skin moisture tester after 0, 1h, 2h and 3h, as shown in Table 2,
TABLE 2
Figure BDA0002198387580000181
As shown in Table 2, the skin moisture content of the nano invisible masks prepared in examples 1 to 4 after use was higher than that of the silk mask of a certain brand because of the addition of nano-scale micro-porous SiO2The particles can absorb and store more mask liquid, and have the effects of efficiently locking water and moisturizing for a long time; in the embodiment a and the embodiment 3, the skin moisture content of 0 h, 1h, 2h and 3h after the mask is removed can be kept to be more than 45 percent, and the obvious and stable water locking and moisturizing effect is achieved because the nano-scale microporous SiO in the embodiment2The content ratio of the particles is the largest, and the mask sheet bears a large amount of mask liquid to fully moisturize and moisturize applied skin.
And (3) cleaning effect detection: the nano invisible facial mask (without mask liquid) and a certain brand silk facial mask (without mask liquid) prepared in each embodiment are soaked in 10ml of physiological saline for 10 minutes and then taken out, the soaked nano invisible facial mask and the silk facial mask (without mask liquid) of the same size as 3X3cm are applied to the cleaned backs of hands, wherein the silk facial mask of the certain brand is a control group, the facial mask to be detected is removed after 30 minutes, and the skin pore cleanliness of the applied facial mask is detected for volunteers between 20 and 45 years old by using an intelligent skin detector after 0 hour, 1 hour, 2 hours and 3 hours, as shown in Table 3,
TABLE 3
Figure BDA0002198387580000191
As shown in Table 3, the nano-sized mask masks prepared in examples 1 to 4 all had significantly improved skin cleanliness after use, and some products hadThe improvement effect of skin cleanliness of the silk mask after use is not obvious, because the nano-scale microporous SiO is added in the embodiment2The particles play a role in adsorbing and cleaning impurities in skin pores; in the examples a and 3, the skin cleanliness of the removed mask reaches more than 35% at most because of the nano-scale micro-porous SiO2The content ratio of the particles is the highest, and the mask sheet has the best and most obvious cleaning effect.
And (3) anti-wrinkle effect detection: the nano invisible facial mask (without facial mask liquid) and the silk facial mask (without facial mask liquid) of a certain brand prepared in each embodiment are soaked in 10ml of physiological saline for 10 minutes and then taken out, the obtained eye facial masks are applied to the periphery of the designated cleaned eye, wherein the silk facial mask of a certain brand is a control group, the facial mask to be detected is removed after 30 minutes, an intelligent skin detector is used for detecting the skin wrinkle degree of the applied facial mask of a volunteer between 20 and 45 years old, as shown in Table 4,
TABLE 4
Application time (min) Degree of skin wrinkles (% before application) Skin wrinkle degree after removing mask (%)
Certain brand silk mask piece 30 38.3 38.2
Example 1 30 37.5 34.2
Example a 30 35.2 31.5
Example b 30 37.9 33.4
Example 2 30 35.8 32.0
Example 3 30 33.4 29.2
Example 4 30 35.2 31.8
As shown in table 4, the facial wrinkle condition of a certain brand of silk mask is not obviously changed, the facial wrinkle degree of the nano invisible mask prepared in examples 1 to 4 is reduced and the wrinkle degree is obviously improved after the nano invisible mask is used, which indicates that the nano invisible mask has certain skin-tightening and anti-wrinkle effects; compared with the traditional mask cloth, the nano invisible mask is much lighter and thinner, and the nano fibers with small apertures are applied on the face and tightly attached to the skin, so that the effect of tightening the skin is achieved.
The above embodiments are only used to illustrate some technical solutions of the present invention, and the description thereof is specific and detailed, but not to limit the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the spirit of the invention, which shall be covered by the protection scope of the claims.

Claims (10)

1. A nanometer invisible mask is characterized in that: the raw material components comprise, by mass, 3-30% of polyamide, 65-96.9% of organic acid and 0.1-5% of nano-scale microporous silica particles; mixing the raw materials, and then carrying out electrostatic spinning to obtain a nanofiber layer which is formed between a base material bottom layer and a protective layer; wherein the particle size of the silicon dioxide particles is 5 nm-300 nm; the organic acid is one or a mixture of formic acid and acetic acid; in the electrostatic spinning process, the electrostatic spinning parameters are that the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃.
2. The nano invisible mask as claimed in claim 1, wherein: the nano invisible mask comprises the following raw materials, by mass, 8-20% of polyamide, 78-91.5% of organic acid and 0.5-2% of nano microporous silica particles; the raw materials are mixed and then are subjected to electrostatic spinning to form a nanofiber layer, and the nanofiber layer is formed between the base material bottom layer and the protective layer.
3. The nano invisible mask as claimed in claim 1 or 2, wherein: the particle size of the silicon dioxide particles is 5-100nm, and when the organic acid is a mixture of formic acid and acetic acid, the mass ratio of the formic acid to the acetic acid is 1: 2.
4. The process for preparing a nano invisible mask as claimed in claim 1, 2 or 3, wherein the process comprises the following steps: the method comprises the following steps:
1) mixing polyamide and organic acid according to mass percent to obtain electrospinning liquid, fully and uniformly stirring at the stirring speed of 300-;
2) adding SiO2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the stirring speed is 200-;
3) spinning a nanofiber layer on the bottom layer of the base material by using an electrostatic spinning machine for the solution obtained after the treatment in the step 2), and then covering a protective layer on the nanofiber layer to finally prepare the nano invisible mask, wherein in the electrostatic spinning process, the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃.
5. The manufacturing process according to claim 4, wherein: the method comprises the following steps:
1) dissolving polyamide with the mass fraction of 30% as a solute in a formic acid solvent with the mass fraction of 65% to form an electrospinning solution, fully and uniformly stirring, standing and defoaming, wherein the stirring speed is 600r/min, and the stirring time is 6 hours;
2) adding 5 percent of nano SiO by mass2Carrying out ultrasonic oscillation stirring on the particles in the electrospinning liquid, wherein the ultrasonic oscillation stirring speed is 500r/min, and the stirring time is 4 h; wherein the used nano SiO2The particle size of the particles is 100 nm;
3) spinning a nanofiber layer on the bottom layer of the non-woven fabric substrate by using an electrostatic spinning machine for the solution treated in the step 2), and covering a protective layer on the nanofiber layer to finally prepare the nano invisible mask; wherein, the technological parameters in the electrostatic spinning are as follows:
the electrode voltage is 80KV, the spinning electrode spacing is 180mm, the spinning liquid feeding speed is 300mm/s, the base material transmission speed is 200mm/min, the spinning humidity is 30%, and the spinning temperature is 27 ℃.
6. A nano invisible mask is characterized in that: the raw material composition comprises, by mass, 3-30% of polyamide, 60-96.8% of organic acid, 0.1-5% of nano-scale microporous silica particles and 0.1-5% of titanium dioxide particles, and after the raw materials are mixed, a nanofiber layer is subjected to electrostatic spinning and formed between a base material bottom layer and a protective layer; wherein the particle size of the silicon dioxide particles is 5 nm-300 nm; the particle size of the titanium dioxide particles is 5 nm-200 nm; the organic acid is one or a mixture of formic acid and acetic acid; wherein in the electrostatic spinning process, the parameters of the electrostatic spinning machine are that the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃.
7. The nano invisible mask as claimed in claim 6, wherein: the nano invisible mask comprises the following raw materials, by mass, 8-20% of polyamide, 75-91% of organic acid, 0.5-2% of nano microporous silica particles and 0.5-3% of titanium dioxide particles, wherein a nano fiber layer is formed between a base material bottom layer and a protective layer through electrostatic spinning after the raw materials are mixed.
8. The nano invisible mask as claimed in claim 6, wherein: the particle size of the silicon dioxide particles is 5-100nm, the particle size of the titanium dioxide particles is 5-100nm, and when the organic acid is a mixture of formic acid and acetic acid, the mass ratio of the formic acid to the acetic acid is 1: 2.
9. The process for preparing a nano invisible mask according to claim 6, 7 or 8, which is characterized in that:
the method comprises the following steps:
1) mixing polyamide and organic acid according to mass percent to obtain electrospinning liquid, fully and uniformly stirring at the stirring speed of 300-;
2) adding SiO2The particles are stirred in the electrospinning liquid by ultrasonic oscillation, the stirring speed is 200-500r/min, and the stirring time is 4 h;
3) continued addition of TiO2Carrying out ultrasonic oscillation stirring on the particles at the speed of 200 and 500r/min for 4 h;
4) spinning a nanofiber layer on the bottom layer of the base material by using an electrostatic spinning machine for the solution obtained after the treatment in the step 3), and then covering a protective layer on the nanofiber layer to finally prepare the nano invisible mask, wherein in the electrostatic spinning process, the electrode voltage is 20-80KV, the spinning electrode spacing is 150-240mm, the spinning liquid feeding speed is 100-300mm/s, the base material transmission speed is 40-200mm/min, the spinning humidity is 20-35%, and the spinning temperature is 22-27 ℃.
10. The preparation process of the nano invisible mask as claimed in claim 9, wherein the preparation process comprises the following steps: the polyamide mass fraction in the step 1) is 10%, the organic acid mass fraction is 89%, and the organic acid is a mixed solvent of formic acid and acetic acid at a mass ratio of 1:2, and SiO in the step 2)2The mass fraction of the particles is 0.5% and the particle size of the particles is 80nm, TiO in step 3)2The mass fraction of the particles is 0.5 percent, and the particle size of the particles is 60 nm;
or the polyamide in the step 1) is 30% by mass, the organic acid is 60% by mass, and a formic acid solvent is used, and SiO in the step 2)2The mass fraction of the particles is 5% and the particle size is 5nm, TiO in step 3)2The mass fraction of the particles is 5 percent, and the particle diameter of the particles is 200 nm;
or, the mass fraction of polyamide in the step 1) is 3%, the mass fraction of organic acid is 96.8%, acetic acid solvent is adopted, and SiO in the step 2) is adopted2The mass fraction of the particles is 0.1% and the particle size of the particles is 300nm, TiO in step 3)2The mass fraction of the particles was 0.1% and the particle size was 5 nm.
CN201910856344.5A 2019-09-11 2019-09-11 Nano invisible mask and manufacturing process thereof Active CN110433087B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910856344.5A CN110433087B (en) 2019-09-11 2019-09-11 Nano invisible mask and manufacturing process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910856344.5A CN110433087B (en) 2019-09-11 2019-09-11 Nano invisible mask and manufacturing process thereof

Publications (2)

Publication Number Publication Date
CN110433087A CN110433087A (en) 2019-11-12
CN110433087B true CN110433087B (en) 2022-05-10

Family

ID=68440024

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910856344.5A Active CN110433087B (en) 2019-09-11 2019-09-11 Nano invisible mask and manufacturing process thereof

Country Status (1)

Country Link
CN (1) CN110433087B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114606651A (en) * 2022-01-20 2022-06-10 杭州龙碧科技有限公司 Nanofiber membrane for heat radiation cooling and preparation method and application thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105246469A (en) * 2013-03-12 2016-01-13 活性纤维有限公司 Nanofibre and bioactive compositions and related methods
CN109853130A (en) * 2018-12-21 2019-06-07 北京工商大学 The ultra-thin super stemness nano fibrous membrane paper of one kind and preparation method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105246469A (en) * 2013-03-12 2016-01-13 活性纤维有限公司 Nanofibre and bioactive compositions and related methods
CN109853130A (en) * 2018-12-21 2019-06-07 北京工商大学 The ultra-thin super stemness nano fibrous membrane paper of one kind and preparation method

Also Published As

Publication number Publication date
CN110433087A (en) 2019-11-12

Similar Documents

Publication Publication Date Title
CN105063896B (en) Manufacturing method of waterproof and breathable paper diaper base membrane
CN106811849B (en) Soybean fiber and bamboo fiber blended Siro Core-spun Yarn line and its spinning process
CN106245118A (en) The production method of anion Bombyxmori Linnaeus silk flosssilk wadding
CN108998889A (en) A kind of preparation process of ES hydrophilic fibers non-woven fabrics
CN110433087B (en) Nano invisible mask and manufacturing process thereof
CN108085772A (en) A kind of cellulose nanometer fibril enhancing polyurethane fiber and preparation method and application
CN104927074A (en) Konjac glucomannan sticking membrane used for sanitary travel sleeping bag and preparation method for konjac glucomannan sticking membrane
CN106400230A (en) Cold yarn thread and preparation method and use thereof
CN108309569A (en) A kind of compound core body and its manufacturing method of paper diaper
CN203016833U (en) Health care towel
CN205390407U (en) Antifog haze gauze mask of bamboo fibre
CN109537302A (en) A kind of multi-function health-care linen-cotton fabric and preparation method thereof
CN212555288U (en) Nano-silver antibacterial melt-blown non-woven fabric
CN107142727A (en) A kind of production method of controllable wet-guide quick-drying silk pajama fabric
CN107604647A (en) A kind of antibiotic ultraviolet-resistant brocade cotton
CN208148720U (en) Uvioresistant moisture-permeable shell fabric
CN108030702B (en) Water-locking moisture-preserving mask cloth and preparation method and application thereof
JP2008307814A (en) Waterproof cloth and its manufacturing process
CN208338912U (en) A kind of pure cotton thickness money crew neck that permeability is good suit
CN206778027U (en) A kind of high filtration PM2.5 nonwoven fabric construct
CN109363967A (en) A kind of invisible face pack and preparation method thereof
CN109112656A (en) A kind of preparation method of high mating type antibacterial viscose fiber material
CN104775180A (en) Process for producing saturated impregnated non-woven fabric
CN205197082U (en) Antibiotic dust mask
CN105582744B (en) A kind of silk nanofiber filtration material, its preparation method and its application

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20230508

Address after: 311215 room 1505, 15 / F, building 3, No. 475, Changhe Road, Changhe street, Binjiang District, Hangzhou City, Zhejiang Province

Patentee after: Hangzhou Long-Beach Technology Co.,Ltd.

Address before: 312366 Lehai Town Industrial Zone, Binhai New Town, Shaoxing, Zhejiang

Patentee before: Shaoxing longbi Technology Co.,Ltd.