CN110408931B - Thermal barrier coating with long service life and preparation method thereof - Google Patents

Thermal barrier coating with long service life and preparation method thereof Download PDF

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Publication number
CN110408931B
CN110408931B CN201910821322.5A CN201910821322A CN110408931B CN 110408931 B CN110408931 B CN 110408931B CN 201910821322 A CN201910821322 A CN 201910821322A CN 110408931 B CN110408931 B CN 110408931B
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layer
bonding layer
layers
thermal barrier
barrier coating
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CN110408931A (en
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王东生
周杏花
朱坤锋
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Tongling University
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Tongling University
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/073—Metallic material containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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    • C23C14/14—Metallic material, boron or silicon
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/5813—Thermal treatment using lasers
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C23C28/3215—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer at least one MCrAlX layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
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    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
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    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
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    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/024—Anodisation under pulsed or modulated current or potential
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Abstract

The invention relates to a thermal barrier coating with long service life and a preparation method thereof, the thermal barrier coating comprises a bonding layer and a ceramic surface layer which are arranged on the surface of a substrate, a diffusion barrier layer is also arranged between the bonding layer and the substrate, the diffusion barrier layer is a Zr layer/ZrN layer alternately overlapped diffusion barrier layer, and the surfaces of the diffusion barrier layer, which are contacted with the substrate and the bonding layer, are both Zr layers; the time between the ceramic surface layer and the bonding layer is also provided with a pre-oxidation layer, and the pre-oxidation layer is continuous and compact alpha-Al 2 O 3 A layer. The invention respectively prepares a multi-layer diffusion barrier layer and alpha-Al at two interfaces of a double-layer structure thermal barrier coating matrix/bonding layer and a bonding layer/ceramic surface layer 2 O 3 The pre-oxidized layer can effectively slow down the inter-diffusion of metal elements at the interface of a matrix/bonding layer and the interface of the bonding layer/ceramic surface layer in the high-temperature service processThe growth speed of TGO is improved, so that the long-term high temperature resistance of the thermal barrier coating with the double-layer structure is improved, and the service life of the thermal barrier coating with the double-layer structure is prolonged.

Description

Thermal barrier coating with long service life and preparation method thereof
Technical Field
The invention belongs to the technical field of thermal barrier coatings, and particularly relates to a thermal barrier coating with long service life and a preparation method thereof.
Background
In order to reduce the fuel consumption of future aerospace engines, improve the thrust/mass ratio and the service life, a plurality of advanced materials with low density, good room temperature toughness and high temperature strength are used in a large quantity, and various functional coatings are widely applied, wherein the thermal barrier coatings (Thermal Barrier Coatings, TBCs) play a very important role in improving the working temperature of the engines. Because the preparation process is simple, the double-layer thermal barrier coating is mainly in a structural form adopted by the thermal barrier coating, wherein the surface layer of the double-layer thermal barrier coating is a ceramic heat insulation layer, and the middle layer is a metal bonding layer.
The two interfaces of the matrix/bonding layer and the bonding layer/ceramic surface layer of the thermal barrier coating with the double-layer structure are weak links of the whole thermal barrier coating and are key points affecting the service life of the thermal barrier coating. When the thermal barrier coating is in service at a temperature higher than 1000 ℃, the oxidation rate of the bonding layer and the inter-diffusion rate of the metal elements at the interface of the matrix and the bonding layer are obviously increased, and the premature failure of the thermal barrier coating can be caused. In addition, as the service time of the coating at high temperature is prolonged, thermally grown oxide (TGO, thermally Grown Oxide) at the interface of the bonding layer/the ceramic surface layer continuously grows, the TGO deforms and even cracks, and finally the whole coating is destructively peeled off, so that the protective effect is lost. Therefore, the development and design of the thermal barrier coating which prolongs the service life of the thermal barrier coating in a high-temperature environment by controlling the growth of the bonding layer/ceramic surface layer interface TGO, preventing the oxidation of the bonding layer and the mutual diffusion of metal elements at the matrix/bonding layer interface has important economic, social and practical significance.
Disclosure of Invention
The invention aims to solve the problems and provide the thermal barrier coating with the long service life, which has the advantages of simple structure and reasonable design, and the preparation method thereof.
The invention realizes the above purpose through the following technical scheme:
the thermal barrier coating with the long service life comprises a bonding layer and a ceramic surface layer which are arranged on the surface of a substrate, wherein a diffusion barrier layer is also arranged between the bonding layer and the substrate, the diffusion barrier layer is formed by alternately overlapping Zr layers/ZrN layers, and the surfaces of the diffusion barrier layer, which are contacted with the substrate and the bonding layer, are both Zr layers;
the time between the ceramic surface layer and the bonding layer is also provided with a pre-oxidation layer, and the pre-oxidation layer is continuous and compact alpha-Al 2 O 3 A layer.
As a further optimization scheme of the invention, the bonding layer is made of MCrAlY or PtNiAl material, M in the MCrAlY is Ni or Co element, and the thickness of the MCrAlY is 50-200 mu M.
As a further optimization scheme of the invention, the thickness of the Zr layer is 0.25-1 mu m, and the thickness of the ZrN layer is 1-4 mu m.
As a further optimization scheme of the invention, the ceramic surface layer is ZrO 2 And Y 2 O 3 A mixed powder ceramic facing wherein Y 2 O 3 The ceramic surface layer accounts for 7 mass percent, and the thickness of the ceramic surface layer is 50-1000 mu m.
As a further optimization of the present invention, the alpha-Al 2 O 3 The thickness of the layer is 5-10 μm.
A method of preparing a long life thermal barrier coating as claimed in any one of the preceding claims, comprising the steps of:
step S1: preparing a diffusion barrier layer with alternately overlapped Zr layers/ZrN layers on the surface of the pretreated substrate
Placing the pretreated substrate into a vacuum chamber of an arc ion plating device, sputtering and cleaning for 10-20min under vacuum and protective atmosphere, and intermittently charging a reaction gas N 2 Alternately depositing Zr layers and ZrN layers on the surface of the matrix;
step S2: preparation of a bonding layer on the surface of a diffusion Barrier
Preparing a bonding layer on the surface of the diffusion barrier layer by using a thermal spraying, arc ion plating, magnetron sputtering or electron beam physical vapor deposition method, and carrying out paint spraying blackening treatment on the surface of the bonding layer;
step S3: laser remelting the blackened adhesive layer
Step S4: preparation of a Pre-oxidized layer on the surface of the bonding layer
Preparation of alpha-Al on the surface of adhesive layer by micro-arc oxidation 2 O 3 A pre-oxidation layer;
step S5: preparation of ceramic surface layer
And preparing a ceramic surface layer on the surface of the pre-oxidized layer by thermal spraying or electron beam physical vapor deposition to finally obtain the thermal barrier coating with long service life.
As a further optimization scheme of the invention, the pretreatment operation of the substrate in the step S1 comprises polishing, ultrasonic cleaning of acetone, dehydration of absolute ethyl alcohol and drying; zr is adopted as a target material and Ar is adopted in arc ion plating equipment 2 Is a working gas, N 2 Is reaction gas, the working pressure is 1-2Pa, and the flow rate of the working gas is 30-50cm in the deposition process 3 ·min -1 The flow rate of the reaction gas is 60-100cm when the ZrN layer is deposited 3 ·min -1 The arc current is 60-100A, the bias voltage is 20-300V, the deposition temperature is 300-350 ℃, the time for depositing the Zr layer is 7.5-30min, and the time for depositing the Zr layer is 30-120min.
As a further optimization scheme of the invention, the laser remelting process parameters in the step S3 are that the laser power is 500-2000W, the spot diameter is 2-5mm, and the laser scanning speed is 300-1000 mm.min -1 And Ar is blown during remelting 2 Protecting the molten pool, ar 2 The flow rate is 5-10 L.min -1 。
As a further optimization scheme of the invention, in the micro-arc oxidation in the step S4, the power source is a pulse direct current power source, and the concentration of the electrolyte is 8-12 g.L -1 Na of (2) 2 SiO 3 The current density is 8-12A dm -2 The frequency is 3000-8000Hz, the duty ratio is 40% -60%, and the time is 5-10min.
The invention has the beneficial effects that:
1) The invention respectively prepares a multi-layer diffusion barrier layer and alpha-Al at two interfaces of a double-layer structure thermal barrier coating matrix/bonding layer and a bonding layer/ceramic surface layer 2 O 3 The pre-oxidized layer can effectively slow down the metal element at the interface of the matrix/bonding layer in the high-temperature service processThe growth speed of the inter-diffusion and bonding layer/ceramic surface layer interface TGO is improved, so that the long-term high temperature resistance of the thermal barrier coating with the double-layer structure is improved, and the service life of the thermal barrier coating is prolonged;
2) The Zr layer/ZrN layer alternate diffusion barrier layer is prepared on the matrix/bonding layer interface of the thermal barrier coating by adopting arc ion plating, so that not only is the Zr layers at two ends of the diffusion barrier layer well combined with the matrix and the bonding layer, but also the ceramic multilayer diffusion barrier layer has better effect of blocking element diffusion;
3) According to the invention, the prepared bonding layer is subjected to laser remelting treatment, and based on low Al density, al floats to the upper part of a molten pool in the laser remelting process, gradient distribution of high Al content and low Al content on the surface is formed in the remelting layer, and meanwhile, a rapid remelting structure with fine grains is formed, so that the formation of a pre-oxidized layer is facilitated;
4) Preoxidized Al prepared by the invention 2 O 3 The ceramic layer has good adhesiveness with the bonding layer, and can effectively slow down the oxidation of the bonding layer and the growth rate of the bonding layer/ceramic surface layer interface TGO;
5) The invention has simple structure, high stability, reasonable design and convenient realization.
Drawings
FIG. 1 is a schematic structural view of a thermal barrier coating of the present invention.
In the figure: 1. a base; 2. a diffusion barrier layer; 3. a bonding layer; 4. a pre-oxidation layer; 5. and a ceramic surface layer.
Detailed Description
The following detailed description of the present application is provided in conjunction with the accompanying drawings, and it is to be understood that the following detailed description is merely illustrative of the application and is not to be construed as limiting the scope of the application, since numerous insubstantial modifications and adaptations of the application will be to those skilled in the art in light of the foregoing disclosure.
Example 1
As shown in FIG. 1, the thermal barrier coating with long service life comprises a bonding layer 3 and a ceramic surface layer 5 which are arranged on the surface of a substrate 1, wherein the bonding layer 3 is made of MCrAlY or PtNiAl material, M in the MCrAlY is Ni or Co element, and the thickness of the M is 50-200 mu M; and a diffusion barrier layer 2 is further arranged between the bonding layer 3 and the substrate 1, the diffusion barrier layer 2 is formed by alternately overlapping Zr layers/ZrN layers, wherein the thickness of the Zr layers is 0.25-1 mu m, the thickness of the ZrN layers is 1-4 mu m, and the surfaces of the diffusion barrier layer 2, which are in contact with the substrate 1 and the bonding layer 3, are all Zr layers.
The ceramic surface layer 5 is ZrO 2 And Y 2 O 3 A mixed powder ceramic facing 5, wherein Y 2 O 3 The ceramic surface layer 5 accounts for 7 mass percent, and the thickness is 50-1000 mu m; the time between the ceramic surface layer 5 and the bonding layer 3 is also provided with a pre-oxidation layer 4, and the pre-oxidation layer 4 is continuous and compact alpha-Al 2 O 3 The thickness of the layer is 5-10 μm.
The preparation method of the thermal barrier coating with long service life comprises the following steps:
step S1: preparing a diffusion barrier layer 2 with alternately overlapped Zr layers/ZrN layers on the surface of the pretreated substrate 1
Putting the pretreated substrate 1 into a vacuum chamber of an arc ion plating device, sputtering and cleaning for 10-20min under vacuum and protective atmosphere, intermittently flushing a reaction gas N2, and alternately depositing a Zr layer and a ZrN layer on the surface of the substrate 1;
step S2: preparation of adhesive layer 3 on surface of diffusion Barrier 2
Preparing a bonding layer 3 on the surface of the diffusion barrier layer 2 by using a thermal spraying, arc ion plating, magnetron sputtering or electron beam physical vapor deposition method, and carrying out paint spraying blackening treatment on the surface;
step S3: the blackened adhesive layer 3 is remelted by laser
Step S4: preparation of Pre-oxidized layer 4 on the surface of bonding layer 3
Preparation of alpha-Al on the surface of the bonding layer 3 by micro-arc oxidation 2 O 3 A pre-oxidation layer 4;
step S5: preparation of ceramic topcoat 5
And preparing a ceramic surface layer 5 on the surface of the pre-oxidized layer 4 by thermal spraying or electron beam physical vapor deposition to finally obtain the thermal barrier coating with long service life.
The pretreatment operation of the substrate 1 in the step S1 is polishing, ultrasonic cleaning with acetone, dehydration with absolute ethyl alcohol, and drying; zr is adopted as a target material and Ar is adopted in arc ion plating equipment 2 Is a working gas, N 2 Is reaction gas, the working pressure is 1-2Pa, and the flow rate of the working gas is 30-50cm in the deposition process 3 ·min -1 The flow rate of the reaction gas is 60-100cm when the ZrN layer is deposited 3 ·min -1 The arc current is 60-100A, the bias voltage is 20-300V, the deposition temperature is 300-350 ℃, the time for depositing the Zr layer is 7.5-30min, and the time for depositing the Zr layer is 30-120min; the laser remelting process parameters in the step S3 are that the laser power is 500-2000W, the diameter of a light spot is 2-5mm, and the scanning speed of the laser is 300-1000 mm.min -1 And Ar is blown during remelting 2 Protecting the molten pool, ar 2 The flow rate is 5-10 L.min -1 The method comprises the steps of carrying out a first treatment on the surface of the In the micro-arc oxidation in the step S4, the power source is a pulse direct current power source, and the concentration of the electrolyte is 8-12 g.L -1 Na of (2) 2 SiO 3 The current density is 8-12A dm -2 The frequency is 3000-8000Hz, the duty ratio is 40% -60%, and the time is 5-10min.
Example 2
The preparation method of the thermal barrier coating with long service life comprises the following steps:
step S1: polishing the nickel-based superalloy K405 substrate 1, ultrasonically cleaning the nickel-based superalloy K405 substrate with acetone, dehydrating the nickel-based superalloy K with absolute ethyl alcohol, and drying the nickel-based superalloy K405 substrate; zr and Ar with purity of 99.99 percent respectively 2 And N 2 As target material, working gas and reaction gas, the pretreated substrate 1 is placed into a vacuum chamber of MIP-8-800 type arc ion plating equipment, and is vacuumized to 6 multiplied by 10 -3 Pa, then charging working gas to vacuum degree of 3Pa, then Ar + Sputtering and cleaning the matrix for 110min, intermittently filling reaction gas, and realizing alternate deposition of the Zr layer/ZrN layer; the deposition process parameters are as follows: working pressure is 2Pa, and working gas flow is 30cm 3 ·min -1 The flow rate of the reaction gas during ZrN deposition is 60cm 3 ·min -1 Arc current 60A, bias voltage 80V, deposition temperature 300 ℃, and deposition time of Zr layer and ZrN layer 15m in sequenceDepositing a single layer of Zr with the thickness of 0.25 mu m and ZrN with the thickness of 1 mu m for 60min to form a Zr/ZrN/Zr diffusion barrier layer 2;
step S2: the surface of the diffusion barrier layer 2 is sprayed with an MCrAlY bonding layer 3 by adopting a 3710 type atmospheric plasma spraying system manufactured by Prazix corporation of America, and the MCrAlY powder is Ni-20Co-18Cr-15Al-2Y according to mass percent 2 O 3 The spray process parameters are shown in table 1 below;
step S3: the adhesive layer 3 is sprayed with paint and blackened, and then is subjected to laser remelting treatment, wherein the laser remelting process parameters are that the laser power is 950W, the spot diameter is 3mm, and the laser scanning speed is 600 mm.min -1 Ar blowing during remelting 2 Protecting the molten pool, oxidizing with an anti-sticking layer 3, ar 2 The flow rate is 10 L.min -1 Based on low Al density, al floats to the upper part of a molten pool in the laser remelting process, gradient distribution of high Al content on the surface and high Al content on the surface is formed in a remelting layer, and a rapid remelting structure with fine grains is formed;
step S4: micro-arc oxidation treatment is carried out on the bonding layer 3 remelted by laser on MA-120A type micro-arc oxidation equipment, a pulse direct current power supply is adopted, and electrolyte sodium silicate (Na 2 SiO 3 ) The concentration is 8 g.L -1 The current density was 8A.dm -2 The frequency is 3000Hz, the duty ratio is 40%, the time is 5min, and the generated continuous compact alpha-Al is controlled 2 O 3 The thickness of the pre-oxidized layer 4 is about 5 μm;
step S5: zrO was sprayed on the surface of the pre-oxidized layer 4 by using 3710 atmospheric plasma spraying system manufactured by Prach Co., USA 2 -Y 2 O 3 Ceramic surface layer 5, zrO 2 -Y 2 O 3 The powder is ZrO in percentage by mass 2 -7％Y 2 O 3 The spray coating process parameters are shown in Table 1, and finally a thermal barrier coating sample with long service life is obtained.
Table 1: atmospheric plasma spraying MCrAlY process parameters
Process parameters MCrAlY ZrO 2 -7％Y 2 O 3
current/A 710 920
voltage/V 42 42
Main gas, ar/PSI 65 45
Auxiliary gas, he/PSI 115 150
Carrier gas, ar/PSI 45 45
Powder feeding rate/(r.min) -1 ) 2 3
Spray distance/mm 110 100
Spray gun moving speed/(mm.s) -1 ) 100 100
Coating thickness/. Mu.m 100 350
Example 3
The preparation method of the thermal barrier coating with long service life comprises the following steps:
step S1: polishing, ultrasonic cleaning with acetone, dehydrating with absolute ethyl alcohol and drying the surface of a TMS75 substrate 1 of the nickel-based single crystal alloy; zr and Ar with purity of 99.99 percent respectively 2 And N 2 As target material, working gas and reaction gas, the pretreated substrate 1 is placed into a vacuum chamber of MIP-8-800 type arc ion plating equipment, and is vacuumized to 6 multiplied by 10 -3 Pa, then charging working gas to vacuum degree of 3Pa, then Ar + Sputtering and cleaning the matrix for 110min, intermittently filling reaction gas, and realizing alternate deposition of the Zr layer/ZrN layer; the deposition process parameters are as follows: working pressure is 2Pa, working gas flow is 40cm 3 ·min -1 The flow rate of the reaction gas during ZrN deposition is 80cm 3 ·min -1 The arc current is 80A, the bias voltage is 150V, the deposition temperature is 350 ℃, the deposition time of the Zr layer and the ZrN layer is 30min and 120min in sequence, the thickness of a deposited monolayer Zr is 1 mu m, the ZrN is 4 mu m, and the Zr/ZrN/Zr diffusion barrier layer 2 is formed;
step S2: spraying an MCrAlY bonding layer 3 on the surface of the diffusion barrier layer 2 by adopting a ZDP-1700 type vacuum plasma spraying device, wherein MCrAlY powder is Ni-25Cr-5Al-0.5Y by mass percent, vacuumizing before spraying, filling argon, and keeping the pressure in a spraying chamber to be 4 multiplied by 10 3 Pa-5×10 3 Igniting a plasma arc to start spraying at Pa, wherein the spraying process parameters are shown in the table 2;
step S3: the adhesive layer 3 is sprayed with paint and blackened, then is subjected to laser remelting treatment, the laser remelting process parameters are that the laser power is 800W, the spot diameter is 3mm, and the laser is scannedThe speed is 500mm min -1 Ar blowing during remelting 2 Protecting the molten pool, oxidizing with an anti-sticking layer 3, ar 2 The flow rate is 10 L.min -1 Based on low Al density, al floats to the upper part of a molten pool in the laser remelting process, gradient distribution of high Al content on the surface and high Al content on the surface is formed in a remelting layer, and a rapid remelting structure with fine grains is formed;
step S4: micro-arc oxidation treatment is carried out on the bonding layer 3 remelted by laser on MA-120A type micro-arc oxidation equipment, a pulse direct current power supply is adopted, and electrolyte sodium silicate (Na 2 SiO 3 ) The concentration is 8 g.L -1 The current density was 8A.dm -2 The frequency is 3000Hz, the duty ratio is 40%, the time is 5min, and the generated continuous compact alpha-Al is controlled 2 O 3 The thickness of the pre-oxidized layer 4 is about 8 μm;
step S5: zrO preparation on the surface of the pre-oxidized layer 4 by using a multifunctional electron beam physical vapor deposition device model number UE-204 manufactured by International technical center of electron beam of Ukraton welding institute 2 -Y 2 O 3 A ceramic surface layer 5 having a thickness of 100 μm, zrO 2 -Y 2 O 3 The powder is ZrO in percentage by mass 2 -7％Y 2 O 3 And finally obtaining the thermal barrier coating sample with long service life under the deposition conditions that the accelerating voltage of the electron beam is 20kV, the current of the electron beam is 2A, the current of the heating matrix 1 is 0.1A and the pressure of the vacuum chamber is 10 < -3 > Pa.
Table 2: vacuum plasma spraying MCrAlY technological parameter
Plasma power/kW 48
current/A 650
Spray booth pressure/Pa 8×10 3
Argon flow/(L.min-1) 65
Hydrogen flow/(L.min-1) 115
Powder feeding rate/(g.min-1) 50
Spray distance/mm 300
Coating thickness/. Mu.m 100
Example 4
The preparation method of the thermal barrier coating with long service life comprises the following steps:
step S1: polishing the nickel-based superalloy K405 substrate 1, ultrasonically cleaning the nickel-based superalloy K405 substrate with acetone, dehydrating the nickel-based superalloy K with absolute ethyl alcohol, and drying the nickel-based superalloy K405 substrate; zr and Ar with purity of 99.99 percent respectively 2 And N 2 As target material, working gas and reaction gas, the pretreated substrate 1 is placed into a vacuum chamber of MIP-8-800 type arc ion plating equipment, and is vacuumized to 6 multiplied by 10 -3 Pa, then charging working gas to vacuum degree of 3Pa, then Ar + Sputtering and cleaning the matrix for 110min, intermittently filling reaction gas, and realizing alternate deposition of the Zr layer/ZrN layer; the deposition process parameters are as follows: working pressure is 1Pa, working gas flow is 50cm 3 ·min -1 The flow rate of the reaction gas is 100cm when ZrN is deposited 3 ·min -1 Arc current 100A, bias voltage 300V, deposition temperature 350 ℃, and deposition time of Zr layer and ZrN layer in sequence30min and 120min, depositing a single layer with Zr thickness of 0.5 μm and ZrN of 2 μm to form a Zr/ZrN/Zr diffusion barrier layer 2;
step S2: the surface of the diffusion barrier layer 2 is sprayed with an MCrAlY bonding layer 3 by adopting a 3710 type atmospheric plasma spraying system manufactured by Prazix corporation of America, and the MCrAlY powder is Ni-20Co-18Cr-15Al-2Y according to mass percent 2 O 3 The spray process parameters are shown in table 1 below;
step S3: the adhesive layer 3 is sprayed with paint and blackened, and then is subjected to laser remelting treatment, wherein the laser remelting process parameters are that the laser power is 950W, the spot diameter is 3mm, and the laser scanning speed is 600 mm.min -1 Ar blowing during remelting 2 Protecting the molten pool, oxidizing with an anti-sticking layer 3, ar 2 The flow rate is 10 L.min -1 Based on low Al density, al floats to the upper part of a molten pool in the laser remelting process, gradient distribution of high Al content on the surface and high Al content on the surface is formed in a remelting layer, and a rapid remelting structure with fine grains is formed;
step S4: micro-arc oxidation treatment is carried out on the bonding layer 3 remelted by laser on MA-120A type micro-arc oxidation equipment, a pulse direct current power supply is adopted, and electrolyte sodium silicate (Na 2 SiO 3 ) The concentration is 8 g.L -1 The current density was 8A.dm -2 The frequency is 3000Hz, the duty ratio is 40%, the time is 5min, and the generated continuous compact alpha-Al is controlled 2 O 3 The thickness of the pre-oxidized layer 4 is about 5 μm;
step S5: zrO was sprayed on the surface of the pre-oxidized layer 4 by using 3710 atmospheric plasma spraying system manufactured by Prach Co., USA 2 -Y 2 O 3 Ceramic surface layer 5, zrO 2 -Y 2 O 3 The powder is ZrO in percentage by mass 2 -7％Y 2 O 3 The spray process parameters were the same as in table 1, finally obtaining a thermal barrier coating sample with long life.
Comparative example 1
A thermal expansion coating, the preparation method of which comprises the following steps:
step S1: polishing, ultrasonic cleaning with acetone, dehydrating with absolute ethyl alcohol and drying the surface of a TMS75 substrate 1 of the nickel-based single crystal alloy;
step S2: spraying an MCrAlY bonding layer 3 on the surface of a substrate by adopting a ZDP-1700 type vacuum plasma spraying device, wherein MCrAlY powder is Ni-25Cr-5Al-0.5Y by mass percent, vacuumizing before spraying, filling argon, and keeping the pressure in a spraying chamber to be 4 multiplied by 10 3 Pa-5×10 3 Igniting a plasma arc to start spraying when Pa;
step S3: zrO preparation on the surface of the bonding layer by using multifunctional electron beam physical vapor deposition equipment with model number of UE-204 manufactured by International technical center of electron beam of Ukrabbe institute of welding 2 -Y 2 O 3 Ceramic surface layer 5, zrO 2 -Y 2 O 3 The powder is ZrO in percentage by mass 2 -7％Y 2 O 3 And finally obtaining the thermal barrier coating sample under the deposition conditions that the accelerating voltage of the electron beam is 20kV, the current of the electron beam is 2A, the current of the heating matrix 1 is 0.1A and the pressure of the vacuum chamber is 10 < -3 > Pa.
After the thermal barrier coatings obtained in example 3 and comparative example 1 were oxidized at 1150 ℃ for 100h, the cross sections of the thermal barrier coatings of example and comparative example were taken, and it was found by observation that, compared with the thermal barrier coatings of comparative example, the thermal expansion coating obtained in example 3 was subjected to high temperature oxidation, the interface between the pre-oxidized layer 4 and the bonding layer 3 and the ceramic surface layer 5 was clear, uniform and flat, the growth of Thermally Grown Oxide (TGO) was slow, and in addition, the interdiffusion of the elements of the bonding layer 3 and the substrate 1 was effectively blocked by the diffusion barrier layer 2, and no obvious diffusion region was formed between the bonding layer 3 and the substrate 1.
The foregoing examples illustrate only a few embodiments of the invention and are described in detail herein without thereby limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention.

Claims (4)

1. The preparation method of the thermal barrier coating with long service life comprises a bonding layer (3) and a ceramic surface layer (5) which are arranged on the surface of a substrate (1), and is characterized in that: a diffusion barrier layer (2) is further arranged between the bonding layer (3) and the substrate (1), and a pre-oxidation layer (4) is further arranged between the ceramic surface layer (5) and the bonding layer (3);
the diffusion barrier layers (2) are alternately overlapped Zr layers/ZrN layers, the surfaces of the diffusion barrier layers (2) contacted with the substrate (1) and the bonding layers (3) are Zr layers, the thickness of the Zr layers is 1 mu m, and the thickness of the ZrN layers is 4 mu m;
the pre-oxidized layer (4) is a continuous and compact alpha-Al 2O3 layer, and the thickness of the alpha-Al 2O3 layer is 8 mu m;
the substrate (1) is nickel-based single crystal alloy TMS75;
the bonding layer (3) is prepared from MCrAlY material, M in the MCrAlY is Ni element, and the thickness of the bonding layer is 100 mu M;
the ceramic surface layer (5) is a ZrO2 and Y2O3 mixed powder ceramic surface layer (5), wherein the Y2O3 accounts for 7% of the mass of the ceramic surface layer, and the thickness of the ceramic surface layer (5) is 100 mu m;
the preparation method of the thermal barrier coating comprises the following steps:
step S1: preparing a diffusion barrier layer (2) with alternately overlapped Zr layers/ZrN layers on the surface of the pretreated substrate (1);
putting the pretreated substrate (1) into a vacuum chamber of arc ion plating equipment, sputtering and cleaning for 110min under vacuum and protective atmosphere, intermittently filling a reaction gas N2, and alternately depositing Zr layers and ZrN layers on the surface of the substrate (1);
step S2: preparing a bonding layer (3) on the surface of the diffusion barrier layer (2)
Preparing a bonding layer (3) on the surface of the diffusion barrier layer (2) by using a thermal spraying, arc ion plating, magnetron sputtering or electron beam physical vapor deposition method, and carrying out paint spraying and blackening treatment on the surface of the bonding layer;
step S3: laser remelting the blackened adhesive layer (3)
Step S4: preparing a pre-oxidized layer (4) on the surface of the bonding layer (3)
Preparing an alpha-Al 2O3 pre-oxidized layer (4) on the surface of the bonding layer (3) by a micro-arc oxidation method;
step S5: preparation of ceramic surface layer (5)
And preparing a ceramic surface layer (5) on the surface of the pre-oxidized layer (4) by thermal spraying or electron beam physical vapor deposition method, and finally obtaining the thermal barrier coating with long service life.
2. The method for preparing the long-life thermal barrier coating according to claim 1, wherein the method comprises the following steps: the pretreatment operation of the substrate (1) in the step S1 comprises polishing, acetone ultrasonic cleaning, absolute ethyl alcohol dehydration and drying; in the arc ion plating equipment, zr is adopted as a target, ar2 is adopted as working gas, N2 is adopted as reaction gas, in the deposition process, the working pressure is 1-2Pa, the working gas flow is 30-50cm < 3 >. Min < -1 >, the reaction gas flow is 60-100cm < 3 >. Min < -1 >, the arc current is 60-100A, the bias voltage is 20-300V, the deposition temperature is 300-350 ℃, the time for depositing the Zr layer is 7.5-30min, and the time for depositing the Zr layer is 30-120min.
3. The method for preparing the long-life thermal barrier coating according to claim 1, wherein the method comprises the following steps: in the step S3, the laser remelting process parameters are that the laser power is 500-2000W, the diameter of a light spot is 2-5mm, the laser scanning speed is 300-1000mm & min-1, ar2 is blown to protect a molten pool during remelting, and the Ar2 flow is 5-10L & min-1.
4. The method for preparing the long-life thermal barrier coating according to claim 1, wherein the method comprises the following steps: in the micro-arc oxidation in the step S4, the power supply is a pulse direct current power supply, the electrolyte is Na2SiO3 with the concentration of 8-12 g.L < -1 >, the current density is 8-12 A.dm < -2 >, the frequency is 3000-8000Hz, the duty ratio is 40% -60%, and the time is 5-10min.
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