CN110400767B - Substrate cleaning device - Google Patents
Substrate cleaning device Download PDFInfo
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- CN110400767B CN110400767B CN201910703138.0A CN201910703138A CN110400767B CN 110400767 B CN110400767 B CN 110400767B CN 201910703138 A CN201910703138 A CN 201910703138A CN 110400767 B CN110400767 B CN 110400767B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- Condensed Matter Physics & Semiconductors (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention provides a substrate cleaning device. The substrate cleaning device comprises a first filter, a second filter, a water discharge pipeline and a plurality of protection valves; the drainage pipeline comprises a main pipe, a water outlet pipe and a plurality of water inlet pipes; the first filter comprises a first water inlet, a first water outlet and at least one first water discharge port, and the second filter comprises a second water inlet, a second water outlet and at least one second water discharge port; the main pipe is provided with a water outlet hole and a plurality of water inlet holes; the first water inlet is connected with cleaning water, the first water outlet is connected with the second water inlet, and each first water drainage port is connected to the corresponding water inlet hole through a water inlet pipe; the second water outlets output the filtered cleaning water, and each second water outlet is connected to the corresponding water inlet hole through a water inlet pipe; one end of the water outlet pipe is connected with the water outlet hole, and the other end of the water outlet pipe discharges waste water; a protection valve is arranged on each water inlet pipe, and the cleaning water can be guaranteed to be effectively filtered by arranging the protection valve on the water inlet pipe.
Description
Technical Field
The invention relates to the technical field of display, in particular to a substrate cleaning device.
Background
In the field of Display technology, flat panel displays such as Liquid Crystal Displays (LCDs) and Organic Light Emitting Diodes (OLEDs) have gradually replaced CRT displays, and are widely used in LCD tvs, mobile phones, personal digital assistants, digital cameras, computer screens, notebook computer screens, and the like.
The display panel is an important component of the LCD and the OLED. A display panel, whether an LCD or an OLED, generally has a Thin Film Transistor (TFT) substrate. Taking a display panel of an LCD as an example, the display panel mainly includes a TFT substrate, a Color Filter (CF) substrate, a liquid crystal layer disposed between the two substrates, and a Sealant, and the forming process generally includes: front Array (Array) process (thin film, yellow light, etching and stripping), middle Cell (TFT substrate and CF substrate) process and back module assembly process (driver IC and printed circuit board lamination). Wherein, the front-stage Array process mainly forms a TFT substrate to control the movement of liquid crystal molecules; the middle Cell process is mainly to add liquid crystal between the TFT substrate and the CF substrate; the back module assembly process mainly drives the integration of IC pressing and printed circuit board, and further drives the liquid crystal molecules to rotate and display images.
In the flat panel display process, cleaning, dehydration drying, coating, pre-baking, exposure, development and post-baking are the main process units of the yellow light process, wherein the cleaning unit is used for removing dust particles (particles) on a glass substrate, the dehydration drying unit is used for removing moisture on the substrate and increasing the hydrophobicity of the surface, the coating unit is used for coating a layer of photoresist on the substrate, the pre-baking unit (which is usually used at a temperature of 90-130 ℃) is used for removing a solvent in the photoresist and increasing the adhesion between the photoresist and the substrate, the exposure unit is used for defining a pattern on the substrate by using a photomask (MASK), the development unit is used for leaving a specific pattern on the substrate to display the pattern, and the post-baking unit is used for further curing the patterned photoresist on the glass substrate.
In the prior art, an ultrahigh Pressure fine particle spray Cleaning Filter section (HPMJ Filter House) in a Chemical Vapor Deposition (CVD) pre-Cleaning device includes two filters, each having a water outlet, the water outlets of the two filters are connected to a water discharge pipeline, only a final water discharge end in the existing water discharge pipeline is provided with a water discharge main valve, and the water outlet of the Filter has no valve, when the machine station works, the cleaning water flows out from the water outlet of one filter, flows into the water outlet of the other filter and flows out from the water outlet of the other filter at a certain probability, further, the washing water is directly used for washing without being filtered, and the unfiltered water is directly used for washing and brings impurities (particles) into the substrate, thereby reducing the yield of the product.
Disclosure of Invention
The invention aims to provide a substrate cleaning device which can ensure that cleaning water is effectively filtered, the cleaning effect is improved, and the product yield is ensured.
In order to achieve the above objects, the present invention provides a substrate cleaning apparatus, comprising a first filter, a second filter, a drain pipe and a plurality of protection valves;
the drainage pipeline comprises a main pipe, a water outlet pipe and a plurality of water inlet pipes; the first filter comprises a first water inlet, a first water outlet and at least one first water discharge port, and the second filter comprises a second water inlet, a second water outlet and at least one second water discharge port; the main pipe is provided with a water outlet hole and a plurality of water inlet holes;
the first water inlet is connected with cleaning water, the first water outlet is connected with the second water inlet, and each first water drainage port is connected to the corresponding water inlet hole through a water inlet pipe;
the second water outlets output the filtered cleaning water, and each second water outlet is connected to the corresponding water inlet hole through a water inlet pipe;
one end of the water outlet pipe is connected with the water outlet hole, and the other end of the water outlet pipe discharges waste water;
each water inlet pipe is provided with a protection valve.
The substrate cleaning device also comprises a water outlet valve arranged on the water outlet pipe.
The first filter comprises a first cavity and a first filter element arranged in the first cavity, and the first filter element divides the first cavity into a first space and a second space;
the second filter comprises a second cavity and a second filter element arranged in the second cavity, and the second cavity is divided into a third space and a fourth space by the second filter element;
the first water inlet and the first water outlet are respectively communicated with the first space and the second space, and the second water inlet and the second water outlet are respectively communicated with the third space and the fourth space.
The first strainer includes two first drain openings and the second strainer includes two second drain openings;
the two first drainage ports are respectively communicated with the first space and the second space;
the two second water outlets are respectively communicated with the third space and the fourth space.
The plurality of protection valves are all manual valves.
The plurality of protection valves are all electrically operated valves.
The substrate cleaning device further comprises a valve control module electrically connected with the plurality of protection valves, and the valve control module is used for controlling the plurality of protection valves to be opened or closed simultaneously.
The substrate cleaning device also comprises an auxiliary drainage pipeline, wherein the auxiliary drainage pipeline comprises an auxiliary main pipe and two second auxiliary branch pipes, namely a first auxiliary branch pipe and a second auxiliary branch pipe;
the auxiliary main pipe is provided with a first connecting hole and two second connecting holes;
the first filter also comprises a first auxiliary connecting port, and the second filter also comprises a second auxiliary connecting port;
the first auxiliary connecting port is connected to a second connecting hole through a second auxiliary support;
the second auxiliary connecting port is connected to another second connecting hole through another second auxiliary branch pipe;
one end of the first auxiliary branch pipe is connected with the first connecting hole, and the other end of the first auxiliary branch pipe is connected with the auxiliary drainage gas;
each second auxiliary branch pipe is provided with a protection valve.
The substrate cleaning device further comprises an air inlet valve arranged on the first auxiliary branch pipe.
The substrate cleaning device also comprises a spraying mechanism which is connected with the second water outlet so as to receive the filtered cleaning water to spray the substrate to be cleaned.
The invention has the beneficial effects that: the invention provides a substrate cleaning device, which comprises a first filter, a second filter, a water discharge pipeline and a plurality of protection valves, wherein the first filter is connected with the second filter; the drainage pipeline comprises a main pipe, a water outlet pipe and a plurality of water inlet pipes; the first filter comprises a first water inlet, a first water outlet and at least one first water discharge port, and the second filter comprises a second water inlet, a second water outlet and at least one second water discharge port; the main pipe is provided with a water outlet hole and a plurality of water inlet holes; the first water inlet is connected with cleaning water, the first water outlet is connected with the second water inlet, and each first water drainage port is connected to the corresponding water inlet hole through a water inlet pipe; the second water outlets output the filtered cleaning water, and each second water outlet is connected to the corresponding water inlet hole through a water inlet pipe; one end of the water outlet pipe is connected with the water outlet hole, and the other end of the water outlet pipe discharges waste water; all be equipped with a protection valve on each oral siphon, through set up the protection valve on the oral siphon, can guarantee that washing water obtains effective filtration, promote the cleaning performance, guarantee the product yield.
Drawings
For a better understanding of the nature and technical aspects of the present invention, reference should be made to the following detailed description of the invention, taken in conjunction with the accompanying drawings, which are provided for purposes of illustration and description and are not intended to limit the invention.
In the drawings, there is shown in the drawings,
FIG. 1 is a schematic view of a substrate cleaning apparatus according to a first embodiment of the present invention;
fig. 2 is a schematic view of a substrate cleaning apparatus according to a second embodiment of the present invention.
Detailed Description
To further illustrate the technical means and effects of the present invention, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.
Referring to fig. 1 and 2, the present invention provides a substrate cleaning apparatus, including a first filter 2, a second filter 3, a drain pipe 4 and a plurality of protection valves 5;
the drainage pipeline 4 comprises a main pipe 41, a water outlet pipe 42 and a plurality of water inlet pipes 43; the first filter 2 comprises a first water inlet 21, a first water outlet 22 and at least one first water discharge opening 23, and the second filter 3 comprises a second water inlet 31, a second water outlet 32 and at least one second water discharge opening 33; the main pipe 41 is provided with a water outlet 411 and a plurality of water inlet 412;
the first water inlet 21 is connected with cleaning water, the first water outlet 22 is connected with the second water inlet 31, and each first water drainage port 23 is connected to the corresponding water inlet hole 412 through a water inlet pipe 43;
the second water outlet 32 outputs the filtered washing water, and each second water outlet 33 is connected to the corresponding water inlet hole 412 through a water inlet pipe 43;
one end of the water outlet pipe 42 is connected with the water outlet hole 411, and the other end of the water outlet pipe discharges waste water;
a protective valve 5 is arranged on each water inlet pipe 43.
Specifically, in the preferred embodiment of the present invention, the substrate cleaning apparatus further includes a water outlet valve 91 disposed on the water outlet pipe 42.
Further, the first filter 2 includes a first cavity 201 and a first filter element 202 disposed in the first cavity 201, and the first filter element 202 divides the first cavity 201 into a first space 401 and a second space 402; the second filter 3 comprises a second cavity 301 and a second filter element 302 arranged in the second cavity 301, and the second filter element 302 divides the second cavity 301 into a third space 403 and a fourth space 404; the first water inlet 21 and the first water outlet 22 are respectively communicated with the first space 401 and the second space 402, and the second water inlet 31 and the second water outlet 32 are respectively communicated with the third space 403 and the fourth space 404.
In particular, the first strainer 2 comprises two first drain openings 23, the second strainer 3 comprises two second drain openings 33; the two first drain ports 23 are respectively communicated with the first space 401 and the second space 402; the two second water discharge ports 33 communicate with the third space 403 and the fourth space 404, respectively.
Further, the substrate cleaning device further comprises a spraying mechanism 1, and the spraying mechanism 1 is connected with the water outlet 52 of the second filter 3 to receive the filtered cleaning water to spray the substrate to be cleaned.
Specifically, the substrate cleaning device further comprises an auxiliary drain pipeline 7, wherein the auxiliary drain pipeline 7 comprises an auxiliary main pipe 71, a first auxiliary branch pipe 72 and two second auxiliary branch pipes 73; the auxiliary main pipe 71 is provided with a first connecting hole 711 and two second connecting holes 712; the first filter 2 further comprises a first auxiliary connection port 24, and the second filter 3 further comprises a second auxiliary connection port 34; the first auxiliary connection port 24 is connected to a second connection hole 712 through a second auxiliary branch pipe 73; the second auxiliary connection port 34 is connected to another second connection hole 712 through another second auxiliary branch pipe 73; one end of the first auxiliary branch pipe 72 is connected to the first connection hole 711, and the other end is connected to the drainage auxiliary gas; a protection valve 5 is provided in each second auxiliary branch 73.
Further, the substrate cleaning apparatus further includes an intake valve 92 provided in the first auxiliary branch pipe 72.
The substrate cleaning apparatus of the present invention includes: when the substrate cleaning device works normally, each protection valve 5, the water outlet valve 91 and the air inlet valve 92 are closed, the water discharge pipeline 4 and the auxiliary water discharge pipeline 7 are in a closed state, cleaning water enters the first space 401 from the first water inlet 21, then enters the second space 402 through the first filter element 202, then flows out from the first water outlet 22, enters the second water inlet 31, enters the third space 403, then enters the fourth space 404 through the second filter element 302, then is output to the spraying mechanism 1 from the second water outlet 32, the spraying mechanism 1 sprays the cleaning water secondarily filtered by the first filter 2 and the second filter 3 onto the substrate to clean the substrate, at the moment, because each protection valve 5, the water outlet valve 91 and the air inlet valve 92 are closed, the cleaning water can only be output to the spraying mechanism 1 after sequentially passing through the first filter 2 and the second filter 3, and can't export to spraying mechanism 1 through drainage pipe 4 or auxiliary drainage pipe 7 to guaranteed that washing water obtains effectual filtration, promoted the cleaning performance, guaranteed the product yield.
Preferably, the spraying mechanism 1 of the present invention includes a water pump (not shown) and a spraying pipeline (not shown) connected to the water pump, and the filtered cleaning water firstly enters the water pump of the spraying mechanism 1, then is output to the spraying pipeline by the water pump, and finally is sprayed onto the substrate by the spraying pipeline, so as to complete the cleaning of the substrate.
Further, the maintenance process of the substrate cleaning apparatus of the present invention includes: when the first filter 2 and the second filter 3 need to be maintained (for example, filter element replacement), each of the protection valve 5, the water outlet valve 91, and the air inlet valve 92 is opened, the water discharge pipeline 4 and the auxiliary water discharge pipeline 7 are both in an open state, the water discharge auxiliary gas is input into the first filter 2 and the second filter 3 from the auxiliary water discharge pipeline 7, the waste water remaining in the first filter 2 and the second filter 3 is forced to be discharged from the water discharge pipeline 4, after the waste water is completely discharged, the maintenance personnel performs maintenance operation on the first filter 2 and the second filter 3, and after the maintenance is completed, each of the protection valve 5, the water outlet valve 91, and the air inlet valve 92 is closed, so that the substrate cleaning apparatus enters a normal operation state again.
Preferably, as shown in fig. 1, in the first embodiment of the present invention, the plurality of protection valves 5 are all manual valves, and are manually opened by a worker during operation.
Preferably, as shown in fig. 2, the plurality of protection valves 5 are all electrically operated valves, and at this time, the substrate cleaning apparatus further includes a valve control module 6 electrically connected to the plurality of protection valves 5, where the valve control module 6 is configured to control the plurality of protection valves 5 to be opened or closed simultaneously, and control the plurality of protection valves 5 to be opened or closed simultaneously through the valve control module 6, so as to simplify the opening and closing operations of the protection valves 5 and improve the maintenance efficiency, and further, in some embodiments of the present invention, the water outlet valve 91 and the air inlet valve 92 are also electrically operated valves, and the valve control module 6 is further electrically connected to the water outlet valve 91 and the air inlet valve 92, and is capable of controlling the water outlet valve 91 and the air inlet valve 92 to be opened or closed simultaneously with the protection valves 5.
In summary, the present invention provides a substrate cleaning apparatus, which includes a first filter, a second filter, a drain pipe and a plurality of protection valves; the drainage pipeline comprises a main pipe, a water outlet pipe and a plurality of water inlet pipes; the first filter comprises a first water inlet, a first water outlet and at least one first water discharge port, and the second filter comprises a second water inlet, a second water outlet and at least one second water discharge port; the main pipe is provided with a water outlet hole and a plurality of water inlet holes; the first water inlet is connected with cleaning water, the first water outlet is connected with the second water inlet, and each first water drainage port is connected to the corresponding water inlet hole through a water inlet pipe; the second water outlets output the filtered cleaning water, and each second water outlet is connected to the corresponding water inlet hole through a water inlet pipe; one end of the water outlet pipe is connected with the water outlet hole, and the other end of the water outlet pipe discharges waste water; all be equipped with a protection valve on each oral siphon, through set up the protection valve on the oral siphon, can guarantee that washing water obtains effective filtration, promote the cleaning performance, guarantee the product yield.
As described above, it will be apparent to those skilled in the art that other various changes and modifications may be made based on the technical solution and concept of the present invention, and all such changes and modifications are intended to fall within the scope of the appended claims.
Claims (9)
1. A substrate cleaning apparatus, comprising a first filter (2), a second filter (3), a drain pipe (4) and a plurality of protection valves (5);
the drainage pipeline (4) comprises a main pipe (41), a water outlet pipe (42) and a plurality of water inlet pipes (43); the first filter (2) comprises a first water inlet (21), a first water outlet (22) and at least one first water discharge opening (23), and the second filter (3) comprises a second water inlet (31), a second water outlet (32) and at least one second water discharge opening (33); the main pipe (41) is provided with a water outlet hole (411) and a plurality of water inlet holes (412);
the first water inlet (21) is connected with cleaning water, the first water outlet (22) is connected with the second water inlet (31), and each first water drainage port (23) is connected to the corresponding water inlet hole (412) through a water inlet pipe (43);
the second water outlets (32) output the filtered cleaning water, and each second water outlet (33) is connected to the corresponding water inlet hole (412) through a water inlet pipe (43);
one end of the water outlet pipe (42) is connected with the water outlet hole (411), and the other end of the water outlet pipe discharges waste water;
each water inlet pipe (43) is provided with a protective valve (5);
the first filter (2) comprises a first cavity (201) and a first filter element (202) arranged in the first cavity (201), and the first filter element (202) divides the first cavity (201) into a first space (401) and a second space (402);
the second filter (3) comprises a second cavity (301) and a second filter element (302) arranged in the second cavity (301), and the second cavity (301) is divided into a third space (403) and a fourth space (404) by the second filter element (302);
the first water inlet (21) and the first water outlet (22) are respectively communicated with the first space (401) and the second space (402), and the second water inlet (31) and the second water outlet (32) are respectively communicated with the third space (403) and the fourth space (404).
2. The substrate cleaning apparatus according to claim 1, further comprising an outlet valve (91) provided on the outlet pipe (42).
3. The substrate cleaning apparatus according to claim 1, wherein the first filter (2) includes two first drain ports (23), and the second filter (3) includes two second drain ports (33);
the two first drainage ports (23) are respectively communicated with the first space (401) and the second space (402);
the two second water discharge ports (33) communicate with the third space (403) and the fourth space (404), respectively.
4. The substrate cleaning apparatus according to claim 1, wherein each of the plurality of protection valves (5) is a manual valve.
5. The substrate cleaning apparatus according to claim 1, wherein the plurality of protection valves (5) are all electrically operated valves.
6. The apparatus for cleaning a substrate according to claim 5, further comprising a valve control module (6) electrically connected to the plurality of protection valves (5), wherein the valve control module (6) is configured to control the plurality of protection valves (5) to be opened simultaneously or closed simultaneously.
7. The substrate cleaning apparatus according to claim 1, further comprising an auxiliary drain line (7), wherein the auxiliary drain line (7) comprises an auxiliary main pipe (71), a first auxiliary branch pipe (72), two second auxiliary branch pipes (73);
the auxiliary main pipe (71) is provided with a first connecting hole (711) and two second connecting holes (712);
the first filter (2) further comprises a first auxiliary connection port (24), and the second filter (3) further comprises a second auxiliary connection port (34);
the first auxiliary connecting port (24) is connected to a second connecting hole (712) through a second auxiliary branch pipe (73);
the second auxiliary connecting port (34) is connected to another second connecting hole (712) through another second auxiliary branch pipe (73);
one end of the first auxiliary branch pipe (72) is connected with the first connecting hole (711), and the other end of the first auxiliary branch pipe is connected with the auxiliary drainage gas;
each second auxiliary branch pipe (73) is provided with a protection valve (5).
8. The substrate cleaning apparatus according to claim 7, further comprising an intake valve (92) provided in the first auxiliary branch pipe (72).
9. The substrate cleaning apparatus according to claim 1, further comprising a spray mechanism (1), wherein the spray mechanism (1) is connected to the second water outlet (32) to receive the filtered cleaning water to spray the substrate to be cleaned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910703138.0A CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910703138.0A CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
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| CN110400767A CN110400767A (en) | 2019-11-01 |
| CN110400767B true CN110400767B (en) | 2021-07-23 |
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| CN201910703138.0A Active CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107530590A (en) * | 2015-03-17 | 2018-01-02 | 唐纳森公司 | Water bag hydrocarbon cleaning system |
| CN207108569U (en) * | 2017-06-30 | 2018-03-16 | 淮安富扬电子材料有限公司 | A kind of reverse osmosis membrane waste waster processor |
| CN207941399U (en) * | 2018-01-30 | 2018-10-09 | 山西清泽环境科技有限公司 | A kind of Integrated Films separating and filtering device |
| US20190105613A1 (en) * | 2017-10-09 | 2019-04-11 | Samsung Electronics Co., Ltd. | Methods of fluorinating filters used in the manufacture of a semiconductor device |
-
2019
- 2019-07-31 CN CN201910703138.0A patent/CN110400767B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107530590A (en) * | 2015-03-17 | 2018-01-02 | 唐纳森公司 | Water bag hydrocarbon cleaning system |
| CN207108569U (en) * | 2017-06-30 | 2018-03-16 | 淮安富扬电子材料有限公司 | A kind of reverse osmosis membrane waste waster processor |
| US20190105613A1 (en) * | 2017-10-09 | 2019-04-11 | Samsung Electronics Co., Ltd. | Methods of fluorinating filters used in the manufacture of a semiconductor device |
| CN207941399U (en) * | 2018-01-30 | 2018-10-09 | 山西清泽环境科技有限公司 | A kind of Integrated Films separating and filtering device |
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