CN110391143A - Semiconductor package and its packaging method - Google Patents
Semiconductor package and its packaging method Download PDFInfo
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- CN110391143A CN110391143A CN201910591921.2A CN201910591921A CN110391143A CN 110391143 A CN110391143 A CN 110391143A CN 201910591921 A CN201910591921 A CN 201910591921A CN 110391143 A CN110391143 A CN 110391143A
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- 238000004806 packaging method and process Methods 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 230000001788 irregular Effects 0.000 claims abstract description 4
- 238000005538 encapsulation Methods 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 5
- 239000000084 colloidal system Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000012856 packing Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 229910000679 solder Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 230000002829 reductive effect Effects 0.000 abstract description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 241000784732 Lycaena phlaeas Species 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005520 electrodynamics Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012945 sealing adhesive Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4885—Wire-like parts or pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4885—Wire-like parts or pins
- H01L21/4889—Connection or disconnection of other leads to or from wire-like parts, e.g. wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/49—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions wire-like arrangements or pins or rods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85986—Specific sequence of steps, e.g. repetition of manufacturing steps, time sequence
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
This application discloses a kind of semiconductor package and its packaging methods.Method for packaging semiconductor includes: offer support plate, has first surface and second surface;Mask layer is formed on one surface of support plate;Metal layer is prepared on one surface of support plate;Remove mask layer;Stationed on the island and pin is formed on one surface of support plate;Chip is arranged on stationed on the island;Disclosed herein as well is a kind of semiconductor packages prepared using the above method.Thickness of detector can be reduced using this method for packaging semiconductor, realize device miniaturization;The preparation for also helping irregular encapsulating structure stationed on the island, realizes the preparation of special structure devices stationed on the island.
Description
Technical field
This application involves semiconductor field more particularly to a kind of method for packaging semiconductor and its structures.
Background technique
Semiconductor devices slimming, lightness and more environmentally friendly manufacturing method are Developing directions.Currently, semiconductor
The size of device and semiconductor packaging are closely related.It realizes that semiconductor devices is lightening, semiconductor packages will be required
Industry develops device to lighter, thinner direction, i.e., proposes the requirement of more Gao Gengxin to semiconductor packaging.
There are many encapsulate pattern, quad flat non-pin package (QFN, Quad Flat No-lead for semiconductor devices
It Package) is one of currently used packaging method.
QFN is a kind of leadless packages, is in square or rectangular, and package bottom central location usually has a large area naked
The pad of dew can be used for thermally conductive, to have realization to be electrically connected around the encapsulation periphery of pad conductive welding disk.Due to inner core
The pin of piece and packaging pin conductive path are short, and routing resistance is very low in electrodynamic capacity and packaging body, so QFN encapsulation can mention
For outstanding electrical property and heat dissipation performance.Meanwhile QFN packaging is small in size, and it is light-weight, it is very suitable to answer Yu Shouji, it is digital
The high-density printed circuit board of the portable compact electronics equipment such as camera.
Conventional QFN (i.e. chip bearing area) stationed on the island and pin figure (i.e. lead electrical connection area), by etching metal
The mode of layer (common copper sheet) is formed.Copper sheet forms the structure with part hollow out (being open) after overetch.To guarantee erosion
Stationed on the island, pin configuration is stable, reliable after quarter, copper sheet need to meet certain thickness, and otherwise stationed on the island, pin figure exists from copper sheet
On the risk that falls off, to influence device performance.In addition, when support plate surface forms stationed on the island, in different units group it is stationed on the island, draw
It needs copper product to connect between leg structure, greatly limits arrangement mode of the stationed on the island, pin configuration on support plate.
Since there are above-mentioned technical problems for QFN encapsulation, so that QFN package dimension is thicker, it is difficult to it is thick that device further be thinned
Degree meets thinner package requirements;Meanwhile QFN encapsulates the arrangement of stationed on the island, pin configuration there are certain limitations, it is difficult to be suitable for
Encapsulating structure with irregular or random pin, that is, be dfficult to apply in the device that pin need to customize;
In addition, QFN technique is relative complex and needs to be easy to cause heavy metal pollution, environmental friendliness using electroplating technology
It is lower, do not meet the development trend for pollution-free industry.
Summary of the invention
The embodiment of the present application provides a kind of semiconductor package and its packaging method, can reduce thickness of detector, into one
Step realizes device miniaturization.
On the one hand, a kind of semiconductor package, including metal layer, chip and lead are provided;Metal layer includes staying
Island and pin configuration;Chip is provided on stationed on the island, pin configuration with lead for being electrically connected.
On the other hand, a kind of method for packaging semiconductor is provided, comprising:
Support plate is provided, there are first surface and second surface;
Setting has patterned mask layer on support plate first surface;
Metal layer is prepared on support plate first surface;
Remove mask layer;
Stationed on the island and pin figure is formed on support plate first surface;
Chip is arranged on stationed on the island;
Lead is set, and lead one end is electrically connected with chip far from the surface of support plate, the other end is electrically connected with pin figure;
Packaging body is set, and packaging body at least partly coats stationed on the island, pin figure, chip and lead
Remove support plate.
According to technical solution provided by the embodiments of the present application, encapsulation body thickness can be further decreased, is prepared smaller
Device, simultaneously, additionally it is possible to according to the actual needs of device customize pin, with meet have different pin out requirements chip seal
Dress.
Other features and advantage will illustrate in the following description, also, partly become from specification
It obtains it is clear that being understood and implementing the application.The purpose of the application and other advantages can be by specifications, right
Specifically noted structure is achieved and obtained in claim and attached drawing.
Detailed description of the invention
Attached drawing is used to provide to further understand technical scheme, and constitutes part of specification, with this
The embodiment of application is used to explain the technical solution of the application together, does not constitute the limitation to technical scheme.
Fig. 1 to Fig. 8 show the structural schematic diagram of one embodiment encapsulating structure making step of the application;
Fig. 9 show the semiconductor package of the embodiment of the present application;
Description of symbols:
100- support plate;
110- first surface;
120- second surface;
200- mask layer;
210- opening;
211 chip bearing regions;
The electric coupling area 212-
300- metal layer;
310- is stationed on the island;
320- pin figure;
400- chip;
500- lead;
600- packaging body;
700- Cutting Road.
Specific embodiment
Below with reference to embodiment and attached drawing to the technical effect of design of the invention, specific system, method and generation into
Row clearly and completely describes, to be completely understood by the purpose of the present invention, feature and effect.Obviously, described embodiment is
A part of the embodiments of the present invention, rather than whole embodiments, based on the embodiment of the present invention, those skilled in the art is not
Other embodiments obtained, belong to the scope of protection of the invention under the premise of making the creative labor.
It should be noted that unless otherwise specified, in embodiment used in the "an" of singular, " described " and
"the" is also intended to including most forms, unless the context clearly indicates other meaning.In addition, unless otherwise defined, this paper institute
All technical and scientific terms used are identical as the normally understood meaning of those skilled in the art.This paper specification
Used in term be intended merely to description specific embodiment, be not intended to be limiting of the invention.Term as used herein
"and/or" includes the arbitrary combination of one or more relevant listed items.
It should be appreciated that be referred to as " being set to " another element when element, it can directly on the other element or
There may also be another elements placed in the middle.When an element is considered as " connection " another element, it, which can be, directly connects
It is connected to another element or may be simultaneously present another element placed in the middle.Term as used herein " vertically ", " level
", "left", "right" and similar statement for illustrative purposes only, be not meant to be the only embodiment.
As shown in Figure 1, providing, there is the encapsulation of first surface 110 and the second surface 120 opposite with first surface 110 to carry
Plate 100, the preferred metal substrate of support plate 100.It, can also be to the one of support plate 100 in order to further decrease the difficulty of removing support plate 100
Surface is surface-treated, and to reduce the affinity of support plate 100, is prepared for subsequent technique;It is preferred that a surface of support plate 100
Carry out oxidation processes, improve support plate 100 and metal/encapsulating material affinity, convenient for it is subsequent by support plate 100 from metal layer
300, it is removed in the contact surface of packaging body 600.
As shown in Fig. 2, mask layer 200 is arranged on support plate 100;Mask layer 200 has the opening of multiple exposed support plates 100
210;Multiple openings 210, which at least have, is used to form chip bearing region 211 and for electric coupling area 212.Mask layer 200 can
Think the screen printing template being placed on support plate 100.Different figures can be arranged in screen printing template according to different encapsulating structures
Shape, to needed for being formed stationed on the island 310 and pin figure 320.
As shown in figure 3, forming metal layer 300 on the support plate 100 for be provided with mask layer 200, partial metal layers 300 are arranged
In opening 210;Metal material can be printed on support plate 100 by metal layer 300 by mode of printing by mask layer 200.
As shown in figure 4, removing mask layer 200, the metal material left forms stationed on the island 310 and pinouts on support plate 100
Shape 320;Between each stationed on the island 310, it is mutually indepedent between each pin figure 320 and between each stationed on the island 310 and each pin, and have
There is an interval of certain distance, i.e., is connected between each stationed on the island 310, each pin figure 320 without excess metal material.Remove mask layer
After 200, it can also be sintered technique, so that figure shapes on support plate 100.
Stationed on the island 310 and pin figure 320 are formed using the above method, only need to guarantee 100 rigidity of support plate and/or thickness i.e.
Can, there is no limit for rigidity and/or thickness to metal layer, therefore the thickness of stationed on the island 310, pin 320 can be made thinner;Due to
Support plate 100 will be stripped after the completion of prepared by integral device, i.e., the thickness of support plate 100 does not influence device integral thickness, therefore, adopts
The thickness of encapsulating structure can be reduced in aforementioned manners.
The above method when 100 surface of support plate prepares stationed on the island 310, pin figure 320, in different units group it is stationed on the island 310,
Between pin figure 320 without excess metal material connect, stationed on the island 310 and pin figure 320 on support plate 100 arrangement limit
System is less, and the pin limitation of corresponding irregular encapsulating structure also can be smaller.
As shown in figure 5, chip 400 is bonded on stationed on the island 310 by binding material;Using bonding wire craft, pass through lead
500 are electrically connected the solder joint of chip 400 with pin figure 320, to realize chip and external electrical connections.
As shown in fig. 6, packing colloid 600 is at least partly covered on support plate 100 by sealing adhesive process, and by chip
400 and bonding wire 500 seal;Packing colloid 600 has also filled up the interval between each stationed on the island 310 and pin figure 320, and stationed on the island 310
It is electrically insulated from each other with pin 320.
As shown in fig. 7, support plate 100 and packed colloid 600 are coated on interior entire packaging part point by stripping technology
From.For affinity processing can be carried out in advance to 100 surface of support plate convenient for removing, reduce damage of the removing to packaging.
As shown in figure 8, cutting packaging body along Cutting Road 700 by cutting technique, each independent QFN packaging part is formed.
Referring to Fig. 9, another embodiment of the application discloses a kind of semiconductor package, including stationed on the island 310 and pinouts
Shape 320, chip 400, lead 500 and packaging body 600.Stationed on the island 310 and pin figure 320 be prepared by metal layer 300,
And it is electrically insulated from each other.Chip 400 is arranged on stationed on the island 310 by binding material.500 both ends of lead respectively with table on chip 400
Face and pin figure 320 are electrically connected.600 coating chip 400 of packaging body, lead 500 and part stationed on the island 310 and pin figure
320, stationed on the island 310 and pin figure 320 far from chip 400 surface exposure.
The above, only presently preferred embodiments of the present invention, the invention is not limited to above embodiment, as long as
It reaches technical effect of the invention with identical means, all within the spirits and principles of the present invention, any modification for being made,
Equivalent replacement, improvement etc., should be included within the scope of the present invention.Its technical solution within the scope of the present invention
And/or embodiment can have a variety of different modifications and variations.
Claims (10)
1. a kind of method for packaging semiconductor: including:
It provides an encapsulating carrier plate (100), encapsulating carrier plate (100) at least surface is provided with peelable metal material and encapsulation
The first surface (110) of material;
It is formed on the first surface (110) patterned mask layer (200), the patterned mask layer (200) has more
The opening (210) of a exposure first surface (110);
A metal layer (300) are formed on the patterned mask layer (200), at least partly described metal layer (300) filling is opened
Mouth (210);
It removes the patterned mask layer (200), forms (310) stationed on the island and pin (320);
Chip (400) are set on (310) stationed on the island;
The lead (500) of connection chip (400) solder joint and the pin (320) is set.
2. method for packaging semiconductor as described in claim 1, it is characterised in that: further include:
Packing colloid 600 is formed, covers the first surface (110) of the support plate (100), covering is arranged in the first surface
(110) (310) stationed on the island, pin (320), chip (400) and lead (500) on.
3. method for packaging semiconductor as described in claim 1, it is characterised in that: further include:
Oxidation processes are carried out to encapsulating carrier plate (100) first surface (110), to reduce surface affinity.
4. method for packaging semiconductor as described in claim 1, it is characterised in that:
The patterned mask layer (200) is the screen printing template being placed on encapsulating carrier plate (100) first surface (110).
5. method for packaging semiconductor as described in claim 1, it is characterised in that:
Between each (310) stationed on the island, between each pin (320), it is mutually indepedent between (310) stationed on the island and pin (320).
6. method for packaging semiconductor as described in claim 1, it is characterised in that:
Each pin (320) array can be irregular arrangement.
7. method for packaging semiconductor as described in claim 1, it is characterised in that:
The removal patterned mask layer (200) further includes to described stationed on the island after forming (310) stationed on the island and pin (320)
(310) and pin (320) is sintered.
8. method for packaging semiconductor as described in claim 1, it is characterised in that:
Using the lead (500) of bonding wire craft connection chip (400) solder joint and the pin (320).
9. a kind of semiconductor package being fabricated using method as described in claim 1.
10. a kind of semiconductor package being fabricated using method as claimed in claim 2.
Priority Applications (1)
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CN201910591921.2A CN110391143A (en) | 2019-07-02 | 2019-07-02 | Semiconductor package and its packaging method |
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CN201910591921.2A CN110391143A (en) | 2019-07-02 | 2019-07-02 | Semiconductor package and its packaging method |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113380638A (en) * | 2021-05-21 | 2021-09-10 | 苏州通富超威半导体有限公司 | Method for setting through hole on packaging body and method for preparing packaging body |
CN113991004A (en) * | 2021-10-26 | 2022-01-28 | 东莞市中麒光电技术有限公司 | LED substrate manufacturing method, LED substrate, LED device manufacturing method and LED device |
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CN107960132A (en) * | 2015-05-04 | 2018-04-24 | 由普莱克斯有限公司 | Leaded carriers with printed and formed package parts and conductive path redistribution structure |
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2019
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CN102460722A (en) * | 2009-06-05 | 2012-05-16 | 株式会社半导体能源研究所 | Photoelectric conversion device and method for manufacturing the same |
CN103403864A (en) * | 2011-02-23 | 2013-11-20 | 德克萨斯仪器股份有限公司 | Semiconductor packages with agglomerate terminals |
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