CN110357085A - A kind of graphene surface plasma modification processing unit and processing method - Google Patents

A kind of graphene surface plasma modification processing unit and processing method Download PDF

Info

Publication number
CN110357085A
CN110357085A CN201910753605.0A CN201910753605A CN110357085A CN 110357085 A CN110357085 A CN 110357085A CN 201910753605 A CN201910753605 A CN 201910753605A CN 110357085 A CN110357085 A CN 110357085A
Authority
CN
China
Prior art keywords
vacuum chamber
glass container
graphene
processing unit
graphene surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910753605.0A
Other languages
Chinese (zh)
Other versions
CN110357085B (en
Inventor
张波
金旭栋
朱理瀚
虞文武
马雯雯
聂俊
刘凯凯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Vocational Institute of Mechatronic Technology
Original Assignee
Changzhou Vocational Institute of Mechatronic Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Vocational Institute of Mechatronic Technology filed Critical Changzhou Vocational Institute of Mechatronic Technology
Priority to CN201910753605.0A priority Critical patent/CN110357085B/en
Publication of CN110357085A publication Critical patent/CN110357085A/en
Application granted granted Critical
Publication of CN110357085B publication Critical patent/CN110357085B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/194After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

The invention proposes a kind of graphene surface plasma modification processing unit and processing methods, belong to graphene surface technical field of modification, more particularly to a kind of graphene surface plasma modification processing unit and processing method.Solve the problems, such as it is existing the method low yield of graphene is managed by ultrasonic wave, heating or air-flow etc., lamella serious, long-time ultrasound of reuniting causes a large amount of faults of construction of graphene, needs to introduce more surfactant or surface active object and the problem of existing method of plasma processing can only act on the superficial layer of graphene accumulation.It include vacuum chamber, glass container, radio-frequency power system, to electrode and rotating mechanism, the vacuum chamber is horizontal type structure, and described is arc-shaped structure to electrode, described to placement circle tube glass container among electrode, the glass container is connected with rotating mechanism and corresponding processing method.It is mainly used for graphene surface modification.

Description

A kind of graphene surface plasma modification processing unit and processing method
Technical field
The invention belongs to graphene surface technical field of modification, more particularly to a kind of graphene surface plasma modification Processing unit and processing method.
Background technique
Plasma technique is usually used in material surface modifying, and graphene is also widely used in each field, has in aqueous solution The graphene of effect dispersion surfactant-free is always the hope that material supply section scholar dreams of, however due to graphene surface Hydrophobicity is difficult to be scattered in water with uniformly dividing, is easy to reunite, therefore also limit the application development of graphene, mainly borrow at present The effect of ultrasonic wave, heating or air-flow is helped to obtain graphene solution, but there is also yields that not high, lamella is reunited for the preparation of these methods Seriously, long-time ultrasound causes a large amount of faults of construction of graphene, needs to introduce more surfactant or surface active object etc. Disadvantage, so that these preparation methods are by very big restriction.There is also the correlations of graphene surface plasma modification to grind at present Study carefully, but take tiling accumulation mode generally for graphene, plasma can only act on the superficial layer of graphene accumulation, the inside Graphene cannot achieve modification, be badly in need of a kind of device for being able to achieve industrialization production and processing method in the market.For The hydrophilic plasma modification device of graphene surface and processing method are improved, is advantageously implemented at the modification of graphene surface Reason and application.
Summary of the invention
The present invention in order to solve the problems in the prior art, proposes a kind of graphene surface plasma modification processing unit And processing method.
To achieve the above object, the invention adopts the following technical scheme: a kind of graphene surface plasma modification is handled Device, it include vacuum chamber, glass container, radio-frequency power system, to electrode and rotating mechanism, the vacuum chamber is horizontal knot Structure offers aeration aperture and aspirating hole on the vacuum chamber, described to be connected to electrode with radio-frequency power system, described to be to electrode Arc-shaped structure, inner arc part are discharge layer, and middle section is insulating layer, and outer arc part is shielded layer, described right Circle tube glass container is placed among electrode, it is described that electrode is fixed in vacuum chamber interior walls by polytetrafluoroethylene (PTFE) block, and with Glass container central coaxial, the glass container are connected with rotating mechanism, and described glass container one end is provided with through-hole.
Further, offer protected type observation window on the vacuum chamber, the vacuum chamber include vacuum chamber body and Vacuum chamber end socket, the vacuum chamber body and vacuum chamber end socket are to be detachably connected.The vacuum chamber is Horizontal rectangular structure, long Degree is 1500mm, width 1200mm, is highly 1000mm.
Further, the glass container includes vessel and vessel head, the vessel and vessel head To be detachably connected.The glass container length is 1000mm, internal diameter 600mm, with a thickness of 5mm.
Further, the aeration aperture is connected with ventilatory control system, and the aspirating hole is connected with pumping control system.
Further, the rotating mechanism includes rotary shaft and active motor, the output end of the active motor and rotation Shaft is connected, and the rotary shaft is connected with glass container.
Further, the maximum power of the radio-frequency power system is 1000W, frequency 13.56MHz.
Further, the discharge layer is 304 stainless steel materials, and the insulating layer is polytetrafluoroethylene (PTFE) material, described Shielded layer is 304 stainless steel materials.
Further, the discharge layer is 50mm with a thickness of 3mm, the thickness of insulating layer, and the shielding thickness is 3mm。
The present invention also provides a kind of graphene surface plasma modification processing method, it the following steps are included:
Step 1: graphene to be processed is packed into glass container, closes vessel head and vacuum chamber end socket, and starting is taken out Gas control system keeps the background vacuum 0.01-1Pa of vacuum chamber;
Step 2: ventilatory control system is opened, mixed gas is filled with into vacuum chamber, maintains the pumping and inflation of vacuum chamber State makes the indoor working vacuum degree of vacuum be kept stable at 10~20Pa, opens radio-frequency power system, makes glow discharge zone beam It is tied in glass container;
Step 3: opening active motor, rotate glass container by transmission of rotary axis, drives and places inside glass container Graphene continuously roll in glow discharge zone, the processing time be 2-5min, electric discharge radio-frequency power be 80-120W;
Step 4: after the completion of processing, radio-frequency power system, ventilatory control system and pumping control system is closed, sky is passed through Gas is to atmospheric pressure, the graphene that takes out that treated.
Further, mixed gas is oxygen and helium in the step 2, and the volume ratio of oxygen and helium is 10: 1-5:1.
Compared with prior art, the beneficial effects of the present invention are: the present invention solve it is existing by ultrasonic wave, heating or gas Stream etc. manages the method low yield of graphene, lamella is reunited, and serious, long-time ultrasound causes a large amount of faults of construction of graphene, needs The problem of introducing more surfactant or surface active object and existing method of plasma processing can only act on graphite The problem of superficial layer of alkene accumulation.The present invention is used to improve the hydrophily of graphene surface, is advantageously implemented graphene surface Modification, the apparatus structure is reasonable, stability is good, easy to operate, and the processing method is modified for pure physical method, processing method Environmental protection, without introducing surfactant or surface active object, processing result is reproducible, high production efficiency.
Detailed description of the invention
Fig. 1 is a kind of graphene surface plasma modification processing device structure diagram of the present invention
Fig. 2 is a kind of graphene surface plasma modification processing unit schematic cross-sectional view of the present invention
Fig. 3 is of the present invention to electrode structure schematic diagram
1- vacuum chamber, 2- glass container, 3- vessel head, 4- vacuum chamber end socket, 5- aeration aperture, 6- aspirating hole, 7- rotation Axis, 8- active motor, 9- radio-frequency power system, 10- is to electrode, 11- through-hole, 12- polytetrafluoroethylene (PTFE) block, 13- discharge layer, 14- Insulating layer, 15- shielded layer
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation illustrates.
Illustrate present embodiment referring to Fig. 1-3, a kind of graphene surface plasma modification processing unit, it includes vacuum Room 1, glass container 2, radio-frequency power system 9, to electrode 10 and rotating mechanism, the vacuum chamber 1 is horizontal type structure, the vacuum Aeration aperture 5 and aspirating hole 6 are offered on room 1, described to be connected to electrode 10 with radio-frequency power system 9, described is circle to electrode 10 Arcuate structure, inner arc part are discharge layer 13, and middle section is insulating layer 14, and outer arc part is shielded layer 15, institute It states to placement circle tube glass container 2 among electrode 10, it is described that vacuum chamber 1 is fixed on by polytetrafluoroethylene (PTFE) block 12 to electrode 10 On inner wall, and with 2 central coaxial of glass container, the glass container 2 is connected with rotating mechanism, and described 2 one end of glass container is set It is equipped with through-hole 11.
The present embodiment vacuum chamber 1 realizes radio-frequency power system 9 to electrode 10 in the case where setting vacuum degree condition, by arc-shaped Glow discharge is strapped in plasma glow discharge region in glass container 2, improves the validity of graphene processing, passes through Rotating mechanism drives glass container 2 to rotate, so that the internal graphene loaded be driven continuously to be rolled, carries out to graphene equal Even surface treatment, through-hole 11 pass through aeration aperture 5 and aspirating hole 6 for realizing the connection between vacuum chamber 1 and glass container 2 Guarantee the vacuum degree of vacuum chamber 1.
Protected type observation window is offered on vacuum chamber 1 described in the present embodiment, the vacuum chamber 1 is including vacuum chamber body and very Empty room end socket 4, the vacuum chamber body and vacuum chamber end socket 4 are to be detachably connected.The vacuum chamber 1 is Horizontal rectangular structure, Length is 1500mm, width 1200mm, is highly 1000mm, and protected type observation window can be used for observing transmission in vacuum chamber 1 And the case where glow discharge, protected type observation window may be provided on vacuum chamber end socket 4, vacuum chamber body and vacuum chamber end socket 4 can The structure of dismantling connection is convenient for the installation inside vacuum chamber 1 and the opening and closing of vacuum chamber;The glass container 2 include vessel and Vessel head 3, the vessel and vessel head 3 are to be detachably connected.2 length of glass container is 1000mm, internal diameter For 600mm, with a thickness of 5mm, vessel and vessel head 3 are the pick-and-place being detachably connected convenient for graphene;The aeration aperture 5 It is connected with ventilatory control system, the aspirating hole 6 is connected with pumping control system, passes through ventilatory control system and pumping control system The vacuum degree of blanket insurance card vacuum chamber 1;The rotating mechanism includes rotary shaft 7 and active motor 8, the output of the active motor 8 End be connected with rotary shaft 7, the rotary shaft 7 is connected with glass container 2, and rotation speed is adjustable, with control realization cylinder rotate with Graphene continuously rolls;The maximum power of the radio-frequency power system 9 be 1000W, frequency 13.56MHz, as needed can be real Glow discharge under existing different capacity;The discharge layer 13 is 304 stainless steel materials, and the insulating layer 14 is polytetrafluoroethylene (PTFE) material Matter, the shielded layer 15 are 304 stainless steel materials, the discharge layer 13 with a thickness of 3mm, the insulating layer 14 with a thickness of 50mm, The shielded layer 15 with a thickness of 3mm, 11 quantity of through-hole be it is multiple, multiple through-holes 11 are uniformly distributed along 2 center of circle direction of glass container.
The present invention also provides a kind of graphene surface plasma modification processing method, it the following steps are included:
Step 1: graphene to be processed is packed into glass container 2, is closed vessel head 3 and vacuum chamber end socket 4, is opened Dynamic pumping control system, keeps the background vacuum 0.01-1Pa of vacuum chamber 1;
Step 2: opening ventilatory control system, and mixed gas is filled with into vacuum chamber 1, maintains the pumping of vacuum chamber 1 and fills Gaseity makes the working vacuum degree in vacuum chamber 1 be kept stable at 10~20Pa, opens radio-frequency power system 9, makes glow discharge Area is strapped in glass container 2;
Step 3: opening active motor 8, rotates glass container 2 by the transmission of rotary shaft 7, drives inside glass container 2 The graphene of placement continuously rolls in glow discharge zone, and the processing time is 2-5min, and electric discharge radio-frequency power is 80-120W;
Step 4: after the completion of processing, radio-frequency power system 9, ventilatory control system and pumping control system is closed, sky is passed through Gas is to atmospheric pressure, the graphene that takes out that treated.
Mixed gas is oxygen and helium in step 2 described in the present embodiment, and the volume ratio of oxygen and helium is 10:1-5: 1。
Above to a kind of graphene surface plasma modification processing unit provided by the present invention and processing method, carry out It is discussed in detail, used herein a specific example illustrates the principle and implementation of the invention, above embodiments Explanation be merely used to help understand method and its core concept of the invention;At the same time, for those skilled in the art, According to the thought of the present invention, there will be changes in the specific implementation manner and application range, in conclusion in this specification Appearance should not be construed as limiting the invention.

Claims (10)

1. a kind of graphene surface plasma modification processing unit, it is characterised in that: it includes vacuum chamber (1), glass container (2), radio-frequency power system (9), to electrode (10) and rotating mechanism, the vacuum chamber (1) is horizontal type structure, the vacuum chamber (1) aeration aperture (5) and aspirating hole (6) are offered on, it is described to be connected to electrode (10) with radio-frequency power system (9), it is described to electricity Pole (10) is arc-shaped structure, and inner arc part is discharge layer (13), and middle section is insulating layer (14), outer arc part It is described to place circle tube glass container (2) among electrode (10) for shielded layer (15), it is described that polytetrafluoro is passed through to electrode (10) Ethylene block (12) is fixed on vacuum chamber (1) inner wall, and with glass container (2) central coaxial, the glass container (2) and rotation Mechanism is connected, and described glass container (2) one end is provided with through-hole (11).
2. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: described true Offer protected type observation window in empty room (1), the vacuum chamber (1) includes vacuum chamber body and vacuum chamber end socket (4), described true Empty room ontology and vacuum chamber end socket (4) are to be detachably connected.The vacuum chamber (1) be Horizontal rectangular structure, length 1500mm, Width is 1200mm, is highly 1000mm.
3. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: the glass Glass container (2) includes vessel and vessel head (3), and the vessel and vessel head (3) are to be detachably connected.It is described Glass container (2) length is 1000mm, internal diameter 600mm, with a thickness of 5mm.
4. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: described to fill Stomata (5) is connected with ventilatory control system, and the aspirating hole (6) is connected with pumping control system.
5. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: the rotation Rotation mechanism includes rotary shaft (7) and active motor (8), and the output end of the active motor (8) is connected with rotary shaft (7), described Rotary shaft (7) is connected with glass container (2).
6. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: described to penetrate The maximum power of frequency power system (9) is 1000W, frequency 13.56MHz.
7. a kind of graphene surface plasma modification processing unit according to claim 1, it is characterised in that: described to put Electric layer (13) is 304 stainless steel materials, and the insulating layer (14) is polytetrafluoroethylene (PTFE) material, and the shielded layer (15) is not 304 not Rust steel material.
8. a kind of graphene surface plasma modification processing unit according to claim 7, it is characterised in that: described to put Electric layer (13) is with a thickness of 3mm, and the insulating layer (14) is with a thickness of 50mm, and the shielded layer (15) is with a thickness of 3mm.
9. a kind of processing method of graphene surface plasma modification processing unit as described in claim 1, feature exist In: it the following steps are included:
Step 1: graphene to be processed is packed into glass container (2), closes vessel head (3) and vacuum chamber end socket (4), Starting pumping control system, keeps the background vacuum 0.01-1Pa of vacuum chamber (1);
Step 2: opening ventilatory control system, and mixed gas is filled with into vacuum chamber (1), maintains the pumping of vacuum chamber (1) and fills Gaseity makes the working vacuum degree in vacuum chamber (1) be kept stable at 10~20Pa, opens radio-frequency power system (9), makes aura Region of discharge is strapped in glass container (2);
Step 3: opening active motor (8), rotates glass container (2) by rotary shaft (7) transmission, drives glass container (2) The graphene that inside is placed continuously rolls in glow discharge zone, and the processing time is 2-5min, and electric discharge radio-frequency power is 80-120W;
Step 4: after the completion of processing, radio-frequency power system (9), ventilatory control system and pumping control system is closed, air is passed through To atmospheric pressure, the graphene that takes out that treated.
10. a kind of graphene surface plasma modification processing method according to claim 9, it is characterised in that: described Mixed gas is oxygen and helium in step 2, and the volume ratio of oxygen and helium is 10:1-5:1.
CN201910753605.0A 2019-08-15 2019-08-15 Graphene surface plasma modification treatment device and treatment method Active CN110357085B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910753605.0A CN110357085B (en) 2019-08-15 2019-08-15 Graphene surface plasma modification treatment device and treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910753605.0A CN110357085B (en) 2019-08-15 2019-08-15 Graphene surface plasma modification treatment device and treatment method

Publications (2)

Publication Number Publication Date
CN110357085A true CN110357085A (en) 2019-10-22
CN110357085B CN110357085B (en) 2020-04-24

Family

ID=68223850

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910753605.0A Active CN110357085B (en) 2019-08-15 2019-08-15 Graphene surface plasma modification treatment device and treatment method

Country Status (1)

Country Link
CN (1) CN110357085B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111430724A (en) * 2020-05-16 2020-07-17 武汉理工大学 Current collector, preparation method thereof and soft package lithium ion battery
CN112724710A (en) * 2021-01-15 2021-04-30 贵州玖碳科技有限公司 Plasma graphene powder surface modification process
CN115069168A (en) * 2022-06-14 2022-09-20 西安交通大学 Plasma-based carbon nanotube material fluorination device and use method thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140272108A1 (en) * 2013-03-15 2014-09-18 Plasmability, Llc Toroidal Plasma Processing Apparatus
CN104671237A (en) * 2015-02-04 2015-06-03 浙江大学 Device and method for preparing graphene film on basis of plasma
CN105742143A (en) * 2016-04-15 2016-07-06 常州机电职业技术学院 Plasma modifying apparatus and processing method for improving surface hydrophilicity of powder material
CN205542695U (en) * 2016-04-15 2016-08-31 常州机电职业技术学院 Improve modified device of hydrophilic plasma in powder material surface
CN106744898A (en) * 2016-12-06 2017-05-31 中国石油大学(北京) A kind of modifies three-dimensional grapheme powder of nitrogen plasma and its preparation and application
CN109302790A (en) * 2018-06-01 2019-02-01 苏州海唐智能装备有限公司 A kind of novel plasma powder modifying device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140272108A1 (en) * 2013-03-15 2014-09-18 Plasmability, Llc Toroidal Plasma Processing Apparatus
CN104671237A (en) * 2015-02-04 2015-06-03 浙江大学 Device and method for preparing graphene film on basis of plasma
CN105742143A (en) * 2016-04-15 2016-07-06 常州机电职业技术学院 Plasma modifying apparatus and processing method for improving surface hydrophilicity of powder material
CN205542695U (en) * 2016-04-15 2016-08-31 常州机电职业技术学院 Improve modified device of hydrophilic plasma in powder material surface
CN106744898A (en) * 2016-12-06 2017-05-31 中国石油大学(北京) A kind of modifies three-dimensional grapheme powder of nitrogen plasma and its preparation and application
CN109302790A (en) * 2018-06-01 2019-02-01 苏州海唐智能装备有限公司 A kind of novel plasma powder modifying device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111430724A (en) * 2020-05-16 2020-07-17 武汉理工大学 Current collector, preparation method thereof and soft package lithium ion battery
CN112724710A (en) * 2021-01-15 2021-04-30 贵州玖碳科技有限公司 Plasma graphene powder surface modification process
CN115069168A (en) * 2022-06-14 2022-09-20 西安交通大学 Plasma-based carbon nanotube material fluorination device and use method thereof
CN115069168B (en) * 2022-06-14 2023-09-22 西安交通大学 Carbon nanotube material fluorination device based on plasma and application method thereof

Also Published As

Publication number Publication date
CN110357085B (en) 2020-04-24

Similar Documents

Publication Publication Date Title
CN110357085A (en) A kind of graphene surface plasma modification processing unit and processing method
Gallant et al. Microscopic effects of ultrasound on the structure of potato starch preliminary study
KR900005172B1 (en) Treating method of particles crogenic plasma and apparatus therefor
JP6505523B2 (en) Plasma powder processing apparatus and plasma powder processing method
CN107308875A (en) Cell size ultrasonic wave mixing apparatus
CN208671547U (en) A kind of biological products processing drying unit convenient for stirring
CN110913553B (en) High-efficient plasma activated water produces equipment
WO2018152777A1 (en) Double-layer battery positive electrode material dispersing device having vibration absorption function
CN105719931A (en) Powder or particle plasma processing device
CN108120266A (en) Medicinal material Minton dryer
CN201766766U (en) Device for generating plasmas uniformly in large area
CN207119320U (en) Cell size ultrasonic wave mixing apparatus
CN206714970U (en) Portable type atmosphere plasma sterilizing installation
CN109302790A (en) A kind of novel plasma powder modifying device
KR101371168B1 (en) Rotation drum type plasma treating apparatus
CN217797816U (en) Vacuum plasma cleaning cavity
WO2021026888A1 (en) Graphene surface plasma modification treatment device and treatment method
CN103623719A (en) Method for dispersing carbon nanotubes in suspension
CN201880526U (en) Device for modifying powder and nano materials by cold plasma
CN214509193U (en) Fermented acidophilus milk ice cream jar
CN108450536A (en) A kind of meat product processing tumbler
CN108220910A (en) A kind of preparation method of in-situ preparation nano-onions carbon
CN207347577U (en) A kind of ultrasonic wave plant cell wall breaking machine
JP3436447B2 (en) Method of improving bulk density of iron oxide powder
CN201006838Y (en) Plasma ozone generating instrument

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant