CN110280232A - A kind of preparation method of richness defect metal oxygen (sulphur) compound/graphene oxide composite material - Google Patents

A kind of preparation method of richness defect metal oxygen (sulphur) compound/graphene oxide composite material Download PDF

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Publication number
CN110280232A
CN110280232A CN201910414165.6A CN201910414165A CN110280232A CN 110280232 A CN110280232 A CN 110280232A CN 201910414165 A CN201910414165 A CN 201910414165A CN 110280232 A CN110280232 A CN 110280232A
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CN
China
Prior art keywords
preparation
graphene oxide
compound
sulphur
oxygen
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Pending
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CN201910414165.6A
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Chinese (zh)
Inventor
李美成
彭鹏
陈杰威
牛凯
李静如
刘乐浩
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North China Electric Power University
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North China Electric Power University
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Priority to CN201910414165.6A priority Critical patent/CN110280232A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/06Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of zinc, cadmium or mercury
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/24Chromium, molybdenum or tungsten
    • B01J23/28Molybdenum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/02Sulfur, selenium or tellurium; Compounds thereof
    • B01J27/04Sulfides
    • B01J27/047Sulfides with chromium, molybdenum, tungsten or polonium
    • B01J27/051Molybdenum
    • B01J35/39

Abstract

The present invention provides a kind of preparation method of rich defect metal oxygen (sulphur) compound/graphene oxide composite material.Metal lithium sheet, graphene oxide colloidal sol and selected oxide or sulfide are stirred evenly in the liquid phase, the composite material of certain defect concentration can be obtained after washing is dry.This method whipping step carries out under the anhydrous environment of anaerobic, and excessive hydrochloric acid is added to remove residual lithium piece after abundant reaction.The material that the present invention is prepared has exhibiting high surface defect, may advantageously facilitate the progress of photochemistry and electrochemical reaction;With graphene oxide it is compound can substantially extend light abstraction width, increasing specific surface area, improve conductive capability, to improve the photochemistry and chemical property of oxygen (sulphur) compound material.This method carries out at room temperature, easy to operate, low in cost, provides a kind of new thinking for the preparation of photochemical catalyst and energy storage material.

Description

A kind of preparation of richness defect metal oxygen (sulphur) compound/graphene oxide composite material Method
Technical field
The invention belongs to technical field of nano material, in particular to a kind of rich defect metal oxygen (sulphur) compound/graphite oxide The preparation method of alkene composite material.
Background technique
Environment and energy problem have caused whole world extensive concern, and the development for seeking new cleaning fuel and energy storage technology is compeled In the eyebrows and eyelashes.Semiconductor material uses very extensive, especially many transition metal oxides and its sulfide, such as titanium dioxide wherein Titanium (TiO2), molybdenum sulfide (MoS2), zinc oxide (ZnO) and molybdenum trioxide (MoO3) etc., they are the extensive semiconductors of research in recent years Material, they all have the characteristics that chemical property is stable, cheap, abundance and prepares relatively simple at a low price, are outstanding light Electric material.However, wider forbidden bandwidth limits the carrier transport and separating capacity of these materials, Carrier recombination rate also by It is influenced.Therefore, by adjusting their forbidden bandwidth, improve its carrier transport and separating capacity, improve its light absorption energy Power, and then it is particularly important to improve photocatalysis performance.Metal oxide and sulfide are the main forces of the energy storage material in addition to carbon material Army, for semiconductor material, poorly conductive and ionic diffusion coefficient coefficient it is low be its energy-storage property limiting factor, from this The energy-storage property that two aspects improve semiconductor material is also even more important.
On the other hand on the one hand electric conductivity that surface defect is conducive to improve material is Active sites, is conducive to promote The progress of entering light chemistry and electrochemical reaction.Importantly, the ratio table of the excellent electricity of graphene, mechanical property and its super large Area, and semiconductor material is compound greatly improves its electrochemistry and optical property.The unique gauffer pattern of graphene can be effective Increase specific surface area, improves the adsorption capacity of material surface;Graphene has higher conductivity, for improving leading for compound Electric energy power has great role, to improve its chemical property, graphene oxide can be used as the gatherer and transmitter of electronics, Promote the migration of electronics to reduce the probability of recombination of carrier;Also, the chemical action between semiconductor and graphene oxide Doping chemical bond can be formed, to extend the light abstraction width of catalysis material.It is existing to oxide and sulfide at present The method for carrying out defect regulation mainly under the high temperature conditions restores it, manufacturing conditions are more harsh and preparation cost compared with It is high.In addition, by graphene oxide auxiliary preparation there is the method for the semiconductor material of exhibiting high surface defect not report also.Pass through Solution at room temperature method is to TiO2、MoS2, ZnO and MoO3Several difference nano materials are handled, and exhibiting high surface defect are introduced, into one Step is compound with graphene oxide, can reduce the complexity of expensive cost and preparation condition needed for preparing material, and can be effective Prepare the semiconductor material with excellent optical, chemical property in ground.
Summary of the invention
The present invention is directed to propose a kind of simple and effective oxygen (sulphur) compound and graphene oxide with vacancy are compound Preparation method.We by stirring metal lithium sheet, graphene oxide colloidal sol and selected oxide or sulfide in the liquid phase It is even, the composite material of certain defect concentration is obtained, this method carries out at room temperature, and it is easy to operate, low in cost, and pass through the party The material of method preparation has excellent absorbing properties and chemical property.
The metal oxide and sulfide include TiO2、MoS2, ZnO and MoO3Deng.Due to experimentation and method one It causes, with TiO2For, the specific steps are as follows:
(1) TiO that 100~600mg is dry2Nano particle pours into beaker, and addition 20~40ml EDA and 1~ Magneton is added in the graphene oxide gel of 3mL.
(2) 12~36mg metallic lithium foil is dissolved in and is added in above-mentioned solution, seal simultaneously magnetic agitation.
(3) sufficiently after reaction, hydrochloric acid stirring is gradually added dropwise, extinguishes excessive lithium piece, and forms lithium salts to remove residual lithium gold Belong to.
(4) precipitating obtained after reaction is washed with deionized water and dehydrated alcohol, is then freeze-dried.
The TiO being added in the step (1)2Nano particle is 100~600mg, and anatase crystal, purity is 99.9%, EDA additional amount are 20mL, graphene oxide gel is 1~3mL, concentration 1wt.%.
The quality of lithium metal be added is 12~36mg in the step (2), and mixing time is 24 hours, and the process must It must be carried out in the glove box of no water oxygen environment, avoid the reaction between lithium metal and water, oxygen.
Concentration of hydrochloric acid be added is 36%~38% in the step (3), and hydrochloric acid is added excessively, until not having reaction to be Only, it stirs 3 hours.
Drying condition is vacuum freezedrying in affiliated step (4), and temperature is -40 DEG C, the time 24 hours or more.
The processing method is equally applicable to MoS2, ZnO and MoO3Equal materials.This method operating procedure is extremely simple, at low cost Honest and clean, the material band gap width being prepared narrows, and is conducive to promote its absorbing properties, and defect density improves, and is conducive to mention High photocatalysis performance.This method provides a kind of new thinking for the preparation of photochemical catalyst.
Detailed description of the invention
Fig. 1 is oxide and sulfide optical photograph figure before and after the processing.
Fig. 2 is TiO before and after the processing2Light absorption comparison diagram.
Fig. 3 is transmission electron microscope (TEM) figure: (a) TiO2(b)ZnO(c)MoO3
Fig. 4 is MoO after processing3XPS figure.
Fig. 5 is the cycle performance of lithium ion battery figure of titanium oxide (anatase) before and after the processing, circulating ratio 5C.
Specific embodiment
Embodiment 1
It is proposed by the present invention to prepare lithium reduction GO@MoS2Material can be implemented by following method, specific preparation method Include the following steps:
(1) MoS that 100~600mg is dry2Nano particle pours into beaker, and addition 20~40ml EDA and 1~ Magneton is added in the graphene oxide gel of 3mL.
(2) 12~36mg metallic lithium foils, which are dissolved in, to be added in above-mentioned solution, sealer and magnetic agitation.
(3) sufficiently after reaction, hydrochloric acid stirring is gradually added dropwise, extinguishes excessive lithium piece, and forms lithium salts to remove residual lithium gold Belong to.
(4) precipitating obtained after reaction is washed with deionized water and dehydrated alcohol, is then freeze-dried.
Embodiment 2
The lithium reduction GO@ZnO material proposed by the present invention for preparing can be implemented by following method, specific preparation method packet Include following steps:
(1) the dry ZnO nano particle of 100~600mg is poured into beaker, and 20~40ml EDA and 1~3mL is added Graphene oxide gel, be added magneton.
(2) 12~36mg metallic lithium foils, which are dissolved in, to be added in above-mentioned solution, sealer and magnetic agitation.
(3) sufficiently after reaction, hydrochloric acid stirring is gradually added dropwise, extinguishes excessive lithium piece, and forms lithium salts to remove residual lithium gold Belong to.
(4) precipitating obtained after reaction is washed with deionized water and dehydrated alcohol, is then freeze-dried.
Embodiment 3
It is proposed by the present invention to prepare lithium reduction GO@MoO3Material can be implemented by following method, specific preparation method Include the following steps:
(1) MoO that 100~600mg is dry3Nano particle pours into beaker, and addition 20~40ml EDA and 1~ Magneton is added in the graphene oxide gel of 3mL.
(2) 12~36mg metallic lithium foils, which are dissolved in, to be added in above-mentioned solution, sealer and magnetic agitation.
(3) sufficiently after reaction, hydrochloric acid stirring is gradually added dropwise, extinguishes excessive lithium piece, and forms lithium salts to remove residual lithium gold Belong to.
(4) precipitating obtained after reaction is washed with deionized water and dehydrated alcohol, is then freeze-dried.

Claims (6)

1. a kind of preparation method of richness defect metal oxygen (sulphur) compound/graphene oxide composite material, it is characterised in that: by metal Lithium piece, graphene oxide gel and metal target oxygen (sulphur) compound are added to ethylenediamine (EDA) solution, carry out under normal temperature conditions Stirring.After sufficiently reacting, hydrochloric acid is added dropwise and stirs.Finally, the product obtained after cleaning is freeze-dried.
2. preparation method according to claim 1, it is characterised in that: TiO2Dosage be 100~600mg, the dosage of EDA For 20~40ml, graphene oxide gel concentration is 1wt%, and dosage is 1~3mL, and whipping step is in the environment of anhydrous and oxygen-free It carries out.
3. preparation method according to claim 1, it is characterised in that: the dosage of metal lithium sheet is 12~36mg.
4. preparation method according to claim 1, it is characterised in that: solvent for use is salt in removal residual lithium piece step Acid, hydrochloric acid addition needs excess, until not having reaction.
5. preparation method according to claim 1, it is characterised in that: drying condition is vacuum freezedrying, drying time At 24 hours or more.
6. according to the method described in claim 1, this method is applicable not only to TiO2Material, equally applicable ZnO and MoO3Deng oxidation Object, it may also be used for MoS2Sulfides are to introduce sulphur vacancy.
CN201910414165.6A 2019-05-17 2019-05-17 A kind of preparation method of richness defect metal oxygen (sulphur) compound/graphene oxide composite material Pending CN110280232A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111389417A (en) * 2020-03-24 2020-07-10 武汉理工大学 Sulfur-rich vacancy bismuth sulfide nanowire and preparation method and application thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104069807A (en) * 2014-06-19 2014-10-01 北京师范大学 Preparation method and application of ZnO nano particle/graphene oxide composite material
US20160355405A1 (en) * 2015-06-02 2016-12-08 Korea Advanced Institute Of Science And Technology Method of fabricating array of nanoparticle clusters using thermal transformation of sublimable liquid crystal film
CN107342405A (en) * 2017-06-14 2017-11-10 三峡大学 A kind of MoS2‑xOx/ carbon negative pole material and preparation method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104069807A (en) * 2014-06-19 2014-10-01 北京师范大学 Preparation method and application of ZnO nano particle/graphene oxide composite material
US20160355405A1 (en) * 2015-06-02 2016-12-08 Korea Advanced Institute Of Science And Technology Method of fabricating array of nanoparticle clusters using thermal transformation of sublimable liquid crystal film
CN107342405A (en) * 2017-06-14 2017-11-10 三峡大学 A kind of MoS2‑xOx/ carbon negative pole material and preparation method thereof

Non-Patent Citations (2)

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MING MA ET AL.: ""Dual Oxygen and Tungsten Vacancies on a WO3 Photoanode for Enhanced Water Oxidation"", 《ANGEWANDTE CHEMIE INTERNATIONAL EDITION》 *
何光裕等: ""ZnO/氧化石墨烯复合材料的制备及其可见光催化性能"", 《高校化学工程学报》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111389417A (en) * 2020-03-24 2020-07-10 武汉理工大学 Sulfur-rich vacancy bismuth sulfide nanowire and preparation method and application thereof
CN111389417B (en) * 2020-03-24 2021-06-08 武汉理工大学 Sulfur-rich vacancy bismuth sulfide nanowire and preparation method and application thereof

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Application publication date: 20190927